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FR2601175B1 - Cible de pulverisation cathodique et support d'enregistrement utilisant une telle cible. - Google Patents

Cible de pulverisation cathodique et support d'enregistrement utilisant une telle cible.

Info

Publication number
FR2601175B1
FR2601175B1 FR8703807A FR8703807A FR2601175B1 FR 2601175 B1 FR2601175 B1 FR 2601175B1 FR 8703807 A FR8703807 A FR 8703807A FR 8703807 A FR8703807 A FR 8703807A FR 2601175 B1 FR2601175 B1 FR 2601175B1
Authority
FR
France
Prior art keywords
target
recording medium
cathode spraying
cathode
spraying
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
FR8703807A
Other languages
English (en)
Other versions
FR2601175A1 (fr
Inventor
Shimokawato Satoshi
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Seiko Epson Corp
Original Assignee
Seiko Epson Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from JP61146743A external-priority patent/JP2747580B2/ja
Application filed by Seiko Epson Corp filed Critical Seiko Epson Corp
Publication of FR2601175A1 publication Critical patent/FR2601175A1/fr
Application granted granted Critical
Publication of FR2601175B1 publication Critical patent/FR2601175B1/fr
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01F—MAGNETS; INDUCTANCES; TRANSFORMERS; SELECTION OF MATERIALS FOR THEIR MAGNETIC PROPERTIES
    • H01F41/00—Apparatus or processes specially adapted for manufacturing or assembling magnets, inductances or transformers; Apparatus or processes specially adapted for manufacturing materials characterised by their magnetic properties
    • H01F41/14—Apparatus or processes specially adapted for manufacturing or assembling magnets, inductances or transformers; Apparatus or processes specially adapted for manufacturing materials characterised by their magnetic properties for applying magnetic films to substrates
    • H01F41/18—Apparatus or processes specially adapted for manufacturing or assembling magnets, inductances or transformers; Apparatus or processes specially adapted for manufacturing materials characterised by their magnetic properties for applying magnetic films to substrates by cathode sputtering
    • H01F41/183—Sputtering targets therefor
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34—Sputtering
    • C23C14/3407—Cathode assembly for sputtering apparatus, e.g. Target
    • C23C14/3414—Metallurgical or chemical aspects of target preparation, e.g. casting, powder metallurgy
    • G—PHYSICS
    • G11—INFORMATION STORAGE
    • G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
    • G11B5/84—Processes or apparatus specially adapted for manufacturing record carriers
    • G11B5/851—Coating a support with a magnetic layer by sputtering
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01F—MAGNETS; INDUCTANCES; TRANSFORMERS; SELECTION OF MATERIALS FOR THEIR MAGNETIC PROPERTIES
    • H01F10/00—Thin magnetic films, e.g. of one-domain structure
    • H01F10/08—Thin magnetic films, e.g. of one-domain structure characterised by magnetic layers
    • H01F10/10—Thin magnetic films, e.g. of one-domain structure characterised by magnetic layers characterised by the composition
    • H01F10/12—Thin magnetic films, e.g. of one-domain structure characterised by magnetic layers characterised by the composition being metals or alloys
    • H01F10/13—Amorphous metallic alloys, e.g. glassy metals
    • H01F10/133—Amorphous metallic alloys, e.g. glassy metals containing rare earth metals

Landscapes

  • Engineering & Computer Science (AREA)
  • Power Engineering (AREA)
  • Chemical & Material Sciences (AREA)
  • Manufacturing & Machinery (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
FR8703807A 1986-04-04 1987-03-19 Cible de pulverisation cathodique et support d'enregistrement utilisant une telle cible. Expired - Lifetime FR2601175B1 (fr)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP7780786 1986-04-04
JP61146743A JP2747580B2 (ja) 1986-04-04 1986-06-23 磁性薄膜用スパッタリング・ターゲット

Publications (2)

Publication Number Publication Date
FR2601175A1 FR2601175A1 (fr) 1988-01-08
FR2601175B1 true FR2601175B1 (fr) 1993-11-12

Family

ID=26418871

Family Applications (1)

Application Number Title Priority Date Filing Date
FR8703807A Expired - Lifetime FR2601175B1 (fr) 1986-04-04 1987-03-19 Cible de pulverisation cathodique et support d'enregistrement utilisant une telle cible.

Country Status (3)

Country Link
US (1) US4814053A (fr)
FR (1) FR2601175B1 (fr)
NL (1) NL191420C (fr)

Families Citing this family (23)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5529854A (en) * 1984-09-12 1996-06-25 Seiko Epson Corporation Magneto-optic recording systems
DE3788069T2 (de) * 1986-08-22 1994-06-01 Japan Broadcasting Corp Optomagnetisches speichermedium und verfahren zur herstellung.
JP2646398B2 (ja) * 1989-09-20 1997-08-27 インターナシヨナル・ビジネス・マシーンズ・コーポレーシヨン 光磁気記録媒体
DE4321851A1 (de) * 1993-07-01 1995-01-12 Philips Patentverwaltung Magnetooptisches Aufzeichnungsmedium
JP2733006B2 (ja) 1993-07-27 1998-03-30 株式会社神戸製鋼所 半導体用電極及びその製造方法並びに半導体用電極膜形成用スパッタリングターゲット
US5439500A (en) * 1993-12-02 1995-08-08 Materials Research Corporation Magneto-optical alloy sputter targets
US6071357A (en) * 1997-09-26 2000-06-06 Guruswamy; Sivaraman Magnetostrictive composites and process for manufacture by dynamic compaction
US6342114B1 (en) * 1999-03-31 2002-01-29 Praxair S.T. Technology, Inc. Nickel/vanadium sputtering target with ultra-low alpha emission
US6113761A (en) 1999-06-02 2000-09-05 Johnson Matthey Electronics, Inc. Copper sputtering target assembly and method of making same
US6858102B1 (en) * 2000-11-15 2005-02-22 Honeywell International Inc. Copper-containing sputtering targets, and methods of forming copper-containing sputtering targets
US6432819B1 (en) 1999-09-27 2002-08-13 Applied Materials, Inc. Method and apparatus of forming a sputtered doped seed layer
US6391163B1 (en) 1999-09-27 2002-05-21 Applied Materials, Inc. Method of enhancing hardness of sputter deposited copper films
JP3434476B2 (ja) * 1999-09-29 2003-08-11 秋田県 高密度情報記録媒体及びその媒体の製造方法
WO2001039250A2 (fr) 1999-11-24 2001-05-31 Honeywell International Inc. Cibles de depot physique en phase vapeur, interconnexions de circuit integre conductrices en alliage metallique, anodes d'electrodeposition et alliages metalliques utiles comme interconnexion conductrice dans un circuit integre
AU2003216441A1 (en) * 2002-02-28 2003-09-16 Seagate Technology Llc Chemically ordered, cobalt-platinum alloys for magnetic recording
CN1839213A (zh) * 2003-08-21 2006-09-27 霍尼韦尔国际公司 在三元混合物中包含铜的pvd靶和形成含铜pvd靶的方法
JP4579709B2 (ja) * 2005-02-15 2010-11-10 株式会社神戸製鋼所 Ａｌ−Ｎｉ−希土類元素合金スパッタリングターゲット
KR20080100358A (ko) * 2006-03-06 2008-11-17 토소우 에스엠디, 인크 전자 장치, 이의 제조방법 및 스퍼터링 타겟
US20090008786A1 (en) * 2006-03-06 2009-01-08 Tosoh Smd, Inc. Sputtering Target
JP4377906B2 (ja) * 2006-11-20 2009-12-02 株式会社コベルコ科研 Ａｌ−Ｎｉ−Ｌａ系Ａｌ基合金スパッタリングターゲット、およびその製造方法
US20090065354A1 (en) * 2007-09-12 2009-03-12 Kardokus Janine K Sputtering targets comprising a novel manufacturing design, methods of production and uses thereof
US20150041731A1 (en) * 2013-08-09 2015-02-12 Chung-Shan Institute of Science and Technology Armaments Bureau, Ministry of National Defense Method For Preparing Scandium-Doped Hafnium Oxide Film
JP7564626B2 (ja) * 2020-02-13 2024-10-09 山陽特殊製鋼株式会社 スパッタリングターゲット材及びその製造方法

Family Cites Families (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CH616777A5 (fr) * 1975-09-23 1980-04-15 Bbc Brown Boveri & Cie
US4135953A (en) * 1975-09-23 1979-01-23 Bbc Brown, Boveri & Company, Limited Permanent magnet and method of making it
JPS54104408A (en) * 1978-02-03 1979-08-16 Namiki Precision Jewel Co Ltd Rare earthhcobalt base permanent magnet alloy
JPS601940B2 (ja) * 1980-08-11 1985-01-18 富士通株式会社 感温素子材料
JPS5968854A (ja) * 1982-09-28 1984-04-18 Seiko Instr & Electronics Ltd 光磁気記録媒体
JPS59202614A (ja) * 1983-05-04 1984-11-16 Showa Denko Kk 磁気素子
JPS60117436A (ja) * 1983-11-29 1985-06-24 Sharp Corp 磁気光学記憶素子
US4547276A (en) * 1984-04-30 1985-10-15 The United States Of America As Represented By The Secretary Of The Army Method of directly crystallizing a (Sm+Ti):Fe=1:5 compound
JPS616807A (ja) * 1984-06-20 1986-01-13 Oki Electric Ind Co Ltd 光磁気記録用材料
JPS6115308A (ja) * 1984-07-02 1986-01-23 Hitachi Ltd 光磁気記録材料
US4620872A (en) * 1984-10-18 1986-11-04 Mitsubishi Kinzoku Kabushiki Kaisha Composite target material and process for producing the same

Also Published As

Publication number Publication date
US4814053A (en) 1989-03-21
NL191420C (nl) 1995-07-17
FR2601175A1 (fr) 1988-01-08
NL8700792A (nl) 1987-11-02
NL191420B (nl) 1995-02-16

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