[go: up one dir, main page]

EP1636651B8 - Low-viscous, radiation curable formulation, particularly for the stereolithographical production of earpieces - Google Patents

Low-viscous, radiation curable formulation, particularly for the stereolithographical production of earpieces Download PDF

Info

Publication number
EP1636651B8
EP1636651B8 EP04738713A EP04738713A EP1636651B8 EP 1636651 B8 EP1636651 B8 EP 1636651B8 EP 04738713 A EP04738713 A EP 04738713A EP 04738713 A EP04738713 A EP 04738713A EP 1636651 B8 EP1636651 B8 EP 1636651B8
Authority
EP
European Patent Office
Prior art keywords
weight
viscosity
viscous
radiation curable
low
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
EP04738713A
Other languages
German (de)
French (fr)
Other versions
EP1636651A1 (en
EP1636651B1 (en
Inventor
Martin Klare
Reiner Altmann
Michael Kutschinski
Georgia Meissner
Thomas Veit
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Dreve Otoplastik GmbH
Original Assignee
Dreve Otoplastik GmbH
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Dreve Otoplastik GmbH filed Critical Dreve Otoplastik GmbH
Publication of EP1636651A1 publication Critical patent/EP1636651A1/en
Publication of EP1636651B1 publication Critical patent/EP1636651B1/en
Application granted granted Critical
Publication of EP1636651B8 publication Critical patent/EP1636651B8/en
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
    • B29C64/00—Additive manufacturing, i.e. manufacturing of three-dimensional [3D] objects by additive deposition, additive agglomeration or additive layering, e.g. by 3D printing, stereolithography or selective laser sintering
    • B29C64/10—Processes of additive manufacturing
    • B29C64/106—Processes of additive manufacturing using only liquids or viscous materials, e.g. depositing a continuous bead of viscous material
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
    • B29C64/00—Additive manufacturing, i.e. manufacturing of three-dimensional [3D] objects by additive deposition, additive agglomeration or additive layering, e.g. by 3D printing, stereolithography or selective laser sintering
    • B29C64/10—Processes of additive manufacturing
    • B29C64/106—Processes of additive manufacturing using only liquids or viscous materials, e.g. depositing a continuous bead of viscous material
    • B29C64/124—Processes of additive manufacturing using only liquids or viscous materials, e.g. depositing a continuous bead of viscous material using layers of liquid which are selectively solidified
    • B29C64/129—Processes of additive manufacturing using only liquids or viscous materials, e.g. depositing a continuous bead of viscous material using layers of liquid which are selectively solidified characterised by the energy source therefor, e.g. by global irradiation combined with a mask
    • B29C64/135—Processes of additive manufacturing using only liquids or viscous materials, e.g. depositing a continuous bead of viscous material using layers of liquid which are selectively solidified characterised by the energy source therefor, e.g. by global irradiation combined with a mask the energy source being concentrated, e.g. scanning lasers or focused light sources
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B33—ADDITIVE MANUFACTURING TECHNOLOGY
    • B33Y—ADDITIVE MANUFACTURING, i.e. MANUFACTURING OF THREE-DIMENSIONAL [3-D] OBJECTS BY ADDITIVE DEPOSITION, ADDITIVE AGGLOMERATION OR ADDITIVE LAYERING, e.g. BY 3-D PRINTING, STEREOLITHOGRAPHY OR SELECTIVE LASER SINTERING
    • B33Y70/00—Materials specially adapted for additive manufacturing
    • B33Y70/10—Composites of different types of material, e.g. mixtures of ceramics and polymers or mixtures of metals and biomaterials
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0037—Production of three-dimensional images
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055—Radiation sensitive composition or product or process of making
    • Y10S430/114—Initiator containing
    • Y10S430/118—Initiator containing with inhibitor or stabilizer

Landscapes

  • Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Manufacturing & Machinery (AREA)
  • Optics & Photonics (AREA)
  • General Physics & Mathematics (AREA)
  • Mechanical Engineering (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Ceramic Engineering (AREA)
  • Civil Engineering (AREA)
  • Composite Materials (AREA)
  • Structural Engineering (AREA)
  • Macromonomer-Based Addition Polymer (AREA)
  • Polymerisation Methods In General (AREA)
  • Materials For Medical Uses (AREA)
  • Pharmaceuticals Containing Other Organic And Inorganic Compounds (AREA)
  • Acyclic And Carbocyclic Compounds In Medicinal Compositions (AREA)
  • Dental Preparations (AREA)

Abstract

The invention relates to a biocompatible, low-viscous, radiation curable formulation, particularly for use in stereolithography, for use in medical technology, in particular, for producing earpieces, containing: a) 55-95% by weight of a monomeric or oligomeric dimethacrylate based on bisphenol A or bisphenol F; b) 0-20% by weight of a urethane methacrylate having a functionality of n<4 and a viscosity<15 Pa s; c) 2-15% by weight of a monomeric aliphatic or cycloaliphatic dimethacrylate having a viscosity<5 Pa s; d) 0-15% by weight of a monofunctional methacrylate having a viscosity<3 Pa s; e) 0.5-6% by weight of a photoinitiator or a combination of a number of photoinitiators whose absorption is located within the wavelength range of the laser beam used; f) 0.0001-2% by weight of the inhibitor 2,2,6,6-tetramethylpiperidin-1-yloxy (free radical), also in conjunction with known inhibitors; g) 0-40% by weight of fillers; h) 0-5% by weight of coloring pigments; i) 0-5% by weight of remaining additives such as UV stabilizers or spreading additives, whereby the proportions of constituents a) to h) total 100% by weight.
EP04738713A 2003-06-23 2004-06-17 Low-viscous, radiation curable formulation, particularly for the stereolithographical production of earpieces Expired - Lifetime EP1636651B8 (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
DE10328302A DE10328302A1 (en) 2003-06-23 2003-06-23 Low-viscosity, radiation-curable formulation, in particular for stereolithography, for use in medical technology, in particular for the production of ear pieces
PCT/DE2004/001262 WO2005001570A1 (en) 2003-06-23 2004-06-17 Low-viscous, radiation curable formulation, particularly for the stereolithographical production of earpieces

Publications (3)

Publication Number Publication Date
EP1636651A1 EP1636651A1 (en) 2006-03-22
EP1636651B1 EP1636651B1 (en) 2009-10-28
EP1636651B8 true EP1636651B8 (en) 2010-02-17

Family

ID=33546628

Family Applications (1)

Application Number Title Priority Date Filing Date
EP04738713A Expired - Lifetime EP1636651B8 (en) 2003-06-23 2004-06-17 Low-viscous, radiation curable formulation, particularly for the stereolithographical production of earpieces

Country Status (9)

Country Link
US (1) US7232646B2 (en)
EP (1) EP1636651B8 (en)
JP (1) JP4251368B2 (en)
CN (1) CN1813220B (en)
AT (1) ATE447200T1 (en)
AU (1) AU2004252589B2 (en)
CA (1) CA2530069C (en)
DE (2) DE10328302A1 (en)
WO (1) WO2005001570A1 (en)

Families Citing this family (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE102004050868A1 (en) * 2004-10-18 2006-04-20 Dreve Otoplastik Gmbh Low-viscosity, radiation-curable formulation for the production of ear molds
DE102005050186A1 (en) * 2005-10-18 2007-04-19 Dreve Otoplastik Gmbh Low viscosity, radiation-hardenable composition for antimicrobial medical products, especially adaptive ear pieces, is based on e.g. (meth)acrylates, glass or silver antimicrobials and photoinitiators
US7354870B2 (en) * 2005-11-14 2008-04-08 National Research Council Of Canada Process for chemical etching of parts fabricated by stereolithography
DE102007017195A1 (en) * 2007-04-12 2008-10-16 Dreve Otoplastik Gmbh Biocompatible, radiation-curing formulation for the generative production of medical-technical products, in particular earmolds and dental moldings, by means of image projection systems
DE102007041489A1 (en) 2007-08-31 2009-03-05 Deltamed Gmbh Flexible medical-technical molded body and method for its production
EP2445028A1 (en) 2010-10-25 2012-04-25 Nederlandse Organisatie voor toegepast -natuurwetenschappelijk onderzoek TNO Opto-electric device and method of manufacturing an opto-electric device
EP2445029A1 (en) * 2010-10-25 2012-04-25 Nederlandse Organisatie voor toegepast -natuurwetenschappelijk onderzoek TNO Multilayered protective layer, organic opto-electric device and method of manufacturing the same
US10357435B2 (en) * 2012-12-18 2019-07-23 Dentca, Inc. Photo-curable resin compositions and method of using the same in three-dimensional printing for manufacturing artificial teeth and denture base
DK2986654T3 (en) * 2013-04-18 2020-05-25 Dentca Inc Light-curing resin compositions and methods for using them for three-dimensional printing to make artificial teeth and denture base
EP3234035B1 (en) * 2014-12-18 2021-06-02 BASF Coatings GmbH Radiation curable composition comprising hydrophilic nanoparticles
CN112313577B (en) 2018-04-20 2024-07-09 斯特拉塔西斯公司 Radiation curable compositions for additive manufacturing
US20230365830A1 (en) * 2020-10-08 2023-11-16 Dic Corporation Resin composition for stereolithography
CA3197362A1 (en) 2020-11-30 2022-06-02 Dinesh Kumar BASKER Radiation curable resin

Family Cites Families (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0425441B1 (en) * 1989-10-27 1995-12-27 Ciba-Geigy Ag Photosensitive mixture
DE4009602A1 (en) * 1990-03-26 1991-10-02 Ivoclar Ag POLYMERIZABLE DENTAL MATERIAL
GB9504995D0 (en) * 1995-03-11 1995-04-26 Zeneca Ltd Compositions
DE59701299D1 (en) * 1996-07-29 2000-04-27 Ciba Sc Holding Ag Liquid, radiation-curable composition, especially for stereolithography
US5969000A (en) * 1997-01-17 1999-10-19 Jeneric Pentron Incorporated Dental resin materials
US6569602B1 (en) * 1998-10-05 2003-05-27 E. I. Du Pont De Nemours And Company Ionization radiation imageable photopolymer compositions
DE10108261B4 (en) * 2001-02-21 2006-07-20 Ivoclar Vivadent Ag Polymerizable composition with particulate composite based filler
US6660208B2 (en) * 2001-03-30 2003-12-09 3D Systems, Inc. Detoxification of solid freeform fabrication materials
JP2002302523A (en) * 2001-04-04 2002-10-18 Rion Co Ltd Stereolithography resin
EP1456307B1 (en) * 2001-10-03 2011-12-07 3D Systems, Inc. Phase change support material composition
GB0212062D0 (en) * 2002-05-24 2002-07-03 Vantico Ag Jetable compositions
US6989225B2 (en) * 2002-07-18 2006-01-24 3D Systems, Inc. Stereolithographic resins with high temperature and high impact resistance

Also Published As

Publication number Publication date
DE502004010300D1 (en) 2009-12-10
EP1636651A1 (en) 2006-03-22
CN1813220A (en) 2006-08-02
ATE447200T1 (en) 2009-11-15
DE10328302A1 (en) 2005-01-27
CA2530069C (en) 2009-12-22
US20060264526A1 (en) 2006-11-23
EP1636651B1 (en) 2009-10-28
AU2004252589B2 (en) 2007-03-22
US7232646B2 (en) 2007-06-19
WO2005001570A1 (en) 2005-01-06
AU2004252589A1 (en) 2005-01-06
JP2007500759A (en) 2007-01-18
JP4251368B2 (en) 2009-04-08
CN1813220B (en) 2010-11-03
CA2530069A1 (en) 2005-01-06

Similar Documents

Publication Publication Date Title
EP1636651B8 (en) Low-viscous, radiation curable formulation, particularly for the stereolithographical production of earpieces
Mainjot et al. From artisanal to CAD-CAM blocks: state of the art of indirect composites
WO2006042514A3 (en) Low-viscosity, radiation-curable formulation for producing adaptive ear pieces
EP3254667B1 (en) Light-curable composition, denture, and plate denture
EP1776968A3 (en) Low-viscosity radiation-curable formulation for the preparation of ear pieces with antimicrobial properties
JP6258919B2 (en) Dental filling restoration material kit
AU4887196A (en) Liquid photocurable compositions
EP1323757A3 (en) Powder coating compositions based on crystalline urethane acrylates and their use
EP3360907A1 (en) Photocurable composition, denture base, and plate denture
EP1323758A3 (en) Radiation curable powder lacquer compositions and their use
JPH044209A (en) Photo-setting resin
CN115943053B (en) Radiation curable compositions for rapid prototyping or rapid manufacturing
US20250092176A1 (en) Thiol urethane group-containing polymerizable composition
Khan et al. Influence of primers on the properties of the adhesive interface between resin composite luting cement and fiber-reinforced composite
EP3825099A1 (en) Composition for three-dimensional shaping and method for producing dental article
WO2005021457A3 (en) Optical fiber coatings
EP1538149A3 (en) Sulfonium salts as photoinitiators
US20110077320A1 (en) Dental restorative material composition
EP3862373A1 (en) Resin composition for optical shaping
BRPI0514378A (en) gas releasing sealing and shutter compositions
JP5894861B2 (en) Method for producing denture capable of confirming identification information of identification information recording section by fluorescence and composition kit for providing identification information capable of being confirmed by fluorescence to denture
CN112689646B (en) Radiation curable composition for rapid prototyping or rapid manufacturing methods
DE60309597D1 (en) COSMETIC OR PHARMACEUTICAL COMPOSITION CONTAINING AN EXTRACT OF A BROWN ALGE OF ART HALOPTERIS
Al-Zain et al. Performance of multiple light-curing units used by dental students
JP7728527B2 (en) Composition for three-dimensional modeling

Legal Events

Date Code Title Description
PUAI Public reference made under article 153(3) epc to a published international application that has entered the european phase

Free format text: ORIGINAL CODE: 0009012

17P Request for examination filed

Effective date: 20051025

AK Designated contracting states

Kind code of ref document: A1

Designated state(s): AT BE BG CH CY CZ DE DK EE ES FI FR GB GR HU IE IT LI LU MC NL PL PT RO SE SI SK TR

DAX Request for extension of the european patent (deleted)
RIN1 Information on inventor provided before grant (corrected)

Inventor name: KLARE, MARTIN

Inventor name: MEISSNER, GEORGIA

Inventor name: KUTSCHINSKI, MICHAEL

Inventor name: VEIT, THOMAS

Inventor name: ALTMANN, REINER

17Q First examination report despatched

Effective date: 20090409

GRAP Despatch of communication of intention to grant a patent

Free format text: ORIGINAL CODE: EPIDOSNIGR1

GRAS Grant fee paid

Free format text: ORIGINAL CODE: EPIDOSNIGR3

GRAA (expected) grant

Free format text: ORIGINAL CODE: 0009210

AK Designated contracting states

Kind code of ref document: B1

Designated state(s): AT BE BG CH CY CZ DE DK EE ES FI FR GB GR HU IE IT LI LU MC NL PL PT RO SE SI SK TR

REG Reference to a national code

Ref country code: GB

Ref legal event code: FG4D

Free format text: NOT ENGLISH

REG Reference to a national code

Ref country code: CH

Ref legal event code: EP

REG Reference to a national code

Ref country code: IE

Ref legal event code: FG4D

REF Corresponds to:

Ref document number: 502004010300

Country of ref document: DE

Date of ref document: 20091210

Kind code of ref document: P

NLV1 Nl: lapsed or annulled due to failure to fulfill the requirements of art. 29p and 29m of the patents act
PG25 Lapsed in a contracting state [announced via postgrant information from national office to epo]

Ref country code: SE

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20091028

Ref country code: ES

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20100208

Ref country code: PT

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20100301

Ref country code: FI

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20091028

REG Reference to a national code

Ref country code: IE

Ref legal event code: FD4D

PG25 Lapsed in a contracting state [announced via postgrant information from national office to epo]

Ref country code: PL

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20091028

Ref country code: SI

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20091028

Ref country code: CY

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20091028

PG25 Lapsed in a contracting state [announced via postgrant information from national office to epo]

Ref country code: RO

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20091028

Ref country code: EE

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20091028

Ref country code: IE

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20091028

Ref country code: BG

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20100128

Ref country code: DK

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20091028

PG25 Lapsed in a contracting state [announced via postgrant information from national office to epo]

Ref country code: SK

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20091028

Ref country code: CZ

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20091028

PLBE No opposition filed within time limit

Free format text: ORIGINAL CODE: 0009261

STAA Information on the status of an ep patent application or granted ep patent

Free format text: STATUS: NO OPPOSITION FILED WITHIN TIME LIMIT

26N No opposition filed

Effective date: 20100729

PG25 Lapsed in a contracting state [announced via postgrant information from national office to epo]

Ref country code: GR

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20100129

BERE Be: lapsed

Owner name: DREVE OTOPLASTIK G.M.B.H.

Effective date: 20100630

PG25 Lapsed in a contracting state [announced via postgrant information from national office to epo]

Ref country code: MC

Free format text: LAPSE BECAUSE OF NON-PAYMENT OF DUE FEES

Effective date: 20100630

REG Reference to a national code

Ref country code: CH

Ref legal event code: PL

PG25 Lapsed in a contracting state [announced via postgrant information from national office to epo]

Ref country code: LI

Free format text: LAPSE BECAUSE OF NON-PAYMENT OF DUE FEES

Effective date: 20100630

Ref country code: CH

Free format text: LAPSE BECAUSE OF NON-PAYMENT OF DUE FEES

Effective date: 20100630

PG25 Lapsed in a contracting state [announced via postgrant information from national office to epo]

Ref country code: BE

Free format text: LAPSE BECAUSE OF NON-PAYMENT OF DUE FEES

Effective date: 20100630

PG25 Lapsed in a contracting state [announced via postgrant information from national office to epo]

Ref country code: AT

Free format text: LAPSE BECAUSE OF NON-PAYMENT OF DUE FEES

Effective date: 20100617

PG25 Lapsed in a contracting state [announced via postgrant information from national office to epo]

Ref country code: HU

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20100429

Ref country code: LU

Free format text: LAPSE BECAUSE OF NON-PAYMENT OF DUE FEES

Effective date: 20100617

Ref country code: NL

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20091028

PG25 Lapsed in a contracting state [announced via postgrant information from national office to epo]

Ref country code: TR

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20091028

REG Reference to a national code

Ref country code: FR

Ref legal event code: PLFP

Year of fee payment: 13

REG Reference to a national code

Ref country code: FR

Ref legal event code: PLFP

Year of fee payment: 14

REG Reference to a national code

Ref country code: FR

Ref legal event code: PLFP

Year of fee payment: 15

PGFP Annual fee paid to national office [announced via postgrant information from national office to epo]

Ref country code: GB

Payment date: 20220629

Year of fee payment: 19

PGFP Annual fee paid to national office [announced via postgrant information from national office to epo]

Ref country code: FR

Payment date: 20220621

Year of fee payment: 19

PGFP Annual fee paid to national office [announced via postgrant information from national office to epo]

Ref country code: IT

Payment date: 20220630

Year of fee payment: 19

Ref country code: DE

Payment date: 20220630

Year of fee payment: 19

P01 Opt-out of the competence of the unified patent court (upc) registered

Effective date: 20230509

REG Reference to a national code

Ref country code: DE

Ref legal event code: R119

Ref document number: 502004010300

Country of ref document: DE

GBPC Gb: european patent ceased through non-payment of renewal fee

Effective date: 20230617

PG25 Lapsed in a contracting state [announced via postgrant information from national office to epo]

Ref country code: DE

Free format text: LAPSE BECAUSE OF NON-PAYMENT OF DUE FEES

Effective date: 20240103

Ref country code: GB

Free format text: LAPSE BECAUSE OF NON-PAYMENT OF DUE FEES

Effective date: 20230617

PG25 Lapsed in a contracting state [announced via postgrant information from national office to epo]

Ref country code: FR

Free format text: LAPSE BECAUSE OF NON-PAYMENT OF DUE FEES

Effective date: 20230630

PG25 Lapsed in a contracting state [announced via postgrant information from national office to epo]

Ref country code: IT

Free format text: LAPSE BECAUSE OF NON-PAYMENT OF DUE FEES

Effective date: 20230617