EP1228668B1 - A radiant heating system with a high infrared radiant heating capacity, for treatment chambers - Google Patents
A radiant heating system with a high infrared radiant heating capacity, for treatment chambers Download PDFInfo
- Publication number
- EP1228668B1 EP1228668B1 EP00987096A EP00987096A EP1228668B1 EP 1228668 B1 EP1228668 B1 EP 1228668B1 EP 00987096 A EP00987096 A EP 00987096A EP 00987096 A EP00987096 A EP 00987096A EP 1228668 B1 EP1228668 B1 EP 1228668B1
- Authority
- EP
- European Patent Office
- Prior art keywords
- infrared radiation
- radiant heating
- tube
- quartz glass
- processing chamber
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Revoked
Links
- 238000010438 heat treatment Methods 0.000 title claims abstract description 12
- 230000005855 radiation Effects 0.000 claims abstract description 43
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims description 18
- 238000001816 cooling Methods 0.000 claims description 6
- 239000010453 quartz Substances 0.000 description 5
- 244000089486 Phragmites australis subsp australis Species 0.000 description 3
- 239000003570 air Substances 0.000 description 3
- 230000002411 adverse Effects 0.000 description 2
- 239000000463 material Substances 0.000 description 2
- 238000000034 method Methods 0.000 description 2
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 1
- 239000012080 ambient air Substances 0.000 description 1
- 238000003491 array Methods 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- 239000012141 concentrate Substances 0.000 description 1
- 238000011109 contamination Methods 0.000 description 1
- 239000002826 coolant Substances 0.000 description 1
- 229910052802 copper Inorganic materials 0.000 description 1
- 239000010949 copper Substances 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 239000010931 gold Substances 0.000 description 1
- 229910052737 gold Inorganic materials 0.000 description 1
- 229910052736 halogen Inorganic materials 0.000 description 1
- 230000001678 irradiating effect Effects 0.000 description 1
- 230000007774 longterm Effects 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 229910052594 sapphire Inorganic materials 0.000 description 1
- 239000010980 sapphire Substances 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
Images
Classifications
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05B—ELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
- H05B3/00—Ohmic-resistance heating
- H05B3/40—Heating elements having the shape of rods or tubes
- H05B3/42—Heating elements having the shape of rods or tubes non-flexible
- H05B3/44—Heating elements having the shape of rods or tubes non-flexible heating conductor arranged within rods or tubes of insulating material
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05B—ELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
- H05B3/00—Ohmic-resistance heating
- H05B3/0033—Heating devices using lamps
- H05B3/0038—Heating devices using lamps for industrial applications
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05B—ELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
- H05B2203/00—Aspects relating to Ohmic resistive heating covered by group H05B3/00
- H05B2203/032—Heaters specially adapted for heating by radiation heating
Definitions
- the invention relates to a radiant heater with a high Infrared radiation power for processing chambers.
- Such radiant heaters for example, within of processing chambers, e.g. Vacuum chambers, used to in a given working range a required working temperature to create.
- processing chambers e.g. Vacuum chambers
- Such temperatures can in Spotlight range can reach 3,000 ° C, with large area Work areas also a spotlight array for use can come to a uniform over a larger area To reach working temperature.
- US-A-5 551 670 describes a high-intensity infrared heater in which the life of the infrared emitters is thereby to be increased.
- each infrared emitter is arranged in a transparent quartz tube, through which cooling air can be passed.
- copper tubes are provided which extend through the electrical connection contacts of the infrared emitters.
- EP-A-0 848 575 shows a heater with an array of tungsten-halogen lamps, each arranged in a concentric arrangement of quartz, silicon or sapphire tubes.
- one of the tubes is provided with a reflector in the form of a gold coating which partially surrounds the tube.
- US-A-5,196,674 discloses an oven with protection for a heating element disposed in a quartz tube.
- the protection against contact provided here consists of a multiply slotted U-shaped housing made of sheet metal, which surrounds the quartz tube at a distance. The invention is therefore based on the object to realize a vacuum-suitable radiant heating, in which the disadvantages of the prior art are avoided.
- the object underlying the invention is achieved by the use of a radiant heater with a high infrared radiation power, wherein the infrared radiation unit consists of an infrared radiation source, which is disposed within an infrared radiation-transmissive quartz glass tube, wherein the infrared radiation source in the Quartz glass tube is connected to a cooling device which generates an air flow within the quartz glass tube, wherein the infrared radiation source is associated with a radiation reflector and wherein the infrared radiation source is connectable to a source of energy dissolved in a vacuum chamber in which the Quartz glass tube extends into the vacuum processing chamber and penetrates the wall at least one end and wherein the interior of the quartz glass tubes to the atmosphere within the vacuum processing chamber is isolated by the passage of the quartz glass tubes sealed by the wall gas-tight are.
- each infrared radiation source is separately connectable to a power source to a simple adjustment of the radiation power to the respective requirements, eg by switching on the respectively required number of infrared radiation sources.
- the invention makes it possible that the infrared radiation source with any operating voltages, so even at high operating voltages can be operated without the risk of electrical flashovers in the processing chamber would exist.
- the invention makes it possible to achieve particularly high operating temperatures or radiation powers, since the atmosphere inside the tube is completely independent of the atmosphere in the processing chamber.
- the array is arranged within the processing chamber, wherein each tube of the array is guided at least one end through the wall of the processing chamber.
- the end of each tube of the array extending into the processing chamber must be closed.
- these tubes can be connected to a cooling circuit, so that the cooling medium can flow through the tubes.
- the radiant heater according to the invention consists of FIG. 1 an infrared-radiation-permeable tube 1, which extends through a processing chamber 3 extends and its wall 6 at both ends penetrates in a wall opening 4. Within the Pipe 1 is arranged an infrared radiation source 2, the to the atmosphere within the processing chamber 3 is isolated.
- This tube 1 consists of a high temperature resistant Material, preferably of quartz glass.
- a cooling circuit not shown.
- the pipe 1 with a means for generating an air flow within the tube 1 are connected. In this way, long-term high radiation power can be used be driven, without affecting the life the infrared radiation source 2 would be adversely affected.
- the infrared radiation source 1 assign a radiation reflector to a maximum Radiation power towards a work area within reach the processing chamber 3.
- the radiation reflector should work together with the infrared radiation source 2 are arranged in the tube 1 to unwanted thermal effects, or even contamination to avoid the atmosphere in the processing chamber 3, the caused by the material of the radiation reflector could.
- each tube 1 with infrared radiation sources 2 may be separate switchably connected to an energy source. The allows e.g. a simple adjustment of the radiant power to the respective requirements. This will over the entire Emitter area of the array uniform irradiation of the reached irradiating objects.
- a variant is shown, in which the infrared radiation-transmissive Tube 1 only passed through a wall 6 is, wherein the free end of the tube 1 in the processing chamber 3 is closed.
- This variant is less Effort can be realized and offers the same advantages as the Variant in which both ends of the tube 1 through the wall 6 of the processing chamber are guided. Also can be easily realize an array of infrared radiation sources 2, in which all tubes 1 only through a wall 6 of the processing chamber 3 are guided.
Landscapes
- Resistance Heating (AREA)
- Yarns And Mechanical Finishing Of Yarns Or Ropes (AREA)
- Perforating, Stamping-Out Or Severing By Means Other Than Cutting (AREA)
- Physical Or Chemical Processes And Apparatus (AREA)
- Furnace Details (AREA)
- Muffle Furnaces And Rotary Kilns (AREA)
Abstract
Description
Die Erfindung betrifft eine Strahlungsheizung mit einer hohen Infrarot-Strahlungsleistung für Bearbeitungskammern.The invention relates to a radiant heater with a high Infrared radiation power for processing chambers.
Derartige Strahlungsheizungen werden beispielsweise innerhalb von Bearbeitungskammern, z.B. Vakuumkammern, eingesetzt, um in einem vorgegebenen Arbeitsbereich eine erforderliche Arbeitstemperatur zu erzeugen. Derartige Temperaturen können im Strahlerbereich durchaus 3.000 °C erreichen, wobei bei großflächigen Arbeitsbereichen auch ein Strahlerarray zur Anwendung kommen kann, um über einen größeren Bereich eine gleichmäßige Arbeitstemperatur zu erreichen.Such radiant heaters, for example, within of processing chambers, e.g. Vacuum chambers, used to in a given working range a required working temperature to create. Such temperatures can in Spotlight range can reach 3,000 ° C, with large area Work areas also a spotlight array for use can come to a uniform over a larger area To reach working temperature.
Bei derartigen Strahlungsheizungen haben sich jedoch einige Nachteile herausgestellt, die deren Anwendung erheblich behindern. Dies ist einerseits das Problem, daß insbesondere bei Anwendungen im Vakuum bei hohen Betriebsspannungen elektrische Überschläge auftreten können. Diese Gefahr besteht insbesondere während des Evakuierungsvorganges. Andererseits können besonders hohe Arbeitstemperaturen bzw. Strahlungsleistungen mangels ausreichender Kühlung der Infrarotstrahler im Vakuum nicht realisiert werden können.In such radiant heaters, however, have some Disadvantages highlighted that significantly hinder their application. On the one hand, this is the problem, in particular in the case of Vacuum applications at high operating voltages electrical Flashovers may occur. This danger exists in particular during the evacuation process. On the other hand especially high working temperatures or radiant powers in the absence of adequate cooling of the infrared radiators in a vacuum can not be realized.
zur vermeidung von Überschlägen kann zwar die Spannung reduziert
werden, jedoch läßt sich dann die geforderte Strahlungsleistung
nicht erreichen. Außerdem besteht grundsätzlich die
Möglichkeit, daß die Heizung während der Evakuierung der Vakuumkammer
abgeschaltet wird. Dies führt aber zwangsläufig zu
einer unerwünschten Erhöhung bzw. Verlängerung der Prozesszeit.
In der US-A-5 551 670 wird eine hochintensive Infrarot-Heizvorrichtung
beschrieben, bei der die Lebensdauer der
Infrarot-Strahler dadurch erhöht werden soll. Um dies zu erreichen,
ist jeder Infrarot-Strahler in einem transparenten
Quarz-Rohr angeordnet, durch das Kühlluft geleitet werden
kann. Zu diesem Zweck sind Kupferröhrchen vorgesehen, die
sich durch die elektrischen Anschlusskontakte der Infrarot-Strahler
erstrecken. Um den Wirkungsgrad der Infrarot-Strahler
nicht negativ zu beeinflussen, wird die Umgebungsluft
erst bei Temperaturen über 1.500 °F (793 °C) in die
Quarz-Rohre eingeleitet.
Weiterhin zeigt die EP-A-0 848 575 eine Heizvorrichtung mit
einem Array von Wolfram-Halogen-Strahlern, die jeweils in
einer konzentrischen Anordnung von Quarz-, Silizium- oder
Saphir-Rohren angeordnet sind. Um die erzeugte Strahlung zu
konzentrieren und in eine Vorzugsrichtung auszurichten, sind
ist eines der Rohre mit einem Reflektor in Form von einer
Goldbeschichtung versehen, die das Rohr teilweise umgibt.
Schließlich wird in der US-A-5 196 674 ein Ofen mit einem
Schutz für ein Heizelement beschrieben, das in einem Quarz-Rohr
angeordnet ist. Der hier vorgesehene Schutz gegen Berührung
besteht aus einem mehrfach geschlitzten u-förmigen
Gehäuse aus Blech, welches das Quarz-Rohr in einem Abstand
umgibt.
Der Erfindung liegt daher die Aufgabe zugrunde, eine vakuumtaugliche
Strahlungsheizung zu realisieren, bei der die aufgezeigten
Nachteile des Standes der Technik vermieden werden.Although the voltage can be reduced to avoid flashovers, it is then not possible to achieve the required radiant power. In addition, there is basically the possibility that the heater is switched off during the evacuation of the vacuum chamber. However, this inevitably leads to an undesirable increase or prolongation of the process time.
US-A-5 551 670 describes a high-intensity infrared heater in which the life of the infrared emitters is thereby to be increased. To achieve this, each infrared emitter is arranged in a transparent quartz tube, through which cooling air can be passed. For this purpose, copper tubes are provided which extend through the electrical connection contacts of the infrared emitters. In order not to adversely affect the efficiency of the infrared radiator, the ambient air is introduced into the quartz tubes only at temperatures above 1500 ° F (793 ° C).
Furthermore, EP-A-0 848 575 shows a heater with an array of tungsten-halogen lamps, each arranged in a concentric arrangement of quartz, silicon or sapphire tubes. In order to concentrate and direct the generated radiation in a preferred direction, one of the tubes is provided with a reflector in the form of a gold coating which partially surrounds the tube. Finally, US-A-5,196,674 discloses an oven with protection for a heating element disposed in a quartz tube. The protection against contact provided here consists of a multiply slotted U-shaped housing made of sheet metal, which surrounds the quartz tube at a distance.
The invention is therefore based on the object to realize a vacuum-suitable radiant heating, in which the disadvantages of the prior art are avoided.
Die der Erfindung zugrundeliegende Aufgabe wird durch die
Verwendung einer Strahlungsheizung mit einer hohen Infrarot-Strahlungsleistung,
bei der die Infrarot-Strahlungseinheit
aus einer Infrarot-Strahlungsquelle besteht, die innerhalb
eines infrarot-strahlungsdurchlässigen Quarzglas-Rohres
angeordnet ist, wobei die Infrarot-Strahlungsquelle
in dem Quarzglas-Rohr mit einer Kühleinrichtung verbunden
ist, die innerhalb des Quarzglas-Rohres einen Luftstrom erzeugt,
wobei der Infrarot-Strahlungsquelle ein Strahlungsreflektor
zugeordnet ist und wobei die Infrarot-Strahlungsquelle
mit einer Energiequelle verbindbar ist in einer Vakuum-Kammer
gelöst, bei der sich das Quarzglas-Rohr in die Vakuum-Bearbeitungs-kammer
erstreckt und deren Wand zumindest
mit einem Ende durchdringt und wobei der Innenraum der
Quarzglas-Rohre gegenüber der Atmosphäre innerhalb der Vakuum-Bearbeitungskammer
isoliert ist, indem die Durchgänge der
Quarzglas-Rohre durch die Wand gasdicht abgedichtet sind.
Um eine großflächige und gleichmäßige Bestrahlung zu
realisieren, ist die Verwendung einer Strahlungsheizung mit
einem Array von Infrarot-Strahlungseinheiten mit Infrarot-Strahlungsquellen
vorgesehen, wobei jede Infrarot-Strahlungsquelle
separat mit einer Energiequelle verbindbar
ist, um eine einfache Anpassung der Strahlungsleistung an
die jeweiligen Erfordernisse, z.B. durch Einschalten der jeweils
benötigten Anzahl von Infrarot-Strahlungsquellen zu
ermöglichen.
Durch die Erfindung wird ermöglicht, dass die Infrarot-Strahlungsquelle
mit beliebigen Betriebsspannungen, also
auch bei hohen Betriebsspannungen betrieben werden kann, ohne
dass die Gefahr von elektrischen Überschlägen in der Bearbeitungskammer
bestehen würde. Darüber hinaus ermöglicht
die Erfindung das Erreichen besonders hoher Arbeitstemperaturen
bzw. Strahlungsleistungen, da die Atmosphäre innerhalb
des Rohres völlig unabhängig von der Atmosphäre in der Bearbeitungskammer
ist.
Um dies realisieren zu können, ist das Array innerhalb der Bearbeitungskammer
angeordnet, wobei jedes Rohr des Arrays
wenigstens mit einem Ende durch die Wandung der Bearbeitungskammer
geführt ist. In diesem Fall muss dann natürlich das sich
in die Bearbeitungskammer erstreckende Ende jedes Rohres des
Arrays verschlossen sein. Im Falle dass sich die Rohre des
Arrays durch beidends durch die Wandung der Bearbeitungskammer
erstrecken, können diese Rohre mit einem Kühlkreislauf verbunden
werden, so dass das Kühlmedium durch die Rohre strömen
kann. The object underlying the invention is achieved by the use of a radiant heater with a high infrared radiation power, wherein the infrared radiation unit consists of an infrared radiation source, which is disposed within an infrared radiation-transmissive quartz glass tube, wherein the infrared radiation source in the Quartz glass tube is connected to a cooling device which generates an air flow within the quartz glass tube, wherein the infrared radiation source is associated with a radiation reflector and wherein the infrared radiation source is connectable to a source of energy dissolved in a vacuum chamber in which the Quartz glass tube extends into the vacuum processing chamber and penetrates the wall at least one end and wherein the interior of the quartz glass tubes to the atmosphere within the vacuum processing chamber is isolated by the passage of the quartz glass tubes sealed by the wall gas-tight are. In order to realize a large-scale and uniform irradiation, the use of a radiant heater with an array of infrared radiation units is provided with infrared radiation sources, each infrared radiation source is separately connectable to a power source to a simple adjustment of the radiation power to the respective requirements, eg by switching on the respectively required number of infrared radiation sources.
The invention makes it possible that the infrared radiation source with any operating voltages, so even at high operating voltages can be operated without the risk of electrical flashovers in the processing chamber would exist. Moreover, the invention makes it possible to achieve particularly high operating temperatures or radiation powers, since the atmosphere inside the tube is completely independent of the atmosphere in the processing chamber.
In order to be able to realize this, the array is arranged within the processing chamber, wherein each tube of the array is guided at least one end through the wall of the processing chamber. In that case, of course, the end of each tube of the array extending into the processing chamber must be closed. In the event that the tubes of the array extend through both sides of the wall of the processing chamber, these tubes can be connected to a cooling circuit, so that the cooling medium can flow through the tubes.
Die Erfindung soll nachfolgend an einem Ausführungsbeispiel näher erläutert werden. Aus den zugehörigen Zeichnungsfiguren sind unterschiedliche Ausführungen der erfindungsgemäßen Strahlungsheizung ersichtlich. Dabei zeigen:
- Fig. 1
- eine erfindungsgemäße Strahlungsheizung, bei der sich das infrarot-strahlungsdurchlässige Rohr durch beide gegenüberliegenden Wandungen der Bearbeitungskammer erstreckt; und
- Fig. 2
- eine Variante, bei der das infrarot-strahlungsdurchlässige Rohr nur durch eine Wandung geführt ist und das freie Ende des Rohres in der Bearbeitungskammer verschlossen ist.
- Fig. 1
- a radiant heater according to the invention, in which the infrared radiation-permeable pipe extends through both opposite walls of the processing chamber; and
- Fig. 2
- a variant in which the infrared-radiation-permeable tube is guided only by a wall and the free end of the tube is closed in the processing chamber.
Die erfindungsgemäße Strahlungsheizung besteht nach Fig. 1 aus
einem infrarot-strahlungsdurchlässigen Rohr 1, das sich durch
eine Bearbeitungskammer 3 erstreckt und deren Wandung 6 beidends
in einem Wanddurchbruch 4 durchdringt. Innerhalb des
Rohres 1 ist eine Infrarot-Strahlungsquelle 2 angeordnet, die
gegenüber der Atmosphäre innerhalb der Bearbeitungskammer 3
isoliert ist. Dieses Rohr 1 besteht aus einem hoch temperaturbelastbaren
Material, vorzugsweise aus Quarzglas.The radiant heater according to the invention consists of FIG. 1
an infrared-radiation-
Um jegliche Störung der Atmosphäre innerhalb der Bearbeitungskammer
3 auszuschließen, sind die Durchgänge des Rohres 1
durch die Wandung 6 gasdicht abgedichtet. Hierzu ist ein Verschluß
5 mit einer innenliegenden Dichtung 7 vorgesehen.To any disturbance of the atmosphere within the
Weiterhin ist die Infrarot-Strahlungsquelle 2 in dem Rohr 1
mit einem nicht dargestellten Kühlkreislauf verbunden. Beispielsweise
kann das Rohr 1 mit einer Einrichtung zur Erzeugung
eines Luftstromes innerhalb des Rohres 1 verbunden werden.
Auf diese Weise können auch langzeitig hohe Strahlungsleistungen
gefahren werden, ohne daß dadurch die Lebensdauer
der Infrarot-Strahlungsquelle 2 negativ beeinflußt würde.Furthermore, the
Auch ist es problemlos möglich, der Infrarot-Strahlungsquelle
1 einen Strahlungsreflektor zuzuordnen, um eine maximale
Strahlungsleistung in Richtung auf einen Arbeitsbereich innerhalb
der Bearbeitungskammer 3 zu erreichen.It is also easily possible, the
Der Strahlungsreflektor sollte gemeinsam mit der Infrarot-Strahlungsquelle
2 in dem Rohr 1 angeordnet werden, um unerwünschte
thermische Effekte, oder auch eine Kontamination
des Atmosphäre in der Bearbeitungskammer 3 zu vermeiden, die
durch das Material des Strahlungsreflektors verursacht werden
könnte.The radiation reflector should work together with the
Es ist auch möglich, mehrere Rohre 1 mit Infrarot-Strahlungsquellen
2 zu einem Array anzuordnen, indem das Array innerhalb
der Bearbeitungskammer 3 angeordnet wird, wobei jedes Rohr des
Arrays beidends durch die Wandung 6 der Bearbeitungskammer 3
geführt ist. Jede der Infrarot-Strahlungsquellen 2 kann separat
schaltbar mit einer Energiequelle verbunden sein. Das
ermöglicht z.B. eine einfache Anpassung der Strahlungsleistung
an die jeweiligen Erfordernisse. Damit wird über die gesamte
Strahlerfläche des Arrays eine gleichmäßige Bestrahlung der zu
bestrahlenden Objekte erreicht.It is also possible to use
In Fig. 2 ist eine Variante dargestellt, bei der das infrarot-strahlungsdurchlässige
Rohr 1 nur durch eine Wandung 6 geführt
ist, wobei das freie Ende des Rohres 1 in der Bearbeitungskammer
3 verschlossen ist. Diese Variante ist mit weniger
Aufwand realisierbar und bietet die gleichen Vorteile, wie die
Variante, bei der beide Enden des Rohres 1 durch die Wandung
6 der Bearbeitungskammer geführt sind. Auch läßt sich problemlos
ein Array der Infrarot-Strahlungsquellen 2 realisieren,
bei dem sämtliche Rohre 1 nur durch eine Wandung 6 der Bearbeitungskammer
3 geführt sind. In Fig. 2, a variant is shown, in which the infrared radiation-
- 11
- Rohrpipe
- 22
- Infrarot-StrahlungsquelleInfrared radiation source
- 33
- Bearbeitungskammerprocessing chamber
- 44
- WanddurchbruchWall opening
- 55
- Verschlußshutter
- 66
- Wandwall
- 77
- Dichtungpoetry
Claims (3)
- Use of a radiant heating system with a high infrared radiation capacity in which the infrared radiation unit comprises an infrared radiation source (2) arranged inside an infrared radioparent quartz glass tube (1), whereby the infrared radiation source is connected in the quartz glass tube (1) with a cooling device which generates an air current inside the quartz glass tube (1), whereby a radiation reflector is assigned to the infrared radiation source (2) and whereby the infrared radiation source (2) can be connected with an energy source in a vacuum chamber where the quartz glass tube (1) extends into the vacuum processing chamber (3) and at least one end of which penetrates its wall (6) and whereby the interior of the quartz glass tube (1) is insulated against the atmosphere inside the vacuum processing chamber (3), while the points at which the quartz glass tube (1) penetrates the wall (6) are sealed so as to be gastight.
- Use of a radiant heating system in accordance with claim 1 with an array of infrared radiation units with infrared radiation sources (2).
- Use of a radiant heating system in accordance with claim 2 with which each infrared radiation source (2) can be connected separately to an energy source.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DK00987096T DK1228668T3 (en) | 1999-11-09 | 2000-11-08 | Radiation heating using a high infrared radiation effect for machining chambers |
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DE29919685 | 1999-11-09 | ||
| DE29919685U | 1999-11-09 | ||
| PCT/DE2000/003908 WO2001035699A1 (en) | 1999-11-09 | 2000-11-08 | A radiant heating system with a high infrared radiant heating capacity, for treatment chambers |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| EP1228668A1 EP1228668A1 (en) | 2002-08-07 |
| EP1228668B1 true EP1228668B1 (en) | 2005-02-09 |
Family
ID=8081389
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| EP00987096A Revoked EP1228668B1 (en) | 1999-11-09 | 2000-11-08 | A radiant heating system with a high infrared radiant heating capacity, for treatment chambers |
Country Status (7)
| Country | Link |
|---|---|
| US (1) | US7067770B1 (en) |
| EP (1) | EP1228668B1 (en) |
| AT (1) | ATE289154T1 (en) |
| AU (1) | AU2348301A (en) |
| DE (1) | DE50009507D1 (en) |
| ES (1) | ES2237483T3 (en) |
| WO (1) | WO2001035699A1 (en) |
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|---|---|---|---|---|
| DE102008063677A1 (en) | 2008-12-19 | 2010-07-08 | Heraeus Noblelight Gmbh | Infrared radiator arrangement for high-temperature vacuum processes |
| DE102010064141A1 (en) * | 2010-12-23 | 2012-06-28 | Von Ardenne Anlagentechnik Gmbh | Heating device for substrate processing system, has power connector for making electrical contact of heating wire, which is arranged at terminal end of heater pipe, where terminal end of heater pipe fastens heater pipe with sealing unit |
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| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE102007048564A1 (en) | 2007-10-09 | 2009-04-23 | Heraeus Noblelight Gmbh | Device for an irradiation unit |
| TWM413957U (en) * | 2010-10-27 | 2011-10-11 | Tangteck Equipment Inc | Diffusion furnace apparatus |
| DE102011081749B4 (en) * | 2011-04-29 | 2016-04-14 | Von Ardenne Gmbh | Substrate treatment plant |
| UA111631C2 (en) * | 2011-10-06 | 2016-05-25 | Санофі Пастер Са | HEATING DEVICE FOR ROTOR DRUM LYOPHILE DRYER |
| KR20140116969A (en) * | 2012-02-09 | 2014-10-06 | 잘트 에너지 엘엘씨 | Lamp assembly |
| DE102015102665A1 (en) | 2015-02-25 | 2016-08-25 | Heraeus Noblelight Gmbh | Irradiation device for coupling infrared radiation in a vacuum process chamber with a single-ended infrared radiator |
| KR102244854B1 (en) * | 2020-08-13 | 2021-04-27 | 주식회사 세원전자 | Heating apparatus capable of heating a heat-shrinkable tube differentially |
Family Cites Families (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| GB1515086A (en) * | 1975-05-22 | 1978-06-21 | Sun Chemical Corp | Ultraviolet lamp assembly |
| GB2136937A (en) * | 1983-03-18 | 1984-09-26 | Philips Electronic Associated | A furnace for rapidly heating semiconductor bodies |
| US5551670A (en) * | 1990-10-16 | 1996-09-03 | Bgk Finishing Systems, Inc. | High intensity infrared heat treating apparatus |
| FR2671859B1 (en) | 1991-01-17 | 1999-01-22 | Moulinex Sa | COOKING APPARATUS, FOR EXAMPLE OVEN COMPRISING A PROTECTOR FOR AN ELECTRIC HEATING ELEMENT. |
| US5951896A (en) | 1996-12-04 | 1999-09-14 | Micro C Technologies, Inc. | Rapid thermal processing heater technology and method of use |
| US6600138B2 (en) * | 2001-04-17 | 2003-07-29 | Mattson Technology, Inc. | Rapid thermal processing system for integrated circuits |
-
2000
- 2000-11-08 AT AT00987096T patent/ATE289154T1/en not_active IP Right Cessation
- 2000-11-08 EP EP00987096A patent/EP1228668B1/en not_active Revoked
- 2000-11-08 DE DE50009507T patent/DE50009507D1/en not_active Expired - Fee Related
- 2000-11-08 US US10/129,340 patent/US7067770B1/en not_active Expired - Fee Related
- 2000-11-08 AU AU23483/01A patent/AU2348301A/en not_active Abandoned
- 2000-11-08 ES ES00987096T patent/ES2237483T3/en not_active Expired - Lifetime
- 2000-11-08 WO PCT/DE2000/003908 patent/WO2001035699A1/en not_active Ceased
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE102008063677A1 (en) | 2008-12-19 | 2010-07-08 | Heraeus Noblelight Gmbh | Infrared radiator arrangement for high-temperature vacuum processes |
| DE102008063677B4 (en) * | 2008-12-19 | 2012-10-04 | Heraeus Noblelight Gmbh | Infrared radiator and use of the infrared radiator in a process chamber |
| DE102010064141A1 (en) * | 2010-12-23 | 2012-06-28 | Von Ardenne Anlagentechnik Gmbh | Heating device for substrate processing system, has power connector for making electrical contact of heating wire, which is arranged at terminal end of heater pipe, where terminal end of heater pipe fastens heater pipe with sealing unit |
Also Published As
| Publication number | Publication date |
|---|---|
| ES2237483T3 (en) | 2005-08-01 |
| AU2348301A (en) | 2001-06-06 |
| ATE289154T1 (en) | 2005-02-15 |
| WO2001035699A1 (en) | 2001-05-17 |
| DE50009507D1 (en) | 2005-03-17 |
| US7067770B1 (en) | 2006-06-27 |
| EP1228668A1 (en) | 2002-08-07 |
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