EP1717353A1 - Bain galvanique contenant une membrane de filtration - Google Patents

Bain galvanique contenant une membrane de filtration Download PDF

Info

Publication number: EP1717353A1
Authority: EP; European Patent Office
Prior art keywords: filtration membrane; bath; electroplating bath; anode; cathode
Prior art date: 2005-04-26
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.): Granted

Application number

EP05009127A

Other languages

German (de)

English (en)

Other versions

EP1717353B1 (fr

Inventor

Karlheinz Arzt

Jens-Eric Geissler

Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)

Atotech Deutschland GmbH and Co KG

Original Assignee

Atotech Deutschland GmbH and Co KG

Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)

2005-04-26

Filing date

2005-04-26

Publication date

2006-11-02

Family has litigation

First worldwide family litigation filed litigation Critical https://patents.darts-ip.com/?family=35530823&utm_source=google_patent&utm_medium=platform_link&utm_campaign=public_patent_search&patent=EP1717353(A1) "Global patent litigation dataset” by Darts-ip is licensed under a Creative Commons Attribution 4.0 International License.

2005-04-26 Application filed by Atotech Deutschland GmbH and Co KG filed Critical Atotech Deutschland GmbH and Co KG

2005-04-26 Priority to AT05009127T priority Critical patent/ATE429528T1/de

2005-04-26 Priority to EP09152660.8A priority patent/EP2050841B1/fr

2005-04-26 Priority to ES05009127T priority patent/ES2324169T3/es

2005-04-26 Priority to ES09152660.8T priority patent/ES2574158T3/es

2005-04-26 Priority to EP05009127A priority patent/EP1717353B1/fr

2005-04-26 Priority to DE502005007138T priority patent/DE502005007138D1/de

2006-04-26 Priority to CA2600273A priority patent/CA2600273C/fr

2006-04-26 Priority to US11/912,591 priority patent/US8293092B2/en

2006-04-26 Priority to KR1020077019889A priority patent/KR101301275B1/ko

2006-04-26 Priority to BRPI0610765A priority patent/BRPI0610765B1/pt

2006-04-26 Priority to CNA2006800094924A priority patent/CN101146934A/zh

2006-04-26 Priority to PCT/EP2006/003883 priority patent/WO2006114305A1/fr

2006-04-26 Priority to CN201510173898.7A priority patent/CN104911676B/zh

2006-04-26 Priority to JP2008508150A priority patent/JP4955657B2/ja

2006-04-26 Priority to CN201510173915.7A priority patent/CN104911651A/zh

2006-11-02 Publication of EP1717353A1 publication Critical patent/EP1717353A1/fr

2009-04-22 Publication of EP1717353B1 publication Critical patent/EP1717353B1/fr

2009-04-22 Application granted granted Critical

2025-04-26 Anticipated expiration legal-status Critical

Status Expired - Lifetime legal-status Critical Current

Images

Classifications

- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D3/00—Electroplating: Baths therefor
- C25D3/02—Electroplating: Baths therefor from solutions
- C25D3/56—Electroplating: Baths therefor from solutions of alloys
- C25D3/565—Electroplating: Baths therefor from solutions of alloys containing more than 50% by weight of zinc
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D17/00—Constructional parts, or assemblies thereof, of cells for electrolytic coating
- C25D17/02—Tanks; Installations therefor
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D17/00—Constructional parts, or assemblies thereof, of cells for electrolytic coating
- C25D17/002—Cell separation, e.g. membranes, diaphragms
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D21/00—Processes for servicing or operating cells for electrolytic coating
- C25D21/06—Filtering particles other than ions
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D21/00—Processes for servicing or operating cells for electrolytic coating
- C25D21/16—Regeneration of process solutions
- C25D21/22—Regeneration of process solutions by ion-exchange

Definitions

the invention relates to an alkaline electroplating bath for applying zinc alloys to substrates, in which the anode space and the cathode space are separated from one another by a filtration membrane.
zinc alloys can be deposited on substrates in a consistently high quality.
the electroplating bath is operated with zinc alloy baths containing organic additives such as brighteners and wetting agents and complexing agents in addition to soluble zinc salts and optionally other metal salts selected from iron, nickel, cobalt and tin salts.
Bath dilution reduces the concentration of impurities in proportion to the degree of dilution.
a dilution is easy to carry out, but has the disadvantage that the amount of electrolyte removed from the bath has to be supplied to cost-intensive disposal.
a complete new approach of the bath can be considered in this context as a special case of Badver Mednung.
Activated carbon treatment by stirring 0.5-2 g / l of activated carbon into the bath followed by filtration reduces the concentration of impurities by adsorption on the coal. Disadvantage of this method is that it is laborious is and causes only a relatively small reduction.
Alkaline Zn baths contain a factor of 5 to 10 lower proportion of organic additives as acidic baths. Accordingly, contamination by decomposition products is generally less critical. In the case of alkaline alloy baths, however, the addition of significant amounts of organic complexing agents is required to complex the alloying additive (Fe, Co, Ni, Sn). These are oxidatively degraded at the anode and the accumulated decomposition products have a negative effect on the production process.
the EP 1 369 505 A2 discloses a method for purifying a zinc-nickel electrolyte in a galvanic process in which a portion of the process bath used in the process is evaporated until phase separation into a lower phase, at least one middle phase and an upper phase occurs, and the lower one and the upper phase are separated. This process requires several stages and is disadvantageous in terms of its energy requirements from a cost point of view.
the WO 00/06807 and WO 01/96631 describe electroplating baths for applying zinc-nickel coatings. To avoid the undesirable decomposition of additives at the anode, it is proposed to separate the anode from the alkaline electrolyte through an ion exchange membrane.
the baths known in the prior art have the disadvantage that in the anodic decomposition of the nitrogen-containing complexing agent cyanide is formed and accumulates in non-negligible concentration.
the invention has for its object to provide an alkaline electroplating bath, which does not have the aforementioned disadvantages.
the life of the bath is to be increased, the anodic decomposition of organic constituents of the bath to be minimized and, when it is used, a layer thickness of consistently high quality to be obtained on the coated substrate.
the invention relates to an alkaline electroplating bath for applying zinc alloys on substrates having a cathode and an anode, which has a filtration membrane which separates the anode space and the cathode space of the bath from each other.
filtration membranes are used.
the size of the pores of these filtration membranes is generally in a range from 0.0001 to 1.0 ⁇ m and from 0.001 to 1.0 ⁇ m, depending on the type of membrane (nano- or ultrafiltration membrane).
the pore size is in a range of 0.1 to 0.3 microns.
the filtration membrane contained in the alkaline electroplating bath according to the invention may consist of various organic or inorganic, alkali-resistant materials. These materials are, for example, ceramics, polytetrafluoroethylene (PTFE), polysulfones and polypropylene.
PTFE polytetrafluoroethylene
polysulfones polysulfones
polypropylene polypropylene
filtration membranes made of polypropylene.
the filtration membrane in the alkaline electroplating bath according to the invention is designed as a flat membrane.
the alkaline electroplating bath according to the invention can also be realized with other membrane forms, examples being hoses, capillaries and hollow fibers.
Such baths are for example in US 5,417,840 .
US 4,421,611 US 4,877,496 or US 6,652,728 described.
the alkaline electroplating bath according to the invention has the advantage that in it also baths for the deposition of zinc alloys can be used, which are suitable for use in the from WO 00/06807 and WO 01/96631 known alkaline zinc-nickel bath with an ion exchange membrane are not suitable.
sold by the applicant bath "Protedur Ni-75" to call which is characterized by a particularly high efficiency.
the previously used anodes can be used further. These are mostly nickel anodes.
the use of these anodes is less expensive than that from the WO 00/06807 known electroplating bath, in which special platinum-plated titanium anodes must be used in addition.
the anode space is preferably made smaller than the cathode space, since the essential processes take place there.
Both baths were operated with and without filtration membrane in 5-liter tanks.
the filtration membrane used was the Abwa-Tec polymer membrane P150F, which has a pore size of 0.12 ⁇ m.
the membrane was placed in the anode to cathode bath with the anolyte and catholyte being identical, ie, no special anolyte was added.
iron sheets (7 ⁇ 10 cm), which are usually used for Hull cell tests, were used as workpieces to be coated and coated at a current density of 2 A / dm 2 .
the baths were operated in serial connection. The movement of the iron sheets was mechanical, at a speed of 1.4 m / min.
Table 2 shows the Hull cell layer thickness in a new approach and old approach depending on the throughput with and without filtration membrane. The layer thickness measurements were made after adjustment of the baths.
the dots lie on the Hullzellenblechen 3 cm from the bottom and 2.5 cm from the left and right lateral edge. On the left side is the high current density (point A) and on the right the low current density (point B).
the average layer thickness is about 35% higher in a new batch in the high current density range and about 19% higher in the low current density range as if one had not used a filtration membrane. In the old batch, it is on average 17% and 12% higher than without filtration membrane.
a filtration membrane is produced after a throughput of> 1000 Ah / l introduced after a short time comparable to a new approach current efficiency.
Table 3 shows the average consumption (1 / 10,000 Ah) of the electrolyte in the bath for filtration membrane electroplating baths according to the invention and baths which do not have this membrane.
the organic consumption was reduced between 12 and 29% depending on the additive.
Complexing agent quadrol, polyethylenimine Brilliant addition: pyridine-N-propane-3-sulfonic acid
composition of the aforementioned baths were analyzed according to the tests described above. Of particular interest was their cyanide content. This was much lower when using the baths according to the invention with a filtration membrane as baths without membrane. As shown in Table 4 below, a bath without the membrane had a cyanide content of 680 mg / L (new batch) and 790 mg / L (bath of> 1000 Ah / L), respectively, while the corresponding membrane baths contained a cyanide Content of 96 mg / L or 190 mg / L.
the cyanide content of an old batch ie a bath with> 1000 Ah / l can be reduced when it is provided with a filtration membrane and operated.
the cyanide content was reduced from 670 mg / l to 190 mg / l.
the color of the baths was also evaluated. It was found that the color of a freshly prepared bath without membrane changed from initially violet-orange to brown within 15 Ah / l, whereby it remained purple or violet-orange over the entire time when using a filtration membrane. The old batch remained brown without using a membrane and the color changed to orange-brown after 15 Ah / l using a filtration membrane. Violet is also the color of freshly applied baths, which then turn to orange (after a few Ah / l) and at high throughput in brown.
the voltage between anode and cathode was measured. It was about 3 V and was only about 50-100 mV higher in both approaches using a filtration membrane. Is used instead of the filtration membrane an ion exchange membrane, as in the WO 00/06807 described is, the voltage is higher by at least 500 mV. This again shows the advantage of using a filtration membrane instead of an ion exchange membrane.
the use of filtration membranes over the use of ion exchange membranes offers many advantages.
the coating process carried out therewith is more cost-effective, since no platinized anodes have to be used, catholyte and anolyte can have the same composition, and thus no circulation for the anolyte is required.

Landscapes

Chemical & Material Sciences (AREA)
Engineering & Computer Science (AREA)
Chemical Kinetics & Catalysis (AREA)
Electrochemistry (AREA)
Materials Engineering (AREA)
Metallurgy (AREA)
Organic Chemistry (AREA)
Electroplating And Plating Baths Therefor (AREA)
Separation Using Semi-Permeable Membranes (AREA)
Electrodes For Compound Or Non-Metal Manufacture (AREA)

EP05009127A 2005-04-26 2005-04-26 Bain galvanique contenant une membrane de filtration Expired - Lifetime EP1717353B1 (fr)

Priority Applications (15)

Application Number	Priority Date	Filing Date	Title
AT05009127T ATE429528T1 (de)	2005-04-26	2005-04-26	Alkalisches galvanikbad mit einer filtrationsmembran
EP09152660.8A EP2050841B1 (fr)	2005-04-26	2005-04-26	Bain galvanique alcalin doté d'une membrane de filtration
ES05009127T ES2324169T3 (es)	2005-04-26	2005-04-26	Baño galvanico alcalino con una membrana de filtracion.
ES09152660.8T ES2574158T3 (es)	2005-04-26	2005-04-26	Baño galvánico alcalino con una membrana de filtración
EP05009127A EP1717353B1 (fr)	2005-04-26	2005-04-26	Bain galvanique contenant une membrane de filtration
DE502005007138T DE502005007138D1 (de)	2005-04-26	2005-04-26	Alkalisches Galvanikbad mit einer Filtrationsmembran
KR1020077019889A KR101301275B1 (ko)	2005-04-26	2006-04-26	여과막을 가지는 알칼리 전기도금조
JP2008508150A JP4955657B2 (ja)	2005-04-26	2006-04-26	ろ過膜を備えたアルカリ電気めっき浴
CA2600273A CA2600273C (fr)	2005-04-26	2006-04-26	Bain galvanoplastique alcalin a membrane de filtration
BRPI0610765A BRPI0610765B1 (pt)	2005-04-26	2006-04-26	banho alcalino de eletrogalvanização tendo uma membrana de filtração
CNA2006800094924A CN101146934A (zh)	2005-04-26	2006-04-26	具有滤过膜的碱性电镀浴
PCT/EP2006/003883 WO2006114305A1 (fr)	2005-04-26	2006-04-26	Bain galvanoplastique alcalin a membrane de filtration
CN201510173898.7A CN104911676B (zh)	2005-04-26	2006-04-26	具有滤过膜的碱性电镀浴
US11/912,591 US8293092B2 (en)	2005-04-26	2006-04-26	Alkaline electroplating bath having a filtration membrane
CN201510173915.7A CN104911651A (zh)	2005-04-26	2006-04-26	具有滤过膜的碱性电镀浴

Applications Claiming Priority (1)

Application Number	Priority Date	Filing Date	Title
EP05009127A EP1717353B1 (fr)	2005-04-26	2005-04-26	Bain galvanique contenant une membrane de filtration

Related Child Applications (1)

Application Number	Title	Priority Date	Filing Date
EP09152660.8A Division EP2050841B1 (fr)	2005-04-26	2005-04-26	Bain galvanique alcalin doté d'une membrane de filtration

Publications (2)

Publication Number	Publication Date
EP1717353A1 true EP1717353A1 (fr)	2006-11-02
EP1717353B1 EP1717353B1 (fr)	2009-04-22

Family

ID=35530823

Family Applications (2)

Application Number	Title	Priority Date	Filing Date
EP05009127A Expired - Lifetime EP1717353B1 (fr)	2005-04-26	2005-04-26	Bain galvanique contenant une membrane de filtration
EP09152660.8A Revoked EP2050841B1 (fr)	2005-04-26	2005-04-26	Bain galvanique alcalin doté d'une membrane de filtration

Family Applications After (1)

Application Number	Title	Priority Date	Filing Date
EP09152660.8A Revoked EP2050841B1 (fr)	2005-04-26	2005-04-26	Bain galvanique alcalin doté d'une membrane de filtration

Country Status (11)

Country	Link
US (1)	US8293092B2 (fr)
EP (2)	EP1717353B1 (fr)
JP (1)	JP4955657B2 (fr)
KR (1)	KR101301275B1 (fr)
CN (3)	CN101146934A (fr)
AT (1)	ATE429528T1 (fr)
BR (1)	BRPI0610765B1 (fr)
CA (1)	CA2600273C (fr)
DE (1)	DE502005007138D1 (fr)
ES (2)	ES2324169T3 (fr)
WO (1)	WO2006114305A1 (fr)

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
WO2009044266A3 (fr) *	2007-10-05	2010-01-21	Create New Technology S.R.L.	Système et procédé de plaquage par des alliages métalliques à l'aide d'une technologie galvanique
EP2184384A1 (fr)	2008-11-11	2010-05-12	Enthone, Inc.	Bain galvanique et procédé pour la déposition de couches contenant du zinc
EP2384800A1 (fr)	2010-05-07	2011-11-09	Dr.Ing. Max Schlötter GmbH & Co. KG	Régénération d'électrolytes nickel-zinc alcalins par la suppression de cyanidiones
EP3358045A1 (fr)	2017-02-07	2018-08-08	Dr.Ing. Max Schlötter GmbH & Co. KG	Procédé de dépôt par placage de revêtements en zinc et en alliage de zinc à partir d'un bain de revêtement alcalin à élimination réduite des additifs de bain organiques
EP3415665A1 (fr)	2017-06-14	2018-12-19	Dr.Ing. Max Schlötter GmbH & Co. KG	Procédé de dépôt galvanique de revêtements d'alliage zinc/nicel à partir d'un bain d'alliage nickel/zinc à élimination réduite des additifs

Families Citing this family (16)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
US8084684B2 (en) *	2006-10-09	2011-12-27	Solexel, Inc.	Three-dimensional thin-film solar cells
US8177944B2 (en)	2007-12-04	2012-05-15	Ebara Corporation	Plating apparatus and plating method
IT1405319B1 (it) *	2010-12-27	2014-01-03	Fontana R D S R L	Procedimento di rivestimento di pezzi metallici filettati
KR101420865B1 (ko) *	2012-10-12	2014-07-18	주식회사 익스톨	금속 도금장치
EP2784189A1 (fr)	2013-03-28	2014-10-01	Coventya SAS	Bain d'électrodéposition d'alliages zinc-fer, procédé de dépôt d'alliage zinc-fer sur un dispositif et ledit dispositif
US11649558B2 (en)	2015-03-13	2023-05-16	Okuno Chemical Industries Co., Ltd.	Electrolytic stripping agent for jig
JP5830203B1 (ja)	2015-07-22	2015-12-09	ディップソール株式会社	亜鉛合金めっき方法
BR112015028629A2 (pt) *	2015-07-22	2017-07-25	Dipsol Chem	método de eletrogalvanização de liga de zinco
US11913131B2 (en) *	2016-05-24	2024-02-27	Macdermid, Incorporated	Ternary zinc-nickel-iron alloys and alkaline electrolytes or plating such alloys
CA3032224A1 (fr)	2016-07-29	2018-02-01	Simon Fraser University	Procede de depot electrochimique
PT3461933T (pt) *	2017-09-28	2019-12-09	Atotech Deutschland Gmbh	Método para depositar eletroliticamente uma camada de liga de zinco-níquel em, pelo menos, um substrato a ser tratado
US11165091B2 (en)	2018-01-23	2021-11-02	City University Of Hong Kong	Battery system and a method of forming a battery
EP3914757B1 (fr) *	2019-01-24	2023-04-05	Atotech Deutschland GmbH & Co. KG	Procede de dépôt électrolytique d'un alliage zinc-nickel utilsant un système d'anode à membrane
JP6582353B1 (ja)	2019-02-15	2019-10-02	ディップソール株式会社	亜鉛又は亜鉛合金電気めっき方法及びシステム
RU2712582C1 (ru) *	2019-07-16	2020-01-29	Федеральное государственное бюджетное образовательное учреждение высшего образования "Ивановский государственный химико-технологический университет"	Электролит для электроосаждения цинк-железных покрытий
EP4273303A1 (fr) *	2022-05-05	2023-11-08	Atotech Deutschland GmbH & Co. KG	Procédé de dépôt d'un alliage zinc-nickel sur un substrat, bain de dépôt zinc-nickel aqueux, agent d'éclaircissement et son utilisation

Citations (3)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
US3974049A (en) *	1973-08-03	1976-08-10	Parel. Societe Anonyme	Electrochemical process
EP1365046A1 (fr) *	2002-05-16	2003-11-26	UNIVERSITE PAUL SABATIER (TOULOUSE III) Etablissement public a caractère scientifique, culturel et professionnel	Procédé de protection d'un substrat en acier ou alliage d'alumium contre la corrosion permettant de lui conferer des propriétés tribologiques, et substrat obtenu
WO2005073438A1 (fr) *	2003-12-31	2005-08-11	Coventya Sas	Installation de depot de zinc ou d’alliages de zinc

Family Cites Families (25)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
GB381931A (en) *	1931-07-11	1932-10-11	Mond Nickel Co Ltd	Improvements relating to electro-plating and the electrodeposition of metals
US3945900A (en)	1972-05-02	1976-03-23	Dorr-Oliver Incorporated	Electro ultrafiltration process and apparatus
US4250002A (en) *	1979-09-19	1981-02-10	Hooker Chemicals & Plastics Corp.	Polymeric microporous separators for use in electrolytic processes and devices
US4421611A (en)	1982-09-30	1983-12-20	Mcgean-Rohco, Inc.	Acetylenic compositions and nickel plating baths containing same
JPS6353285A (ja)	1986-08-22	1988-03-07	Nippon Hyomen Kagaku Kk	亜鉛−ニツケル合金めつき液
JPH01116094A (ja) *	1987-10-28	1989-05-09	Eagle Ind Co Ltd	隔膜鍍金法
JPH02141596A (ja) *	1988-11-21	1990-05-30	Yuken Kogyo Kk	ジンケート型亜鉛合金メッキ浴
JPH0444375A (ja) *	1990-06-12	1992-02-14	Zexel Corp	レーザ共振器のアライメント装置
US5443727A (en)	1990-10-30	1995-08-22	Minnesota Mining And Manufacturing Company	Articles having a polymeric shell and method for preparing same
US5082538A (en)	1991-01-09	1992-01-21	Eltech Systems Corporation	Process for replenishing metals in aqueous electrolyte solutions
CN2175238Y (zh)	1993-09-29	1994-08-24	北京科技大学	锌-镍合金电镀用阳极
US5417840A (en)	1993-10-21	1995-05-23	Mcgean-Rohco, Inc.	Alkaline zinc-nickel alloy plating baths
US5631102A (en) *	1996-02-12	1997-05-20	Wilson Greatbatch Ltd.	Separator insert for electrochemical cells
JPH11200099A (ja)	1998-01-08	1999-07-27	Toyo Kohan Co Ltd	不溶性陽極を用いるめっき方法およびめっき装置
DE19834353C2 (de) *	1998-07-30	2000-08-17	Hillebrand Walter Gmbh & Co Kg	Alkalisches Zink-Nickelbad
DE19840019C1 (de)	1998-09-02	2000-03-16	Atotech Deutschland Gmbh	Wäßriges alkalisches cyanidfreies Bad zur galvanischen Abscheidung von Zink- oder Zinklegierungsüberzügen sowie Verfahren
JP2000087299A (ja) *	1998-09-08	2000-03-28	Ebara Corp	基板メッキ装置
US6383352B1 (en)	1998-11-13	2002-05-07	Mykrolis Corporation	Spiral anode for metal plating baths
JP4060012B2 (ja) *	1999-07-19	2008-03-12	日本エレクトロプレイテイング・エンジニヤース株式会社	カップ式めっき装置
ATE306572T1 (de)	2000-06-15	2005-10-15	Taskem Inc	Zink-nickel-elektroplattierung
DE10225203A1 (de)	2002-06-06	2003-12-18	Goema Ag	Verfahren und Vorrichtung zur Spülwasserrückführung und Reinigung eines Prozessbades
AU2003252677A1 (en)	2002-07-25	2004-02-16	Shinryo Electronics Co., Ltd.	Tin-silver-copper plating solution, plating film containing the same, and method for forming the plating film
AU2003239929A1 (en) *	2003-06-03	2005-01-04	Coventya Sas	Zinc and zinc-alloy electroplating
JP4120497B2 (ja) *	2003-06-27	2008-07-16	Ｊｆｅスチール株式会社	電気亜鉛系めっき鋼板
US7442286B2 (en) *	2004-02-26	2008-10-28	Atotech Deutschland Gmbh	Articles with electroplated zinc-nickel ternary and higher alloys, electroplating baths, processes and systems for electroplating such alloys

2005
- 2005-04-26 ES ES05009127T patent/ES2324169T3/es not_active Expired - Lifetime
- 2005-04-26 DE DE502005007138T patent/DE502005007138D1/de not_active Expired - Lifetime
- 2005-04-26 AT AT05009127T patent/ATE429528T1/de not_active IP Right Cessation
- 2005-04-26 EP EP05009127A patent/EP1717353B1/fr not_active Expired - Lifetime
- 2005-04-26 ES ES09152660.8T patent/ES2574158T3/es not_active Expired - Lifetime
- 2005-04-26 EP EP09152660.8A patent/EP2050841B1/fr not_active Revoked
2006
- 2006-04-26 CA CA2600273A patent/CA2600273C/fr active Active
- 2006-04-26 CN CNA2006800094924A patent/CN101146934A/zh active Pending
- 2006-04-26 KR KR1020077019889A patent/KR101301275B1/ko active Active
- 2006-04-26 JP JP2008508150A patent/JP4955657B2/ja active Active
- 2006-04-26 BR BRPI0610765A patent/BRPI0610765B1/pt active IP Right Grant
- 2006-04-26 CN CN201510173915.7A patent/CN104911651A/zh active Pending
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- 2006-04-26 US US11/912,591 patent/US8293092B2/en active Active
- 2006-04-26 WO PCT/EP2006/003883 patent/WO2006114305A1/fr not_active Ceased

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
US3974049A (en) *	1973-08-03	1976-08-10	Parel. Societe Anonyme	Electrochemical process
EP1365046A1 (fr) *	2002-05-16	2003-11-26	UNIVERSITE PAUL SABATIER (TOULOUSE III) Etablissement public a caractère scientifique, culturel et professionnel	Procédé de protection d'un substrat en acier ou alliage d'alumium contre la corrosion permettant de lui conferer des propriétés tribologiques, et substrat obtenu
WO2005073438A1 (fr) *	2003-12-31	2005-08-11	Coventya Sas	Installation de depot de zinc ou d’alliages de zinc

Cited By (7)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
WO2009044266A3 (fr) *	2007-10-05	2010-01-21	Create New Technology S.R.L.	Système et procédé de plaquage par des alliages métalliques à l'aide d'une technologie galvanique
US8668817B2 (en)	2007-10-05	2014-03-11	Creat New Technology S.R.L.	System and method of plating metal alloys by using galvanic technology
EP2184384A1 (fr)	2008-11-11	2010-05-12	Enthone, Inc.	Bain galvanique et procédé pour la déposition de couches contenant du zinc
EP2384800A1 (fr)	2010-05-07	2011-11-09	Dr.Ing. Max Schlötter GmbH & Co. KG	Régénération d'électrolytes nickel-zinc alcalins par la suppression de cyanidiones
EP3358045A1 (fr)	2017-02-07	2018-08-08	Dr.Ing. Max Schlötter GmbH & Co. KG	Procédé de dépôt par placage de revêtements en zinc et en alliage de zinc à partir d'un bain de revêtement alcalin à élimination réduite des additifs de bain organiques
WO2018146041A1 (fr)	2017-02-07	2018-08-16	Dr.-Ing. Max Schlötter Gmbh & Co. Kg	Procédé pour le dépôt électrolytique de revêtements de zinc et d'alliage de zinc à partir d'un bain de revêtement alcalin, avec dégradation réduite des additifs organiques du bain
EP3415665A1 (fr)	2017-06-14	2018-12-19	Dr.Ing. Max Schlötter GmbH & Co. KG	Procédé de dépôt galvanique de revêtements d'alliage zinc/nicel à partir d'un bain d'alliage nickel/zinc à élimination réduite des additifs

Also Published As

Publication number	Publication date
BRPI0610765B1 (pt)	2017-04-04
US20090107845A1 (en)	2009-04-30
EP2050841A1 (fr)	2009-04-22
US8293092B2 (en)	2012-10-23
CN104911651A (zh)	2015-09-16
CN104911676A (zh)	2015-09-16
CN101146934A (zh)	2008-03-19
ES2324169T3 (es)	2009-07-31
CA2600273A1 (fr)	2006-11-02
DE502005007138D1 (de)	2009-06-04
EP1717353B1 (fr)	2009-04-22
EP2050841B1 (fr)	2016-05-11
CN104911676B (zh)	2017-11-17
KR101301275B1 (ko)	2013-08-29
ES2574158T3 (es)	2016-06-15
BRPI0610765A2 (pt)	2010-07-20
JP2008539329A (ja)	2008-11-13
CA2600273C (fr)	2014-08-12
JP4955657B2 (ja)	2012-06-20
WO2006114305A1 (fr)	2006-11-02
ATE429528T1 (de)	2009-05-15
KR20070122454A (ko)	2007-12-31

Publication	Publication Date	Title
EP1717353B1 (fr)	2009-04-22	Bain galvanique contenant une membrane de filtration
DE3043571A1 (de)	1982-07-01	Verfahren und vorrichtung zur durchfuehrung eines elektrolytischen prozesses
DE102015107748A1 (de)	2015-11-19	Galvanisierzelle und Verfahren zum Bilden einer Metallbeschichtung
EP1408141B1 (fr)	2014-12-17	Methode et électrolyte pour la deposition galvanique des bronzes
DE4023444A1 (de)	1991-01-31	Cyanid-freies verfahren zur herstellung eines galvanischen kupferueberzuges
EP3250733B1 (fr)	2021-07-14	Réalisation de couches de chrome sur des cylindres gravés
DE2724045A1 (de)	1977-12-15	Galvanogeformter gegenstand oder ueberzug
EP1213372B1 (fr)	2011-02-09	Procédé et disposition pour la déposition galvanique de nickel, cobalt, d'alliages de nickel ou de cobalt grâce à des impulsions périodiques de courant et utilisation de ce procédé
EP0797693A1 (fr)	1997-10-01	Materiau stratifie pour elements de glissement ainsi que procede et agents utilises pour le produire
EP3358045A1 (fr)	2018-08-08	Procédé de dépôt par placage de revêtements en zinc et en alliage de zinc à partir d'un bain de revêtement alcalin à élimination réduite des additifs de bain organiques
DE102010044551A1 (de)	2012-03-08	Anode sowie deren Verwendung in einem alkalischen Galvanikbad
DE3029364A1 (de)	1981-02-19	Verfahren zur herstellung von kathoden mit niedriger wasserstoffueberspannung und ihre verwendung
EP2635724B1 (fr)	2014-12-17	Procédé de placage de chrome dur à partir d'un électrolyte sans cr(vi)
EP0801692A2 (fr)	1997-10-22	Installation galvanoplastique
DE102009023124A1 (de)	2009-12-03	Verfahren zur galvanischen Kupferbeschichtung und Vorrichtung zur Durchführung eines solchen Verfahrens
EP1080252B1 (fr)	2002-08-07	Procede de cuivrage electrolytique de substrats
DE2929305C2 (de)	1982-07-01	Verfahren und Vorrichtung zur kontinuierlichen galvanischen Abscheidung von Mangan auf Stahl
EP3415665A1 (fr)	2018-12-19	Procédé de dépôt galvanique de revêtements d'alliage zinc/nicel à partir d'un bain d'alliage nickel/zinc à élimination réduite des additifs
DE3423690A1 (de)	1985-01-10	Waessriges bad zur abscheidung von gold und dessen verwendung bei einem galvanischen verfahren
DE69710870T2 (de)	2002-09-12	Elektrolytische Gewinnung von Reinzink aus einer Mangan enthaltenden Laugungslösung durch vorhergehender Entmanganisierung der Lösung mittels kalter Elektrolyse
DE102019202899B3 (de)	2019-11-14	Wässrige Formulierung zum Herstellen einer Schicht aus Gold und Silber
EP3899106A1 (fr)	2021-10-27	Électrolyte et procédé pour la préparation de couches de chrome
DE102012004348A1 (de)	2013-09-12	Zusatz zur Verbesserung der Schichtdickenverteilung in galvanischen Trommelelektrolyten
EP2878711A1 (fr)	2015-06-03	Procédé de séparation galvanique de nickel et de l'électrolyte correspondant
DE1496848A1 (de)	1969-04-17	Verfahren zum galvanischen Niederschlagen von Nickel aus Nickelsulfamatbaedern

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