EP1712660A1 - Anode insoluble - Google Patents
Anode insoluble Download PDFInfo
- Publication number
- EP1712660A1 EP1712660A1 EP05008042A EP05008042A EP1712660A1 EP 1712660 A1 EP1712660 A1 EP 1712660A1 EP 05008042 A EP05008042 A EP 05008042A EP 05008042 A EP05008042 A EP 05008042A EP 1712660 A1 EP1712660 A1 EP 1712660A1
- Authority
- EP
- European Patent Office
- Prior art keywords
- anode
- shield
- bath
- mesh
- base body
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Withdrawn
Links
- 238000009713 electroplating Methods 0.000 claims abstract description 20
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 claims abstract description 14
- 229910052751 metal Inorganic materials 0.000 claims abstract description 14
- 239000002184 metal Substances 0.000 claims abstract description 14
- 238000000034 method Methods 0.000 claims abstract description 9
- 229910052759 nickel Inorganic materials 0.000 claims abstract description 7
- 229910000831 Steel Inorganic materials 0.000 claims abstract description 6
- 239000010935 stainless steel Substances 0.000 claims abstract description 6
- 229910001220 stainless steel Inorganic materials 0.000 claims abstract description 6
- 239000010959 steel Substances 0.000 claims abstract description 6
- 239000004744 fabric Substances 0.000 claims description 17
- -1 polypropylene Polymers 0.000 claims description 11
- 239000004743 Polypropylene Substances 0.000 claims description 10
- 229920001155 polypropylene Polymers 0.000 claims description 10
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 claims description 9
- 239000010936 titanium Substances 0.000 claims description 7
- 229910052719 titanium Inorganic materials 0.000 claims description 7
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 claims description 5
- HCHKCACWOHOZIP-UHFFFAOYSA-N Zinc Chemical group [Zn] HCHKCACWOHOZIP-UHFFFAOYSA-N 0.000 claims description 4
- 229910001297 Zn alloy Inorganic materials 0.000 claims description 4
- 239000004033 plastic Substances 0.000 claims description 4
- 229910052725 zinc Inorganic materials 0.000 claims description 4
- 239000011701 zinc Substances 0.000 claims description 4
- 229910000906 Bronze Inorganic materials 0.000 claims description 3
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 claims description 3
- 229910001128 Sn alloy Inorganic materials 0.000 claims description 3
- 239000010974 bronze Substances 0.000 claims description 3
- KUNSUQLRTQLHQQ-UHFFFAOYSA-N copper tin Chemical compound [Cu].[Sn] KUNSUQLRTQLHQQ-UHFFFAOYSA-N 0.000 claims description 3
- 230000008021 deposition Effects 0.000 claims description 3
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 claims description 3
- 229910052737 gold Inorganic materials 0.000 claims description 3
- 239000010931 gold Substances 0.000 claims description 3
- 229910052709 silver Inorganic materials 0.000 claims description 3
- 239000004332 silver Substances 0.000 claims description 3
- 239000004020 conductor Substances 0.000 claims description 2
- 239000003365 glass fiber Substances 0.000 claims 1
- 239000002557 mineral fiber Substances 0.000 claims 1
- 239000000758 substrate Substances 0.000 abstract description 9
- 239000000463 material Substances 0.000 abstract description 8
- 238000007747 plating Methods 0.000 abstract description 6
- 229910000531 Co alloy Inorganic materials 0.000 abstract 1
- 229910000990 Ni alloy Inorganic materials 0.000 abstract 1
- 239000012670 alkaline solution Substances 0.000 abstract 1
- 239000010941 cobalt Substances 0.000 abstract 1
- 229910017052 cobalt Inorganic materials 0.000 abstract 1
- GUTLYIVDDKVIGB-UHFFFAOYSA-N cobalt atom Chemical compound [Co] GUTLYIVDDKVIGB-UHFFFAOYSA-N 0.000 abstract 1
- 229910021645 metal ion Inorganic materials 0.000 abstract 1
- 239000000203 mixture Substances 0.000 abstract 1
- 229910000510 noble metal Inorganic materials 0.000 abstract 1
- 239000000654 additive Substances 0.000 description 11
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical compound [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 description 6
- 239000012876 carrier material Substances 0.000 description 5
- 239000003792 electrolyte Substances 0.000 description 5
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 3
- 239000011248 coating agent Substances 0.000 description 3
- 238000000576 coating method Methods 0.000 description 3
- 238000005868 electrolysis reaction Methods 0.000 description 3
- 238000004519 manufacturing process Methods 0.000 description 3
- 230000001590 oxidative effect Effects 0.000 description 3
- 239000001301 oxygen Substances 0.000 description 3
- 229910052760 oxygen Inorganic materials 0.000 description 3
- 229910052697 platinum Inorganic materials 0.000 description 3
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 2
- 239000007789 gas Substances 0.000 description 2
- 229910052741 iridium Inorganic materials 0.000 description 2
- GKOZUEZYRPOHIO-UHFFFAOYSA-N iridium atom Chemical compound [Ir] GKOZUEZYRPOHIO-UHFFFAOYSA-N 0.000 description 2
- 229910052758 niobium Inorganic materials 0.000 description 2
- 239000010955 niobium Substances 0.000 description 2
- GUCVJGMIXFAOAE-UHFFFAOYSA-N niobium atom Chemical compound [Nb] GUCVJGMIXFAOAE-UHFFFAOYSA-N 0.000 description 2
- 150000002894 organic compounds Chemical class 0.000 description 2
- 230000003647 oxidation Effects 0.000 description 2
- 238000007254 oxidation reaction Methods 0.000 description 2
- ZAMOUSCENKQFHK-UHFFFAOYSA-N Chlorine atom Chemical compound [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 description 1
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 1
- 230000000996 additive effect Effects 0.000 description 1
- 230000015556 catabolic process Effects 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- 239000000460 chlorine Substances 0.000 description 1
- 229910052801 chlorine Inorganic materials 0.000 description 1
- 150000001875 compounds Chemical class 0.000 description 1
- 238000011109 contamination Methods 0.000 description 1
- 229910052802 copper Inorganic materials 0.000 description 1
- 239000010949 copper Substances 0.000 description 1
- 239000013078 crystal Substances 0.000 description 1
- 230000006378 damage Effects 0.000 description 1
- 239000007857 degradation product Substances 0.000 description 1
- 238000006731 degradation reaction Methods 0.000 description 1
- 230000001934 delay Effects 0.000 description 1
- 239000010432 diamond Substances 0.000 description 1
- 238000005246 galvanizing Methods 0.000 description 1
- 150000002739 metals Chemical class 0.000 description 1
- 239000012811 non-conductive material Substances 0.000 description 1
- 230000000704 physical effect Effects 0.000 description 1
- 239000010970 precious metal Substances 0.000 description 1
- 238000000746 purification Methods 0.000 description 1
- IUTCEZPPWBHGIX-UHFFFAOYSA-N tin(2+) Chemical compound [Sn+2] IUTCEZPPWBHGIX-UHFFFAOYSA-N 0.000 description 1
- SYRHIZPPCHMRIT-UHFFFAOYSA-N tin(4+) Chemical compound [Sn+4] SYRHIZPPCHMRIT-UHFFFAOYSA-N 0.000 description 1
Images
Classifications
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D17/00—Constructional parts, or assemblies thereof, of cells for electrolytic coating
- C25D17/10—Electrodes, e.g. composition, counter electrode
- C25D17/12—Shape or form
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D17/00—Constructional parts, or assemblies thereof, of cells for electrolytic coating
- C25D17/10—Electrodes, e.g. composition, counter electrode
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D17/00—Constructional parts, or assemblies thereof, of cells for electrolytic coating
- C25D17/02—Tanks; Installations therefor
Definitions
- the invention relates to an insoluble anode for electroplating.
- Galvanic processes such as copper plating, nickel plating, galvanizing or tinning, are operated by means of soluble or insoluble anodes.
- soluble anodes which are also referred to as an active anode system
- the anode changes into solution during the electrolysis.
- insoluble anodes also referred to as inert anode systems
- insoluble anodes consist of a carrier material on the one hand and a coating applied thereto, which can be referred to as an active layer, on the other hand.
- Titanium, niobium or other reaction carrier metals are usually used as the carrier material, but in any case those materials which passivate under the electrolysis conditions.
- As material for the active layer are usually electron-conducting materials, such as platinum, iridium or other precious metals, their mixed oxides or compounds of these elements are used.
- the active layer can either be directly on the surface of the Carrier material may be applied or located on a distance to the substrate arranged substrate. Among others, such materials may be used as substrate, which may be considered as support material, for example titanium, niobium or the like.
- additives which, for example, act as brighteners, increase the hardness and / or increase the scattering.
- organic compounds are preferably used as additives.
- gases such as oxygen or chlorine are formed at the insoluble anode. These gases can cause the additives contained in the electroplating bath to oxidize, which can lead to partial or even complete degradation of these additives. This circumstance weighs twice as hard. On the one hand, the additives must be replaced continuously, on the other hand disrupt the degradation products of the additives, so that it is necessary to renew the plating baths more often or clean or regenerate, which is uneconomical and beyond also ecologically meaningful.
- anode for electroplating which has an anode base body and a Shielding, wherein the anode base body comprises a support material and a substrate having an active layer, the shield is spaced from the anode base attached thereto and reduces the mass transfer to the anode base body and away from it.
- Such an anode allows in contrast to the embodiment of the EP 1 102 875 B1 a reduction in the expenditure on equipment and also has the advantage that the additives contained in the electroplating bath oxidize less strongly.
- the anode base body of the anode is formed in two parts, which makes their production very expensive and therefore expensive.
- the anode base body consists of a carrier material on the one hand and an active layer on the other hand, wherein preferably titanium is used as carrier material.
- Suitable materials for the active layer are, in particular, platinum, iridium, mixed oxides of platinum metals or diamonds. Also for this reason, the proves out of the DE 102 61 493 A1 Prior art anode as relatively expensive, which is why the economics of operated using such an anode galvanic process in question. There is a need for improvement.
- the invention proposes an insoluble anode for electroplating, which is formed in two or more phases and an anode base body on the one hand and a shield on the other hand, wherein the anode base body is integrally formed and made of steel, stainless steel or nickel ,
- the anode according to the invention is formed in two or more phases and consists of an anode base body on the one hand and a shield on the other hand.
- the anode body is different from that of the DE 102 61 493 A1 previously known anode is not in two parts, that is, from a substrate and formed an active layer consisting, but rather in one piece and consists of steel, stainless steel or nickel.
- the anode according to the invention advantageously proves to be much less expensive to manufacture, allowing a more economical operation, especially with alkaline zinc and zinc alloy baths.
- the anode according to the invention is suitable for electrolytes which work with inert anodes, for example also for high-speed systems, as well as for electrolytes with divalent tin or other easily oxidizing components.
- the particular advantage of the anode according to the invention is that present in the electrolyte components or additives less or not oxidize, in the case of divalent tin, the disturbing oxidation of tin (II) to tin (IV) is prevented.
- two-phase or multi-phase anode is understood to mean an anode which consists of an anode base body on the one hand and a shield for the anode base body on the other hand.
- the anode base body represents the first phase and the shielding represents the second phase.
- the shield of the anode is preferably arranged at a distance from the anode base body and consists of a non-conductive material, plastic or metal.
- the shield is preferably formed in the manner of a fabric, mesh, mesh or the like.
- the shield consists of a grid or mesh made of titanium.
- the shield is made by a polypropylene existing tissue formed. Preference is given to the use of a two-part shield, wherein the first part of the shield is formed of a mesh or mesh made of titanium, whereas the second part of the shield is a fabric made of polypropylene.
- the existing polypropylene fabric between the anode base body on the one hand and the grid made of titanium mesh or network on the other hand is arranged.
- An anode with a two-part shield is three-phase.
- the two-phase or multi-phase electrode system prevents too high a contamination of the electrolyte with oxygen and thus too high an additive consumption.
- a galvanic bath operated with the anode according to the invention proves to be particularly economical.
- the invention further proposes a method of electroplating in which an anode according to the above-described features is used.
- the deposition is preferably by means of direct current. In this way, a particularly fine crystal structure can be achieved, which leads to improved physical properties of the deposited layer.
- the process can be used in both horizontal and vertical systems.
- the deposition can also be done by means of pulse current or pulse-reverse current.
- the invention further proposes a galvanic bath, in particular an alkaline galvanic bath, with an anode according to the aforementioned features.
- a galvanic bath in particular an alkaline galvanic bath
- an anode according to the aforementioned features.
- electroplating baths are alkaline zinc and zinc alloy baths, gold baths, silver baths, tin baths, tin alloy baths and bronze baths.
- Fig. 1 shows a schematic representation of an anode 1 according to the invention in a partially sectioned side view.
- the anode 1 is plate-shaped and has an anode base body 2 and a shield. 3
- the shield 3 is arranged at a distance from the anode base body, wherein the distance between the anode base body 2 and shield 3 is referred to as "A".
- the distance A between anode base body 2 and shield 3 can be 0.01 mm to 100 mm, preferably 0.05 mm to 50 mm, particularly preferably 0.5 mm to 10 mm.
- the shield 3 is formed in two parts. It consists of a polypropylene fabric 4 on the one hand and a platinum metal fabric 5 on the other.
- Fig. 1 reveals, the polypropylene fabric 4 between the anode base body 2 on the one hand and the metal fabric 5 on the other hand arranged.
- the metal fabric 5 may be electrically conductively connected to the anode base body 2, which is not shown in FIG. 1 for the sake of clarity.
- the anode 1 shown in Fig. 1 is three-phase.
- a first phase provides the anode base 2 ready.
- the second and third phases result from the shield 3, wherein the second phase is caused by the polypropylene fabric 4 and the third phase by the metal fabric 5.
- the shield 3 is arranged only on one side of the anode base body 2. It goes without saying that a shield 3 can also be arranged on the other side, that is to say with reference to the sheet plane according to FIG. 1 on the left-hand side of the anode main body 2.
- Fig. 2 shows in a schematic sectional view from above another embodiment of the anode 1 according to the invention.
- the anode 1 of Fig. 2 is in correspondence of the embodiment of FIG. 1 also of an anode base body 2 and a shield 3.
- the anode 1 of FIG. 2 is not plate-shaped, but formed with respect to its cross-section circular in the manner of a rod.
- the shield 3 surrounds the anode main body 2 completely in the manner of a shell.
- the shield 3 according to the embodiment of FIG. 2 is single-phase and consists for example of a metal mesh or a plastic fabric.
- the distance A between anode base body 2 and shield 3 corresponds to the distance A according to the embodiment of FIG. 1.
- the anode base body 2 is formed in one piece. It is made of steel, stainless steel or nickel.
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Electrochemistry (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Electroplating Methods And Accessories (AREA)
- Electrodes For Compound Or Non-Metal Manufacture (AREA)
Priority Applications (4)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| EP05008042A EP1712660A1 (fr) | 2005-04-12 | 2005-04-12 | Anode insoluble |
| CN2005101185805A CN1847466B (zh) | 2005-04-12 | 2005-10-31 | 不溶性阳极 |
| KR1020050117062A KR20060108201A (ko) | 2005-04-12 | 2005-12-02 | 불용해 애노드 |
| US11/279,512 US7666283B2 (en) | 2005-04-12 | 2006-04-12 | Insoluble anode |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| EP05008042A EP1712660A1 (fr) | 2005-04-12 | 2005-04-12 | Anode insoluble |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| EP1712660A1 true EP1712660A1 (fr) | 2006-10-18 |
Family
ID=35429145
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| EP05008042A Withdrawn EP1712660A1 (fr) | 2005-04-12 | 2005-04-12 | Anode insoluble |
Country Status (4)
| Country | Link |
|---|---|
| US (1) | US7666283B2 (fr) |
| EP (1) | EP1712660A1 (fr) |
| KR (1) | KR20060108201A (fr) |
| CN (1) | CN1847466B (fr) |
Families Citing this family (11)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP1712660A1 (fr) | 2005-04-12 | 2006-10-18 | Enthone Inc. | Anode insoluble |
| EP1717351A1 (fr) * | 2005-04-27 | 2006-11-02 | Enthone Inc. | Bain de galvanisation |
| TWI384094B (zh) * | 2008-02-01 | 2013-02-01 | Zhen Ding Technology Co Ltd | 電鍍用陽極裝置及包括該陽極裝置之電鍍裝置 |
| JP5617240B2 (ja) * | 2009-12-28 | 2014-11-05 | 栗田工業株式会社 | 電気浸透脱水処理方法及び装置 |
| US8980068B2 (en) | 2010-08-18 | 2015-03-17 | Allen R. Hayes | Nickel pH adjustment method and apparatus |
| CN103911650B (zh) * | 2014-04-02 | 2016-07-06 | 广东达志环保科技股份有限公司 | 一种应用于碱性锌镍合金电镀的阳极 |
| CN104073862A (zh) * | 2014-07-11 | 2014-10-01 | 张钰 | 一种用于碱性锌镍合金电镀的不溶性阳极装置 |
| CN105200460A (zh) * | 2015-10-15 | 2015-12-30 | 厦门理工学院 | 一种可调式组合电极 |
| CN106676618A (zh) * | 2017-03-22 | 2017-05-17 | 苏州市汉宜化学有限公司 | 一种改良的枪色电镀网状阳极 |
| CN113106527B (zh) * | 2021-04-19 | 2024-09-10 | 深圳铱创科技有限公司 | 不溶性阳极及脉冲电镀设备 |
| CA3238810A1 (fr) * | 2021-12-02 | 2023-06-08 | Dipsol Chemicals Co., Ltd. | Procede et systeme de placage electrolytique d'un article avec un metal |
Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE2652152A1 (de) | 1975-11-18 | 1977-09-15 | Diamond Shamrock Techn | Elektrode fuer elektrolytische reaktionen und verfahren zu deren herstellung |
| EP0471577A1 (fr) | 1990-08-15 | 1992-02-19 | Almex Inc. | Dispositif d'électrodéposition à transport horizontal |
| EP1102875B1 (fr) | 1998-07-30 | 2003-06-11 | Walter Hillebrand GmbH & Co. | Bain alcalin de zinc-nickel |
| DE10261493A1 (de) | 2002-12-23 | 2004-07-08 | METAKEM Gesellschaft für Schichtchemie der Metalle mbH | Anode zur Galvanisierung |
| WO2004108995A1 (fr) | 2003-06-03 | 2004-12-16 | Taskem Inc. | Electrodeposition de zinc et d'alliage de zinc |
Family Cites Families (23)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3607706A (en) * | 1967-08-04 | 1971-09-21 | Ionics | Method of making stable laminated cation-exchange membranes |
| US4033837A (en) * | 1976-02-24 | 1977-07-05 | Olin Corporation | Plated metallic cathode |
| US4214964A (en) * | 1978-03-15 | 1980-07-29 | Cannell John F | Electrolytic process and apparatus for the recovery of metal values |
| JPS5626554A (en) * | 1979-08-10 | 1981-03-14 | Asahi Chem Ind Co Ltd | Improved cation exchange membrane |
| CA1125228A (fr) * | 1979-10-10 | 1982-06-08 | Daniel P. Young | Methode d'extraction du nickel ou du cobalt par electrolyse |
| US4469564A (en) * | 1982-08-11 | 1984-09-04 | At&T Bell Laboratories | Copper electroplating process |
| JPH0246675B2 (ja) | 1986-07-04 | 1990-10-16 | Nippon Kagaku Sangyo Kk | Sanseidometsukyoku |
| JPH01150000A (ja) | 1987-12-07 | 1989-06-13 | Nippon Steel Corp | 電気メッキ用不溶性陽極 |
| JPH01152294A (ja) | 1987-12-09 | 1989-06-14 | Nippon Mining Co Ltd | 不溶性アノード用材料の製造方法 |
| JPH0726240B2 (ja) * | 1989-10-27 | 1995-03-22 | ペルメレック電極株式会社 | 鋼板の電解酸洗又は電解脱脂方法 |
| US5378347A (en) | 1993-05-19 | 1995-01-03 | Learonal, Inc. | Reducing tin sludge in acid tin plating |
| DE19545231A1 (de) * | 1995-11-21 | 1997-05-22 | Atotech Deutschland Gmbh | Verfahren zur elektrolytischen Abscheidung von Metallschichten |
| US5972192A (en) * | 1997-07-23 | 1999-10-26 | Advanced Micro Devices, Inc. | Pulse electroplating copper or copper alloys |
| US6120658A (en) * | 1999-04-23 | 2000-09-19 | Hatch Africa (Pty) Limited | Electrode cover for preventing the generation of electrolyte mist |
| KR100366631B1 (ko) * | 2000-09-27 | 2003-01-09 | 삼성전자 주식회사 | 폴리비닐피롤리돈을 포함하는 구리도금 전해액 및 이를이용한 반도체 소자의 구리배선용 전기도금방법 |
| US6610192B1 (en) * | 2000-11-02 | 2003-08-26 | Shipley Company, L.L.C. | Copper electroplating |
| JP2003105584A (ja) * | 2001-07-26 | 2003-04-09 | Electroplating Eng Of Japan Co | 微細配線埋め込み用銅メッキ液及びそれを用いた銅メッキ方法 |
| EP1310582A1 (fr) * | 2001-11-07 | 2003-05-14 | Shipley Company LLC | Procédé de placage électrolytique de cuivre |
| US20040074775A1 (en) | 2002-10-21 | 2004-04-22 | Herdman Roderick Dennis | Pulse reverse electrolysis of acidic copper electroplating solutions |
| US20050121332A1 (en) * | 2003-10-03 | 2005-06-09 | Kochilla John R. | Apparatus and method for treatment of metal surfaces by inorganic electrophoretic passivation |
| US20050133376A1 (en) * | 2003-12-19 | 2005-06-23 | Opaskar Vincent C. | Alkaline zinc-nickel alloy plating compositions, processes and articles therefrom |
| EP1712660A1 (fr) | 2005-04-12 | 2006-10-18 | Enthone Inc. | Anode insoluble |
| EP1717351A1 (fr) * | 2005-04-27 | 2006-11-02 | Enthone Inc. | Bain de galvanisation |
-
2005
- 2005-04-12 EP EP05008042A patent/EP1712660A1/fr not_active Withdrawn
- 2005-10-31 CN CN2005101185805A patent/CN1847466B/zh not_active Expired - Fee Related
- 2005-12-02 KR KR1020050117062A patent/KR20060108201A/ko not_active Ceased
-
2006
- 2006-04-12 US US11/279,512 patent/US7666283B2/en active Active
Patent Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE2652152A1 (de) | 1975-11-18 | 1977-09-15 | Diamond Shamrock Techn | Elektrode fuer elektrolytische reaktionen und verfahren zu deren herstellung |
| EP0471577A1 (fr) | 1990-08-15 | 1992-02-19 | Almex Inc. | Dispositif d'électrodéposition à transport horizontal |
| EP1102875B1 (fr) | 1998-07-30 | 2003-06-11 | Walter Hillebrand GmbH & Co. | Bain alcalin de zinc-nickel |
| DE10261493A1 (de) | 2002-12-23 | 2004-07-08 | METAKEM Gesellschaft für Schichtchemie der Metalle mbH | Anode zur Galvanisierung |
| WO2004108995A1 (fr) | 2003-06-03 | 2004-12-16 | Taskem Inc. | Electrodeposition de zinc et d'alliage de zinc |
Also Published As
| Publication number | Publication date |
|---|---|
| CN1847466B (zh) | 2010-09-08 |
| US7666283B2 (en) | 2010-02-23 |
| US20060226002A1 (en) | 2006-10-12 |
| KR20060108201A (ko) | 2006-10-17 |
| CN1847466A (zh) | 2006-10-18 |
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