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FR2439437A1 - PROCESS AND DEVICE FOR EXAMINING PATTERNS SUCH AS THOSE MASKS USED IN THE MANUFACTURE OF INTEGRATED CIRCUITS - Google Patents

PROCESS AND DEVICE FOR EXAMINING PATTERNS SUCH AS THOSE MASKS USED IN THE MANUFACTURE OF INTEGRATED CIRCUITS

Info

Publication number
FR2439437A1
FR2439437A1 FR7908076A FR7908076A FR2439437A1 FR 2439437 A1 FR2439437 A1 FR 2439437A1 FR 7908076 A FR7908076 A FR 7908076A FR 7908076 A FR7908076 A FR 7908076A FR 2439437 A1 FR2439437 A1 FR 2439437A1
Authority
FR
France
Prior art keywords
pattern
manufacture
integrated circuits
examining
masks used
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
FR7908076A
Other languages
French (fr)
Other versions
FR2439437B1 (en
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NTT Inc
Original Assignee
Nippon Telegraph and Telephone Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nippon Telegraph and Telephone Corp filed Critical Nippon Telegraph and Telephone Corp
Publication of FR2439437A1 publication Critical patent/FR2439437A1/en
Application granted granted Critical
Publication of FR2439437B1 publication Critical patent/FR2439437B1/en
Expired legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G03F7/70605—Workpiece metrology
    • G03F7/70616—Monitoring the printed patterns
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B11/00—Measuring arrangements characterised by the use of optical techniques
    • G01B11/02—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness
    • G01B11/024—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness by means of diode-array scanning

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Image Analysis (AREA)
  • Testing Or Measuring Of Semiconductors Or The Like (AREA)
  • Investigating Materials By The Use Of Optical Means Adapted For Particular Applications (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Image Processing (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)

Abstract

L'INVENTION A POUR OBJET UN PROCEDE ET UN DISPOSITIF POUR L'EXAMEN DE MOTIFS TELS QUE CEUX D'UN MASQUE UTILISE POUR LA FABRICATION DES CIRCUITS INTEGRES. UN MOTIF 601 A EXAMINER EST MONTE SUR UN SUPPORT 603 ENTRAINE PAR UN MECANISME 602. LE MOTIF 601 EST AMENE EN DESSOUS D'UN DISPOSITIF 604 (LAMPE 607 ET CAPTEUR D'IMAGE 608) POUR PRODUIRE UN SIGNAL VIDEO 51 EN EXPLORANT LA REGION A. CE SIGNAL VIDEO 51 EST ENVOYE A UN CODEUR BINAIRE 611 POUR PRODUIRE UN SIGNAL BINAIRE 54 RECU DANS UN GROUPE 612 DE REGISTRES A DECALAGE. LES INFORMATIONS CONTENUES DANS LES REGISTRES SONT TRAITES PAR UN CIRCUIT 11 D'EXAMEN DE LA FORME DU MOTIF, UN CIRCUIT 12 D'EXAMEN DE LA POSITION DU MOTIF, ET UN CALCULATEUR 13 CONTENANT NOTAMMENT LES DONNEES DE REFERENCE D'UN MOTIF DE BASE. L'INVENTION S'APPLIQUE NOTAMMENT A LA DETECTION DES DEFAUTS DES MASQUES UTILISES DANS LA FABRICATION DES CIRCUITS INTEGRES.THE SUBJECT OF THE INVENTION IS A METHOD AND A DEVICE FOR EXAMINING PATTERNS SUCH AS THOSE OF A MASK USED FOR THE MANUFACTURE OF INTEGRATED CIRCUITS. A PATTERN 601 TO BE EXAMINED IS MOUNTED ON A BRACKET 603 DRAWN BY A MECHANISM 602. PATTERN 601 IS TAKEN UNDER DEVICE 604 (LAMP 607 AND IMAGE SENSOR 608) TO PRODUCE A VIDEO SIGNAL 51 BY EXPLORING REGION A THIS VIDEO SIGNAL 51 IS SENT TO A BINARY ENCODER 611 TO GENERATE A BINARY SIGNAL 54 RECEIVED IN A GROUP 612 OF OFFSET REGISTERS. THE INFORMATION CONTAINED IN THE REGISTERS ARE PROCESSED BY A CIRCUIT 11 FOR EXAMINING THE FORM OF THE PATTERN, A CIRCUIT 12 FOR EXAMINING THE POSITION OF THE PATTERN, AND A COMPUTER 13 CONTAINING IN PARTICULAR THE REFERENCE DATA OF A BASIC PATTERN. THE INVENTION APPLIES IN PARTICULAR TO THE DETECTION OF DEFECTS OF MASKS USED IN THE MANUFACTURE OF INTEGRATED CIRCUITS.

FR7908076A 1978-10-16 1979-03-30 PROCESS AND DEVICE FOR EXAMINING PATTERNS SUCH AS THOSE MASKS USED IN THE MANUFACTURE OF INTEGRATED CIRCUITS Expired FR2439437B1 (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP53127654A JPS5915381B2 (en) 1978-10-16 1978-10-16 Pattern inspection method

Publications (2)

Publication Number Publication Date
FR2439437A1 true FR2439437A1 (en) 1980-05-16
FR2439437B1 FR2439437B1 (en) 1986-12-26

Family

ID=14965430

Family Applications (1)

Application Number Title Priority Date Filing Date
FR7908076A Expired FR2439437B1 (en) 1978-10-16 1979-03-30 PROCESS AND DEVICE FOR EXAMINING PATTERNS SUCH AS THOSE MASKS USED IN THE MANUFACTURE OF INTEGRATED CIRCUITS

Country Status (7)

Country Link
US (1) US4242662A (en)
JP (1) JPS5915381B2 (en)
CA (1) CA1102001A (en)
DE (1) DE2912894C2 (en)
FR (1) FR2439437B1 (en)
GB (1) GB2035548B (en)
NL (1) NL7902480A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0054596A1 (en) * 1980-12-18 1982-06-30 International Business Machines Corporation Process for inspecting and automatically classifying objects presenting configurations with dimensional tolerances and variable rejecting criteria depending on placement, apparatus and circuits therefor
EP0054710A1 (en) * 1980-12-19 1982-06-30 International Business Machines Corporation Positioning and controlling procedure of a workpiece provided with patterns, for example of a mask for manufacturing semi-conductor elements

Families Citing this family (37)

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JPS56132505A (en) * 1980-03-24 1981-10-16 Hitachi Ltd Position detecting method
JPS5887819A (en) * 1981-11-20 1983-05-25 Hitachi Ltd Mask pattern defect inspection equipment
US4510616A (en) * 1982-01-19 1985-04-09 The Environmental Research Institute Of Michigan Design rule checking using serial neighborhood processors
US4441207A (en) * 1982-01-19 1984-04-03 Environmental Research Institute Of Michigan Design rule checking using serial neighborhood processors
JPS58142487A (en) * 1982-02-18 1983-08-24 Fuji Electric Co Ltd Feature extraction device
GB2129545B (en) * 1982-11-02 1986-07-16 Industry The Secretary Of Stat Parallel digital signal processing
US4549087A (en) * 1982-12-27 1985-10-22 Usm Corporation Lead sensing system
GB2139348B (en) * 1983-03-26 1986-10-01 Disco Abrasive Systems Ltd Automatic aligment system
DE3317331A1 (en) * 1983-05-11 1984-11-15 Siemens AG, 1000 Berlin und 8000 München Method for detecting criteria of characteristics, particularly for production checking of mass-produced articles
JPH0750664B2 (en) * 1983-06-23 1995-05-31 富士通株式会社 Reticle inspection method
GB8320016D0 (en) * 1983-07-25 1983-08-24 Lloyd Doyle Ltd Apparatus for inspecting printed wiring boards
JPS6062122A (en) * 1983-09-16 1985-04-10 Fujitsu Ltd Inspection of mask pattern
GB2152658A (en) * 1984-01-09 1985-08-07 Philips Electronic Associated Object sorting system
US4853967A (en) * 1984-06-29 1989-08-01 International Business Machines Corporation Method for automatic optical inspection analysis of integrated circuits
DE3427981A1 (en) * 1984-07-28 1986-02-06 Telefunken electronic GmbH, 7100 Heilbronn METHOD FOR DETECTING ERRORS ON DEFINED STRUCTURES
US4851678A (en) * 1984-07-31 1989-07-25 Fuji Photo Film Co., Ltd. Method of adjusting radiation image read-out conditions
JP2602201B2 (en) * 1985-04-12 1997-04-23 株式会社日立製作所 Defect inspection method for inspected pattern
US4668982A (en) * 1985-06-17 1987-05-26 The Perkin-Elmer Corporation Misregistration/distortion correction scheme
US4803644A (en) * 1985-09-20 1989-02-07 Hughes Aircraft Company Alignment mark detector for electron beam lithography
US4928313A (en) * 1985-10-25 1990-05-22 Synthetic Vision Systems, Inc. Method and system for automatically visually inspecting an article
JPH0623999B2 (en) * 1986-07-28 1994-03-30 株式会社日立製作所 Pattern defect detection method
US4760607A (en) * 1986-07-31 1988-07-26 Machine Vision International Corporation Apparatus and method for implementing transformations in grayscale image processing
US4949390A (en) * 1987-04-16 1990-08-14 Applied Vision Systems, Inc. Interconnect verification using serial neighborhood processors
US4752897A (en) * 1987-05-01 1988-06-21 Eastman Kodak Co. System for monitoring and analysis of a continuous process
IL92480A0 (en) * 1988-12-01 1990-08-31 Westinghouse Electric Systems Feature comparison
JPH0344473U (en) * 1989-09-05 1991-04-25
US5313532A (en) * 1990-01-23 1994-05-17 Massachusetts Institute Of Technology Recognition of patterns in images
WO1991011783A1 (en) * 1990-01-23 1991-08-08 Massachusetts Institute Of Technology Recognition of patterns in images
WO1991014235A1 (en) * 1990-03-06 1991-09-19 Massachusetts Institute Of Technology Recognition of patterns in images
US5231675A (en) * 1990-08-31 1993-07-27 The Boeing Company Sheet metal inspection system and apparatus
DE4401900C2 (en) * 1994-01-24 1998-07-09 Heidelberger Druckmasch Ag Method for controlling a print image position on a sheet in a sheet printing machine
RU2206918C2 (en) * 2001-06-29 2003-06-20 ЗАО Интеллектуальные технологии РАН Device for adaptive recognition of characters in text documents
US7693336B2 (en) * 2004-06-15 2010-04-06 Fraudhalt Limited Method and apparatus for determining if an optical disk originated from a valid source
KR100961305B1 (en) * 2006-06-08 2010-06-04 가부시키가이샤 시마즈세이사쿠쇼 Imager
US8326018B2 (en) * 2010-05-29 2012-12-04 Mentor Graphics Corporation Fast pattern matching
US20180300872A1 (en) * 2017-04-12 2018-10-18 Ngr Inc. Method And Apparatus For Integrated Circuit Pattern Inspection With Automatically Set Inspection Areas
CN110657744A (en) * 2019-09-29 2020-01-07 深圳市兆威机电股份有限公司 Position detection device, control method, power device and computer readable medium

Citations (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3541511A (en) * 1966-10-31 1970-11-17 Tokyo Shibaura Electric Co Apparatus for recognising a pattern
US3699519A (en) * 1971-04-30 1972-10-17 North American Rockwell Fingerprint analysis device
US3898617A (en) * 1973-02-22 1975-08-05 Hitachi Ltd System for detecting position of pattern
US4021778A (en) * 1975-08-01 1977-05-03 Hitachi, Ltd. Pattern recognition system
US4083035A (en) * 1976-09-10 1978-04-04 Rockwell International Corporation Binary image minutiae detector
US4091394A (en) * 1976-01-26 1978-05-23 Hitachi, Ltd. Pattern position detecting system
DE2700252A1 (en) * 1977-01-05 1978-07-06 Licentia Gmbh Testing of structures on surfaces of electrical modules - has structures scanned and tested for observance of salient factors, e.g. spacing, angles, straightness
US4115761A (en) * 1976-02-13 1978-09-19 Hitachi, Ltd. Method and device for recognizing a specific pattern

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3613080A (en) * 1968-11-08 1971-10-12 Scan Data Corp Character recognition system utilizing feature extraction
JPS5341030B2 (en) * 1973-09-06 1978-10-31
US4107648A (en) * 1976-04-12 1978-08-15 Bell Telephone Laboratories, Incorporated Scan encoding of two dimensional pictorial entities
JPS5371563A (en) * 1976-12-08 1978-06-26 Hitachi Ltd Automatic inspection correcting method for mask
GB1517869A (en) * 1976-12-20 1978-07-12 Ibm Image encoding apparatus
JPS5421129A (en) * 1977-07-18 1979-02-17 Fuji Electric Co Ltd Flaw detection method by square difference system for length of circumference

Patent Citations (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3541511A (en) * 1966-10-31 1970-11-17 Tokyo Shibaura Electric Co Apparatus for recognising a pattern
US3699519A (en) * 1971-04-30 1972-10-17 North American Rockwell Fingerprint analysis device
US3898617A (en) * 1973-02-22 1975-08-05 Hitachi Ltd System for detecting position of pattern
US4021778A (en) * 1975-08-01 1977-05-03 Hitachi, Ltd. Pattern recognition system
US4091394A (en) * 1976-01-26 1978-05-23 Hitachi, Ltd. Pattern position detecting system
US4115761A (en) * 1976-02-13 1978-09-19 Hitachi, Ltd. Method and device for recognizing a specific pattern
US4083035A (en) * 1976-09-10 1978-04-04 Rockwell International Corporation Binary image minutiae detector
DE2700252A1 (en) * 1977-01-05 1978-07-06 Licentia Gmbh Testing of structures on surfaces of electrical modules - has structures scanned and tested for observance of salient factors, e.g. spacing, angles, straightness

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0054596A1 (en) * 1980-12-18 1982-06-30 International Business Machines Corporation Process for inspecting and automatically classifying objects presenting configurations with dimensional tolerances and variable rejecting criteria depending on placement, apparatus and circuits therefor
EP0054710A1 (en) * 1980-12-19 1982-06-30 International Business Machines Corporation Positioning and controlling procedure of a workpiece provided with patterns, for example of a mask for manufacturing semi-conductor elements

Also Published As

Publication number Publication date
GB2035548B (en) 1983-02-16
DE2912894C2 (en) 1986-11-20
FR2439437B1 (en) 1986-12-26
JPS5915381B2 (en) 1984-04-09
CA1102001A (en) 1981-05-26
JPS5553425A (en) 1980-04-18
NL7902480A (en) 1980-04-18
DE2912894A1 (en) 1980-04-17
US4242662A (en) 1980-12-30
GB2035548A (en) 1980-06-18

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Legal Events

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TP Transmission of property
ST Notification of lapse