EP1817500A4 - Preconditionnement pour pompes a vide - Google Patents

Preconditionnement pour pompes a vide

Info

Publication number: EP1817500A4
Authority: EP; European Patent Office
Prior art keywords: preconditioning; vacuum pumps; pumps; vacuum
Prior art date: 2004-12-03
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.): Granted

Application number

EP05852187A

Other languages

German (de)

English (en)

Other versions

EP1817500A2 (fr

EP1817500B1 (fr

Inventor

Christopher M Bailey

Michael S Boger

Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)

Edwards Vacuum LLC

Original Assignee

Edwards Vacuum LLC

Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)

2004-12-03

Filing date

2005-11-23

Publication date

2012-09-12

2005-11-23 Application filed by Edwards Vacuum LLC filed Critical Edwards Vacuum LLC

2007-08-15 Publication of EP1817500A2 publication Critical patent/EP1817500A2/fr

2012-09-12 Publication of EP1817500A4 publication Critical patent/EP1817500A4/fr

2014-07-30 Application granted granted Critical

2014-07-30 Publication of EP1817500B1 publication Critical patent/EP1817500B1/fr

2025-11-23 Anticipated expiration legal-status Critical

Status Expired - Lifetime legal-status Critical Current

Classifications

- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F04—POSITIVE - DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS FOR LIQUIDS OR ELASTIC FLUIDS
- F04D—NON-POSITIVE-DISPLACEMENT PUMPS
- F04D19/00—Axial-flow pumps
- F04D19/02—Multi-stage pumps
- F04D19/04—Multi-stage pumps specially adapted to the production of a high vacuum, e.g. molecular pumps
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F04—POSITIVE - DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS FOR LIQUIDS OR ELASTIC FLUIDS
- F04B—POSITIVE-DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS
- F04B25/00—Multi-stage pumps
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/4412—Details relating to the exhausts, e.g. pumps, filters, scrubbers, particle traps
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F04—POSITIVE - DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS FOR LIQUIDS OR ELASTIC FLUIDS
- F04D—NON-POSITIVE-DISPLACEMENT PUMPS
- F04D19/00—Axial-flow pumps
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F04—POSITIVE - DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS FOR LIQUIDS OR ELASTIC FLUIDS
- F04D—NON-POSITIVE-DISPLACEMENT PUMPS
- F04D19/00—Axial-flow pumps
- F04D19/02—Multi-stage pumps
- F04D19/04—Multi-stage pumps specially adapted to the production of a high vacuum, e.g. molecular pumps
- F04D19/046—Combinations of two or more different types of pumps
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F04—POSITIVE - DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS FOR LIQUIDS OR ELASTIC FLUIDS
- F04D—NON-POSITIVE-DISPLACEMENT PUMPS
- F04D25/00—Pumping installations or systems
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F04—POSITIVE - DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS FOR LIQUIDS OR ELASTIC FLUIDS
- F04D—NON-POSITIVE-DISPLACEMENT PUMPS
- F04D27/00—Control, e.g. regulation, of pumps, pumping installations or pumping systems specially adapted for elastic fluids
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67017—Apparatus for fluid treatment
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67155—Apparatus for manufacturing or treating in a plurality of work-stations

Landscapes

Engineering & Computer Science (AREA)
Mechanical Engineering (AREA)
General Engineering & Computer Science (AREA)
Chemical & Material Sciences (AREA)
Power Engineering (AREA)
Microelectronics & Electronic Packaging (AREA)
Computer Hardware Design (AREA)
Manufacturing & Machinery (AREA)
General Physics & Mathematics (AREA)
Physics & Mathematics (AREA)
Condensed Matter Physics & Semiconductors (AREA)
Organic Chemistry (AREA)
Metallurgy (AREA)
Materials Engineering (AREA)
Chemical Kinetics & Catalysis (AREA)
General Chemical & Material Sciences (AREA)
Drying Of Semiconductors (AREA)
Treating Waste Gases (AREA)
Compressors, Vaccum Pumps And Other Relevant Systems (AREA)
Chemical Vapour Deposition (AREA)

EP05852187.3A 2004-12-03 2005-11-23 Preconditionnement pour pompes a vide Expired - Lifetime EP1817500B1 (fr)

Applications Claiming Priority (2)

Application Number	Priority Date	Filing Date	Title
US11/003,125 US7021903B2 (en)	2003-12-31	2004-12-03	Fore-line preconditioning for vacuum pumps
PCT/US2005/042730 WO2006060275A2 (fr)	2004-12-03	2005-11-23	Preconditionnement pour pompes a vide

Publications (3)

Publication Number	Publication Date
EP1817500A2 EP1817500A2 (fr)	2007-08-15
EP1817500A4 true EP1817500A4 (fr)	2012-09-12
EP1817500B1 EP1817500B1 (fr)	2014-07-30

Family

ID=36565566

Family Applications (1)

Application Number	Title	Priority Date	Filing Date
EP05852187.3A Expired - Lifetime EP1817500B1 (fr)	2004-12-03	2005-11-23	Preconditionnement pour pompes a vide

Country Status (7)

Country	Link
US (1)	US7021903B2 (fr)
EP (1)	EP1817500B1 (fr)
JP (1)	JP5996834B2 (fr)
KR (1)	KR101194511B1 (fr)
CN (1)	CN100587264C (fr)
TW (1)	TWI388729B (fr)
WO (1)	WO2006060275A2 (fr)

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US7278831B2 (en) *	2003-12-31	2007-10-09	The Boc Group, Inc.	Apparatus and method for control, pumping and abatement for vacuum process chambers
EP1761706B1 (fr) *	2004-06-24	2013-05-15	ixetic Hückeswagen GmbH	Pompe
CN100468629C (zh) *	2005-07-20	2009-03-11	台达电子工业股份有限公司	真空控制系统
KR100749739B1 (ko) *	2006-02-10	2007-08-16	삼성전자주식회사	반도체 제조장치
GB0617498D0 (en) *	2006-09-06	2006-10-18	Boc Group Plc	Method of pumping gas
US8500382B2 (en) *	2007-05-22	2013-08-06	Axcelis Technologies Inc.	Airflow management for particle abatement in semiconductor manufacturing equipment
US9997325B2 (en) *	2008-07-17	2018-06-12	Verity Instruments, Inc.	Electron beam exciter for use in chemical analysis in processing systems
US8657584B2 (en) *	2010-02-16	2014-02-25	Edwards Limited	Apparatus and method for tuning pump speed
US8408013B2 (en)	2010-06-30	2013-04-02	Instrotek, Inc.	Lightweight portable moisture traps for use with vacuum pumps
JP6368458B2 (ja) *	2013-05-24	2018-08-01	株式会社荏原製作所	除害機能付真空ポンプ
US9240308B2 (en) *	2014-03-06	2016-01-19	Applied Materials, Inc.	Hall effect enhanced capacitively coupled plasma source, an abatement system, and vacuum processing system
JP5808454B1 (ja) *	2014-04-25	2015-11-10	株式会社日立国際電気	基板処理装置、半導体装置の製造方法、プログラムおよび記録媒体
JP6418838B2 (ja) *	2014-07-31	2018-11-07	エドワーズ株式会社	ドライポンプ及び排ガス処理方法
JP6391171B2 (ja) *	2015-09-07	2018-09-19	東芝メモリ株式会社	半導体製造システムおよびその運転方法
KR102477302B1 (ko)	2015-10-05	2022-12-13	주성엔지니어링(주)	배기가스 분해기를 가지는 기판처리장치 및 그 배기가스 처리방법
GB201613794D0 (en) *	2016-08-11	2016-09-28	Edwards Ltd	Enclosure system including wire mesh and thin non-porous membrane panels
JP6595148B2 (ja) *	2017-05-29	2019-10-23	カンケンテクノ株式会社	排ガスの減圧除害装置
CN108678973A (zh) *	2018-05-04	2018-10-19	重庆冲能动力机械有限公司	一种用于vpsa气体分离系统的高速直驱双级离心真空泵机组
US11077401B2 (en) *	2018-05-16	2021-08-03	Highvac Corporation	Separated gas stream point of use abatement device
GB201810916D0 (en) *	2018-07-03	2018-08-15	Edwards Ltd	Gas abatement apparatus
GB2579360A (en) *	2018-11-28	2020-06-24	Edwards Ltd	Multiple chamber vacuum exhaust system
GB2584881B (en) *	2019-06-19	2022-01-05	Edwards Vacuum Llc	Multiple vacuum chamber exhaust system and method of evacuating multiple chambers
KR102300561B1 (ko) *	2020-07-31	2021-09-13	삼성전자주식회사	증착 시스템 및 공정 시스템
US12060637B2 (en)	2020-12-01	2024-08-13	Applied Materials, Inc.	Actively cooled foreline trap to reduce throttle valve drift
KR102583557B1 (ko) *	2021-05-26	2023-10-10	세메스 주식회사	기판 처리 설비의 배기 장치 및 배기 방법
KR20230025590A (ko) *	2021-08-13	2023-02-22	삼성디스플레이 주식회사	배출 방법, 배출 시스템 및 이를 포함하는 기판 처리 장치
KR20230068788A (ko) *	2021-11-11	2023-05-18	세메스 주식회사	기판 처리 장치
CN114975183B (zh) *	2022-05-31	2025-09-16	北京北方华创微电子装备有限公司	半导体工艺设备的补水控制方法和半导体工艺设备
US12473637B2 (en) *	2022-08-08	2025-11-18	Applied Materials, Inc.	Interlock system for processing chamber exhaust assembly
US12442074B2 (en) *	2022-08-25	2025-10-14	Applied Materials, Inc.	System and method for controlling foreline pressure
KR102657614B1 (ko) *	2023-02-17	2024-04-15	주식회사 트리플코어스테크놀러지	다수 개의 반응챔버를 가진 모듈타입 폐가스 저감 장치

Citations (5)

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US4636401A (en) *	1984-02-15	1987-01-13	Semiconductor Energy Laboratory Co., Ltd.	Apparatus for chemical vapor deposition and method of film deposition using such deposition
US4725204A (en) *	1986-11-05	1988-02-16	Pennwalt Corporation	Vacuum manifold pumping system
EP0819779A1 (fr) *	1996-07-15	1998-01-21	The BOC Group plc	Procédé pour épurer des substances nocives d'un gaz d'échappement
JPH11168067A (ja) *	1997-12-02	1999-06-22	Kanken Techno Kk	半導体製造排ガスの除害装置及び除害方法
US6635228B1 (en) *	1999-11-01	2003-10-21	Robert R. Moore	Falling film plasma reactor

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2004
- 2004-12-03 US US11/003,125 patent/US7021903B2/en not_active Expired - Lifetime
2005
- 2005-11-23 WO PCT/US2005/042730 patent/WO2006060275A2/fr not_active Ceased
- 2005-11-23 CN CN200580041324A patent/CN100587264C/zh not_active Expired - Lifetime
- 2005-11-23 EP EP05852187.3A patent/EP1817500B1/fr not_active Expired - Lifetime
- 2005-11-23 JP JP2007544406A patent/JP5996834B2/ja not_active Expired - Lifetime
- 2005-11-23 KR KR1020077012414A patent/KR101194511B1/ko not_active Expired - Lifetime
- 2005-12-02 TW TW094142673A patent/TWI388729B/zh active

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
US4636401A (en) *	1984-02-15	1987-01-13	Semiconductor Energy Laboratory Co., Ltd.	Apparatus for chemical vapor deposition and method of film deposition using such deposition
US4725204A (en) *	1986-11-05	1988-02-16	Pennwalt Corporation	Vacuum manifold pumping system
EP0819779A1 (fr) *	1996-07-15	1998-01-21	The BOC Group plc	Procédé pour épurer des substances nocives d'un gaz d'échappement
JPH11168067A (ja) *	1997-12-02	1999-06-22	Kanken Techno Kk	半導体製造排ガスの除害装置及び除害方法
US6635228B1 (en) *	1999-11-01	2003-10-21	Robert R. Moore	Falling film plasma reactor

Also Published As

Publication number	Publication date
TWI388729B (zh)	2013-03-11
CN100587264C (zh)	2010-02-03
US7021903B2 (en)	2006-04-04
US20050142010A1 (en)	2005-06-30
WO2006060275A3 (fr)	2006-08-17
KR20070085630A (ko)	2007-08-27
TW200632219A (en)	2006-09-16
JP5996834B2 (ja)	2016-09-21
EP1817500A2 (fr)	2007-08-15
EP1817500B1 (fr)	2014-07-30
KR101194511B1 (ko)	2012-10-25
JP2010504847A (ja)	2010-02-18
CN101069017A (zh)	2007-11-07
WO2006060275A2 (fr)	2006-06-08

Publication	Publication Date	Title
EP1817500A4 (fr)	2012-09-12	Preconditionnement pour pompes a vide
DE602005014706D1 (de)	2009-07-16	Vakuumpumpe
ES1066424Y (es)	2008-05-01	Succionador de aspirador
GB0424199D0 (en)	2004-12-01	Vacuum pump
DE502006002609D1 (de)	2009-02-26	Vakuumpumpe
DE602004029470D1 (de)	2010-11-18	Vakuumpumpe
EP1805514A4 (fr)	2010-02-24	Immunodosages pour le topiramate
DE502005006154D1 (de)	2009-01-15	Einflügelvakuumpumpe
GB0413776D0 (en)	2004-07-21	Vacuum pump
DE502005002932D1 (de)	2008-04-03	Einflügelvakuumpumpe
DE502005002006D1 (de)	2007-12-27	Einflügelvakuumpumpe
GB0418547D0 (en)	2004-09-22	Vacuum pump
GB0426959D0 (en)	2005-01-12	Vacuum pump
EP1802820A4 (fr)	2012-12-05	Ensemble cuve a vide
GB0707944D0 (en)	2007-06-06	A Well pump device
GB2412950B (en)	2006-04-05	A pump unit
GB0406748D0 (en)	2004-04-28	Vacuum pump
DE602004003041D1 (de)	2006-12-14	Fahrzeugvakuumpumpe
DE602005007593D1 (de)	2008-07-31	Vakuumpumpe
DE502005002583D1 (de)	2008-03-06	Einflügelvakuumpumpe
GB0419505D0 (en)	2004-10-06	Vacuum pump
EP1733668A4 (fr)	2008-06-11	Aspirateur
GB0426919D0 (en)	2005-01-12	Vacuum pump
AU156375S (en)	2004-09-07	A pump
GB0525895D0 (en)	2006-02-01	A pump unit

Legal Events

Date	Code	Title	Description
2007-07-13	PUAI	Public reference made under article 153(3) epc to a published international application that has entered the european phase	Free format text: ORIGINAL CODE: 0009012
2007-08-15	17P	Request for examination filed	Effective date: 20070522
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2007-10-17	RAP1	Party data changed (applicant data changed or rights of an application transferred)	Owner name: BOC EDWARDS, INC.
2007-11-21	RAP1	Party data changed (applicant data changed or rights of an application transferred)	Owner name: EDWARDS VACUUM, INC.
2008-03-12	DAX	Request for extension of the european patent (deleted)
2009-02-11	RAP1	Party data changed (applicant data changed or rights of an application transferred)	Owner name: EDWARDS VACUUM, INC.
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2014-04-09	RIN1	Information on inventor provided before grant (corrected)	Inventor name: BOGER, MICHAEL S. Inventor name: BAILEY, CHRISTOPHER M.
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