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EP1654914B1 - Generateur de rayons ultraviolets extremes et de rayons x mous - Google Patents

Generateur de rayons ultraviolets extremes et de rayons x mous Download PDF

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Publication number
EP1654914B1
EP1654914B1 EP04744676A EP04744676A EP1654914B1 EP 1654914 B1 EP1654914 B1 EP 1654914B1 EP 04744676 A EP04744676 A EP 04744676A EP 04744676 A EP04744676 A EP 04744676A EP 1654914 B1 EP1654914 B1 EP 1654914B1
Authority
EP
European Patent Office
Prior art keywords
gas
radiation
electrode
diaphragm
discharge source
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
EP04744676A
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German (de)
English (en)
Other versions
EP1654914A2 (fr
EP1654914B8 (fr
Inventor
Klaus Philips Intellectual Property & BERGMANN
Willi c/o Philips Intellectual Property & NEFF
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Koninklijke Philips NV
Original Assignee
Koninklijke Philips Electronics NV
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Koninklijke Philips Electronics NV filed Critical Koninklijke Philips Electronics NV
Publication of EP1654914A2 publication Critical patent/EP1654914A2/fr
Publication of EP1654914B1 publication Critical patent/EP1654914B1/fr
Application granted granted Critical
Publication of EP1654914B8 publication Critical patent/EP1654914B8/fr
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

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Classifications

    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05G—X-RAY TECHNIQUE
    • H05G2/00—Apparatus or processes specially adapted for producing X-rays, not involving X-ray tubes, e.g. involving generation of a plasma
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J61/00—Gas-discharge or vapour-discharge lamps
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05G—X-RAY TECHNIQUE
    • H05G2/00—Apparatus or processes specially adapted for producing X-rays, not involving X-ray tubes, e.g. involving generation of a plasma
    • H05G2/001—Production of X-ray radiation generated from plasma
    • H05G2/009—Auxiliary arrangements not involved in the plasma generation
    • H05G2/0092—Housing of the apparatus for producing X-rays; Environment inside the housing

Definitions

  • the invention relates to a gas discharge source according to the preamble of claim 1.
  • Preferred fields of application are those which require extreme ultraviolet and / or soft X-radiation in the wavelength range of about 1 nm to 20 nm, in particular semiconductor lithography.
  • FIG. 1 shows an electrode assembly in which there is a gas-filled electrode gap between two electrodes.
  • the two electrodes each have an opening through which an axis of symmetry is defined.
  • the device operates in a constant gas pressure environment.
  • When high voltage is applied to the electrodes there is a gas breakdown that depends on the pressure and electrode gap.
  • the pressure of the gas and the electrode gap are chosen so that the system operates on the left branch of the Paschen curve and as a result no electrical breakdown occurs between the electrodes.
  • the gas discharge can not propagate between the electrodes, because in this case the mean free path of the charge carriers is greater than the electrode gap.
  • the gas discharge seeks a longer path, since only with sufficiently large discharge path enough ionizing shocks to trigger the discharge are possible.
  • This longer path can be predetermined by the electrode openings, over which the axis of symmetry is defined.
  • a current-carrying plasma channel of axially symmetrical shape corresponding to the electrode openings is formed.
  • the very high discharge current builds up a magnetic field around the current path.
  • the resulting Lorentz force constricts the plasma, during which the plasma is heated to very high temperatures, emitting radiation of very short wavelength, in particular in the EUV and soft X-ray wavelength range.
  • the decoupling of Radiation takes place in the axial direction along the symmetry axis through the opening of one of the electrodes.
  • the plasmas should have an axial extent of between 1 to 2 mm and a diameter of also 1 to 2 mm and be optically accessible at an observation angle of 45 to 60 degrees. It is generally known that such plasmas are optimally produced for this application in electrical discharges with pulse energies in the range of a few Joules, a current pulse duration of 100 ns and current amplitudes between 10 and 30 kA.
  • the optimum neutral gas pressure is typically in the range of a few Pa to a few 10 Pa.
  • the starting radius for the compression of the plasma which is determined essentially by the openings in the electrode system, is in the range of a few mm.
  • the distance between the electrodes is between 3 and 10 mm.
  • the WO 01 / 0173.6 A1 discloses a generic device in which as a means for increasing the conversion efficiency in addition an auxiliary electrode between the main electrodes is present, which has an opening on the axis of symmetry.
  • the DE 101 34 033 A1 discloses a generic device in which the gas pressure of the gas filling near a cathode formed as electrode is higher than in a remote therefrom region of the discharge vessel.
  • the devices described in the prior art are not able to provide the high power required for many applications, especially for semiconductor lithography. Thus, improvements are needed to achieve the highest possible radiation intensity.
  • the current transport through the cathode is inevitably associated with vaporization of cathode material for the necessary high current amplitudes and current densities.
  • Such electrode erosion leads to a geometric change of the cathode, which ultimately has a negative effect on the emission properties of the plasma. This is the faster the closer the pinch plasma is oriented to the cathode surface. For the usability of such devices, however, a sufficiently long service life is indispensable.
  • the US 6576917B1 and the US 6031241A describe gas discharge sources in which a capillary discharge is used for generating radiation.
  • a capillary discharge the hollow channel of a capillary made of an electrically insulating material represents the gas discharge space.
  • the two ends of the capillary are usually connected to the electrodes.
  • a certain opening diameter must be maintained in order to achieve the capillary effect, ie the spatial limitation of the capillary discharge to a small diameter.
  • an embodiment is selected in which the generated radiation emerges laterally from the gas discharge source.
  • one of the electrodes is arranged at a distance from the capillary in order to allow the lateral exit.
  • a gas discharge source in particular for producing extreme ultraviolet and / or soft X-radiation, in which there is a gas-filled electrode gap 3 between two electrodes 1, 2 in which devices for admitting and pumping out of gas are present, in which an electrode 1 has an axis of symmetry 4 defining and provided for the exit of radiation opening 5 and in which between the two electrodes 1,2 having at least one opening 7 on the axis of symmetry 4 and as a differential Pump stage acting aperture 6 is present.
  • the invention is based on the finding that by introducing a diaphragm 6 having an opening 7 on the axis of symmetry 4 and by using this diaphragm as a diffential pumping stage, it is possible to set certain desired pressure ratios in the electrode gap 3 in a simple manner.
  • the electrode gap 3 is intended to denote the entire space between the two electrodes 1, 2. It is subdivided by the diaphragm 6 into two subregions which are delimited by one of the electrodes (including its opening) and the diaphragm (including its opening).
  • the electrode 2 which faces away from the diaphragm 6 and from the exit side of the radiation, to be limited Part of the gas-filled gap between the electrodes 3 to provide a greater gas pressure than in the limited by the aperture 6 and the exit side of the radiation electrode 2 portion of the gas-filled electrode gap 3.
  • This measure causes the compression or the coupling of energy into the current-carrying plasma and thus connected to the localization of the high impedance region at the desired location near the exit side of the radiation-facing electrode 1 takes place.
  • This has the advantage that optimal usability of the radiation is given in terms of accessibility at large observation angles.
  • the current transport from the cathode to this point takes place in a diffuse low-impedance plasma. This leads to losses compared to the prior art, in which an overall shorter plasma channel arises. Also, therefore, an increase in the radiant power can be achieved.
  • the gas pressure in the electrode gap 3 and the distance between the two electrodes are chosen so that the ignition of the plasma takes place on the left branch of the Paschen curve, i.
  • the ionization processes start along the long electric field lines, which preferably occur in the region of the openings of the anode and cathode. The ignition thus takes place in the gas volume and thus particularly low in wear.
  • when operating on the left branch of the Paschen curve without switching element between radiation generator and power supply can be used, which makes a low-inductive and thus very effective energy coupling possible.
  • the first alternative has the advantage that the compressed plasma, which can arise in this case near the anode 1 by the device according to the invention, is thus relatively far removed from the cathode 2. This leads to a lower erosion of the cathode. Above all, however, the generation of the pinch plasma also depends less on geometric changes of the cathode. Thus, higher erosion can be tolerated. Overall, this leads to a significantly longer life of the electrode system and offers the possibility to couple a higher electrical power and thus a to achieve higher radiant power.
  • the thermal load on the exit side of the radiation-facing electrode 1, thus e.g. The anode is limited because the shutter 6 is capable of dissipating a significant portion of the energy. Therefore, due to the presence of the aperture 6, only the portion of the energy which is coupled into the region of the pinch plasma which emits short-wave radiation must be considered. Since this proportion is only one-fifth to one-quarter of the total energy, the input power and also the pulse energy can be correspondingly increased by a factor of 4 to 5.
  • the electrode 2 remote from the exit side of the radiation is particularly advantageous to design the electrode 2 remote from the exit side of the radiation as a hollow electrode having a cavity 8, in particular as a hollow cathode.
  • a preionization of the gas takes place followed by the formation of a dense hollow cathode plasma.
  • the hollow electrode 2 may have one or more openings 9 to the electrode gap 3. Since the latter alternative, the total current is distributed to a plurality of electrode openings 9, the local load of the electrode 2 can be reduced in this way, and thus the life of the electrode system or the einkoppelbare electrical power can be increased.
  • triggering devices may additionally be present. In this way, the ignition of the discharge can be triggered precisely as needed. This is particularly advantageous in a hollow cathode with multiple openings.
  • the triggering device can be designed, for example, as an auxiliary electrode in the hollow cathode, with which the discharge can be triggered by switching the auxiliary electrode from a positive potential with respect to the cathode to a lower potential, for example cathode potential.
  • Further possibilities for triggering consist in the injection or generation of charge carriers in the hollow cathode via a glow discharge trigger, a high-dielectric trigger or the triggering of photoelectrons or metal vapor via light or laser pulses.
  • the panel 6 It is advantageous to design the panel 6 so that it contributes to the transport of electricity at most to a small extent.
  • the entire or at least the substantial portion of the current transport is instead transmitted largely only via the plasma channel from the cathode to the anode.
  • the current can be used as completely and effectively as possible for the generation of the pinch plasma.
  • the generation of cathode spots on the diaphragm and the erosion occurring there can thus largely be avoided.
  • the diaphragm 6 or at least part of the diaphragm 6 consists of a material which is readily machinable. Moreover, it is advantageous if the material of at least part of the diaphragm 6 has a high thermal conductivity. This allows effective cooling or heat dissipation.
  • a material for at least part of the diaphragm 6 can be, for example, ceramic, in particular alumina or Lanthanhexaborid use.
  • this part of a particularly discharge-resistant material, in particular for example of molybdenum, tungsten, Titanium nitride or lanthanum hexaboride.
  • a particularly discharge-resistant material in particular for example of molybdenum, tungsten, Titanium nitride or lanthanum hexaboride.
  • these diaphragms are designed as metal diaphragms 6, 6 ', 6 "spaced from one another by isolators 11. In this way, the incorporation of metal allows a desired low-induction structure of the electrode system in comparison to a pure ceramic plate, as well as deposits of metal vapor The aperture, which could lead to problems such as a ceramic shutter, almost no role.
  • the thickness of the diaphragm 6 may be in a range between about 1 to 20 mm. From the aspect of cooling, it is necessary to provide as thick a diaphragm as possible. Of the Diameter of the aperture 6 should be approximately between 4 and 20 mm.
  • gas inlets 12 in such a way that their openings face the partial region of the gas-filled electrode gap 3 delimited by the diaphragm 6 and by the electrode 2 facing away from the exit side of the radiation. This allows the gas pressure in this subarea to be adjusted specifically.
  • a higher gas pressure can be provided there than in the partial region of the electrode gap 3 delimited by the diaphragm 6 and the electrode 1 facing the outlet side of the radiation or a specific desired pressure difference can be set.
  • gas inlets 12 ' may be present which have openings for the partial area of the gas-filled electrode gap 3 bounded by the diaphragm 6 and by the electrode 2 facing the outlet side of the radiation.
  • the working gas provided for the generation of the pinch plasma and the resulting emission of EUV radiation, such as xenon or Neon taken in.
  • the pumping of the gas can be particularly easily by a located outside the electrode gap pumping device through the opening of the the exit side of the radiation-facing electrode 1 therethrough.
  • a pumping device directly in the electrode gap 3, in particular in the portion of the electrode gap 3 bounded by the diaphragm 6 and by the electrode 1 facing the outlet side of the radiation. This is particularly advantageous if different gas compositions are present in the two subregions of the interelectrode space 3 as described above, because then a comparatively low mixing of the two gas mixtures can be realized during the pumping.
  • Fig.2 shows an embodiment of the electrode system of the device according to the invention.
  • an electrode 2 as a cavity 8 having hollow electrode configured and is used as a cathode.
  • the other electrode 1 acts as an anode.
  • the decoupling of the radiation generated by the pinch plasma 13 generated inside the gap between the electrodes 3 takes place through the opening 5 of the anode 1.
  • the anode opening 5 widened in Auskoppelcardi.
  • a diaphragm 6 is arranged, which has a continuous opening 7 on the axis of symmetry 4 defined by the anode opening 5.
  • the hollow cathode has in this embodiment an opening 9 to the electrode gap 3, this is just as on the symmetry axis 4.
  • gas inlets 12 are provided with openings to the diaphragm 6 and the cathode 2 limited portion of the gas-filled gap 3.
  • the leads of this Gas inlets run through the body of the hollow cathode in this embodiment. Further gas inlets 12 'are present with openings to the portion of the gas-filled electrode gap 3 delimited by the diaphragm 6 and by the anode 2.
  • Figure 3 shows an embodiment of the device according to the invention, in which the aperture 6 in a region 10 near its opening 7 made of a discharge-resistant material, for example of molybdenum, tungsten, titanium nitride or lanthanum hexaboride.
  • a discharge-resistant material for example of molybdenum, tungsten, titanium nitride or lanthanum hexaboride.
  • the remaining part of the diaphragm 6 consists of a readily machineable material and / or a material with high thermal conductivity.
  • FIG 4 an embodiment of the inventive device is shown, in which a plurality of metal panels 6,6 ', 6 "are arranged between the electrodes 1,2, each spaced by insulators 11th
  • Fig. 5 shows a further embodiment, in which the cathode 2 has three openings 9, 9 ', 9 ".
  • the central opening 9, which lies on the axis of symmetry, is designed as a blind hole, and the two other openings 9', 9" are through openings between the cavity 8 of the cathode 2 and the electrode gap 3.

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  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Optics & Photonics (AREA)
  • Plasma & Fusion (AREA)
  • X-Ray Techniques (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Analysing Materials By The Use Of Radiation (AREA)
  • Reciprocating Pumps (AREA)

Claims (19)

  1. Source de décharge de gaz pour la génération de rayons ultraviolets extrêmes et/ou de rayons X mous, dans laquelle entre deux électrodes (1, 2) se trouve un espace entre électrodes (3) rempli de gaz, dans laquelle il existe des dispositifs pour admettre et évacuer du gaz, et dans laquelle une électrode (1) présente une ouverture (5) définissant un axe de symétrie (4) et étant prévue pour la sortie d'un rayonnement,
    caractérisée en ce que
    entre les deux électrodes (1, 2), il existe au moins un diaphragme (6) présentant au moins une ouverture (7) sur l'axe de symétrie (4) et agissant comme un étage de pompage différentiel et qui divise l'espace entre électrodes rempli de gaz (3) en deux zones partielles.
  2. Source de décharge de gaz selon la revendication 1,
    caractérisée en ce que
    la pression de gaz dans la zone partielle de l'espace entre électrodes (3) rempli de gaz, délimitée par le diaphragme (6) et par l'électrode (2) détournée du côté de sortie du rayonnement, est plus haute que dans la zone partielle de l'espace entre électrodes (3) rempli de gaz, délimitée par le diaphragme (6) et par l'électrode (1) tournée vers le côté de sortie du rayonnement.
  3. Source de décharge de gaz selon l'une quelconque des revendications précédentes,
    caractérisée en ce que
    le diaphragme (6) est configuré de telle sorte qu'il contribue au transport de courant tout au plus dans une faible mesure.
  4. Source de décharge de gaz selon l'une quelconque des revendications précédentes,
    caractérisée en ce que
    au moins une partie du diaphragme (6) se compose d'un matériau à bonne ouvrabilité mécanique et/ou d'un matériau à conductibilité thermique élevée.
  5. Source de décharge de gaz selon l'une quelconque des revendications précédentes,
    caractérisée en ce que
    au moins une partie du diaphragme (6) se compose de céramique.
  6. Source de décharge de gaz selon l'une quelconque des revendications précédentes,
    caractérisée en ce que
    le diaphragme (6) se compose au moins dans une zone (10) près de son ouverture (7) d'un matériau résistant aux décharges.
  7. Source de décharge de gaz selon l'une quelconque des revendications 1 à 4,
    caractérisée en ce que
    il existe plusieurs diaphragmes (6, 6', 6") métalliques espacés les uns des autres par des corps isolants (11).
  8. Source de décharge de gaz selon l'une quelconque des revendications précédentes,
    caractérisée en ce que
    le diaphragme (6) présente en direction de l'axe de symétrie (4) une étendue entre 1 mm et 20 mm.
  9. Source de décharge de gaz selon l'une quelconque des revendications précédentes,
    caractérisée en ce que
    l'ouverture (7) du diaphragme (6) présente un diamètre entre 4 mm et 20 mm.
  10. Source de décharge de gaz selon l'une quelconque des revendications précédentes,
    caractérisée en ce que
    il existe des entrées de gaz avec des ouvertures vers la zone partielle de l'espace entre électrodes (3) rempli de gaz, délimitée par le diaphragme (6) et par l'électrode (2) détournée du côté de sortie du rayonnement.
  11. Source de décharge de gaz selon l'une quelconque des revendications précédentes,
    caractérisée en ce que
    il existe des entrées de gaz avec des ouvertures vers la zone partielle de l'espace entre électrodes (3) rempli de gaz, délimitée par le diaphragme (6) et par l'électrode (2) tournée vers le côté de sortie du rayonnement.
  12. Source de décharge de gaz selon l'une quelconque des revendications précédentes,
    caractérisée en ce que
    l'électrode (2) détournée du côté de sortie du rayonnement présente une cavité (8) qui présente au moins une ouverture (9) vers l'espace entre électrodes (3) rempli de gaz.
  13. Source de décharge de gaz selon l'une quelconque des revendications précédentes,
    caractérisée en ce que
    il existe une entrée de gaz avec une ouverture vers la cavité (8) de l'électrode (2) détournée du côté de sortie du rayonnement.
  14. Source de décharge de gaz selon les revendications 12 ou 13,
    caractérisée en ce que
    un dispositif d'amorçage existe dans la cavité (8) de l'électrode (2) détournée du côté de sortie du rayonnement.
  15. Source de décharge de gaz selon l'une quelconque des revendications précédentes,
    caractérisée en ce que
    le mélange gazeux dans l'espace entre électrodes (3) contient un gaz de service utilisé pour la décharge de gaz et de plus au moins un gaz de remplissage supplémentaire qui présente des pertes par rayonnement inférieures en comparaison avec le gaz de service.
  16. Source de décharge de gaz selon la revendication précédente,
    caractérisée en ce que
    dans la zone partielle de l'espace entre électrodes (3) rempli de gaz, délimitée par le diaphragme (6) et par l'électrode (2) tournée vers le côté de sortie du rayonnement, le mélange gazeux contient principalement le gaz de service, et que dans la zone partielle de l'espace entre électrodes (3) rempli de gaz, délimitée par le diaphragme (6) et par l'électrode (2) détournée du côté de sortie du rayonnement, le mélange gazeux contient principalement le gaz de remplissage.
  17. Source de décharge de gaz selon l'une quelconque des revendications précédentes,
    caractérisée en ce que
    l'évacuation de l'espace entre électrodes (3) s'effectue à travers l'ouverture (5) de l'électrode (2) tournée vers le côté de sortie du rayonnement.
  18. Source de décharge de gaz selon l'une quelconque des revendications précédentes,
    caractérisée en ce que
    l'électrode (2) détournée du côté de sortie du rayonnement est utilisée comme cathode.
  19. Source de décharge de gaz selon l'une quelconque des revendications précédentes,
    caractérisée en ce que
    l'espacement des deux électrodes et la pression de gaz entre les électrodes sont choisis de telle sorte que la décharge de gaz a lieu sur la branche gauche de la courbe de Paschen.
EP04744676A 2003-08-07 2004-07-29 Generateur de rayons ultraviolets extremes et de rayons x mous Expired - Lifetime EP1654914B8 (fr)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
DE10336273A DE10336273A1 (de) 2003-08-07 2003-08-07 Vorrichtung zur Erzeugung von EUV- und weicher Röntgenstrahlung
PCT/IB2004/051323 WO2005015602A2 (fr) 2003-08-07 2004-07-29 Generateur de rayons ultraviolets extremes et de rayons x mous

Publications (3)

Publication Number Publication Date
EP1654914A2 EP1654914A2 (fr) 2006-05-10
EP1654914B1 true EP1654914B1 (fr) 2009-03-25
EP1654914B8 EP1654914B8 (fr) 2009-08-12

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EP04744676A Expired - Lifetime EP1654914B8 (fr) 2003-08-07 2004-07-29 Generateur de rayons ultraviolets extremes et de rayons x mous

Country Status (9)

Country Link
US (1) US7734014B2 (fr)
EP (1) EP1654914B8 (fr)
JP (1) JP4814093B2 (fr)
KR (1) KR101058068B1 (fr)
CN (1) CN100482030C (fr)
AT (1) ATE427026T1 (fr)
DE (2) DE10336273A1 (fr)
TW (1) TW200515458A (fr)
WO (1) WO2005015602A2 (fr)

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US8951384B2 (en) 2011-10-20 2015-02-10 Applied Materials, Inc. Electron beam plasma source with segmented beam dump for uniform plasma generation
US9129777B2 (en) 2011-10-20 2015-09-08 Applied Materials, Inc. Electron beam plasma source with arrayed plasma sources for uniform plasma generation
US9443700B2 (en) 2013-03-12 2016-09-13 Applied Materials, Inc. Electron beam plasma source with segmented suppression electrode for uniform plasma generation

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TW589924B (en) * 2001-04-06 2004-06-01 Fraunhofer Ges Forschung Process and device for producing extreme ultraviolet ray/weak x-ray
DE10134033A1 (de) * 2001-04-06 2002-10-17 Fraunhofer Ges Forschung Verfahren und Vorrichtung zum Erzeugen von Extrem-Ultraviolettstrahlung/weicher Röntgenstrahlung
DE10151080C1 (de) * 2001-10-10 2002-12-05 Xtreme Tech Gmbh Einrichtung und Verfahren zum Erzeugen von extrem ultravioletter (EUV-)Strahlung auf Basis einer Gasentladung
US7342236B2 (en) * 2004-02-23 2008-03-11 Veeco Instruments, Inc. Fluid-cooled ion source

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JP4814093B2 (ja) 2011-11-09
US7734014B2 (en) 2010-06-08
KR20060054422A (ko) 2006-05-22
JP2007501997A (ja) 2007-02-01
DE502004009224D1 (de) 2009-05-07
KR101058068B1 (ko) 2011-08-22
WO2005015602A3 (fr) 2005-06-02
ATE427026T1 (de) 2009-04-15
DE10336273A1 (de) 2005-03-10
WO2005015602A2 (fr) 2005-02-17
TW200515458A (en) 2005-05-01
EP1654914A2 (fr) 2006-05-10
EP1654914B8 (fr) 2009-08-12
US20080143228A1 (en) 2008-06-19
CN100482030C (zh) 2009-04-22
CN1833472A (zh) 2006-09-13

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