EP1103524A3 - Procédé de séchage d'un gel de silice humide - Google Patents

Procédé de séchage d'un gel de silice humide Download PDF

Info

Publication number: EP1103524A3
Authority: EP; European Patent Office
Prior art keywords: silica gel; wet silica; drying; drying wet; solvent
Prior art date: 1999-11-29
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.): Withdrawn

Application number

EP00125992A

Other languages

German (de)

English (en)

Other versions

EP1103524A2 (fr

Inventor

Takashi Hashida

Masaaki Suzuki

Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)

Panasonic Holdings Corp

Original Assignee

Matsushita Electric Industrial Co Ltd

Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)

1999-11-29

Filing date

2000-11-28

Publication date

2002-07-31

1999-11-29 Priority claimed from JP33828199A external-priority patent/JP2001158615A/ja

1999-12-10 Priority claimed from JP35235299A external-priority patent/JP2001163614A/ja

2000-11-28 Application filed by Matsushita Electric Industrial Co Ltd filed Critical Matsushita Electric Industrial Co Ltd

2001-05-30 Publication of EP1103524A2 publication Critical patent/EP1103524A2/fr

2002-07-31 Publication of EP1103524A3 publication Critical patent/EP1103524A3/fr

Status Withdrawn legal-status Critical Current

Classifications

- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B33/00—Silicon; Compounds thereof
- C01B33/113—Silicon oxides; Hydrates thereof
- C01B33/12—Silica; Hydrates thereof, e.g. lepidoic silicic acid
- C01B33/14—Colloidal silica, e.g. dispersions, gels, sols
- C01B33/157—After-treatment of gels
- C01B33/158—Purification; Drying; Dehydrating
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B33/00—Silicon; Compounds thereof
- C01B33/113—Silicon oxides; Hydrates thereof
- C01B33/12—Silica; Hydrates thereof, e.g. lepidoic silicic acid
- C01B33/16—Preparation of silica xerogels
- G—PHYSICS
- G10—MUSICAL INSTRUMENTS; ACOUSTICS
- G10K—SOUND-PRODUCING DEVICES; METHODS OR DEVICES FOR PROTECTING AGAINST, OR FOR DAMPING, NOISE OR OTHER ACOUSTIC WAVES IN GENERAL; ACOUSTICS NOT OTHERWISE PROVIDED FOR
- G10K11/00—Methods or devices for transmitting, conducting or directing sound in general; Methods or devices for protecting against, or for damping, noise or other acoustic waves in general
- G10K11/16—Methods or devices for protecting against, or for damping, noise or other acoustic waves in general
- G10K11/162—Selection of materials

Landscapes

Chemical & Material Sciences (AREA)
Organic Chemistry (AREA)
Dispersion Chemistry (AREA)
Inorganic Chemistry (AREA)
Physics & Mathematics (AREA)
Engineering & Computer Science (AREA)
Acoustics & Sound (AREA)
Multimedia (AREA)
Silicon Compounds (AREA)

EP00125992A 1999-11-29 2000-11-28 Procédé de séchage d'un gel de silice humide Withdrawn EP1103524A3 (fr)

Applications Claiming Priority (4)

Application Number	Priority Date	Filing Date	Title
JP33828199		1999-11-29
JP33828199A JP2001158615A (ja)	1999-11-29	1999-11-29	湿潤ゲルの乾燥方法
JP35235299		1999-12-10
JP35235299A JP2001163614A (ja)	1999-12-10	1999-12-10	湿潤シリカゲルの乾燥方法

Publications (2)

Publication Number	Publication Date
EP1103524A2 EP1103524A2 (fr)	2001-05-30
EP1103524A3 true EP1103524A3 (fr)	2002-07-31

Family

ID=26576057

Family Applications (1)

Application Number	Title	Priority Date	Filing Date
EP00125992A Withdrawn EP1103524A3 (fr)	1999-11-29	2000-11-28	Procédé de séchage d'un gel de silice humide

Country Status (3)

Country	Link
EP (1)	EP1103524A3 (fr)
KR (1)	KR20010076229A (fr)
CN (1)	CN1297846A (fr)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
WO2008044873A1 (fr) *	2006-10-10	2008-04-17	Korea Institute Of Industrial Technology	Procédé de préparation d'un aérogel à hydrophobicité permanente et aérogel à hydrophobicité permanente préparé par ce procédé
KR100849927B1 (ko) *	2007-05-03	2008-08-04	연세대학교 산학협력단	형태에 따라 최적화된 실리카 에어로젤의 제조방법
CN102891077B (zh) *	2012-09-26	2015-12-09	复旦大学	采用水基原子层沉积技术在石墨烯表面制备高k栅介质的方法
CN107162006B (zh) *	2017-05-25	2019-05-24	厦门大学	一种加盐干燥方法
CN113637348A (zh) *	2021-08-26	2021-11-12	苏州弗克技术股份有限公司	一种吸音降噪腻子膏及其制备方法
CN114777425A (zh) *	2022-03-10	2022-07-22	格科半导体(上海)有限公司	晶圆干燥方法、晶圆干燥装置及化学机械研磨机台

Citations (5)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
WO1997010177A1 (fr) *	1995-09-15	1997-03-20	Hoechst Research & Technology Deutschland Gmbh & Co. Kg	Procede de production d'aerogels organofonctionnalises
WO1997017287A1 (fr) *	1995-11-06	1997-05-15	Hoechst Research & Technology Deutschland Gmbh & Co. Kg	Procede de preparation d'aerogels modifies de maniere organique a l'aide d'alcools
US5750610A (en) *	1997-02-24	1998-05-12	Dow Corning Corporation	Hydrophobic organosilicate-modified silica gels
DE19648798A1 (de) *	1996-11-26	1998-06-04	Hoechst Ag	Verfahren zur Herstellung von organisch modifizierten Aerogelen durch Oberflächenmodifikation des wäßrigen Gels (ohne vorherigen Lösungsmitteltausch) und anschließender Trocknung
DE19702238A1 (de) *	1997-01-24	1998-08-06	Hoechst Ag	Verwendung von Aerogelen zur Körper- und/oder Trittschalldämmung

2000
- 2000-11-28 EP EP00125992A patent/EP1103524A3/fr not_active Withdrawn
- 2000-11-28 KR KR1020000071200A patent/KR20010076229A/ko not_active Ceased
- 2000-11-29 CN CN00135076A patent/CN1297846A/zh active Pending

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
WO1997010177A1 (fr) *	1995-09-15	1997-03-20	Hoechst Research & Technology Deutschland Gmbh & Co. Kg	Procede de production d'aerogels organofonctionnalises
WO1997017287A1 (fr) *	1995-11-06	1997-05-15	Hoechst Research & Technology Deutschland Gmbh & Co. Kg	Procede de preparation d'aerogels modifies de maniere organique a l'aide d'alcools
DE19648798A1 (de) *	1996-11-26	1998-06-04	Hoechst Ag	Verfahren zur Herstellung von organisch modifizierten Aerogelen durch Oberflächenmodifikation des wäßrigen Gels (ohne vorherigen Lösungsmitteltausch) und anschließender Trocknung
DE19702238A1 (de) *	1997-01-24	1998-08-06	Hoechst Ag	Verwendung von Aerogelen zur Körper- und/oder Trittschalldämmung
US5750610A (en) *	1997-02-24	1998-05-12	Dow Corning Corporation	Hydrophobic organosilicate-modified silica gels

Non-Patent Citations (1)

* Cited by examiner, † Cited by third party
Title
GT BURNS, Q DENG, R FIELD, JR HAHN, CW LENTZ: "A convenient synthesis of silylated silica xerogels", CHEMISTRY OF MATERIALS, vol. 11, no. 5, 17 May 1999 (1999-05-17), pages 1275 - 1284, XP002189274 *

Also Published As

Publication number	Publication date
EP1103524A2 (fr)	2001-05-30
CN1297846A (zh)	2001-06-06
KR20010076229A (ko)	2001-08-11

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Legal Events

Date	Code	Title	Description
2001-04-13	PUAI	Public reference made under article 153(3) epc to a published international application that has entered the european phase	Free format text: ORIGINAL CODE: 0009012
2001-05-30	AK	Designated contracting states	Kind code of ref document: A2 Designated state(s): AT BE CH CY DE DK ES FI FR GB GR IE IT LI LU MC NL PT SE TR
2001-05-30	AX	Request for extension of the european patent	Free format text: AL;LT;LV;MK;RO;SI
2002-06-14	PUAL	Search report despatched	Free format text: ORIGINAL CODE: 0009013
2002-07-31	AK	Designated contracting states	Kind code of ref document: A3 Designated state(s): AT BE CH CY DE DK ES FI FR GB GR IE IT LI LU MC NL PT SE TR
2002-07-31	AX	Request for extension of the european patent	Free format text: AL;LT;LV;MK;RO;SI
2002-11-13	17P	Request for examination filed	Effective date: 20020916
2003-04-02	17Q	First examination report despatched	Effective date: 20030214
2003-04-23	AKX	Designation fees paid	Designated state(s): DE GB SE
2005-09-09	STAA	Information on the status of an ep patent application or granted ep patent	Free format text: STATUS: THE APPLICATION IS DEEMED TO BE WITHDRAWN
2005-10-26	18D	Application deemed to be withdrawn	Effective date: 20050419