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FR2628211B1 - ELLIPSOMETRY ANALYZER, METHOD OF ELLIPSOMETRIC ANALYSIS OF A SAMPLE AND APPLICATION TO MEASUREMENT OF VARIATION IN THICKNESS THICKNESS - Google Patents

ELLIPSOMETRY ANALYZER, METHOD OF ELLIPSOMETRIC ANALYSIS OF A SAMPLE AND APPLICATION TO MEASUREMENT OF VARIATION IN THICKNESS THICKNESS

Info

Publication number
FR2628211B1
FR2628211B1 FR8802784A FR8802784A FR2628211B1 FR 2628211 B1 FR2628211 B1 FR 2628211B1 FR 8802784 A FR8802784 A FR 8802784A FR 8802784 A FR8802784 A FR 8802784A FR 2628211 B1 FR2628211 B1 FR 2628211B1
Authority
FR
France
Prior art keywords
thickness
variation
sample
measurement
application
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
FR8802784A
Other languages
French (fr)
Other versions
FR2628211A1 (en
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Individual
Original Assignee
Individual
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Individual filed Critical Individual
Priority to FR8802784A priority Critical patent/FR2628211B1/en
Priority to EP89400582A priority patent/EP0332508B1/en
Priority to DE89400582T priority patent/DE68908920T2/en
Priority to US07/319,001 priority patent/US5018863A/en
Publication of FR2628211A1 publication Critical patent/FR2628211A1/en
Application granted granted Critical
Publication of FR2628211B1 publication Critical patent/FR2628211B1/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/17—Systems in which incident light is modified in accordance with the properties of the material investigated
    • G01N21/21—Polarisation-affecting properties
    • G01N21/211—Ellipsometry
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B11/00—Measuring arrangements characterised by the use of optical techniques
    • G01B11/02—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness
    • G01B11/06—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness for measuring thickness ; e.g. of sheet material
    • G01B11/0616—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness for measuring thickness ; e.g. of sheet material of coating
    • G01B11/0641—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness for measuring thickness ; e.g. of sheet material of coating with measurement of polarization
    • G01B11/065—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness for measuring thickness ; e.g. of sheet material of coating with measurement of polarization using one or more discrete wavelengths

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Biochemistry (AREA)
  • General Health & Medical Sciences (AREA)
  • Immunology (AREA)
  • Pathology (AREA)
  • Investigating Or Analysing Materials By Optical Means (AREA)
  • Length Measuring Devices By Optical Means (AREA)
FR8802784A 1988-03-04 1988-03-04 ELLIPSOMETRY ANALYZER, METHOD OF ELLIPSOMETRIC ANALYSIS OF A SAMPLE AND APPLICATION TO MEASUREMENT OF VARIATION IN THICKNESS THICKNESS Expired - Fee Related FR2628211B1 (en)

Priority Applications (4)

Application Number Priority Date Filing Date Title
FR8802784A FR2628211B1 (en) 1988-03-04 1988-03-04 ELLIPSOMETRY ANALYZER, METHOD OF ELLIPSOMETRIC ANALYSIS OF A SAMPLE AND APPLICATION TO MEASUREMENT OF VARIATION IN THICKNESS THICKNESS
EP89400582A EP0332508B1 (en) 1988-03-04 1989-03-02 Device for ellipsometric analysis, method for the ellipsometric analysis of a sample, and use in the measurement of thickness variation of thin layers
DE89400582T DE68908920T2 (en) 1988-03-04 1989-03-02 Apparatus for ellipsometric examination, method for the ellipsometric examination of a sample, use for measuring the change in thickness of thin layers.
US07/319,001 US5018863A (en) 1988-03-04 1989-03-06 Apparatus for analysis by ellipsometry, procedure for ellipsometric analysis of a sample and application to the measurement of variations in the thickness of thin films

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
FR8802784A FR2628211B1 (en) 1988-03-04 1988-03-04 ELLIPSOMETRY ANALYZER, METHOD OF ELLIPSOMETRIC ANALYSIS OF A SAMPLE AND APPLICATION TO MEASUREMENT OF VARIATION IN THICKNESS THICKNESS

Publications (2)

Publication Number Publication Date
FR2628211A1 FR2628211A1 (en) 1989-09-08
FR2628211B1 true FR2628211B1 (en) 1993-05-14

Family

ID=9363926

Family Applications (1)

Application Number Title Priority Date Filing Date
FR8802784A Expired - Fee Related FR2628211B1 (en) 1988-03-04 1988-03-04 ELLIPSOMETRY ANALYZER, METHOD OF ELLIPSOMETRIC ANALYSIS OF A SAMPLE AND APPLICATION TO MEASUREMENT OF VARIATION IN THICKNESS THICKNESS

Country Status (4)

Country Link
US (1) US5018863A (en)
EP (1) EP0332508B1 (en)
DE (1) DE68908920T2 (en)
FR (1) FR2628211B1 (en)

Families Citing this family (19)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE69421844T2 (en) * 1993-04-23 2000-06-29 Research Development Corp. Of Japan, Kawaguchi Method for checking the layer thickness and / or the refractive index
US5412473A (en) * 1993-07-16 1995-05-02 Therma-Wave, Inc. Multiple angle spectroscopic analyzer utilizing interferometric and ellipsometric devices
US5548404A (en) * 1994-09-23 1996-08-20 Sunshine Medical Instruments, Inc. Multiple wavelength polarization-modulated ellipsometer with phase-generated carrier
US5877859A (en) 1996-07-24 1999-03-02 Therma-Wave, Inc. Broadband spectroscopic rotating compensator ellipsometer
US5717490A (en) * 1996-10-17 1998-02-10 Lsi Logic Corporation Method for identifying order skipping in spectroreflective film measurement equipment
FR2756925B1 (en) * 1996-12-06 2001-06-15 Armines ELLIPSOMETER WITH ROTATING BIREFRINGENT BLADE
FR2756919B1 (en) * 1996-12-06 1999-02-12 Armines ELLIPSOMETER WITH ROTATING BIREFRINGENT BLADE
US5798837A (en) 1997-07-11 1998-08-25 Therma-Wave, Inc. Thin film optical measurement system and method with calibrating ellipsometer
US6278519B1 (en) 1998-01-29 2001-08-21 Therma-Wave, Inc. Apparatus for analyzing multi-layer thin film stacks on semiconductors
RU2133956C1 (en) * 1997-08-27 1999-07-27 Российский Университет Дружбы Народов Process of ellipsometric study of thin films on flat substrates
RU2149382C1 (en) * 1997-10-23 2000-05-20 Физико-технологический институт Российской академии наук Process determining ellipsometric parameters of object (versions)
US6483580B1 (en) * 1998-03-06 2002-11-19 Kla-Tencor Technologies Corporation Spectroscopic scatterometer system
US6804003B1 (en) 1999-02-09 2004-10-12 Kla-Tencor Corporation System for analyzing surface characteristics with self-calibrating capability
US6184984B1 (en) 1999-02-09 2001-02-06 Kla-Tencor Corporation System for measuring polarimetric spectrum and other properties of a sample
RU2193158C2 (en) * 2000-01-26 2002-11-20 Акционерное общество открытого типа "НИИ молекулярной электроники и завод "Микрон" Procedure measuring thickness of residual films in small-size windows
US6753961B1 (en) * 2000-09-18 2004-06-22 Therma-Wave, Inc. Spectroscopic ellipsometer without rotating components
RU2270437C2 (en) * 2003-05-15 2006-02-20 Открытое акционерное общество "НИИ молекулярной электроники и завод "МИКРОН" (ОАО "НИИМЭ и завод "МИКРОН") Method for measuring height of step in any random multi-layer structures
US7336359B1 (en) 2004-05-03 2008-02-26 Purdue Research Foundation System and method for nonlinear optical null ellipsometry
US7515253B2 (en) * 2005-01-12 2009-04-07 Kla-Tencor Technologies Corporation System for measuring a sample with a layer containing a periodic diffracting structure

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2365793A1 (en) * 1976-09-23 1978-04-21 France Etat ROTATING BIREFRINGENT ELLIPSOMETER IN ITS APPLICATION TO PHOTOELASTICIMETRY
JPS60233533A (en) * 1984-05-04 1985-11-20 Victor Co Of Japan Ltd Instrument for measuring magnetic domain

Also Published As

Publication number Publication date
DE68908920T2 (en) 1994-03-31
US5018863A (en) 1991-05-28
EP0332508B1 (en) 1993-09-08
FR2628211A1 (en) 1989-09-08
DE68908920D1 (en) 1993-10-14
EP0332508A1 (en) 1989-09-13

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Legal Events

Date Code Title Description
TP Transmission of property
TP Transmission of property
ST Notification of lapse