EP2339332A3 - X-ray optical arrangement with two focussing elements - Google Patents
X-ray optical arrangement with two focussing elements Download PDFInfo
- Publication number
- EP2339332A3 EP2339332A3 EP10193792.8A EP10193792A EP2339332A3 EP 2339332 A3 EP2339332 A3 EP 2339332A3 EP 10193792 A EP10193792 A EP 10193792A EP 2339332 A3 EP2339332 A3 EP 2339332A3
- Authority
- EP
- European Patent Office
- Prior art keywords
- sample
- ray
- focusing element
- ray optical
- intermediate focus
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- G—PHYSICS
- G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
- G21K—TECHNIQUES FOR HANDLING PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES
- G21K1/00—Arrangements for handling particles or ionising radiation, e.g. focusing or moderating
- G21K1/06—Arrangements for handling particles or ionising radiation, e.g. focusing or moderating using diffraction, refraction or reflection, e.g. monochromators
-
- G—PHYSICS
- G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
- G21K—TECHNIQUES FOR HANDLING PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES
- G21K2201/00—Arrangements for handling radiation or particles
- G21K2201/06—Arrangements for handling radiation or particles using diffractive, refractive or reflecting elements
- G21K2201/064—Arrangements for handling radiation or particles using diffractive, refractive or reflecting elements having a curved surface
Landscapes
- Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Engineering & Computer Science (AREA)
- General Engineering & Computer Science (AREA)
- High Energy & Nuclear Physics (AREA)
- Analysing Materials By The Use Of Radiation (AREA)
Abstract
Ein röntgenoptischer Aufbau (1), umfassend
• eine Position für eine Röntgenquelle (2),
• eine Position für eine Probe (3),
• ein erstes fokussierendes Element (4), mit dem Röntgenlicht von der Position der Röntgenquelle (2) über einen Zwischenfokus (5) auf die Position der Probe (3) gerichtet wird, und
• einen Röntgendetektor (6), der auf einem Kreisbogen (7) mit Radius R um die Position der Probe (3) bewegbar ist,
ist dadurch gekennzeichnet, dass der Aufbau weiterhin umfasst:
• ein zweites fokussierendes Element (8), mit welchem ein Teil des vom Zwischenfokus (5) ausgehenden Röntgenlichts auf die Position der Probe (3) gerichtet wird, und
• ein Blendensystem (9), mit welchem zwischen einer Beleuchtung der Position der Probe (3)
○ ausschließlich vom Zwischenfokus (5) direkt ( = erster Strahlengang (10')) oder
○ ausschließlich über das zweite fokussierende Element (8) (= zweiter Strahlengang (10"))
ausgewählt werden kann.An X-ray optical structure (1) comprising
A position for an X-ray source (2),
A position for a sample (3),
A first focusing element (4), with which X-ray light is directed from the position of the X-ray source (2) via an intermediate focus (5) to the position of the sample (3), and
An X-ray detector (6) which is movable on a circular arc (7) of radius R about the position of the sample (3),
characterized in that the structure further comprises:
A second focusing element (8), with which a part of the X-ray from the intermediate focus (5) is directed to the position of the sample (3), and
A diaphragm system (9) with which between a lighting of the position of the sample (3)
○ exclusively from the intermediate focus (5) directly (= first beam path (10 ')) or
○ exclusively via the second focusing element (8) (= second beam path (10 "))
can be selected.
Durch die Erfindung wird ein Aufbau vorgeschlagen, bei dem ein Wechseln zwischen Reflexions- und Transmissionsgeometrie erleichtert ist, insbesondere wobei Umbau- und Justagearbeiten minimiert oder überflüssig sind. The invention proposes a construction in which a change between reflection and transmission geometry is facilitated, in particular where conversion and adjustment work are minimized or superfluous.
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DE102009047672.5A DE102009047672C5 (en) | 2009-12-08 | 2009-12-08 | X-ray optical construction with two focusing elements |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| EP2339332A2 EP2339332A2 (en) | 2011-06-29 |
| EP2339332A3 true EP2339332A3 (en) | 2013-05-29 |
| EP2339332B1 EP2339332B1 (en) | 2018-12-05 |
Family
ID=43769220
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| EP10193792.8A Active EP2339332B1 (en) | 2009-12-08 | 2010-12-06 | X-ray optical arrangement with two focussing elements |
Country Status (3)
| Country | Link |
|---|---|
| US (1) | US8345822B2 (en) |
| EP (1) | EP2339332B1 (en) |
| DE (1) | DE102009047672C5 (en) |
Families Citing this family (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE102015226101A1 (en) | 2015-12-18 | 2017-06-22 | Bruker Axs Gmbh | X-ray optics assembly with switching system for three beam paths and associated X-ray diffractometer |
| DE102016203588A1 (en) | 2016-03-04 | 2017-09-07 | Bruker Biospin Gmbh | Low-leakage permanent magnet arrangement for MR apparatuses |
| AT523121B1 (en) | 2019-10-21 | 2021-12-15 | Anton Paar Gmbh | X-ray device with multiple beam paths |
Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE10141958A1 (en) * | 2001-08-28 | 2003-04-03 | Bruker Axs Gmbh | X-ray diffractometer |
| US6807251B2 (en) * | 2001-12-28 | 2004-10-19 | Rigaku Corporation | X-ray diffraction apparatus |
| WO2011002037A1 (en) * | 2009-07-01 | 2011-01-06 | 株式会社リガク | X-ray device, method for using same, and method for applying x-rays |
Family Cites Families (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP3757199B2 (en) * | 2002-09-03 | 2006-03-22 | 株式会社リガク | X-ray small angle scattering optical system |
| JP2004333131A (en) * | 2003-04-30 | 2004-11-25 | Rigaku Corp | Total reflection fluorescence xafs measuring apparatus |
| JP4451248B2 (en) * | 2004-08-24 | 2010-04-14 | アイシン・エィ・ダブリュ株式会社 | Resolver |
| JP4860418B2 (en) * | 2006-10-10 | 2012-01-25 | 株式会社リガク | X-ray optical system |
-
2009
- 2009-12-08 DE DE102009047672.5A patent/DE102009047672C5/en active Active
-
2010
- 2010-11-30 US US12/926,607 patent/US8345822B2/en active Active
- 2010-12-06 EP EP10193792.8A patent/EP2339332B1/en active Active
Patent Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE10141958A1 (en) * | 2001-08-28 | 2003-04-03 | Bruker Axs Gmbh | X-ray diffractometer |
| US6807251B2 (en) * | 2001-12-28 | 2004-10-19 | Rigaku Corporation | X-ray diffraction apparatus |
| WO2011002037A1 (en) * | 2009-07-01 | 2011-01-06 | 株式会社リガク | X-ray device, method for using same, and method for applying x-rays |
Also Published As
| Publication number | Publication date |
|---|---|
| US8345822B2 (en) | 2013-01-01 |
| DE102009047672A1 (en) | 2011-06-09 |
| EP2339332A2 (en) | 2011-06-29 |
| DE102009047672B4 (en) | 2012-09-27 |
| DE102009047672C5 (en) | 2014-06-05 |
| EP2339332B1 (en) | 2018-12-05 |
| US20110135059A1 (en) | 2011-06-09 |
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