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EP2066827B1 - Procede et dispositif de depot d'un revetement non metallique par projection a gaz froid - Google Patents

Procede et dispositif de depot d'un revetement non metallique par projection a gaz froid Download PDF

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Publication number
EP2066827B1
EP2066827B1 EP06805371A EP06805371A EP2066827B1 EP 2066827 B1 EP2066827 B1 EP 2066827B1 EP 06805371 A EP06805371 A EP 06805371A EP 06805371 A EP06805371 A EP 06805371A EP 2066827 B1 EP2066827 B1 EP 2066827B1
Authority
EP
European Patent Office
Prior art keywords
reactive gas
particles
substrate
mixture flow
flow
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Not-in-force
Application number
EP06805371A
Other languages
German (de)
English (en)
Other versions
EP2066827A1 (fr
Inventor
Dirk Janz
Jens Dahl Jensen
Jens Klingemann
Ursus KRÜGER
Daniel Körtvelyessy
Volkmar LÜTHEN
Ralph Reiche
Oliver Stier
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Siemens AG
Siemens Corp
Original Assignee
Siemens AG
Siemens Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Siemens AG, Siemens Corp filed Critical Siemens AG
Publication of EP2066827A1 publication Critical patent/EP2066827A1/fr
Application granted granted Critical
Publication of EP2066827B1 publication Critical patent/EP2066827B1/fr
Not-in-force legal-status Critical Current
Anticipated expiration legal-status Critical

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Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C24/00—Coating starting from inorganic powder
    • C23C24/02—Coating starting from inorganic powder by application of pressure only
    • C23C24/04—Impact or kinetic deposition of particles
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C30/00—Coating with metallic material characterised only by the composition of the metallic material, i.e. not characterised by the coating process

Definitions

  • the invention relates to a method and a device for depositing a non-metallic, in particular ceramic coating on a substrate by means of cold gas spraying, according to the preambles of claims 1 and 16.
  • Cold gas spraying is a coating process by which metallic layers, such as copper, silver, aluminum, and the like, can be deposited on a substrate, such as a workpiece to be coated.
  • Ceramic layers can be produced by cold gas spraying only conditionally via the deposition of so-called composite layers. This ceramic particles are embedded in larger metallic particles and thus deposited on the substrate. By suitable annealing of the layers thus deposited, a ceramic layer can be produced by the temperature-induced diffusion of ceramic particles and metallic matrix.
  • a method for cold gas spraying is known.
  • a carrier gas flow is generated, in which particles are introduced.
  • the kinetic energy of the particles leads to a layer formation on a substrate.
  • the substrate has a structural texture which is transferred to the forming layer.
  • a suitable composition of the particles By means of a suitable composition of the particles, a high-temperature superconducting layer can thereby be produced on the substrate. Again, a subsequent annealing of the provided with the layer substrate is provided.
  • High Velocity Oxy-Fuel Flame Spraying can not be used in cold gas spraying directly ceramic particles are used, since they generally do not adhere to the substrate. According to the WO 2005/061116 A1 it is proposed in this regard to mix the ceramic particles with an auxiliary gas and preheat before processing.
  • An object of the invention is to provide a transesterified method with which it is possible to deposit non-metallic layers, in particular ceramic layers, by means of cold gas spraying on a substrate or workpiece.
  • the reactive gas flow may include a carrier gas commonly used for cold gas spraying.
  • the reactive gas flow comprises a carrier gas commonly used for cold gas spraying and a reactive gas added to the carrier gas.
  • the carrier gas itself is the reactive gas.
  • the reactive gas flow can be generated, for example, in that a reactive gas under pressure in a container or a mixture of reactive gas and carrier gas flows out of the container, for example through a pipe or hose line or the like.
  • the inventive method extends the classic cold gas spraying to the possibility of depositing non-metallic, in particular ceramic coatings on a substrate.
  • metallic powders can be used as particles, for example for producing ceramic coatings, as in the classic cold gas spraying method.
  • a reactive gas is used, which gives the desired ceramic coating in a chemical reaction with the material of the particles.
  • Suitable reactive gases are, for example, nitrogen or oxygen.
  • Other reactive gases for producing, for example, carbides are conceivable.
  • the reactive gas is admixed with a carrier gas which can also be used in the classical cold gas spraying.
  • a carrier gas which can also be used in the classical cold gas spraying.
  • metal nitride compounds such as titanium nitride (TiN).
  • the inventive method provides, in addition to carry out an activation of the reactive gas by generating reactive gas radicals in the particle and reactive gas comprehensive mixture flow.
  • the mixture flow containing the particles is conducted, for example, immediately after leaving a nozzle on the way to the substrate, for example by a high-frequency electromagnetic field, such as by microwaves and / or UV light. This leads to a targeted activation of the reactive gas, resulting in the Reattentiongasmolekülen reactive gas radicals.
  • the highly reactive reactive gas radicals initiate the formation of chemical compounds between the particles and the reactive gas, thereby depositing a ceramic coating on the substrate.
  • the generation of the reactive gas radicals in the mixture flow takes place by exciting the reactive gas molecules in the mixture flow by means of electromagnetic radiation with a frequency and flux density suitable for splitting the reactive gas molecules into reactive gas radicals.
  • the electromagnetic radiation can be targeted in their frequency the reactive gas molecules to be activated, which are to be split into reactive gas radicals, are tuned. That the excitation of the reactive gas molecules in the mixture flow by means of electromagnetic high-frequency and / or microwaves and / or ultraviolet light, and / or laser light. All these sources of electromagnetic waves are freely available and thus allow a cost-effective implementation of the method according to the invention.
  • the method comprises the additional process step of an expansion of the mixture flow after the injection of the particles into the reactive gas flow and before the generation of the reactive gas radicals in the mixture flow.
  • reactive gas radicals can be produced more easily and with less energy input.
  • the expansion takes place in a Laval nozzle.
  • a Laval nozzle is particularly suitable for the expansion of subsonic flows of cold gaseous fluids.
  • the expansion preferably takes place in an environment with a pressure level below the normal conditions. As a result, the static pressure in the mixture flow can be lowered even further, whereby the formation of reactive gas radicals even easier and with even less energy use is possible.
  • the method comprises the additional method step of supplying additional reactive gas to the surface of the substrate to be coated.
  • the reaction between the particles and the reactive gas takes place only to a limited extent during the transport of the mixture flow to the surface to be coated.
  • the reaction between particles and reactive gas takes place mainly when the particles hit the substrate. Therefore, the admixture or addition of reactive gas in the region of the surface to be coated by a high partial pressure of activatable reactive gas safely, so that a complete reaction between particles and reactive gas to the coating material takes place at the surface of the substrate.
  • An advantageous embodiment of the method according to the invention provides that the particles are agglomerated nanoparticles.
  • the reaction of reactive gas and metallic particles is all the more complete, the larger the active surface of the particles in relation to their mass.
  • the use of agglomerated nanoparticles thus reliably results in the production of a fully reacted coating.
  • the reactive gas flow comprises a carrier gas suitable for cold gas spraying.
  • the carrier gas itself is the reactive gas.
  • the carrier gas may be admixed with the reactive gas.
  • the reactive gas comprises nitrogen.
  • the reactive gas may comprise oxygen.
  • a particularly advantageous embodiment of the method according to the invention provides that the particles at least partially comprise at least one metal which forms a non-metallic, in particular ceramic coating material by reaction with the reactive gas or with the reactive gas radicals.
  • the device according to the invention makes it possible to carry out a method according to the invention described above and thus allows to utilize the advantages of the method according to the invention.
  • An advantageous embodiment of the device according to the invention provides means for expanding the mixture flow after the injection of the particles into the reactive gas flow and before the generation of the reactive gas radicals in the mixture flow. This is advantageous because in this way the complete particle surfaces enter into the reaction kinetics.
  • the Means for expanding the mixture flow may include, for example, a Laval nozzle.
  • the means for generating the reactive gas radicals in the mixture flow comprise, according to the invention, an electromagnetic high-frequency and / or microwave generator acting on the mixture flow and / or a light source and / or laser light source emitting ultraviolet light.
  • Another advantageous embodiment of the device according to the invention provides means for additional supply of reactive gas to the surface to be coated of the substrate. This is advantageous to ensure complete reaction between particles and reactive gas to the coating material.
  • An in Fig. 1 illustrated apparatus 1 for depositing a ceramic coating on a substrate 2 by means of cold gas spraying comprises a mixing chamber 3, which is supplied to a reactive gas.
  • the reactive gas is supplied to the mixing chamber from a container, not shown, in which a higher pressure prevails, than at the surface to be coated of the substrate 2. This forms when entering the mixing chamber 3, a reactive gas flow 5 from.
  • the reactive gas flow 5 particles 4 are supplied, which consists of a for producing a desired ceramic coating material by reaction with the reactive gas required material. This results in the discharge of the mixing chamber 3, a mixture flow of reactive gas and particles 4.
  • a Laval nozzle 6 is arranged, in which the mixture flow of reactive gas and particles 4 is expanded.
  • a microwave generator 7 adjoining the Laval nozzle 6 serves to produce a formation of the coating material from the reactive gas and the reactive gas radicals initiating the particles in the mixture flow.
  • the mixture of reactive gases and particles 4 impinges on a surface of the substrate 2 to be coated so that a surface consisting of a chemical compound of the material of the particles 4 with the reactive gas, or depositing a ceramic coating formed by a chemical combination of the material of the particles 4 with the reactive gas.
  • a carrier gas and metallic powders may be used as particles.
  • a reactive gas such as molecular oxygen O 2 or molecular nitrogen N 2
  • the carrier gas a reactive gas, for example, molecular oxygen O 2 is added .
  • the sole admixture of the generally inert nitrogen gas to the carrier gas, or the use of nitrogen as the carrier gas, which is also the reactive gas, is not sufficient to, for example, metal nitride compounds such as titanium nitride TiN produce.
  • additionally activation made of the reactive gas for this purpose, the mixture flow containing the particles immediately after leaving the Laval nozzle 6 on the way to the substrate 2, for example, by a high-frequency electromagnetic field, which may be generated for example by microwaves, ultraviolet light or the like, passed. This leads to a targeted activation of the reactive gas used, whereby the reactive gas molecules are split into reactive gas radicals.
  • the then highly reactive reactive gas radicals allow the formation of chemical compounds between the metallic particles 4 and the reactive gas to metal reactive gas compounds such as titanium nitride TiN, titanium oxide TiO 2 and the like.
  • the reactive gas can of course also be offered on the substrate 2, since the reaction of the metallic particles 4 with the reactive gas only to a small extent during transport in the mixing chamber 3, the Laval nozzle 6 and the microwave generator 7 comprising the inventive device 1, but rather takes place mainly on the impact of the particles 4 on the substrate 2.
  • the admixture of the reactive gas to the carrier gas of the cold gas process is advantageous because it can ensure a high partial pressure of activatable reactive gas on the substrate 2.
  • agglomerated nanoparticles are preferably used as particles 4, whereby a completely reacted coating is formed on the substrate 2.

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Other Surface Treatments For Metallic Materials (AREA)
  • Coating By Spraying Or Casting (AREA)
  • Chemically Coating (AREA)

Claims (16)

  1. Procédé de dépôt d'un revêtement non métallique, notamment céramique, sur un substrat ( 2 ), au moyen d'une projection par gaz froid, comprenant les stades de procédé, dans lesquels :
    - on produit un courant ( 5 ) de gaz réactif comprenant au moins un gaz réactif,
    - on injecte dans le courant ( 5 ) de gaz réactif des particules ( 4 ) constituées en au moins un matériau nécessaire pour produire, par réaction avec le gaz réactif, un matériau de revêtement non métallique, notamment céramique, de manière à créer un courant de mélange de gaz réactif et de particules ( 4 ),
    - on dirige un courant de mélange sur une surface à revêtement d'un substrat ( 2 ) de manière à ce qu'un revêtement non métallique, notamment en céramique, se dépose sur la surface du substrat ( 2 ),
    caractérisé par le stade de procédé :
    - on produit des radicaux de gaz réactif dans le courant de mélange, la production des radicaux de gaz réactif s'effectuant dans le courant de mélange par excitation de molécules de gaz réactif au moyen d'ondes électromagnétiques de haute fréquence et/ou de micro-ondes et/ou de lumière ultraviolette et/ou de lumière laser.
  2. Procédé suivant la revendication 1,
    caractérisé par le stade de procédé supplémentaire :
    - on détend le courant de mélange après la réaction des particules ( 4 ) dans le courant ( 5 ) de gaz réactif et avant la production de gaz réactif dans le courant de mélange.
  3. Procédé suivant la revendication 2,
    caractérisé en ce que
    on effectue la détente dans une buse ( 6 ) Laval.
  4. Procédé suivant la revendication 2 ou 3,
    caractérisé en ce que
    on effectue la détente dans une ambiance ayant un niveau de pression en dessous des conditions normales.
  5. Procédé suivant l'une des revendications précédentes, caractérisé par le stade de procédé supplémentaire :
    - on envoie du gaz réactif supplémentaire à la surface à revêtir du substrat ( 2 ).
  6. Procédé suivant l'une des revendications précédentes,
    caractérisé en ce que
    les particules ( 4 ) sont des nanoparticules agglomérées.
  7. Procédé suivant l'une des revendications précédentes,
    caractérisé en ce que
    le courant ( 5 ) de gaz réactif comprend un gaz porteur approprié à l'injection à gaz froid.
  8. Procédé suivant la revendication 7,
    caractérisé en ce que
    le gaz porteur soi-même est le gaz réactif.
  9. Procédé suivant la revendication 7,
    caractérisé en ce que
    le gaz réactif est mélangé au gaz porteur.
  10. Procédé suivant l'une des revendications 7 à 9,
    caractérisé en ce que
    le gaz réactif comprend de l'azote.
  11. Procédé suivant l'une des revendications 7 à 10,
    caractérisé en ce que
    le gaz réactif comprend de l'oxygène.
  12. Procédé suivant l'une des revendications précédentes,
    caractérisé en ce que
    les particules ( 4 ) comprennent, au moins en partie, un métal, qui forme par réaction chimique avec le gaz réactif un matériau de revêtement non métallique, notamment céramique.
  13. Dispositif ( 1 ) de dépôt d'un revêtement non métallique, notamment céramique, sur un substrat au moyen d'une injection à gaz froid, comprenant :
    - des moyens ( 3 ) de production d'un courant ( 5 ) de gaz réactif comprenant au moins un gaz réactif,
    - des moyens ( 3 ) d'injection dans le courant ( 5 ) de gaz réactif des particules (4) constituées d'au moins un matériau nécessaire à la production, par réaction sur le gaz réactif, d'un matériau de revêtement non métallique, notamment céramique de manière à créer un courant de mélange composé du gaz réactif,
    - des moyens pour diriger le courant de mélange sur une surface à revêtir d'un substrat ( 2 ), de manière à ce qu'un revêtement non métallique, notamment céramique, se dépose sur la surface du substrat ( 2 ),
    caractérisé par
    - des moyens ( 7 ) de production de radicaux de gaz réactif dans le courant de mélange, ces moyens comprenant un générateur ( 7 ) de haute fréquence électromagnétique et/ou de micro-ondes et/ou une source lumineuse émettant de la lumière ultraviolette et/ou une source de lumière laser.
  14. Dispositif suivant la revendication 13,
    caractérisé par
    des moyens ( 6 ) de détente du courant de mélange après l'injection des particules ( 4 ) dans le courant ( 5 ) de gaz réactif et avant la production des radicaux de gaz réactif dans le courant de mélange.
  15. Dispositif suivant la revendication 13 ou 14,
    caractérisé en ce que
    les moyens de détente du courant de mélange comprennent une buse ( 6 ) Laval.
  16. Dispositif suivant l'une des revendications 13 à 15,
    caractérisé par
    des moyens d'apport supplémentaire de gaz réactif à la surface à revêtir du substrat ( 2 ).
EP06805371A 2006-09-29 2006-09-29 Procede et dispositif de depot d'un revetement non metallique par projection a gaz froid Not-in-force EP2066827B1 (fr)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
PCT/DE2006/001751 WO2008037237A1 (fr) 2006-09-29 2006-09-29 procédé et dispositif de dépôt d'un revêtement non métallique par projection À gaz froid

Publications (2)

Publication Number Publication Date
EP2066827A1 EP2066827A1 (fr) 2009-06-10
EP2066827B1 true EP2066827B1 (fr) 2011-02-02

Family

ID=37964864

Family Applications (1)

Application Number Title Priority Date Filing Date
EP06805371A Not-in-force EP2066827B1 (fr) 2006-09-29 2006-09-29 Procede et dispositif de depot d'un revetement non metallique par projection a gaz froid

Country Status (7)

Country Link
US (1) US8574687B2 (fr)
EP (1) EP2066827B1 (fr)
AT (1) ATE497548T1 (fr)
CA (1) CA2664929C (fr)
DE (2) DE502006008861D1 (fr)
DK (1) DK2066827T3 (fr)
WO (1) WO2008037237A1 (fr)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE102009033620A1 (de) * 2009-07-17 2011-01-20 Mtu Aero Engines Gmbh Kaltgasspritzen von oxydhaltigen Schutzschichten
MY165224A (en) * 2009-12-04 2018-03-13 Univ Michigan Regents Coaxial laser assisted cold spray nozzle
WO2011156809A2 (fr) * 2010-06-11 2011-12-15 Thermoceramix Inc. Résistances pulvérisées de façon cinétique
AT14202U1 (de) * 2013-09-06 2015-05-15 Plansee Se Verfahren zur Oberflächenbehandlung mittels Kaltgasspritzen

Family Cites Families (12)

* Cited by examiner, † Cited by third party
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JP2000223446A (ja) * 1998-11-27 2000-08-11 Denso Corp 半導体装置およびその製造方法
JP2004095918A (ja) * 2002-08-30 2004-03-25 Fasl Japan Ltd 半導体記憶装置及び半導体装置の製造方法
US7300743B2 (en) * 2003-03-06 2007-11-27 E. I. Du Pont De Nemours And Company Radiation durable organic compounds with high transparency in the vacuum ultraviolet, and method for preparing
DE10319481A1 (de) * 2003-04-30 2004-11-18 Linde Ag Lavaldüse für das thermische Spritzen und das kinetische Spritzen
US20050137092A1 (en) * 2003-05-23 2005-06-23 John Mester Superconductive contacts with hydroxide-catalyzed bonds that retain superconductivity and provide mechanical fastening strength
KR100605099B1 (ko) * 2003-06-04 2006-07-26 삼성전자주식회사 산화막 형성 방법 및 이를 이용하여 리세스된 게이트를갖는 트랜지스터를 제조하는 방법
US20050065035A1 (en) * 2003-06-10 2005-03-24 Rupich Martin W. Superconductor methods and reactors
KR100515608B1 (ko) 2003-12-24 2005-09-16 재단법인 포항산업과학연구원 분말 예열 장치가 구비된 저온 스프레이 장치
DE102004029354A1 (de) * 2004-05-04 2005-12-01 Linde Ag Verfahren und Vorrichtung zum Kaltgasspritzen
US20060093736A1 (en) * 2004-10-29 2006-05-04 Derek Raybould Aluminum articles with wear-resistant coatings and methods for applying the coatings onto the articles
US20060090593A1 (en) * 2004-11-03 2006-05-04 Junhai Liu Cold spray formation of thin metal coatings
DE102004059716B3 (de) * 2004-12-08 2006-04-06 Siemens Ag Verfahren zum Kaltgasspritzen

Also Published As

Publication number Publication date
DE112006004160A5 (de) 2009-09-03
CA2664929A1 (fr) 2008-04-03
DE502006008861D1 (de) 2011-03-17
DK2066827T3 (da) 2011-05-23
WO2008037237A1 (fr) 2008-04-03
CA2664929C (fr) 2014-07-08
US8574687B2 (en) 2013-11-05
US20100183826A1 (en) 2010-07-22
ATE497548T1 (de) 2011-02-15
EP2066827A1 (fr) 2009-06-10

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