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FR2371705A1 - Procede de suppression des couches d'un materiau organique formees sur un substrat - Google Patents

Procede de suppression des couches d'un materiau organique formees sur un substrat

Info

Publication number
FR2371705A1
FR2371705A1 FR7731531A FR7731531A FR2371705A1 FR 2371705 A1 FR2371705 A1 FR 2371705A1 FR 7731531 A FR7731531 A FR 7731531A FR 7731531 A FR7731531 A FR 7731531A FR 2371705 A1 FR2371705 A1 FR 2371705A1
Authority
FR
France
Prior art keywords
persulphate
conc
sulphuric acid
polymers
sensitised
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
FR7731531A
Other languages
English (en)
Other versions
FR2371705B1 (fr
Inventor
Leon H Kaplan
Nungavaram S Viswanathan
Steven M Zimmerman
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
International Business Machines Corp
Original Assignee
International Business Machines Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by International Business Machines Corp filed Critical International Business Machines Corp
Publication of FR2371705A1 publication Critical patent/FR2371705A1/fr
Application granted granted Critical
Publication of FR2371705B1 publication Critical patent/FR2371705B1/fr
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/42—Stripping or agents therefor
    • G03F7/422—Stripping or agents therefor using liquids only
    • G03F7/423—Stripping or agents therefor using liquids only containing mineral acids or salts thereof, containing mineral oxidizing substances, e.g. peroxy compounds

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Cleaning Or Drying Semiconductors (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Manufacturing Of Printed Circuit Boards (AREA)

Abstract

Procédé de suppression des couches d'un matériau organique formées sur un substrat. Un matériau organique, tel qu'un matériau photorésistant du type organique polymérisé est éliminé de la surface d'un substrat en traitant les couches par une solution de persulfate dans de l'acide sulfurique concentré. Cette solution est un agent de décapage efficace et qui évite les problèmes de pollution et limite les dangers dûs à la manipulation, trouve à s'appliquer de façon générale dans l'industrie de la fabrication des dispositifs integrés à semi-conducteurs.
FR7731531A 1976-11-19 1977-10-07 Procede de suppression des couches d'un materiau organique formees sur un substrat Granted FR2371705A1 (fr)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US74319076A 1976-11-19 1976-11-19

Publications (2)

Publication Number Publication Date
FR2371705A1 true FR2371705A1 (fr) 1978-06-16
FR2371705B1 FR2371705B1 (fr) 1980-12-19

Family

ID=24987844

Family Applications (1)

Application Number Title Priority Date Filing Date
FR7731531A Granted FR2371705A1 (fr) 1976-11-19 1977-10-07 Procede de suppression des couches d'un materiau organique formees sur un substrat

Country Status (4)

Country Link
US (1) UST973008I4 (fr)
JP (1) JPS5364769A (fr)
DE (1) DE2747669A1 (fr)
FR (1) FR2371705A1 (fr)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2009026324A2 (fr) 2007-08-20 2009-02-26 Advanced Technology Materials, Inc. Composition et procédé pour retirer un photorésist à implantation ionique
EP2288965A4 (fr) * 2008-05-01 2011-08-10 Advanced Tech Materials Mélanges à ph bas pour l élimination de réserve implantée à haute densité

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4678597A (en) 1986-03-17 1987-07-07 Am International, Inc. Chemical cleaning solution and method

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE277834C (fr) *

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE277834C (fr) *

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2009026324A2 (fr) 2007-08-20 2009-02-26 Advanced Technology Materials, Inc. Composition et procédé pour retirer un photorésist à implantation ionique
EP2190967A4 (fr) * 2007-08-20 2010-10-13 Advanced Tech Materials Composition et procédé pour retirer un photorésist à implantation ionique
EP2288965A4 (fr) * 2008-05-01 2011-08-10 Advanced Tech Materials Mélanges à ph bas pour l élimination de réserve implantée à haute densité

Also Published As

Publication number Publication date
JPS5364769A (en) 1978-06-09
UST973008I4 (en) 1978-08-01
FR2371705B1 (fr) 1980-12-19
DE2747669A1 (de) 1978-05-24

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Legal Events

Date Code Title Description
ST Notification of lapse