EP1337694A4 - Procede de fabrication de particules colloidales de type tige sous forme de nano codes-barres - Google Patents
Procede de fabrication de particules colloidales de type tige sous forme de nano codes-barresInfo
- Publication number
- EP1337694A4 EP1337694A4 EP01977334A EP01977334A EP1337694A4 EP 1337694 A4 EP1337694 A4 EP 1337694A4 EP 01977334 A EP01977334 A EP 01977334A EP 01977334 A EP01977334 A EP 01977334A EP 1337694 A4 EP1337694 A4 EP 1337694A4
- Authority
- EP
- European Patent Office
- Prior art keywords
- pores
- pattern
- nanoparticles
- substrate
- membrane
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Withdrawn
Links
- 238000000034 method Methods 0.000 title claims abstract description 138
- 238000004519 manufacturing process Methods 0.000 title claims abstract description 38
- 239000002245 particle Substances 0.000 title abstract description 109
- 239000011148 porous material Substances 0.000 claims abstract description 129
- 239000002105 nanoparticle Substances 0.000 claims abstract description 104
- 239000000758 substrate Substances 0.000 claims abstract description 68
- 229920002120 photoresistant polymer Polymers 0.000 claims abstract description 39
- 238000005530 etching Methods 0.000 claims abstract description 27
- 238000004070 electrodeposition Methods 0.000 claims abstract description 25
- 239000000463 material Substances 0.000 claims description 87
- 230000015572 biosynthetic process Effects 0.000 claims description 48
- 238000000151 deposition Methods 0.000 claims description 32
- 238000000025 interference lithography Methods 0.000 claims description 30
- 230000008021 deposition Effects 0.000 claims description 27
- 239000010410 layer Substances 0.000 abstract description 95
- 238000007747 plating Methods 0.000 abstract description 40
- 229920000642 polymer Polymers 0.000 abstract description 22
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 abstract description 20
- 229910052710 silicon Inorganic materials 0.000 abstract description 20
- 239000010703 silicon Substances 0.000 abstract description 20
- 238000011161 development Methods 0.000 abstract description 8
- 239000013047 polymeric layer Substances 0.000 abstract 1
- 239000012528 membrane Substances 0.000 description 149
- 239000010931 gold Substances 0.000 description 77
- 229910052751 metal Inorganic materials 0.000 description 71
- 239000002184 metal Substances 0.000 description 71
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 description 63
- 239000000243 solution Substances 0.000 description 56
- 229910052709 silver Inorganic materials 0.000 description 41
- 229910052737 gold Inorganic materials 0.000 description 40
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 35
- 239000002073 nanorod Substances 0.000 description 34
- 239000004332 silver Substances 0.000 description 34
- 238000003786 synthesis reaction Methods 0.000 description 34
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 description 33
- 239000000796 flavoring agent Substances 0.000 description 32
- 235000019634 flavors Nutrition 0.000 description 32
- 235000012431 wafers Nutrition 0.000 description 29
- 238000009713 electroplating Methods 0.000 description 25
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical compound [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 description 25
- 238000013459 approach Methods 0.000 description 23
- 229920000767 polyaniline Polymers 0.000 description 22
- 239000011324 bead Substances 0.000 description 19
- 150000002739 metals Chemical group 0.000 description 19
- 239000004020 conductor Substances 0.000 description 18
- 210000004027 cell Anatomy 0.000 description 16
- 239000000203 mixture Substances 0.000 description 16
- 230000003287 optical effect Effects 0.000 description 16
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 15
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 14
- 230000008569 process Effects 0.000 description 14
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 13
- 229910001868 water Inorganic materials 0.000 description 13
- 238000000429 assembly Methods 0.000 description 11
- 230000000712 assembly Effects 0.000 description 11
- 229910052697 platinum Inorganic materials 0.000 description 11
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 10
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 10
- 238000000576 coating method Methods 0.000 description 10
- 239000004065 semiconductor Substances 0.000 description 10
- 239000010949 copper Substances 0.000 description 9
- 238000005229 chemical vapour deposition Methods 0.000 description 8
- 239000011248 coating agent Substances 0.000 description 8
- 229910052802 copper Inorganic materials 0.000 description 8
- 239000000126 substance Substances 0.000 description 8
- ZMXDDKWLCZADIW-UHFFFAOYSA-N N,N-Dimethylformamide Chemical compound CN(C)C=O ZMXDDKWLCZADIW-UHFFFAOYSA-N 0.000 description 7
- GRYLNZFGIOXLOG-UHFFFAOYSA-N Nitric acid Chemical compound O[N+]([O-])=O GRYLNZFGIOXLOG-UHFFFAOYSA-N 0.000 description 7
- 238000003917 TEM image Methods 0.000 description 7
- 238000005516 engineering process Methods 0.000 description 7
- 239000000835 fiber Substances 0.000 description 7
- 238000007306 functionalization reaction Methods 0.000 description 7
- 239000011521 glass Substances 0.000 description 7
- 238000001459 lithography Methods 0.000 description 7
- 229910017604 nitric acid Inorganic materials 0.000 description 7
- 238000000206 photolithography Methods 0.000 description 7
- 239000002904 solvent Substances 0.000 description 7
- 239000010936 titanium Substances 0.000 description 7
- QTBSBXVTEAMEQO-UHFFFAOYSA-N Acetic acid Chemical compound CC(O)=O QTBSBXVTEAMEQO-UHFFFAOYSA-N 0.000 description 6
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 6
- 230000008901 benefit Effects 0.000 description 6
- 238000006243 chemical reaction Methods 0.000 description 6
- IJOOHPMOJXWVHK-UHFFFAOYSA-N chlorotrimethylsilane Chemical compound C[Si](C)(C)Cl IJOOHPMOJXWVHK-UHFFFAOYSA-N 0.000 description 6
- XBDQKXXYIPTUBI-UHFFFAOYSA-N dimethylselenoniopropionate Natural products CCC(O)=O XBDQKXXYIPTUBI-UHFFFAOYSA-N 0.000 description 6
- 238000001704 evaporation Methods 0.000 description 6
- 229910044991 metal oxide Inorganic materials 0.000 description 6
- 150000004706 metal oxides Chemical class 0.000 description 6
- 229910052759 nickel Inorganic materials 0.000 description 6
- 239000004417 polycarbonate Substances 0.000 description 6
- 229920000515 polycarbonate Polymers 0.000 description 6
- 238000001338 self-assembly Methods 0.000 description 6
- 239000011701 zinc Substances 0.000 description 6
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 5
- 239000004642 Polyimide Substances 0.000 description 5
- 239000002253 acid Substances 0.000 description 5
- 238000004458 analytical method Methods 0.000 description 5
- 238000013461 design Methods 0.000 description 5
- FFUAGWLWBBFQJT-UHFFFAOYSA-N hexamethyldisilazane Chemical compound C[Si](C)(C)N[Si](C)(C)C FFUAGWLWBBFQJT-UHFFFAOYSA-N 0.000 description 5
- 229910010272 inorganic material Inorganic materials 0.000 description 5
- 239000002082 metal nanoparticle Substances 0.000 description 5
- 238000000059 patterning Methods 0.000 description 5
- 239000012071 phase Substances 0.000 description 5
- 229920003229 poly(methyl methacrylate) Polymers 0.000 description 5
- 229910021420 polycrystalline silicon Inorganic materials 0.000 description 5
- 229920001721 polyimide Polymers 0.000 description 5
- 239000004926 polymethyl methacrylate Substances 0.000 description 5
- 229920005591 polysilicon Polymers 0.000 description 5
- 239000000377 silicon dioxide Substances 0.000 description 5
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 4
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 4
- KDLHZDBZIXYQEI-UHFFFAOYSA-N Palladium Chemical compound [Pd] KDLHZDBZIXYQEI-UHFFFAOYSA-N 0.000 description 4
- NRTOMJZYCJJWKI-UHFFFAOYSA-N Titanium nitride Chemical compound [Ti]#N NRTOMJZYCJJWKI-UHFFFAOYSA-N 0.000 description 4
- 229910052782 aluminium Inorganic materials 0.000 description 4
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 4
- 239000003153 chemical reaction reagent Substances 0.000 description 4
- 239000011651 chromium Substances 0.000 description 4
- 238000004891 communication Methods 0.000 description 4
- 150000001875 compounds Chemical class 0.000 description 4
- 238000004090 dissolution Methods 0.000 description 4
- 239000000975 dye Substances 0.000 description 4
- -1 e.g. Substances 0.000 description 4
- 238000010894 electron beam technology Methods 0.000 description 4
- 230000008020 evaporation Effects 0.000 description 4
- 239000004816 latex Substances 0.000 description 4
- 229920000126 latex Polymers 0.000 description 4
- 239000007788 liquid Substances 0.000 description 4
- 238000001020 plasma etching Methods 0.000 description 4
- 230000005855 radiation Effects 0.000 description 4
- 230000009467 reduction Effects 0.000 description 4
- 239000010944 silver (metal) Substances 0.000 description 4
- 238000001179 sorption measurement Methods 0.000 description 4
- DENFJSAFJTVPJR-UHFFFAOYSA-N triethoxy(ethyl)silane Chemical compound CCO[Si](CC)(OCC)OCC DENFJSAFJTVPJR-UHFFFAOYSA-N 0.000 description 4
- 239000000853 adhesive Substances 0.000 description 3
- 230000001070 adhesive effect Effects 0.000 description 3
- 238000003556 assay Methods 0.000 description 3
- 230000008859 change Effects 0.000 description 3
- 229910052681 coesite Inorganic materials 0.000 description 3
- 229910052593 corundum Inorganic materials 0.000 description 3
- 229910052906 cristobalite Inorganic materials 0.000 description 3
- 238000002474 experimental method Methods 0.000 description 3
- 150000002484 inorganic compounds Chemical class 0.000 description 3
- 229910001092 metal group alloy Inorganic materials 0.000 description 3
- 229910021645 metal ion Inorganic materials 0.000 description 3
- 238000010943 off-gassing Methods 0.000 description 3
- 150000002894 organic compounds Chemical class 0.000 description 3
- 229920000620 organic polymer Polymers 0.000 description 3
- 229910052763 palladium Inorganic materials 0.000 description 3
- 239000002861 polymer material Substances 0.000 description 3
- 238000002360 preparation method Methods 0.000 description 3
- 230000001737 promoting effect Effects 0.000 description 3
- 235000019260 propionic acid Nutrition 0.000 description 3
- IUVKMZGDUIUOCP-BTNSXGMBSA-N quinbolone Chemical class O([C@H]1CC[C@H]2[C@H]3[C@@H]([C@]4(C=CC(=O)C=C4CC3)C)CC[C@@]21C)C1=CCCC1 IUVKMZGDUIUOCP-BTNSXGMBSA-N 0.000 description 3
- 238000002310 reflectometry Methods 0.000 description 3
- 241000894007 species Species 0.000 description 3
- 238000004528 spin coating Methods 0.000 description 3
- 229910052682 stishovite Inorganic materials 0.000 description 3
- 238000001447 template-directed synthesis Methods 0.000 description 3
- 229910052719 titanium Inorganic materials 0.000 description 3
- 238000012546 transfer Methods 0.000 description 3
- 229910052905 tridymite Inorganic materials 0.000 description 3
- 229910001845 yogo sapphire Inorganic materials 0.000 description 3
- SCYULBFZEHDVBN-UHFFFAOYSA-N 1,1-Dichloroethane Chemical compound CC(Cl)Cl SCYULBFZEHDVBN-UHFFFAOYSA-N 0.000 description 2
- XNWFRZJHXBZDAG-UHFFFAOYSA-N 2-METHOXYETHANOL Chemical compound COCCO XNWFRZJHXBZDAG-UHFFFAOYSA-N 0.000 description 2
- QPLDLSVMHZLSFG-UHFFFAOYSA-N Copper oxide Chemical compound [Cu]=O QPLDLSVMHZLSFG-UHFFFAOYSA-N 0.000 description 2
- 108091034117 Oligonucleotide Proteins 0.000 description 2
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 2
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 description 2
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 2
- 238000013019 agitation Methods 0.000 description 2
- 150000001343 alkyl silanes Chemical class 0.000 description 2
- 239000012491 analyte Substances 0.000 description 2
- 239000006117 anti-reflective coating Substances 0.000 description 2
- WATWJIUSRGPENY-UHFFFAOYSA-N antimony atom Chemical compound [Sb] WATWJIUSRGPENY-UHFFFAOYSA-N 0.000 description 2
- 239000007864 aqueous solution Substances 0.000 description 2
- 238000003491 array Methods 0.000 description 2
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 2
- 238000004166 bioassay Methods 0.000 description 2
- UHYPYGJEEGLRJD-UHFFFAOYSA-N cadmium(2+);selenium(2-) Chemical compound [Se-2].[Cd+2] UHYPYGJEEGLRJD-UHFFFAOYSA-N 0.000 description 2
- 238000012512 characterization method Methods 0.000 description 2
- 229910052804 chromium Inorganic materials 0.000 description 2
- 239000002131 composite material Substances 0.000 description 2
- 239000002826 coolant Substances 0.000 description 2
- 238000001816 cooling Methods 0.000 description 2
- 239000002178 crystalline material Substances 0.000 description 2
- 230000006378 damage Effects 0.000 description 2
- 238000000708 deep reactive-ion etching Methods 0.000 description 2
- 238000001035 drying Methods 0.000 description 2
- 239000012530 fluid Substances 0.000 description 2
- 239000007789 gas Substances 0.000 description 2
- 229910052736 halogen Inorganic materials 0.000 description 2
- 150000002367 halogens Chemical class 0.000 description 2
- 238000009396 hybridization Methods 0.000 description 2
- 238000003384 imaging method Methods 0.000 description 2
- 238000002188 infrared transmission spectroscopy Methods 0.000 description 2
- 238000009413 insulation Methods 0.000 description 2
- 150000002500 ions Chemical class 0.000 description 2
- 238000004949 mass spectrometry Methods 0.000 description 2
- 238000002844 melting Methods 0.000 description 2
- 230000008018 melting Effects 0.000 description 2
- 229910052976 metal sulfide Inorganic materials 0.000 description 2
- 238000001465 metallisation Methods 0.000 description 2
- 238000012986 modification Methods 0.000 description 2
- 230000004048 modification Effects 0.000 description 2
- 238000011512 multiplexed immunoassay Methods 0.000 description 2
- 150000004767 nitrides Chemical class 0.000 description 2
- 238000000399 optical microscopy Methods 0.000 description 2
- 239000001301 oxygen Substances 0.000 description 2
- 229910052760 oxygen Inorganic materials 0.000 description 2
- 239000011236 particulate material Substances 0.000 description 2
- 238000002161 passivation Methods 0.000 description 2
- 239000002096 quantum dot Substances 0.000 description 2
- 230000003134 recirculating effect Effects 0.000 description 2
- 238000012216 screening Methods 0.000 description 2
- 150000003346 selenoethers Chemical class 0.000 description 2
- 238000000926 separation method Methods 0.000 description 2
- 238000013207 serial dilution Methods 0.000 description 2
- 235000012239 silicon dioxide Nutrition 0.000 description 2
- 238000002791 soaking Methods 0.000 description 2
- 239000007787 solid Substances 0.000 description 2
- 238000000527 sonication Methods 0.000 description 2
- 238000001228 spectrum Methods 0.000 description 2
- 238000003756 stirring Methods 0.000 description 2
- XSOKHXFFCGXDJZ-UHFFFAOYSA-N telluride(2-) Chemical compound [Te-2] XSOKHXFFCGXDJZ-UHFFFAOYSA-N 0.000 description 2
- VXUYXOFXAQZZMF-UHFFFAOYSA-N titanium(IV) isopropoxide Chemical compound CC(C)O[Ti](OC(C)C)(OC(C)C)OC(C)C VXUYXOFXAQZZMF-UHFFFAOYSA-N 0.000 description 2
- 230000007704 transition Effects 0.000 description 2
- 238000011282 treatment Methods 0.000 description 2
- 238000002525 ultrasonication Methods 0.000 description 2
- 239000010457 zeolite Substances 0.000 description 2
- 229910052725 zinc Inorganic materials 0.000 description 2
- SRZXCOWFGPICGA-UHFFFAOYSA-N 1,6-Hexanedithiol Chemical compound SCCCCCCS SRZXCOWFGPICGA-UHFFFAOYSA-N 0.000 description 1
- OGMADIBCHLQMIP-UHFFFAOYSA-N 2-aminoethanethiol;hydron;chloride Chemical compound Cl.NCCS OGMADIBCHLQMIP-UHFFFAOYSA-N 0.000 description 1
- HBAQYPYDRFILMT-UHFFFAOYSA-N 8-[3-(1-cyclopropylpyrazol-4-yl)-1H-pyrazolo[4,3-d]pyrimidin-5-yl]-3-methyl-3,8-diazabicyclo[3.2.1]octan-2-one Chemical class C1(CC1)N1N=CC(=C1)C1=NNC2=C1N=C(N=C2)N1C2C(N(CC1CC2)C)=O HBAQYPYDRFILMT-UHFFFAOYSA-N 0.000 description 1
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 1
- 241000282461 Canis lupus Species 0.000 description 1
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 description 1
- KRKNYBCHXYNGOX-UHFFFAOYSA-K Citrate Chemical compound [O-]C(=O)CC(O)(CC([O-])=O)C([O-])=O KRKNYBCHXYNGOX-UHFFFAOYSA-K 0.000 description 1
- 238000000018 DNA microarray Methods 0.000 description 1
- 108090000790 Enzymes Proteins 0.000 description 1
- 102000004190 Enzymes Human genes 0.000 description 1
- 206010073306 Exposure to radiation Diseases 0.000 description 1
- 230000005526 G1 to G0 transition Effects 0.000 description 1
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 1
- 102000008394 Immunoglobulin Fragments Human genes 0.000 description 1
- 108010021625 Immunoglobulin Fragments Proteins 0.000 description 1
- 108700026244 Open Reading Frames Proteins 0.000 description 1
- ZLMJMSJWJFRBEC-UHFFFAOYSA-N Potassium Chemical compound [K] ZLMJMSJWJFRBEC-UHFFFAOYSA-N 0.000 description 1
- 229910018885 Pt—Au Inorganic materials 0.000 description 1
- 238000001069 Raman spectroscopy Methods 0.000 description 1
- 229910018162 SeO2 Inorganic materials 0.000 description 1
- 238000001015 X-ray lithography Methods 0.000 description 1
- HCHKCACWOHOZIP-UHFFFAOYSA-N Zinc Chemical compound [Zn] HCHKCACWOHOZIP-UHFFFAOYSA-N 0.000 description 1
- JLCPHMBAVCMARE-UHFFFAOYSA-N [3-[[3-[[3-[[3-[[3-[[3-[[3-[[3-[[3-[[3-[[3-[[5-(2-amino-6-oxo-1H-purin-9-yl)-3-[[3-[[3-[[3-[[3-[[3-[[5-(2-amino-6-oxo-1H-purin-9-yl)-3-[[5-(2-amino-6-oxo-1H-purin-9-yl)-3-hydroxyoxolan-2-yl]methoxy-hydroxyphosphoryl]oxyoxolan-2-yl]methoxy-hydroxyphosphoryl]oxy-5-(5-methyl-2,4-dioxopyrimidin-1-yl)oxolan-2-yl]methoxy-hydroxyphosphoryl]oxy-5-(6-aminopurin-9-yl)oxolan-2-yl]methoxy-hydroxyphosphoryl]oxy-5-(6-aminopurin-9-yl)oxolan-2-yl]methoxy-hydroxyphosphoryl]oxy-5-(6-aminopurin-9-yl)oxolan-2-yl]methoxy-hydroxyphosphoryl]oxy-5-(6-aminopurin-9-yl)oxolan-2-yl]methoxy-hydroxyphosphoryl]oxyoxolan-2-yl]methoxy-hydroxyphosphoryl]oxy-5-(5-methyl-2,4-dioxopyrimidin-1-yl)oxolan-2-yl]methoxy-hydroxyphosphoryl]oxy-5-(4-amino-2-oxopyrimidin-1-yl)oxolan-2-yl]methoxy-hydroxyphosphoryl]oxy-5-(5-methyl-2,4-dioxopyrimidin-1-yl)oxolan-2-yl]methoxy-hydroxyphosphoryl]oxy-5-(5-methyl-2,4-dioxopyrimidin-1-yl)oxolan-2-yl]methoxy-hydroxyphosphoryl]oxy-5-(6-aminopurin-9-yl)oxolan-2-yl]methoxy-hydroxyphosphoryl]oxy-5-(6-aminopurin-9-yl)oxolan-2-yl]methoxy-hydroxyphosphoryl]oxy-5-(4-amino-2-oxopyrimidin-1-yl)oxolan-2-yl]methoxy-hydroxyphosphoryl]oxy-5-(4-amino-2-oxopyrimidin-1-yl)oxolan-2-yl]methoxy-hydroxyphosphoryl]oxy-5-(4-amino-2-oxopyrimidin-1-yl)oxolan-2-yl]methoxy-hydroxyphosphoryl]oxy-5-(6-aminopurin-9-yl)oxolan-2-yl]methoxy-hydroxyphosphoryl]oxy-5-(4-amino-2-oxopyrimidin-1-yl)oxolan-2-yl]methyl [5-(6-aminopurin-9-yl)-2-(hydroxymethyl)oxolan-3-yl] hydrogen phosphate Polymers Cc1cn(C2CC(OP(O)(=O)OCC3OC(CC3OP(O)(=O)OCC3OC(CC3O)n3cnc4c3nc(N)[nH]c4=O)n3cnc4c3nc(N)[nH]c4=O)C(COP(O)(=O)OC3CC(OC3COP(O)(=O)OC3CC(OC3COP(O)(=O)OC3CC(OC3COP(O)(=O)OC3CC(OC3COP(O)(=O)OC3CC(OC3COP(O)(=O)OC3CC(OC3COP(O)(=O)OC3CC(OC3COP(O)(=O)OC3CC(OC3COP(O)(=O)OC3CC(OC3COP(O)(=O)OC3CC(OC3COP(O)(=O)OC3CC(OC3COP(O)(=O)OC3CC(OC3COP(O)(=O)OC3CC(OC3COP(O)(=O)OC3CC(OC3COP(O)(=O)OC3CC(OC3COP(O)(=O)OC3CC(OC3COP(O)(=O)OC3CC(OC3CO)n3cnc4c(N)ncnc34)n3ccc(N)nc3=O)n3cnc4c(N)ncnc34)n3ccc(N)nc3=O)n3ccc(N)nc3=O)n3ccc(N)nc3=O)n3cnc4c(N)ncnc34)n3cnc4c(N)ncnc34)n3cc(C)c(=O)[nH]c3=O)n3cc(C)c(=O)[nH]c3=O)n3ccc(N)nc3=O)n3cc(C)c(=O)[nH]c3=O)n3cnc4c3nc(N)[nH]c4=O)n3cnc4c(N)ncnc34)n3cnc4c(N)ncnc34)n3cnc4c(N)ncnc34)n3cnc4c(N)ncnc34)O2)c(=O)[nH]c1=O JLCPHMBAVCMARE-UHFFFAOYSA-N 0.000 description 1
- 230000002378 acidificating effect Effects 0.000 description 1
- 150000007513 acids Chemical class 0.000 description 1
- 125000003545 alkoxy group Chemical group 0.000 description 1
- 125000000217 alkyl group Chemical group 0.000 description 1
- 229910045601 alloy Inorganic materials 0.000 description 1
- 239000000956 alloy Substances 0.000 description 1
- 238000000149 argon plasma sintering Methods 0.000 description 1
- 238000011953 bioanalysis Methods 0.000 description 1
- 230000005540 biological transmission Effects 0.000 description 1
- 229920001400 block copolymer Polymers 0.000 description 1
- 238000006664 bond formation reaction Methods 0.000 description 1
- QCUOBSQYDGUHHT-UHFFFAOYSA-L cadmium sulfate Chemical compound [Cd+2].[O-]S([O-])(=O)=O QCUOBSQYDGUHHT-UHFFFAOYSA-L 0.000 description 1
- 229910000369 cadmium(II) sulfate Inorganic materials 0.000 description 1
- 230000001413 cellular effect Effects 0.000 description 1
- 150000004770 chalcogenides Chemical class 0.000 description 1
- 239000002801 charged material Substances 0.000 description 1
- 238000005234 chemical deposition Methods 0.000 description 1
- 238000007385 chemical modification Methods 0.000 description 1
- 238000006388 chemical passivation reaction Methods 0.000 description 1
- 230000002759 chromosomal effect Effects 0.000 description 1
- 210000000349 chromosome Anatomy 0.000 description 1
- 238000005253 cladding Methods 0.000 description 1
- 229910017052 cobalt Inorganic materials 0.000 description 1
- 239000010941 cobalt Substances 0.000 description 1
- GUTLYIVDDKVIGB-UHFFFAOYSA-N cobalt atom Chemical compound [Co] GUTLYIVDDKVIGB-UHFFFAOYSA-N 0.000 description 1
- KTVIXTQDYHMGHF-UHFFFAOYSA-L cobalt(2+) sulfate Chemical compound [Co+2].[O-]S([O-])(=O)=O KTVIXTQDYHMGHF-UHFFFAOYSA-L 0.000 description 1
- 239000000084 colloidal system Substances 0.000 description 1
- 230000000295 complement effect Effects 0.000 description 1
- 239000002299 complementary DNA Substances 0.000 description 1
- 229920001577 copolymer Polymers 0.000 description 1
- 239000013078 crystal Substances 0.000 description 1
- 229960004643 cupric oxide Drugs 0.000 description 1
- 238000004925 denaturation Methods 0.000 description 1
- 230000036425 denaturation Effects 0.000 description 1
- 238000005137 deposition process Methods 0.000 description 1
- 229910001873 dinitrogen Inorganic materials 0.000 description 1
- 238000009826 distribution Methods 0.000 description 1
- 229940079593 drug Drugs 0.000 description 1
- 239000003814 drug Substances 0.000 description 1
- 229940000406 drug candidate Drugs 0.000 description 1
- 238000007876 drug discovery Methods 0.000 description 1
- 238000001312 dry etching Methods 0.000 description 1
- 239000000428 dust Substances 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000005323 electroforming Methods 0.000 description 1
- 238000005566 electron beam evaporation Methods 0.000 description 1
- 238000000609 electron-beam lithography Methods 0.000 description 1
- 238000007687 exposure technique Methods 0.000 description 1
- 230000005669 field effect Effects 0.000 description 1
- 238000011049 filling Methods 0.000 description 1
- 239000007850 fluorescent dye Substances 0.000 description 1
- 238000012632 fluorescent imaging Methods 0.000 description 1
- 239000012634 fragment Substances 0.000 description 1
- 238000001502 gel electrophoresis Methods 0.000 description 1
- 230000014509 gene expression Effects 0.000 description 1
- 238000012252 genetic analysis Methods 0.000 description 1
- 238000003205 genotyping method Methods 0.000 description 1
- 150000004676 glycans Chemical class 0.000 description 1
- 230000005484 gravity Effects 0.000 description 1
- 238000009499 grossing Methods 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 238000004128 high performance liquid chromatography Methods 0.000 description 1
- 239000001257 hydrogen Substances 0.000 description 1
- 229910052739 hydrogen Inorganic materials 0.000 description 1
- 230000002209 hydrophobic effect Effects 0.000 description 1
- 238000007654 immersion Methods 0.000 description 1
- 238000007901 in situ hybridization Methods 0.000 description 1
- 238000010348 incorporation Methods 0.000 description 1
- 239000012212 insulator Substances 0.000 description 1
- 238000011835 investigation Methods 0.000 description 1
- 229910052741 iridium Inorganic materials 0.000 description 1
- GKOZUEZYRPOHIO-UHFFFAOYSA-N iridium atom Chemical compound [Ir] GKOZUEZYRPOHIO-UHFFFAOYSA-N 0.000 description 1
- 230000000155 isotopic effect Effects 0.000 description 1
- 238000000608 laser ablation Methods 0.000 description 1
- 238000000960 laser cooling Methods 0.000 description 1
- 238000004093 laser heating Methods 0.000 description 1
- 229910001338 liquidmetal Inorganic materials 0.000 description 1
- 239000002122 magnetic nanoparticle Substances 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- 230000007246 mechanism Effects 0.000 description 1
- 108020004999 messenger RNA Proteins 0.000 description 1
- 239000007769 metal material Substances 0.000 description 1
- 238000000813 microcontact printing Methods 0.000 description 1
- 238000004377 microelectronic Methods 0.000 description 1
- 238000000386 microscopy Methods 0.000 description 1
- 239000002808 molecular sieve Substances 0.000 description 1
- 239000002120 nanofilm Substances 0.000 description 1
- 230000009871 nonspecific binding Effects 0.000 description 1
- 239000002674 ointment Substances 0.000 description 1
- 239000013307 optical fiber Substances 0.000 description 1
- 238000000879 optical micrograph Methods 0.000 description 1
- 230000003647 oxidation Effects 0.000 description 1
- 238000007254 oxidation reaction Methods 0.000 description 1
- TWNQGVIAIRXVLR-UHFFFAOYSA-N oxo(oxoalumanyloxy)alumane Chemical compound O=[Al]O[Al]=O TWNQGVIAIRXVLR-UHFFFAOYSA-N 0.000 description 1
- 238000012856 packing Methods 0.000 description 1
- 239000003973 paint Substances 0.000 description 1
- 238000010422 painting Methods 0.000 description 1
- 230000002572 peristaltic effect Effects 0.000 description 1
- 230000000704 physical effect Effects 0.000 description 1
- 238000000053 physical method Methods 0.000 description 1
- 238000000623 plasma-assisted chemical vapour deposition Methods 0.000 description 1
- 239000004033 plastic Substances 0.000 description 1
- 229920003023 plastic Polymers 0.000 description 1
- 238000009428 plumbing Methods 0.000 description 1
- 229920002401 polyacrylamide Polymers 0.000 description 1
- 229920006254 polymer film Polymers 0.000 description 1
- 229920001282 polysaccharide Polymers 0.000 description 1
- 239000005017 polysaccharide Substances 0.000 description 1
- 229910052700 potassium Inorganic materials 0.000 description 1
- 239000011591 potassium Substances 0.000 description 1
- 239000000843 powder Substances 0.000 description 1
- 239000002243 precursor Substances 0.000 description 1
- 230000037452 priming Effects 0.000 description 1
- 108090000765 processed proteins & peptides Proteins 0.000 description 1
- 102000004196 processed proteins & peptides Human genes 0.000 description 1
- 238000012545 processing Methods 0.000 description 1
- 108090000623 proteins and genes Proteins 0.000 description 1
- 238000000746 purification Methods 0.000 description 1
- 238000010791 quenching Methods 0.000 description 1
- 230000000171 quenching effect Effects 0.000 description 1
- 230000010076 replication Effects 0.000 description 1
- 238000011160 research Methods 0.000 description 1
- 108091008146 restriction endonucleases Proteins 0.000 description 1
- 229910052703 rhodium Inorganic materials 0.000 description 1
- 239000010948 rhodium Substances 0.000 description 1
- MHOVAHRLVXNVSD-UHFFFAOYSA-N rhodium atom Chemical compound [Rh] MHOVAHRLVXNVSD-UHFFFAOYSA-N 0.000 description 1
- 238000002390 rotary evaporation Methods 0.000 description 1
- 239000000523 sample Substances 0.000 description 1
- 238000004621 scanning probe microscopy Methods 0.000 description 1
- JPJALAQPGMAKDF-UHFFFAOYSA-N selenium dioxide Chemical compound O=[Se]=O JPJALAQPGMAKDF-UHFFFAOYSA-N 0.000 description 1
- 230000035945 sensitivity Effects 0.000 description 1
- 150000003378 silver Chemical class 0.000 description 1
- 239000002356 single layer Substances 0.000 description 1
- URGAHOPLAPQHLN-UHFFFAOYSA-N sodium aluminosilicate Chemical compound [Na+].[Al+3].[O-][Si]([O-])=O.[O-][Si]([O-])=O URGAHOPLAPQHLN-UHFFFAOYSA-N 0.000 description 1
- 239000007790 solid phase Substances 0.000 description 1
- 238000000638 solvent extraction Methods 0.000 description 1
- 125000006850 spacer group Chemical group 0.000 description 1
- 230000003595 spectral effect Effects 0.000 description 1
- 238000004544 sputter deposition Methods 0.000 description 1
- 238000010561 standard procedure Methods 0.000 description 1
- 239000011550 stock solution Substances 0.000 description 1
- 238000003860 storage Methods 0.000 description 1
- 239000000725 suspension Substances 0.000 description 1
- 238000010189 synthetic method Methods 0.000 description 1
- 238000004885 tandem mass spectrometry Methods 0.000 description 1
- 150000003568 thioethers Chemical class 0.000 description 1
- 239000004408 titanium dioxide Substances 0.000 description 1
- 238000012876 topography Methods 0.000 description 1
- 238000007740 vapor deposition Methods 0.000 description 1
- 238000012800 visualization Methods 0.000 description 1
- 239000011800 void material Substances 0.000 description 1
- 238000001039 wet etching Methods 0.000 description 1
- 238000009736 wetting Methods 0.000 description 1
Classifications
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N33/00—Investigating or analysing materials by specific methods not covered by groups G01N1/00 - G01N31/00
- G01N33/48—Biological material, e.g. blood, urine; Haemocytometers
- G01N33/50—Chemical analysis of biological material, e.g. blood, urine; Testing involving biospecific ligand binding methods; Immunological testing
- G01N33/53—Immunoassay; Biospecific binding assay; Materials therefor
- G01N33/543—Immunoassay; Biospecific binding assay; Materials therefor with an insoluble carrier for immobilising immunochemicals
- G01N33/54313—Immunoassay; Biospecific binding assay; Materials therefor with an insoluble carrier for immobilising immunochemicals the carrier being characterised by its particulate form
- G01N33/54346—Nanoparticles
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J19/00—Chemical, physical or physico-chemical processes in general; Their relevant apparatus
- B01J19/0046—Sequential or parallel reactions, e.g. for the synthesis of polypeptides or polynucleotides; Apparatus and devices for combinatorial chemistry or for making molecular arrays
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANOTECHNOLOGY
- B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
- B82Y25/00—Nanomagnetism, e.g. magnetoimpedance, anisotropic magnetoresistance, giant magnetoresistance or tunneling magnetoresistance
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANOTECHNOLOGY
- B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
- B82Y30/00—Nanotechnology for materials or surface science, e.g. nanocomposites
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D1/00—Electroforming
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D1/00—Electroforming
- C25D1/006—Nanostructures, e.g. using aluminium anodic oxidation templates [AAO]
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J2219/00—Chemical, physical or physico-chemical processes in general; Their relevant apparatus
- B01J2219/00274—Sequential or parallel reactions; Apparatus and devices for combinatorial chemistry or for making arrays; Chemical library technology
- B01J2219/00277—Apparatus
- B01J2219/00497—Features relating to the solid phase supports
- B01J2219/005—Beads
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J2219/00—Chemical, physical or physico-chemical processes in general; Their relevant apparatus
- B01J2219/00274—Sequential or parallel reactions; Apparatus and devices for combinatorial chemistry or for making arrays; Chemical library technology
- B01J2219/00277—Apparatus
- B01J2219/00497—Features relating to the solid phase supports
- B01J2219/00502—Particles of irregular geometry
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J2219/00—Chemical, physical or physico-chemical processes in general; Their relevant apparatus
- B01J2219/00274—Sequential or parallel reactions; Apparatus and devices for combinatorial chemistry or for making arrays; Chemical library technology
- B01J2219/00277—Apparatus
- B01J2219/0054—Means for coding or tagging the apparatus or the reagents
- B01J2219/00547—Bar codes
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J2219/00—Chemical, physical or physico-chemical processes in general; Their relevant apparatus
- B01J2219/00274—Sequential or parallel reactions; Apparatus and devices for combinatorial chemistry or for making arrays; Chemical library technology
- B01J2219/00583—Features relative to the processes being carried out
- B01J2219/00585—Parallel processes
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J2219/00—Chemical, physical or physico-chemical processes in general; Their relevant apparatus
- B01J2219/00274—Sequential or parallel reactions; Apparatus and devices for combinatorial chemistry or for making arrays; Chemical library technology
- B01J2219/00583—Features relative to the processes being carried out
- B01J2219/00596—Solid-phase processes
-
- C—CHEMISTRY; METALLURGY
- C40—COMBINATORIAL TECHNOLOGY
- C40B—COMBINATORIAL CHEMISTRY; LIBRARIES, e.g. CHEMICAL LIBRARIES
- C40B70/00—Tags or labels specially adapted for combinatorial chemistry or libraries, e.g. fluorescent tags or bar codes
Definitions
- the membranes of the present invention may be used as templates for the synthesis of nanoparticles according to methods provided herein.
- the membranes include anodized alumina membranes, polycarbonate trach-etched membranes, and membranes made using photolithographic methods. Throughout this application, said membranes may be interchangeably referred to as "porous membranes," “porous templates” and “templates.”
- Nanoparticles may be formed within the pores by deposition methods including, electrochemical deposition, sequential chemical reaction, and chemical vapor deposition (CVD). Alternatively, the nanoparticles maybe directly manufactured using photolithographic techniques.
- the present invention relates to methods of manufacture of segmented particles and assemblies of differentiable particles (which may or may not be segmented). Without a doubt, there has been a paradigm change in what is traditionally defined as bioanalytical chemistry. A major focus of these new technologies is to generate what could be called “increased per volume information content”. This term encompasses several approaches, from reduction in the volume of sample required to carry out an assay, to highly parallel measurements ("multiplexing"), such as those involving immobilized molecular arrays, to incorporation of second (or third) information channels, such as in 2-D gel electrophoresis or CE-electrospray MS/MS.
- multiplexing such as those involving immobilized molecular arrays
- second (or third) information channels such as in 2-D gel electrophoresis or CE-electrospray MS/MS.
- beads are chemically modified with a ratio of fluorescent dyes intended to uniquely identify the beads, which are then further modified with a unique chemistry (e.g. a different antibody or enzyme).
- a unique chemistry e.g. a different antibody or enzyme.
- the beads are then randomly dispersed on an etched fiber array so that one bead associates with each fiber.
- the identity of the bead is ascertained by its fluorescence readout, and the analyte is detected by fluorescence readout at the same fiber in a different spectral region.
- the particle flavor is determined by fluorescence, and once the biochemistry is put onto the bead, any spectrally distinct fluorescence generated due to the presence of analyte can be read out. Note that as currently configured, it is necessary to use one color of laser to interrogate the particle flavor, and another, separate laser to excite the bioassay fluorophores.
- particle-based bioanalysis would become exceptionally attractive, insofar as a single technology platform could then be considered for the multiple high-information content research areas; including combinatorial chemistry, genomics, and proteomics (via multiplexed immunoassays).
- Rod-shaped nanoparticles have been prepared whose composition is varied along the length of the rod. These particles are referred to as nanoparticles or nanobar codes, though in reality some or all dimensions may be in the micron size range.
- the present invention is directed to methods of manufacture of such nanoparticles.
- the present invention includes methods of manufacture of free-standing particles comprising a plurality of segments, wherein the particle length is from 10 nm to 50 ⁇ m and particle width is from 5 nm to 50 ⁇ m.
- the segments of the particles of the present invention may be comprised of any material. Included among the possible materials are a metal, any metal chalcogenide, a metal oxide, a metal sulfide, a metal selenide, a metal telluride, a metal alloy, a metal nitride, a metal phosphide, a metal antimonide, a semiconductor, a semi-metal, any organic compound or material, any inorganic compound or material, a particulate layer of material or a composite material.
- the particle types are differentiable based on differences in the length, width or shape of the particles and/or the number, composition, length or pattern of said segments.
- the particles are differentiable based on the nature of their functionalization or physical properties (e.g., as measured by mass spectrometry or light scattering).
- the present invention includes the manufacture of nanobar codes by the electrochemical deposition of metals inside a template wherein the process is improved, separately and collectively, by i) electroplating in an ultrasonication bath; and ii) controlling the temperature of the deposition environment, preferably by using a recirculating temperature bath.
- a plurality of templates are held in a common solution chamber and electrochemical deposition is accomplished by controlling deposition at each membrane by applying current selectively to predetermined electrodes associated with each such membrane.
- an apparatus for the manufacture of nanobar codes comprising: a plating solution cell, a defined-pore size template, means for applying a current to cause electrochemical deposition of a metal into said template, means for agitation of the plating solution, such as an ultrasonic transducer, and temperature control means.
- an apparatus for the simultaneous manufacture of a plurality of different types of nanobar codes comprises: a solution chamber, a plurality of templates, means for selectively applying a current to each of said templates, and control means for operating said apparatus.
- methods of making segmented nanoparticles using a porous template manufactured by standard photolithographic techniques comprising exposing a pattern on a resist-coated substrate or multi-layer stack and then etching the exposed pattern to form pores.
- Figure 2 is a cross-sectional elevation view of the apparatus of Figure 1.
- Figure 3 is a schematic illustration of a four-layer stack on a silicon wafer substrate (A) before exposure; (B) following exposure and development of the photoresist, and etching to etch stop; (C) following further etching to conductive layer, (D) after formation of the segmented nanoparticle, and (E) the liberated segmented nanoparticles.
- Figure 4 is an SEM (top view) of a template prepared using photolithographic techniques in which nanoparticles have been formed by electrochemical deposition. The pore diameter is approximately 2.5 to 3 ⁇ m.
- Figure 5 is an SEM (side view) of a free-standing nanoparticle made by electrodeposition in a template prepared using photolithographic techniques.
- Figure 6 is an SEM (cross-sectional view) of a template prepared using photolithographic techniques.
- the particles to be manufactured according to the present invention are alternately referred to as nanoparticles, nanobar codes, rods, nanorods, NanobarcodesTM particles, and rod shaped particles.
- the label applied should be ignored.
- the particle's composition contains informational content, this is not true for all embodiments of the invention.
- nanometer-sized particles fall within the scope of the invention, not all of the particles of the invention fall within such size range.
- the nanobar code particles are manufactured by electrochemical deposition in an alumina or polycarbonate template, followed by template dissolution, and typically, they are prepared by alternating electrochemical reduction of metal ions, though they may easily be prepared by other means, both with or without a template material.
- the nanobar codes have widths between 30 nm and 1,000 nanometers, though they can have widths of several microns.
- the lengths (i.e. the long dimension) of the materials are typically on the order of 1 to 15 microns, they can easily be prepared in lengths as long as 50 microns, and in lengths as short as 20 nanometers.
- the particles of this embodiment of the present invention are defined in part by their size and by the existence of at least 2 segments.
- the length of the particles can be from 10 nm up to 50 ⁇ m. In preferred embodiments the particle is 500 nm - 30 ⁇ m in length. In the most preferred embodiments, the length of the particles of this invention is 1-15 ⁇ m.
- the width, or diameter, of the particles of the invention is within the range of 5 nm - 50 ⁇ m. In preferred embodiments the width is 10 nm - 1 ⁇ m, and in the most preferred embodiments the width or cross-sectional dimension is 30 nm - 500 nm.
- the particles of the present invention are characterized by the presence of at least two segments.
- a segment represents a region of the particle that is distinguishable, by any means, from adjacent regions of the particle. Segments of the particle bisect the length of the particle to form regions that have the same cross-section (generally) and width as the whole particle, while representing a portion of the length of the whole particle.
- a segment is composed of different materials from its adjacent segments. However, not every segment needs to be distinguishable from all other segments of the particle.
- a particle could be composed of 2 types of segments, e.g., gold and platinum, while having 10 or even 20 different segments, simply by alternating segments of gold and platinum.
- a particle of the present invention contains at least two segments, and as many as 50.
- the particles of the invention preferably have from 2-30 segments and most preferably from 3-20 segments.
- the particles may have from 2-10 different types of segments, preferably 2 to 5 different types of segments.
- a segment of the particle of the present invention is defined by its being distinguishable from adjacent segments of the particle.
- the ability to distinguish between segments includes distinguishing by any physical or chemical means of interrogation, including but not limited to electromagnetic, magnetic, optical, spectrometric, spectroscopic and mechanical.
- the method of interrogating between segments is optical (reflectivity).
- the particles of the present invention can have any cross-sectional shape.
- the particles are generally straight along the lengthwise axis.
- the particles may be curved or helical.
- the ends of the particles of the present invention may be flat, convex or concave.
- the ends may be spiked or pencil tipped. Sharp-tipped embodiments of the invention may be preferred when the particles are used in Raman spectroscopy applications or others in which energy field effects are important.
- the ends of any given particle may be the same or different.
- the contour of the particle may be advantageously selected to contribute to the sensitivity or specificity of the assays (e.g., an undulating contour will be expected to enhance "quenching" of fluorophores located in the troughs).
- pore matrices may be constructed using photolithography techniques, which will give ultimate control over the pore dimensions and lengths, and increase the design flexibility and quality of the resulting nanorods.
- a positive photoresist-coated substrate is exposed to an interference pattern of light, using a technique similar to that used for interference-lithography generated diffraction gratings.
- the template thickness which may be the same as pore length, can be tailored to the length of the rods, which may improve uniformity of electroplating across the membrane.
- 10 10 to 10 12 nanorods can be constructed on a single substrate.
- the two approaches described above can be utilized to synthesize many types of nanobar code from a single wafer, (iv)
- a further approach uses the customized lithographically-defined pores from above, and achieves the ultimate in design flexibility by using novel light-directed electroplating.
- the template pores are constructed just as in the third approach, but on top of a photosensitive semiconductor wafer. The pore- side of the wafer is immersed in an electroplating reagent, and the other side is illuminated with patterns of light.
- the particles of the present invention may also be prepared in large scale by automating the basic electroplating process that is described in Example 1.
- an apparatus containing a series of membranes and separate electrodes can be used to make a large number of different flavors of nanoparticles in an efficient computer controlled manner.
- An example of this type of apparatus is depicted in Figures 1 and 2.
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Health & Medical Sciences (AREA)
- Nanotechnology (AREA)
- Life Sciences & Earth Sciences (AREA)
- Organic Chemistry (AREA)
- Immunology (AREA)
- Crystallography & Structural Chemistry (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Hematology (AREA)
- General Physics & Mathematics (AREA)
- Urology & Nephrology (AREA)
- Physics & Mathematics (AREA)
- Electrochemistry (AREA)
- Biomedical Technology (AREA)
- Molecular Biology (AREA)
- Cell Biology (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Microbiology (AREA)
- Biotechnology (AREA)
- Composite Materials (AREA)
- Food Science & Technology (AREA)
- Medicinal Chemistry (AREA)
- Analytical Chemistry (AREA)
- Biochemistry (AREA)
- General Health & Medical Sciences (AREA)
- Pathology (AREA)
- Micromachines (AREA)
Abstract
Applications Claiming Priority (7)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US23732200P | 2000-10-02 | 2000-10-02 | |
| US677203 | 2000-10-02 | ||
| US237322P | 2000-10-02 | ||
| US09/677,203 US7045049B1 (en) | 1999-10-01 | 2000-10-02 | Method of manufacture of colloidal rod particles as nanobar codes |
| US28501701P | 2001-04-19 | 2001-04-19 | |
| US285017P | 2001-04-19 | ||
| PCT/US2001/030729 WO2002029136A1 (fr) | 2000-10-02 | 2001-10-02 | Procede de fabrication de particules colloidales de type tige sous forme de nano codes-barres |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| EP1337694A1 EP1337694A1 (fr) | 2003-08-27 |
| EP1337694A4 true EP1337694A4 (fr) | 2004-09-15 |
Family
ID=27398967
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| EP01977334A Withdrawn EP1337694A4 (fr) | 2000-10-02 | 2001-10-02 | Procede de fabrication de particules colloidales de type tige sous forme de nano codes-barres |
Country Status (3)
| Country | Link |
|---|---|
| EP (1) | EP1337694A4 (fr) |
| AU (1) | AU2001296460A1 (fr) |
| WO (1) | WO2002029136A1 (fr) |
Families Citing this family (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US8497131B2 (en) | 1999-10-06 | 2013-07-30 | Becton, Dickinson And Company | Surface enhanced spectroscopy-active composite nanoparticles comprising Raman-active reporter molecules |
| US7192778B2 (en) | 1999-10-06 | 2007-03-20 | Natan Michael J | Surface enhanced spectroscopy-active composite nanoparticles |
| US6861263B2 (en) | 2001-01-26 | 2005-03-01 | Surromed, Inc. | Surface-enhanced spectroscopy-active sandwich nanoparticles |
| CN102648438A (zh) | 2009-08-26 | 2012-08-22 | 分子制模股份有限公司 | 功能性纳米微粒 |
| EP2312393A1 (fr) * | 2009-10-14 | 2011-04-20 | Biocartis SA | Procédé pour la production de microparticules |
| EP2529274B1 (fr) * | 2010-01-29 | 2014-10-08 | Canon Nanotechnologies, Inc. | Procédés de lithographie par nano-impression pour former des nanoparticules |
| WO2012061753A2 (fr) * | 2010-11-05 | 2012-05-10 | Molecular Imprints, Inc. | Formation de nanoparticules par lithographie nanométrique à l'aide de doubles couches anti-adhésives |
Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP0602829A2 (fr) * | 1992-12-14 | 1994-06-22 | AT&T Corp. | Fabrication de réseaux en lithographie par faisceau d'électrons |
| WO1999064580A1 (fr) * | 1998-06-10 | 1999-12-16 | Georgia Tech Research Corporation | Dispositifs a microaiguilles et procedes de fabrication et d'utilisation correspondants |
| WO2001025002A1 (fr) * | 1999-10-01 | 2001-04-12 | Surromed,Inc. | Particules de tige colloidales servant de codes nanobar |
| WO2001025510A1 (fr) * | 1999-10-01 | 2001-04-12 | Surromed, Inc. | Procede de fabrication de particules cylindriques colloidales en tant que nano code-barres |
Family Cites Families (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5667667A (en) * | 1992-04-24 | 1997-09-16 | Isis Innovation Limited | Electrochemical treatment of surfaces |
| US5985356A (en) * | 1994-10-18 | 1999-11-16 | The Regents Of The University Of California | Combinatorial synthesis of novel materials |
| EP0865078A1 (fr) * | 1997-03-13 | 1998-09-16 | Hitachi Europe Limited | Méthode de dépÔt de particules nanométriques |
| US6093302A (en) * | 1998-01-05 | 2000-07-25 | Combimatrix Corporation | Electrochemical solid phase synthesis |
| US6503231B1 (en) * | 1998-06-10 | 2003-01-07 | Georgia Tech Research Corporation | Microneedle device for transport of molecules across tissue |
-
2001
- 2001-10-02 WO PCT/US2001/030729 patent/WO2002029136A1/fr not_active Ceased
- 2001-10-02 EP EP01977334A patent/EP1337694A4/fr not_active Withdrawn
- 2001-10-02 AU AU2001296460A patent/AU2001296460A1/en not_active Abandoned
Patent Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP0602829A2 (fr) * | 1992-12-14 | 1994-06-22 | AT&T Corp. | Fabrication de réseaux en lithographie par faisceau d'électrons |
| WO1999064580A1 (fr) * | 1998-06-10 | 1999-12-16 | Georgia Tech Research Corporation | Dispositifs a microaiguilles et procedes de fabrication et d'utilisation correspondants |
| WO2001025002A1 (fr) * | 1999-10-01 | 2001-04-12 | Surromed,Inc. | Particules de tige colloidales servant de codes nanobar |
| WO2001025510A1 (fr) * | 1999-10-01 | 2001-04-12 | Surromed, Inc. | Procede de fabrication de particules cylindriques colloidales en tant que nano code-barres |
Non-Patent Citations (4)
| Title |
|---|
| DECKER J Y ET AL: "GENERATION OF SUBQUARTER-MICRON RESIST STRUCTURE USING OPTICAL INTERFERENCE LITHOGRAPHY AND IMAGE REVERSAL", JOURNAL OF VACUUM SCIENCE AND TECHNOLOGY: PART B, AMERICAN INSTITUTE OF PHYSICS. NEW YORK, US, vol. 15, no. 6, November 1997 (1997-11-01), pages 1949 - 1953, XP001161902, ISSN: 1071-1023 * |
| MARTIN B R ET AL: "Orthogonal self-assembly on colloidal gold-platinum nanorods", ADVANCED MATERIALS, VCH VERLAGSGESELLSCHAFT, WEINHEIM, DE, vol. 11, no. 12, 2 August 1999 (1999-08-02), pages 1021 - 1025, XP002284065, ISSN: 0935-9648 * |
| NAKAJIMA A ET AL: "ISOLATED NANOMETER-SIZE SI DOT ARRAYS FABRICATED USING ELECTRON-BEAM LITHOGRAPHY, REACTIVE ION ETCHING AND WET ETCHING IN NH4OH/H2O2/H2O", JAPANESE JOURNAL OF APPLIED PHYSICS, PUBLICATION OFFICE JAPANESE JOURNAL OF APPLIED PHYSICS. TOKYO, JP, vol. 33, no. 12B, PART 2, 15 December 1994 (1994-12-15), pages L1796 - L1798, XP000624352, ISSN: 0021-4922 * |
| See also references of WO0229136A1 * |
Also Published As
| Publication number | Publication date |
|---|---|
| WO2002029136A1 (fr) | 2002-04-11 |
| EP1337694A1 (fr) | 2003-08-27 |
| AU2001296460A1 (en) | 2002-04-15 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| US6919009B2 (en) | Method of manufacture of colloidal rod particles as nanobarcodes | |
| US20040178076A1 (en) | Method of manufacture of colloidal rod particles as nanobarcodes | |
| US7045049B1 (en) | Method of manufacture of colloidal rod particles as nanobar codes | |
| Barad et al. | Large area patterning of nanoparticles and nanostructures: current status and future prospects | |
| Santos et al. | Low-cost fabrication technologies for nanostructures: state-of-the-art and potential | |
| US7225082B1 (en) | Colloidal rod particles as nanobar codes | |
| CA2387992A1 (fr) | Procede de fabrication de particules cylindriques colloidales en tant que nano code-barres | |
| Mbindyo et al. | DNA‐directed assembly of gold nanowires on complementary surfaces | |
| Jones et al. | Templated techniques for the synthesis and assembly of plasmonic nanostructures | |
| Love et al. | Self-assembled monolayers of thiolates on metals as a form of nanotechnology | |
| US20040209376A1 (en) | Assemblies of differentiable segmented particles | |
| CA2248576C (fr) | Procede de formation d'articles et de surfaces a motifs par micromoulage capillaire | |
| US20100021985A1 (en) | Mechanical process for creating particles in fluid | |
| US20050032226A1 (en) | Encoded nanoparticles in paper manufacture | |
| EP1760527A1 (fr) | Méthode photochimique pour fabriquer des substrats surface-décorés à l'échelle nanométrique | |
| KR20160101961A (ko) | 광 방출의 검출을 개선시키기 위한 구조화 기판 및 이와 관련한 방법 | |
| EP1772186A1 (fr) | Procede de fabrication de nanoparticule ou de nanostructure en utilisant un matériau nanoporeux | |
| EP1337694A1 (fr) | Procede de fabrication de particules colloidales de type tige sous forme de nano codes-barres | |
| EP2134665A1 (fr) | Procédé mécanique pour créer des particules dans un liquide | |
| US7887691B2 (en) | Arrays of electrodes coated with molecules and their production | |
| EP1244938B1 (fr) | Procede pour produire des substrats de l'ordre du nanometre, a surfaces decorees | |
| US20070110639A1 (en) | System and method for positioning and synthesizing of nanostructures | |
| Österlund et al. | Lithographic techniques in nanocatalysis | |
| Greco | Microfluidic device and interfacial transport: application to biomolecules and nanostructures | |
| Gupta | Fabrication of Nano-scale DNA Arrays Using Diblock Copolymers |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| PUAI | Public reference made under article 153(3) epc to a published international application that has entered the european phase |
Free format text: ORIGINAL CODE: 0009012 |
|
| 17P | Request for examination filed |
Effective date: 20030415 |
|
| AK | Designated contracting states |
Designated state(s): AT BE CH CY DE DK ES FI FR GB GR IE IT LI LU MC NL PT SE TR |
|
| AX | Request for extension of the european patent |
Extension state: AL LT LV MK RO SI |
|
| RAP1 | Party data changed (applicant data changed or rights of an application transferred) |
Owner name: SURROMED, INC. |
|
| A4 | Supplementary search report drawn up and despatched |
Effective date: 20040804 |
|
| RIC1 | Information provided on ipc code assigned before grant |
Ipc: 7B 01J 19/00 B Ipc: 7C 30B 30/02 B Ipc: 7C 25D 5/10 B Ipc: 7C 25D 5/02 A |
|
| 17Q | First examination report despatched |
Effective date: 20050330 |
|
| STAA | Information on the status of an ep patent application or granted ep patent |
Free format text: STATUS: THE APPLICATION IS DEEMED TO BE WITHDRAWN |
|
| 18D | Application deemed to be withdrawn |
Effective date: 20050810 |