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ES8201768A1 - Perfeccionamientos introducidos en las puertas logicas de transistores. - Google Patents

Perfeccionamientos introducidos en las puertas logicas de transistores.

Info

Publication number
ES8201768A1
ES8201768A1 ES491626A ES491626A ES8201768A1 ES 8201768 A1 ES8201768 A1 ES 8201768A1 ES 491626 A ES491626 A ES 491626A ES 491626 A ES491626 A ES 491626A ES 8201768 A1 ES8201768 A1 ES 8201768A1
Authority
ES
Spain
Prior art keywords
region
implantation plane
gate
inverter
transistor
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
ES491626A
Other languages
English (en)
Other versions
ES491626A0 (es
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Gouvernement de la Republique Francaise
Original Assignee
Gouvernement de la Republique Francaise
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Gouvernement de la Republique Francaise filed Critical Gouvernement de la Republique Francaise
Publication of ES491626A0 publication Critical patent/ES491626A0/es
Publication of ES8201768A1 publication Critical patent/ES8201768A1/es
Expired legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10DINORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D62/00Semiconductor bodies, or regions thereof, of devices having potential barriers
    • H10D62/10Shapes, relative sizes or dispositions of the regions of the semiconductor bodies; Shapes of the semiconductor bodies
    • H10D62/13Semiconductor regions connected to electrodes carrying current to be rectified, amplified or switched, e.g. source or drain regions
    • H10D62/149Source or drain regions of field-effect devices
    • H10D62/151Source or drain regions of field-effect devices of IGFETs 
    • HELECTRICITY
    • H03ELECTRONIC CIRCUITRY
    • H03KPULSE TECHNIQUE
    • H03K19/00Logic circuits, i.e. having at least two inputs acting on one output; Inverting circuits
    • H03K19/02Logic circuits, i.e. having at least two inputs acting on one output; Inverting circuits using specified components
    • H03K19/08Logic circuits, i.e. having at least two inputs acting on one output; Inverting circuits using specified components using semiconductor devices
    • H03K19/094Logic circuits, i.e. having at least two inputs acting on one output; Inverting circuits using specified components using semiconductor devices using field-effect transistors
    • H03K19/09403Logic circuits, i.e. having at least two inputs acting on one output; Inverting circuits using specified components using semiconductor devices using field-effect transistors using junction field-effect transistors
    • H03K19/09414Logic circuits, i.e. having at least two inputs acting on one output; Inverting circuits using specified components using semiconductor devices using field-effect transistors using junction field-effect transistors with gate injection or static induction [STIL]
    • HELECTRICITY
    • H03ELECTRONIC CIRCUITRY
    • H03KPULSE TECHNIQUE
    • H03K19/00Logic circuits, i.e. having at least two inputs acting on one output; Inverting circuits
    • H03K19/02Logic circuits, i.e. having at least two inputs acting on one output; Inverting circuits using specified components
    • H03K19/08Logic circuits, i.e. having at least two inputs acting on one output; Inverting circuits using specified components using semiconductor devices
    • H03K19/094Logic circuits, i.e. having at least two inputs acting on one output; Inverting circuits using specified components using semiconductor devices using field-effect transistors
    • H03K19/0944Logic circuits, i.e. having at least two inputs acting on one output; Inverting circuits using specified components using semiconductor devices using field-effect transistors using MOSFET or insulated gate field-effect transistors, i.e. IGFET
    • H03K19/09441Logic circuits, i.e. having at least two inputs acting on one output; Inverting circuits using specified components using semiconductor devices using field-effect transistors using MOSFET or insulated gate field-effect transistors, i.e. IGFET of the same canal type
    • H03K19/09443Logic circuits, i.e. having at least two inputs acting on one output; Inverting circuits using specified components using semiconductor devices using field-effect transistors using MOSFET or insulated gate field-effect transistors, i.e. IGFET of the same canal type using a combination of enhancement and depletion transistors
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10DINORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D84/00Integrated devices formed in or on semiconductor substrates that comprise only semiconducting layers, e.g. on Si wafers or on GaAs-on-Si wafers
    • H10D84/80Integrated devices formed in or on semiconductor substrates that comprise only semiconducting layers, e.g. on Si wafers or on GaAs-on-Si wafers characterised by the integration of at least one component covered by groups H10D12/00 or H10D30/00, e.g. integration of IGFETs
    • H10D84/82Integrated devices formed in or on semiconductor substrates that comprise only semiconducting layers, e.g. on Si wafers or on GaAs-on-Si wafers characterised by the integration of at least one component covered by groups H10D12/00 or H10D30/00, e.g. integration of IGFETs of only field-effect components
    • H10D84/83Integrated devices formed in or on semiconductor substrates that comprise only semiconducting layers, e.g. on Si wafers or on GaAs-on-Si wafers characterised by the integration of at least one component covered by groups H10D12/00 or H10D30/00, e.g. integration of IGFETs of only field-effect components of only insulated-gate FETs [IGFET]
    • H10D84/84Combinations of enhancement-mode IGFETs and depletion-mode IGFETs
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10DINORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D89/00Aspects of integrated devices not covered by groups H10D84/00 - H10D88/00
    • H10D89/211Design considerations for internal polarisation
    • H10D89/213Design considerations for internal polarisation in field-effect devices

Landscapes

  • Engineering & Computer Science (AREA)
  • Power Engineering (AREA)
  • Physics & Mathematics (AREA)
  • Computer Hardware Design (AREA)
  • Computing Systems (AREA)
  • General Engineering & Computer Science (AREA)
  • Mathematical Physics (AREA)
  • Metal-Oxide And Bipolar Metal-Oxide Semiconductor Integrated Circuits (AREA)
  • Bipolar Transistors (AREA)
  • Logic Circuits (AREA)

Abstract

PUERTAS LOGICAS DE TRANSISTORES. LA PUERTA LOGICA COMPRENDE AL MENOS UNA PRIMERA ZONA AISLANTE QUE SEPARA A DOS ZONAS DE SALIDAS CONTIGUAS Y QUE EXTIENDEN DESDE EL PRIMER NIVEL DE IMPLANTACION HASTA AL MENOS MAS ALLA DEL SEGUNDO NIVEL DE IMPLANTACION. DICHA PUERTA LOGICA COMPRENDE UNA ZONA RESISTIVA QUE CONSTITUYE EL ELEMENTO DE CARGA Y QUE ESTA IMPLANTADA POR ENCIMA DEL PRIMER NIVEL CON INTERPOSICION DE LA SEGUNDA ZONA AISLANTE; LA ZONA RESISTORA ES DE SILICIO POLICRISTALINO. CUANDO LA PUERTA NO COMPRENDE LA ZONA RESISTIVA, EL ELEMENTO DE CARGA ES UN TRANSISTOR DE ESCTRUCTURA INTEGRADA MOS MONOCANAL QUE TIENE AL MENOS LA ZONA DE CONTACTO DE SU ENTRADA CONSTITUIDA POR UNA PARTE EXTREMA DE LA ZONA DE ELCTRODO DE MANDO DEL TRANSISTOR INVERSOR.
ES491626A 1979-05-21 1980-05-20 Perfeccionamientos introducidos en las puertas logicas de transistores. Expired ES8201768A1 (es)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
FR7912910A FR2457605A2 (fr) 1979-05-21 1979-05-21 Perfectionnements aux portes logiques a transistors mos multidrains

Publications (2)

Publication Number Publication Date
ES491626A0 ES491626A0 (es) 1981-11-16
ES8201768A1 true ES8201768A1 (es) 1981-11-16

Family

ID=9225698

Family Applications (1)

Application Number Title Priority Date Filing Date
ES491626A Expired ES8201768A1 (es) 1979-05-21 1980-05-20 Perfeccionamientos introducidos en las puertas logicas de transistores.

Country Status (6)

Country Link
EP (1) EP0019560B1 (es)
JP (1) JPS55156359A (es)
CA (1) CA1142269A (es)
DE (1) DE3060914D1 (es)
ES (1) ES8201768A1 (es)
FR (1) FR2457605A2 (es)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
NL8401117A (nl) * 1984-04-09 1985-11-01 Philips Nv Halfgeleiderinrichting met veldeffekttransistors met geisoleerde poortelektrode.
US4684967A (en) * 1984-05-04 1987-08-04 Integrated Logic Systems, Inc. Low capacitance transistor cell element and transistor array
US4680484A (en) * 1984-10-19 1987-07-14 Trw Inc. Wired-AND FET logic gate
EP1191601B1 (en) * 2000-09-21 2007-11-28 STMicroelectronics S.r.l. A lateral DMOS transistor

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5268382A (en) * 1975-12-05 1977-06-07 Hitachi Ltd Semiconductor circuit unit
JPS608628B2 (ja) * 1976-07-05 1985-03-04 ヤマハ株式会社 半導体集積回路装置

Also Published As

Publication number Publication date
ES491626A0 (es) 1981-11-16
EP0019560A1 (fr) 1980-11-26
FR2457605B2 (es) 1982-11-19
JPS55156359A (en) 1980-12-05
DE3060914D1 (en) 1982-11-11
CA1142269A (en) 1983-03-01
EP0019560B1 (fr) 1982-10-06
FR2457605A2 (fr) 1980-12-19

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Legal Events

Date Code Title Description
FD1A Patent lapsed

Effective date: 20000601