FR2711276B1 - Cellule photovoltaïque et procédé de fabrication d'une telle cellule. - Google Patents
Cellule photovoltaïque et procédé de fabrication d'une telle cellule.Info
- Publication number
- FR2711276B1 FR2711276B1 FR9312246A FR9312246A FR2711276B1 FR 2711276 B1 FR2711276 B1 FR 2711276B1 FR 9312246 A FR9312246 A FR 9312246A FR 9312246 A FR9312246 A FR 9312246A FR 2711276 B1 FR2711276 B1 FR 2711276B1
- Authority
- FR
- France
- Prior art keywords
- layer
- pct
- cell
- conductivity type
- date
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
- 238000004519 manufacturing process Methods 0.000 title abstract 2
- 239000000758 substrate Substances 0.000 abstract 3
- 238000002161 passivation Methods 0.000 abstract 2
- 239000004065 semiconductor Substances 0.000 abstract 1
Classifications
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10F—INORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
- H10F10/00—Individual photovoltaic cells, e.g. solar cells
- H10F10/10—Individual photovoltaic cells, e.g. solar cells having potential barriers
- H10F10/16—Photovoltaic cells having only PN heterojunction potential barriers
- H10F10/164—Photovoltaic cells having only PN heterojunction potential barriers comprising heterojunctions with Group IV materials, e.g. ITO/Si or GaAs/SiGe photovoltaic cells
- H10F10/165—Photovoltaic cells having only PN heterojunction potential barriers comprising heterojunctions with Group IV materials, e.g. ITO/Si or GaAs/SiGe photovoltaic cells the heterojunctions being Group IV-IV heterojunctions, e.g. Si/Ge, SiGe/Si or Si/SiC photovoltaic cells
- H10F10/166—Photovoltaic cells having only PN heterojunction potential barriers comprising heterojunctions with Group IV materials, e.g. ITO/Si or GaAs/SiGe photovoltaic cells the heterojunctions being Group IV-IV heterojunctions, e.g. Si/Ge, SiGe/Si or Si/SiC photovoltaic cells the Group IV-IV heterojunctions being heterojunctions of crystalline and amorphous materials, e.g. silicon heterojunction [SHJ] photovoltaic cells
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10F—INORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
- H10F77/00—Constructional details of devices covered by this subclass
- H10F77/20—Electrodes
- H10F77/244—Electrodes made of transparent conductive layers, e.g. transparent conductive oxide [TCO] layers
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10F—INORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
- H10F77/00—Constructional details of devices covered by this subclass
- H10F77/20—Electrodes
- H10F77/244—Electrodes made of transparent conductive layers, e.g. transparent conductive oxide [TCO] layers
- H10F77/251—Electrodes made of transparent conductive layers, e.g. transparent conductive oxide [TCO] layers comprising zinc oxide [ZnO]
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10F—INORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
- H10F77/00—Constructional details of devices covered by this subclass
- H10F77/40—Optical elements or arrangements
- H10F77/42—Optical elements or arrangements directly associated or integrated with photovoltaic cells, e.g. light-reflecting means or light-concentrating means
- H10F77/48—Back surface reflectors [BSR]
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10F—INORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
- H10F77/00—Constructional details of devices covered by this subclass
- H10F77/70—Surface textures, e.g. pyramid structures
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10F—INORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
- H10F77/00—Constructional details of devices covered by this subclass
- H10F77/70—Surface textures, e.g. pyramid structures
- H10F77/703—Surface textures, e.g. pyramid structures of the semiconductor bodies, e.g. textured active layers
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10F—INORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
- H10F77/00—Constructional details of devices covered by this subclass
- H10F77/70—Surface textures, e.g. pyramid structures
- H10F77/707—Surface textures, e.g. pyramid structures of the substrates or of layers on substrates, e.g. textured ITO layer on a glass substrate
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
- Y02E10/00—Energy generation through renewable energy sources
- Y02E10/50—Photovoltaic [PV] energy
- Y02E10/52—PV systems with concentrators
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S438/00—Semiconductor device manufacturing: process
- Y10S438/958—Passivation layer
Landscapes
- Photovoltaic Devices (AREA)
Priority Applications (6)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| FR9312246A FR2711276B1 (fr) | 1993-10-11 | 1993-10-11 | Cellule photovoltaïque et procédé de fabrication d'une telle cellule. |
| US08/446,628 US5589008A (en) | 1993-10-11 | 1994-09-27 | Photovoltaic cell and method for fabrication of said cell |
| PCT/CH1994/000192 WO1995010856A1 (fr) | 1993-10-11 | 1994-09-27 | Cellule photovoltaique et procede de fabrication d'une telle cellule |
| EP94926766A EP0673549A1 (fr) | 1993-10-11 | 1994-09-27 | Cellule photovoltaique et procede de fabrication d'une telle cellule |
| JP7511140A JPH08508368A (ja) | 1993-10-11 | 1994-09-27 | 光電池および光電池を製造するための方法 |
| AU76506/94A AU7650694A (en) | 1993-10-11 | 1994-09-27 | Photovoltaic cell and method for fabrication of said cell |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| FR9312246A FR2711276B1 (fr) | 1993-10-11 | 1993-10-11 | Cellule photovoltaïque et procédé de fabrication d'une telle cellule. |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| FR2711276A1 FR2711276A1 (fr) | 1995-04-21 |
| FR2711276B1 true FR2711276B1 (fr) | 1995-12-01 |
Family
ID=9451834
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| FR9312246A Expired - Fee Related FR2711276B1 (fr) | 1993-10-11 | 1993-10-11 | Cellule photovoltaïque et procédé de fabrication d'une telle cellule. |
Country Status (6)
| Country | Link |
|---|---|
| US (1) | US5589008A (fr) |
| EP (1) | EP0673549A1 (fr) |
| JP (1) | JPH08508368A (fr) |
| AU (1) | AU7650694A (fr) |
| FR (1) | FR2711276B1 (fr) |
| WO (1) | WO1995010856A1 (fr) |
Families Citing this family (84)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6339013B1 (en) * | 1997-05-13 | 2002-01-15 | The Board Of Trustees Of The University Of Arkansas | Method of doping silicon, metal doped silicon, method of making solar cells, and solar cells |
| DE19743692A1 (de) * | 1997-10-02 | 1999-04-08 | Zae Bayern | Multifunktionsschicht zur Verbesserung des Wirkungsgrades von kristallinen Dünnschicht Silizium Solarzellen |
| ES2149126B1 (es) * | 1999-01-11 | 2001-05-16 | Univ Pais Vasco | Procedimiento para la fabricacion de celulas solares de silicio con estructura de campo retrodifusor, bajo espesor de base y metalizacion serigrafica. |
| JP2001189478A (ja) * | 1999-12-28 | 2001-07-10 | Sanyo Electric Co Ltd | 半導体素子及びその製造方法 |
| US6787692B2 (en) | 2000-10-31 | 2004-09-07 | National Institute Of Advanced Industrial Science & Technology | Solar cell substrate, thin-film solar cell, and multi-junction thin-film solar cell |
| US6587097B1 (en) | 2000-11-28 | 2003-07-01 | 3M Innovative Properties Co. | Display system |
| US6750394B2 (en) * | 2001-01-12 | 2004-06-15 | Sharp Kabushiki Kaisha | Thin-film solar cell and its manufacturing method |
| US7442629B2 (en) | 2004-09-24 | 2008-10-28 | President & Fellows Of Harvard College | Femtosecond laser-induced formation of submicrometer spikes on a semiconductor substrate |
| US7057256B2 (en) | 2001-05-25 | 2006-06-06 | President & Fellows Of Harvard College | Silicon-based visible and near-infrared optoelectric devices |
| JP2003298077A (ja) * | 2002-03-29 | 2003-10-17 | Ebara Corp | 太陽電池 |
| CN2550906Y (zh) * | 2002-05-27 | 2003-05-14 | 李映华 | 立体光双面结光电池 |
| US20050252544A1 (en) * | 2004-05-11 | 2005-11-17 | Ajeet Rohatgi | Silicon solar cells and methods of fabrication |
| US7790574B2 (en) | 2004-12-20 | 2010-09-07 | Georgia Tech Research Corporation | Boron diffusion in silicon devices |
| EP1696492B1 (fr) * | 2005-02-25 | 2012-04-11 | Sanyo Electric Co., Ltd. | Cellule photovoltaique |
| US7375378B2 (en) * | 2005-05-12 | 2008-05-20 | General Electric Company | Surface passivated photovoltaic devices |
| US7906723B2 (en) * | 2008-04-30 | 2011-03-15 | General Electric Company | Compositionally-graded and structurally-graded photovoltaic devices and methods of fabricating such devices |
| US7871664B2 (en) * | 2006-03-23 | 2011-01-18 | Guardian Industries Corp. | Parabolic trough or dish reflector for use in concentrating solar power apparatus and method of making same |
| JP4854387B2 (ja) * | 2006-05-29 | 2012-01-18 | 三洋電機株式会社 | 光起電力素子 |
| US20080190483A1 (en) * | 2007-02-13 | 2008-08-14 | Carpenter R Douglas | Composition and method of preparing nanoscale thin film photovoltaic materials |
| US20080223436A1 (en) * | 2007-03-15 | 2008-09-18 | Guardian Industries Corp. | Back reflector for use in photovoltaic device |
| EP1973167B1 (fr) * | 2007-03-19 | 2018-06-13 | Panasonic Intellectual Property Management Co., Ltd. | Dispositif photovoltaïque et son procédé de fabrication |
| US7875486B2 (en) | 2007-07-10 | 2011-01-25 | Applied Materials, Inc. | Solar cells and methods and apparatuses for forming the same including I-layer and N-layer chamber cleaning |
| KR20090075421A (ko) * | 2008-01-04 | 2009-07-08 | 삼성에스디아이 주식회사 | 태양 전지 |
| US20090211623A1 (en) * | 2008-02-25 | 2009-08-27 | Suniva, Inc. | Solar module with solar cell having crystalline silicon p-n homojunction and amorphous silicon heterojunctions for surface passivation |
| US8076175B2 (en) | 2008-02-25 | 2011-12-13 | Suniva, Inc. | Method for making solar cell having crystalline silicon P-N homojunction and amorphous silicon heterojunctions for surface passivation |
| US20090211627A1 (en) * | 2008-02-25 | 2009-08-27 | Suniva, Inc. | Solar cell having crystalline silicon p-n homojunction and amorphous silicon heterojunctions for surface passivation |
| KR100976454B1 (ko) * | 2008-03-04 | 2010-08-17 | 삼성에스디아이 주식회사 | 태양 전지 및 이의 제조 방법 |
| US20090242010A1 (en) * | 2008-03-27 | 2009-10-01 | Twin Creeks Technologies, Inc. | Method to Form a Photovoltaic Cell Comprising a Thin Lamina Bonded to a Discrete Receiver Element |
| US20090242031A1 (en) * | 2008-03-27 | 2009-10-01 | Twin Creeks Technologies, Inc. | Photovoltaic Assembly Including a Conductive Layer Between a Semiconductor Lamina and a Receiver Element |
| JP4418500B2 (ja) * | 2008-03-28 | 2010-02-17 | 三菱重工業株式会社 | 光電変換装置及びその製造方法 |
| US20090286349A1 (en) * | 2008-05-13 | 2009-11-19 | Georgia Tech Research Corporation | Solar cell spin-on based process for simultaneous diffusion and passivation |
| TW201005963A (en) * | 2008-07-17 | 2010-02-01 | Big Sun Energy Technology Inc | Solar cell with high photon utilization and method of manufacturing the same |
| US7858427B2 (en) * | 2009-03-03 | 2010-12-28 | Applied Materials, Inc. | Crystalline silicon solar cells on low purity substrate |
| US20100224243A1 (en) * | 2009-03-05 | 2010-09-09 | Applied Materials, Inc. | Adhesion between azo and ag for the back contact in tandem junction cell by metal alloy |
| US20100132775A1 (en) * | 2009-03-05 | 2010-06-03 | Applied Materials, Inc. | Adhesion between azo and ag for the back contact in tandem junction cell by metal alloy |
| US20100243042A1 (en) * | 2009-03-24 | 2010-09-30 | JA Development Co., Ltd. | High-efficiency photovoltaic cells |
| US8418418B2 (en) | 2009-04-29 | 2013-04-16 | 3Form, Inc. | Architectural panels with organic photovoltaic interlayers and methods of forming the same |
| DE102009025977A1 (de) | 2009-06-16 | 2010-12-23 | Q-Cells Se | Solarzelle und Herstellungsverfahren einer Solarzelle |
| JP2011003639A (ja) * | 2009-06-17 | 2011-01-06 | Kaneka Corp | 結晶シリコン系太陽電池とその製造方法 |
| CN102473750B (zh) * | 2009-07-03 | 2014-08-20 | 株式会社钟化 | 晶体硅系太阳能电池及其制造方法 |
| US9673243B2 (en) | 2009-09-17 | 2017-06-06 | Sionyx, Llc | Photosensitive imaging devices and associated methods |
| US9911781B2 (en) | 2009-09-17 | 2018-03-06 | Sionyx, Llc | Photosensitive imaging devices and associated methods |
| JP5307688B2 (ja) * | 2009-10-27 | 2013-10-02 | 株式会社カネカ | 結晶シリコン系太陽電池 |
| CN102725868A (zh) * | 2009-11-30 | 2012-10-10 | 京瓷株式会社 | 光电转换模块及其制造方法、以及发电装置 |
| TW201121066A (en) * | 2009-12-14 | 2011-06-16 | Ind Tech Res Inst | Bificial solar cell |
| US20120068289A1 (en) * | 2010-03-24 | 2012-03-22 | Sionyx, Inc. | Devices Having Enhanced Electromagnetic Radiation Detection and Associated Methods |
| US8692198B2 (en) | 2010-04-21 | 2014-04-08 | Sionyx, Inc. | Photosensitive imaging devices and associated methods |
| CN103081128B (zh) | 2010-06-18 | 2016-11-02 | 西奥尼克斯公司 | 高速光敏设备及相关方法 |
| JP2012060080A (ja) * | 2010-09-13 | 2012-03-22 | Ulvac Japan Ltd | 結晶太陽電池及びその製造方法 |
| US8513046B2 (en) * | 2010-10-07 | 2013-08-20 | Semiconductor Energy Laboratory Co., Ltd. | Photoelectric conversion device and manufacturing method thereof |
| US8815635B2 (en) * | 2010-11-05 | 2014-08-26 | Semiconductor Energy Laboratory Co., Ltd. | Manufacturing method of photoelectric conversion device |
| US8558341B2 (en) * | 2010-12-17 | 2013-10-15 | Semiconductor Energy Laboratory Co., Ltd. | Photoelectric conversion element |
| US8536448B2 (en) | 2010-12-29 | 2013-09-17 | Gtat Corporation | Zener diode within a diode structure providing shunt protection |
| US8268645B2 (en) | 2010-12-29 | 2012-09-18 | Twin Creeks Technologies, Inc. | Method and apparatus for forming a thin lamina |
| US8173452B1 (en) | 2010-12-29 | 2012-05-08 | Twin Creeks Technologies, Inc. | Method to form a device by constructing a support element on a thin semiconductor lamina |
| JP5884077B2 (ja) | 2010-12-29 | 2016-03-15 | パナソニックIpマネジメント株式会社 | 太陽電池及び太陽電池モジュール |
| US8435804B2 (en) | 2010-12-29 | 2013-05-07 | Gtat Corporation | Method and apparatus for forming a thin lamina |
| US8101451B1 (en) | 2010-12-29 | 2012-01-24 | Twin Creeks Technologies, Inc. | Method to form a device including an annealed lamina and having amorphous silicon on opposing faces |
| US8773018B2 (en) * | 2011-01-25 | 2014-07-08 | Paul F. Hensley | Tuning a dielectric barrier discharge cleaning system |
| WO2012105153A1 (fr) * | 2011-01-31 | 2012-08-09 | 三洋電機株式会社 | Élément de conversion photoélectrique |
| WO2012105154A1 (fr) * | 2011-01-31 | 2012-08-09 | 三洋電機株式会社 | Procédé de fabrication d'un élément de conversion photoélectrique |
| WO2012105146A1 (fr) * | 2011-01-31 | 2012-08-09 | 三洋電機株式会社 | Convertisseur photoélectrique et module de conversion photoélectrique |
| US10011920B2 (en) | 2011-02-23 | 2018-07-03 | International Business Machines Corporation | Low-temperature selective epitaxial growth of silicon for device integration |
| US9496308B2 (en) | 2011-06-09 | 2016-11-15 | Sionyx, Llc | Process module for increasing the response of backside illuminated photosensitive imagers and associated methods |
| JP2013012606A (ja) * | 2011-06-29 | 2013-01-17 | Sanyo Electric Co Ltd | 太陽電池及びその製造方法 |
| CN103946867A (zh) | 2011-07-13 | 2014-07-23 | 西奥尼克斯公司 | 生物计量成像装置和相关方法 |
| JP2013030520A (ja) | 2011-07-27 | 2013-02-07 | Sanyo Electric Co Ltd | 太陽電池 |
| DE102011052480A1 (de) * | 2011-08-08 | 2013-02-14 | Roth & Rau Ag | Solarzelle und Verfahren zur Herstellung einer Solarzelle |
| KR101918737B1 (ko) * | 2012-03-19 | 2019-02-08 | 엘지전자 주식회사 | 태양 전지 |
| US9064764B2 (en) | 2012-03-22 | 2015-06-23 | Sionyx, Inc. | Pixel isolation elements, devices, and associated methods |
| CN102693893B (zh) * | 2012-04-28 | 2015-01-14 | 北京工业大学 | 一种利用调频的方式改善高频放电等离子体均匀性的方法 |
| US9059212B2 (en) | 2012-10-31 | 2015-06-16 | International Business Machines Corporation | Back-end transistors with highly doped low-temperature contacts |
| US8912071B2 (en) | 2012-12-06 | 2014-12-16 | International Business Machines Corporation | Selective emitter photovoltaic device |
| US8642378B1 (en) | 2012-12-18 | 2014-02-04 | International Business Machines Corporation | Field-effect inter-digitated back contact photovoltaic device |
| KR20150130303A (ko) | 2013-02-15 | 2015-11-23 | 사이오닉스, 아이엔씨. | 안티 블루밍 특성 및 관련 방법을 가지는 높은 동적 범위의 cmos 이미지 센서 |
| WO2014151093A1 (fr) | 2013-03-15 | 2014-09-25 | Sionyx, Inc. | Imagerie tridimensionnelle utilisant des dispositifs imageurs empilés et procédés associés |
| WO2014209421A1 (fr) | 2013-06-29 | 2014-12-31 | Sionyx, Inc. | Régions texturées formées de tranchées peu profondes et procédés associés. |
| KR20150114792A (ko) | 2014-04-02 | 2015-10-13 | 한국에너지기술연구원 | 초박형 hit 태양전지 및 그 제조방법 |
| US20150318412A1 (en) * | 2014-05-01 | 2015-11-05 | Jesse A. Frantz | Microstructured ZnO coatings for improved performance in Cu(In, Ga)Se2 photovoltaic devices |
| US9525083B2 (en) * | 2015-03-27 | 2016-12-20 | Sunpower Corporation | Solar cell emitter region fabrication with differentiated P-type and N-type architectures and incorporating a multi-purpose passivation and contact layer |
| JP6191925B2 (ja) * | 2015-10-15 | 2017-09-06 | パナソニックIpマネジメント株式会社 | 太陽電池モジュール |
| TWI572050B (zh) * | 2015-11-10 | 2017-02-21 | 財團法人金屬工業研究發展中心 | 異質接面之矽基太陽能電池製作方法及直列式製作設備 |
| CN109378347A (zh) * | 2018-09-19 | 2019-02-22 | 黄剑鸣 | 一种基于n型硅片的异质结太阳能电池及其制作方法 |
| CN118969880B (zh) * | 2024-10-17 | 2024-12-20 | 福建金石能源有限公司 | 具有特定p型发射极的联合钝化背接触电池及制作和应用 |
Family Cites Families (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0795603B2 (ja) * | 1990-09-20 | 1995-10-11 | 三洋電機株式会社 | 光起電力装置 |
| US5213628A (en) * | 1990-09-20 | 1993-05-25 | Sanyo Electric Co., Ltd. | Photovoltaic device |
| JP2994735B2 (ja) * | 1990-11-27 | 1999-12-27 | シャープ株式会社 | 太陽電池 |
-
1993
- 1993-10-11 FR FR9312246A patent/FR2711276B1/fr not_active Expired - Fee Related
-
1994
- 1994-09-27 AU AU76506/94A patent/AU7650694A/en not_active Abandoned
- 1994-09-27 US US08/446,628 patent/US5589008A/en not_active Expired - Lifetime
- 1994-09-27 EP EP94926766A patent/EP0673549A1/fr not_active Withdrawn
- 1994-09-27 JP JP7511140A patent/JPH08508368A/ja not_active Ceased
- 1994-09-27 WO PCT/CH1994/000192 patent/WO1995010856A1/fr not_active Ceased
Also Published As
| Publication number | Publication date |
|---|---|
| WO1995010856A1 (fr) | 1995-04-20 |
| JPH08508368A (ja) | 1996-09-03 |
| EP0673549A1 (fr) | 1995-09-27 |
| US5589008A (en) | 1996-12-31 |
| FR2711276A1 (fr) | 1995-04-21 |
| AU7650694A (en) | 1995-05-04 |
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