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EP2986955B1 - Système de pesée monolithique - Google Patents

Système de pesée monolithique Download PDF

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Publication number
EP2986955B1
EP2986955B1 EP14708479.2A EP14708479A EP2986955B1 EP 2986955 B1 EP2986955 B1 EP 2986955B1 EP 14708479 A EP14708479 A EP 14708479A EP 2986955 B1 EP2986955 B1 EP 2986955B1
Authority
EP
European Patent Office
Prior art keywords
base
position sensor
pedestal
passage
target region
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
EP14708479.2A
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German (de)
English (en)
Other versions
EP2986955A1 (fr
Inventor
Winfried Graf
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Sartorius Lab Instruments GmbH and Co KG
Original Assignee
Sartorius Lab Instruments GmbH and Co KG
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Filing date
Publication date
Application filed by Sartorius Lab Instruments GmbH and Co KG filed Critical Sartorius Lab Instruments GmbH and Co KG
Publication of EP2986955A1 publication Critical patent/EP2986955A1/fr
Application granted granted Critical
Publication of EP2986955B1 publication Critical patent/EP2986955B1/fr
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Classifications

    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01G—WEIGHING
    • G01G23/00—Auxiliary devices for weighing apparatus
    • G01G23/18—Indicating devices, e.g. for remote indication; Recording devices; Scales, e.g. graduated
    • G01G23/36—Indicating the weight by electrical means, e.g. using photoelectric cells
    • G01G23/361—Indicating the weight by electrical means, e.g. using photoelectric cells using photoelectric cells
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01G—WEIGHING
    • G01G7/00—Weighing apparatus wherein the balancing is effected by magnetic, electromagnetic, or electrostatic action, or by means not provided for in the preceding groups
    • G01G7/02—Weighing apparatus wherein the balancing is effected by magnetic, electromagnetic, or electrostatic action, or by means not provided for in the preceding groups by electromagnetic action

Definitions

  • the invention relates to a monolithic weighing system, comprising a base, a load-bearing via a parallel linkage at the base and a lever hinged to the load receiver, which has a point of application for a force compensation arrangement and a target area for an optical position sensor, wherein the target area a slit in a having thin-walled lever portion of the lever in the deflection plane.
  • the invention further relates to a weighing device comprising such a monolithic weighing system.
  • Monolithic weighing systems as the core element of weighing devices are known to those skilled in precision balances, in particular precision balances operating on the principle of electromagnetic force compensation.
  • Such weighing systems have a load bearing, which is articulated by means of a parallel link arrangement on a base.
  • the load bearing is connected to a weighing pan to be weighed while the base is fixed.
  • the load bearing is able to perform a purely vertical movement due to the parallel link arrangement - at least for small deflections.
  • a lever assembly for translating the deflection of the load bearing is articulated.
  • a force compensation arrangement such as a provided electromagnetic immersion coil assembly.
  • the force compensation arrangement serves to generate a counterforce acting on the lever arrangement, which counteracts the deflection of the lever arrangement produced by the weight force acting on the load receiver.
  • a current through the immersion coil must be regulated for this purpose.
  • the corresponding control circuit contains an optical position sensor which precisely detects the deflections of the lever arrangement and provides the control electronics with a corresponding signal, so that an immediate compensation can take place. This ensures that the actual deflections of the lever arrangement can be minimized.
  • the sensitivity of the position sensor is essential for the precision of the weighing.
  • the lever arrangement in a thin-walled lever section which is subject to a comparatively large deflection, has in the plane of deflection a slit diaphragm which is observed by an optical sensor.
  • the photodetector for example as a split photodiode
  • deflections of the lever section carrying the slit diaphragm can be registered very precisely.
  • both sides of the target area, i. the slit diaphragm, socket for holding the photo emitter and photodetector needed.
  • a balance is known, are housed in the transmitter and receiver of the optical position sensor within the magnetic cover. From the US 3,805,907 Furthermore, an optical zero indicator for a balance is known in which the photosensitive surfaces are pivotable about the optical axis of the receiver for adjustment.
  • the invention provides for the at least one required base for holding the position sensor to be monolithically worked out with the rest of the weighing system without consideration of the above-described resulting problems, and in particular to be arranged on the base.
  • this base is provided with a base opening, which can fulfill two tasks.
  • it can serve the support of the position sensor.
  • the apertures can be adapted to the shape of the position sensor, so that its insertion into the socket or bases takes place in a form-fitting manner with maximum reproducibility.
  • the base opening is assigned a further task, namely as a processing window for a laser processing of the target area, in particular for a processing of the slit diaphragm by means of laser light.
  • the weighing system including the socket or base with base opening, is monolithically machined from a block of material in a conventional manner.
  • the slit diaphragm of the target area is then machined out through the base opening by means of laser processing.
  • a weighing device can be provided by the monolithic weighing system is equipped with position sensor and force compensation arrangement. Such a weighing arrangement can then be expanded to a ready-to-use precision balance by adding scales, electronics and housing.
  • the target area of the lever assembly is approximately at the center of the overall height of the weighing system.
  • the upper link pair of the parallel link arrangement is typically further up, the lower link pair of the parallel link arrangement positioned further down. Since both the upper and the lower arm pair is hinged to the base, the target area and the base or pedestals thus lie between two walls of the base extending over the height of the weighing system. These too can hinder the processing of the target area as well as of the pedestal or sockets.
  • a wall of the base is arranged adjacent to the base opening carrying the base, which has a basal opening overlapping base opening, wherein the slit of the target area is created by laser processing through the base opening therethrough.
  • the idea of laser processing through an editing window is also transmitted to the wall of the base.
  • the base aperture can also be used as access for mechanical machining of the socket.
  • the base aperture and the Sockel trimbrechung be created in a common drilling. The resulting channel then forms the access for the laser processing of the target area.
  • a base with a base opening is arranged on both sides of the target area and the base openings and the target area are aligned with one another.
  • the walls of the base obstructing the mechanical and optical processing of the pedestal or of the target area, this leads to the preferred embodiment, according to which the pedestals are arranged between two walls of the base, which each have a base opening overlapping the nearest base perforation.
  • the sensitivity of the position sensor also has the geometric shape of the slit.
  • the slit is either very thin, such as a very thin sheet, or wedge-shaped, running in the direction of the photodetector tapering.
  • a preferred slot width of the slit is about 0.3 to 0.5 mm.
  • FIGS. 1 and 2 show an embodiment of a weighing system 10 according to the invention in monolithic construction.
  • FIG. 3 shows the same monolithic weighing system 10, which has been extended by a position sensor. A further extension, in particular by adding a force compensation arrangement, a suitable electronics, a weighing pan and a housing would ultimately lead to the creation of an instrument ready for use.
  • the FIGS. 1 to 3 should therefore be described together below, unless in individual cases express reference to a specific representation is taken.
  • the weighing system 10 is monolithic, i. worked out in one piece from a block of material. For this purpose, it is preferable to use a tension-free aluminum block.
  • the machining is predominantly mechanical, in particular by milling and drilling, preferably using programmed CNC machines.
  • the weighing system 10 has a base 12, which represents a fixed reference point with respect to all movements within the weighing system 10. About first thin spots 14, a top link pair 16 is hinged to the base 12. About second thin spots 18, a lower link pair 20 is hinged to the base 12. The upper link pair 16 and the lower link pair 20 are via third thin areas 22 and fourth via thin points 24, the only in FIG. 2 are recognizable, hinged to a load receiver 26. As a result of this parallel guide arrangement, a purely vertical movement of the load receiver 26 relative to the base 12 is made possible, at least for small deflections. In a scale containing the weighing system 10, the load receiver 26 is connected to a weight receiver, in particular a weighing pan, so that a weight force to be measured is introduced into the weighing system 10 via the load receiver 26.
  • the load receiver 26 is connected via a coupling, which can not be seen in detail in the figures, to a lever arrangement for the transmission, in particular in the exemplary embodiment shown to reinforce the deflection of the load receiver 26. Details of the lever arrangement and its coupling with the load receiver 26 are not relevant to the present invention. Of importance is only the terminal lever 28 which is functionally divided into a short lever arm 28a and a long lever arm 28b and is pivotally mounted at the point of contact on a support point 30th A deflection of the load-bearing 26 is, depending on the embodiment of the lever arrangement, transmitted indirectly or directly to the short lever arm 28a and leads to a correspondingly increased deflection of the long lever arm 28b.
  • a target region 32 is arranged for a position sensor 34 described in greater detail below.
  • the target region 32 consists of a thin-walled lever section, which performs a pivoting movement in the deflection plane of the lever 28 and has a slit diaphragm 36 perpendicular thereto.
  • the position sensor 34 consists of a photoemitter 34a and a photodetector 34b. These are arranged so that light from the photoemitter 34a on its way to the photodetector 34b passes through the slit diaphragm 36 of the target area 32.
  • the photodetector for example as a divided photodiode, deflections of the long lever arm 28b can be detected very precisely.
  • sockets 38a, 38b are arranged on both sides of the target area 32, which according to the invention are integrally connected to the base, in particular part of the monolithic weighing system 10.
  • the pedestals 38a, 38b each have a base opening 40a, 40b, which are aligned with each other and - in the undeflected position of the lever 28 - with the slit diaphragm 36 of the target area 32.
  • These base apertures 40a, 40b have a dual function, namely, for holding, in particular by inserting the elements of the position sensor 34, and as a processing window for a laser processing of the target area 32.
  • the base 12 is H-shaped in cross-section and in particular has side walls 12a, 12b, between which the pedestals 38a, 38b and the target area 32 located between them are arranged.
  • the side walls 12a, 12b are in turn provided with base apertures 42a, 42b which are aligned with the base apertures 40a, 40b.
  • the laser beam required for processing the target area 32 is thus introduced through at least two processing windows, namely through base perforation 40a, 40b and base opening 42a, 42b.
  • the person skilled in the art will recognize that a one-sided introduction of the laser beam will generally be sufficient.
  • the larger pair of processing windows is selected, ie in the illustrated embodiment, the processing window pair of base opening 40b and base opening 42b, their alignment with each other and with the slit 36 in particular FIG. 2 is clearly visible.
  • each of the two pairs of processing windows preferably takes place in a common drilling step.
  • a receiving portion 44 of the base 12 for receiving a force compensation arrangement, in particular for receiving a permanent magnet, in the magnetic field of a coupled with the long lever arm 28 b immersion coil for electromagnetic force compensation of the introduced via the load bearing 26 weight force is immersed.

Landscapes

  • Physics & Mathematics (AREA)
  • Electromagnetism (AREA)
  • General Physics & Mathematics (AREA)
  • Length Measuring Devices By Optical Means (AREA)
  • Magnetic Bearings And Hydrostatic Bearings (AREA)
  • Measurement Of Force In General (AREA)

Claims (5)

  1. Système de pesée monolithique, comprenant une base (12), un support de charge (26) articulé à la base (12) au moyen d'un mécanisme à bras parallèles (16, 20) et un levier (28) qui est articulé sur le support de charge (26) et qui comporte un point d'application pour un mécanisme de compensation de force et une zone cible (32) destinée à un capteur de position optique (34),
    dans lequel la zone cible (32) comprend un diaphragme à fente (36) dans une section de levier à parois minces du levier (28) dans le plan de déviation de ce dernier,
    caractérisé en ce que
    un socle de capteur de position (38a, b) relié d'une seule pièce à la base (12), qui est pourvu d'un évidement de socle (40a, b) orienté perpendiculairement au plan de déviation, est agencé horizontalement au voisinage de la zone cible (32), dans lequel le diaphragme à fente (36) de la zone cible (32) est réalisé par usinage laser à travers l'évidement de socle (40a, b).
  2. Système de pesée monolithique selon la revendication 1,
    caractérisé en ce que
    une paroi latérale (12a, 12b) de la base (12), laquelle présente un évidement de base (42a, b) recouvrant l'évidement de socle (40a, b), est agencée au voisinage du socle de capteur de position (38a, b) portant l'évidement de socle (40a, b),
    dans lequel le diaphragme à fente (36) de la zone cible (32) est réalisé par usinage laser à travers l'évidement de base (42a, b).
  3. Système de pesée monolithique selon l'une quelconque des revendications précédentes,
    caractérisé en ce que
    respectivement un socle de capteur de position (38a, b) pourvu d'un évidement de socle (40a, b) est agencé de part et d'autre de la zone cible (32) et les évidements de socle (40a, b) et la zone cible (32) sont en alignement les uns avec les autres.
  4. Système de pesée monolithique selon la revendication 3,
    caractérisé en ce que
    les socles de capteur de position (38a, b) sont agencés entre deux parois latérales (12a, b) de la base (12), laquelle comprend dans chaque cas un évidement de base (42a, b) recouvrant l'évidement de socle (40a, b) le plus proche.
  5. Système de pesée monolithique selon l'une quelconque des revendications 3 à 4,
    caractérisé en ce que
    un photoémetteur (34a) orienté vers la zone cible (32) est inséré dans un évidement de socle (40a) d'un premier des deux socles de capteur de position (38a) et un photo-détecteur (34b) orienté vers la zone cible (32) est inséré dans un évidement de socle (40b) d'un deuxième des deux socles de capteur de position (38b).
EP14708479.2A 2013-04-16 2014-03-04 Système de pesée monolithique Active EP2986955B1 (fr)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
DE102013103791.7A DE102013103791B4 (de) 2013-04-16 2013-04-16 Monolithisches Wägesystem
PCT/EP2014/000540 WO2014169981A1 (fr) 2013-04-16 2014-03-04 Système de pesée monolithique

Publications (2)

Publication Number Publication Date
EP2986955A1 EP2986955A1 (fr) 2016-02-24
EP2986955B1 true EP2986955B1 (fr) 2016-12-07

Family

ID=50238346

Family Applications (1)

Application Number Title Priority Date Filing Date
EP14708479.2A Active EP2986955B1 (fr) 2013-04-16 2014-03-04 Système de pesée monolithique

Country Status (5)

Country Link
US (1) US9927284B2 (fr)
EP (1) EP2986955B1 (fr)
CN (1) CN105143838B (fr)
DE (1) DE102013103791B4 (fr)
WO (1) WO2014169981A1 (fr)

Families Citing this family (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
PL3208583T3 (pl) 2016-02-19 2020-01-31 Mettler-Toledo Gmbh Urządzenie do przenoszenia siły z oddzielnym ramieniem dźwigni czujnika położenia
DE102016105985A1 (de) 2016-04-01 2017-10-05 Wipotec Wiege- Und Positioniersysteme Gmbh Verfahren und Vorrichtung zur Laserbearbeitung
PL231709B1 (pl) * 2016-05-25 2019-03-29 Lewandowski Witold Radwag Wagi Elektroniczne Automatyczny komparator wzorców masy
CN109870218B (zh) * 2017-12-04 2024-08-16 梅特勒-托利多仪器（上海）有限公司 称重传感器组件及包括其的电子天平
CN109870226B (zh) * 2017-12-04 2025-02-21 梅特勒-托利多仪器（上海）有限公司 称重传感器及其杠杆
DE102019113001A1 (de) * 2019-05-16 2020-11-19 Wipotec Gmbh Monolithischer Wägeblock
DE102019131101A1 (de) 2019-11-18 2021-05-20 Sartorius Lab Instruments Gmbh & Co. Kg Monolithisches Wägesystem und Verfahren zu dessen Herstellung
DE102020102606B4 (de) 2020-02-03 2022-02-24 Sartorius Lab Instruments Gmbh & Co. Kg Verfahren zum Herstellen eines Wägesystems
CN120907651A (zh) * 2025-10-10 2025-11-07 联公精密测量技术(杭州)有限公司 一种称重校准方法及装置

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CH673153A5 (fr) * 1986-12-24 1990-02-15 Sartorius Gmbh
DE3743073A1 (de) * 1986-12-24 1988-07-07 Sartorius Gmbh Elektromagnetisch kraftkompensierende waage mit optischem lagensensor
CH679074A5 (fr) * 1988-09-16 1991-12-13 Sartorius Gmbh
DE3838906C1 (fr) * 1988-11-17 1990-05-23 Sartorius Gmbh, 3400 Goettingen, De
DE4427087C2 (de) * 1994-07-30 1996-07-11 Sartorius Gmbh Oberschalige Waage
DE19923207C1 (de) * 1999-05-20 2000-10-12 Sartorius Gmbh Wägeaufnehmer
DE10326699B3 (de) * 2003-06-13 2005-01-13 Sartorius Ag Kompaktes Wägesystem
DE10342272B3 (de) * 2003-09-12 2004-09-16 Sartorius Ag Wägesystem nach dem Prinzip der elektromagnetischen Kraftkompensation
DE102004020145B3 (de) * 2004-04-24 2005-12-01 Sartorius Ag Schmales, seitlich eng aneinanderreihbares Wägesystem
DE202004011793U1 (de) * 2004-07-27 2005-09-01 Sartorius Ag Wägesystem nach dem Prinzip der elektromagnetischen Kraftkompensation
DE102006002711C5 (de) * 2006-01-19 2009-11-12 Wipotec Wiege- Und Positioniersysteme Gmbh Wägeaufnehmer
CN101706312B (zh) * 2009-11-23 2011-04-20 卢能晓 激光光电分析天平
PL2607866T3 (pl) * 2011-12-22 2015-05-29 Mettler Toledo Gmbh Ogniwo obciążnikowe według zasady elektromagnetycznej kompensacji siły z optoelektronicznym czujnikiem pozycji
EP2634543A1 (fr) * 2012-02-29 2013-09-04 Mettler-Toledo AG Cellule de pesage fonctionnant selon le principe de l'équilibrage des forces magnétique avec capteur de position optoélectronique

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Also Published As

Publication number Publication date
DE102013103791A1 (de) 2014-10-16
CN105143838B (zh) 2017-10-13
CN105143838A (zh) 2015-12-09
DE102013103791B4 (de) 2015-07-09
US20160033320A1 (en) 2016-02-04
WO2014169981A1 (fr) 2014-10-23
EP2986955A1 (fr) 2016-02-24
US9927284B2 (en) 2018-03-27

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