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ES2024494B3 - PROCESS AND APPARATUS FOR THE DEPOSITION OF ANTI-FRICTION ALLOYS. - Google Patents

PROCESS AND APPARATUS FOR THE DEPOSITION OF ANTI-FRICTION ALLOYS.

Info

Publication number
ES2024494B3
ES2024494B3 ES87201324T ES87201324T ES2024494B3 ES 2024494 B3 ES2024494 B3 ES 2024494B3 ES 87201324 T ES87201324 T ES 87201324T ES 87201324 T ES87201324 T ES 87201324T ES 2024494 B3 ES2024494 B3 ES 2024494B3
Authority
ES
Spain
Prior art keywords
deposition
porous pad
overlay
providing
alloy
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
ES87201324T
Other languages
Spanish (es)
Inventor
David Raymond Eastham
John Keith Dennis
Michael Turner
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
AE PLC
Original Assignee
AE PLC
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by AE PLC filed Critical AE PLC
Application granted granted Critical
Publication of ES2024494B3 publication Critical patent/ES2024494B3/en
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
    • C25D5/04—Electroplating with moving electrodes
    • C25D5/06—Brush or pad plating
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D7/00—Electroplating characterised by the article coated
    • C25D7/10—Bearings

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Electrochemistry (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Electroplating Methods And Accessories (AREA)
  • Sliding-Contact Bearings (AREA)
  • Pressure Welding/Diffusion-Bonding (AREA)
  • Physical Vapour Deposition (AREA)

Abstract

A process and apparatus is described for the electro-deposition of an overlay alloy onto a bearing alloy surface (14). The process comprises the steps of cleaning the surface, providing relative motion between the surface to be plated and a porous pad (52) in contact with said surface, providing a flow of plating solution to the porous pad and said surface whilst applying a voltage difference between said surface which is cathodic during overlay deposition and an anode (51) connected to the porous pad. An example of the deposition of a tin-based overlay alloy containing cobalt is described.
ES87201324T 1986-07-19 1987-07-13 PROCESS AND APPARATUS FOR THE DEPOSITION OF ANTI-FRICTION ALLOYS. Expired - Lifetime ES2024494B3 (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
GB868617675A GB8617675D0 (en) 1986-07-19 1986-07-19 Deposition of bearing alloys

Publications (1)

Publication Number Publication Date
ES2024494B3 true ES2024494B3 (en) 1992-03-01

Family

ID=10601361

Family Applications (1)

Application Number Title Priority Date Filing Date
ES87201324T Expired - Lifetime ES2024494B3 (en) 1986-07-19 1987-07-13 PROCESS AND APPARATUS FOR THE DEPOSITION OF ANTI-FRICTION ALLOYS.

Country Status (6)

Country Link
EP (1) EP0257670B1 (en)
JP (1) JPS6328896A (en)
AT (1) ATE67528T1 (en)
DE (1) DE3773088D1 (en)
ES (1) ES2024494B3 (en)
GB (2) GB8617675D0 (en)

Families Citing this family (24)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE19500727C1 (en) * 1995-01-12 1996-05-23 Fraunhofer Ges Forschung Electrodeposition appts. for plating rotationally symmetrical component
JPH08209384A (en) * 1995-02-02 1996-08-13 Yamaha Motor Co Ltd Surface-treating device
DE19754221A1 (en) * 1997-12-06 1999-06-17 Federal Mogul Wiesbaden Gmbh Layered composite material for plain bearings with lead-free sliding layer
EP1055020A2 (en) * 1998-02-12 2000-11-29 ACM Research, Inc. Plating apparatus and method
US6565729B2 (en) 1998-03-20 2003-05-20 Semitool, Inc. Method for electrochemically depositing metal on a semiconductor workpiece
GB2336161B (en) * 1998-04-06 2003-03-26 John Michael Lowe Method of providing conductive tracks on a printed circuit and apparatus for use in carrying out the method
US6447668B1 (en) 1998-07-09 2002-09-10 Acm Research, Inc. Methods and apparatus for end-point detection
US7136173B2 (en) 1998-07-09 2006-11-14 Acm Research, Inc. Method and apparatus for end-point detection
US6395152B1 (en) 1998-07-09 2002-05-28 Acm Research, Inc. Methods and apparatus for electropolishing metal interconnections on semiconductor devices
US6497801B1 (en) 1998-07-10 2002-12-24 Semitool Inc Electroplating apparatus with segmented anode array
US6248222B1 (en) 1998-09-08 2001-06-19 Acm Research, Inc. Methods and apparatus for holding and positioning semiconductor workpieces during electropolishing and/or electroplating of the workpieces
US6916412B2 (en) 1999-04-13 2005-07-12 Semitool, Inc. Adaptable electrochemical processing chamber
US7160421B2 (en) 1999-04-13 2007-01-09 Semitool, Inc. Turning electrodes used in a reactor for electrochemically processing a microelectronic workpiece
US7351314B2 (en) 2003-12-05 2008-04-01 Semitool, Inc. Chambers, systems, and methods for electrochemically processing microfeature workpieces
US7438788B2 (en) 1999-04-13 2008-10-21 Semitool, Inc. Apparatus and methods for electrochemical processing of microelectronic workpieces
US7585398B2 (en) 1999-04-13 2009-09-08 Semitool, Inc. Chambers, systems, and methods for electrochemically processing microfeature workpieces
CN1296524C (en) 1999-04-13 2007-01-24 塞米用具公司 System for electrochemically processing workpiece
US7020537B2 (en) 1999-04-13 2006-03-28 Semitool, Inc. Tuning electrodes used in a reactor for electrochemically processing a microelectronic workpiece
US7264698B2 (en) 1999-04-13 2007-09-04 Semitool, Inc. Apparatus and methods for electrochemical processing of microelectronic workpieces
US7351315B2 (en) 2003-12-05 2008-04-01 Semitool, Inc. Chambers, systems, and methods for electrochemically processing microfeature workpieces
US7189318B2 (en) 1999-04-13 2007-03-13 Semitool, Inc. Tuning electrodes used in a reactor for electrochemically processing a microelectronic workpiece
US7090751B2 (en) 2001-08-31 2006-08-15 Semitool, Inc. Apparatus and methods for electrochemical processing of microelectronic workpieces
GB0216331D0 (en) * 2002-07-13 2002-08-21 Dana Corp Bearings
CN110813657A (en) * 2019-11-14 2020-02-21 昌河飞机工业（集团）有限责任公司 Oxidation brushing device and method for hole parts

Family Cites Families (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB760016A (en) * 1953-09-11 1956-10-31 Glacier Co Ltd Improvements in or relating to electroplating
GB1186357A (en) * 1966-09-15 1970-04-02 Metadalic Ltd Methods and Apparatus for Electrolytic Treatment of Continuous Strand Materials
GB1257541A (en) * 1968-04-03 1971-12-22
US3616285A (en) * 1969-12-31 1971-10-26 Sifco Ind Inc Repair of chromium plated surfaces
US3751343A (en) * 1971-06-14 1973-08-07 A Macula Brush electroplating metal at increased rates of deposition
GB1551212A (en) * 1976-06-11 1979-08-22 Owen S G Ltd Selective electro-plating
EP0003680A1 (en) * 1978-02-09 1979-08-22 Weldex A.G. Method for brush electroplating, electrode and electrolyte therefor
US4399019A (en) * 1981-07-21 1983-08-16 Imperial Clevite Inc. Ultra-high current density electroplating cell
US4452684A (en) * 1983-03-11 1984-06-05 The Carolinch Company Apparatus for selective electrolytic plating
DE3312905C2 (en) * 1983-04-11 1986-03-27 Battelle-Institut E.V., 6000 Frankfurt Device for galvanic internal coating of hollow parts
US4610772A (en) * 1985-07-22 1986-09-09 The Carolinch Company Electrolytic plating apparatus

Also Published As

Publication number Publication date
GB2192642B (en) 1990-12-19
GB2192642A (en) 1988-01-20
GB8617675D0 (en) 1986-08-28
DE3773088D1 (en) 1991-10-24
JPS6328896A (en) 1988-02-06
GB8716477D0 (en) 1987-08-19
ATE67528T1 (en) 1991-10-15
EP0257670A1 (en) 1988-03-02
EP0257670B1 (en) 1991-09-18

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