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FR2745010B1 - TUBULAR OR DERIVATIVE CATHODE SPRAYING TARGET MADE OF MULTIPLE LONGITUDINAL PLATES AND METHOD OF MANUFACTURE THEREOF - Google Patents

TUBULAR OR DERIVATIVE CATHODE SPRAYING TARGET MADE OF MULTIPLE LONGITUDINAL PLATES AND METHOD OF MANUFACTURE THEREOF

Info

Publication number
FR2745010B1
FR2745010B1 FR9602288A FR9602288A FR2745010B1 FR 2745010 B1 FR2745010 B1 FR 2745010B1 FR 9602288 A FR9602288 A FR 9602288A FR 9602288 A FR9602288 A FR 9602288A FR 2745010 B1 FR2745010 B1 FR 2745010B1
Authority
FR
France
Prior art keywords
tubular
manufacture
target made
multiple longitudinal
longitudinal plates
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
FR9602288A
Other languages
French (fr)
Other versions
FR2745010A1 (en
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Individual
Original Assignee
Individual
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Individual filed Critical Individual
Priority to FR9602288A priority Critical patent/FR2745010B1/en
Publication of FR2745010A1 publication Critical patent/FR2745010A1/en
Application granted granted Critical
Publication of FR2745010B1 publication Critical patent/FR2745010B1/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/34—Gas-filled discharge tubes operating with cathodic sputtering
    • H01J37/3411—Constructional aspects of the reactor
    • H01J37/3414—Targets
    • H01J37/3423—Shape
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34—Sputtering
    • C23C14/3407—Cathode assembly for sputtering apparatus, e.g. Target
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/34—Gas-filled discharge tubes operating with cathodic sputtering
    • H01J37/3488—Constructional details of particle beam apparatus not otherwise provided for, e.g. arrangement, mounting, housing, environment; special provisions for cleaning or maintenance of the apparatus
    • H01J37/3491—Manufacturing of targets

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Plasma & Fusion (AREA)
  • Analytical Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
FR9602288A 1996-02-20 1996-02-20 TUBULAR OR DERIVATIVE CATHODE SPRAYING TARGET MADE OF MULTIPLE LONGITUDINAL PLATES AND METHOD OF MANUFACTURE THEREOF Expired - Fee Related FR2745010B1 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
FR9602288A FR2745010B1 (en) 1996-02-20 1996-02-20 TUBULAR OR DERIVATIVE CATHODE SPRAYING TARGET MADE OF MULTIPLE LONGITUDINAL PLATES AND METHOD OF MANUFACTURE THEREOF

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
FR9602288A FR2745010B1 (en) 1996-02-20 1996-02-20 TUBULAR OR DERIVATIVE CATHODE SPRAYING TARGET MADE OF MULTIPLE LONGITUDINAL PLATES AND METHOD OF MANUFACTURE THEREOF

Publications (2)

Publication Number Publication Date
FR2745010A1 FR2745010A1 (en) 1997-08-22
FR2745010B1 true FR2745010B1 (en) 1998-06-12

Family

ID=9489530

Family Applications (1)

Application Number Title Priority Date Filing Date
FR9602288A Expired - Fee Related FR2745010B1 (en) 1996-02-20 1996-02-20 TUBULAR OR DERIVATIVE CATHODE SPRAYING TARGET MADE OF MULTIPLE LONGITUDINAL PLATES AND METHOD OF MANUFACTURE THEREOF

Country Status (1)

Country Link
FR (1) FR2745010B1 (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7842355B2 (en) 2005-11-01 2010-11-30 Applied Materials, Inc. System and method for modulation of power and power related functions of PECVD discharge sources to achieve new film properties

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE19953470A1 (en) * 1999-11-05 2001-05-23 Heraeus Gmbh W C Tube target
DE10213043B4 (en) * 2002-03-22 2008-10-30 Von Ardenne Anlagentechnik Gmbh Tubular magnetron and its use
US20030183518A1 (en) * 2002-03-27 2003-10-02 Glocker David A. Concave sputtering apparatus
WO2007110172A1 (en) * 2006-03-23 2007-10-04 W. C. Heraeus Gmbh Tubular target

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4443318A (en) * 1983-08-17 1984-04-17 Shatterproof Glass Corporation Cathodic sputtering apparatus
JPS6217175A (en) * 1985-07-16 1987-01-26 Nissin Electric Co Ltd Sputtering device
JPS62211372A (en) * 1986-03-11 1987-09-17 Matsushita Electric Ind Co Ltd sputtering equipment
JPS63247367A (en) * 1987-04-03 1988-10-14 Hitachi Ltd Ion beam sputtering device
JPH07228967A (en) * 1994-02-17 1995-08-29 Mitsubishi Materials Corp Long cylindrical sputtering target

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7842355B2 (en) 2005-11-01 2010-11-30 Applied Materials, Inc. System and method for modulation of power and power related functions of PECVD discharge sources to achieve new film properties

Also Published As

Publication number Publication date
FR2745010A1 (en) 1997-08-22

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Legal Events

Date Code Title Description
ST Notification of lapse
RN Application for restoration
FC Favourable decision of inpi director general on an application for restauration.
ST Notification of lapse