[go: up one dir, main page]

FI20165598L - Menetelmä silikonituotteen saastuttaman metalliepäpuhtauksia sisältävän konsentraation määrittämiseksi - Google Patents

Menetelmä silikonituotteen saastuttaman metalliepäpuhtauksia sisältävän konsentraation määrittämiseksi Download PDF

Info

Publication number
FI20165598L
FI20165598L FI20165598A FI20165598A FI20165598L FI 20165598 L FI20165598 L FI 20165598L FI 20165598 A FI20165598 A FI 20165598A FI 20165598 A FI20165598 A FI 20165598A FI 20165598 L FI20165598 L FI 20165598L
Authority
FI
Finland
Prior art keywords
concentration
determining
metal impurities
silicone product
silicone
Prior art date
Application number
FI20165598A
Other languages
English (en)
Swedish (sv)
Other versions
FI20165598A7 (fi
Inventor
Douglas Kreszowski
Iii Carl Puehl
Dale Workman
Original Assignee
Hemlock Semiconductor Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hemlock Semiconductor Corp filed Critical Hemlock Semiconductor Corp
Publication of FI20165598A7 publication Critical patent/FI20165598A7/fi
Publication of FI20165598L publication Critical patent/FI20165598L/fi

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C01INORGANIC CHEMISTRY
    • C01BNON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B33/00Silicon; Compounds thereof
    • C01B33/02Silicon
    • C01B33/021Preparation
    • CCHEMISTRY; METALLURGY
    • C01INORGANIC CHEMISTRY
    • C01BNON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B33/00Silicon; Compounds thereof
    • C01B33/02Silicon
    • CCHEMISTRY; METALLURGY
    • C01INORGANIC CHEMISTRY
    • C01BNON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B33/00Silicon; Compounds thereof
    • C01B33/02Silicon
    • C01B33/037Purification
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01NINVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N1/00Sampling; Preparing specimens for investigation
    • G01N1/28Preparing specimens for investigation including physical details of (bio-)chemical methods covered elsewhere, e.g. G01N33/50, C12Q
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01NINVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N1/00Sampling; Preparing specimens for investigation
    • G01N1/28Preparing specimens for investigation including physical details of (bio-)chemical methods covered elsewhere, e.g. G01N33/50, C12Q
    • G01N1/40Concentrating samples
    • G01N1/4044Concentrating samples by chemical techniques; Digestion; Chemical decomposition
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J49/00Particle spectrometers or separator tubes
    • H01J49/02Details

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Inorganic Chemistry (AREA)
  • Analytical Chemistry (AREA)
  • General Health & Medical Sciences (AREA)
  • Pathology (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Biochemistry (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Immunology (AREA)
  • Health & Medical Sciences (AREA)
  • Other Investigation Or Analysis Of Materials By Electrical Means (AREA)
  • Sampling And Sample Adjustment (AREA)
  • Investigating, Analyzing Materials By Fluorescence Or Luminescence (AREA)
  • Investigating Or Analyzing Non-Biological Materials By The Use Of Chemical Means (AREA)
  • Investigating And Analyzing Materials By Characteristic Methods (AREA)
  • Silicon Compounds (AREA)
  • Testing Or Measuring Of Semiconductors Or The Like (AREA)
FI20165598A 2014-01-03 2014-12-31 Menetelmä silikonituotteen saastuttaman metalliepäpuhtauksia sisältävän konsentraation määrittämiseksi FI20165598L (fi)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US201461923328P 2014-01-03 2014-01-03
PCT/US2014/072946 WO2015103366A1 (en) 2014-01-03 2014-12-31 Method for determining a concentration of metal impurities contaminating a silicon product

Publications (2)

Publication Number Publication Date
FI20165598A7 FI20165598A7 (fi) 2016-07-27
FI20165598L true FI20165598L (fi) 2016-07-27

Family

ID=53494010

Family Applications (1)

Application Number Title Priority Date Filing Date
FI20165598A FI20165598L (fi) 2014-01-03 2014-12-31 Menetelmä silikonituotteen saastuttaman metalliepäpuhtauksia sisältävän konsentraation määrittämiseksi

Country Status (9)

Country Link
US (1) US20160320275A1 (fi)
JP (1) JP2017512298A (fi)
KR (1) KR20160106117A (fi)
CN (1) CN105899458A (fi)
CA (1) CA2935320A1 (fi)
DE (1) DE112014006099T5 (fi)
FI (1) FI20165598L (fi)
TW (1) TW201527731A (fi)
WO (1) WO2015103366A1 (fi)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP6199686B2 (ja) * 2013-10-04 2017-09-20 信越化学工業株式会社 レジスト組成物の製造方法
CN105424680A (zh) * 2015-11-20 2016-03-23 沈阳黎明航空发动机(集团)有限责任公司 一种碳化钨钴合金粉末成份的分析方法
US20170269004A1 (en) 2016-03-18 2017-09-21 Hemlock Semiconductor Corporation Low impurity detection method for characterizing metals within a surface and sub-surface of polycrystalline silicon
US12366567B2 (en) * 2020-07-21 2025-07-22 Wacker Chemie Ag Method for determining trace metals in silicon
CN113533489A (zh) * 2021-08-09 2021-10-22 上海富乐德智能科技发展有限公司 一种半导体设备零部件通孔内微污染的测试方法
CN113960155A (zh) * 2021-10-28 2022-01-21 西安奕斯伟材料科技有限公司 用于检测抛光液中的金属杂质的方法

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3331106B2 (ja) * 1995-11-29 2002-10-07 株式会社東芝 半導体薄膜または半導体基板の不純物分析方法
US5851303A (en) * 1996-05-02 1998-12-22 Hemlock Semiconductor Corporation Method for removing metal surface contaminants from silicon
KR20010052580A (ko) * 1998-06-08 2001-06-25 헨넬리 헬렌 에프 웨이퍼 클리닝 용액 내의 금속 불순물의 농도를 감시하기위한 공정
JP2004012315A (ja) * 2002-06-07 2004-01-15 Toshiba Ceramics Co Ltd 炭化ケイ素材または窒化ケイ素材の不純物濃度分布測定方法ならびにセラミックスの不純物濃度分布測定方法
JP3804864B2 (ja) * 2004-05-24 2006-08-02 株式会社Sumco 不純物の分析方法
CN103030149B (zh) * 2012-12-10 2014-09-24 中国科学院过程工程研究所 一种从工业硅中去除杂质的方法

Also Published As

Publication number Publication date
DE112014006099T5 (de) 2016-09-22
KR20160106117A (ko) 2016-09-09
TW201527731A (zh) 2015-07-16
CN105899458A (zh) 2016-08-24
WO2015103366A1 (en) 2015-07-09
JP2017512298A (ja) 2017-05-18
FI20165598A7 (fi) 2016-07-27
US20160320275A1 (en) 2016-11-03
CA2935320A1 (en) 2015-07-09

Similar Documents

Publication Publication Date Title
HUE047958T2 (hu) A PIK3CA mutációs állapotának meghatározási módszere a mintában
IL249981A0 (en) Method
BR112016023105A2 (pt) escalonamento de processos e métodos
BR112016027102A2 (pt) método e aparelho
SG11201701014VA (en) Concentration measuring method
DK3341479T3 (da) LNA-G-Proces
IL246889A0 (en) A method for measuring engagement
GB201410646D0 (en) Methods of increasing sequencing accuracy
IL250589A0 (en) Electrode for electrochlorination processes and method of manufacturing thereof
HUE057118T2 (hu) Folyamat
DK2965736T3 (da) Ståramme
GB201607639D0 (en) Sensing method
FI20165598L (fi) Menetelmä silikonituotteen saastuttaman metalliepäpuhtauksia sisältävän konsentraation määrittämiseksi
LT3181740T (lt) Plaušų pluošto medžiagos apdorojimo būdas
FI20145649A7 (fi) Malminkäsittelylaite ja -menetelmä
EP3333285C0 (en) ELECTROLYTIC DEVICE
EP3233246C0 (en) GAS SEPARATION PROCESS
GB201419113D0 (en) Method for determining diffusion
EP3217965C0 (en) Pharmaceutical processing
FI20140294A7 (fi) Menetelmä fosfonaattien määrittämiseksi
GB2559520B (en) Concentration measurement method
TH1601003285A (th) วิธีการแสดงเชิงปริมาณของสารเจือปนในแลคไทด์
TH1601001435A (th) วิธีการสำหรับการทำกระบวนการของโลหะ
TH1601001263A (th) อิมัลชันและวิธีการผลิตสำหรับสิ่งนั้น
TH1601000834A (th) วิธีสำหรับการหาปริมาณของ 227ac ในองค์ประกอบ 223ra

Legal Events

Date Code Title Description
PC Transfer of assignment of patent

Owner name: HEMLOCK SEMICONDUCTOR OPERATIONS LLC

MM Patent lapsed