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EP1143031A3 - Plasma boronizing - Google Patents

Plasma boronizing Download PDF

Info

Publication number
EP1143031A3
EP1143031A3 EP01110904A EP01110904A EP1143031A3 EP 1143031 A3 EP1143031 A3 EP 1143031A3 EP 01110904 A EP01110904 A EP 01110904A EP 01110904 A EP01110904 A EP 01110904A EP 1143031 A3 EP1143031 A3 EP 1143031A3
Authority
EP
European Patent Office
Prior art keywords
minimum
excited
specified
amount
medium
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Ceased
Application number
EP01110904A
Other languages
German (de)
French (fr)
Other versions
EP1143031A2 (en
Inventor
Emilio Dr. Rodriguez Cabeo
Günther LAUDIEN
Kyong-Tschong Rie
Swen Biemer
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Volkswagen AG
Original Assignee
Volkswagen AG
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Volkswagen AG filed Critical Volkswagen AG
Publication of EP1143031A2 publication Critical patent/EP1143031A2/en
Publication of EP1143031A3 publication Critical patent/EP1143031A3/en
Ceased legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C8/00—Solid state diffusion of only non-metal elements into metallic material surfaces; Chemical surface treatment of metallic material by reaction of the surface with a reactive gas, leaving reaction products of surface material in the coating, e.g. conversion coatings, passivation of metals
    • C23C8/06—Solid state diffusion of only non-metal elements into metallic material surfaces; Chemical surface treatment of metallic material by reaction of the surface with a reactive gas, leaving reaction products of surface material in the coating, e.g. conversion coatings, passivation of metals using gases
    • C23C8/36—Solid state diffusion of only non-metal elements into metallic material surfaces; Chemical surface treatment of metallic material by reaction of the surface with a reactive gas, leaving reaction products of surface material in the coating, e.g. conversion coatings, passivation of metals using gases using ionised gases, e.g. ionitriding
    • C23C8/38—Treatment of ferrous surfaces
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C8/00—Solid state diffusion of only non-metal elements into metallic material surfaces; Chemical surface treatment of metallic material by reaction of the surface with a reactive gas, leaving reaction products of surface material in the coating, e.g. conversion coatings, passivation of metals
    • C23C8/06—Solid state diffusion of only non-metal elements into metallic material surfaces; Chemical surface treatment of metallic material by reaction of the surface with a reactive gas, leaving reaction products of surface material in the coating, e.g. conversion coatings, passivation of metals using gases
    • C23C8/36—Solid state diffusion of only non-metal elements into metallic material surfaces; Chemical surface treatment of metallic material by reaction of the surface with a reactive gas, leaving reaction products of surface material in the coating, e.g. conversion coatings, passivation of metals using gases using ionised gases, e.g. ionitriding
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C8/00—Solid state diffusion of only non-metal elements into metallic material surfaces; Chemical surface treatment of metallic material by reaction of the surface with a reactive gas, leaving reaction products of surface material in the coating, e.g. conversion coatings, passivation of metals
    • C23C8/06—Solid state diffusion of only non-metal elements into metallic material surfaces; Chemical surface treatment of metallic material by reaction of the surface with a reactive gas, leaving reaction products of surface material in the coating, e.g. conversion coatings, passivation of metals using gases
    • C23C8/08—Solid state diffusion of only non-metal elements into metallic material surfaces; Chemical surface treatment of metallic material by reaction of the surface with a reactive gas, leaving reaction products of surface material in the coating, e.g. conversion coatings, passivation of metals using gases only one element being applied

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physical Or Chemical Processes And Apparatus (AREA)
  • Solid-Phase Diffusion Into Metallic Material Surfaces (AREA)
  • Chemical Vapour Deposition (AREA)
  • Plasma Technology (AREA)
  • Apparatus For Radiation Diagnosis (AREA)
  • Electron Sources, Ion Sources (AREA)
  • Primary Cells (AREA)

Abstract

The amount of at least one boron dispensing medium excited in the glow discharge is specified, and the parameters of the plasma produced in the treatment chamber (11) of the reactor (10) are chosen so that a minimum and/or maximum amount of this medium and/or a minimum and/or maximum value of its relation with one or several specified excited media is maintained.
EP01110904A 1997-12-15 1998-12-11 Plasma boronizing Ceased EP1143031A3 (en)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
DE19755595 1997-12-15
DE19755595 1997-12-15
EP98965249A EP1044289B1 (en) 1997-12-15 1998-12-11 Plasma boronizing

Related Parent Applications (1)

Application Number Title Priority Date Filing Date
EP98965249A Division EP1044289B1 (en) 1997-12-15 1998-12-11 Plasma boronizing

Publications (2)

Publication Number Publication Date
EP1143031A2 EP1143031A2 (en) 2001-10-10
EP1143031A3 true EP1143031A3 (en) 2004-04-28

Family

ID=7851902

Family Applications (2)

Application Number Title Priority Date Filing Date
EP98965249A Expired - Lifetime EP1044289B1 (en) 1997-12-15 1998-12-11 Plasma boronizing
EP01110904A Ceased EP1143031A3 (en) 1997-12-15 1998-12-11 Plasma boronizing

Family Applications Before (1)

Application Number Title Priority Date Filing Date
EP98965249A Expired - Lifetime EP1044289B1 (en) 1997-12-15 1998-12-11 Plasma boronizing

Country Status (8)

Country Link
US (1) US6783794B1 (en)
EP (2) EP1044289B1 (en)
JP (1) JP4588213B2 (en)
KR (1) KR100583262B1 (en)
CN (1) CN1198953C (en)
AT (1) ATE215132T1 (en)
DE (1) DE59803574D1 (en)
WO (1) WO1999031291A2 (en)

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
SE524493C2 (en) * 2002-02-25 2004-08-17 Telia Ab Estimator and method for determining the position of a mobile station in a mobile communication system
US7767274B2 (en) * 2005-09-22 2010-08-03 Skaff Corporation of America Plasma boriding method
WO2007124018A2 (en) * 2006-04-20 2007-11-01 Skaff Corporation Of America, Inc. Mechanical parts having increased wear resistance
CA2680858A1 (en) * 2007-03-22 2008-09-25 Skaff Corporation Of America, Inc. Mechanical parts having increased wear-resistance
US8338317B2 (en) * 2011-04-06 2012-12-25 Infineon Technologies Ag Method for processing a semiconductor wafer or die, and particle deposition device
CN104233425B (en) * 2014-09-29 2017-01-25 河海大学常州校区 Micro-arc boriding catalyzing solution, micro-arc boriding solution, and micro-arc boriding method
US10388524B2 (en) * 2016-12-15 2019-08-20 Tokyo Electron Limited Film forming method, boron film, and film forming apparatus

Citations (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3677799A (en) * 1970-11-10 1972-07-18 Celanese Corp Vapor phase boron deposition by pulse discharge
US4406765A (en) * 1980-01-28 1983-09-27 Fuji Photo Film Co., Ltd. Apparatus and process for production of amorphous semiconductor
DE3322341A1 (en) * 1983-06-22 1985-01-03 Siegfried Dr.-Ing. 5135 Selfkant Strämke METHOD AND DEVICE FOR THE SURFACE TREATMENT OF WORKPIECES BY GLIMMER DISCHARGE
DE4003623A1 (en) * 1990-02-07 1991-08-08 Kloeckner Ionon METHOD FOR CONTROLLING A PLANT TREATMENT SYSTEM FOR WORKPIECES
EP0603864A2 (en) * 1992-12-23 1994-06-29 Hughes Aircraft Company Surface potential control in plasma processing of materials
FR2708624A1 (en) * 1993-07-30 1995-02-10 Neuville Stephane Process for deposition of a protective coating based on amorphous diamond pseudocarbon or on modified silicon carbide
EP0695813A2 (en) * 1994-08-06 1996-02-07 ALD Vacuum Technologies GmbH Process for carburizing carburisable work pieces under the action of plasma-pulses
WO1997027345A1 (en) * 1996-01-25 1997-07-31 Elektroschmelzwerk Kempten Gmbh Process for producing wear-resistant boride layers on metal material surfaces

Family Cites Families (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5118944A (en) * 1974-08-07 1976-02-14 Suwa Seikosha Kk KISOHOKAHO
DE3908200C1 (en) * 1989-03-14 1989-09-07 Degussa Ag, 6000 Frankfurt, De
US5286534A (en) * 1991-12-23 1994-02-15 Minnesota Mining And Manufacturing Company Process for plasma deposition of a carbon rich coating
US5354381A (en) * 1993-05-07 1994-10-11 Varian Associates, Inc. Plasma immersion ion implantation (PI3) apparatus
JPH07286254A (en) * 1994-04-21 1995-10-31 Sumitomo Metal Ind Ltd Steel sheet excellent in secondary processing brittleness resistance and method for producing the same
JP3050361B2 (en) * 1994-07-19 2000-06-12 株式会社ライムズ Ion nitriding method for metal members
US5578725A (en) 1995-01-30 1996-11-26 Regents Of The University Of Minnesota Delta opioid receptor antagonists
JPH0982495A (en) * 1995-09-18 1997-03-28 Toshiba Corp Plasma generating apparatus and plasma generating method
US6306225B1 (en) * 1996-01-25 2001-10-23 Bor Tec Gmbh Process for producing wear-resistant boride layers on metallic material surfaces
DE19629877C1 (en) * 1996-07-24 1997-03-27 Schott Glaswerke CVD for internal coating of hollow articles with barrier film
US5654043A (en) * 1996-10-10 1997-08-05 Eaton Corporation Pulsed plate plasma implantation system and method
US6101971A (en) * 1998-05-13 2000-08-15 Axcelis Technologies, Inc. Ion implantation control using charge collection, optical emission spectroscopy and mass analysis
US20040016402A1 (en) * 2002-07-26 2004-01-29 Walther Steven R. Methods and apparatus for monitoring plasma parameters in plasma doping systems

Patent Citations (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3677799A (en) * 1970-11-10 1972-07-18 Celanese Corp Vapor phase boron deposition by pulse discharge
US4406765A (en) * 1980-01-28 1983-09-27 Fuji Photo Film Co., Ltd. Apparatus and process for production of amorphous semiconductor
DE3322341A1 (en) * 1983-06-22 1985-01-03 Siegfried Dr.-Ing. 5135 Selfkant Strämke METHOD AND DEVICE FOR THE SURFACE TREATMENT OF WORKPIECES BY GLIMMER DISCHARGE
DE4003623A1 (en) * 1990-02-07 1991-08-08 Kloeckner Ionon METHOD FOR CONTROLLING A PLANT TREATMENT SYSTEM FOR WORKPIECES
EP0603864A2 (en) * 1992-12-23 1994-06-29 Hughes Aircraft Company Surface potential control in plasma processing of materials
FR2708624A1 (en) * 1993-07-30 1995-02-10 Neuville Stephane Process for deposition of a protective coating based on amorphous diamond pseudocarbon or on modified silicon carbide
EP0695813A2 (en) * 1994-08-06 1996-02-07 ALD Vacuum Technologies GmbH Process for carburizing carburisable work pieces under the action of plasma-pulses
WO1997027345A1 (en) * 1996-01-25 1997-07-31 Elektroschmelzwerk Kempten Gmbh Process for producing wear-resistant boride layers on metal material surfaces

Also Published As

Publication number Publication date
CN1282383A (en) 2001-01-31
WO1999031291A2 (en) 1999-06-24
DE59803574D1 (en) 2002-05-02
EP1044289B1 (en) 2002-03-27
KR20010033075A (en) 2001-04-25
JP4588213B2 (en) 2010-11-24
KR100583262B1 (en) 2006-05-25
CN1198953C (en) 2005-04-27
WO1999031291A3 (en) 1999-09-10
US6783794B1 (en) 2004-08-31
EP1044289A2 (en) 2000-10-18
JP2002508448A (en) 2002-03-19
ATE215132T1 (en) 2002-04-15
EP1143031A2 (en) 2001-10-10

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