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ES2031835T3 - LASER BEAM HOMOGENIZER. - Google Patents

LASER BEAM HOMOGENIZER.

Info

Publication number
ES2031835T3
ES2031835T3 ES198787100538T ES87100538T ES2031835T3 ES 2031835 T3 ES2031835 T3 ES 2031835T3 ES 198787100538 T ES198787100538 T ES 198787100538T ES 87100538 T ES87100538 T ES 87100538T ES 2031835 T3 ES2031835 T3 ES 2031835T3
Authority
ES
Spain
Prior art keywords
tunnel
ray
laser
light
lcoh
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
ES198787100538T
Other languages
Spanish (es)
Inventor
Bunsen Fan
Raymond Eugene Tibbetts
Janusz Stanislaw Wilczynski
David Francis Whitman
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
International Business Machines Corp
Original Assignee
International Business Machines Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by International Business Machines Corp filed Critical International Business Machines Corp
Application granted granted Critical
Publication of ES2031835T3 publication Critical patent/ES2031835T3/en
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G03F7/7055—Exposure light control in all parts of the microlithographic apparatus, e.g. pulse length control or light interruption
    • G03F7/70583—Speckle reduction, e.g. coherence control or amplitude/wavefront splitting
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
    • G02B27/09—Beam shaping, e.g. changing the cross-sectional area, not otherwise provided for
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
    • G02B27/09—Beam shaping, e.g. changing the cross-sectional area, not otherwise provided for
    • G02B27/0938—Using specific optical elements
    • G02B27/0994—Fibers, light pipes
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/70075—Homogenization of illumination intensity in the mask plane by using an integrator, e.g. fly's eye lens, facet mirror or glass rod, by using a diffusing optical element or by beam deflection

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Lasers (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Optical Elements Other Than Lenses (AREA)
  • Non-Portable Lighting Devices Or Systems Thereof (AREA)

Abstract

UN RAYO LASER COHERENTE (12), POSIBLEMENTE DE DISTRIBUCION DE INTENSIDAD ESPACIAL NO UNIFORME, SE TRANSFORMA EN UN RAYO DE LUZ INCOHERENTE DE DISTRIBUCION DE INTENSIDAD ESPACIAL ESENCIALMENTE UNIFORME HOMOGENEIZANDO EL RAYO LASER CON UN TUNEL DE LUZ (22) (UN PASILLO DE LUZ TRANSPARENTE DE SUPERFICIES LATERALES PLANAS INTERIORMENTE REFLECTANTES). CUANDO LA SECCION TRANSVERSAL DEL TUNEL ES UN POLIGONO (LO OPTIMO) Y SUS LADOS SON PARALELOS AL EJE DEL TUNEL (LO OPTIMO) LA LUZ LASER A LA SALIDA DEL TUNEL (O, ALTERNATIVAMENTE, EN CUALQUIER PLANO DE IMAGEN EN RELACION A EL) TENDRA UNA DISTRIBUCION DE INTENSIDAD ESENCIALMENTE UNIFORME Y SOLO SERA INCOHERENTE CUANDO LA RELACION LONGITUD/ANCHURA (R) DEL TUNEL SEA IGUAL O SUPERIOR A LA COTANGENTE DEL ANGULO DE DIVERGENCIA 0 DEL RAYO DE ENTRADA Y CUANDO WMIN = LCOH (R+ (1+R2)1/2) > 2RLCOH, SIENDO WMIN LA MINIMA ANCHURA REQUERIDA DEL TUNEL DE LUZ Y LCOH LA LONGITUD DE COHERENCIA EFECTIVA DEL RAYO LASER QUE SE HOMOGENEIZA.A COHERENT LASER RAY (12), POSSIBLY OF NON-UNIFORM SPACE INTENSITY DISTRIBUTION, IS TRANSFORMED INTO AN ESSENTIALLY UNIFORM SPACE INTENSITY DISTRIBUTION LIGHT RAY HOMOGENIZING THE LASER BEAM (22). OF FLAT SIDE SURFACES INTERIOR REFLECTING). WHEN THE CROSS SECTION OF THE TUNNEL IS A POLYGON (THE OPTIMAL) AND ITS SIDES ARE PARALLEL TO THE AXIS OF THE TUNNEL (THE OPTIMAL) THE LASER LIGHT AT THE EXIT OF THE TUNNEL (OR, ALTERNATIVELY, IN ANY IMAGE PLANE IN RELATION TO IT) AN ESSENTIALLY UNIFORM DISTRIBUTION OF INTENSITY WILL ONLY BE INCONSISTENT WHEN THE TUNNEL LENGTH / WIDTH (R) RATIO IS EQUAL TO OR GREATER THAN THE DIVERGENCE ANGLE 0 COTANGENT OF THE ENTRY RAY AND WHEN WMIN = LCOH (R + (1 + R2) / 2)> 2RLCOH, WMIN BEING THE MINIMUM REQUIRED WIDTH OF THE LIGHT TUNNEL AND LCOH THE EFFECTIVE COHERENCE LENGTH OF THE LASER RAY HOMOGENIZED.

ES198787100538T 1986-01-29 1987-01-16 LASER BEAM HOMOGENIZER. Expired - Lifetime ES2031835T3 (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US06/823,554 US4744615A (en) 1986-01-29 1986-01-29 Laser beam homogenizer

Publications (1)

Publication Number Publication Date
ES2031835T3 true ES2031835T3 (en) 1993-01-01

Family

ID=25239079

Family Applications (1)

Application Number Title Priority Date Filing Date
ES198787100538T Expired - Lifetime ES2031835T3 (en) 1986-01-29 1987-01-16 LASER BEAM HOMOGENIZER.

Country Status (7)

Country Link
US (1) US4744615A (en)
EP (1) EP0230931B1 (en)
JP (1) JPS62178904A (en)
BR (1) BR8606399A (en)
CA (1) CA1264712A (en)
DE (1) DE3778387D1 (en)
ES (1) ES2031835T3 (en)

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Also Published As

Publication number Publication date
BR8606399A (en) 1987-10-13
JPS62178904A (en) 1987-08-06
EP0230931A3 (en) 1989-01-11
JPH0561602B2 (en) 1993-09-06
EP0230931B1 (en) 1992-04-22
DE3778387D1 (en) 1992-05-27
EP0230931A2 (en) 1987-08-05
US4744615A (en) 1988-05-17
CA1264712A (en) 1990-01-23

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