ES2368079A1 - Method and apparatus for the fast manufacture of functional glass and ceramic pieces. (Machine-translation by Google Translate, not legally binding) - Google Patents
Method and apparatus for the fast manufacture of functional glass and ceramic pieces. (Machine-translation by Google Translate, not legally binding) Download PDFInfo
- Publication number
- ES2368079A1 ES2368079A1 ES200902063A ES200902063A ES2368079A1 ES 2368079 A1 ES2368079 A1 ES 2368079A1 ES 200902063 A ES200902063 A ES 200902063A ES 200902063 A ES200902063 A ES 200902063A ES 2368079 A1 ES2368079 A1 ES 2368079A1
- Authority
- ES
- Spain
- Prior art keywords
- laser beam
- main
- primary
- component
- wavelength
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000000919 ceramic Substances 0.000 title claims abstract description 21
- 238000000034 method Methods 0.000 title claims abstract description 20
- 238000004519 manufacturing process Methods 0.000 title abstract description 9
- 239000011521 glass Substances 0.000 title abstract description 3
- 239000000463 material Substances 0.000 claims abstract description 34
- 230000003287 optical effect Effects 0.000 claims abstract description 31
- 239000002243 precursor Substances 0.000 claims abstract description 29
- 230000003993 interaction Effects 0.000 claims abstract description 12
- 239000000758 substrate Substances 0.000 claims abstract description 11
- 238000010521 absorption reaction Methods 0.000 claims description 16
- 239000000203 mixture Substances 0.000 claims description 9
- 239000000843 powder Substances 0.000 claims description 7
- 239000005313 bioactive glass Substances 0.000 claims description 6
- 230000005855 radiation Effects 0.000 claims description 6
- 238000001816 cooling Methods 0.000 claims description 5
- 238000002347 injection Methods 0.000 claims description 5
- 239000007924 injection Substances 0.000 claims description 5
- 238000004814 ceramic processing Methods 0.000 claims description 4
- 229910052588 hydroxylapatite Inorganic materials 0.000 claims description 4
- XYJRXVWERLGGKC-UHFFFAOYSA-D pentacalcium;hydroxide;triphosphate Chemical group [OH-].[Ca+2].[Ca+2].[Ca+2].[Ca+2].[Ca+2].[O-]P([O-])([O-])=O.[O-]P([O-])([O-])=O.[O-]P([O-])([O-])=O XYJRXVWERLGGKC-UHFFFAOYSA-D 0.000 claims description 4
- 238000010438 heat treatment Methods 0.000 claims description 3
- 239000000835 fiber Substances 0.000 claims description 2
- 230000003068 static effect Effects 0.000 claims description 2
- 229910004298 SiO 2 Inorganic materials 0.000 claims 1
- 229910052769 Ytterbium Inorganic materials 0.000 claims 1
- 238000002329 infrared spectrum Methods 0.000 claims 1
- 230000008685 targeting Effects 0.000 claims 1
- NAWDYIZEMPQZHO-UHFFFAOYSA-N ytterbium Chemical compound [Yb] NAWDYIZEMPQZHO-UHFFFAOYSA-N 0.000 claims 1
- 239000002245 particle Substances 0.000 abstract description 7
- 238000007747 plating Methods 0.000 abstract description 4
- 239000000428 dust Substances 0.000 abstract description 3
- 230000008569 process Effects 0.000 abstract description 2
- 230000005514 two-phase flow Effects 0.000 abstract 1
- 229910010293 ceramic material Inorganic materials 0.000 description 4
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 3
- 238000009826 distribution Methods 0.000 description 3
- HCHKCACWOHOZIP-UHFFFAOYSA-N Zinc Chemical compound [Zn] HCHKCACWOHOZIP-UHFFFAOYSA-N 0.000 description 2
- 230000008901 benefit Effects 0.000 description 2
- 239000011230 binding agent Substances 0.000 description 2
- 230000002051 biphasic effect Effects 0.000 description 2
- 239000011248 coating agent Substances 0.000 description 2
- 238000000576 coating method Methods 0.000 description 2
- 238000006073 displacement reaction Methods 0.000 description 2
- 230000005670 electromagnetic radiation Effects 0.000 description 2
- 238000001125 extrusion Methods 0.000 description 2
- 239000012212 insulator Substances 0.000 description 2
- 238000003754 machining Methods 0.000 description 2
- 229910052751 metal Inorganic materials 0.000 description 2
- 239000002184 metal Substances 0.000 description 2
- 238000000465 moulding Methods 0.000 description 2
- 238000005245 sintering Methods 0.000 description 2
- 229910052725 zinc Inorganic materials 0.000 description 2
- 239000011701 zinc Substances 0.000 description 2
- PFNQVRZLDWYSCW-UHFFFAOYSA-N (fluoren-9-ylideneamino) n-naphthalen-1-ylcarbamate Chemical compound C12=CC=CC=C2C2=CC=CC=C2C1=NOC(=O)NC1=CC=CC2=CC=CC=C12 PFNQVRZLDWYSCW-UHFFFAOYSA-N 0.000 description 1
- OYPRJOBELJOOCE-UHFFFAOYSA-N Calcium Chemical compound [Ca] OYPRJOBELJOOCE-UHFFFAOYSA-N 0.000 description 1
- DGAQECJNVWCQMB-PUAWFVPOSA-M Ilexoside XXIX Chemical compound C[C@@H]1CC[C@@]2(CC[C@@]3(C(=CC[C@H]4[C@]3(CC[C@@H]5[C@@]4(CC[C@@H](C5(C)C)OS(=O)(=O)[O-])C)C)[C@@H]2[C@]1(C)O)C)C(=O)O[C@H]6[C@@H]([C@H]([C@@H]([C@H](O6)CO)O)O)O.[Na+] DGAQECJNVWCQMB-PUAWFVPOSA-M 0.000 description 1
- FYYHWMGAXLPEAU-UHFFFAOYSA-N Magnesium Chemical compound [Mg] FYYHWMGAXLPEAU-UHFFFAOYSA-N 0.000 description 1
- OAICVXFJPJFONN-UHFFFAOYSA-N Phosphorus Chemical compound [P] OAICVXFJPJFONN-UHFFFAOYSA-N 0.000 description 1
- ZLMJMSJWJFRBEC-UHFFFAOYSA-N Potassium Chemical compound [K] ZLMJMSJWJFRBEC-UHFFFAOYSA-N 0.000 description 1
- 229910001069 Ti alloy Inorganic materials 0.000 description 1
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 1
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 1
- 239000006117 anti-reflective coating Substances 0.000 description 1
- 239000011575 calcium Substances 0.000 description 1
- 229910052791 calcium Inorganic materials 0.000 description 1
- 238000005266 casting Methods 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- 238000005056 compaction Methods 0.000 description 1
- 230000000295 complement effect Effects 0.000 description 1
- 238000011109 contamination Methods 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 239000002241 glass-ceramic Substances 0.000 description 1
- 239000000411 inducer Substances 0.000 description 1
- 230000006698 induction Effects 0.000 description 1
- 239000011777 magnesium Substances 0.000 description 1
- 229910052749 magnesium Inorganic materials 0.000 description 1
- 238000003913 materials processing Methods 0.000 description 1
- 239000000155 melt Substances 0.000 description 1
- 239000012768 molten material Substances 0.000 description 1
- 239000011574 phosphorus Substances 0.000 description 1
- 229910052698 phosphorus Inorganic materials 0.000 description 1
- 239000004014 plasticizer Substances 0.000 description 1
- 239000011591 potassium Substances 0.000 description 1
- 229910052700 potassium Inorganic materials 0.000 description 1
- 230000009257 reactivity Effects 0.000 description 1
- 238000002310 reflectometry Methods 0.000 description 1
- 150000003346 selenoethers Chemical class 0.000 description 1
- HBMJWWWQQXIZIP-UHFFFAOYSA-N silicon carbide Chemical compound [Si+]#[C-] HBMJWWWQQXIZIP-UHFFFAOYSA-N 0.000 description 1
- 229910010271 silicon carbide Inorganic materials 0.000 description 1
- 239000011734 sodium Substances 0.000 description 1
- 229910052708 sodium Inorganic materials 0.000 description 1
- 238000007711 solidification Methods 0.000 description 1
- 230000008023 solidification Effects 0.000 description 1
- 238000001228 spectrum Methods 0.000 description 1
- 229910052712 strontium Inorganic materials 0.000 description 1
- CIOAGBVUUVVLOB-UHFFFAOYSA-N strontium atom Chemical compound [Sr] CIOAGBVUUVVLOB-UHFFFAOYSA-N 0.000 description 1
- 238000010345 tape casting Methods 0.000 description 1
- 239000010936 titanium Substances 0.000 description 1
- 229910052719 titanium Inorganic materials 0.000 description 1
- 230000009466 transformation Effects 0.000 description 1
- 238000000844 transformation Methods 0.000 description 1
- 238000002834 transmittance Methods 0.000 description 1
- NWONKYPBYAMBJT-UHFFFAOYSA-L zinc sulfate Chemical compound [Zn+2].[O-]S([O-])(=O)=O NWONKYPBYAMBJT-UHFFFAOYSA-L 0.000 description 1
- 229960001763 zinc sulfate Drugs 0.000 description 1
- 229910000368 zinc sulfate Inorganic materials 0.000 description 1
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K26/00—Working by laser beam, e.g. welding, cutting or boring
- B23K26/08—Devices involving relative movement between laser beam and workpiece
-
- C—CHEMISTRY; METALLURGY
- C04—CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
- C04B—LIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
- C04B35/00—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products
- C04B35/622—Forming processes; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products
- C04B35/653—Processes involving a melting step
- C04B35/657—Processes involving a melting step for manufacturing refractories
Landscapes
- Engineering & Computer Science (AREA)
- Chemical & Material Sciences (AREA)
- Manufacturing & Machinery (AREA)
- Physics & Mathematics (AREA)
- Ceramic Engineering (AREA)
- Optics & Photonics (AREA)
- Inorganic Chemistry (AREA)
- Organic Chemistry (AREA)
- Structural Engineering (AREA)
- Materials Engineering (AREA)
- Plasma & Fusion (AREA)
- Mechanical Engineering (AREA)
- Laser Beam Processing (AREA)
Abstract
Description
Método y aparato para la fabricación rápida de piezas funcionales de vidrios y cerámicas.Method and apparatus for rapid manufacturing of functional pieces of glass and ceramics.
La presente invención se enmarca en el procesamiento de materiales cerámicos. Mediante el objeto de la presente invención es posible obtener piezas cerámicas de composición gradual y geometría compleja mediante la aplicación de radiación láser.The present invention is framed in the ceramic materials processing. Through the object of the present invention it is possible to obtain ceramic pieces of gradual composition and complex geometry by applying laser radiation
Los procesos habituales de fabricación de piezas cerámicas como colada en molde, moldeo por presión, moldeo por inyección, extrusión, colado en cinta, mecanizado en verde o sinterizado, normalmente requieren de la adición de aglutinantes o plastificantes de composición diferente a la del material cerámico, lo cual conlleva riesgo de contaminación de la pieza final. Las geometrías de las piezas obtenidas son limitadas para algunas de las técnicas, como en el caso de la extrusión o el mecanizado en verde, y en la mayoría de las técnicas es requerida la fabricación de un molde, lo cual incrementa el tiempo de fabricación y difícilmente resulta rentable para la producción de lotes de una o pocas piezas. Las técnicas que comprenden la compactación del material cerámico en polvo conllevan un paso final de sinterización en hornos, en el cual la pieza se somete a una temperatura homogénea en todo su volumen. Los elementos aislantes de los hornos están sometidos a la misma temperatura que la pieza cerámica procesada, lo cual limita las velocidades de calentamiento que es posible emplear.The usual parts manufacturing processes ceramics such as mold casting, pressure molding, molding injection, extrusion, tape casting, green machining or sintered, usually require the addition of binders or plasticizers of a different composition than ceramic material, which entails risk of contamination of the final piece. The geometries of the pieces obtained are limited for some of the techniques, as in the case of extrusion or green machining, and in most of the techniques the manufacture of a mold, which increases manufacturing time and hardly It is profitable for the production of lots of one or few pieces. The techniques that comprise the compaction of the ceramic material in dust entails a final sintering step in ovens, in which The piece is subjected to a homogeneous temperature throughout its volume. The insulating elements of the furnaces are subject to it temperature than the processed ceramic piece, which limits the heating rates that can be used.
La técnica del prototipado rápido basado en plaqueado láser es una técnica muy extendida para la generación de prototipos metálicos. El proceso consiste en la inyección de partículas de material precursor sobre un sustrato mediante un chorro de gas de arrastre. Un haz láser de alta potencia incide en la zona de inyección de material precursor creando una piscina de material fundido. El sustrato presenta un movimiento relativo respecto al chorro de material precursor y el haz láser, de manera que se forma una pista de material depositado. Superponiendo varias pistas de material depositado se obtiene la pieza deseada. La aplicación convencional de la técnica a la fabricación de piezas cerámicas se encuentra recogida en publicaciones y patentes previas (KM Jasim et al., Journal of Materials Science 28, 1993; NI Shieh, Journal of Materials Science 29, 1994; WO0240744; US5038014). Esta técnica aplicada de forma convencional presenta inconvenientes para el procesamiento de cerámicas, como elevados gradientes espaciales de temperatura y elevadas velocidades de enfriamiento que pueden provocar la fractura de la pieza procesada. Sin embargo, el procesamiento mediante radiación láser con la técnica de prototipado rápido basado en plaqueado láser presenta características con potencial para obtener piezas cerámicas con una microestructura diferenciada de las cerámicas procesadas con métodos convencionales.The rapid prototyping technique based on laser plating is a widespread technique for the generation of metal prototypes. The process involves the injection of particles of precursor material onto a substrate by means of a jet of entrainment gas. A high power laser beam strikes the injection zone of precursor material creating a pool of molten material. The substrate has a relative movement with respect to the jet of precursor material and the laser beam, so that a track of deposited material is formed. By superimposing several tracks of deposited material, the desired piece is obtained. The conventional application of the technique to the manufacture of ceramic pieces is found in previous publications and patents ( KM Jasim et al., Journal of Materials Science 28, 1993; NI Shieh, Journal of Materials Science 29, 1994; WO0240744; US5038014 ) . This technique applied in a conventional way presents inconveniences for the processing of ceramics, such as high spatial temperature gradients and high cooling rates that can cause the fracture of the processed part. However, laser radiation processing with the rapid prototyping technique based on laser plating has characteristics with potential to obtain ceramic pieces with a differentiated microstructure of ceramics processed with conventional methods.
La presente invención aplica la radiación láser para producir piezas de material cerámico y vitrocerámico bifásico o multifásico. El método está basado en los mismos principios físicos del plaqueado láser, pero incorpora una serie de diferencias esenciales que influyen en las transformaciones físico-químicas experimentadas por el material y permiten la obtención de piezas con mejores propiedades para su aplicación final.The present invention applies laser radiation to produce pieces of biphasic ceramic and ceramic hob or multiphase. The method is based on the same physical principles of laser plating, but incorporates a series of differences essentials that influence transformations physicochemical experienced by the material and allow obtaining parts with better properties for final application
Una de las ventajas del objeto de la presente patente es la inducción controlada de las reacciones en la interfaz de las diferentes fases presentes en el material precursor mediante la utilización de dos haces láser de diferente longitud de onda, presentando una de estas longitudes de onda una absorción notablemente diferenciada en función de la fase irradiada. Asimismo, es posible la producción de piezas de cerámicas bifásicas con una distribución variable de una de las fases, sin que la distribución modifique el grado de reactividad y la estructura obtenida en la interfase.One of the advantages of the object of this patent is the controlled induction of reactions at the interface of the different phases present in the precursor material by the use of two laser beams of different wavelengths, presenting one of these wavelengths an absorption remarkably differentiated according to the irradiated phase. Likewise, It is possible to produce two-phase ceramic pieces with a variable distribution of one of the phases, without the distribution modify the degree of reactivity and the structure obtained in the interface.
Otra ventaja de la invención es la producción de piezas cerámicas y vitrocerámicas de formas tridimensionales complejas directamente a partir del polvo precursor, sin necesidad de fabricar moldes o negativos de la geometría deseada.Another advantage of the invention is the production of ceramic and glass ceramic pieces of three-dimensional shapes complex directly from the precursor powder, no need of making molds or negatives of the desired geometry.
El producto obtenido después del procesamiento es totalmente puro, ya que no se necesita la adición de productos secundarios como aglutinantes o inductores de sinterización. El enfriamiento de la pieza durante y después de la irradiación con láser es controlado mediante el confinamiento en un entorno aislante, de manera que se evita la aparición y crecimiento de grietas propio de elevadas velocidades de enfriamiento.The product obtained after processing It is totally pure, since the addition of products is not needed secondary as binders or sintering inducers. He cooling of the piece during and after irradiation with laser is controlled by confinement in an environment insulator, so that the appearance and growth of Cracks own high cooling speeds.
Para complementar la descripción que, se está realizando y con objeto de ayudar a una mejor comprensión de las características de la invención, de acuerdo con un ejemplo de realización práctica de la misma, se acompaña como parte integrante de dicha descripción, una única figura en donde, con carácter ilustrativo y no limitativo, se ha representado esquemáticamente y en alzado, un modelo de realización preferente de la invención.To complement the description that, you are performing and in order to help a better understanding of the characteristics of the invention, according to an example of practical realization of it, is accompanied as an integral part of that description, a single figure where, with character illustrative and not limiting, it has been schematically represented and in elevation, a preferred embodiment of the invention.
El método de procesamiento de cerámicas bifásicas objeto de la presente invención, se lleva a cabo con un sistema adecuado representado en la Figura 1. Una fuente de haz láser, denominada fuente de haz láser principal (1), emite un haz láser principal (2) de una determinada longitud de onda y con una potencia ajustable. La longitud de onda del haz láser principal, denominada longitud de onda principal, debe presentar una absorción similar para todos los componentes o fases que forman parte del material procesado. Un expansor de haz principal (5) modifica el diámetro y la divergencia del haz láser principal. Por lo tanto, dicho expansor de haz principal (5) debe presentar una relación de expansión ajustable y ajuste de colimación. Un elemento óptico plano paralelo (7) transmite el haz láser principal, produciendo un desplazamiento lateral de dicho haz láser principal, pero sin modificar la dirección del mismo. Simultáneamente, una fuente de haz láser secundaria (3) emite un haz láser secundario (4), dicho haz láser secundario presenta una potencia ajustable. La longitud de onda del haz láser secundario, denominada longitud de onda secundaria, presenta una absorción notablemente diferente en función de la fase o componente del material procesado. Un expansor de haz secundario (6) modifica el diámetro y la divergencia del haz láser secundario. Por lo tanto, dicho expansor de haz secundario (6) debe presentar una relación de expansión ajustable y ajuste de colimación. El haz láser secundario (4) es reflejado mediante un espejo (9) y dicho haz láser secundario es también reflejado por el elemento óptico plañó paralelo (7). Tanto el haz láser principal (2) como el haz láser secundario (4) inciden paralelamente entre sí sobre una lente de focalización (8), de manera que los dos haces láser son focalizados sobre el mismo eje óptico. El ajuste de colimación efectuado por el expansor de haz principal (5) y el expansor de haz secundario (6) permite focalizar el haz láser principal y el haz láser secundario sobre el mismo punto. En dicho punto se emplaza la zona de interacción (12) entre el haz láser principal (2), el haz láser secundario (4), el chorro de material precursor inyectado (22) y la pieza procesada (13).The ceramic processing method biphasic object of the present invention, is carried out with a suitable system depicted in Figure 1. A beam source laser, called the main laser beam source (1), emits a beam main laser (2) of a certain wavelength and with a adjustable power The wavelength of the main laser beam, called main wavelength, it must have an absorption similar for all components or phases that are part of the processed material. A main beam expander (5) modifies the diameter and divergence of the main laser beam. Thus, said main beam expander (5) must have a ratio of Adjustable expansion and collimation adjustment. A flat optical element parallel (7) transmits the main laser beam, producing a lateral displacement of said main laser beam, but without Modify the address of the same. Simultaneously, a beam source secondary laser (3) emits a secondary laser beam (4), said beam Secondary laser has an adjustable power. The length of secondary laser beam wave, called wavelength secondary, it has a noticeably different absorption depending on of the phase or component of the processed material. A beam expander secondary (6) modify the diameter and divergence of the laser beam secondary. Therefore, said secondary beam expander (6) must present an adjustable expansion ratio and adjustment of collimation The secondary laser beam (4) is reflected by a mirror (9) and said secondary laser beam is also reflected by the Optical element planted parallel (7). Both the main laser beam (2) as the secondary laser beam (4) parallel to each other on a focusing lens (8), so that the two do Lasers are focused on the same optical axis. The setting of collimation performed by the main beam expander (5) and the secondary beam expander (6) allows focusing the laser beam main and secondary laser beam on the same point. In said point the interaction zone (12) between the laser beam is located main (2), secondary laser beam (4), material jet injected precursor (22) and the processed part (13).
El material que se va a procesar, denominado material precursor, está compuesto por dos o más fases o componentes diferenciados, dichas fases o componentes se encuentran inicialmente separados. El depósito primario (15) contiene uno o más componentes, dichos componentes presentan una absorción baja cuando son irradiados por el haz láser secundario (4) y su conjunto se denomina componente primario. El citado valor de la absorción puede deberse bien a una alta reflectividad o bien a una alta transmitancia frente a la longitud de onda del haz láser secundario. La electroválvula de paso primaria (16) permite seleccionar el caudal másico que se desplaza desde el depósito primario (15) al depósito general (20). El depósito secundario (17) contiene las fases o componentes del material a procesar que presentan una absorción elevada para la longitud de onda del haz láser secundario (4) y su conjunto se denomina componente secundario. La electroválvula de paso secundaria (18) permite seleccionar el caudal másico que se desplaza desde el depósito secundario (17) al depósito general (20). En dicho depósito general, el componente primario y el componente secundario del material a procesar se mezclan homogéneamente mediante una hélice y posteriormente se inyectan mediante un inyector de polvo precursor (21) hacia la zona de interacción (12). El chorro de material precursor inyectado (22) alcanza la zona de interacción (12), donde interacciona con el haz láser principal (2) y el haz láser secundario (4). El material precursor se funde total o parcialmente, o bien es sinterizado, dando lugar a la pieza procesada (13) cuando se produce la solidificación del material precursor procesado sobre el sustrato (14).The material to be processed, called precursor material, is composed of two or more phases or components differentiated, said phases or components are initially found separated. The primary tank (15) contains one or more components, these components have a low absorption when they are irradiated by the secondary laser beam (4) and its whole is called primary component The cited absorption value may be due to either at high reflectivity or at high transmittance against to the wavelength of the secondary laser beam. Solenoid valve primary step (16) allows to select the mass flow rate moves from the primary deposit (15) to the general deposit (20). The secondary tank (17) contains the phases or components of the material to be processed that have a high absorption for wavelength of the secondary laser beam (4) and its set is called secondary component. The secondary solenoid valve (18) allows you to select the mass flow that travels from the secondary deposit (17) to the general deposit (20). In said deposit general, the primary component and the secondary component of the material to be processed are mixed homogeneously by means of a propeller and subsequently injected by a precursor powder injector (21) towards the interaction zone (12). The material jet injected precursor (22) reaches the interaction zone (12), where interacts with the main laser beam (2) and the laser beam secondary (4). The precursor material melts totally or partially, or it is sintered, giving rise to the processed part (13) when solidification of the precursor material processed on the substrate (14).
La radiación electromagnética desprendida de la zona de interacción (12), correspondiente a bandas del espectro visible e infrarrojo, excepto las bandas correspondientes al haz láser principal (2) y al haz láser secundario (4), es colimada por la lente de focalización (8), reflejada total o parcialmente por el elemento óptico plano paralelo (7) y trasmitida total o parcialmente a través del espejo (9). Dicha radiación electromagnética incide sobre un elemento sensor óptico de temperatura (11), que puede ser un sensor de tipo pirómetro o una cámara CMOS o CCD con su correspondiente óptica. El elemento sensor óptico de temperatura (11) envía una señal eléctrica a un sistema de control electrónico (19). Dicho sistema de control electrónico (19) gobierna la electroválvula de paso primaria (16) y la electroválvula de paso secundaria (18), de forma que controla, en cada instante, tanto el caudal másico que fluye del depósito primario (15) al depósito general (20), como el caudal que fluye del depósito secundario (17) al depósito principal (20). Dicho sistema de control electrónico (19) gobierna, asimismo, la potencia óptica del haz láser principal (2) emitido por la fuente de haz láser principal (1), de forma que dicha potencia óptica del haz láser principal (2) es proporcional al flujo másico del componente primario que atraviesa la electroválvula de paso primaria (16), pudiéndose seleccionar el valor del factor de proporcionalidad dentro de un rango. Asimismo, la potencia óptica del haz láser principal (2) es inversamente proporcional al valor de absorción del componente primario contenido en el depósito primario (15) para la longitud de onda del haz láser principal (2). Dicho sistema de control electrónico (19) gobierna, asimismo, la potencia óptica del haz láser secundario (4) emitido por la fuente de haz láser secundario (3), de forma que dicha potencia óptica del haz láser secundario (4) es proporcional al flujo másico que atraviesa la electroválvula de paso secundaria (18), pudiéndose seleccionar el valor del factor de proporcionalidad dentro de un rango. Asimismo, la potencia óptica del haz láser secundario (4) es inversamente proporcional al valor de absorción del componente secundario contenido en el depósito secundario (17) para la longitud de onda del haz láser secundario (4). Asimismo, la potencia óptica del haz láser secundario (4) es inversamente proporcional al valor de absorción del componente secundario contenido en el depósito secundario (17) para la longitud de onda del haz láser principal (2). Asimismo, la potencia óptica del haz láser secundario (4) es inversamente proporcional al valor de de la potencia óptica del haz láser principal (2).The electromagnetic radiation released from the interaction zone (12), corresponding to spectrum bands visible and infrared, except the bands corresponding to the beam main laser (2) and the secondary laser beam (4), is collimated by the focusing lens (8), totally or partially reflected by the parallel flat optical element (7) and transmitted totally or partially through the mirror (9). Said electromagnetic radiation affects on an optical temperature sensor element (11), which can be a pyrometer sensor or a CMOS or CCD camera with its corresponding optics. The optical temperature sensor element (11) sends an electrical signal to an electronic control system (19). Said electronic control system (19) governs the primary solenoid valve (16) and the solenoid valve secondary (18), so that it controls, at every moment, both the mass flow that flows from the primary tank (15) to the tank general (20), such as the flow that flows from the secondary tank (17) to the main deposit (20). Said electronic control system (19) also governs the optical power of the main laser beam (2) emitted by the main laser beam source (1), so that said optical power of the main laser beam (2) is proportional to the mass flow of the primary component that crosses the solenoid valve of primary passage (16), being able to select the value of the factor of proportionality within a range. Also, the optical power of the main laser beam (2) is inversely proportional to the value of absorption of the primary component contained in the primary reservoir (15) for the wavelength of the main laser beam (2). Saying electronic control system (19) also governs the power secondary laser beam optics (4) emitted by the beam source secondary laser (3), so that said optical beam power secondary laser (4) is proportional to the mass flow through the secondary solenoid valve (18), being able to select the value of the proportionality factor within a range. Likewise, The optical power of the secondary laser beam (4) is inversely proportional to the absorption value of the secondary component content in the secondary reservoir (17) for the wavelength of the secondary laser beam (4). Also, the optical power of the beam secondary laser (4) is inversely proportional to the value of absorption of the secondary component contained in the reservoir secondary (17) for the wavelength of the main laser beam (2). Also, the optical power of the secondary laser beam (4) is inversely proportional to the value of the optical power of the beam main laser (2).
El sustrato (14), que soporta la pieza procesada (13), se sitúa encima de una plataforma aislante (28). Dichos tres elementos, pieza procesada (13), sustrato (14) y plataforma aislante (28), se mueven solidariamente en un plano normal al plano del dibujo que contiene la dirección indicada por la flecha horizontal (29). Dicho movimiento es producido por una estación de control numérico computerizado o calefactor (25) alojado en la cubierta aislante móvil (23). De esta manera, se mantiene una temperatura en la zona de procesamiento adecuada al material procesado, un gradiente de temperatura entre la zona de interacción (12) y la pieza procesada (13) reducido y una velocidad de enfriamiento controlada; siendo los valores de los anteriores parámetros adecuados para la obtención de la microestructura deseada en la pieza procesada (13).The substrate (14), which supports the processed part (13), is placed on top of an insulating platform (28). Say three elements, processed part (13), substrate (14) and insulating platform (28), move in solidarity in a plane normal to the plane of the drawing containing the direction indicated by the horizontal arrow (29). Said movement is produced by a control station computerized numerical or heater (25) housed in the cover mobile insulator (23). In this way, a temperature is maintained at the appropriate processing area for the processed material, a temperature gradient between the interaction zone (12) and the processed part (13) reduced and cooling rate controlled; the values of the previous parameters being suitable for obtaining the desired microstructure in the processed piece (13).
Un ejemplo práctico de aplicación de la invención es el procesamiento de material cerámico consistente en una mezcla cuyos componentes son vidrio bioactivo e hidroxiapatita. El vidrio bioactivo es un vidrio de sílice como formador de red y puede contener otros elementos como calcio, sodio, potasio, fósforo, magnesio, estroncio, zinc o titanio. El vidrio bioactivo se corresponde con el componente primario y se deposita en el depósito primario (15) en forma de polvo, con tamaño de partícula comprendido entre 50 y 150 \mum. La hidroxiapatita se corresponde con el componente secundario y se presenta en forma de polvo, con tamaño de partícula comprendido entre 50 y 150 \mum, se encuentra en el depósito secundario (17). Ambos materiales se mezclan controladamente por las electroválvulas de paso primaria (16) y secundaria (18), dando lugar a una mezcla de proporciones conocidas y definidas. Esta proporción es variable en el tiempo y se encuentra en el rango 1:9 a 9:1 de hidroxiapatita:vidrio bioactivo. Este material precursor en forma de mezcla, es homogeneizado en términos de distribución de componentes mediante una hélice dentro del depósito general (20) y alimentado mediante una bomba de desplazamiento positivo de tornillo helicoidal hacia el inyector de polvo precursor (21). El inyector de polvo precursor es una boquilla metálica con forma cónica, con su eje formando un ángulo comprendido entre 15º y 35º respecto al eje del haz láser principal (2) en la zona de procesamiento. No se utiliza gas alguno durante la inyección del polvo precursor, con excepción del aire presente en el entorno de procesamiento.A practical example of application of the invention is the processing of ceramic material consisting of a mixture whose components are bioactive glass and hydroxyapatite. Bioactive glass is a silica glass as a network former and It may contain other elements such as calcium, sodium, potassium, phosphorus, magnesium, strontium, zinc or titanium. The bioactive glass is corresponds to the primary component and is deposited in the deposit primary (15) in powder form, with particle size comprised between 50 and 150 µm. Hydroxyapatite corresponds to the secondary component and comes in powder form, with size of particle between 50 and 150 µm, is in the secondary deposit (17). Both materials are mixed controlled by the primary solenoid valves (16) and secondary (18), resulting in a mixture of known proportions and defined. This proportion is variable in time and is in the range 1: 9 to 9: 1 of hydroxyapatite: bioactive glass. This precursor material in the form of a mixture, is homogenized in terms of distribution of components by means of a propeller inside the general tank (20) and powered by a pump positive displacement of helical screw towards the injector of precursor powder (21). The precursor powder injector is a nozzle conical shaped metal, with its axis forming an angle included between 15º and 35º with respect to the axis of the main laser beam (2) in the processing area No gas is used during injection precursor dust, with the exception of the air present in the environment of processing.
La fuente de haz láser principal (1) es una fuente láser de CO_{2}, con una potencia óptica ajustable entre 5 W y 100 W. El expansor de haz principal (5) es un expansor de relación de expansión variable comprendida entre 1x y 5x, de diseño galileano y formado por tres lentes de seleniuro de zinc. La fuente de haz láser secundario (3) es una fuente de láser de fibra dopada con iterbio, con una longitud de onda comprendida entre 1060 y 1100 nm y con una potencia óptica ajustable entre 10 W y 200 W. El expansor de haz secundario (6) es un expansor de haz de relación de expansión variable comprendida entre 1x y 10x, de diseño galileano y compuesta por más de dos lentes ópticas de sílice vítrea. El elemento óptico plano (7) es un sustrato plano paralelo de seleniuro de zinc con un recubrimiento antirreflectante para la longitud de onda del haz láser de CO_{2} en la cara superior, y un recubrimiento dieléctrico multicapa altamente reflectante en el rango 500 nm a 1250 nm en la cara inferior. El espejo (9) es un sustrato plano paralelo de sílice vítrea con un recubrimiento dieléctrico multicapa altamente reflectante en el rango 1060 a 1100 nm en la cara superior. La lente de focalización (8) es una lente cóncavo-convexa de sulfato de zinc multiespectral, con una longitud focal comprendida entre 120 mm y 260 mm. El sustrato (13) es una placa plana de aleación de titanio de espesor 6 mm. La plataforma aislante (28), la cubierta aislante móvil (23) y la cubierta aislante estática (26) están compuestos por mullita-alúmina y presentan un grosor de pared de 20 mm. El elemento sensor de temperatura (27) es un termopar de rango de medición 100 a 800ºC, mientras que el elemento calefactor (25) es una resistencia de carburo de silicio. La temperatura medida por el elemento sensor de temperatura (27) se mantiene entre 400 y 600ºC en función de la composición exacta del componente vidrio bioactivo empleado.The main laser beam source (1) is a CO2 laser source, with an adjustable optical power between 5 W and 100 W. The main beam expander (5) is an expander of variable expansion ratio between 1x and 5x, design Galilean and formed by three zinc selenide lenses. The fountain Secondary laser beam (3) is a source of doped fiber laser with yerbium, with a wavelength between 1060 and 1100 nm and with an adjustable optical power between 10 W and 200 W. secondary beam expander (6) is a ratio beam expander of variable expansion between 1x and 10x, of Galilean design and composed of more than two vitreous silica optical lenses. He flat optical element (7) is a parallel flat substrate of selenide of zinc with an anti-reflective coating for the length of CO 2 laser beam wave on the upper face, and a highly reflective multilayer dielectric coating on the 500 nm range at 1250 nm on the underside. The mirror (9) is a parallel flat substrate of vitreous silica with a coating highly reflective multilayer dielectric in the range 1060 to 1100 nm on the upper face. The focusing lens (8) is a lens concave-convex of multispectral zinc sulfate, with a focal length between 120 mm and 260 mm. He substrate (13) is a flat plate of titanium alloy thickness 6 mm The insulating platform (28), the mobile insulating cover (23) and The static insulating cover (26) consists of mullite-alumina and have a wall thickness of 20 mm The temperature sensing element (27) is a thermocouple of range measuring 100 to 800 ° C, while the heating element (25) is a resistance of silicon carbide. The temperature measured by the temperature sensor element (27) is maintained between 400 and 600 ° C in function of the exact composition of the bioactive glass component employee.
Claims (9)
- --
- Mezcla de los dos componentes primario y secundario de la cerámica manteniendo una proporción conocida en el tiempo entre ambos componentes.Mixture of the two primary and secondary ceramic components maintaining a known proportion in time between the two components.
- --
- Inyección de un chorro de material precursor (22) e irradiación de dicho material precursor con un haz láser principal (2) y un haz láser secundario (4) de diferente longitud de onda y focalizados sobre la zona de interacción (12). La longitud de onda del haz láser principal (2) es tal que la absorción de energía por parte del componente primario cuando se irradia con la longitud de onda principal es similar a la absorción de energía por parte del componente secundario cuando se irradia con la misma longitud de onda principal. La longitud de onda del haz láser secundario (4) es tal que la absorción de energía por parte del componente primario cuando se irradia con la longitud de onda secundaria es menor que la absorción de energía por parte del componente secundario cuando se irradia con la misma longitud de onda secundaria.Injection of a material jet precursor (22) and irradiation of said precursor material with a beam main laser (2) and a secondary laser beam (4) of different wavelength and focused on the interaction zone (12). The wavelength of the main laser beam (2) is such that absorption of energy by the primary component when irradiated with The main wavelength is similar to energy absorption by the secondary component when irradiated with it main wavelength The wavelength of the laser beam secondary (4) is such that the absorption of energy by the primary component when irradiated with wavelength secondary is less than the energy absorption by the secondary component when irradiated with the same length of secondary wave
- --
- Movimiento relativo tridimensional de la pieza procesada (13) respecto a la zona de interacción (12) entre el chorro de material precursor (22), el haz láser principal (2) focalizado y el haz láser secundario (4) focalizado; para generar una pieza de geometría tridimensional.Three-dimensional relative movement of the processed part (13) with respect to the interaction zone (12) between the jet of precursor material (22), the main laser beam (2) focused and the secondary laser beam (4) focused; To generate a piece of three-dimensional geometry.
(2).2. Method of processing ceramics according to claim 1, wherein the concentration of the primary component and the concentration of the secondary component in the jet of precursor material (22) are variable over time. In addition, the optical power of the main laser beam (2) is: proportional to the concentration of the primary component in the jet of precursor material (22); inversely proportional to the absorption value of the primary component for the wavelength of the main laser beam (2). Likewise, the optical power of the secondary laser beam is: proportional to the concentration of the secondary component in the jet of the precursor material (22); inversely proportional to: the absorption value of the secondary component for the wavelength of the secondary laser beam (4); inversely proportional to the absorption value of the secondary component for the wavelength of the main laser beam (2); inversely proportional to the value of the optical power of the main laser beam
(2).
- --
- Un expansor de haz principal (5) de relación de expansión variable para ajustar el tamaño y la colimación del haz láser principal (2).A main beam expander (5) of variable expansion ratio for adjust the size and collimation of the main laser beam (2).
- --
- Un expansor de haz secundario (6) de relación de expansión variable destinado a ajustar el tamaño y la colimación del haz láser secundario (4) en función de la posición del diámetro mínimo del haz láser principal (2) focalizado.A secondary beam expander (6) of variable expansion ratio intended to adjust the size and collimation of the laser beam secondary (4) depending on the position of the minimum beam diameter main laser (2) focused.
- --
- Un espejo (9) que refleja la longitud de onda del haz láser secundario (4) procedente del expansor de haz secundario (6).A mirror (9) reflecting the wavelength of the secondary laser beam (4) from the secondary beam expander (6).
- --
- Un elemento óptico plano (7) que transmite el haz láser principal (2) procedente del expansor de haz principal (5) y, al mismo tiempo, refleja el haz láser secundario (4) procedente del espejo (9) paralelamente al haz láser principal (2).A flat optical element (7) that transmits the main laser beam (2) from the main beam expander (5) and, at the same time, reflects the secondary laser beam (4) from the mirror (9) parallel to the main laser beam (2).
- --
- Una lente de focalización (8) situada después del elemento óptico plano (7) que focaliza el haz láser principal (2) y, al mismo tiempo, focaliza el haz láser secundario (4).A focusing lens (8) located after the flat optical element (7) which focuses the main laser beam (2) and, at the same time, focus the secondary laser beam (4).
- --
- Un depósito primario (15) destinado a alojar el componente primario del material precursor.A primary tank (15) intended to house the primary component of the precursor material.
- --
- Un depósito secundario (17) destinado a alojar el componente secundario del material precursor.A secondary tank (17) intended to house the secondary component of the precursor material.
- --
- Una electroválvula de paso primaria (16) situada a la salida del depósito primario (15), destinada a ajustar el flujo de salida del componente primario.A primary solenoid valve (16) located at the exit of the primary tank (15), designed to adjust the output flow of the primary component
- --
- Una electroválvula de paso secundaria (18) situada a la salida del depósito secundario (17), destinada a ajustar el flujo de salida del componente secundario.A secondary solenoid valve (18) located at the exit of the secondary tank (17), intended to adjust the output flow of the secondary component
- --
- Un depósito general (20) destinado a alojar y homogeneizar el material precursor mezcla de componente primario y componente secundario procedentes del depósito primario (15) y el depósito secundario (17).A general deposit (20) intended to house and homogenize the material precursor mixture of primary component and secondary component from the primary deposit (15) and the secondary deposit (17).
- --
- Un inyector de polvo precursor (21) destinado a inyectar el material precursor procedente del depósito general (20) en el punto de focalización del haz láser principal (2) y el haz láser secundario (4).A precursor powder injector (21) intended to inject the material precursor from the general deposit (20) at the point of focus of the main laser beam (2) and the secondary laser beam (4).
- --
- Un substrato (14) que soporta la generación de la pieza procesada (13) mediante el enfriamiento de la mezcla de material precursor procedente de la zona de interacción (12).A substrate (14) that supports the generation of the processed part (13) by cooling the precursor material mixture from the interaction zone (12).
- --
- Un sistema de confinamiento de la zona de procesamiento destinada a reducir las pérdidas de calor en dicha zona de procesamiento y que comprende: una cubierta aislante (23) solidaria a la lente de focalización (8); una plataforma aislante (28) que soporta y es solidaria al sustrato (14); una cubierta aislante estática (26) destinada a reducir las pérdidas de calor en la zona de procesamiento.A confinement system of the processing area destined to reduce heat losses in said processing zone and that comprises: an insulating cover (23) integral with the lens of targeting (8); an insulating platform (28) that supports and is in solidarity with the substrate (14); a static insulating cover (26) aimed at reducing heat losses in the area of processing
- --
- Un elemento calefactor (25), contenido dentro de la cubierta aislante (23), destinado a generar el calor necesario para mantener una determinada temperatura media de la zona de procesamiento.A heating element (25), contained within the insulating cover (23), intended to generate the heat necessary to maintain a determined average temperature of the processing area.
- --
- Un elemento sensor de temperatura (27) destinado a medir la temperatura media de la zona de procesamiento.A temperature sensor element (27) intended to measure the temperature Average of the processing area.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| ES200902063A ES2368079B1 (en) | 2009-10-24 | 2009-10-24 | METHOD AND APPARATUS FOR QUICK MANUFACTURE OF FUNCTIONAL GLASS AND CERAMIC PARTS. |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| ES200902063A ES2368079B1 (en) | 2009-10-24 | 2009-10-24 | METHOD AND APPARATUS FOR QUICK MANUFACTURE OF FUNCTIONAL GLASS AND CERAMIC PARTS. |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| ES2368079A1 true ES2368079A1 (en) | 2011-11-14 |
| ES2368079B1 ES2368079B1 (en) | 2012-09-10 |
Family
ID=44838640
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| ES200902063A Active ES2368079B1 (en) | 2009-10-24 | 2009-10-24 | METHOD AND APPARATUS FOR QUICK MANUFACTURE OF FUNCTIONAL GLASS AND CERAMIC PARTS. |
Country Status (1)
| Country | Link |
|---|---|
| ES (1) | ES2368079B1 (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2018002001A1 (en) * | 2016-06-28 | 2018-01-04 | Shell Internationale Research Maatschappij B.V. | A method and apparatus for 3d printing of quartz glass |
Citations (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| GB1307263A (en) * | 1969-10-20 | 1973-02-14 | American Optical Corp | Crucible free sintering or melting of glass glass-ceramic ceramic or refractory materials |
| JPS6027490A (en) * | 1983-07-25 | 1985-02-12 | Nec Corp | Laser working device |
| JPS60239333A (en) * | 1984-03-16 | 1985-11-28 | Hitachi Cable Ltd | Method and apparatus for manufacturing base material for optical fiber |
| US5008890A (en) * | 1990-05-01 | 1991-04-16 | Hughes Aircraft Company | Red, green, blue upconversion laser pumped by single wavelength infrared laser source |
| ES2031298T3 (en) * | 1988-04-07 | 1992-12-01 | Europaische Atomgemeinschaft (Euratom) | DEVICE FOR THE MANUFACTURE OF AMORPHOUS CERAMIC SUBSTANCES OR METAL ALLOYS. |
| WO1996021628A1 (en) * | 1995-01-13 | 1996-07-18 | Maria Brink | Novel bioactive glasses and their use |
| ES2214956A1 (en) * | 2002-12-20 | 2004-09-16 | Universidad De Sevilla | Biocompatible material |
| ES2306613B1 (en) * | 2007-04-30 | 2009-10-02 | Consejo Superior De Investigaciones Cientificas | CERAMIC MATERIAL WITH EUTECTIC STRUCTURE GROWED BY FUSION ASSISTED WITH LASER. |
| WO2011109753A1 (en) * | 2010-03-05 | 2011-09-09 | TeraDiode, Inc. | Wavelength beam combining based pump / pulsed lasers |
-
2009
- 2009-10-24 ES ES200902063A patent/ES2368079B1/en active Active
Patent Citations (10)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| GB1307263A (en) * | 1969-10-20 | 1973-02-14 | American Optical Corp | Crucible free sintering or melting of glass glass-ceramic ceramic or refractory materials |
| JPS6027490A (en) * | 1983-07-25 | 1985-02-12 | Nec Corp | Laser working device |
| JPS60239333A (en) * | 1984-03-16 | 1985-11-28 | Hitachi Cable Ltd | Method and apparatus for manufacturing base material for optical fiber |
| ES2031298T3 (en) * | 1988-04-07 | 1992-12-01 | Europaische Atomgemeinschaft (Euratom) | DEVICE FOR THE MANUFACTURE OF AMORPHOUS CERAMIC SUBSTANCES OR METAL ALLOYS. |
| US5008890A (en) * | 1990-05-01 | 1991-04-16 | Hughes Aircraft Company | Red, green, blue upconversion laser pumped by single wavelength infrared laser source |
| WO1996021628A1 (en) * | 1995-01-13 | 1996-07-18 | Maria Brink | Novel bioactive glasses and their use |
| ES2214956A1 (en) * | 2002-12-20 | 2004-09-16 | Universidad De Sevilla | Biocompatible material |
| ES2325812T3 (en) * | 2002-12-20 | 2009-09-18 | Universidad De Sevilla | BIOCOMPATIBLE MATERIAL. |
| ES2306613B1 (en) * | 2007-04-30 | 2009-10-02 | Consejo Superior De Investigaciones Cientificas | CERAMIC MATERIAL WITH EUTECTIC STRUCTURE GROWED BY FUSION ASSISTED WITH LASER. |
| WO2011109753A1 (en) * | 2010-03-05 | 2011-09-09 | TeraDiode, Inc. | Wavelength beam combining based pump / pulsed lasers |
Non-Patent Citations (1)
| Title |
|---|
| Modificación superficial de materiales cerámicos por láser, P. PARDO, A. PUCHE, R. IBÁÑEZ, J. BASTIDA, V.PRIMO. Boletín de la Sociedad Española de Cerámica y Vidrio. Vol.45, nº6. Nov.-Dic. 2006 * |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2018002001A1 (en) * | 2016-06-28 | 2018-01-04 | Shell Internationale Research Maatschappij B.V. | A method and apparatus for 3d printing of quartz glass |
Also Published As
| Publication number | Publication date |
|---|---|
| ES2368079B1 (en) | 2012-09-10 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| US20240024984A1 (en) | Three-Dimensional Printing Systems and Methods of Their Use | |
| EP2292357B1 (en) | Ceramic article and methods for producing such article | |
| CN114472927B (en) | A multi-energy beam selective laser melting device and material addition method | |
| Mühler et al. | Slurry‐based additive manufacturing of ceramics | |
| RU2469851C2 (en) | Method of producing 3d structure layer-by-layer | |
| US9599756B2 (en) | Method for manufacturing a mirror comprising at least one cavity and optical mirror | |
| US6391251B1 (en) | Forming structures from CAD solid models | |
| ES2284099T3 (en) | PROCEDURE AND DEVICE FOR THE MANUFACTURE OF PRODUCTS BY SINTERIZED AND / OR FUSION. | |
| US20160263704A1 (en) | Method and apparatus for producing a three-dimensional workpiece with thermal focus shift compensation | |
| CN109996644A (en) | Method for controlling cooling rate of melting pool of powder bed by online laser scanner and direct metal laser melting manufacturing system | |
| CN105033250B (en) | A kind of coaxial double light beam laser preheating shapes slow cooling stress delayed release device and method | |
| Boddu et al. | Control of laser cladding for rapid prototyping--a review | |
| ES2368079A1 (en) | Method and apparatus for the fast manufacture of functional glass and ceramic pieces. (Machine-translation by Google Translate, not legally binding) | |
| CN104773957A (en) | Gold nanoparticle-doped glass and preparation method thereof and femtosecond laser irradiation system | |
| RU159233U1 (en) | DEVICE FOR LASER PROCESSING OF MATERIALS | |
| Luo | Additive manufacturing of glass using a filament fed process | |
| Gong et al. | Powder transport model for laser cladding by lateral powder feeding: I. Powder flow field with cylindrical distribution | |
| US20230405679A1 (en) | Apparatus for producing a three-dimensional work piece | |
| Luo et al. | Solid freeform fabrication of transparent fused quartz using a filament fed process | |
| RU183887U1 (en) | Device for laser processing of materials | |
| RU150514U1 (en) | INSTALLATION FOR FORMING BIOS-COMPATIBLE STRUCTURES | |
| CN106696263B (en) | A kind of 3D printing laser knot burner | |
| US20210206693A1 (en) | Methods and apparatus for forming and polishing glass, glass-ceramic and ceramic preforms to form shaped plates for liquid lenses | |
| JP2019104230A (en) | Apparatus for additively manufacturing three-dimensional object | |
| Nan et al. | Modeling for laser-material interaction to predict and control the cross sectional area of coaxial laser cladding with powder |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| FG2A | Definitive protection |
Ref document number: 2368079 Country of ref document: ES Kind code of ref document: B1 Effective date: 20120910 |