EP2749948A4 - Dispositif et procédé d'exposition à des interférences - Google Patents

Dispositif et procédé d'exposition à des interférences

Info

Publication number: EP2749948A4
Authority: EP; European Patent Office
Prior art keywords: control device; interference control; interference; control
Prior art date: 2011-08-22
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.): Granted

Application number

EP12825707.8A

Other languages

German (de)

English (en)

Other versions

EP2749948A1 (fr

EP2749948B1 (fr

Inventor

Qixin Xu

Fan Wang

Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)

Shanghai Micro Electronics Equipment Co Ltd

Original Assignee

Shanghai Micro Electronics Equipment Co Ltd

Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)

2011-08-22

Filing date

2012-08-16

Publication date

2015-05-20

2012-08-16 Application filed by Shanghai Micro Electronics Equipment Co Ltd filed Critical Shanghai Micro Electronics Equipment Co Ltd

2014-07-02 Publication of EP2749948A1 publication Critical patent/EP2749948A1/fr

2015-05-20 Publication of EP2749948A4 publication Critical patent/EP2749948A4/fr

2019-11-20 Application granted granted Critical

2019-11-20 Publication of EP2749948B1 publication Critical patent/EP2749948B1/fr

Status Active legal-status Critical Current

2032-08-16 Anticipated expiration legal-status Critical

Classifications

- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/20—Exposure; Apparatus therefor
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70058—Mask illumination systems
- G03F7/70208—Multiple illumination paths, e.g. radiation distribution devices, microlens illumination systems, multiplexers or demultiplexers for single or multiple projection systems
- G—PHYSICS
- G01—MEASURING; TESTING
- G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
- G01B11/00—Measuring arrangements characterised by the use of optical techniques
- G01B11/14—Measuring arrangements characterised by the use of optical techniques for measuring distance or clearance between spaced objects or spaced apertures
- G—PHYSICS
- G01—MEASURING; TESTING
- G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
- G01B11/00—Measuring arrangements characterised by the use of optical techniques
- G01B11/26—Measuring arrangements characterised by the use of optical techniques for measuring angles or tapers; for testing the alignment of axes
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/20—Exposure; Apparatus therefor
- G03F7/2002—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image
- G03F7/2004—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image characterised by the use of a particular light source, e.g. fluorescent lamps or deep UV light
- G03F7/2006—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image characterised by the use of a particular light source, e.g. fluorescent lamps or deep UV light using coherent light; using polarised light
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70408—Interferometric lithography; Holographic lithography; Self-imaging lithography, e.g. utilizing the Talbot effect
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70691—Handling of masks or workpieces
- G03F7/70775—Position control, e.g. interferometers or encoders for determining the stage position
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
- G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
- G03F9/7003—Alignment type or strategy, e.g. leveling, global alignment
- G03F9/7007—Alignment other than original with workpiece

Landscapes

Physics & Mathematics (AREA)
General Physics & Mathematics (AREA)
Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
Length Measuring Devices By Optical Means (AREA)

EP12825707.8A 2011-08-22 2012-08-16 Dispositif et procédé d'exposition à des interférences Active EP2749948B1 (fr)

Applications Claiming Priority (2)

Application Number	Priority Date	Filing Date	Title
CN201110241758.0A CN102955365B (zh)	2011-08-22	2011-08-22	一种干涉曝光装置及方法
PCT/CN2012/080258 WO2013026368A1 (fr)	2011-08-22	2012-08-16	Dispositif et procédé d'exposition à des interférences

Publications (3)

Publication Number	Publication Date
EP2749948A1 EP2749948A1 (fr)	2014-07-02
EP2749948A4 true EP2749948A4 (fr)	2015-05-20
EP2749948B1 EP2749948B1 (fr)	2019-11-20

Family

ID=47745937

Family Applications (1)

Application Number	Title	Priority Date	Filing Date
EP12825707.8A Active EP2749948B1 (fr)	2011-08-22	2012-08-16	Dispositif et procédé d'exposition à des interférences

Country Status (5)

Country	Link
US (1)	US9195146B2 (fr)
EP (1)	EP2749948B1 (fr)
KR (1)	KR101576071B1 (fr)
CN (1)	CN102955365B (fr)
WO (1)	WO2013026368A1 (fr)

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* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
CN103424794B (zh) *	2013-09-03	2016-01-20	苏州大学	一种透射式分光光栅及干涉光刻系统
JP6223091B2 (ja) *	2013-09-25	2017-11-01	株式会社Ｓｃｒｅｅｎホールディングス	位置計測装置、アライメント装置、パターン描画装置および位置計測方法
CN104698769B (zh) *	2013-12-10	2017-04-12	上海微电子装备有限公司	蓝宝石衬底的拼接曝光方法
JP2017054006A (ja) *	2015-09-09	2017-03-16	ウシオ電機株式会社	光照射方法、基板上構造体の製造方法および基板上構造体
AU2016340034B2 (en) *	2015-10-13	2021-05-06	Microtau Ip Pty Ltd	Microstructure patterns
JP6844363B2 (ja) *	2017-03-23	2021-03-17	ウシオ電機株式会社	光照射方法、基板上構造体の製造方法および露光装置
DE102017206968B4 (de) *	2017-04-26	2019-10-10	4Jet Microtech Gmbh & Co. Kg	Verfahren und Vorrichtung zum Herstellen von Riblets
CN109141225B (zh) *	2017-06-19	2020-11-13	河南科技大学	基于圆光栅的轴系五、六自由度误差测量方法及测量系统
CN109212916B (zh) *	2017-06-30	2022-02-15	上海微电子装备（集团）股份有限公司	一种曝光显影装置及方法
DE102017115169A1 (de) *	2017-07-06	2019-01-10	Temicon Gmbh	Erzeugung von belichteten Strukturen auf einem Werkstück
CN111427237B (zh) *	2019-01-10	2021-07-23	苏州苏大维格科技集团股份有限公司	大面积纳米光刻系统及其方法

Citations (2)

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US20090257039A1 (en) *	2008-04-10	2009-10-15	Canon Kabushiki Kaisha	Exposure apparatus and device manufacturing method
US20090323078A1 (en) *	2008-06-26	2009-12-31	Industrial Technology Research Institute	Method and system for step-and-align interference lithography

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US4631416A (en) *	1983-12-19	1986-12-23	Hewlett-Packard Company	Wafer/mask alignment system using diffraction gratings
CA1270934C (fr) *	1985-03-20	1990-06-26		Masques a modulation de phase spatiale et methodes de fabrication de ces masques et de reseaux de diffraction a dephasage
WO1997047997A1 (fr)	1996-06-10	1997-12-18	Holographic Lithography Systems, Inc.	Outil et procede holographiques de formation de motifs pour milieux de production
TW460758B (en) *	1998-05-14	2001-10-21	Holographic Lithography System	A holographic lithography system for generating an interference pattern suitable for selectively exposing a photosensitive material
US6882477B1 (en)	1999-11-10	2005-04-19	Massachusetts Institute Of Technology	Method and system for interference lithography utilizing phase-locked scanning beams
JP4514317B2 (ja) *	2000-11-27	2010-07-28	株式会社ミツトヨ	露光装置
JP2002198301A (ja) *	2000-12-27	2002-07-12	Mitsutoyo Corp	露光装置
US6522433B2 (en) *	2001-02-28	2003-02-18	Optical Switch Corporation	Interference lithography using holey fibers
US20020149757A1 (en) *	2001-02-28	2002-10-17	Optical Switch Corporation	Polarization vector alignment for interference lithography patterning
AUPS328402A0 (en) *	2002-06-28	2002-07-18	Australian Photonics Pty Limited	Writing of photo-induced structures
US7561252B2 (en)	2005-12-29	2009-07-14	Asml Holding N.V.	Interferometric lithography system and method used to generate equal path lengths of interfering beams
JP2007264476A (ja) *	2006-03-29	2007-10-11	Ricoh Co Ltd	周期構造パターン形成方法及び干渉露光装置
JP2008198799A (ja) *	2007-02-13	2008-08-28	Canon Inc	波面収差測定装置、露光装置及び波面収差測定方法

2011
- 2011-08-22 CN CN201110241758.0A patent/CN102955365B/zh active Active
2012
- 2012-08-16 WO PCT/CN2012/080258 patent/WO2013026368A1/fr not_active Ceased
- 2012-08-16 EP EP12825707.8A patent/EP2749948B1/fr active Active
- 2012-08-16 KR KR1020147006799A patent/KR101576071B1/ko active Active
- 2012-08-16 US US14/239,515 patent/US9195146B2/en active Active

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Publication number	Priority date	Publication date	Assignee	Title
US20090257039A1 (en) *	2008-04-10	2009-10-15	Canon Kabushiki Kaisha	Exposure apparatus and device manufacturing method
US20090323078A1 (en) *	2008-06-26	2009-12-31	Industrial Technology Research Institute	Method and system for step-and-align interference lithography

Non-Patent Citations (1)

* Cited by examiner, † Cited by third party
Title
See also references of WO2013026368A1 *

Also Published As

Publication number	Publication date
KR101576071B1 (ko)	2015-12-09
US9195146B2 (en)	2015-11-24
KR20140056341A (ko)	2014-05-09
EP2749948A1 (fr)	2014-07-02
EP2749948B1 (fr)	2019-11-20
CN102955365B (zh)	2014-12-17
WO2013026368A1 (fr)	2013-02-28
CN102955365A (zh)	2013-03-06
US20140176925A1 (en)	2014-06-26

Publication	Publication Date	Title
DE112012001807T8 (de)	2014-03-06	Steuervorrichtung
EP2753871A4 (fr)	2014-11-05	Dispositif d'éclairage et procédé de commande de l'éclairage
BR112013033888A2 (pt)	2017-02-14	dispositivo e método de comunicação
EP4131036C0 (fr)	2025-08-20	Dispositif mobile et son procédé de commande
PT2696423T (pt)	2016-11-04	Dispositivo de laminação e método de laminação
EP2727819A4 (fr)	2015-11-04	Dispositif de gouverne de bateau et procédé de gouverne de bateau
EP2747714A4 (fr)	2015-03-04	Dispositif de fusion extensible et procédé d'installation de celui-ci
PL2696754T3 (pl)	2015-03-31	Urządzenie i sposób pomiaru stresu
DK2402240T3 (da)	2013-09-23	Aero-cykelstyranordning
BR112015007125A2 (pt)	2017-07-04	aparelho e método
FI20115791A0 (fi)	2011-08-10	Harjoittelun ohjauslaite
BR112013033167A2 (pt)	2017-01-31	método, e, aparelho
EP2749948A4 (fr)	2015-05-20	Dispositif et procédé d'exposition à des interférences
BR112014009795A2 (pt)	2017-04-25	método
BR112014007958A2 (pt)	2017-04-11	método
BR112014001765A2 (pt)	2017-02-21	método
BR112014001237A2 (pt)	2017-02-21	método
EP2687931A4 (fr)	2015-08-26	Dispositif de commande et programme de système
EP2717219A4 (fr)	2016-05-25	Dispositif de détection d'objet, procédé de détection d'objet et programme de détection d'objet
EP2688305A4 (fr)	2014-12-31	Dispositif de commande de lentille et procédé de commande de lentille
BR112014025224A2 (pt)	2017-06-20	Dispositivo de controle de fluxo e método
BR112013019921A2 (pt)	2016-12-13	dispositivo de estimação de alcance de área e método de estimação de alcance de área
BR112013022820A2 (pt)	2016-12-06	método de tratamento
BR112014012552A2 (pt)	2017-06-13	aparelho, e método
EP2755363A4 (fr)	2014-12-31	Procédé et dispositif de distribution rapide de données

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