EP1828055A2 - Water-free metal oxide colloids and metal oxide polymers, method for the production thereof and use thereof - Google Patents
Water-free metal oxide colloids and metal oxide polymers, method for the production thereof and use thereofInfo
- Publication number
- EP1828055A2 EP1828055A2 EP05814848A EP05814848A EP1828055A2 EP 1828055 A2 EP1828055 A2 EP 1828055A2 EP 05814848 A EP05814848 A EP 05814848A EP 05814848 A EP05814848 A EP 05814848A EP 1828055 A2 EP1828055 A2 EP 1828055A2
- Authority
- EP
- European Patent Office
- Prior art keywords
- metal oxide
- metal
- colloids
- oxide polymers
- compounds
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Withdrawn
Links
- 229910044991 metal oxide Inorganic materials 0.000 title claims abstract description 82
- 150000004706 metal oxides Chemical class 0.000 title claims abstract description 81
- 239000000084 colloidal system Substances 0.000 title claims abstract description 42
- 229920000642 polymer Polymers 0.000 title claims abstract description 41
- 238000000034 method Methods 0.000 title claims description 18
- 238000004519 manufacturing process Methods 0.000 title description 5
- -1 organo radical Chemical class 0.000 claims abstract description 38
- 125000004432 carbon atom Chemical group C* 0.000 claims abstract description 25
- 125000000217 alkyl group Chemical group 0.000 claims abstract description 19
- 229910052794 bromium Inorganic materials 0.000 claims abstract description 19
- 229910052801 chlorine Inorganic materials 0.000 claims abstract description 19
- 229910052740 iodine Inorganic materials 0.000 claims abstract description 17
- 125000003118 aryl group Chemical group 0.000 claims abstract description 10
- 229910052710 silicon Inorganic materials 0.000 claims abstract description 9
- 239000003791 organic solvent mixture Substances 0.000 claims abstract description 8
- 125000003545 alkoxy group Chemical group 0.000 claims abstract description 7
- 150000005840 aryl radicals Chemical class 0.000 claims abstract description 7
- 229910052719 titanium Inorganic materials 0.000 claims abstract description 7
- 229910052731 fluorine Inorganic materials 0.000 claims abstract description 6
- 229910052732 germanium Inorganic materials 0.000 claims abstract description 4
- 229910052735 hafnium Inorganic materials 0.000 claims abstract description 4
- 229910052718 tin Inorganic materials 0.000 claims abstract description 4
- 229910052726 zirconium Inorganic materials 0.000 claims abstract description 4
- WYURNTSHIVDZCO-UHFFFAOYSA-N Tetrahydrofuran Chemical compound C1CCOC1 WYURNTSHIVDZCO-UHFFFAOYSA-N 0.000 claims description 60
- 150000002367 halogens Chemical group 0.000 claims description 26
- 229910052751 metal Inorganic materials 0.000 claims description 23
- 239000002184 metal Substances 0.000 claims description 23
- 229910001507 metal halide Inorganic materials 0.000 claims description 23
- 229910052736 halogen Inorganic materials 0.000 claims description 20
- 229910003902 SiCl 4 Inorganic materials 0.000 claims description 15
- 239000007787 solid Substances 0.000 claims description 13
- CPLXHLVBOLITMK-UHFFFAOYSA-N Magnesium oxide Chemical compound [Mg]=O CPLXHLVBOLITMK-UHFFFAOYSA-N 0.000 claims description 12
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 claims description 12
- 239000002904 solvent Substances 0.000 claims description 12
- 150000001875 compounds Chemical class 0.000 claims description 11
- 238000002360 preparation method Methods 0.000 claims description 10
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 claims description 9
- XLOMVQKBTHCTTD-UHFFFAOYSA-N Zinc monoxide Chemical compound [Zn]=O XLOMVQKBTHCTTD-UHFFFAOYSA-N 0.000 claims description 9
- 239000000370 acceptor Substances 0.000 claims description 9
- 239000000203 mixture Substances 0.000 claims description 9
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 claims description 8
- 239000000010 aprotic solvent Substances 0.000 claims description 8
- 229910001404 rare earth metal oxide Inorganic materials 0.000 claims description 8
- 229910021193 La 2 O 3 Inorganic materials 0.000 claims description 7
- 229930195733 hydrocarbon Natural products 0.000 claims description 7
- 150000002430 hydrocarbons Chemical class 0.000 claims description 7
- WEVYAHXRMPXWCK-UHFFFAOYSA-N Acetonitrile Chemical compound CC#N WEVYAHXRMPXWCK-UHFFFAOYSA-N 0.000 claims description 6
- UHOVQNZJYSORNB-UHFFFAOYSA-N Benzene Chemical compound C1=CC=CC=C1 UHOVQNZJYSORNB-UHFFFAOYSA-N 0.000 claims description 6
- XEKOWRVHYACXOJ-UHFFFAOYSA-N Ethyl acetate Chemical compound CCOC(C)=O XEKOWRVHYACXOJ-UHFFFAOYSA-N 0.000 claims description 6
- ZMANZCXQSJIPKH-UHFFFAOYSA-N Triethylamine Chemical compound CCN(CC)CC ZMANZCXQSJIPKH-UHFFFAOYSA-N 0.000 claims description 6
- 230000015572 biosynthetic process Effects 0.000 claims description 6
- IEJIGPNLZYLLBP-UHFFFAOYSA-N dimethyl carbonate Chemical compound COC(=O)OC IEJIGPNLZYLLBP-UHFFFAOYSA-N 0.000 claims description 6
- VLKZOEOYAKHREP-UHFFFAOYSA-N n-Hexane Chemical compound CCCCCC VLKZOEOYAKHREP-UHFFFAOYSA-N 0.000 claims description 6
- 230000008569 process Effects 0.000 claims description 6
- 229910017493 Nd 2 O 3 Inorganic materials 0.000 claims description 5
- 239000003054 catalyst Substances 0.000 claims description 5
- 229910052761 rare earth metal Inorganic materials 0.000 claims description 5
- 238000003786 synthesis reaction Methods 0.000 claims description 5
- JWUJQDFVADABEY-UHFFFAOYSA-N 2-methyltetrahydrofuran Chemical compound CC1CCCO1 JWUJQDFVADABEY-UHFFFAOYSA-N 0.000 claims description 4
- YEJRWHAVMIAJKC-UHFFFAOYSA-N 4-Butyrolactone Chemical compound O=C1CCCO1 YEJRWHAVMIAJKC-UHFFFAOYSA-N 0.000 claims description 4
- IAZDPXIOMUYVGZ-UHFFFAOYSA-N Dimethylsulphoxide Chemical compound CS(C)=O IAZDPXIOMUYVGZ-UHFFFAOYSA-N 0.000 claims description 4
- YNQLUTRBYVCPMQ-UHFFFAOYSA-N Ethylbenzene Chemical compound CCC1=CC=CC=C1 YNQLUTRBYVCPMQ-UHFFFAOYSA-N 0.000 claims description 4
- OFBQJSOFQDEBGM-UHFFFAOYSA-N Pentane Chemical compound CCCCC OFBQJSOFQDEBGM-UHFFFAOYSA-N 0.000 claims description 4
- 150000001408 amides Chemical class 0.000 claims description 4
- 150000004651 carbonic acid esters Chemical class 0.000 claims description 4
- 150000001733 carboxylic acid esters Chemical class 0.000 claims description 4
- RWGFKTVRMDUZSP-UHFFFAOYSA-N cumene Chemical compound CC(C)C1=CC=CC=C1 RWGFKTVRMDUZSP-UHFFFAOYSA-N 0.000 claims description 4
- 150000002576 ketones Chemical class 0.000 claims description 4
- 239000000463 material Substances 0.000 claims description 4
- 150000005309 metal halides Chemical class 0.000 claims description 4
- 150000002739 metals Chemical class 0.000 claims description 4
- QPJVMBTYPHYUOC-UHFFFAOYSA-N methyl benzoate Chemical compound COC(=O)C1=CC=CC=C1 QPJVMBTYPHYUOC-UHFFFAOYSA-N 0.000 claims description 4
- UAEPNZWRGJTJPN-UHFFFAOYSA-N methylcyclohexane Chemical compound CC1CCCCC1 UAEPNZWRGJTJPN-UHFFFAOYSA-N 0.000 claims description 4
- FDPIMTJIUBPUKL-UHFFFAOYSA-N pentan-3-one Chemical compound CCC(=O)CC FDPIMTJIUBPUKL-UHFFFAOYSA-N 0.000 claims description 4
- RUOJZAUFBMNUDX-UHFFFAOYSA-N propylene carbonate Chemical compound CC1COC(=O)O1 RUOJZAUFBMNUDX-UHFFFAOYSA-N 0.000 claims description 4
- 150000003464 sulfur compounds Chemical class 0.000 claims description 4
- 150000003512 tertiary amines Chemical class 0.000 claims description 4
- KCYCGNHQFGTGSS-UWVGGRQHSA-N (2S,5S)-5-amino-4-oxo-1,2,4,5,6,7-hexahydroazepino[3,2,1-hi]indole-2-carboxylic acid Chemical compound O=C1[C@@H](N)CCC2=CC=CC3=C2N1[C@H](C(O)=O)C3 KCYCGNHQFGTGSS-UWVGGRQHSA-N 0.000 claims description 3
- 239000004215 Carbon black (E152) Substances 0.000 claims description 3
- 229910003691 SiBr Inorganic materials 0.000 claims description 3
- 229910052788 barium Inorganic materials 0.000 claims description 3
- 229910052791 calcium Inorganic materials 0.000 claims description 3
- 229920001577 copolymer Polymers 0.000 claims description 3
- 125000004122 cyclic group Chemical group 0.000 claims description 3
- 238000001035 drying Methods 0.000 claims description 3
- 150000002148 esters Chemical class 0.000 claims description 3
- 239000011521 glass Substances 0.000 claims description 3
- 229910052749 magnesium Inorganic materials 0.000 claims description 3
- 229910052748 manganese Inorganic materials 0.000 claims description 3
- 150000002825 nitriles Chemical class 0.000 claims description 3
- 239000002798 polar solvent Substances 0.000 claims description 3
- 229920000728 polyester Polymers 0.000 claims description 3
- 229920000098 polyolefin Polymers 0.000 claims description 3
- 238000001556 precipitation Methods 0.000 claims description 3
- 150000003254 radicals Chemical class 0.000 claims description 3
- 229910052706 scandium Inorganic materials 0.000 claims description 3
- 229910052712 strontium Inorganic materials 0.000 claims description 3
- 238000004381 surface treatment Methods 0.000 claims description 3
- 229910052727 yttrium Inorganic materials 0.000 claims description 3
- 229910052725 zinc Inorganic materials 0.000 claims description 3
- AZTFYJYLDIQSAG-UHFFFAOYSA-N 1-(4-chlorophenyl)-2-(propan-2-ylamino)propan-1-one Chemical compound CC(C)NC(C)C(=O)C1=CC=C(Cl)C=C1 AZTFYJYLDIQSAG-UHFFFAOYSA-N 0.000 claims description 2
- XDTMQSROBMDMFD-UHFFFAOYSA-N Cyclohexane Chemical compound C1CCCCC1 XDTMQSROBMDMFD-UHFFFAOYSA-N 0.000 claims description 2
- OIFBSDVPJOWBCH-UHFFFAOYSA-N Diethyl carbonate Chemical compound CCOC(=O)OCC OIFBSDVPJOWBCH-UHFFFAOYSA-N 0.000 claims description 2
- KMTRUDSVKNLOMY-UHFFFAOYSA-N Ethylene carbonate Chemical compound O=C1OCCO1 KMTRUDSVKNLOMY-UHFFFAOYSA-N 0.000 claims description 2
- 229910052765 Lutetium Inorganic materials 0.000 claims description 2
- KWYHDKDOAIKMQN-UHFFFAOYSA-N N,N,N',N'-tetramethylethylenediamine Chemical compound CN(C)CCN(C)C KWYHDKDOAIKMQN-UHFFFAOYSA-N 0.000 claims description 2
- FXHOOIRPVKKKFG-UHFFFAOYSA-N N,N-Dimethylacetamide Chemical compound CN(C)C(C)=O FXHOOIRPVKKKFG-UHFFFAOYSA-N 0.000 claims description 2
- SECXISVLQFMRJM-UHFFFAOYSA-N N-Methylpyrrolidone Chemical compound CN1CCCC1=O SECXISVLQFMRJM-UHFFFAOYSA-N 0.000 claims description 2
- 229910052772 Samarium Inorganic materials 0.000 claims description 2
- 229910052769 Ytterbium Inorganic materials 0.000 claims description 2
- 150000001335 aliphatic alkanes Chemical class 0.000 claims description 2
- 239000002518 antifoaming agent Substances 0.000 claims description 2
- KVNRLNFWIYMESJ-UHFFFAOYSA-N butyronitrile Chemical compound CCCC#N KVNRLNFWIYMESJ-UHFFFAOYSA-N 0.000 claims description 2
- 150000001768 cations Chemical class 0.000 claims description 2
- 239000000919 ceramic Substances 0.000 claims description 2
- SLLGVCUQYRMELA-UHFFFAOYSA-N chlorosilicon Chemical compound Cl[Si] SLLGVCUQYRMELA-UHFFFAOYSA-N 0.000 claims description 2
- 239000011248 coating agent Substances 0.000 claims description 2
- 238000000576 coating method Methods 0.000 claims description 2
- 239000011263 electroactive material Substances 0.000 claims description 2
- 150000002170 ethers Chemical class 0.000 claims description 2
- 238000001704 evaporation Methods 0.000 claims description 2
- 230000008020 evaporation Effects 0.000 claims description 2
- 239000003349 gelling agent Substances 0.000 claims description 2
- 239000002638 heterogeneous catalyst Substances 0.000 claims description 2
- 229910052742 iron Inorganic materials 0.000 claims description 2
- 239000000314 lubricant Substances 0.000 claims description 2
- 229940095102 methyl benzoate Drugs 0.000 claims description 2
- GYNNXHKOJHMOHS-UHFFFAOYSA-N methyl-cycloheptane Natural products CC1CCCCCC1 GYNNXHKOJHMOHS-UHFFFAOYSA-N 0.000 claims description 2
- 239000004033 plastic Substances 0.000 claims description 2
- 229920003023 plastic Polymers 0.000 claims description 2
- 150000002910 rare earth metals Chemical class 0.000 claims description 2
- YCOZIPAWZNQLMR-UHFFFAOYSA-N heptane - octane Natural products CCCCCCCCCCCCCCC YCOZIPAWZNQLMR-UHFFFAOYSA-N 0.000 claims 1
- KTSWBLUMAWETAK-UHFFFAOYSA-N heptane octane Chemical compound CCCCCCC.CCCCCCCC.CCCCCCC KTSWBLUMAWETAK-UHFFFAOYSA-N 0.000 claims 1
- 150000003839 salts Chemical class 0.000 claims 1
- 125000005843 halogen group Chemical group 0.000 abstract 1
- YLQBMQCUIZJEEH-UHFFFAOYSA-N tetrahydrofuran Natural products C=1C=COC=1 YLQBMQCUIZJEEH-UHFFFAOYSA-N 0.000 description 29
- 239000000460 chlorine Substances 0.000 description 27
- 229910004298 SiO 2 Inorganic materials 0.000 description 18
- 238000010992 reflux Methods 0.000 description 8
- 239000000243 solution Substances 0.000 description 8
- 125000001424 substituent group Chemical group 0.000 description 8
- 239000000499 gel Substances 0.000 description 7
- 239000007788 liquid Substances 0.000 description 7
- 239000000047 product Substances 0.000 description 7
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 7
- 238000006243 chemical reaction Methods 0.000 description 6
- 239000011777 magnesium Substances 0.000 description 6
- 239000000395 magnesium oxide Substances 0.000 description 6
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 5
- 239000000725 suspension Substances 0.000 description 5
- 239000010936 titanium Substances 0.000 description 5
- 239000000706 filtrate Substances 0.000 description 4
- 238000001914 filtration Methods 0.000 description 4
- 238000001879 gelation Methods 0.000 description 4
- PLDDOISOJJCEMH-UHFFFAOYSA-N neodymium(3+);oxygen(2-) Chemical compound [O-2].[O-2].[O-2].[Nd+3].[Nd+3] PLDDOISOJJCEMH-UHFFFAOYSA-N 0.000 description 4
- 238000003756 stirring Methods 0.000 description 4
- 239000011787 zinc oxide Substances 0.000 description 4
- 239000006227 byproduct Substances 0.000 description 3
- 229910052739 hydrogen Inorganic materials 0.000 description 3
- XEEYBQQBJWHFJM-UHFFFAOYSA-N iron Substances [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 3
- 239000011572 manganese Substances 0.000 description 3
- 239000002994 raw material Substances 0.000 description 3
- 238000000926 separation method Methods 0.000 description 3
- 238000003860 storage Methods 0.000 description 3
- 239000011701 zinc Substances 0.000 description 3
- VXEGSRKPIUDPQT-UHFFFAOYSA-N 4-[4-(4-methoxyphenyl)piperazin-1-yl]aniline Chemical compound C1=CC(OC)=CC=C1N1CCN(C=2C=CC(N)=CC=2)CC1 VXEGSRKPIUDPQT-UHFFFAOYSA-N 0.000 description 2
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 2
- LCGLNKUTAGEVQW-UHFFFAOYSA-N Dimethyl ether Chemical compound COC LCGLNKUTAGEVQW-UHFFFAOYSA-N 0.000 description 2
- UQSXHKLRYXJYBZ-UHFFFAOYSA-N Iron oxide Chemical compound [Fe]=O UQSXHKLRYXJYBZ-UHFFFAOYSA-N 0.000 description 2
- BZLVMXJERCGZMT-UHFFFAOYSA-N Methyl tert-butyl ether Chemical compound COC(C)(C)C BZLVMXJERCGZMT-UHFFFAOYSA-N 0.000 description 2
- LRHPLDYGYMQRHN-UHFFFAOYSA-N N-Butanol Chemical compound CCCCO LRHPLDYGYMQRHN-UHFFFAOYSA-N 0.000 description 2
- IMNFDUFMRHMDMM-UHFFFAOYSA-N N-Heptane Chemical compound CCCCCCC IMNFDUFMRHMDMM-UHFFFAOYSA-N 0.000 description 2
- 239000004698 Polyethylene Substances 0.000 description 2
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical group [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 2
- 229910010413 TiO 2 Inorganic materials 0.000 description 2
- 239000013543 active substance Substances 0.000 description 2
- 238000004458 analytical method Methods 0.000 description 2
- 125000004429 atom Chemical group 0.000 description 2
- 238000005352 clarification Methods 0.000 description 2
- 150000004796 dialkyl magnesium compounds Chemical class 0.000 description 2
- 238000004817 gas chromatography Methods 0.000 description 2
- AMWRITDGCCNYAT-UHFFFAOYSA-L hydroxy(oxo)manganese;manganese Chemical compound [Mn].O[Mn]=O.O[Mn]=O AMWRITDGCCNYAT-UHFFFAOYSA-L 0.000 description 2
- 230000003647 oxidation Effects 0.000 description 2
- 238000007254 oxidation reaction Methods 0.000 description 2
- 229920001707 polybutylene terephthalate Polymers 0.000 description 2
- 238000006068 polycondensation reaction Methods 0.000 description 2
- 229920000573 polyethylene Polymers 0.000 description 2
- 229920000139 polyethylene terephthalate Polymers 0.000 description 2
- 239000005020 polyethylene terephthalate Substances 0.000 description 2
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- 239000005049 silicon tetrachloride Substances 0.000 description 2
- 238000007711 solidification Methods 0.000 description 2
- 230000008023 solidification Effects 0.000 description 2
- WKBOTKDWSSQWDR-UHFFFAOYSA-N Bromine atom Chemical class [Br] WKBOTKDWSSQWDR-UHFFFAOYSA-N 0.000 description 1
- ZAMOUSCENKQFHK-UHFFFAOYSA-N Chlorine atom Chemical compound [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 description 1
- 229910052692 Dysprosium Inorganic materials 0.000 description 1
- 229910052691 Erbium Inorganic materials 0.000 description 1
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 1
- 229910052693 Europium Inorganic materials 0.000 description 1
- 230000005526 G1 to G0 transition Effects 0.000 description 1
- 229910052688 Gadolinium Inorganic materials 0.000 description 1
- 229910052689 Holmium Inorganic materials 0.000 description 1
- SUYHYHLFUHHVJQ-UHFFFAOYSA-N Menazon Chemical compound COP(=S)(OC)SCC1=NC(N)=NC(N)=N1 SUYHYHLFUHHVJQ-UHFFFAOYSA-N 0.000 description 1
- 229910052779 Neodymium Inorganic materials 0.000 description 1
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- 229910004283 SiO 4 Inorganic materials 0.000 description 1
- 229910052771 Terbium Inorganic materials 0.000 description 1
- DHXVGJBLRPWPCS-UHFFFAOYSA-N Tetrahydropyran Chemical compound C1CCOCC1 DHXVGJBLRPWPCS-UHFFFAOYSA-N 0.000 description 1
- 229910052775 Thulium Inorganic materials 0.000 description 1
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 1
- 230000002378 acidificating effect Effects 0.000 description 1
- 238000004220 aggregation Methods 0.000 description 1
- 230000002776 aggregation Effects 0.000 description 1
- 150000001298 alcohols Chemical class 0.000 description 1
- 238000006136 alcoholysis reaction Methods 0.000 description 1
- 229910001854 alkali hydroxide Inorganic materials 0.000 description 1
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- 239000007900 aqueous suspension Substances 0.000 description 1
- 229910052786 argon Inorganic materials 0.000 description 1
- 239000011230 binding agent Substances 0.000 description 1
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- 125000001246 bromo group Chemical group Br* 0.000 description 1
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- 239000007810 chemical reaction solvent Substances 0.000 description 1
- 239000003795 chemical substances by application Substances 0.000 description 1
- 125000001309 chloro group Chemical group Cl* 0.000 description 1
- GTDCAOYDHVNFCP-UHFFFAOYSA-N chloro(trihydroxy)silane Chemical class O[Si](O)(O)Cl GTDCAOYDHVNFCP-UHFFFAOYSA-N 0.000 description 1
- 238000004587 chromatography analysis Methods 0.000 description 1
- 238000005354 coacervation Methods 0.000 description 1
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- 229910052746 lanthanum Inorganic materials 0.000 description 1
- AXZKOIWUVFPNLO-UHFFFAOYSA-N magnesium;oxygen(2-) Chemical compound [O-2].[Mg+2] AXZKOIWUVFPNLO-UHFFFAOYSA-N 0.000 description 1
- VASIZKWUTCETSD-UHFFFAOYSA-N manganese(II) oxide Inorganic materials [Mn]=O VASIZKWUTCETSD-UHFFFAOYSA-N 0.000 description 1
- 125000005609 naphthenate group Chemical group 0.000 description 1
- 238000000655 nuclear magnetic resonance spectrum Methods 0.000 description 1
- TVMXDCGIABBOFY-UHFFFAOYSA-N octane Chemical compound CCCCCCCC TVMXDCGIABBOFY-UHFFFAOYSA-N 0.000 description 1
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- 229920001296 polysiloxane Polymers 0.000 description 1
- 235000019353 potassium silicate Nutrition 0.000 description 1
- 230000002035 prolonged effect Effects 0.000 description 1
- 239000003586 protic polar solvent Substances 0.000 description 1
- 239000010453 quartz Substances 0.000 description 1
- 230000009467 reduction Effects 0.000 description 1
- 239000012262 resinous product Substances 0.000 description 1
- SIXSYDAISGFNSX-UHFFFAOYSA-N scandium atom Chemical group [Sc] SIXSYDAISGFNSX-UHFFFAOYSA-N 0.000 description 1
- 239000005368 silicate glass Substances 0.000 description 1
- 150000004760 silicates Chemical class 0.000 description 1
- RMAQACBXLXPBSY-UHFFFAOYSA-N silicic acid Chemical compound O[Si](O)(O)O RMAQACBXLXPBSY-UHFFFAOYSA-N 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- AIFMYMZGQVTROK-UHFFFAOYSA-N silicon tetrabromide Chemical compound Br[Si](Br)(Br)Br AIFMYMZGQVTROK-UHFFFAOYSA-N 0.000 description 1
- 229920005573 silicon-containing polymer Polymers 0.000 description 1
- HPALAKNZSZLMCH-UHFFFAOYSA-M sodium;chloride;hydrate Chemical compound O.[Na+].[Cl-] HPALAKNZSZLMCH-UHFFFAOYSA-M 0.000 description 1
- 239000012453 solvate Substances 0.000 description 1
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- 239000000126 substance Substances 0.000 description 1
- 239000000758 substrate Substances 0.000 description 1
- 230000007704 transition Effects 0.000 description 1
- ORVMIVQULIKXCP-UHFFFAOYSA-N trichloro(phenyl)silane Chemical compound Cl[Si](Cl)(Cl)C1=CC=CC=C1 ORVMIVQULIKXCP-UHFFFAOYSA-N 0.000 description 1
- 238000005406 washing Methods 0.000 description 1
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Classifications
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B33/00—Silicon; Compounds thereof
- C01B33/113—Silicon oxides; Hydrates thereof
- C01B33/12—Silica; Hydrates thereof, e.g. lepidoic silicic acid
- C01B33/14—Colloidal silica, e.g. dispersions, gels, sols
- C01B33/145—Preparation of hydroorganosols, organosols or dispersions in an organic medium
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J13/00—Colloid chemistry, e.g. the production of colloidal materials or their solutions, not otherwise provided for; Making microcapsules or microballoons
- B01J13/0004—Preparation of sols
- B01J13/0026—Preparation of sols containing a liquid organic phase
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J13/00—Colloid chemistry, e.g. the production of colloidal materials or their solutions, not otherwise provided for; Making microcapsules or microballoons
- B01J13/0004—Preparation of sols
- B01J13/0047—Preparation of sols containing a metal oxide
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01G—COMPOUNDS CONTAINING METALS NOT COVERED BY SUBCLASSES C01D OR C01F
- C01G1/00—Methods of preparing compounds of metals not covered by subclasses C01B, C01C, C01D, or C01F, in general
- C01G1/02—Oxides
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01G—COMPOUNDS CONTAINING METALS NOT COVERED BY SUBCLASSES C01D OR C01F
- C01G17/00—Compounds of germanium
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01G—COMPOUNDS CONTAINING METALS NOT COVERED BY SUBCLASSES C01D OR C01F
- C01G17/00—Compounds of germanium
- C01G17/02—Germanium dioxide
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01G—COMPOUNDS CONTAINING METALS NOT COVERED BY SUBCLASSES C01D OR C01F
- C01G19/00—Compounds of tin
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01G—COMPOUNDS CONTAINING METALS NOT COVERED BY SUBCLASSES C01D OR C01F
- C01G19/00—Compounds of tin
- C01G19/02—Oxides
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01G—COMPOUNDS CONTAINING METALS NOT COVERED BY SUBCLASSES C01D OR C01F
- C01G23/00—Compounds of titanium
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01G—COMPOUNDS CONTAINING METALS NOT COVERED BY SUBCLASSES C01D OR C01F
- C01G23/00—Compounds of titanium
- C01G23/04—Oxides; Hydroxides
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01G—COMPOUNDS CONTAINING METALS NOT COVERED BY SUBCLASSES C01D OR C01F
- C01G25/00—Compounds of zirconium
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01G—COMPOUNDS CONTAINING METALS NOT COVERED BY SUBCLASSES C01D OR C01F
- C01G25/00—Compounds of zirconium
- C01G25/02—Oxides
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01G—COMPOUNDS CONTAINING METALS NOT COVERED BY SUBCLASSES C01D OR C01F
- C01G27/00—Compounds of hafnium
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01G—COMPOUNDS CONTAINING METALS NOT COVERED BY SUBCLASSES C01D OR C01F
- C01G27/00—Compounds of hafnium
- C01G27/02—Oxides
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
- C01P2002/00—Crystal-structural characteristics
- C01P2002/80—Crystal-structural characteristics defined by measured data other than those specified in group C01P2002/70
- C01P2002/86—Crystal-structural characteristics defined by measured data other than those specified in group C01P2002/70 by NMR- or ESR-data
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- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
- C01P2006/00—Physical properties of inorganic compounds
- C01P2006/60—Optical properties, e.g. expressed in CIELAB-values
Definitions
- the invention relates to anhydrous metal oxide sols or metal oxide colloids and metal oxide polymers and to processes for their preparation and their use.
- Sols are colloidal solutions in which a solid or liquid substance in the finest distribution, e.g. in a liquid medium.
- organosols these are suspensions in an organic solvent
- hydrosols these are aqueous suspensions, for example silica sol.
- coagulation coagulation
- the sols go into so-called gels, which is usually externally noticeable by a reduction in flowability, that is solidification or coacervation, noticeable.
- Insoluble metal oxides such as SiO 2
- water glasses can be dissolved in water by addition of alkali oxides or hydroxides, resulting in so-called water glasses. These viscous solutions can be used in different ways in brine,
- silica gels Gels or true suspensions (e.g., production of silica). From this, so-called silica gels can be produced, which are used for silica.
- Surface treatment e.g., building protection
- building protection e.g., building protection
- Silicones are compounds in which silicon atoms are bridged via oxygen atoms, but each Si atom carries one or more organic groups. These oligo- or polymers are generally prepared from halosilanes by hydrolysis or alcoholysis and subsequent polycondensation, e.g.
- silicone polymers having rubbery properties are obtained (H.H. Moretto, M. Schulze, G. Wagner, in: Ullmann's Encyclopeidia of Industrial Chemistry, VoI A24, 57-93, 1993).
- a SiO 2 -containing solid Frequently used as substrates for heterogeneous (ie solid-supported) catalysts is a SiO 2 -containing solid.
- a catalyst support suitable for Ziegler's polyolefin synthesis consisting of SiO 2 / MgCl 2 is prepared as follows:
- the object of the present invention is to overcome the disadvantages of the prior art and to demonstrate anhydrous metal oxide colloids or metal oxide polymers and their synthetic routes.
- the use or formation of proton-active substances such as water or alcohols and the use of difficult-to-handle, especially self-ignitable substances should be avoided.
- the molar concentration of the metal halide M 1 is preferably HaI x 0.1 to 200%, particularly preferably 0.001 to 20% of that of the metal oxide colloid or metal oxide polymer MOX 3 X 4 .
- the metal oxide colloids and / or metal oxide polymers contain one or more of the following compounds: - A -
- the metal oxide colloids and / or metal oxide polymers contain one or more of the following polar, aprotic solvents: ethers (either open-chain or cyclic, mono- or polyfunctional), esters (either carboxylic esters or carbonic acid esters), ketones, amides, nitriles, halogen-free sulfur compounds or tertiary amines , Particularly preferred are the following solvents: THF, 2-MeTHF, dimethyl carbonate, acetone, propionone, propylene carbonate and diethyl ether.
- ethers either open-chain or cyclic, mono- or polyfunctional
- esters either carboxylic esters or carbonic acid esters
- ketones amides
- nitriles nitriles
- halogen-free sulfur compounds or tertiary amines Particularly preferred are the following solvents: THF, 2-MeTHF, dimethyl carbonate, acetone, propionone, propylene carbonate and diethy
- the concentration of metal oxide colloid and / or metal oxide polymer is preferably from 0.001 to 2 mol / l, particularly preferably from 0.01 to 1 mol / l.
- metal oxide colloids or metal oxide polymers according to the invention can be prepared by a process in which metal halide compounds of the general formula
- M Si, Ge, Sn, Ti, Zr, Hf
- Organo radical having 1 - 20 carbon atoms, alkyl having 1 to 20 carbon atoms or aryl having 6 to 20 carbon atoms, wherein the alkyl or
- Aryl radicals may carry one or more further halogen substituents selected from the group F, Cl, Br or I.
- halogen acceptors selected from the group of rare earth metal oxides, metal (II) oxides (such as MgO 1 CaO, BaO, SrO, ZnO, MnO) or Fe 2 O 3 , are reacted in a polar, aprotic solvent.
- metal (II) oxides such as MgO 1 CaO, BaO, SrO, ZnO, MnO
- Fe 2 O 3 a polar, aprotic solvent.
- M is always 4-valued in this formula.
- Particularly preferred metal halide compounds are: SiCl 4 , SiBr 4 , GeCl 4 , SnCl 4 , TiCl 4 , TiBr 4 , C 6 H 5 SiCl 3 , 4-CIC 6 H 4 SiCl 3 , 4-BrC 6 H 4 SiCl 3 , HSiCl 3 , or (CHs) 2 SiCl 2 .
- the compounds SE 2 O 3 with SE scandium, yttrium, La, Pr, Nd, Pm, Sm, Eu, Gd, Tb, Dy, Ho, Er, Tm, Yb or Lu, in general commercial form used. Preference is given to using Nd 2 O 3 , Sm 2 O 3 or La 2 O 3 .
- metal (II) oxides halogen acceptors
- MgO, ZnO or MnO metal oxide oxides
- the halogen acceptors are preferably used in pulverized form and anhydrous, that is to say with H 2 O contents ⁇ 0.5%.
- polar aprotic solvents, ethereal compounds can be used. These can
- R 1 -OR 2 (with R 1 and R 2 independently of one another alkyl or aryl having 1 to 8 C atoms); or
- ethereal solvent for example, tetrahydrofuran, tetrahydropyran, 2-methyltetrahydrofuran, dimethyl ether, diethyl ether or methyl tert-butyl ether or a mixture thereof.
- - Esters e.g. Carboxylic esters (such as ethyl acetate, ⁇ -butyrolactone, methyl benzoate), or carbonic acid esters (such as dimethyl carbonate, diethyl carbonate,
- Carboxylic esters such as ethyl acetate, ⁇ -butyrolactone, methyl benzoate
- carbonic acid esters such as dimethyl carbonate, diethyl carbonate
- Ketones e.g., acetone, propionone
- Amides e.g., N-methylpyrrolidone, dimethylacetamide, NMPU; or
- - nitriles e.g., acetonitrile, butyronitrile
- halogen-free sulfur compounds e.g., dimethyl sulfoxide
- tertiary amines e.g., triethylamine, tetramethylethylenediamine.
- X 1 and / or X 2 in the metal halide compound Mhai 1 Hal 2 X 1 X 2 is not the meaning of halogen have the (X 1, X 2 ⁇ Hal, but X 1 and / or X 2 are, for example, alkyl or aryl ), X 3 and X 4 in the product [M (O) X 3 X 4 ] n have the same, unchanged meaning as in the metal halide compound.
- X 1 C 6 H 5
- X 2 Hal SE 2 O 3 + 2 /? HaI 3 MC 6 H 5 ⁇ 2 n SEHaI 3 + 2 [M (O) 1i5 C 6 H 5 ] n
- silicon tetrachloride reacts with rare earth oxides at room temperature in, for example, tetrahydrofuran (THF) as solvent quickly and irreversibly to the desired metal oxides:
- the metal oxide formed for example SiO 2
- the rare earth halides usually have only a low solubility in the solvents or solvent mixtures according to the invention, whereby the rare earth halide in solid form, usually as a solvate with the aprotic polar solvent used, can be separated from the metal oxide sol by solid / liquid separation.
- NdCl 3 • 2 THF complex is formed, which is only slightly soluble in THF (about 1 to 1, 5%, based on NdCl 3 ) and in crystalline form Form can be separated by filtration of the desired SiO 2 - sol.
- a preferred embodiment of the present invention is to make the solid / liquid separation before the transition to the gel state.
- oxides of trivalent metals rare earth oxides and iron oxide
- other metal oxides can also be used for the oxidation of the metal halide compounds.
- metal oxide colloids and / or metal oxide polymers according to the invention are used, for example. in the surface treatment of solids, that is to say - for coating materials of all kinds, in particular metals,
- Such catalysts are used for polymer synthesis, for example for the production of polyolefins such as polyethylene, polypropylene or copolymers and copolymers or polyesters such as polyethylene terephthalate (PET), polyethylene naphthenate (PEN),
- PBT Polybutylene terephthalate
- colloid solutions can be used as gelling agents for organic or inorganic preparations. After removal of the solvent and depending on the state of aggregation of the remaining MOX 3 X 4 product, the following uses continue to exist: - As a heat transfer oil, lubricant, or anti-foaming agent (applies to oily products), wherein M is preferably Si or as
- the yellow-greenish filtrate (83 g) was analyzed as follows:
- TiO 2 -SoI is doped with NdCb, which has a solubility of approximately 1.5% by weight in the system.
- Example 7 when using dimethyl carbonate (DMC), gelling occurred after a longer useful life (Example 7).
- Examples 8 to 12 deal with halogen acceptors other than rare earth metal oxides: zinc oxide (Example 8), manganese oxide (Example 9), magnesium oxide (Examples 10 to 12).
- Example 13 shows that bromine compounds, in this case silicon tetrabromide, can be used instead of chlorine-based metal halide compounds.
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Inorganic Chemistry (AREA)
- Dispersion Chemistry (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Geology (AREA)
- General Life Sciences & Earth Sciences (AREA)
- Environmental & Geological Engineering (AREA)
- Life Sciences & Earth Sciences (AREA)
- Oxygen, Ozone, And Oxides In General (AREA)
- Silicon Compounds (AREA)
- Polymers With Sulfur, Phosphorus Or Metals In The Main Chain (AREA)
- Inorganic Compounds Of Heavy Metals (AREA)
- Degasification And Air Bubble Elimination (AREA)
- Colloid Chemistry (AREA)
- Lubricants (AREA)
Abstract
Description
Claims
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DE102004060427 | 2004-12-14 | ||
| PCT/EP2005/013287 WO2006063757A2 (en) | 2004-12-14 | 2005-12-12 | Water-free metal oxide colloids and metal oxide polymers, method for the production thereof and use thereof |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| EP1828055A2 true EP1828055A2 (en) | 2007-09-05 |
Family
ID=35914965
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| EP05814848A Withdrawn EP1828055A2 (en) | 2004-12-14 | 2005-12-12 | Water-free metal oxide colloids and metal oxide polymers, method for the production thereof and use thereof |
Country Status (5)
| Country | Link |
|---|---|
| US (1) | US7807723B1 (en) |
| EP (1) | EP1828055A2 (en) |
| JP (1) | JP2008523230A (en) |
| CN (1) | CN101124040B (en) |
| WO (1) | WO2006063757A2 (en) |
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| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN109536239A (en) * | 2018-12-19 | 2019-03-29 | 中英海底系统有限公司 | A kind of Nanometer-sized Neodymium Oxide lube oil additive and preparation method thereof |
| CN114669090B (en) * | 2022-04-07 | 2023-07-21 | 湖北鑫钰鸿成科技有限公司 | Defoaming agent for phosphogypsum washing and preparation method thereof |
Family Cites Families (21)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4698417A (en) * | 1986-02-24 | 1987-10-06 | Rockwell International Corporation | Production of oxy-metallo-organic polymer |
| JP2619905B2 (en) * | 1987-02-27 | 1997-06-11 | 株式会社中戸研究所 | Composite material and method for producing the same |
| JPS63277545A (en) * | 1987-05-11 | 1988-11-15 | Denki Kagaku Kogyo Kk | Oxide ceramic precursor composition |
| IL86316A0 (en) * | 1987-05-15 | 1988-11-15 | Ppg Industries Inc | Formation of superconductive ceramic oxides by chemical polymerization |
| JPS6442314A (en) * | 1987-08-07 | 1989-02-14 | Shinetsu Chemical Co | Production of silica sol dispersed in organic solvent |
| JPH01164709A (en) * | 1987-12-22 | 1989-06-28 | Koroido Res:Kk | Production of composite oxide precursor |
| JPH01176206A (en) * | 1987-12-29 | 1989-07-12 | Koroido Res:Kk | Production of precursor of compound oxide |
| JP2725857B2 (en) * | 1989-09-18 | 1998-03-11 | 旭電化工業株式会社 | Method for producing hydrophobic organocolloidal silica |
| JPH0764564B2 (en) * | 1991-02-20 | 1995-07-12 | 株式会社槌屋 | Zirconium oxide-based precursor gel and its production method |
| JPH04304017A (en) * | 1991-04-01 | 1992-10-27 | Nec Corp | Semiconductor integrated circuit |
| FR2686793B1 (en) * | 1992-01-31 | 1994-04-15 | Oreal | COSMETIC COMPOSITION FOR MAKE-UP CONTAINING A TRANSPARENT PIGMENT OF TITANIUM OXIDE AND SILICON OXIDE. |
| JPH05254818A (en) * | 1992-03-09 | 1993-10-05 | Hitachi Chem Co Ltd | Production of metallosiloxane sol solution and gelatinous polymer |
| FR2691380B1 (en) * | 1992-05-25 | 1994-07-22 | Inst Francais Du Petrole | CATALYTIC COMPOSITION BASED ON SILICA AND ITS USE FOR THE POLYMERIZATION OF HETEROCYCLIC COMPOUNDS. |
| JPH07121817B2 (en) * | 1992-09-24 | 1995-12-25 | 株式会社槌屋 | Zirconium oxide-based precursor gel and its production method |
| JP3899546B2 (en) * | 1996-03-11 | 2007-03-28 | 株式会社豊田中央研究所 | Layered organic titanosilicate and molded body of layered organic titanosilicate |
| JP3129399B2 (en) * | 1997-03-18 | 2001-01-29 | 株式会社金子建材 | Zirconia film and method for producing the same |
| DE19931204A1 (en) * | 1999-07-07 | 2001-01-18 | Rwe Dea Ag | Process for the production of metal oxides dispersible in organic solvents |
| JP2001261338A (en) * | 2000-03-15 | 2001-09-26 | Mitsubishi Materials Corp | Raw material solution for forming Ti-containing metal oxide thin film, method for forming Ti-containing metal oxide thin film, and Ti-containing metal oxide thin film |
| US6511672B2 (en) * | 2001-01-17 | 2003-01-28 | Color Access, Inc. | Compositions containing optical diffusing pigments |
| JP2003267721A (en) * | 2002-03-15 | 2003-09-25 | Dokai Chemical Industries Co Ltd | Silica particle slurry highly dispersed in liquid organic medium, dry powder thereof, and methods for producing them |
| JP4263552B2 (en) * | 2003-08-12 | 2009-05-13 | 富士通株式会社 | Optical material, optical amplifier and manufacturing method thereof |
-
2005
- 2005-12-12 CN CN2005800483538A patent/CN101124040B/en not_active Expired - Fee Related
- 2005-12-12 EP EP05814848A patent/EP1828055A2/en not_active Withdrawn
- 2005-12-12 WO PCT/EP2005/013287 patent/WO2006063757A2/en not_active Ceased
- 2005-12-12 US US11/792,873 patent/US7807723B1/en not_active Expired - Fee Related
- 2005-12-12 JP JP2007545914A patent/JP2008523230A/en not_active Ceased
Non-Patent Citations (1)
| Title |
|---|
| See references of WO2006063757A2 * |
Also Published As
| Publication number | Publication date |
|---|---|
| WO2006063757A2 (en) | 2006-06-22 |
| JP2008523230A (en) | 2008-07-03 |
| CN101124040A (en) | 2008-02-13 |
| CN101124040B (en) | 2012-12-12 |
| US7807723B1 (en) | 2010-10-05 |
| WO2006063757A3 (en) | 2007-02-08 |
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