EP2419551A2 - Électrolyte et additifs tensio-actifs pour le dépôt galvanique de couches d'aluminium lisses et compactes à partir de liquides ioniques - Google Patents
Électrolyte et additifs tensio-actifs pour le dépôt galvanique de couches d'aluminium lisses et compactes à partir de liquides ioniquesInfo
- Publication number
- EP2419551A2 EP2419551A2 EP10708571A EP10708571A EP2419551A2 EP 2419551 A2 EP2419551 A2 EP 2419551A2 EP 10708571 A EP10708571 A EP 10708571A EP 10708571 A EP10708571 A EP 10708571A EP 2419551 A2 EP2419551 A2 EP 2419551A2
- Authority
- EP
- European Patent Office
- Prior art keywords
- alkyl
- cycloalkyl
- aryl
- aralkyl
- alkoxyaryl
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Withdrawn
Links
- 229910052782 aluminium Inorganic materials 0.000 title claims abstract description 61
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 title claims abstract description 60
- 239000002608 ionic liquid Substances 0.000 title claims abstract description 30
- 239000000654 additive Substances 0.000 title claims abstract description 17
- 239000003792 electrolyte Substances 0.000 title claims description 34
- 230000008021 deposition Effects 0.000 title description 18
- 238000000034 method Methods 0.000 claims abstract description 29
- 238000000151 deposition Methods 0.000 claims abstract description 21
- 150000001768 cations Chemical class 0.000 claims abstract description 17
- 229910052751 metal Inorganic materials 0.000 claims abstract description 17
- 239000002184 metal Substances 0.000 claims abstract description 17
- 150000003839 salts Chemical class 0.000 claims abstract description 15
- 238000004070 electrodeposition Methods 0.000 claims abstract description 13
- 150000001450 anions Chemical class 0.000 claims abstract description 12
- 230000000996 additive effect Effects 0.000 claims abstract description 8
- -1 pyridinium ions Chemical class 0.000 claims description 462
- 125000000217 alkyl group Chemical group 0.000 claims description 89
- 125000003118 aryl group Chemical group 0.000 claims description 62
- 229910052739 hydrogen Inorganic materials 0.000 claims description 61
- 125000000623 heterocyclic group Chemical group 0.000 claims description 58
- 125000005842 heteroatom Chemical group 0.000 claims description 54
- 125000000753 cycloalkyl group Chemical group 0.000 claims description 49
- 125000000524 functional group Chemical group 0.000 claims description 44
- 125000003710 aryl alkyl group Chemical group 0.000 claims description 35
- 238000005868 electrolysis reaction Methods 0.000 claims description 32
- 125000004171 alkoxy aryl group Chemical group 0.000 claims description 30
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Natural products CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 claims description 25
- 229910052760 oxygen Inorganic materials 0.000 claims description 24
- 125000001424 substituent group Chemical group 0.000 claims description 20
- 150000001875 compounds Chemical class 0.000 claims description 19
- DBMJMQXJHONAFJ-UHFFFAOYSA-M Sodium laurylsulphate Chemical compound [Na+].CCCCCCCCCCCCOS([O-])(=O)=O DBMJMQXJHONAFJ-UHFFFAOYSA-M 0.000 claims description 17
- 235000019333 sodium laurylsulphate Nutrition 0.000 claims description 17
- MVPPADPHJFYWMZ-UHFFFAOYSA-N chlorobenzene Chemical compound ClC1=CC=CC=C1 MVPPADPHJFYWMZ-UHFFFAOYSA-N 0.000 claims description 16
- 239000000460 chlorine Substances 0.000 claims description 12
- 239000010949 copper Substances 0.000 claims description 12
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 claims description 11
- 229910052717 sulfur Inorganic materials 0.000 claims description 10
- ZAMOUSCENKQFHK-UHFFFAOYSA-N Chlorine atom Chemical compound [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 claims description 8
- IOJUPLGTWVMSFF-UHFFFAOYSA-N benzothiazole Chemical compound C1=CC=C2SC=NC2=C1 IOJUPLGTWVMSFF-UHFFFAOYSA-N 0.000 claims description 8
- WOWHHFRSBJGXCM-UHFFFAOYSA-M cetyltrimethylammonium chloride Chemical compound [Cl-].CCCCCCCCCCCCCCCC[N+](C)(C)C WOWHHFRSBJGXCM-UHFFFAOYSA-M 0.000 claims description 8
- 229910052801 chlorine Inorganic materials 0.000 claims description 8
- RFFLAFLAYFXFSW-UHFFFAOYSA-N 1,2-dichlorobenzene Chemical compound ClC1=CC=CC=C1Cl RFFLAFLAYFXFSW-UHFFFAOYSA-N 0.000 claims description 6
- WKBOTKDWSSQWDR-UHFFFAOYSA-N Bromine atom Chemical compound [Br] WKBOTKDWSSQWDR-UHFFFAOYSA-N 0.000 claims description 6
- PXGOKWXKJXAPGV-UHFFFAOYSA-N Fluorine Chemical compound FF PXGOKWXKJXAPGV-UHFFFAOYSA-N 0.000 claims description 6
- GDTBXPJZTBHREO-UHFFFAOYSA-N bromine Substances BrBr GDTBXPJZTBHREO-UHFFFAOYSA-N 0.000 claims description 6
- 229910052794 bromium Inorganic materials 0.000 claims description 6
- 239000011737 fluorine Substances 0.000 claims description 6
- 229910052731 fluorine Inorganic materials 0.000 claims description 6
- 239000011734 sodium Substances 0.000 claims description 6
- 239000010959 steel Substances 0.000 claims description 6
- 229910000831 Steel Inorganic materials 0.000 claims description 5
- 229910002804 graphite Inorganic materials 0.000 claims description 5
- 239000010439 graphite Substances 0.000 claims description 5
- ZPQOPVIELGIULI-UHFFFAOYSA-N 1,3-dichlorobenzene Chemical compound ClC1=CC=CC(Cl)=C1 ZPQOPVIELGIULI-UHFFFAOYSA-N 0.000 claims description 4
- 229910045601 alloy Inorganic materials 0.000 claims description 4
- 239000000956 alloy Substances 0.000 claims description 4
- PNDPGZBMCMUPRI-UHFFFAOYSA-N iodine Chemical compound II PNDPGZBMCMUPRI-UHFFFAOYSA-N 0.000 claims description 4
- 239000000463 material Substances 0.000 claims description 4
- 125000003944 tolyl group Chemical group 0.000 claims description 4
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 claims description 3
- 239000003960 organic solvent Substances 0.000 claims description 3
- 239000002904 solvent Substances 0.000 claims description 3
- RELMFMZEBKVZJC-UHFFFAOYSA-N 1,2,3-trichlorobenzene Chemical compound ClC1=CC=CC(Cl)=C1Cl RELMFMZEBKVZJC-UHFFFAOYSA-N 0.000 claims description 2
- CSNIZNHTOVFARY-UHFFFAOYSA-N 1,2-benzothiazole Chemical compound C1=CC=C2C=NSC2=C1 CSNIZNHTOVFARY-UHFFFAOYSA-N 0.000 claims description 2
- KTZQTRPPVKQPFO-UHFFFAOYSA-N 1,2-benzoxazole Chemical compound C1=CC=C2C=NOC2=C1 KTZQTRPPVKQPFO-UHFFFAOYSA-N 0.000 claims description 2
- BCMCBBGGLRIHSE-UHFFFAOYSA-N 1,3-benzoxazole Chemical compound C1=CC=C2OC=NC2=C1 BCMCBBGGLRIHSE-UHFFFAOYSA-N 0.000 claims description 2
- BKSKBIKKJLHPLR-UHFFFAOYSA-N 1-ethylindazole Chemical compound C1=CC=C2N(CC)N=CC2=C1 BKSKBIKKJLHPLR-UHFFFAOYSA-N 0.000 claims description 2
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 claims description 2
- 239000010406 cathode material Substances 0.000 claims description 2
- 229910052802 copper Inorganic materials 0.000 claims description 2
- 239000010935 stainless steel Substances 0.000 claims description 2
- 229910001220 stainless steel Inorganic materials 0.000 claims description 2
- PXDAXYDMZCYZNH-UHFFFAOYSA-N 3-methyl-2h-1,3-benzothiazole Chemical compound C1=CC=C2N(C)CSC2=C1 PXDAXYDMZCYZNH-UHFFFAOYSA-N 0.000 claims 1
- LZZYPRNAOMGNLH-UHFFFAOYSA-M Cetrimonium bromide Chemical compound [Br-].CCCCCCCCCCCCCCCC[N+](C)(C)C LZZYPRNAOMGNLH-UHFFFAOYSA-M 0.000 claims 1
- RAXXELZNTBOGNW-UHFFFAOYSA-O Imidazolium Chemical compound C1=C[NH+]=CN1 RAXXELZNTBOGNW-UHFFFAOYSA-O 0.000 claims 1
- 150000004645 aluminates Chemical class 0.000 claims 1
- 239000010405 anode material Substances 0.000 claims 1
- 229910052759 nickel Inorganic materials 0.000 claims 1
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 62
- 239000001257 hydrogen Substances 0.000 description 60
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 41
- 150000003254 radicals Chemical class 0.000 description 37
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 32
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 32
- 150000002431 hydrogen Chemical group 0.000 description 28
- 125000003545 alkoxy group Chemical group 0.000 description 26
- 229910052736 halogen Inorganic materials 0.000 description 23
- 150000002367 halogens Chemical class 0.000 description 23
- 125000004104 aryloxy group Chemical group 0.000 description 18
- 125000004432 carbon atom Chemical group C* 0.000 description 18
- 239000001301 oxygen Substances 0.000 description 17
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 description 16
- WEVYAHXRMPXWCK-UHFFFAOYSA-N Acetonitrile Chemical compound CC#N WEVYAHXRMPXWCK-UHFFFAOYSA-N 0.000 description 15
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 15
- 125000004108 n-butyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 14
- 125000004434 sulfur atom Chemical group 0.000 description 13
- 229910052799 carbon Inorganic materials 0.000 description 12
- 239000011248 coating agent Substances 0.000 description 11
- 238000000576 coating method Methods 0.000 description 11
- 125000004093 cyano group Chemical group *C#N 0.000 description 11
- 238000002474 experimental method Methods 0.000 description 11
- 125000001841 imino group Chemical group [H]N=* 0.000 description 11
- 239000011261 inert gas Substances 0.000 description 11
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 10
- KFZMGEQAYNKOFK-UHFFFAOYSA-N Isopropanol Chemical compound CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 description 10
- 239000012456 homogeneous solution Substances 0.000 description 10
- 239000011541 reaction mixture Substances 0.000 description 10
- 125000000959 isobutyl group Chemical group [H]C([H])([H])C([H])(C([H])([H])[H])C([H])([H])* 0.000 description 9
- 125000001280 n-hexyl group Chemical group C(CCCCC)* 0.000 description 9
- 229920006395 saturated elastomer Polymers 0.000 description 9
- 229910004283 SiO 4 Inorganic materials 0.000 description 8
- 125000000740 n-pentyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 8
- 125000004123 n-propyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])* 0.000 description 8
- 229910052757 nitrogen Inorganic materials 0.000 description 8
- 125000001731 2-cyanoethyl group Chemical group [H]C([H])(*)C([H])([H])C#N 0.000 description 7
- 125000001931 aliphatic group Chemical group 0.000 description 7
- 125000005843 halogen group Chemical group 0.000 description 7
- 125000001449 isopropyl group Chemical group [H]C([H])([H])C([H])(*)C([H])([H])[H] 0.000 description 7
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 7
- 125000002914 sec-butyl group Chemical group [H]C([H])([H])C([H])([H])C([H])(*)C([H])([H])[H] 0.000 description 6
- 150000003512 tertiary amines Chemical class 0.000 description 6
- 125000002777 acetyl group Chemical group [H]C([H])([H])C(*)=O 0.000 description 5
- 125000001797 benzyl group Chemical group [H]C1=C([H])C([H])=C(C([H])=C1[H])C([H])([H])* 0.000 description 5
- 150000001721 carbon Chemical group 0.000 description 5
- 150000002500 ions Chemical class 0.000 description 5
- IQQRAVYLUAZUGX-UHFFFAOYSA-N 1-butyl-3-methylimidazolium Chemical compound CCCCN1C=C[N+](C)=C1 IQQRAVYLUAZUGX-UHFFFAOYSA-N 0.000 description 4
- AMKUSFIBHAUBIJ-UHFFFAOYSA-N 1-hexylpyridin-1-ium Chemical compound CCCCCC[N+]1=CC=CC=C1 AMKUSFIBHAUBIJ-UHFFFAOYSA-N 0.000 description 4
- XDEQOBPALZZTCA-UHFFFAOYSA-N 1-octylpyridin-1-ium Chemical compound CCCCCCCC[N+]1=CC=CC=C1 XDEQOBPALZZTCA-UHFFFAOYSA-N 0.000 description 4
- 125000004398 2-methyl-2-butyl group Chemical group CC(C)(CC)* 0.000 description 4
- 125000004918 2-methyl-2-pentyl group Chemical group CC(C)(CCC)* 0.000 description 4
- 125000004922 2-methyl-3-pentyl group Chemical group CC(C)C(CC)* 0.000 description 4
- 125000004493 2-methylbut-1-yl group Chemical group CC(C*)CC 0.000 description 4
- 125000004917 3-methyl-2-butyl group Chemical group CC(C(C)*)C 0.000 description 4
- 125000004919 3-methyl-2-pentyl group Chemical group CC(C(C)*)CC 0.000 description 4
- 125000004921 3-methyl-3-pentyl group Chemical group CC(CC)(CC)* 0.000 description 4
- 125000004920 4-methyl-2-pentyl group Chemical group CC(CC(C)*)C 0.000 description 4
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 4
- GRYLNZFGIOXLOG-UHFFFAOYSA-N Nitric acid Chemical compound O[N+]([O-])=O GRYLNZFGIOXLOG-UHFFFAOYSA-N 0.000 description 4
- 125000001972 isopentyl group Chemical group [H]C([H])([H])C([H])(C([H])([H])[H])C([H])([H])C([H])([H])* 0.000 description 4
- 239000000203 mixture Substances 0.000 description 4
- 229910017604 nitric acid Inorganic materials 0.000 description 4
- 125000000449 nitro group Chemical group [O-][N+](*)=O 0.000 description 4
- 125000003538 pentan-3-yl group Chemical group [H]C([H])([H])C([H])([H])C([H])(*)C([H])([H])C([H])([H])[H] 0.000 description 4
- 239000000725 suspension Substances 0.000 description 4
- KEQTWHPMSVAFDA-UHFFFAOYSA-N 2,3-dihydro-1h-pyrazole Chemical compound C1NNC=C1 KEQTWHPMSVAFDA-UHFFFAOYSA-N 0.000 description 3
- 125000004200 2-methoxyethyl group Chemical group [H]C([H])([H])OC([H])([H])C([H])([H])* 0.000 description 3
- 125000006201 3-phenylpropyl group Chemical group [H]C1=C([H])C([H])=C(C([H])=C1[H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 3
- CTQNGGLPUBDAKN-UHFFFAOYSA-N O-Xylene Chemical compound CC1=CC=CC=C1C CTQNGGLPUBDAKN-UHFFFAOYSA-N 0.000 description 3
- NINIDFKCEFEMDL-UHFFFAOYSA-N Sulfur Chemical compound [S] NINIDFKCEFEMDL-UHFFFAOYSA-N 0.000 description 3
- 125000002015 acyclic group Chemical group 0.000 description 3
- 125000004453 alkoxycarbonyl group Chemical group 0.000 description 3
- 125000004181 carboxyalkyl group Chemical group 0.000 description 3
- 125000004122 cyclic group Chemical group 0.000 description 3
- 150000002148 esters Chemical class 0.000 description 3
- 239000004744 fabric Substances 0.000 description 3
- ISNICOKBNZOJQG-UHFFFAOYSA-O guanidinium ion Chemical compound C[NH+]=C(N(C)C)N(C)C ISNICOKBNZOJQG-UHFFFAOYSA-O 0.000 description 3
- 150000002739 metals Chemical group 0.000 description 3
- LEHULSCLOPRJSL-UHFFFAOYSA-N n,n-dibutylpentan-1-amine Chemical compound CCCCCN(CCCC)CCCC LEHULSCLOPRJSL-UHFFFAOYSA-N 0.000 description 3
- 125000004430 oxygen atom Chemical group O* 0.000 description 3
- 125000000636 p-nitrophenyl group Chemical group [H]C1=C([H])C(=C([H])C([H])=C1*)[N+]([O-])=O 0.000 description 3
- 125000001147 pentyl group Chemical group C(CCCC)* 0.000 description 3
- 125000002924 primary amino group Chemical group [H]N([H])* 0.000 description 3
- 125000001436 propyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])[H] 0.000 description 3
- 125000003107 substituted aryl group Chemical group 0.000 description 3
- 239000011593 sulfur Substances 0.000 description 3
- 150000003568 thioethers Chemical class 0.000 description 3
- 125000002023 trifluoromethyl group Chemical group FC(F)(F)* 0.000 description 3
- 125000004385 trihaloalkyl group Chemical group 0.000 description 3
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 description 3
- 229920002554 vinyl polymer Polymers 0.000 description 3
- 239000008096 xylene Substances 0.000 description 3
- FKTXDTWDCPTPHK-UHFFFAOYSA-N 1,1,1,2,3,3,3-heptafluoropropane Chemical group FC(F)(F)[C](F)C(F)(F)F FKTXDTWDCPTPHK-UHFFFAOYSA-N 0.000 description 2
- KCUGPPHNMASOTE-UHFFFAOYSA-N 1,2,3-trimethylimidazol-1-ium Chemical compound CC=1N(C)C=C[N+]=1C KCUGPPHNMASOTE-UHFFFAOYSA-N 0.000 description 2
- KLNYRFBLEYSXHW-UHFFFAOYSA-N 1,2-diethylpyridin-1-ium Chemical compound CCC1=CC=CC=[N+]1CC KLNYRFBLEYSXHW-UHFFFAOYSA-N 0.000 description 2
- JXKFTCYRLIOPQE-UHFFFAOYSA-N 1,2-dimethyl-3-octylimidazol-1-ium Chemical compound CCCCCCCC[N+]=1C=CN(C)C=1C JXKFTCYRLIOPQE-UHFFFAOYSA-N 0.000 description 2
- UMZDENILBZKMFY-UHFFFAOYSA-N 1,2-dimethylpyridin-1-ium Chemical compound CC1=CC=CC=[N+]1C UMZDENILBZKMFY-UHFFFAOYSA-N 0.000 description 2
- NOBVKAMFUBMCCA-UHFFFAOYSA-N 1,3,4,5-tetramethylimidazol-1-ium Chemical compound CC1=C(C)[N+](C)=CN1C NOBVKAMFUBMCCA-UHFFFAOYSA-N 0.000 description 2
- HVVRUQBMAZRKPJ-UHFFFAOYSA-N 1,3-dimethylimidazolium Chemical compound CN1C=C[N+](C)=C1 HVVRUQBMAZRKPJ-UHFFFAOYSA-N 0.000 description 2
- YAUDCIYPLNVQLB-UHFFFAOYSA-N 1,4,5-trimethyl-3-octylimidazol-1-ium Chemical compound CCCCCCCCN1C=[N+](C)C(C)=C1C YAUDCIYPLNVQLB-UHFFFAOYSA-N 0.000 description 2
- CASWLBSPGZUOFP-UHFFFAOYSA-N 1,4-dimethyl-3-octylimidazol-1-ium Chemical compound CCCCCCCCN1C=[N+](C)C=C1C CASWLBSPGZUOFP-UHFFFAOYSA-N 0.000 description 2
- ZYWSJXQRTWKCSV-UHFFFAOYSA-N 1,5-diethyl-2-methylpyridin-1-ium Chemical compound CCC1=CC=C(C)[N+](CC)=C1 ZYWSJXQRTWKCSV-UHFFFAOYSA-N 0.000 description 2
- XUAXVBUVQVRIIQ-UHFFFAOYSA-N 1-butyl-2,3-dimethylimidazol-3-ium Chemical compound CCCCN1C=C[N+](C)=C1C XUAXVBUVQVRIIQ-UHFFFAOYSA-N 0.000 description 2
- GYZXRPOUUZKBAT-UHFFFAOYSA-N 1-butyl-2-ethylpyridin-1-ium Chemical compound CCCC[N+]1=CC=CC=C1CC GYZXRPOUUZKBAT-UHFFFAOYSA-N 0.000 description 2
- BHIGPVGNEXDQBL-UHFFFAOYSA-N 1-butyl-2-methylpyridin-1-ium Chemical compound CCCC[N+]1=CC=CC=C1C BHIGPVGNEXDQBL-UHFFFAOYSA-N 0.000 description 2
- RIDWYWYHKGNNOF-UHFFFAOYSA-N 1-butyl-3,4,5-trimethylimidazol-3-ium Chemical compound CCCCN1C=[N+](C)C(C)=C1C RIDWYWYHKGNNOF-UHFFFAOYSA-N 0.000 description 2
- VZGDWXRMRQTAPB-UHFFFAOYSA-N 1-butyl-3-ethyl-2-methylpyridin-1-ium Chemical compound CCCC[N+]1=CC=CC(CC)=C1C VZGDWXRMRQTAPB-UHFFFAOYSA-N 0.000 description 2
- MCMFEZDRQOJKMN-UHFFFAOYSA-N 1-butylimidazole Chemical compound CCCCN1C=CN=C1 MCMFEZDRQOJKMN-UHFFFAOYSA-N 0.000 description 2
- REACWASHYHDPSQ-UHFFFAOYSA-N 1-butylpyridin-1-ium Chemical compound CCCC[N+]1=CC=CC=C1 REACWASHYHDPSQ-UHFFFAOYSA-N 0.000 description 2
- UAGDLNCPPXLUJE-UHFFFAOYSA-N 1-dodecyl-2-ethylpyridin-1-ium Chemical compound CCCCCCCCCCCC[N+]1=CC=CC=C1CC UAGDLNCPPXLUJE-UHFFFAOYSA-N 0.000 description 2
- OMPLFUALYIEKNF-UHFFFAOYSA-N 1-dodecyl-2-methylpyridin-1-ium Chemical compound CCCCCCCCCCCC[N+]1=CC=CC=C1C OMPLFUALYIEKNF-UHFFFAOYSA-N 0.000 description 2
- MKMZBNMOMCOCOA-UHFFFAOYSA-N 1-dodecyl-3-ethyl-2-methylpyridin-1-ium Chemical compound CCCCCCCCCCCC[N+]1=CC=CC(CC)=C1C MKMZBNMOMCOCOA-UHFFFAOYSA-N 0.000 description 2
- ILQHIGIKULUQFQ-UHFFFAOYSA-N 1-dodecyl-3-methylimidazolium Chemical compound CCCCCCCCCCCCN1C=C[N+](C)=C1 ILQHIGIKULUQFQ-UHFFFAOYSA-N 0.000 description 2
- FFYRIXSGFSWFAQ-UHFFFAOYSA-N 1-dodecylpyridin-1-ium Chemical compound CCCCCCCCCCCC[N+]1=CC=CC=C1 FFYRIXSGFSWFAQ-UHFFFAOYSA-N 0.000 description 2
- IRGDPGYNHSIIJJ-UHFFFAOYSA-N 1-ethyl-2,3-dimethylimidazol-3-ium Chemical compound CCN1C=C[N+](C)=C1C IRGDPGYNHSIIJJ-UHFFFAOYSA-N 0.000 description 2
- FUZQTBHDJAOMJB-UHFFFAOYSA-N 1-ethyl-2-methylpyridin-1-ium Chemical compound CC[N+]1=CC=CC=C1C FUZQTBHDJAOMJB-UHFFFAOYSA-N 0.000 description 2
- LNCAFWKXQYNUFX-UHFFFAOYSA-N 1-ethyl-3,4,5-trimethylimidazol-3-ium Chemical compound CCN1C=[N+](C)C(C)=C1C LNCAFWKXQYNUFX-UHFFFAOYSA-N 0.000 description 2
- NJMWOUFKYKNWDW-UHFFFAOYSA-N 1-ethyl-3-methylimidazolium Chemical compound CCN1C=C[N+](C)=C1 NJMWOUFKYKNWDW-UHFFFAOYSA-N 0.000 description 2
- OIDIRWZVUWCCCO-UHFFFAOYSA-N 1-ethylpyridin-1-ium Chemical compound CC[N+]1=CC=CC=C1 OIDIRWZVUWCCCO-UHFFFAOYSA-N 0.000 description 2
- OPVAFCQZNIZLRH-UHFFFAOYSA-N 1-hexadecyl-2-methylpyridin-1-ium Chemical compound CCCCCCCCCCCCCCCC[N+]1=CC=CC=C1C OPVAFCQZNIZLRH-UHFFFAOYSA-N 0.000 description 2
- DCLKMMFVIGOXQN-UHFFFAOYSA-N 1-hexadecyl-3-methylimidazol-3-ium Chemical compound CCCCCCCCCCCCCCCCN1C=C[N+](C)=C1 DCLKMMFVIGOXQN-UHFFFAOYSA-N 0.000 description 2
- OLRSYSUCJIKFOL-UHFFFAOYSA-N 1-hexyl-2-methylpyridin-1-ium Chemical compound CCCCCC[N+]1=CC=CC=C1C OLRSYSUCJIKFOL-UHFFFAOYSA-N 0.000 description 2
- RVEJOWGVUQQIIZ-UHFFFAOYSA-N 1-hexyl-3-methylimidazolium Chemical compound CCCCCCN1C=C[N+](C)=C1 RVEJOWGVUQQIIZ-UHFFFAOYSA-N 0.000 description 2
- BMKLRPQTYXVGNK-UHFFFAOYSA-N 1-methyl-3-tetradecylimidazol-1-ium Chemical compound CCCCCCCCCCCCCCN1C=C[N+](C)=C1 BMKLRPQTYXVGNK-UHFFFAOYSA-N 0.000 description 2
- HXQHRUJXQJEGER-UHFFFAOYSA-N 1-methylbenzotriazole Chemical compound C1=CC=C2N(C)N=NC2=C1 HXQHRUJXQJEGER-UHFFFAOYSA-N 0.000 description 2
- 125000004343 1-phenylethyl group Chemical group [H]C1=C([H])C([H])=C(C([H])=C1[H])C([H])(*)C([H])([H])[H] 0.000 description 2
- SIHFYNZIBKOFFK-UHFFFAOYSA-N 1-tetradecylpyridin-1-ium Chemical compound CCCCCCCCCCCCCC[N+]1=CC=CC=C1 SIHFYNZIBKOFFK-UHFFFAOYSA-N 0.000 description 2
- GIWQSPITLQVMSG-UHFFFAOYSA-O 2,3-dimethylimidazolium ion Chemical compound CC1=[NH+]C=CN1C GIWQSPITLQVMSG-UHFFFAOYSA-O 0.000 description 2
- KLIDCXVFHGNTTM-UHFFFAOYSA-N 2,6-dimethoxyphenol Chemical group COC1=CC=CC(OC)=C1O KLIDCXVFHGNTTM-UHFFFAOYSA-N 0.000 description 2
- 125000003456 2,6-dinitrophenyl group Chemical group [H]C1=C([H])C(=C(*)C(=C1[H])[N+]([O-])=O)[N+]([O-])=O 0.000 description 2
- 125000003006 2-dimethylaminoethyl group Chemical group [H]C([H])([H])N(C([H])([H])[H])C([H])([H])C([H])([H])* 0.000 description 2
- YKZAWSIPYMCKTA-UHFFFAOYSA-N 2-ethyl-1-hexadecylpyridin-1-ium Chemical compound CCCCCCCCCCCCCCCC[N+]1=CC=CC=C1CC YKZAWSIPYMCKTA-UHFFFAOYSA-N 0.000 description 2
- LAZBQCSALWFNRK-UHFFFAOYSA-N 2-ethyl-1-hexylpyridin-1-ium Chemical compound CCCCCC[N+]1=CC=CC=C1CC LAZBQCSALWFNRK-UHFFFAOYSA-N 0.000 description 2
- BJMBCVIFMXOIIH-UHFFFAOYSA-N 2-ethyl-1-methylpyridin-1-ium Chemical compound CCC1=CC=CC=[N+]1C BJMBCVIFMXOIIH-UHFFFAOYSA-N 0.000 description 2
- NJTLATCJDPHVMV-UHFFFAOYSA-N 2-ethyl-1-octylpyridin-1-ium Chemical compound CCCCCCCC[N+]1=CC=CC=C1CC NJTLATCJDPHVMV-UHFFFAOYSA-N 0.000 description 2
- HRDVJODPWYQQCG-UHFFFAOYSA-N 2-ethyl-1-tetradecylpyridin-1-ium Chemical compound CCCCCCCCCCCCCC[N+]1=CC=CC=C1CC HRDVJODPWYQQCG-UHFFFAOYSA-N 0.000 description 2
- UINDRJHZBAGQFD-UHFFFAOYSA-O 2-ethyl-3-methyl-1h-imidazol-3-ium Chemical compound CCC1=[NH+]C=CN1C UINDRJHZBAGQFD-UHFFFAOYSA-O 0.000 description 2
- UMXZFNYZWGQZAF-UHFFFAOYSA-O 2-hexyl-3-methyl-1h-imidazol-3-ium Chemical compound CCCCCCC=1NC=C[N+]=1C UMXZFNYZWGQZAF-UHFFFAOYSA-O 0.000 description 2
- UAAXLYUGYHRBLE-UHFFFAOYSA-N 2-methyl-1-octylpyridin-1-ium Chemical compound CCCCCCCC[N+]1=CC=CC=C1C UAAXLYUGYHRBLE-UHFFFAOYSA-N 0.000 description 2
- FCPJQWAQQWCBII-UHFFFAOYSA-N 2-methyl-1-tetradecylpyridin-1-ium Chemical compound CCCCCCCCCCCCCC[N+]1=CC=CC=C1C FCPJQWAQQWCBII-UHFFFAOYSA-N 0.000 description 2
- RDTIFYBSPQERAS-UHFFFAOYSA-O 3,4,5-trimethyl-1h-imidazol-3-ium Chemical compound CC=1NC=[N+](C)C=1C RDTIFYBSPQERAS-UHFFFAOYSA-O 0.000 description 2
- BLHTXORQJNCSII-UHFFFAOYSA-O 3,5-dimethyl-1h-imidazol-3-ium Chemical compound CC1=C[N+](C)=CN1 BLHTXORQJNCSII-UHFFFAOYSA-O 0.000 description 2
- SSENHTOBLYRWKU-UHFFFAOYSA-O 3-(2-phenylethyl)-1h-imidazol-3-ium Chemical compound C=1C=CC=CC=1CCN1C=C[NH+]=C1 SSENHTOBLYRWKU-UHFFFAOYSA-O 0.000 description 2
- KANKBJJYRFLSIR-UHFFFAOYSA-N 3-ethyl-1,4-dimethylimidazol-1-ium Chemical compound CCN1C=[N+](C)C=C1C KANKBJJYRFLSIR-UHFFFAOYSA-N 0.000 description 2
- DLCGJBUWOXTQBD-UHFFFAOYSA-N 3-ethyl-1-hexyl-2-methylpyridin-1-ium Chemical compound CCCCCC[N+]1=CC=CC(CC)=C1C DLCGJBUWOXTQBD-UHFFFAOYSA-N 0.000 description 2
- SBMAVGCFVCQWMA-UHFFFAOYSA-N 3-ethyl-2-methyl-1-octylpyridin-1-ium Chemical compound CCCCCCCC[N+]1=CC=CC(CC)=C1C SBMAVGCFVCQWMA-UHFFFAOYSA-N 0.000 description 2
- WXMVWUBWIHZLMQ-UHFFFAOYSA-N 3-methyl-1-octylimidazolium Chemical compound CCCCCCCCN1C=C[N+](C)=C1 WXMVWUBWIHZLMQ-UHFFFAOYSA-N 0.000 description 2
- 125000004800 4-bromophenyl group Chemical group [H]C1=C([H])C(*)=C([H])C([H])=C1Br 0.000 description 2
- 125000006283 4-chlorobenzyl group Chemical group [H]C1=C([H])C(=C([H])C([H])=C1Cl)C([H])([H])* 0.000 description 2
- HSFKRYDUVJTWHM-UHFFFAOYSA-N 5-ethyl-1,2-dimethylpyridin-1-ium Chemical compound CCC1=CC=C(C)[N+](C)=C1 HSFKRYDUVJTWHM-UHFFFAOYSA-N 0.000 description 2
- ZCYVEMRRCGMTRW-UHFFFAOYSA-N 7553-56-2 Chemical compound [I] ZCYVEMRRCGMTRW-UHFFFAOYSA-N 0.000 description 2
- CPELXLSAUQHCOX-UHFFFAOYSA-M Bromide Chemical compound [Br-] CPELXLSAUQHCOX-UHFFFAOYSA-M 0.000 description 2
- UIOAQJNADLELPQ-UHFFFAOYSA-N C[C]1OCCO1 Chemical group C[C]1OCCO1 UIOAQJNADLELPQ-UHFFFAOYSA-N 0.000 description 2
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 2
- JGFZNNIVVJXRND-UHFFFAOYSA-N N,N-Diisopropylethylamine (DIPEA) Chemical compound CCN(C(C)C)C(C)C JGFZNNIVVJXRND-UHFFFAOYSA-N 0.000 description 2
- PQBAWAQIRZIWIV-UHFFFAOYSA-N N-methylpyridinium Chemical compound C[N+]1=CC=CC=C1 PQBAWAQIRZIWIV-UHFFFAOYSA-N 0.000 description 2
- 229910019142 PO4 Inorganic materials 0.000 description 2
- OAICVXFJPJFONN-UHFFFAOYSA-N Phosphorus Chemical compound [P] OAICVXFJPJFONN-UHFFFAOYSA-N 0.000 description 2
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 2
- 125000003342 alkenyl group Chemical group 0.000 description 2
- 125000004183 alkoxy alkyl group Chemical group 0.000 description 2
- 125000004429 atom Chemical group 0.000 description 2
- 125000001164 benzothiazolyl group Chemical group S1C(=NC2=C1C=CC=C2)* 0.000 description 2
- 125000004541 benzoxazolyl group Chemical group O1C(=NC2=C1C=CC=C2)* 0.000 description 2
- 125000002619 bicyclic group Chemical group 0.000 description 2
- WERYXYBDKMZEQL-UHFFFAOYSA-N butane-1,4-diol Chemical class OCCCCO WERYXYBDKMZEQL-UHFFFAOYSA-N 0.000 description 2
- 125000002915 carbonyl group Chemical group [*:2]C([*:1])=O 0.000 description 2
- 125000003178 carboxy group Chemical group [H]OC(*)=O 0.000 description 2
- 150000001735 carboxylic acids Chemical class 0.000 description 2
- NEUSVAOJNUQRTM-UHFFFAOYSA-N cetylpyridinium Chemical compound CCCCCCCCCCCCCCCC[N+]1=CC=CC=C1 NEUSVAOJNUQRTM-UHFFFAOYSA-N 0.000 description 2
- 125000004218 chloromethyl group Chemical group [H]C([H])(Cl)* 0.000 description 2
- 125000000068 chlorophenyl group Chemical group 0.000 description 2
- 238000010276 construction Methods 0.000 description 2
- 230000007797 corrosion Effects 0.000 description 2
- 238000005260 corrosion Methods 0.000 description 2
- 125000000392 cycloalkenyl group Chemical group 0.000 description 2
- 125000000113 cyclohexyl group Chemical group [H]C1([H])C([H])([H])C([H])([H])C([H])(*)C([H])([H])C1([H])[H] 0.000 description 2
- 125000000640 cyclooctyl group Chemical group [H]C1([H])C([H])([H])C([H])([H])C([H])([H])C([H])(*)C([H])([H])C([H])([H])C1([H])[H] 0.000 description 2
- 125000001511 cyclopentyl group Chemical group [H]C1([H])C([H])([H])C([H])([H])C([H])(*)C1([H])[H] 0.000 description 2
- 125000002704 decyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 2
- 125000004188 dichlorophenyl group Chemical group 0.000 description 2
- 125000001664 diethylamino group Chemical group [H]C([H])([H])C([H])([H])N(*)C([H])([H])C([H])([H])[H] 0.000 description 2
- GGSUCNLOZRCGPQ-UHFFFAOYSA-N diethylaniline Chemical compound CCN(CC)C1=CC=CC=C1 GGSUCNLOZRCGPQ-UHFFFAOYSA-N 0.000 description 2
- 125000001028 difluoromethyl group Chemical group [H]C(F)(F)* 0.000 description 2
- 125000004212 difluorophenyl group Chemical group 0.000 description 2
- 125000005805 dimethoxy phenyl group Chemical group 0.000 description 2
- ZZVUWRFHKOJYTH-UHFFFAOYSA-N diphenhydramine Chemical group C=1C=CC=CC=1C(OCCN(C)C)C1=CC=CC=C1 ZZVUWRFHKOJYTH-UHFFFAOYSA-N 0.000 description 2
- 125000004216 fluoromethyl group Chemical group [H]C([H])(F)* 0.000 description 2
- 125000002541 furyl group Chemical group 0.000 description 2
- 150000002334 glycols Chemical class 0.000 description 2
- 150000004820 halides Chemical class 0.000 description 2
- 125000006343 heptafluoro propyl group Chemical group 0.000 description 2
- 125000003187 heptyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 2
- 125000004051 hexyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 2
- 150000003949 imides Chemical class 0.000 description 2
- 125000001041 indolyl group Chemical group 0.000 description 2
- 239000011630 iodine Substances 0.000 description 2
- 229910052740 iodine Inorganic materials 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- DLMICMXXVVMDNV-UHFFFAOYSA-N n,n-di(propan-2-yl)propan-1-amine Chemical compound CCCN(C(C)C)C(C)C DLMICMXXVVMDNV-UHFFFAOYSA-N 0.000 description 2
- HTDCNKTXDLRMHZ-UHFFFAOYSA-N n,n-dibutylcyclohexanamine Chemical compound CCCCN(CCCC)C1CCCCC1 HTDCNKTXDLRMHZ-UHFFFAOYSA-N 0.000 description 2
- UPNQFYMXRSHQBY-UHFFFAOYSA-N n,n-diethyl-2-methylpropan-2-amine Chemical compound CCN(CC)C(C)(C)C UPNQFYMXRSHQBY-UHFFFAOYSA-N 0.000 description 2
- 125000005246 nonafluorobutyl group Chemical group FC(F)(F)C(F)(F)C(F)(F)C(F)(F)* 0.000 description 2
- 125000003518 norbornenyl group Chemical group C12(C=CC(CC1)C2)* 0.000 description 2
- 125000002868 norbornyl group Chemical group C12(CCC(CC1)C2)* 0.000 description 2
- 125000002347 octyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 2
- 125000006340 pentafluoro ethyl group Chemical group FC(F)(F)C(F)(F)* 0.000 description 2
- 235000021317 phosphate Nutrition 0.000 description 2
- 150000003013 phosphoric acid derivatives Chemical class 0.000 description 2
- 229910052698 phosphorus Inorganic materials 0.000 description 2
- 239000011574 phosphorus Substances 0.000 description 2
- 239000005077 polysulfide Substances 0.000 description 2
- 229920001021 polysulfide Polymers 0.000 description 2
- 150000008117 polysulfides Polymers 0.000 description 2
- 125000004076 pyridyl group Chemical group 0.000 description 2
- 229910052710 silicon Inorganic materials 0.000 description 2
- 239000010703 silicon Substances 0.000 description 2
- 125000000547 substituted alkyl group Chemical group 0.000 description 2
- LSNNMFCWUKXFEE-UHFFFAOYSA-L sulfite Chemical class [O-]S([O-])=O LSNNMFCWUKXFEE-UHFFFAOYSA-L 0.000 description 2
- 150000003871 sulfonates Chemical class 0.000 description 2
- 150000003467 sulfuric acid derivatives Chemical class 0.000 description 2
- 125000000999 tert-butyl group Chemical group [H]C([H])([H])C(*)(C([H])([H])[H])C([H])([H])[H] 0.000 description 2
- 150000003511 tertiary amides Chemical class 0.000 description 2
- 125000001544 thienyl group Chemical group 0.000 description 2
- 125000003866 trichloromethyl group Chemical group ClC(Cl)(Cl)* 0.000 description 2
- CDIWYWUGTVLWJM-UHFFFAOYSA-N 1,3,4-trimethylimidazol-1-ium Chemical compound CC1=C[N+](C)=CN1C CDIWYWUGTVLWJM-UHFFFAOYSA-N 0.000 description 1
- XTFIVUDBNACUBN-UHFFFAOYSA-N 1,3,5-trinitro-1,3,5-triazinane Chemical compound [O-][N+](=O)N1CN([N+]([O-])=O)CN([N+]([O-])=O)C1 XTFIVUDBNACUBN-UHFFFAOYSA-N 0.000 description 1
- ARJRHPLYUDOSCK-UHFFFAOYSA-N 1-butan-2-ylpiperidine Chemical compound CCC(C)N1CCCCC1 ARJRHPLYUDOSCK-UHFFFAOYSA-N 0.000 description 1
- YQVWRENWRRGCAE-UHFFFAOYSA-N 1-butyl-3-dodecylimidazol-3-ium Chemical compound CCCCCCCCCCCC[N+]=1C=CN(CCCC)C=1 YQVWRENWRRGCAE-UHFFFAOYSA-N 0.000 description 1
- JYARJXBHOOZQQD-UHFFFAOYSA-N 1-butyl-3-ethylimidazol-1-ium Chemical compound CCCC[N+]=1C=CN(CC)C=1 JYARJXBHOOZQQD-UHFFFAOYSA-N 0.000 description 1
- SEXHGTIIWVRNCW-UHFFFAOYSA-N 1-butyl-3-hexadecylimidazol-3-ium Chemical compound CCCCCCCCCCCCCCCC[N+]=1C=CN(CCCC)C=1 SEXHGTIIWVRNCW-UHFFFAOYSA-N 0.000 description 1
- FBYLUDUZJBTVKE-UHFFFAOYSA-N 1-butyl-3-hexylimidazol-3-ium Chemical compound CCCCCC[N+]=1C=CN(CCCC)C=1 FBYLUDUZJBTVKE-UHFFFAOYSA-N 0.000 description 1
- SFDHXQFDRRXIQD-UHFFFAOYSA-N 1-butyl-3-octylimidazol-3-ium Chemical compound CCCCCCCC[N+]=1C=CN(CCCC)C=1 SFDHXQFDRRXIQD-UHFFFAOYSA-N 0.000 description 1
- UDUANKMWNRSRHS-UHFFFAOYSA-N 1-butyl-3-tetradecylimidazol-3-ium Chemical compound CCCCCCCCCCCCCC[N+]=1C=CN(CCCC)C=1 UDUANKMWNRSRHS-UHFFFAOYSA-N 0.000 description 1
- SXZFAXBXUMMDRX-UHFFFAOYSA-N 1-dodecyl-3-ethylimidazol-1-ium Chemical compound CCCCCCCCCCCC[N+]=1C=CN(CC)C=1 SXZFAXBXUMMDRX-UHFFFAOYSA-N 0.000 description 1
- LMOWRYYEJQFKGZ-UHFFFAOYSA-N 1-dodecyl-3-octylimidazol-1-ium Chemical compound CCCCCCCCCCCC[N+]=1C=CN(CCCCCCCC)C=1 LMOWRYYEJQFKGZ-UHFFFAOYSA-N 0.000 description 1
- UNVFUDQXHWCYDC-UHFFFAOYSA-N 1-ethyl-3-hexadecylimidazol-3-ium Chemical compound CCCCCCCCCCCCCCCC[N+]=1C=CN(CC)C=1 UNVFUDQXHWCYDC-UHFFFAOYSA-N 0.000 description 1
- KRJBDLCQPFFVAX-UHFFFAOYSA-N 1-ethyl-3-hexylimidazol-3-ium Chemical compound CCCCCC[N+]=1C=CN(CC)C=1 KRJBDLCQPFFVAX-UHFFFAOYSA-N 0.000 description 1
- JKPTVNKULSLTHA-UHFFFAOYSA-N 1-ethyl-3-octylimidazol-3-ium Chemical compound CCCCCCCC[N+]=1C=CN(CC)C=1 JKPTVNKULSLTHA-UHFFFAOYSA-N 0.000 description 1
- WIAFMINWRRVYEP-UHFFFAOYSA-N 1-hexadecyl-3-octylimidazol-1-ium Chemical compound CCCCCCCCCCCCCCCC[N+]=1C=CN(CCCCCCCC)C=1 WIAFMINWRRVYEP-UHFFFAOYSA-N 0.000 description 1
- SWWLEHMBKPSRSI-UHFFFAOYSA-N 1-hexyl-2,3-dimethylimidazol-3-ium Chemical compound CCCCCCN1C=C[N+](C)=C1C SWWLEHMBKPSRSI-UHFFFAOYSA-N 0.000 description 1
- CSUGQXMRKOKBFI-UHFFFAOYSA-N 1-methylindazole Chemical compound C1=CC=C2N(C)N=CC2=C1 CSUGQXMRKOKBFI-UHFFFAOYSA-N 0.000 description 1
- LCXKRHUGCUOJJN-UHFFFAOYSA-N 1-octyl-3-tetradecylimidazol-3-ium Chemical compound CCCCCCCCCCCCCC[N+]=1C=CN(CCCCCCCC)C=1 LCXKRHUGCUOJJN-UHFFFAOYSA-N 0.000 description 1
- KXIXHISTUVHOCY-UHFFFAOYSA-N 1-propan-2-ylpiperidine Chemical compound CC(C)N1CCCCC1 KXIXHISTUVHOCY-UHFFFAOYSA-N 0.000 description 1
- VTDIWMPYBAVEDY-UHFFFAOYSA-N 1-propylpiperidine Chemical compound CCCN1CCCCC1 VTDIWMPYBAVEDY-UHFFFAOYSA-N 0.000 description 1
- RSVIUCBJPRWLIZ-UHFFFAOYSA-N 1-tert-butylpiperidine Chemical compound CC(C)(C)N1CCCCC1 RSVIUCBJPRWLIZ-UHFFFAOYSA-N 0.000 description 1
- WNMQSIGDRWCJMO-UHFFFAOYSA-N 1-tert-butylpyrrolidine Chemical compound CC(C)(C)N1CCCC1 WNMQSIGDRWCJMO-UHFFFAOYSA-N 0.000 description 1
- 125000004206 2,2,2-trifluoroethyl group Chemical group [H]C([H])(*)C(F)(F)F 0.000 description 1
- PTBPTNCGZUOCBK-UHFFFAOYSA-N 2,4,5-trimethyl-1h-imidazole Chemical compound CC1=NC(C)=C(C)N1 PTBPTNCGZUOCBK-UHFFFAOYSA-N 0.000 description 1
- 125000001917 2,4-dinitrophenyl group Chemical group [H]C1=C([H])C(=C([H])C(=C1*)[N+]([O-])=O)[N+]([O-])=O 0.000 description 1
- 125000001340 2-chloroethyl group Chemical group [H]C([H])(Cl)C([H])([H])* 0.000 description 1
- STMRFGRNIRUIML-UHFFFAOYSA-N 2-ethyl-n,n-di(propan-2-yl)hexan-1-amine Chemical compound CCCCC(CC)CN(C(C)C)C(C)C STMRFGRNIRUIML-UHFFFAOYSA-N 0.000 description 1
- AIJVWZSWXBRBID-UHFFFAOYSA-N 2-ethyl-n,n-dipropylhexan-1-amine Chemical compound CCCCC(CC)CN(CCC)CCC AIJVWZSWXBRBID-UHFFFAOYSA-N 0.000 description 1
- 125000000954 2-hydroxyethyl group Chemical group [H]C([*])([H])C([H])([H])O[H] 0.000 description 1
- 125000000094 2-phenylethyl group Chemical group [H]C1=C([H])C([H])=C(C([H])=C1[H])C([H])([H])C([H])([H])* 0.000 description 1
- 125000003903 2-propenyl group Chemical group [H]C([*])([H])C([H])=C([H])[H] 0.000 description 1
- 125000004975 3-butenyl group Chemical group C(CC=C)* 0.000 description 1
- GVHIIOWNAUSAPT-UHFFFAOYSA-N 3-ethyl-1-hexadecyl-2-methylpyridin-1-ium Chemical compound CCCCCCCCCCCCCCCC[N+]1=CC=CC(CC)=C1C GVHIIOWNAUSAPT-UHFFFAOYSA-N 0.000 description 1
- YBQNFGJPJGULSW-UHFFFAOYSA-N 3-ethyl-2-methyl-1-tetradecylpyridin-1-ium Chemical compound CCCCCCCCCCCCCC[N+]1=CC=CC(CC)=C1C YBQNFGJPJGULSW-UHFFFAOYSA-N 0.000 description 1
- VAJZCFLYJRMBFN-UHFFFAOYSA-N 4,4-dimethylmorpholin-4-ium Chemical compound C[N+]1(C)CCOCC1 VAJZCFLYJRMBFN-UHFFFAOYSA-N 0.000 description 1
- FDHGUCPWMSEFHX-UHFFFAOYSA-N 4-butan-2-ylmorpholine Chemical compound CCC(C)N1CCOCC1 FDHGUCPWMSEFHX-UHFFFAOYSA-N 0.000 description 1
- OILJIEKQCVHNMM-UHFFFAOYSA-N 4-tert-butylmorpholine Chemical compound CC(C)(C)N1CCOCC1 OILJIEKQCVHNMM-UHFFFAOYSA-N 0.000 description 1
- 206010000372 Accident at work Diseases 0.000 description 1
- QTBSBXVTEAMEQO-UHFFFAOYSA-M Acetate Chemical compound CC([O-])=O QTBSBXVTEAMEQO-UHFFFAOYSA-M 0.000 description 1
- 229910000838 Al alloy Inorganic materials 0.000 description 1
- 229910000851 Alloy steel Inorganic materials 0.000 description 1
- 229910017008 AsF 6 Inorganic materials 0.000 description 1
- SAIKULLUBZKPDA-UHFFFAOYSA-N Bis(2-ethylhexyl) amine Chemical compound CCCCC(CC)CNCC(CC)CCCC SAIKULLUBZKPDA-UHFFFAOYSA-N 0.000 description 1
- VEXZGXHMUGYJMC-UHFFFAOYSA-M Chloride anion Chemical compound [Cl-] VEXZGXHMUGYJMC-UHFFFAOYSA-M 0.000 description 1
- 229910021591 Copper(I) chloride Inorganic materials 0.000 description 1
- 229910000881 Cu alloy Inorganic materials 0.000 description 1
- RWSOTUBLDIXVET-UHFFFAOYSA-N Dihydrogen sulfide Chemical class S RWSOTUBLDIXVET-UHFFFAOYSA-N 0.000 description 1
- SNRUBQQJIBEYMU-UHFFFAOYSA-N Dodecane Natural products CCCCCCCCCCCC SNRUBQQJIBEYMU-UHFFFAOYSA-N 0.000 description 1
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 1
- 238000009626 Hall-Héroult process Methods 0.000 description 1
- DGAQECJNVWCQMB-PUAWFVPOSA-M Ilexoside XXIX Chemical compound C[C@@H]1CC[C@@]2(CC[C@@]3(C(=CC[C@H]4[C@]3(CC[C@@H]5[C@@]4(CC[C@@H](C5(C)C)OS(=O)(=O)[O-])C)C)[C@@H]2[C@]1(C)O)C)C(=O)O[C@H]6[C@@H]([C@H]([C@@H]([C@H](O6)CO)O)O)O.[Na+] DGAQECJNVWCQMB-PUAWFVPOSA-M 0.000 description 1
- FBOZXECLQNJBKD-ZDUSSCGKSA-N L-methotrexate Chemical compound C=1N=C2N=C(N)N=C(N)C2=NC=1CN(C)C1=CC=C(C(=O)N[C@@H](CCC(O)=O)C(O)=O)C=C1 FBOZXECLQNJBKD-ZDUSSCGKSA-N 0.000 description 1
- SVYKKECYCPFKGB-UHFFFAOYSA-N N,N-dimethylcyclohexylamine Chemical compound CN(C)C1CCCCC1 SVYKKECYCPFKGB-UHFFFAOYSA-N 0.000 description 1
- 229910000990 Ni alloy Inorganic materials 0.000 description 1
- ABLZXFCXXLZCGV-UHFFFAOYSA-N Phosphorous acid Chemical class OP(O)=O ABLZXFCXXLZCGV-UHFFFAOYSA-N 0.000 description 1
- 229910018286 SbF 6 Inorganic materials 0.000 description 1
- 229910001297 Zn alloy Inorganic materials 0.000 description 1
- 150000004703 alkoxides Chemical class 0.000 description 1
- 125000005161 aryl oxy carbonyl group Chemical group 0.000 description 1
- 229910001570 bauxite Inorganic materials 0.000 description 1
- 125000003785 benzimidazolyl group Chemical group N1=C(NC2=C1C=CC=C2)* 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- FCPMOQKUPRKDAN-UHFFFAOYSA-N bis(dimethylamino)methylidene-dimethylazanium Chemical compound CN(C)C(N(C)C)=[N+](C)C FCPMOQKUPRKDAN-UHFFFAOYSA-N 0.000 description 1
- 125000005621 boronate group Chemical class 0.000 description 1
- 150000001642 boronic acid derivatives Chemical class 0.000 description 1
- 125000001246 bromo group Chemical group Br* 0.000 description 1
- 125000000484 butyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 150000004649 carbonic acid derivatives Chemical class 0.000 description 1
- 150000003857 carboxamides Chemical class 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- 125000001309 chloro group Chemical group Cl* 0.000 description 1
- 239000002131 composite material Substances 0.000 description 1
- 239000004020 conductor Substances 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- OXBLHERUFWYNTN-UHFFFAOYSA-M copper(I) chloride Chemical compound [Cu]Cl OXBLHERUFWYNTN-UHFFFAOYSA-M 0.000 description 1
- 125000004210 cyclohexylmethyl group Chemical group [H]C([H])(*)C1([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C1([H])[H] 0.000 description 1
- 125000004851 cyclopentylmethyl group Chemical group C1(CCCC1)C* 0.000 description 1
- 230000006378 damage Effects 0.000 description 1
- 238000000354 decomposition reaction Methods 0.000 description 1
- 238000005137 deposition process Methods 0.000 description 1
- 125000002147 dimethylamino group Chemical group [H]C([H])([H])N(*)C([H])([H])[H] 0.000 description 1
- 125000005982 diphenylmethyl group Chemical group [H]C1=C([H])C([H])=C(C([H])=C1[H])C([H])(*)C1=C([H])C([H])=C([H])C([H])=C1[H] 0.000 description 1
- 125000003438 dodecyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
- MOTZDAYCYVMXPC-UHFFFAOYSA-N dodecyl hydrogen sulfate Chemical compound CCCCCCCCCCCCOS(O)(=O)=O MOTZDAYCYVMXPC-UHFFFAOYSA-N 0.000 description 1
- 229940043264 dodecyl sulfate Drugs 0.000 description 1
- 125000001153 fluoro group Chemical group F* 0.000 description 1
- 239000003365 glass fiber Substances 0.000 description 1
- 150000002390 heteroarenes Chemical class 0.000 description 1
- XMBWDFGMSWQBCA-UHFFFAOYSA-N hydrogen iodide Chemical compound I XMBWDFGMSWQBCA-UHFFFAOYSA-N 0.000 description 1
- QAOWNCQODCNURD-UHFFFAOYSA-M hydrogensulfate Chemical compound OS([O-])(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-M 0.000 description 1
- 230000007062 hydrolysis Effects 0.000 description 1
- 238000006460 hydrolysis reaction Methods 0.000 description 1
- 125000004356 hydroxy functional group Chemical group O* 0.000 description 1
- 150000002460 imidazoles Chemical class 0.000 description 1
- MTNDZQHUAFNZQY-UHFFFAOYSA-N imidazoline Chemical compound C1CN=CN1 MTNDZQHUAFNZQY-UHFFFAOYSA-N 0.000 description 1
- 229940079865 intestinal antiinfectives imidazole derivative Drugs 0.000 description 1
- 125000002346 iodo group Chemical group I* 0.000 description 1
- 125000002960 margaryl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 238000011089 mechanical engineering Methods 0.000 description 1
- 239000000155 melt Substances 0.000 description 1
- NNCAWEWCFVZOGF-UHFFFAOYSA-N mepiquat Chemical compound C[N+]1(C)CCCCC1 NNCAWEWCFVZOGF-UHFFFAOYSA-N 0.000 description 1
- 229910021645 metal ion Inorganic materials 0.000 description 1
- AFVFQIVMOAPDHO-UHFFFAOYSA-M methanesulfonate group Chemical class CS(=O)(=O)[O-] AFVFQIVMOAPDHO-UHFFFAOYSA-M 0.000 description 1
- 125000005525 methide group Chemical group 0.000 description 1
- 125000004184 methoxymethyl group Chemical group [H]C([H])([H])OC([H])([H])* 0.000 description 1
- 125000001421 myristyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- GYVGXEWAOAAJEU-UHFFFAOYSA-N n,n,4-trimethylaniline Chemical compound CN(C)C1=CC=C(C)C=C1 GYVGXEWAOAAJEU-UHFFFAOYSA-N 0.000 description 1
- KLVOSHOFGYMCCP-UHFFFAOYSA-N n,n-di(propan-2-yl)butan-1-amine Chemical compound CCCCN(C(C)C)C(C)C KLVOSHOFGYMCCP-UHFFFAOYSA-N 0.000 description 1
- OENLNEZGRPNQDR-UHFFFAOYSA-N n,n-di(propan-2-yl)hexan-1-amine Chemical compound CCCCCCN(C(C)C)C(C)C OENLNEZGRPNQDR-UHFFFAOYSA-N 0.000 description 1
- KXFXGJYVVIZSBL-UHFFFAOYSA-N n,n-di(propan-2-yl)octan-1-amine Chemical compound CCCCCCCCN(C(C)C)C(C)C KXFXGJYVVIZSBL-UHFFFAOYSA-N 0.000 description 1
- HNIMBAXJIKTYOV-UHFFFAOYSA-N n,n-di(propan-2-yl)pentan-1-amine Chemical compound CCCCCN(C(C)C)C(C)C HNIMBAXJIKTYOV-UHFFFAOYSA-N 0.000 description 1
- UVDXVPFJGDNPTE-UHFFFAOYSA-N n,n-dibutyl-4-methylaniline Chemical compound CCCCN(CCCC)C1=CC=C(C)C=C1 UVDXVPFJGDNPTE-UHFFFAOYSA-N 0.000 description 1
- FZPXKEPZZOEPGX-UHFFFAOYSA-N n,n-dibutylaniline Chemical compound CCCCN(CCCC)C1=CC=CC=C1 FZPXKEPZZOEPGX-UHFFFAOYSA-N 0.000 description 1
- KFOQAMWOIJJNFX-UHFFFAOYSA-N n,n-dibutylhexan-1-amine Chemical compound CCCCCCN(CCCC)CCCC KFOQAMWOIJJNFX-UHFFFAOYSA-N 0.000 description 1
- PMDQHLBJMHXBAF-UHFFFAOYSA-N n,n-dibutyloctan-1-amine Chemical compound CCCCCCCCN(CCCC)CCCC PMDQHLBJMHXBAF-UHFFFAOYSA-N 0.000 description 1
- HKJNHYJTVPWVGV-UHFFFAOYSA-N n,n-diethyl-4-methylaniline Chemical compound CCN(CC)C1=CC=C(C)C=C1 HKJNHYJTVPWVGV-UHFFFAOYSA-N 0.000 description 1
- ORSUTASIQKBEFU-UHFFFAOYSA-N n,n-diethylbutan-1-amine Chemical compound CCCCN(CC)CC ORSUTASIQKBEFU-UHFFFAOYSA-N 0.000 description 1
- CIXSDMKDSYXUMJ-UHFFFAOYSA-N n,n-diethylcyclohexanamine Chemical compound CCN(CC)C1CCCCC1 CIXSDMKDSYXUMJ-UHFFFAOYSA-N 0.000 description 1
- BVUGARXRRGZONH-UHFFFAOYSA-N n,n-diethyloctan-1-amine Chemical compound CCCCCCCCN(CC)CC BVUGARXRRGZONH-UHFFFAOYSA-N 0.000 description 1
- YZULHOOBWDXEOT-UHFFFAOYSA-N n,n-diethylpentan-1-amine Chemical compound CCCCCN(CC)CC YZULHOOBWDXEOT-UHFFFAOYSA-N 0.000 description 1
- MMFBQHXDINNBMW-UHFFFAOYSA-N n,n-dipropylaniline Chemical compound CCCN(CCC)C1=CC=CC=C1 MMFBQHXDINNBMW-UHFFFAOYSA-N 0.000 description 1
- VJIRBKSBSKOOLV-UHFFFAOYSA-N n,n-dipropylbutan-1-amine Chemical compound CCCCN(CCC)CCC VJIRBKSBSKOOLV-UHFFFAOYSA-N 0.000 description 1
- KFXHGBDFXUDEBP-UHFFFAOYSA-N n,n-dipropylhexan-1-amine Chemical compound CCCCCCN(CCC)CCC KFXHGBDFXUDEBP-UHFFFAOYSA-N 0.000 description 1
- QISQZMBDDZCOTR-UHFFFAOYSA-N n,n-dipropyloctan-1-amine Chemical compound CCCCCCCCN(CCC)CCC QISQZMBDDZCOTR-UHFFFAOYSA-N 0.000 description 1
- CQHCAESRELTRNA-UHFFFAOYSA-N n,n-dipropylpentan-1-amine Chemical compound CCCCCN(CCC)CCC CQHCAESRELTRNA-UHFFFAOYSA-N 0.000 description 1
- MSHKXFDHUIFHMD-UHFFFAOYSA-N n-benzyl-n-butylbutan-1-amine Chemical compound CCCCN(CCCC)CC1=CC=CC=C1 MSHKXFDHUIFHMD-UHFFFAOYSA-N 0.000 description 1
- HSZCJVZRHXPCIA-UHFFFAOYSA-N n-benzyl-n-ethylaniline Chemical compound C=1C=CC=CC=1N(CC)CC1=CC=CC=C1 HSZCJVZRHXPCIA-UHFFFAOYSA-N 0.000 description 1
- ZWRDBWDXRLPESY-UHFFFAOYSA-N n-benzyl-n-ethylethanamine Chemical compound CCN(CC)CC1=CC=CC=C1 ZWRDBWDXRLPESY-UHFFFAOYSA-N 0.000 description 1
- OJKDJKUSLNKNEL-UHFFFAOYSA-N n-benzyl-n-propan-2-ylaniline Chemical compound C=1C=CC=CC=1N(C(C)C)CC1=CC=CC=C1 OJKDJKUSLNKNEL-UHFFFAOYSA-N 0.000 description 1
- YLFDIUNVGXCCPV-UHFFFAOYSA-N n-benzyl-n-propylpropan-1-amine Chemical compound CCCN(CCC)CC1=CC=CC=C1 YLFDIUNVGXCCPV-UHFFFAOYSA-N 0.000 description 1
- 125000006606 n-butoxy group Chemical group 0.000 description 1
- BBDGYADAMYMJNO-UHFFFAOYSA-N n-butyl-n-ethylbutan-1-amine Chemical compound CCCCN(CC)CCCC BBDGYADAMYMJNO-UHFFFAOYSA-N 0.000 description 1
- VEBPYKMCKZTFPJ-UHFFFAOYSA-N n-butyl-n-propylbutan-1-amine Chemical compound CCCCN(CCC)CCCC VEBPYKMCKZTFPJ-UHFFFAOYSA-N 0.000 description 1
- 125000001624 naphthyl group Chemical group 0.000 description 1
- 125000001400 nonyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 125000002524 organometallic group Chemical group 0.000 description 1
- TWNQGVIAIRXVLR-UHFFFAOYSA-N oxo(oxoalumanyloxy)alumane Chemical compound O=[Al]O[Al]=O TWNQGVIAIRXVLR-UHFFFAOYSA-N 0.000 description 1
- 239000005022 packaging material Substances 0.000 description 1
- 125000000913 palmityl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 230000000737 periodic effect Effects 0.000 description 1
- 125000005538 phosphinite group Chemical group 0.000 description 1
- AQSJGOWTSHOLKH-UHFFFAOYSA-N phosphite(3-) Chemical class [O-]P([O-])[O-] AQSJGOWTSHOLKH-UHFFFAOYSA-N 0.000 description 1
- XRBCRPZXSCBRTK-UHFFFAOYSA-N phosphonous acid Chemical class OPO XRBCRPZXSCBRTK-UHFFFAOYSA-N 0.000 description 1
- 229920003023 plastic Polymers 0.000 description 1
- 239000004033 plastic Substances 0.000 description 1
- 229920000642 polymer Polymers 0.000 description 1
- 239000002243 precursor Substances 0.000 description 1
- 230000000750 progressive effect Effects 0.000 description 1
- 238000005086 pumping Methods 0.000 description 1
- 238000000746 purification Methods 0.000 description 1
- DNXIASIHZYFFRO-UHFFFAOYSA-N pyrazoline Chemical compound C1CN=NC1 DNXIASIHZYFFRO-UHFFFAOYSA-N 0.000 description 1
- 125000001725 pyrenyl group Chemical group 0.000 description 1
- 238000005956 quaternization reaction Methods 0.000 description 1
- 125000006413 ring segment Chemical group 0.000 description 1
- 150000004760 silicates Chemical class 0.000 description 1
- RMAQACBXLXPBSY-UHFFFAOYSA-N silicic acid Chemical class O[Si](O)(O)O RMAQACBXLXPBSY-UHFFFAOYSA-N 0.000 description 1
- 229910052708 sodium Inorganic materials 0.000 description 1
- 125000004079 stearyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 238000003756 stirring Methods 0.000 description 1
- 239000000758 substrate Substances 0.000 description 1
- 125000000020 sulfo group Chemical group O=S(=O)([*])O[H] 0.000 description 1
- 125000000472 sulfonyl group Chemical group *S(*)(=O)=O 0.000 description 1
- 125000005463 sulfonylimide group Chemical group 0.000 description 1
- 125000001973 tert-pentyl group Chemical group [H]C([H])([H])C([H])([H])C(*)(C([H])([H])[H])C([H])([H])[H] 0.000 description 1
- ZMZDMBWJUHKJPS-UHFFFAOYSA-N thiocyanic acid Chemical compound SC#N ZMZDMBWJUHKJPS-UHFFFAOYSA-N 0.000 description 1
- 150000007944 thiolates Chemical class 0.000 description 1
- JOXIMZWYDAKGHI-UHFFFAOYSA-M toluene-4-sulfonate Chemical compound CC1=CC=C(S([O-])(=O)=O)C=C1 JOXIMZWYDAKGHI-UHFFFAOYSA-M 0.000 description 1
- VPYJNCGUESNPMV-UHFFFAOYSA-N triallylamine Chemical compound C=CCN(CC=C)CC=C VPYJNCGUESNPMV-UHFFFAOYSA-N 0.000 description 1
- HJHUXWBTVVFLQI-UHFFFAOYSA-N tributyl(methyl)azanium Chemical compound CCCC[N+](C)(CCCC)CCCC HJHUXWBTVVFLQI-UHFFFAOYSA-N 0.000 description 1
- 125000004953 trihalomethyl group Chemical group 0.000 description 1
- GBXQPDCOMJJCMJ-UHFFFAOYSA-M trimethyl-[6-(trimethylazaniumyl)hexyl]azanium;bromide Chemical compound [Br-].C[N+](C)(C)CCCCCC[N+](C)(C)C GBXQPDCOMJJCMJ-UHFFFAOYSA-M 0.000 description 1
- 125000002221 trityl group Chemical group [H]C1=C([H])C([H])=C([H])C([H])=C1C([*])(C1=C(C(=C(C(=C1[H])[H])[H])[H])[H])C1=C([H])C([H])=C([H])C([H])=C1[H] 0.000 description 1
- 125000002948 undecyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 239000011701 zinc Substances 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D3/00—Electroplating: Baths therefor
- C25D3/66—Electroplating: Baths therefor from melts
- C25D3/665—Electroplating: Baths therefor from melts from ionic liquids
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
- C25D5/34—Pretreatment of metallic surfaces to be electroplated
- C25D5/42—Pretreatment of metallic surfaces to be electroplated of light metals
- C25D5/44—Aluminium
Definitions
- the invention relates to a process for the electrochemical deposition of aluminum and to an electrolyte which can be used in this process.
- Aluminum is an important material that is used predominantly in vehicle and aircraft construction as well as in mechanical engineering, construction and as packaging material. Both in the production of aluminum and in its purification, electrolysis plays an important role.
- the conventional method for industrial aluminum production is based on the so-called Hall Heroult process, while aluminum oxide is dissolved in the form of bauxite and cathodically deposited by means of direct current from a melt at temperatures of about 1000 0 C.
- a process for the electrochemical deposition of aluminum is the so-called SIGAL process, in which a highly reactive, pyrophoric organoaluminum compound is handled in a flammable basic electrolyte.
- SIGAL process a highly reactive, pyrophoric organoaluminum compound is handled in a flammable basic electrolyte.
- Such aluminum organyls decompose spontaneously in air by reaction with atmospheric oxygen and moisture, causing flame formation.
- Such decomposition in the presence of easily combustible toluene or xylene electrolytes can lead to serious industrial accidents up to the destruction of the plant.
- a disadvantage of the use of electrolytes based on ionic liquids is the poor surface finish which is currently achieved at technically relevant current densities of> 200 A / m 2 .
- a poor surface finish is understood to mean a rough, dendritic surface which does not cover the electrode or the substrate on which it is deposited flat. For decorative and corrosion protection reasons, even deposition with a gloss or matt finish is desirable.
- a dense layer is essential for proper corrosion protection.
- EP 0 084 816 discloses organometallic electrolytes for the electrodeposition of aluminum, which should have a high throwing power coupled with good electrical conductivity.
- a further object of the present invention is to provide a process for the electrochemical deposition of aluminum from ionic liquids, with the aid of which matt or glossy dense aluminum layers can be obtained.
- the object is achieved by a method for the electrochemical deposition of aluminum comprising the steps:
- X 1 and X 2 are independently of one another N or CH, X 3 is NR 1 , O or S, m is an integer from 0 to 4,
- X 1 , X 2 and X 3 are heteroatoms selected from N, O and S, and
- R 1 is selected from the group H, alkyl, cycloalkyl, aralkyl, aryl, alkoxyaryl and heterocyclyl wherein the groups alkyl, cycloalkyl, aralkyl, aryl, alkoxyaryl and heterocyclyl optionally substituted by one or more substituents, and the groups alkyl and cycloalkyl optionally interrupted by 1 to 3 heteroatoms or functional groups, and
- R 2 independently represents H, alkyl, cycloalkyl, aralkyl, aryl, alkoxyaryl and heterocyclyl, wherein the groups alkyl, cycloalkyl, aralkyl, aryl, alkoxyaryl and heterocyclyl optionally substituted by one or more substituents, and the groups alkyl and cycloalkyl optionally substituted by 1 to 3 heteroatoms or functional groups are interrupted.
- the additive according to the general formula (II) is a compound of the general formula (II)
- R 3 is H, alkyl, cycloalkyl, aralkyl, aryl, alkoxyaryl and heterocyclyl, wherein the groups alkyl, cycloalkyl, aralkyl, aryl, alkoxyaryl and heterocyclyl optionally substituted with one or more substituents, and the groups alkyl and cycloalkyl optionally substituted by 1 to 3 heteroatoms or functional groups are interrupted, and,
- B08 / 0552PC R 4 independently of one another are H, alkyl, cycloalkyl, aralkyl, aryl, alkoxyaryl and heterocyclyl, where the groups alkyl, cycloalkyl, aralkyl, aryl, alkoxyaryl and heterocyclyl optionally substituted by one or more substituents, and the groups alkyl and cycloalkyl optionally are interrupted by 1 to 3 heteroatoms or functional groups, and Hal is selected from the group fluorine, chlorine, bromine and iodine.
- the additive according to the general formula (III) is a compound of the general formula (III)
- R 5 is alkyl, cycloalkyl, aralkyl, aryl, alkoxyaryl and heterocyclyl, wherein the groups alkyl, cycloalkyl, aralkyl, aryl, alkoxyaryl and heterocyclyl optionally substituted with one or more substituents and the groups alkyl and cycloalkyl optionally substituted by 1 to 3 heteroatoms or are interrupted by functional groups, and M + is Na + or K + .
- the substituents are independently selected from the group fluorine, chlorine, bromine, iodine, optionally substituted alkyl, optionally substituted aryl, optionally substituted heterocyclyl, optionally substituted aralkyl, alkoxy, nitro, carboalkoxy, cyano, alkylmercaptyl, trihaloalkyl, carboxyalkyl, - ( dC 7 ) alkyl, -O- (dC 7 ) -alkyl, -N ((dC 4 ) -alkyl) 2 , -CO-N ((dC 4 ) alkyl) 2 .
- Alkyl means a saturated aliphatic hydrocarbon group which may be straight chain or branched and may have from 1 to 20 carbon atoms in the chain Preferred alkyl groups may be straight chain or branched and have from 1 to 10 carbon atoms in the chain a lower alkyl group, such as methyl, ethyl or propyl, is attached to a linear alkyl chain, for example, methyl, ethyl, 1-propyl, 2-propyl, 1-butyl, 2-butyl, 2-methyl 1 -propyl (isobutyl), 2-methyl-2-propyl (tert-butyl), 1-pentyl, 2-pentyl, 3-pentyl, 2-methyl-1-butyl, 3-methyl-1-butyl, 2 Methyl 2-butyl, 3-methyl-2-butyl, 2,2-dimethyl-1-propyl, 1-hexyl, 2-hexyl, 3-hexyl, 2-methyl-1-pentyl, 3-methyl
- Substituted alkyl means that the alkyl group is substituted with one or more substituents selected from alkyl, optionally substituted aryl, optionally substituted aralkyl, alkoxy, nitro, carboalkoxy, cyano, halo, alkylmercaptyl, trihaloalkyl or carboxyalkyl.
- Cycloalkyl means an aliphatic ring having from 3 to about 10 carbon atoms in the ring Preferred cycloalkyl groups have from 4 to about 7 carbon atoms in the ring.
- Aryl means phenyl or naphthyl.
- Aralkyl means an alkyl group substituted with an aryl group.
- Substituted aralkyl and “substituted aryl” mean that the aryl group or aryl group of the aralkyl group is substituted with one or more substituents selected from alkyl, alkoxy, nitro, carboalkoxy, cyano, halo, alkylmercaptyl, trihaloalkyl or carboxyalkyl.
- Alkoxy means an alkyl-O-group in which "alkyl” has the meaning described above. Lower alkoxy groups are preferred. Exemplary groups include methoxy, ethoxy, n-propoxy, i -propoxy and n-butoxy.
- “Lower alkyl” means an alkyl group having from 1 to about 7 carbon atoms.
- Alkoxyalkyl means an alkyl group as described above substituted with an alkoxy group as described above.
- Halogen means chloro, fluoro, bromo or iodo.
- Heterocyclyl means an approximately 4 to about 10 membered ring structure in which one or more of the ring atoms is other than carbon, for example N, O or S. Heterocyclyl may be aromatic or non-aromatic, ie it may be saturated, partially or completely unsaturated.
- Substituted heterocyclyl means that the heterocyclyl group is substituted with one or more substituents, which include as substituents: alkoxy, aryl, carbalkoxy, cyano, halo, heterocyclyl, trihalomethyl, alkylmercaptyl or nitro.
- Carbalkoxy means a carboxyl substituent esterified with an alcohol of the formula C n H 2n + I OH, where n is from 1 to about 6.
- Alkoxyalkyl means an alkyl group as described above substituted with an alkoxy group as described above.
- R 1 is selected from methyl, ethyl, 1-propyl, 1-butyl, 1-pentyl and 1-hexyl. According to a particularly preferred embodiment of the invention, the radical R 1 is methyl.
- R 2 is H and m is 4.
- the compound according to the general formula (I) is N-methylbenzotriazole.
- the compound according to the general formula (I) is one or more compounds selected from N-methylbenzodiazole, N-ethylbenzodiazole, benzoxazole, benzisooxazole, benzisothiazole and benzothiazole
- R 3 is a straight chain, saturated aliphatic hydrocarbon group having from 5 to 20 carbon atoms in the chain, more preferably from 10 to 18 carbon atoms in the chain.
- R 4 is the same or different and selected from H, methyl, ethyl, 1-propyl and 2-propyl.
- the compound according to the general formula (II) is one or more compounds selected from hexydecyltrimethylammonium bromide and hexadecyltrimethylammonium chloride.
- R 5 is a straight-chain, saturated aliphatic hydrocarbon group having 5 to 20 carbon atoms in the chain, more preferably having 10 to 15 carbon atoms in the chain.
- the compound according to the general formula (III) is sodium lauryl sulfate.
- the current density at which the method according to the invention is carried out is at least 50 A / m 2 and can vary over wide ranges.
- the electrical current density is defined as the quotient of current intensity and effective electrode area during electrolysis.
- the electrical current density is preferably at least 100 A / m 2 , more preferably at least 200 A / m 2 and in particular at least 400 A / m 2
- Ionic liquids are a suitable electrolyte for the deposition of aluminum.
- the electrolyte is typically a molten salt with a water content of less than 0.1% by weight, based on the total amount of the electrolyte.
- the anion of the ionic liquid is tetrachloroaluminate.
- the cations used are preferably dialkylimidazolium cations in which the two alkyl groups, identical or different, branched or unbranched, may be substituted or unsubstituted by one or more phenyl groups and have from 1 to 6 carbon atoms.
- the ionic liquid has a formula KaCl xn AICI3, where Ka is one of the abovementioned imidazolium cations and n is a value of 1.4 to 2.0, more preferably 1.4 to 1.7, in particular 1.5 having.
- ionic liquids can also be used.
- Such ionic liquids are described, for example, in DE-A 10 2005 017 733.
- ionic liquids which have cations which are selected from the compounds of the formulas (IVa) to (IVw):
- radical R is hydrogen, a carbon-containing organic, saturated or unsaturated, acyclic or cyclic, aliphatic, aromatic or
- radicals R 1 to R 9 are independently hydrogen, a sulfo group or a carbon-containing organic, saturated or unsaturated, acyclic or cyclic, aliphatic, aromatic or araliphatic, unsubstituted or interrupted by 1 to 5 heteroatoms or functional groups or substituted radical having 1 to 20 carbon atoms, wherein the radicals R 1 to R 9 , which in the abovementioned formulas (IV) are bonded to a carbon atom (and not to a heteroatom), may additionally also stand for halogen or a functional group ; or
- the radicals R 1 to R 9 are, in the cases in which those in the above formulas (IV) to a carbon atom (and not to a heteroatom) bound also be bound directly via the heteroatom.
- B08 / 0552PC also functional groups and heteroatoms may be directly adjacent, so that combinations of several adjacent atoms, such as -O- (ether), -S- (thioether), -COO- (ester) or -CONR'- (tertiary Amide), are included, for example, di- (Ci-C 4 alkyl) amino, Ci-C 4 alkyloxycarbonyl or Ci-C 4 alkyloxy.
- Halogens are fluorine, chlorine, bromine and iodine.
- the radical R preferably stands for
- Glycols, butylene glycols and their oligomers having from 1 to 100 units and a hydrogen or a C 1 to C 8 alkyl as end group, such as, for example, R A O- (CHR B -CH 2 -O) n -CHR B -CH 2 - or R 1 - (CH 2 CH 2 CH 2 CH 2 O) n - CH 2 CH 2 CH 2 CH 2 O- where R A and R B are preferably hydrogen, methyl or ethyl and n is preferably 0 to 3, in particular 3-oxabutyl , 3-oxapentyl, 3,6-dioxaheptyl, 3,6-dioxaoctyl, 3,6,9-trioxadecyl, 3,6,9-trioxaundecyl, 3,6,9,12-tetraoxatri- decyl and 3,6,9 , 12-tetraoxatetradecyl;
- N, N-di-C 1 to C 6 -alkyl-amino such as N, N-dimethylamino and N, N-
- radical R is unbranched and unsubstituted d-bis
- Ci ⁇ -alkyl such as, for example, methyl, ethyl, 1-propyl, 1-butyl, 1-pentyl, 1-hexyl, 1-heptyl, 1-octyl, 1-decyl, 1-dodecyl, 1-tetradecyl, 1-hexadecyl, 1-octadecyl, in particular
- B08 / 0552PC especially for methyl, ethyl, 1-butyl and 1-octyl and for CH 3 O- (CH 2 CH 2 O) n -CH 2 CH 2 - and CH 3 CH 2 O- (CH 2 CH 2 O) n -CH 2 CH 2 - with n equal to 0 to 3.
- radicals R 1 to R 9 are preferably each independently
- aryl, alkyl, aryloxy, alkyloxy, halo, heteroatoms and / or heterocycles substituted and / or interrupted by one or more oxygen and / or sulfur atoms and / or one or more substituted or unsubstituted imino groups alkyl;
- C 2 interrupted by functional groups, aryl, alkyl, aryloxy, alkyloxy, halo, heteroatoms and / or heterocycles and / or interrupted by one or more oxygen and / or sulfur atoms and / or one or more substituted or unsubstituted imino groups cis alkenyl;
- aryl, alkyl, aryloxy, alkyloxy, halogen, heteroatoms and / or heterocycles d- to Ci 8 alkyl is preferably methyl, ethyl, 1-propyl, 2-propyl, 1-butyl, 2-butyl, 2-methyl-1-propyl (isobutyl), 2-methyl-2-propyl (tert-butyl), 1-pentyl, 2-pentyl, 3-pentyl, 2-methyl-1-butyl , 3-methyl-1-butyl, 2-methyl-2-butyl, 3-methyl-2-butyl, 2,2-dimethyl-1-propyl, 1-hexyl, 2-hexyl, 3-hexyl, 2-methyl 1-pentyl, 3-methyl-1-pentyl, 4-methyl-1-pentyl, 2-methyl-2-pentyl, 3-methyl-2-pentyl, 4-methyl-2-pentyl, 2-methyl-2-pentyl, 3-methyl-2-pentyl, 4-
- B08 / 0552PC substituted imino interrupted C 2 - to C-is alkenyl is preferably vinyl, 2-propenyl, 3-butenyl, cis-2-butenyl, trans-2-butenyl or
- C 1 -C 12 -alkyl which is optionally substituted by functional groups, aryl, alkyl, aryloxy, alkyloxy, halogen, heteroatoms and / or heterocycles, it is preferably phenyl, toIyI, xylene, ⁇ -naphthyl, ⁇ -naphthyl, Diphenylyl, chlorophenyl, dichlorophenyl, trichlorophenyl, difluorophenyl, methylphenyl, dimethylphenyl, trimethylphenyl, ethylphenyl, diethylphenyl, / so-propylphenyl, tert-butylphenyl, dodecylphenyl, methoxyphenyl, dimethoxyphenyl, ethoxyphenyl, hexyloxyphenyl, methylnaphthyl, isopropylnaphthyl,
- aryl, alkyl, aryloxy, alkyloxy, halogen, heteroatoms and / or heterocycles is preferably cyclopentyl, cyclohexyl, cyclooctyl, cyclododecyl, methylcyclopentyl, dimethylcyclopentyl, methylcyclohexyl, dimethylcyclohexyl , Diethylcyclohexyl, butylcyclohexyl, methoxycyclohexyl, dimethoxycyclohexyl, diethoxycyclohexyl, butylthiocyclohexyl, chlorocyclohexyl, dichlorocyclohexyl, dichlorocyclopentyl, C n F 2 (n- 3 ) - (ib) H 2 3 -b with n ⁇ 30, 0 ⁇ a ⁇
- An optionally substituted by functional groups, aryl, alkyl, aryloxy, alkyloxy, halogen, heteroatoms and / or heterocycles substituted five- to six-membered, oxygen, nitrogen and / or sulfur atoms containing heterocycle is preferably furyl, thiophenyl, pyrryl, Pyridyl, indolyl, benzoxazolyl, dioxolyl, dioxo, benzimidazolyl, benzthiazolyl, dimethylpyridyl, methylquinolyl, dimethylpyrryl, methoxyfuryl, dimethoxypyridyl or difluoropyridyl.
- B08 / 0552PC Two adjacent radicals together form an unsaturated, saturated or aromatic, optionally substituted by functional groups, aryl, alkyl, aryloxy, alkyloxy, halogen, heteroatoms and / or heterocycles and optionally substituted by one or more oxygen and / or sulfur atoms and / or one or more several substituted or unsubstituted imino groups interrupted ring, it is preferably 1, 3-propylene, 1, 4-butylene, 1, 5-pentylene, 2-oxa-1, 3-propylene, 1-oxa-1, 3-propylene, 2-oxa-1, 3-propylene, 1-oxa-1, 3-propenylene, 3-oxa-1, 5-pentylene, 1-aza-1, 3-propenylene, 1-Ci-C 4 -Alkyl-1-aza-1,3-propenylene, 1,4-buta-1,3-dienylene, 1-aza-1, 4-buta-1,3-dienylene or 2-aza-1,
- radicals contain oxygen and / or sulfur atoms and / or substituted or unsubstituted imino groups
- the number of oxygen and / or sulfur atoms and / or imino groups is not restricted. As a rule, it is not more than 5 in the radical, preferably not more than 4, and very particularly preferably not more than 3.
- radicals contain heteroatoms, then between two heteroatoms there are generally at least one carbon atom, preferably at least two carbon atoms.
- radicals R 1 to R 9 are each independently
- N 1 N-di-Cr to C ⁇ -alkyl-amino such as N, N-dimethylamino and N, N-
- the radicals R 1 to R 9 independently of one another are hydrogen or C 1 - to C 1 -alkyl, such as, for example, methyl, ethyl, 1-butyl, 1-pentyl, 1-hexyl, 1-heptyl, 1-octyl , for phenyl, for 2-cyanoethyl, for 2- (methoxycarbonyl) ethyl, for 2- (ethoxycarbonyl) ethyl, for 2- (n-butoxycarbonyl) ethyl, for N, N-dimethylamino, for N, N -diethylamino, for Chlorine and for CH 3 O- (CH 2 CH 2 O) n -CH 2 CH 2 - and CH 3 CH 2 O- (CH 2 CH 2 O) n -CH 2 CH 2 - with n is 0 to 3.
- radicals R 1 to R 5 are methyl, ethyl or chlorine and the remaining radicals R 1 to R 5 are hydrogen;
- R 3 is dimethylamino and the remaining radicals R 1 , R 2 , R 4 and R 5 are hydrogen;
- R 2 is carboxy or carboxamide and the remaining radicals R 1 , R 2 , R 4 and R 5 are hydrogen; or
- R 1 and R 2 or R 2 and R 3 is 1, 4-buta-1, 3-dienylene and the remaining radicals
- R 1 , R 2 , R 4 and R 5 are hydrogen
- R 1 to R 5 are hydrogen
- radicals R 1 to R 5 are methyl or ethyl and the remaining radicals R 1 to R 5 are hydrogen.
- pyridinium ions (IVa) there may be mentioned 1-methylpyridinium, 1-ethylpyridinium, 1- (1-butyl) pyridinium, 1- (1-hexyl) pyridinium, 1- (1-octyl) pyridinium, 1 - (1-Hexyl) pyridinium, 1- (1-octyl) pyridinium, 1- (1-dodecyl) pyridinium, 1- (1-tetradecyl) pyridinium, 1- (1-hexadecyl) pyridinium, 1 , 2-Dimethylpyridinium, 1-ethyl-2-methylpyridinium, 1- (1-butyl) -2-methylpyridinium, 1- (1-hexyl) -2-methylpyridinium, 1- (1-octyl) -2-methylpyridinium, 1 - (1-dodecyl)
- R 1 to R 4 are hydrogen
- radicals R 1 to R 4 are methyl or ethyl and the remaining radicals R 1 to R 4 are hydrogen.
- R 1 is hydrogen, methyl or ethyl and R 2 to R 4 are independently hydrogen or methyl; or
- R 1 is hydrogen, methyl or ethyl
- R 2 and R 4 are methyl and R 3 is hydrogen.
- R 1 is hydrogen, methyl or ethyl and R 2 to R 4 are independently hydrogen or methyl;
- R 1 is hydrogen, methyl or ethyl, R 2 and R 4 are methyl and R 3 is hydrogen;
- R 1 to R 4 are methyl; or • R 1 to R 4 are methyl.
- R 1 is hydrogen, methyl, ethyl, 1-propyl, 1-butyl, 1-pentyl, 1-hexyl, 1-octyl, 2-hydroxyethyl or 2-cyanoethyl and R 2 to R 4 are independently
- imidazolium ions may be mentioned 1, 3-dimethylimidazolium, 1-ethyl-3-methylimidazolium, 1- (1-butyl) -3-methylimidazolium, 1- (1-butyl) -3-ethylimidazolium, 1 (1-hexyl) -3-methylimidazolium, 1- (1-hexyl) -3-ethylimidazolium, 1- (1-hexyl) -3-butylimidazolium, 1- (1-octyl) -3- methylimidazolium, 1- (1-octyl) -3-ethylimidazolium, 1- (1-octyl) -3-butylimidazolium, 1- (1-dodecyl) -3-methylimidazolium, 1- (1-dodecyl) -3-ethylimidazolium, 1- (1-dodecyl) -3-butylimi
- R 1 is hydrogen, methyl or ethyl and R 2 to R 4 are independently hydrogen or methyl.
- R 1 to R 4 are independently hydrogen or methyl.
- R 1 to R 6 are hydrogen or methyl.
- R 1 is hydrogen, methyl, ethyl or phenyl and R 2 to R 6 are independently of one another hydrogen or methyl.
- R 1 and R 2 are independently hydrogen, methyl, ethyl or phenyl and R 3 to R 6 are independently hydrogen or methyl.
- Imidazoliniumionen are those in which
- R 1 and R 2 are independently hydrogen, methyl, ethyl, 1-butyl or phenyl, R 3 and R 4 are independently hydrogen, methyl or ethyl, and R 5 and R 6 are independently hydrogen or methyl.
- R 1 and R 2 are independently hydrogen, methyl or ethyl and R 3 to R:> 6 are independently hydrogen or methyl.
- R 1 to R 3 are independently hydrogen, methyl or ethyl and R 4 to R 6 are independently hydrogen or methyl.
- R 1 is hydrogen, methyl, ethyl or phenyl and R 2 and R 3 are independently hydrogen or methyl.
- R 1 and R 2 are independently hydrogen, methyl, ethyl or phenyl and R 3 is hydrogen, methyl or phenyl.
- R 1 is hydrogen, methyl or ethyl and R 2 and R 3 are independently hydrogen or methyl, or R 2 and R 3 together are 1, 4-buta-1, 3-dienylene.
- R 1 is hydrogen, methyl, ethyl or phenyl and R 2 to R 9 are independently of one another hydrogen or methyl.
- R 1 and R 4 are independently hydrogen, methyl, ethyl or phenyl and R 2 and R 3 and R 5 to R 8 are independently hydrogen or methyl.
- R 1 to R 3 are independently C 1 to C 8 alkyl
- R 1 and R 2 together are 1, 5-pentylene or 3-oxa-1, 5-pentylene and R 3 is C r Cr alkyl or 2-cyanoethyl.
- ammonium ions may be mentioned methyl tri (1-butyl) -ammonium, N, N-dimethylpiperidinium and N, N-dimethylmorpholinium.
- Examples of the tertiary amines from which the quaternary ammonium ions of the general formula (IVu) are derived by quaternization with the abovementioned radicals R are diethyl-n-butylamine, diethyl-tert-butylamine, diethyl-n-pentylamine, diethylhexylamine, Diethyloctylamine, diethyl (2-ethylhexyl) amine, di-n-propylbutylamine, di-n-propyl-n-pentylamine, di-n-propylhexylamine, di-n-propyloctylamine, di-n-propyl (2-ethyl - hexyl) -amine, di-isopropylethylamine, di-iso-propyl-n-propylamine, di-isopropyl-butylamine, di-isopropylpenty
- B08 / 0552PC Di-n-butylhexylamine, di-n-butyloctylamine, di-n-butyl (2-ethylhexyl) amine, Nn-butylpyrrolidine, N-sec-butylpyrrodidine, N-tert-butylpyrrolidine, Nn-pentylpyrrolidine, N, N-dimethylcyclohexylamine, N, N-diethylcyclohexylamine, N, N-di-n-butylcyclohexylamine, N-n-propylpiperidine, N-isopropylpiperidine, Nn-butylpiperidine, N-sec-butylpiperidine, N-tert-butylpiperidine, Nn-pentylpiperidine, Nn-butylmorpholine, N-sec-butylmorpholine, N-tert-butylmorpholine, Nn-penty
- Preferred tertiary amines (IVu) are di-iso-propylethylamine, diethyl-tert-butylamine, diisopropyl-propylamine, di-n-butyl-n-pentylamine, N, N-di-n-butylcyclohexylamine and tertiary amines of pentyl isomers.
- tertiary amines are di-n-butyl-n-pentylamine and tertiary amines of pentyl isomers.
- Another preferred tertiary amine having three identical residues is triallylamine.
- R 1 to R 5 are methyl.
- guanidinium ion may be mentioned N, N, N ', N', N ", N" - hexamethylguanidinium.
- R 1 and R 2 are independently methyl, ethyl, 1-butyl or 1-octyl and R 3 is hydrogen, methyl, ethyl, acetyl, -SO 2 OH or -PO (OH) 2 ;
- R 1 is methyl, ethyl, 1-butyl or 1-octyl
- R 2 is a -CH 2 -CH 2 -OR 4 group and R 3 and R 4 are independently hydrogen, methyl, ethyl, acetyl, -SO 2 OH or -PO (OH) 2 ; or
- R 1 is a -CH 2 -CH 2 -OR 4 group
- R 2 is a -CH 2 -CH 2 -OR 5 group
- R 3 to R 5 are independently hydrogen, methyl, ethyl, acetyl, -SO 2 OH or -PO (OH) 2 are.
- Particularly preferred cholinium ions are those in which R 3 is selected from hydrogen, methyl, ethyl, acetyl, 5-methoxy-3-oxa-pentyl, 8-methoxy-3,6-dioxo-octyl, 1 1-methoxy 3,6,9-trioxa undecyl, 7-methoxy-4-oxa-heptyl, 11-methoxy-4,8-dioxa undecyl, 15-methoxy-4,8,12-trioxa-pentadecyl, 9-methoxy 5-oxa-nonyl, 14-methoxy-5,10-oxa-tetradecyl, 5-ethoxy-3-oxa-pentyl, 8-ethoxy-3,6-dioxa-octyl, 11-ethoxy-3,6,9 trioxa undecyl, 7-ethoxy-4-o
- IIIx Very particularly preferred phosphonium ions (IVx) are those in which
- R 1 to R 3 are, independently of one another, C 1 -C 8 -alkyl, in particular butyl, isobutyl, 1-hexyl or 1-octyl.
- the pyridinium ions, pyrazolinium, pyrazolium ions and imidazolinium and imidazolium ions are preferable. Furthermore, ammonium ions are preferred.
- B08 / 0552PC Trimethylimidazolium, 1, 4-dimethyl-3-ethylimidazolium, 3-butylimidazolium, 1, 4-dimethyl-3-octylimidazolium, 1, 4,5-trimethylimidazolium, 1, 3,4,5-tetramethylimidazolium, 1, 4, 5-trimethyl-3-ethylimidazolium, 1, 4,5-trimethyl-3-butylimidazolium, butylmethylpyrolidinium and 1, 4,5-trimethyl-3-octylimidazolium.
- the metal cations [M 1 ] + , [M 2 ] + , [M 3 ] + , [M 4 ] 2+ and [M 5 J 3+ mentioned in formulas (IIIa) to (NIj) are generally to metal cations of the 1st, 2nd, 6th, 7th, 8th, 9th, 10th, 11th, 12th and 13th group of the periodic table.
- Suitable metal cations are, for example, Li + , Na + , K + , Cs + , Mg 2+ , Ca 2+ , Ba 2+ , Cr 3+ , Fe 2+ , Fe 3+ , Co 2+ , Ni 2+ , Cu 2 + , Ag + , Zn 2+ and Al 3+ .
- anions in principle, all anions can be used, provided that AICI 4 " and / or Al 2 Cl 7 " are predominantly present.
- the anion [Y] " 'of the ionic liquid is for example selected from
- R b is -O 2 S ' SO 2 -R C
- v is a whole positive number from 2 to 10; advantageously S 2 " , [S v ] 2" ,
- B08 / 0552PC • the group of complex metal ions such as Fe (CN) 6 3 “ , Fe (CN) 6 4" , MnO 4 “ , Fe (CO) 4 “ .
- R a , R b , R c and R d are each independently hydrogen, C 1 -C 6 -alkyl, optionally interrupted by one or more non-adjacent oxygen and / or sulfur atoms and / or one or more substituted or unsubstituted imino groups 2 -C 8 alkyl, C 6 -C 4 aryl, C 5 -C 2 cycloalkyl or a five- to six-membered, oxygen-, nitrogen- and / or sulfur-comprising heterocycle, where two of them together form an unsaturated, saturated or aromatic, optionally interrupted by one or more oxygen and / or sulfur atoms and / or one or more unsubstituted or substituted imino groups ring, said radicals each additionally by functional groups, aryl, alkyl, aryloxy, alkoxy, halogen, hetero - Atoms and / or heterocycles may be substituted.
- aryl, alkyl, aryloxy, alkyloxy, halogen, heteroatoms and / or heterocycles substituted CrCis-alkyl, for example methyl, ethyl, propyl, isopropyl, n-butyl, sec-butyl, tert-butyl, pentyl, Hexyl, heptyl, octyl, 2-ethylhexyl, 2,4,4-trimethylpentyl, decyl, dodecyl, tetradecyl, heptadecyl, octadecyl, 1,1-dimethylpropyl, 1,1-dimethylbutyl, 1,1,3,3- Tetramethylbutyl, benzyl, 1-phenylethyl, ⁇ , ⁇ -dimethylbenzyl, benzhydryl, p-tolylmethyl, 1- (p-butyl),
- optionally interrupted by one or more non-adjacent oxygen and / or sulfur atoms and / or one or more substituted or unsubstituted imino interrupted C 2 -C 8 alkyl for example, 5-hydroxy-3-oxapentyl, 8-hydroxy-3,6- dioxaoctyl, 1 1-hydroxy-3,6,9-trioxaundecyl, 7-hydroxy-4-oxaheptyl, 1-hydroxy-4,8-dioxaundecyl, 15-hydroxy-4,8,12-trioxapentadecyl, 9-hydroxy 5-oxa-
- B08 / 0552PC nonyl 14-hydroxy-5,10-oxatetradecyl, 5-methoxy-3-oxapentyl, 8-methoxy-3,6-dioxo-octyl, 1-methoxy-3,6,9-trioxa-undecyl, 7-methoxy-4 -oxaheptyl, 1-methoxy-4,8-dioxa- undecyl, 15-methoxy-4,8,12-trioxapentadecyl, 9-methoxy-5-oxanonyl, 14-methoxy-5,10-oxatetradecyl, 5-ethoxy 3-oxapentyl, 8-ethoxy-3,6-dioxaoctyl, 1-ethoxy-3,6,9-trioxaundecyl, 7-ethoxy-4-oxaheptyl, 1-ethoxy-4,8-dioxaundecyl
- radicals can be taken together, for example, as fused building block 1, 3-propylene, 1,4-butylene, 2-oxa-1,3-propylene, 1-oxa-1,3-propylene, 2-oxa 1, 3-propenylene, 1-aza-1, 3-propenylene, 1-dC 4 -alkyl-1-aza-1, 3-propenylene, 1, 4-buta-1, 3-dienylene, 1-aza 1, 4-buta-1, 3-dienylene or 2-aza-1,4-buta-1,3-dienylene.
- the number of non-adjacent oxygen and / or sulfur atoms and / or imino groups is basically not limited, or is automatically limited by the size of the remainder or the ring building block. As a rule, it is not more than 5 in the respective radical, preferably not more than 4 or very particularly preferably not more than 3. Furthermore, at least one, preferably at least two, carbon atoms (e) are generally present between two heteroatoms.
- Substituted and unsubstituted imino groups may be, for example, imino, methylimino, iso-propylimino, n-butylimino or tert-butylimino.
- C 6 -C 4 -aryl substituted by functional groups are, for example, phenyl, ToIyI, XyIyI, ⁇ -naphthyl, ⁇ -naphthyl, 4-diphenylyl, chlorophenyl, Dichlorophenyl, trichlorophenyl, difluorophenyl, methylphenyl, dimethylphenyl, trimethylphenyl, ethylphenyl, diethylphenyl, isopropylphenyl, tert-butylphenyl, dodecylphenyl, methoxyphenyl, dimethoxyphenyl, ethoxyphenyl, hexyloxyphenyl, methylnaphthyl, isopropylnaphthyl, chloronap
- B08 / 0552PC May optionally be substituted by functional groups, aryl, alkyl, aryloxy, halogen, Heteroato- me and / or heterocyclic C 5 -C 2 -cycloalkyl are for example cyclopentyl, cyclohexyl, cyclooctyl, cyclododecyl, methylcyclopentyl, dimethylcyclopentyl, methylcyclohexyl, dimethylcyclohexyl, diethylcyclohexyl, Butylcyclohexyl, methoxycyclohexyl, dimethoxycyclohexyl, diethoxycyclohexyl, butylthiocyclohexyl, chlorocyclohexyl, dichlorocyclohexyl, dichlorocyclopentyl and a saturated or unsaturated bicyclic system such as norbornyl or norbornenyl.
- a five- to six-membered, oxygen, nitrogen and / or sulfur-containing heterocycle is, for example, furyl, thiophenyl, pyryl, pyridyl, indolyl, benzoxazolyl, dioxolyl, dioxyl, benzimidazolyl, benzthiazolyl, dimethylpyridyl, methylquinolyl, dimethylpyryl , Methoxifuryl, dimethoxypyridyl, difluoropyridyl, methylthiophenyl, isopropylthiophenyl or tert-butylthiophenyl.
- Preferred anions are selected from the group of halides and halogen-containing compounds, the group of carboxylic acids, the group of sulfates, sulfites and sulfonates and the group of phosphates.
- Preferred anions are chloride, bromide, iodide, SCN “ , OCN “ , CN “ , acetate, C r C 4 alkyl sulfates, R a -COO " , R 3 SO 3 " , R a R b PO 4 " , methanesulfonates, Tosylate, C r C 4 Dialkylphospha- te, hydrogen sulfate or tetrachloroaluminate.
- dialkylimidazolium cations in which the two alkyl groups, identical or different, branched or unbranched, may be substituted by one or more phenyl groups or may be unsubstituted and have from 1 to 6 carbon atoms.
- benzylmethylimidazolium hexylmethylimidazolium, butylmethylimidazolium, ethylmethylimidazolium.
- Particularly preferred anions are tetrachloroaluminate and / or heptachlorodi-aluminate and / or F " and / or Cl " and / or Br " and / or BF 4 " and / or PF 6 " and / or CF 3 SO 3 " and / or (CF 3 SO 3 ) 2 N " and / or SO 4 2" and / or SO 3 2 " and / or PO 4 3"
- an electrolysis device which has at least one anode and at least one cathode in an electrolysis space.
- the at least one anode and the at least one cathode are connected by the electrolyte, which is an ionic liquid, electrolytically conductive.
- B08 / 0552PC It can be used an anode, it can also be used several anodes. These may have the same composition or have different compositions. The same applies to the cathode (s).
- the anode acts as a so-called sacrificial anode containing primary aluminum.
- the at least one anode contains aluminum in a proportion by weight of at least 95 wt .-%, preferably 99 wt .-%, more preferably at least 99.5 wt .-% based on the total weight of the at least one anode.
- composition of the cathode can be selected in a known manner.
- the at least one cathode arranged in the electrolysis device can be selected from different conductive materials.
- the at least one cathode comprises one or more materials selected from metals, alloys, graphite, electrically conductive plastics or polymers and steels.
- the material of the cathode is selected from metals, alloys and steels, in particular selected from steel, Ni, Cu, Zn and Al alloys.
- a three-dimensional cathode is used.
- suitable cathode materials are stainless steel, nickel-base alloys, graphite, copper, and particularly preferably aluminum.
- the electrolyte is moved on the cathode surface, for example by means of stirring, pumping over or moving the entire device.
- the cathode is a workpiece, such as a body part, on which aluminum is deposited.
- the inventive method at a temperature in the range of 20 to 200 0 C, preferably at a temperature in the range of 20 to 120 0 C, particularly preferably at a temperature in the range of 60 to 90 0 C, in particular preferably carried out at a temperature of about 90 ° C.
- the aluminum is generally supplied to the process according to the invention in the form of a metal salt selected from the group AICI 3 , AIBr 3 , AII 3 and AIF 3 .
- AICI is 3
- the invention further relates to the use of additives according to the general formulas (I), (II) and (III) in a process for the electrochemical deposition of aluminum.
- the invention relates to an electrolyte for the electrochemical deposition of aluminum from an ionic liquid containing an ionic liquid containing anions and cations, and one or more metal salts, one or more additives according to the general formulas (I), (II) and ( III), and optionally one or more solvents.
- the electrolyte according to the invention in combination with one or more additives according to the general formulas (I), (II) and (III) proves to be extremely progressive from a galvanotechnical point of view, i. It fulfills the requirements placed on electrolytes for a technically widely applicable and economical aluminum deposition process to a far greater extent than was previously possible.
- a further advantage of the electrolyte according to the invention is that, when used in the electrochemical deposition of aluminum, it leads to an eve-like deposition with gloss or matte finish of aluminum on the cathode.
- the composition of the electrolyte according to the invention may generally vary over wide ranges, so the electrolyte according to the invention contains 0.1 to 10 wt .-% additive and 99.9 to 90 wt .-% of the ionic liquid, and 0 to 50 wt .-%, preferably 10 to 30 wt .-% of one or more organic solvent (s).
- the organic solvent is generally selected from the group of aromatics and heteroaromatics. According to a preferred embodiment of the invention, the solvent is selected from toluene, chlorobenzene, 1, 2-dichlorobenzene, 1, 3-dichlorobenzene, 1, 3-dichlorobenzene, trichlorobenzene and xylene.
- the terminal voltage drops from 991 to 801 mV.
- the electrodes are removed from the electrolyte and washed off successively with 40 ml of acetonitrile, stirred in 100 ml of water for 15 minutes and washed off with isopropanol. Finally, it is dried at 105 ° C. for one hour. Based on the cathodic mass difference, the current efficiency is determined to be 97.3%. The appearance of the cathode coating is dull and dense.
- Example 2 Aluminum deposition of EMIMCI * 1.5 AICI 3 in the presence of 1% by weight of benzothiazole
- the clamping voltage drops from 974 to 850 mV.
- the electrodes are removed from the electrolyte and washed off successively with 40 ml of acetonitrile, stirred in 100 ml of water for 15 minutes and washed off with isopropanol. Finally, it is dried at 105 ° C. for one hour. Based on the cathodic mass difference, the current efficiency is determined to be 95.8%. The appearance of the gray cathode coating is dull and dense.
- the terminal voltage drops from 1812 mV to 1626 mV.
- the electrodes are removed from the electrolyte and washed off successively with 40 ml of acetonitrile, stirred in 100 ml of water for 15 minutes and washed off with isopropanol. Finally, it is dried at 105 ° C. for one hour. Based on the cathodic mass difference, the current efficiency is determined to be 91.3%. The appearance of the cathode coating is silvery shiny.
- Example 4 Aluminum deposition of EMIMCI x 1.5 AICI 3 in the presence of 9% by weight of hexadecyltrimethylammonium chloride
- EMIMCI x 1.5 AICI 3 are introduced and slowly mixed with 9 g of hexadecyltrimethylammonium chloride. Under an Ar inert gas atmosphere, the reaction mixture is heated to 95 ° C, resulting in a homogeneous solution from the initial suspension.
- An Al anode and an Al cathode (both degreased) with an electrode distance of 2 cm and an active surface of 5 cm 2 (1 ⁇ 5 cm) are introduced into the electrolysis cell. Over a period of 10 seconds, an anodic pulse with a potential of 1 V is applied to the cathode.
- the terminal voltage drops from 1296 mV to 805 mV.
- the electrodes are removed from the electrolyte and washed off successively with 40 ml of acetonitrile, stirred in 100 ml of water for 15 minutes and washed off with isopropanol. Finally, it is dried at 105 ° C. for one hour. Based on the cathodic mass difference, the current efficiency is determined to be 100%. The appearance of the gray cathode coating is dull and dense.
- Example 6 Aluminum Deposition from 80.9% by Weight of EMIMCI x 1.5 AICI 3 + 9.1% by Weight of Hexadecyltrimethylammonium Chloride + 10% by Weight of Toluene
- EMIMCI x 1.5 AICI 3 are introduced and added slowly at 8O 0 C with 6.7 g of hexadecyltrimethylammonium chloride and 7.4 g of toluene. Under an Ar inert gas atmosphere, the reaction mixture is heated to 90 0 C, wherein a homogeneous solution is formed.
- an Al anode and a Cu cathode with an electrode distance of 1 cm and an active surface of 10 cm 2 (2 x 5 cm) are introduced.
- the Cu cathode was previously degreased for 10 minutes in an ultrasonic bath in 5% strength by weight Mucasolates at 6O 0 C, rinsed with acetone, pickled for 5 seconds in concentrated nitric acid and rinsed again with acetone.
- Mucasolates at 6O 0 C
- aluminum is deposited on the cathode for more than 1 h, whereby the anode consumes simultaneously in the sense of a sacrificial anode.
- the clamping voltage drops from 3.0 to 2.0 V.
- the electrodes are removed from the electrolyte and washed with 50 ml of acetone. The appearance of the cathode coating is shiny and dense.
- Example 7 Aluminum deposition from 89.1% by weight of EMIMCI ⁇ 1.5 AICI 3 + 0.9% by weight of SDS (sodium lauryl sulfate) + 10% by weight of toluene
- the Cu cathode was previously degreased for 10 minutes in an ultrasonic bath in 5% Mucasolates at 60 0 C, rinsed with acetone, pickled for 5 seconds in concentrated nitric acid and rinsed again with acetone.
- a current density of 40 mA / cm 2 is deposited over 1 h of aluminum on the cathode with the anode consumed simultaneously in the sense of a sacrificial anode.
- the clamping voltage drops from 2.2 to 1.3 V.
- the electrodes are removed from the electrolyte and washed with 50 ml of acetone. The appearance of the cathode coating is dull and dense.
- Example 8 Aluminum Deposition from 69.3% by Weight of EMIMCI x 1.5 AICI 3 + 0.7% by Weight of SDS (Sodium Lauryl Sulfate) + 30% by Weight of Toluene
- EMIMCI x 1.5 AICI 3 are introduced and slowly mixed at 80 0 C with 0.57 g of sodium lauryl sulfate and 24.46 g of toluene. Under an Ar inert gas atmosphere, the reaction mixture is heated to 90 ° C, forming a homogeneous solution.
- an Al anode and a Cu cathode with an electrode distance of 1 cm and an active surface of 10 cm 2 (2 x 5 cm) are introduced.
- the Cu cathode was degreased before 10 minutes in an ultrasonic bath in 5% Mucasolates at 60 ° C, rinsed with acetone, pickled for 5 seconds in concentrated nitric acid and rinsed again with acetone.
- 5% Mucasolates at 60 ° C, rinsed with acetone, pickled for 5 seconds in concentrated nitric acid and rinsed again with acetone.
- aluminum is deposited on the cathode for more than 1 h, whereby the anode consumes simultaneously in the sense of a sacrificial anode.
- the clamping voltage drops from 1.5 to 1.0 V.
- the electrodes are removed from the electrolyte and washed with 50 ml of acetone. The appearance of the cathode coating is dull and dense.
- Example 9 Aluminum Deposition from 69.3% by Weight of EMIMCI x 1.5 AICI 3 + 0.7% by Weight of SDS (Sodium Lauryl Sulfate) + 30% by Weight of Chlorobenzene
- Example 10 Aluminum Deposition from 69.3% by Weight of EMIMCI x 1.5 AICI 3 + 0.7% by Weight of SDS (Sodium Lauryl Sulfate) + 30% by Weight of Chlorobenzene
- Example 11 Aluminum Deposition from 69.3% by Weight of EMIMCI x 1.5 AICI 3 + 0.7% by Weight of SDS (Sodium Lauryl Sulfate) + 30% by Weight of Chlorobenzene
- the standard steel cathode was firstly degreased by means of the Metex Cleaner System from MacDermid, rinsed with water, pickled for 10 seconds with concentrated hydrochloric acid and rinsed with acetone. At 90 ° C. and a current density of 40 mA / cm 2 , aluminum is deposited on the cathode for more than 15 minutes, whereby the anode is simulated.
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- Chemical Kinetics & Catalysis (AREA)
- Electrochemistry (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Application Of Or Painting With Fluid Materials (AREA)
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Abstract
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| EP10708571A EP2419551A2 (fr) | 2009-03-18 | 2010-03-16 | Électrolyte et additifs tensio-actifs pour le dépôt galvanique de couches d'aluminium lisses et compactes à partir de liquides ioniques |
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| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| EP09155495 | 2009-03-18 | ||
| EP10708571A EP2419551A2 (fr) | 2009-03-18 | 2010-03-16 | Électrolyte et additifs tensio-actifs pour le dépôt galvanique de couches d'aluminium lisses et compactes à partir de liquides ioniques |
| PCT/EP2010/053397 WO2010106072A2 (fr) | 2009-03-18 | 2010-03-16 | Électrolyte et additifs tensio-actifs pour le dépôt galvanique de couches d'aluminium lisses et compactes à partir de liquides ioniques |
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| Publication Number | Publication Date |
|---|---|
| EP2419551A2 true EP2419551A2 (fr) | 2012-02-22 |
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| EP10708571A Withdrawn EP2419551A2 (fr) | 2009-03-18 | 2010-03-16 | Électrolyte et additifs tensio-actifs pour le dépôt galvanique de couches d'aluminium lisses et compactes à partir de liquides ioniques |
Country Status (3)
| Country | Link |
|---|---|
| US (1) | US20120006688A1 (fr) |
| EP (1) | EP2419551A2 (fr) |
| WO (1) | WO2010106072A2 (fr) |
Families Citing this family (23)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR20120095470A (ko) | 2009-12-15 | 2012-08-28 | 바스프 에스이 | 전기화학 전지 및 배터리용 전해액 중의 첨가제로서의 티아졸 화합물 |
| DE102011007566A1 (de) | 2010-04-19 | 2012-01-19 | Basf Se | Verfahren zur Herstellung von Zusammensetzungen, welche Aluminiumtrihalogenide enthalten |
| MA34591B1 (fr) | 2010-10-06 | 2013-10-02 | Glaxosmithkline Llc | Dérivés de benzimidazole utilisés comme inhibiteurs de pi3 kinase |
| US9340884B2 (en) | 2010-12-15 | 2016-05-17 | Basf Se | Process for the electrochemical fluorination of organic compounds |
| CN102888631B (zh) * | 2011-07-20 | 2016-04-27 | 中国科学院过程工程研究所 | 一种离子液体低温电沉积制备Al-Bi合金或电镀Al-Bi合金的方法 |
| CN102888630B (zh) * | 2011-07-20 | 2015-11-18 | 中国科学院过程工程研究所 | 一种离子液体/添加剂体系低温电沉积制备纳米铝或纳米铝镀层的方法 |
| DE102011055911B3 (de) * | 2011-12-01 | 2012-11-29 | Volkmar, Prof. Dr. Neubert | Verfahren zur galvanischen Abscheidung wenigstens eines Metalls oder Halbleiters |
| US20130299355A1 (en) * | 2012-05-14 | 2013-11-14 | United Technologies Corporation | Surface cleaning and activation for electrodeposition in ionic liquids |
| US10190227B2 (en) * | 2013-03-14 | 2019-01-29 | Xtalic Corporation | Articles comprising an electrodeposited aluminum alloys |
| WO2014150508A1 (fr) * | 2013-03-15 | 2014-09-25 | United Technologies Corporation | Revêtement sacrificiel et procédure de dépôt électrolytique d'aluminium sur des alliages d'aluminium |
| WO2015003948A1 (fr) * | 2013-07-09 | 2015-01-15 | Basf Se | Dépôt électrochimique d'aluminium à partir de compositions de liquide ionique |
| US9368284B2 (en) | 2013-09-02 | 2016-06-14 | Litronik Entwicklungs Gmbh | Anode electrode for aluminum electrolytic capacitor and respective production method |
| US9903034B2 (en) | 2013-11-22 | 2018-02-27 | Sikorsky Aircraft Corporation | Methods and materials for electroplating aluminum in ionic liquids |
| WO2015157441A1 (fr) | 2014-04-09 | 2015-10-15 | Nulwala Hunaid B | Solvant liquide ionique pour procédé de placage électrolytique |
| US9758888B2 (en) | 2014-05-06 | 2017-09-12 | Apple Inc. | Preparation of metal substrate surfaces for electroplating in ionic liquids |
| WO2016004189A1 (fr) | 2014-07-03 | 2016-01-07 | Nulwala Hunaid B | Compositions sélectionnées pour procédés et dispositifs à base d'aluminium |
| US9752242B2 (en) * | 2014-09-17 | 2017-09-05 | Xtalic Corporation | Leveling additives for electrodeposition |
| CN104694984B (zh) * | 2015-02-13 | 2017-02-01 | 浙江大学 | 一种不锈钢管内壁室温熔盐镀铝装置及镀铝方法 |
| EP3088571B1 (fr) * | 2015-04-28 | 2021-06-02 | The Boeing Company | Revêtements d'aluminium écologique sacrificiels pour des revêtements sacrificiels pour alliages d'acier à résistance élevée |
| CN106086959B (zh) * | 2016-08-03 | 2018-06-12 | 南京理工大学 | 一种电化学还原沉积铝制备铝热剂的方法 |
| US10530864B2 (en) * | 2017-02-15 | 2020-01-07 | Dell Products, L.P. | Load balancing internet-of-things (IOT) gateways |
| US20180320282A1 (en) | 2017-05-05 | 2018-11-08 | Hamilton Sundstrand Corporation | Method of making aluminum-coated metal |
| US11661665B2 (en) | 2020-04-30 | 2023-05-30 | The Boeing Company | Aluminum and aluminum alloy electroplated coatings |
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| DE3202265A1 (de) | 1982-01-25 | 1983-07-28 | Siemens AG, 1000 Berlin und 8000 München | Elektrolyt zur galvanischen abscheidung von aluminium |
| US4981564A (en) * | 1988-07-06 | 1991-01-01 | Technic Inc. | Additives for electroplating compositions and methods for their use |
| US5074973A (en) * | 1989-05-23 | 1991-12-24 | Nisshin Steel Co. Ltd. | Non-aqueous electrolytic aluminum plating bath composition |
| US5433797A (en) * | 1992-11-30 | 1995-07-18 | Queen's University | Nanocrystalline metals |
| DE10108893C5 (de) | 2001-02-23 | 2011-01-13 | Rolf Prof. Dr. Hempelmann | Verfahren zur Herstellung von Metallen und deren Legierungen |
| US7371467B2 (en) * | 2002-01-08 | 2008-05-13 | Applied Materials, Inc. | Process chamber component having electroplated yttrium containing coating |
| US20030234181A1 (en) * | 2002-06-25 | 2003-12-25 | Gino Palumbo | Process for in-situ electroforming a structural layer of metallic material to an outside wall of a metal tube |
| US7128822B2 (en) * | 2003-06-04 | 2006-10-31 | Shipley Company, L.L.C. | Leveler compounds |
| US7442286B2 (en) * | 2004-02-26 | 2008-10-28 | Atotech Deutschland Gmbh | Articles with electroplated zinc-nickel ternary and higher alloys, electroplating baths, processes and systems for electroplating such alloys |
| DE102005016819B4 (de) * | 2005-04-12 | 2009-10-01 | Dr.-Ing. Max Schlötter GmbH & Co KG | Elektrolyt, Verfahren zur Abscheidung von Zinn-Wismut-Legierungsschichten und Verwendung des Elektrolyten |
| DE102005017733A1 (de) | 2005-04-15 | 2006-10-19 | Basf Ag | Löslichkeit von Cellulose in ionischen Flüssigkeiten unter Zugabe von Aminbase |
| JP5080097B2 (ja) * | 2007-02-09 | 2012-11-21 | ディップソール株式会社 | 溶融塩電気アルミニウムめっき浴及びそれを用いためっき方法 |
| JP5270846B2 (ja) * | 2007-02-09 | 2013-08-21 | ディップソール株式会社 | 常温溶融塩浴を用いた電気Al−Zr合金めっき浴とそれを用いるめっき方法 |
| EP1983592A1 (fr) * | 2007-04-17 | 2008-10-22 | Nederlandse Organisatie voor Toegepast-Natuuurwetenschappelijk Onderzoek TNO | Procédé de fabrication d'une électrode |
-
2010
- 2010-03-16 WO PCT/EP2010/053397 patent/WO2010106072A2/fr not_active Ceased
- 2010-03-16 EP EP10708571A patent/EP2419551A2/fr not_active Withdrawn
- 2010-03-16 US US13/257,092 patent/US20120006688A1/en not_active Abandoned
Non-Patent Citations (1)
| Title |
|---|
| See references of WO2010106072A2 * |
Also Published As
| Publication number | Publication date |
|---|---|
| US20120006688A1 (en) | 2012-01-12 |
| WO2010106072A3 (fr) | 2011-09-01 |
| WO2010106072A2 (fr) | 2010-09-23 |
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