EP1438448A1 - Procede electrolytique et compositions de decapage de depot autocatalytique de nickel - Google Patents
Procede electrolytique et compositions de decapage de depot autocatalytique de nickelInfo
- Publication number
- EP1438448A1 EP1438448A1 EP01981784A EP01981784A EP1438448A1 EP 1438448 A1 EP1438448 A1 EP 1438448A1 EP 01981784 A EP01981784 A EP 01981784A EP 01981784 A EP01981784 A EP 01981784A EP 1438448 A1 EP1438448 A1 EP 1438448A1
- Authority
- EP
- European Patent Office
- Prior art keywords
- oxoacids
- composition
- nickel
- hydrogen peroxide
- acid
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Withdrawn
Links
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 title claims abstract description 224
- 229910052759 nickel Inorganic materials 0.000 title claims abstract description 108
- 239000000203 mixture Substances 0.000 title claims abstract description 44
- 238000000034 method Methods 0.000 title claims description 32
- MHAJPDPJQMAIIY-UHFFFAOYSA-N Hydrogen peroxide Chemical compound OO MHAJPDPJQMAIIY-UHFFFAOYSA-N 0.000 claims abstract description 154
- 239000000758 substrate Substances 0.000 claims abstract description 62
- 150000004715 keto acids Chemical class 0.000 claims abstract description 60
- 239000002253 acid Substances 0.000 claims abstract description 53
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 claims abstract description 28
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 claims abstract description 26
- -1 oxoacid salts Chemical class 0.000 claims abstract description 25
- 229910000851 Alloy steel Inorganic materials 0.000 claims abstract description 6
- ZCDOYSPFYFSLEW-UHFFFAOYSA-N chromate(2-) Chemical class [O-][Cr]([O-])(=O)=O ZCDOYSPFYFSLEW-UHFFFAOYSA-N 0.000 claims abstract description 3
- 229910052782 aluminium Inorganic materials 0.000 claims description 27
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 claims description 26
- 229910052742 iron Inorganic materials 0.000 claims description 12
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 claims description 10
- 150000003839 salts Chemical class 0.000 claims description 10
- 239000010936 titanium Substances 0.000 claims description 10
- 229910052719 titanium Inorganic materials 0.000 claims description 10
- 229910001018 Cast iron Inorganic materials 0.000 claims description 9
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 claims description 9
- 238000010494 dissociation reaction Methods 0.000 claims description 9
- 230000005593 dissociations Effects 0.000 claims description 9
- 150000001875 compounds Chemical class 0.000 claims description 7
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 claims description 6
- 125000000217 alkyl group Chemical group 0.000 claims description 6
- 238000005868 electrolysis reaction Methods 0.000 claims description 6
- 239000001257 hydrogen Substances 0.000 claims description 6
- 229910052739 hydrogen Inorganic materials 0.000 claims description 6
- 125000004435 hydrogen atom Chemical group [H]* 0.000 claims description 6
- KERTUBUCQCSNJU-UHFFFAOYSA-L nickel(2+);disulfamate Chemical compound [Ni+2].NS([O-])(=O)=O.NS([O-])(=O)=O KERTUBUCQCSNJU-UHFFFAOYSA-L 0.000 claims description 6
- 239000010935 stainless steel Substances 0.000 claims description 6
- 229910001220 stainless steel Inorganic materials 0.000 claims description 6
- 229910000531 Co alloy Inorganic materials 0.000 claims description 5
- 229910000990 Ni alloy Inorganic materials 0.000 claims description 5
- LNOPIUAQISRISI-UHFFFAOYSA-N n'-hydroxy-2-propan-2-ylsulfonylethanimidamide Chemical compound CC(C)S(=O)(=O)CC(N)=NO LNOPIUAQISRISI-UHFFFAOYSA-N 0.000 claims description 5
- LSNNMFCWUKXFEE-UHFFFAOYSA-M Bisulfite Chemical compound OS([O-])=O LSNNMFCWUKXFEE-UHFFFAOYSA-M 0.000 claims description 3
- XFXPMWWXUTWYJX-UHFFFAOYSA-N Cyanide Chemical compound N#[C-] XFXPMWWXUTWYJX-UHFFFAOYSA-N 0.000 claims description 3
- 125000003118 aryl group Chemical group 0.000 claims description 3
- WPYMKLBDIGXBTP-UHFFFAOYSA-N benzoic acid group Chemical group C(C1=CC=CC=C1)(=O)O WPYMKLBDIGXBTP-UHFFFAOYSA-N 0.000 claims description 3
- 150000002148 esters Chemical class 0.000 claims description 3
- 125000002924 primary amino group Chemical group [H]N([H])* 0.000 claims description 3
- 229920002554 vinyl polymer Polymers 0.000 claims description 3
- 239000013522 chelant Substances 0.000 claims 1
- 239000010959 steel Substances 0.000 abstract description 36
- 238000009472 formulation Methods 0.000 abstract description 13
- 238000005530 etching Methods 0.000 abstract description 9
- 150000002823 nitrates Chemical class 0.000 abstract description 4
- 239000002699 waste material Substances 0.000 abstract description 2
- 229910000838 Al alloy Inorganic materials 0.000 abstract 1
- 229910000640 Fe alloy Inorganic materials 0.000 abstract 1
- 229910001069 Ti alloy Inorganic materials 0.000 abstract 1
- 239000000243 solution Substances 0.000 description 45
- 239000000126 substance Substances 0.000 description 42
- 150000002978 peroxides Chemical class 0.000 description 39
- 229910000831 Steel Inorganic materials 0.000 description 35
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 30
- QTBSBXVTEAMEQO-UHFFFAOYSA-N Acetic acid Chemical compound CC(O)=O QTBSBXVTEAMEQO-UHFFFAOYSA-N 0.000 description 21
- KRKNYBCHXYNGOX-UHFFFAOYSA-N citric acid Chemical compound OC(=O)CC(O)(C(O)=O)CC(O)=O KRKNYBCHXYNGOX-UHFFFAOYSA-N 0.000 description 21
- 238000000576 coating method Methods 0.000 description 13
- BHEPBYXIRTUNPN-UHFFFAOYSA-N hydridophosphorus(.) (triplet) Chemical compound [PH] BHEPBYXIRTUNPN-UHFFFAOYSA-N 0.000 description 13
- 239000010953 base metal Substances 0.000 description 9
- 239000011248 coating agent Substances 0.000 description 9
- KRVSOGSZCMJSLX-UHFFFAOYSA-L chromic acid Substances O[Cr](O)(=O)=O KRVSOGSZCMJSLX-UHFFFAOYSA-L 0.000 description 7
- PMZURENOXWZQFD-UHFFFAOYSA-L Sodium Sulfate Chemical compound [Na+].[Na+].[O-]S([O-])(=O)=O PMZURENOXWZQFD-UHFFFAOYSA-L 0.000 description 6
- AWJWCTOOIBYHON-UHFFFAOYSA-N furo[3,4-b]pyrazine-5,7-dione Chemical compound C1=CN=C2C(=O)OC(=O)C2=N1 AWJWCTOOIBYHON-UHFFFAOYSA-N 0.000 description 6
- 229910052938 sodium sulfate Inorganic materials 0.000 description 6
- 235000011152 sodium sulphate Nutrition 0.000 description 6
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 5
- 239000001301 oxygen Substances 0.000 description 5
- 229910052760 oxygen Inorganic materials 0.000 description 5
- 229910002651 NO3 Inorganic materials 0.000 description 4
- NHNBFGGVMKEFGY-UHFFFAOYSA-N Nitrate Chemical compound [O-][N+]([O-])=O NHNBFGGVMKEFGY-UHFFFAOYSA-N 0.000 description 4
- NBIIXXVUZAFLBC-UHFFFAOYSA-N Phosphoric acid Chemical compound OP(O)(O)=O NBIIXXVUZAFLBC-UHFFFAOYSA-N 0.000 description 4
- BFDHFSHZJLFAMC-UHFFFAOYSA-L nickel(ii) hydroxide Chemical compound [OH-].[OH-].[Ni+2] BFDHFSHZJLFAMC-UHFFFAOYSA-L 0.000 description 4
- VWDWKYIASSYTQR-UHFFFAOYSA-N sodium nitrate Chemical compound [Na+].[O-][N+]([O-])=O VWDWKYIASSYTQR-UHFFFAOYSA-N 0.000 description 4
- VEXZGXHMUGYJMC-UHFFFAOYSA-M Chloride anion Chemical compound [Cl-] VEXZGXHMUGYJMC-UHFFFAOYSA-M 0.000 description 3
- GRYLNZFGIOXLOG-UHFFFAOYSA-N Nitric acid Chemical compound O[N+]([O-])=O GRYLNZFGIOXLOG-UHFFFAOYSA-N 0.000 description 3
- 238000000354 decomposition reaction Methods 0.000 description 3
- 229910052736 halogen Inorganic materials 0.000 description 3
- 229910000833 kovar Inorganic materials 0.000 description 3
- 229910017604 nitric acid Inorganic materials 0.000 description 3
- 150000005181 nitrobenzenes Chemical class 0.000 description 3
- NLKNQRATVPKPDG-UHFFFAOYSA-M potassium iodide Chemical compound [K+].[I-] NLKNQRATVPKPDG-UHFFFAOYSA-M 0.000 description 3
- 239000001488 sodium phosphate Substances 0.000 description 3
- QGZKDVFQNNGYKY-UHFFFAOYSA-N Ammonia Chemical compound N QGZKDVFQNNGYKY-UHFFFAOYSA-N 0.000 description 2
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 description 2
- AEMRFAOFKBGASW-UHFFFAOYSA-N Glycolic acid Chemical compound OCC(O)=O AEMRFAOFKBGASW-UHFFFAOYSA-N 0.000 description 2
- 229910001209 Low-carbon steel Inorganic materials 0.000 description 2
- CSNNHWWHGAXBCP-UHFFFAOYSA-L Magnesium sulfate Chemical compound [Mg+2].[O-][S+2]([O-])([O-])[O-] CSNNHWWHGAXBCP-UHFFFAOYSA-L 0.000 description 2
- AFVFQIVMOAPDHO-UHFFFAOYSA-N Methanesulfonic acid Chemical compound CS(O)(=O)=O AFVFQIVMOAPDHO-UHFFFAOYSA-N 0.000 description 2
- FAPWRFPIFSIZLT-UHFFFAOYSA-M Sodium chloride Chemical compound [Na+].[Cl-] FAPWRFPIFSIZLT-UHFFFAOYSA-M 0.000 description 2
- QAOWNCQODCNURD-UHFFFAOYSA-L Sulfate Chemical compound [O-]S([O-])(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-L 0.000 description 2
- 150000007513 acids Chemical class 0.000 description 2
- 238000007792 addition Methods 0.000 description 2
- 229910045601 alloy Inorganic materials 0.000 description 2
- 239000000956 alloy Substances 0.000 description 2
- 229910000147 aluminium phosphate Inorganic materials 0.000 description 2
- AYJRCSIUFZENHW-UHFFFAOYSA-L barium carbonate Chemical compound [Ba+2].[O-]C([O-])=O AYJRCSIUFZENHW-UHFFFAOYSA-L 0.000 description 2
- 239000011651 chromium Substances 0.000 description 2
- 229910052804 chromium Inorganic materials 0.000 description 2
- 238000009713 electroplating Methods 0.000 description 2
- 238000007654 immersion Methods 0.000 description 2
- BDAGIHXWWSANSR-UHFFFAOYSA-N methanoic acid Natural products OC=O BDAGIHXWWSANSR-UHFFFAOYSA-N 0.000 description 2
- 229910000403 monosodium phosphate Inorganic materials 0.000 description 2
- 235000019799 monosodium phosphate Nutrition 0.000 description 2
- 238000007747 plating Methods 0.000 description 2
- 238000001556 precipitation Methods 0.000 description 2
- WBHQBSYUUJJSRZ-UHFFFAOYSA-M sodium bisulfate Chemical compound [Na+].OS([O-])(=O)=O WBHQBSYUUJJSRZ-UHFFFAOYSA-M 0.000 description 2
- 229910000342 sodium bisulfate Inorganic materials 0.000 description 2
- 239000001509 sodium citrate Substances 0.000 description 2
- AJPJDKMHJJGVTQ-UHFFFAOYSA-M sodium dihydrogen phosphate Chemical compound [Na+].OP(O)([O-])=O AJPJDKMHJJGVTQ-UHFFFAOYSA-M 0.000 description 2
- 239000004317 sodium nitrate Substances 0.000 description 2
- 235000010344 sodium nitrate Nutrition 0.000 description 2
- 238000003756 stirring Methods 0.000 description 2
- HRXKRNGNAMMEHJ-UHFFFAOYSA-K trisodium citrate Chemical compound [Na+].[Na+].[Na+].[O-]C(=O)CC(O)(CC([O-])=O)C([O-])=O HRXKRNGNAMMEHJ-UHFFFAOYSA-K 0.000 description 2
- 229940038773 trisodium citrate Drugs 0.000 description 2
- RTBFRGCFXZNCOE-UHFFFAOYSA-N 1-methylsulfonylpiperidin-4-one Chemical compound CS(=O)(=O)N1CCC(=O)CC1 RTBFRGCFXZNCOE-UHFFFAOYSA-N 0.000 description 1
- PAWQVTBBRAZDMG-UHFFFAOYSA-N 2-(3-bromo-2-fluorophenyl)acetic acid Chemical compound OC(=O)CC1=CC=CC(Br)=C1F PAWQVTBBRAZDMG-UHFFFAOYSA-N 0.000 description 1
- BZSXEZOLBIJVQK-UHFFFAOYSA-N 2-methylsulfonylbenzoic acid Chemical compound CS(=O)(=O)C1=CC=CC=C1C(O)=O BZSXEZOLBIJVQK-UHFFFAOYSA-N 0.000 description 1
- OSWFIVFLDKOXQC-UHFFFAOYSA-N 4-(3-methoxyphenyl)aniline Chemical compound COC1=CC=CC(C=2C=CC(N)=CC=2)=C1 OSWFIVFLDKOXQC-UHFFFAOYSA-N 0.000 description 1
- QGZKDVFQNNGYKY-UHFFFAOYSA-O Ammonium Chemical compound [NH4+] QGZKDVFQNNGYKY-UHFFFAOYSA-O 0.000 description 1
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 1
- PIICEJLVQHRZGT-UHFFFAOYSA-N Ethylenediamine Chemical compound NCCN PIICEJLVQHRZGT-UHFFFAOYSA-N 0.000 description 1
- CWYNVVGOOAEACU-UHFFFAOYSA-N Fe2+ Chemical compound [Fe+2] CWYNVVGOOAEACU-UHFFFAOYSA-N 0.000 description 1
- OFOBLEOULBTSOW-UHFFFAOYSA-N Propanedioic acid Natural products OC(=O)CC(O)=O OFOBLEOULBTSOW-UHFFFAOYSA-N 0.000 description 1
- VMHLLURERBWHNL-UHFFFAOYSA-M Sodium acetate Chemical compound [Na+].CC([O-])=O VMHLLURERBWHNL-UHFFFAOYSA-M 0.000 description 1
- DWAQJAXMDSEUJJ-UHFFFAOYSA-M Sodium bisulfite Chemical compound [Na+].OS([O-])=O DWAQJAXMDSEUJJ-UHFFFAOYSA-M 0.000 description 1
- 239000004280 Sodium formate Substances 0.000 description 1
- UCKMPCXJQFINFW-UHFFFAOYSA-N Sulphide Chemical compound [S-2] UCKMPCXJQFINFW-UHFFFAOYSA-N 0.000 description 1
- 229920006362 Teflon® Polymers 0.000 description 1
- 239000003929 acidic solution Substances 0.000 description 1
- 229910021529 ammonia Inorganic materials 0.000 description 1
- 150000003863 ammonium salts Chemical class 0.000 description 1
- BFNBIHQBYMNNAN-UHFFFAOYSA-N ammonium sulfate Chemical compound N.N.OS(O)(=O)=O BFNBIHQBYMNNAN-UHFFFAOYSA-N 0.000 description 1
- 229910052921 ammonium sulfate Inorganic materials 0.000 description 1
- 235000011130 ammonium sulphate Nutrition 0.000 description 1
- JFCQEDHGNNZCLN-UHFFFAOYSA-N anhydrous glutaric acid Natural products OC(=O)CCCC(O)=O JFCQEDHGNNZCLN-UHFFFAOYSA-N 0.000 description 1
- SRSXLGNVWSONIS-UHFFFAOYSA-N benzenesulfonic acid Chemical compound OS(=O)(=O)C1=CC=CC=C1 SRSXLGNVWSONIS-UHFFFAOYSA-N 0.000 description 1
- 229940092714 benzenesulfonic acid Drugs 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 239000007844 bleaching agent Substances 0.000 description 1
- 229910021538 borax Inorganic materials 0.000 description 1
- KGBXLFKZBHKPEV-UHFFFAOYSA-N boric acid Chemical compound OB(O)O KGBXLFKZBHKPEV-UHFFFAOYSA-N 0.000 description 1
- 239000004327 boric acid Substances 0.000 description 1
- 230000005587 bubbling Effects 0.000 description 1
- 150000004649 carbonic acid derivatives Chemical class 0.000 description 1
- 239000002738 chelating agent Substances 0.000 description 1
- 238000002144 chemical decomposition reaction Methods 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- 238000005660 chlorination reaction Methods 0.000 description 1
- 150000001805 chlorine compounds Chemical class 0.000 description 1
- 230000007812 deficiency Effects 0.000 description 1
- 230000008021 deposition Effects 0.000 description 1
- 239000003651 drinking water Substances 0.000 description 1
- 235000020188 drinking water Nutrition 0.000 description 1
- 239000002360 explosive Substances 0.000 description 1
- 235000019253 formic acid Nutrition 0.000 description 1
- 239000007789 gas Substances 0.000 description 1
- 239000010439 graphite Substances 0.000 description 1
- 229910002804 graphite Inorganic materials 0.000 description 1
- 231100001261 hazardous Toxicity 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 239000003112 inhibitor Substances 0.000 description 1
- 150000002500 ions Chemical class 0.000 description 1
- 229910052943 magnesium sulfate Inorganic materials 0.000 description 1
- 235000019341 magnesium sulphate Nutrition 0.000 description 1
- VZCYOOQTPOCHFL-UPHRSURJSA-N maleic acid Chemical compound OC(=O)\C=C/C(O)=O VZCYOOQTPOCHFL-UPHRSURJSA-N 0.000 description 1
- 239000011976 maleic acid Substances 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 229940098779 methanesulfonic acid Drugs 0.000 description 1
- 238000002156 mixing Methods 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 150000002825 nitriles Chemical class 0.000 description 1
- 229920001343 polytetrafluoroethylene Polymers 0.000 description 1
- 239000004810 polytetrafluoroethylene Substances 0.000 description 1
- 239000002244 precipitate Substances 0.000 description 1
- 230000001376 precipitating effect Effects 0.000 description 1
- 238000011536 re-plating Methods 0.000 description 1
- 238000011084 recovery Methods 0.000 description 1
- 230000000630 rising effect Effects 0.000 description 1
- 230000035945 sensitivity Effects 0.000 description 1
- 239000001632 sodium acetate Substances 0.000 description 1
- 235000017281 sodium acetate Nutrition 0.000 description 1
- 239000011780 sodium chloride Substances 0.000 description 1
- FQENQNTWSFEDLI-UHFFFAOYSA-J sodium diphosphate Chemical compound [Na+].[Na+].[Na+].[Na+].[O-]P([O-])(=O)OP([O-])([O-])=O FQENQNTWSFEDLI-UHFFFAOYSA-J 0.000 description 1
- HLBBKKJFGFRGMU-UHFFFAOYSA-M sodium formate Chemical compound [Na+].[O-]C=O HLBBKKJFGFRGMU-UHFFFAOYSA-M 0.000 description 1
- 235000019254 sodium formate Nutrition 0.000 description 1
- 235000010267 sodium hydrogen sulphite Nutrition 0.000 description 1
- 229940048086 sodium pyrophosphate Drugs 0.000 description 1
- 239000004328 sodium tetraborate Substances 0.000 description 1
- 235000010339 sodium tetraborate Nutrition 0.000 description 1
- 235000019832 sodium triphosphate Nutrition 0.000 description 1
- 238000013517 stratification Methods 0.000 description 1
- IIACRCGMVDHOTQ-UHFFFAOYSA-N sulfamic acid group Chemical class S(N)(O)(=O)=O IIACRCGMVDHOTQ-UHFFFAOYSA-N 0.000 description 1
- 235000019818 tetrasodium diphosphate Nutrition 0.000 description 1
- 239000001577 tetrasodium phosphonato phosphate Substances 0.000 description 1
- 230000001988 toxicity Effects 0.000 description 1
- 231100000419 toxicity Toxicity 0.000 description 1
- VZCYOOQTPOCHFL-UHFFFAOYSA-N trans-butenedioic acid Natural products OC(=O)C=CC(O)=O VZCYOOQTPOCHFL-UHFFFAOYSA-N 0.000 description 1
- RYFMWSXOAZQYPI-UHFFFAOYSA-K trisodium phosphate Chemical compound [Na+].[Na+].[Na+].[O-]P([O-])([O-])=O RYFMWSXOAZQYPI-UHFFFAOYSA-K 0.000 description 1
- 229910000406 trisodium phosphate Inorganic materials 0.000 description 1
- 235000019801 trisodium phosphate Nutrition 0.000 description 1
- 239000000052 vinegar Substances 0.000 description 1
- 235000021419 vinegar Nutrition 0.000 description 1
- 230000000007 visual effect Effects 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25F—PROCESSES FOR THE ELECTROLYTIC REMOVAL OF MATERIALS FROM OBJECTS; APPARATUS THEREFOR
- C25F5/00—Electrolytic stripping of metallic layers or coatings
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D1/00—Electroforming
- C25D1/20—Separation of the formed objects from the electrodes with no destruction of said electrodes
- C25D1/22—Separating compounds
Definitions
- the present invention relates to an electrical stripping process and compositions for stripping electroless nickel from a substrate.
- An electrical stripping process can be described as the reverse of electroplating. While electroplating applies a coating of metal to a substrate, an electrical stripper removes a coating from the substrate. The coating is dissolved during electrolysis by combining with negative chemical ions in a bath, which are attracted to its surface by its positive potential. While the object of a stripper is to remove a coating without damage to the underlying substrate, most anodic reactions cannot differentiate between the coating and the substrate resulting in etching of that substrate.
- Electroless nickel is a very chemical resistant coating and is difficult to attack.
- An illustration of its chemical resistant is the "nitric acid drop test”. A drop of concentrated nitric acid is applied to the electroless nickel coating's surface. If any etching occurs within a set time period, the test fails.
- the discovery of relatively mild chemical formulations and procedures that will rapidly strip these very chemical resistant coatings is of great economic value. This is especially true when the stripping process can be made environmentally friendly and safe to use in the recovery of defectively plated parts.
- U. S. Patent 4,356,069 (Cunningham) describes an electrical nickel stripper composed of concentrated sulfuric acid, chromic acid, and hydrogen peroxide.
- This formulation claimed to strip chromium as well as nickel from ferrous substrates. While the patent does not claim that the formulation will strip electroless nickel deposits, it suffers from the disadvantages of high disposal costs of its large hazardous chromium and sulfuric acid content, and the added step of having to remove an oxide layer from the substrate before replating can be attempted.
- U. S. Patent 4,664,763 discloses an aqueous stripping solution comprising chromic acid utilizing defectively plated parts as either or both the anode and cathode of an electrolytic stripping cell and applying an alternating current across the electrodes to strip the nickel coatings. Electrolytic and electrolysis nickel coatings are said to be stripped by this method.
- This stripping method cites several optional etch inhibitors, such as potassium iodide, to help prevent etching of the substrate. This method suffers from the possibility of etching and the high disposal cost of the high chromic acid content.
- nitrates normally ammonium or sodium nitrate
- These processes use reverse direct current to remove electroplated nickel and some low phosphorous electroless nickel deposits from iron and steel.
- the stripping bath undergoes rapid pH changes that produce heavy sludging problems. Sporadic passivity of large areas of unstripped nickel occur as the exposed base metal becomes passive under the influence of the electric current causing an incompletely stripped part. The problem is more pronounced when trying to strip electroless nickel deposits above about seven percent phosphorous.
- Nickel stripping baths that utilize water soluble nitrobenzene compounds, either ammonia and ammonium salts or ethylene diamine and/or its homologs, have gained wide acceptance. These baths work well on deposits of electrolytic nickel and some low phosphorous electroless nickels have achieved stripping rates of about 0.001 inch/hour, however, the high phosphorous content electroless deposits slowed the removal to, on average, less than 0.0003 inch an hour. Proper disposal of these types of stripping baths is very expensive because of their toxicity and high chelating power. These baths operate at about 160 - 190 ° Falirenheit to strip electroless nickel coatings and are very vulnerable to damage by heat through loss of volatile chemicals components as well as thermal chemical decomposition.
- U. S Patent 4,554,049 discloses an immersion nickel stripper which uses sulfamic acid, hydrogen peroxide, nitrates, and chlorides.
- U. S. Patent 4,720,332 (Coffey) describes a nickel stripping bath that utilizes soluble nitrobenzene compounds, Zwitterions (as chelating agents), sulfide producing compounds, carbonates, and the use of reverse current for the fast removal of electroless nickel deposits. While this method strips electroless nickel fast (up to 0.002 inch/hour) and works well, it sometimes microscopically etches in high current density areas dulling highly polished surfaces.
- the electrolytic stripping baths of the present invention are made from oxoacids, and/or oxoacid salts, and hydrogen peroxide. It has been discovered that electroless nickel deposits can be dissolved at the anode of electrolytic baths containing oxoacids, and/or oxoacid salts, and hydrogen peroxide.
- the substrates of iron, cast iron, steel alloy, stainless steel, and titanium are protected from attack during electrolysis if the hydrogen peroxide/acid mole ratio is maintained above a minimum preferred mole ratio of about 3.75 for strong oxoacids with one ionizable hydrogen and about 7.5 hydrogen peroxide/oxoacid mole ratio for strong oxoacids with two or more ionizable hydrogens.
- Peroxide/oxoacid ratios as low as 1.5 may be used when combining weak oxoacids with weak oxoacid salts to construct a stripping bath.
- sulfuric and sulfamic acids and/or their salts may be selected from the strong oxoacids while any of the hydrogen peroxide compatible weak oxoacids and/or salts may be used. Only combinations of weak oxoacids and/or oxoacid salts should be used when stripping from the substrates of electroplated nickel, cast nickel, kovar (iron, nickel, cobalt alloy), and sulfamate nickel.
- an acid is considered strong if it has a dissociation constant (Ki) greater than about 2 X 10 "1 .
- strong oxoacids include sulfuric, nitric, sulfamic, alkyl sulfonic, aryl sulfonic, and monoalkyl esters of sulfuric acid.
- weak oxoacids include phosphoric, pyrophosphoric, alkyl phosphoric, glucophosphonic, oxalic, formic, propanoic, bis methanol propanoic, acetic, butanoic, benzoic, phthalic, citric, tartaric, malic, malonic, maleic, butyric, succinic, glycolic, glutaric, gluconic, adipic, boric, ethylenediaminetetraacetic and homologs, nitrilotriacetic, amino acetic, and polyvinyl sulfonic acid.
- the concentration of hydrogen peroxide for the application of this invention can range from about one percent to about 99 percent, but a concentration of about eight percent is preferred. While maintaining the disclosed minimum peroxide/oxoacid mole ratios the oxoacid and/or oxoacid salts may vary from 0.01 mole/liter to saturation.
- the pH range for implementation of the invention is about 0-8, while the preferred pH range is about 1-7, and the most preferred range is about 1.5-4.5.
- oxygen free halogen acids hydrofluoric and hydrochloric are excluded from the invention because there seems to be no hydrogen peroxide/acid ratio that will prevent attack on iron or steel substrates when these acids and/or their salts are used in the stripping bath in amounts above about 0J mole/liter.
- Iodic, bromic, and chromic acids and/or salts are excluded because of their incomparability with hydrogen peroxide either upon mixing with peroxide or during the stripping process.
- electroless nickel deposits can be electrolytically stripped from substrates of iron, cast iron, steel alloy, stainless steel, aluminum, and titanium utilizing stripping baths made from selected oxoacids and/or oxoacid salts and hydrogen peroxide.
- electrolytically deposited nickel, cast nickel, kovar, and high nickel alloy substrates can be stripped of electroless nickel deposits without significant substrate attack provided the stripping bath is made from weak oxoacids and or oxoacid salts.
- Electroless nickel can be stripped from aluminum substrates without significant attack only if the strong oxoacids and /or strong oxoacids salts are selected from sulfuric acid and its salts and/or sulfamic acid and its salts. Any of the hydrogen peroxide compatible weak oxoacids and/or oxoacid salts may be used to strip electroless nickel from aluminum.
- the base metals are protected from attack during electrolysis if the hydrogen peroxide/oxoacid mole ratio is maintained above a minimum of about 3.75 for strong oxoacids with one ionizable hydrogen and about 7.5 hydrogen peroxide/oxoacid mole ratio for strong oxoacids with two or more ionizable hydrogens.
- Peroxide/oxoacid ratios as low as 1.5 maybe used when combining weak oxoacids and/or weak oxoacid salts to construct a stripping bath.
- oxygen free halogen acids hydrofluoric and hydrochloric are excluded from this invention because there is no apparent concentration of hydrogen peroxide that will prevent attack of iron, steel alloy, and aluminum substrates when these acids are present in the stripping bath at a concentration greater than about 0J mole/liter.
- Very small amounts of halogen ions do not seem to attack the substrate if accompanied in solution by relatively large amounts of oxoacid ions.
- the amount of chloride ion resulting from chlorination of drinking water does not seem to affect the substrate, however, if the concentration of chloride ion rises above about 0J mole per liter, some attack of the substrate may result.
- the concentration of oxoacid and/or oxoacid salts may vary over wide limits as long as the minimum peroxide/acid mole ratios are maintained.
- the acid and/or salts may vary from 0.01 mole/liter to saturation.
- the stripping bath since the current that flows through the bath determines the amount of nickel stripped during a time period, it is preferred that the stripping bath have a low electrical resistance. Therefore, selection of the amount and type of oxoacids and/or oxoacid salts that increase the conductivity of the solution is of great importance for the rapid and economic removal of the electroless nickel coating.
- the preferred temperature range for operating the stripping baths of this invention is about 60-115 ° F, and the most preferred is about 80-100 ° F.
- lower or higher temperatures may be used, however, lower conductivity and solubility will be experienced at lower temperatures, and accelerated peroxide decomposition may occur at higher temperatures.
- the following bath was not chelated which makes waste treatment of spent stripping baths of this formulation simple and low in cost. It contained only about three times the acetic acid content of ordinary vinegar which makes it very safe to use. While the peroxide content was high enough to bleach hair, it is not a high enough concentration to be a serious hazard to workers.
- a TEFLON® (polytetrafluoroethylene) coated stirring rod was placed in the beaker and was used to slowly stir the solution to prevent stratification of the bath. The current was applied and the voltage drop across the stripping bath was adjusted to four. After a momentary formation of bubbles on the plated part, the nickel began to dissolve into the stripping bath and all bubbling at the anode stopped. The starting current was 0.75 amps. After about thirty minutes, the steel base metal began to be exposed at the 90-degree angles on the bottom of the plated part. Unlike nitrate based electrolytic strippers, the exposed steel substrate did not gas. The electroless nickel coating continued to dissolve, and as it receded, it assumed a parabolic shape as it shrank from all sides of the panel.
- Example 2 The following examples were constructed as in Example 1 and illustrate the varied oxoacids and/or oxoacid salts that may be used in this invention:
- Example 2 The following examples were constructed as in Example 1 and illustrate the varied oxoacids and/or oxoacid salts that may be used in this invention:
- Example 1 This bath had less resistance to the flow of current than Example 1 and the starting current was 1.02 amperes at a starting voltage drop across the bath of four volts. An identical panel to the one used in Example 1 was stripped in about thirty minutes with identical good results.
- Example 4 This bath was constructed as in Example 1. This bath had very good conductivity. It stripped from the substrates of steel, aluminum, and titanium with no visible attack. 2.35 grams of nickel were introduced into the bath and calculations showed that 97.9 % of the acid had been used to react with nickel. Additional use of this bath caused the pH to rise rapidly from the 4.8 pH that was measured when the nickel content reached 2.35 grams. Continued stripping caused precipitation of nickel hydroxide and rapid decomposition of the hydrogen peroxide as the pH reached about 6-7. No additions of hydrogen peroxide were necessary during the test. Example 4
- This bath was tested to 60 amps./sq. ft. No attack on steel, aluminum, or titanium base metals was observed.
- This bath gave good results stripping nickel from steel, aluminum, and cast iron substrates.
- This bath stripped about 10 times slower at four volts than the bath in Example 1 because of poor bath conductivity. The bath does not attack steel substrate.
- the bath stripped 4.2 grams nickel which is the stoichiometric equivalent of the citric acid in the bath.
- the pH of the bath began to rise rapidly and the test was terminated. No attack on steel, aluminum, cast iron, or titanium substrates was noted.
- This bath stripped electroless nickel deposits at near 100% efficiency. No visible attack on steel substrates was observed. Bright electrolytically deposited nickel was slowly (oxygen liberated at nickel's surface) dissolved in this bath because of the nitrate content. Aluminum substrates were slowly attacked.
- This bath stripped bright electroplated nickel with less efficiency, i.e., some gassing occurs as the electroplated nickel was dissolved. However, 12 % high phosphorous electroless nickel deposits were stripped at near 100 % efficiency.
- This formulation is an improvement over prior art because it allows the use of an acid to keep the pH from rising to a point where nickel hydroxide precipitation causes sludging of the bath which is an inherent deficiency of prior art nitrate electrolytic strippers. It also allows the nitrate based formulation to strip high phosphorous electroless nickel and bright electroplated nickel in one stripping bath with no attack on steel or cast iron substrates. Aluminum substrates are attacked.
- This bath stripped bright electroplated nickel with gassing of oxygen. It stripped electroless nickel very rapidly because of high conductivity. With this bath, aluminum substrates, but not steel or titanium substrates, were attacked.
- the following example has a volume of one liter. This bath illustrates a very low peroxide/oxoacid concentration of 0.3/0.04 moles.
- this bath stripped electroless nickel of 12 % phosphorous content with no discemable attack on steel or aluminum test panels.
- Example 30 A one-inch wide unplated steel test panel was immersed into the solution and was immediately attacked before electrical connection was made to the test panel. This panel was replaced with another steel panel that was plated with 0.001 inch electroless nickel. The panel was connected to the positive lead of the power supply as in Example 1 and voltage was adjusted to four volts. The elecfroless nickel was rapidly dissolved because of the high current density. After the panel was stripped of elecfroless nickel and the part was being removed from the stripping bath, it was explosively attacked by the stripping solution remaining on its surface.
- Example 30 A one-inch wide unplated steel test panel was immersed into the solution and was immediately attacked before electrical connection was made to the test panel. This panel was replaced with another steel panel that was plated with 0.001 inch electroless nickel. The panel was connected to the positive lead of the power supply as in Example 1 and voltage was adjusted to four volts. The elecfroless nickel was rapidly dissolved because of the high current density. After the panel was stripped of elecfroless nickel and the part was being removed from
- Example 29 An unplated test panel identical to that of Example 29 was immersed into the stripping solution without electrical contact. The test panel was very slowly attacked by the solution. As in Example 29, the panel was replaced by a plated one and stripped. When the panel was removed, the steel base metal was attacked but was not explosive in its rate of attack. Addition of 15 milliliters of hydrogen peroxide (50%) to the above bath stopped all the etching and produced results identical to those obtained in Example 1.
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Abstract
L'invention concerne des solutions de décapage électrolytique, contenant des oxacides et/ou des sels d'oxacides, et du péroxyde d'hydrogène. Lesdites solutions ont été formulées pour éliminer rapidement le dépôt autocatalytique de nickel d'alliages de fer, d'acier, d'aluminium, et de titane, ainsi que d'autres substrats conducteurs sélectionnés. Les formulations permettent d'accroître la résistance à l'attaque du substrat et peuvent être formulées sans chélate, ni chromate, nitrate, ou solution d'acide concentré, ce qui augmente la sécurité du travailleur et réduit les coûts d'élimination de déchets de solutions de décapage utilisées.
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| PCT/US2001/032607 WO2003035944A1 (fr) | 2001-10-23 | 2001-10-23 | Procede electrolytique et compositions de decapage de depot autocatalytique de nickel |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| EP1438448A1 true EP1438448A1 (fr) | 2004-07-21 |
Family
ID=21742924
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| EP01981784A Withdrawn EP1438448A1 (fr) | 2001-10-23 | 2001-10-23 | Procede electrolytique et compositions de decapage de depot autocatalytique de nickel |
Country Status (5)
| Country | Link |
|---|---|
| EP (1) | EP1438448A1 (fr) |
| JP (1) | JP2005506457A (fr) |
| KR (1) | KR100618165B1 (fr) |
| CA (1) | CA2458305A1 (fr) |
| WO (1) | WO2003035944A1 (fr) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN111621840A (zh) * | 2020-05-26 | 2020-09-04 | 大连理工大学 | 一种钛合金表面铁污染的双极电化学清除方法 |
Families Citing this family (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| GB0505353D0 (en) * | 2005-03-16 | 2005-04-20 | Chem Technologies Ltd E | Treatment process for concrete |
| US7569490B2 (en) * | 2005-03-15 | 2009-08-04 | Wd Media, Inc. | Electrochemical etching |
| US20060207890A1 (en) * | 2005-03-15 | 2006-09-21 | Norbert Staud | Electrochemical etching |
| CN114561557B (zh) * | 2022-01-15 | 2023-06-30 | 南城广德新材科技有限公司 | 一种快速溶解镍豆的工艺 |
| JP7500088B2 (ja) | 2022-04-11 | 2024-06-17 | 奥野製薬工業株式会社 | 金属剥離剤 |
Family Cites Families (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5062941A (en) * | 1990-10-22 | 1991-11-05 | Union Carbide Coatings Service Technology Corporation | Electrolytic process for stripping a metal coating from a titanium based metal substrate |
| US6332970B1 (en) * | 1999-10-22 | 2001-12-25 | Barry W. Coffey | Electrolytic method of and compositions for stripping electroless nickel |
-
2001
- 2001-10-23 WO PCT/US2001/032607 patent/WO2003035944A1/fr not_active Ceased
- 2001-10-23 KR KR1020047005106A patent/KR100618165B1/ko not_active Expired - Fee Related
- 2001-10-23 JP JP2003538437A patent/JP2005506457A/ja active Pending
- 2001-10-23 CA CA002458305A patent/CA2458305A1/fr not_active Abandoned
- 2001-10-23 EP EP01981784A patent/EP1438448A1/fr not_active Withdrawn
Non-Patent Citations (1)
| Title |
|---|
| See references of WO03035944A1 * |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN111621840A (zh) * | 2020-05-26 | 2020-09-04 | 大连理工大学 | 一种钛合金表面铁污染的双极电化学清除方法 |
Also Published As
| Publication number | Publication date |
|---|---|
| JP2005506457A (ja) | 2005-03-03 |
| WO2003035944A1 (fr) | 2003-05-01 |
| KR20040051600A (ko) | 2004-06-18 |
| CA2458305A1 (fr) | 2003-05-01 |
| KR100618165B1 (ko) | 2006-08-31 |
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