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EP0985121B1 - Dispositif pour l'exposition d'un substrat a des rayons uv et procede pour l'exploitation de ce dispositif - Google Patents

Dispositif pour l'exposition d'un substrat a des rayons uv et procede pour l'exploitation de ce dispositif Download PDF

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Publication number
EP0985121B1
EP0985121B1 EP98916778A EP98916778A EP0985121B1 EP 0985121 B1 EP0985121 B1 EP 0985121B1 EP 98916778 A EP98916778 A EP 98916778A EP 98916778 A EP98916778 A EP 98916778A EP 0985121 B1 EP0985121 B1 EP 0985121B1
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EP
European Patent Office
Prior art keywords
housing
cooling gas
lamp
reflector
cooling
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
EP98916778A
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German (de)
English (en)
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EP0985121A1 (fr
Inventor
Bernhard Max Glaus
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Uviterno AG
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Glaus Bernhard Max
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Filing date
Publication date
Application filed by Glaus Bernhard Max filed Critical Glaus Bernhard Max
Publication of EP0985121A1 publication Critical patent/EP0985121A1/fr
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Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

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Classifications

    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F26—DRYING
    • F26B—DRYING SOLID MATERIALS OR OBJECTS BY REMOVING LIQUID THEREFROM
    • F26B3/00—Drying solid materials or objects by processes involving the application of heat
    • F26B3/28—Drying solid materials or objects by processes involving the application of heat by radiation, e.g. from the sun

Definitions

  • the invention relates to a device for irradiating a Substrate by means of UV rays according to the preamble of Claim 1.
  • a device for irradiating a Substrate by means of UV rays according to the preamble of Claim 1.
  • Such a device is from the US-A-4 182 047 known.
  • Such devices are for example in printing technology for drying paints, inks, etc. Polymerization used. Treatments using UV rays but are also used, for example, in food technology used for preservation purposes etc.
  • UV radiation sources in addition to UV radiation, a very high proportion of heat-intensive Infrared radiation is emitted. On the one hand, this requires permanent cooling of the radiation source and on the other hand Measures have to be taken so that it is mostly heat-sensitive Substrate cannot be damaged. to Cooling of the UV radiation source was therefore already known an air flow through that closed with a quartz glass plate To lead housing.
  • US-A-5,094,010 shows a generic comparable UV lamp, its housing additionally is also equipped with water cooling.
  • the reflector The UV lamp is solid in a relatively massive Integrated lamp head.
  • This UV lamp is for drying large workpieces such as Boat hull made of glass fiber reinforced Plastic determines and is not suitable for irradiation of substrates moving at high speed on the Radiation source passing by. A quick fade or The radiation source cannot be turned away.
  • DE U 93 12 809.6 is a UV radiation device described for highly productive production lines, for example is intended for the production of compact discs.
  • the Outlet opening is covered with a quartz glass pane, however, the housing is not hermetic to the environment completed. Ambient air is created via an exhaust air device sucked in through side ventilation openings and slots. This has the disadvantage that dirt and dust particles in the housing can reach.
  • the reflector of the UV lamp is in two movably mounted reflector halves divided for dimming the radiation collapses overlapping each other can be. Despite the air cooling, the reflector halves exposed to very high temperatures when closed and the heat rays are also thrown back onto the lamp.
  • a UV-transparent Glass plate in particular with a quartz glass plate allows a closed inside the lamp housing Lead cooling air circuit.
  • the housing is with at least one cooling gas inlet and at least one each Provide cooling gas outlet, in such a way that the UV lamp with the gas flow between the inlet and outlet can be acted upon. Cooling with full power is therefore in every operating position possible without the environment being affected by a current becomes.
  • ozone can no longer be applied to the lamp escape. So there is no longer any risk that the The surface of the substrate is directly exposed to air containing ozone becomes what in certain cases the one with the UV rays can delay the desired drying.
  • the supply line and the discharge line at least in sections as flexible Lines or designed as telescopic tubes.
  • the housing forms in this way an autonomous module that is independent of its Operating position in a closed system with a cooling gas flow can be applied.
  • the housing is between the working position and the stand-by position can be moved linearly stored.
  • the reflector is so freely stored in the housing that it Cooling gas flows around in every operating position.
  • Cooling gas inlet with a pressure fan and when the cooling gas outlet is connected to a suction fan can flow through large amounts of cooling gas with a specific flow the lamp housing are guided. Harmful ozone is extracted.
  • only the cooling gas inlet with a pressure fan or that only the cooling gas outlet is connected to a suction fan can be connected to a suction fan.
  • a temperature sensor is arranged in the housing and that control means on the pressure fan and / or on the suction fan arranged to control the amount of air flowing through the housing which are operatively connected to the temperature sensor.
  • the amount of cooling gas can thus be controlled via the temperature sensor become.
  • the Control means a motorized flap for changing of the flow cross-section.
  • the fan drive motor therefore always works at full power, so without Delay can be worked with maximum cooling capacity can.
  • the control means can also use frequency control for the drive motor of the pressure fan and / or the suction fan.
  • cooling gas outlet or a connected to this outlet line with an ozone filter is. This makes the contamination of the environment artificial generated ozone prevented.
  • the air cleaned in this way can a suitable place in the room for heating purposes because they have temperatures of up to 80 ° Celsius can. It is also conceivable to feed the heated exhaust air in a heat exchanger for the recovery of the discharged Warmth.
  • the cooling gas inlet or an inlet line connected to it Air filter is provided.
  • the cooling gas entering the housing is cleaned of dust and contamination of the UV lamp will be prevented.
  • the UV lamp in the housing is preferably surrounded by a reflector, who with at least one opening for passing the Air flow is provided.
  • a reflector who with at least one opening for passing the Air flow is provided. This can be advantageous lying on the plane of symmetry of the reflector and parallel act on the longitudinal slot extending to the UV lamp. This can at least part of the amount of cooling gas is aimed directly at the UV lamp become.
  • a reflector with or without an opening can also be transparent to heat radiation be trained. As a result, the reflector reflects only the UV rays, while a large part of the heat-intensive IR radiation penetrates the reflector.
  • a such design of the reflector can be in the management of Cooling gas within the housing are specifically considered.
  • the reflector particularly advantageously consists of a glass ceramic (e.g. ROBAX® registered Brand). Glass ceramic materials have a very high Permeability to heat rays and are used for this purpose also used for electric hot plates. By known Coating techniques can be applied to a mirror layer so that UV rays are still reflected.
  • an absorber for absorption is advantageous the heat and UV rays are arranged in the stand-by position.
  • the absorber can be used for additional cooling with a suction device be connected.
  • the housing is automatically moved to the stand-by position, so that the substrate does not have an excessively long exposure to radiation exposed, which in extreme cases leads to spontaneous combustion could lead.
  • the UV rays are from the absorber absorbed so that the operating personnel is not at risk.
  • the maximum possible extension position of the housing to reach the working position can be adjustable in such a way that the UV lamp irradiated only a portion of the substrate while the remaining section is directed towards the absorber and irradiated this.
  • the adjustable extension position has the advantage that the radiation section is the size of the continuous Workpiece can be adjusted. This way not unnecessarily irradiated means of transport or the like which would warm up.
  • the housing can be moved linearly if it is connected to at least one Guide rail is suspended and if it is with a pneumatic cylinder between the working position and the stand-by position is movable.
  • Other drive means, such as linear motors etc. would of course also be conceivable.
  • the housing is advantageously divided into a first flow chamber, in which the UV lamp is arranged and in one second flow chamber, the cooling gas inlet at the first Flow chamber and the cooling gas outlet on the second flow chamber is arranged.
  • the two flow chambers are over one slit running parallel to the UV lamp or via a Row of openings connected together.
  • the quartz glass plate has a different coefficient of thermal expansion than the steel case. It is therefore advantageous in stored in a dilatation bearing on the housing.
  • the invention also relates to a method for operating the device mentioned at the beginning.
  • This method is characterized by the features in claims 13, 14 and 15.
  • Feeding the cooling gas at a pressure of at least 1 kilopascal causes intensive cooling of all parts within the housing.
  • the working pressure on the pressure fan can be 2 to 3 kilopascals.
  • the pressure difference compared to the housing results from the transmission lines.
  • the cooling gas throughput can be up to approx. 400 m 3 / hour.
  • the temperature of the cooling gas fed in can correspond to the ambient temperature, but should not exceed approx. 25 to 30 ° Celsius. In certain cases it would be conceivable to reduce the temperature of the cooling gas fed in with a cooling unit.
  • the temperature of the exhaust air at the outlet can be 45 to 80 ° Celsius, so that heat recovery makes sense in certain cases.
  • ambient air is used as the cooling gas.
  • air is always used instead of "Cooling gas” used.
  • UV lamp 1 shows a highly schematized UV lamp 2, which is arranged in a housing 3.
  • Exit side 4 on the housing hit the UV rays Substrate 1, for example on a conveyor belt under the Housing is passed through.
  • the exit side 4 on the housing 3 is UV-transparent Quartz glass plate 5 closed. Until an air inlet 6 and an air outlet 7 that is Housing 3 is thus largely hermetically sealed.
  • the Air inlet 6 is connected to a pressure fan 8 which Ambient air is sucked in and at a relatively high pressure Housing 3 feeds.
  • the air outlet 7 is with a suction fan 9 connected, which sucks air from the housing and releases in turn to the environment via an ozone filter 12.
  • the Feed line 10 and the discharge line 11 are preferred designed as flexible lines. Air inlet 6 and air outlet 7 are arranged on the housing such that the UV lamp 2 lies in the main flow area. Of course can additional baffles, baffles and the like be arranged to the flow effect improve.
  • the housing 3 is not closer to one here shown carriage attached to a linear guide 14 and can be moved in the direction of arrow a. From the shown working position can thus be unchanged Performance of the fans 8, 9 the housing as far as in the Illustration to the right until the UV lamp 2 lies above the absorber 13. In this stand-by position temporarily the throughput of the substrates 1 can be stopped. In this way, switching off the UV lamp 2 can be avoided become.
  • a cross section is also highly schematized in FIG represented by the housing 3, the outlet side 4 with a quartz glass plate 5 is closed.
  • the UV lamp 2 is surrounded by a reflector 15, one above the UV lamp 2 Gap 16 has. Through this gap, cooling air from the Hit the air inlet 6 directly on the UV lamp 2. On Part of the cooling air spreads on the back of the reflector 15 along and also cools it.
  • the air outlet 7 is arranged on the long side, but could just like the Air intake is also on one end. Of course could also have multiple air intakes in each embodiment or air outlets on the housing.
  • the reflector 15 is by means of a surface coating formed such that only the UV rays 21 reflect be, while heat-intensive IR rays 22 den Penetrate reflector directly. This measure also serves to keep harmful heat rays away from the substrate.
  • FIG. 3 shows schematically a lamp housing 3 with one in it arranged UV lamp 2.
  • a temperature sensor in the housing 19 attached, with the help of the internal temperature can be constantly monitored.
  • the temperature sensor 19 is in operative connection with an actuator 20 with which Flap valves 18, 18 'in the feed line 10 or in the Discharge line 11 can be operated.
  • the drive motors 17, 17 'of the pressure fan 8 or the suction fan 9 always work with full power and control the air volume is only via the flap valves.
  • the drive motors 17, 17 'could also be used a frequency control, which control pulses receives from the temperature sensor 19.
  • Figure 4 shows a lamp housing 3, in which the arranged therein UV lamp 2 together with its reflector 15 pivoted through 90 ° can be.
  • the UV rays through the quartz glass plate 5 on the exit side 4 out.
  • the standby position shown at 15 ' of the reflector the rays hit a mudguard 23.
  • UV rays via a partially transparent mirror onto the substrate or be directed away from the substrate.
  • a partially transparent mirror onto the substrate or be directed away from the substrate.
  • Such embodiments are e.g. in CH-A-660 489.
  • the partially permeable Mirror can be fixed or swiveling in the Housing be arranged.
  • FIG. 5 shows a UV lamp in which two different Operating positions are possible.
  • the UV lamp 2 is provided with a reflector 15, which can be turned into three different positions can.
  • a partially transparent mirror 24 arranged over which in a first operating position UV rays 21 can be directed onto the substrate 1, while the heat intensive IR rays 22 penetrate the mirror and absorbed on the absorber 13.
  • the reflector 15 can be 90 ° in this way that the radiation is swung directly through the glass plate 5 falls on a substrate 1.
  • This direct radiation contains the entire spectrum of rays, including the IR rays, however, which may be desirable in certain cases.
  • the reflector 15 In the stand-by position, the reflector 15 is turned upwards, so that the rays fall on the fender 23.
  • On Such a multifunctional radiation head is air cooling particularly advantageous in a closed housing because through the quartz glass plate 5 the mechanically moving parts and in particular also the sensitive mirror 24 is protected become. The cooling air can be targeted within the housing the points are directed where it is needed, e.g. also on the absorber 13.
  • Figures 6 to 8 show an irradiation head, which also is linearly displaceable in the direction of arrow a.
  • the shift takes place on a frame 25, the Can be part of an irradiation device.
  • roller bearings 26 are arranged on the frame, which in two U-shaped guide rails 27 on the top of the Intervene in housing 3.
  • a pneumatic cylinder 28 is attached, the piston rod is connected to the frame at a piston attachment 37.
  • the pneumatic cylinder is not supplied via here Pneumatic lines shown.
  • Figure 6 that is complete extended position shown so that the UV lamp 2 down the entire length of the substrate radiates.
  • the maximum possible extension position can be limited.
  • Such Limitation causes the face of the radiation head only down to the vertical plane 36 extending.
  • the UV lamp 2 only transmits part of their length down radiation.
  • the rest Section of the lamp partially overlaps the one below the housing 3 arranged absorber 13. This consists of grill-like slats and can become intense radiation Heat to red heat.
  • the UV lamp 2 irradiates the absorber via its whole length.
  • the substrate is a cylindrical one Bottle cap 35 shown on the end a mandrel 34 is attached.
  • a complete Extending the UV lamp 2 would obviously also be a Part of the mandrel 34 irradiated and thus heated. Since the mandrel 34 is not cooled, this could damage the Guide cap 35. When extending to the extended position 36, on the other hand, practically only the cap 35 irradiated.
  • the housing 3 is in a first flow chamber 29 and second flow chamber 30 divided. Serve as a subdivision separating plates 31 having a longitudinal slot 32 in the middle leave open. This longitudinal slot runs over the longitudinal slot 16, which form the two reflector halves.
  • the Cooling air enters through the supply line 10 in the front a first flow chamber 29, flows around the UV lamp 2 and their reflector 15 and then arrives in the direction of arrow b in the second flow chamber 30, which they also face leaves again via the discharge line 11.
  • the lines 10 and 11 are designed as flexible hose lines. This also applies to the absorber suction line 33, via which Ambient air through the absorber grill for cooling purposes is suctioned off.
  • the electrical lines leading to the UV lamp 2 or lead to the temperature sensor 19 are also summarized in a flexible hose 40.
  • FIG. 9 shows a dilatation bearing 38 for holding the Quartz glass plate 5.
  • the bracket 39 may be the quartz glass plate do not jam. Rather, it has proven to be beneficial proved that the quartz glass plate with sufficient Free play rests in the bracket 39 (dash-dotted Position). Will be in the housing opposite the atmosphere Maintaining negative pressure, the quartz glass plate is sucked in and presses tightly against the housing opening (hatched position). Use would also be conceivable high temperature resistant sliding seals.

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  • Engineering & Computer Science (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Microbiology (AREA)
  • Mechanical Engineering (AREA)
  • General Engineering & Computer Science (AREA)
  • Physical Or Chemical Processes And Apparatus (AREA)
  • Arrangement Of Elements, Cooling, Sealing, Or The Like Of Lighting Devices (AREA)
  • Recrystallisation Techniques (AREA)
  • Internal Circuitry In Semiconductor Integrated Circuit Devices (AREA)
  • Heating, Cooling, Or Curing Plastics Or The Like In General (AREA)

Claims (15)

  1. Dispositif pour exposer un substrat (1) à des UV, comportant une lampe UV (2) qui est disposée dans une enveloppe (3) de telle sorte que les UV sortent de l'enveloppe directement ou indirectement sur un côté sortie (4), et des moyens pour refroidir la lampe UV grâce à un courant de gaz de refroidissement, étant précisé que l'enveloppe (3) a au moins une admission de gaz de refroidissement (6) et au moins une sortie de gaz de refroidissement (7), de sorte que le gaz de refroidissement peut traverser l'enveloppe, que toute l'enveloppe (3) est mobile entre une position de travail dans laquelle les rayons UV arrivent sur le substrat et une position d'attente dans laquelle les UV sont éloignés du substrat, et que la lampe UV (2) a un réflecteur (15) qui est entouré de tous les côtés par le courant de gaz de refroidissement dans l'enveloppe (3) en position de travail et en position d'attente,
       caractérisé
    en ce que le côté sortie (4) est fermé par une plaque de verre (5) qui laisse passer les UV,
    en ce que l'enveloppe (3) est montée pour être mobile linéairement entre la position de travail et la position d'attente,
    et en ce que l'admission de gaz de refroidissement (6) est raccordée à une conduite d'amenée (10), et la sortie de gaz de refroidissement (7) à une conduite d'évacuation (11),
    étant précisé qu'il est prévu, raccordées respectivement à l'admission de gaz de refroidissement et à la sortie de gaz de refroidissement, une conduite d'amenée et une conduite d'évacuation qui sont conçues au moins par sections, pour compenser la position relative entre la position de travail et la position d'attente, comme des conduites flexibles ou comme des tubes télescopiques.
  2. Dispositif selon la revendication 1, caractérisé en ce que la conduite d'amenée (10) est reliée à un ventilateur soufflant (8) et/ou la conduite d'évacuation (11) à un ventilateur aspirant (9), en ce qu'une sonde de température (19) est disposée dans l'enveloppe (3) et en ce qu'il est prévu sur le ventilateur soufflant (8) et/ou sur le ventilateur aspirant (9) des moyens de commande pour commander la quantité d'air qui traverse l'enveloppe, lesquels moyens de commande sont en relation fonctionnelle avec la sonde de température.
  3. Dispositif selon la revendication 2, caractérisé en ce que les moyens de commande comportent un clapet (18, 18') commandé par moteur et destiné à modifier la section transversale d'écoulement.
  4. Dispositif selon la revendication 2, caractérisé en ce que les moyens de commande comportent une commande de fréquence pour le moteur d'entraínement (17, 17') du ventilateur soufflant et/ou du ventilateur aspirant.
  5. Dispositif selon l'une des revendications 1 à 4, caractérisé en ce que le réflecteur (15) a une fente longitudinale (16), située sur un plan de symétrie et parallèle à la lampe UV, pour le passage du courant de gaz de refroidissement.
  6. Dispositif selon l'une des revendications 1 à 5, caractérisé en ce que le réflecteur (15) est conçu pour laisser passer le rayonnement thermique.
  7. Dispositif selon la revendication 6, caractérisé en ce que le réflecteur (15) se compose d'une vitrocéramique pourvue d'une couche réfléchissante.
  8. Dispositif selon l'une des revendications 1 à 7, caractérisé en ce qu'il est prévu, près de l'enveloppe, un absorbeur (13) destiné à absorber les rayons thermiques et les UV, dans la position d'attente, et en ce qu'il est prévu sur l'absorbeur un dispositif d'aspiration pour un refroidissement supplémentaire.
  9. Dispositif selon la revendication 8, caractérisé en ce que la position déployée possible maximale de l'enveloppe (3), pour atteindre la position de travail, est réglable de telle sorte que la lampe UV (2) n'expose le substrat aux rayons qu'avec une section, tandis que la section restante expose l'absorbeur aux rayons.
  10. Dispositif selon l'une des revendications 1 à 9, caractérisé en ce que l'enveloppe (3) est suspendue à au moins un rail de guidage (27) et est mobile, grâce à un vérin pneumatique (28), entre la position de travail et la position d'attente.
  11. Dispositif selon l'une des revendications 1 à 10, caractérisé en ce que l'enveloppe (3) est divisée en une première chambre d'écoulement (29) dans laquelle est disposée la lampe UV (2), et une seconde chambre d'écoulement (30), et en ce que l'admission de gaz de refroidissement (6) est disposée sur la première chambre d'écoulement (29), et la sortie de gaz de refroidissement (7) sur la seconde chambre d'écoulement (30), les deux chambres d'écoulement étant reliées par une fente (32) parallèle à la lampe UV (2) ou par une rangée d'ouvertures.
  12. Dispositif selon l'une des revendications 1 à 11, caractérisé en ce que la plaque de verre quartzeux (5) est montée sur l'enveloppe dans un montage de dilatation (38) de telle sorte que les dilatations dues à la température puissent être compensées dans son plan.
  13. Procédé pour faire fonctionner le dispositif selon l'une des revendications 1 à 12, caractérisé en ce qu'un gaz de refroidissement est amené dans l'enveloppe (3) par l'admission de gaz de refroidissement (6) avec une pression d'au moins un kilopascal.
  14. Procédé pour faire fonctionner le dispositif selon l'une des revendications 1 à 12, caractérisé en ce qu'une pression inférieure à la pression atmosphérique est maintenue dans l'enveloppe.
  15. Procédé pour faire fonctionner le dispositif selon l'une des revendications 1 à 12, caractérisé en ce qu'on utilise comme gaz de refroidissement de l'azote.
EP98916778A 1997-05-26 1998-05-07 Dispositif pour l'exposition d'un substrat a des rayons uv et procede pour l'exploitation de ce dispositif Expired - Lifetime EP0985121B1 (fr)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
CH122597 1997-05-26
CH122597 1997-05-26
PCT/CH1998/000186 WO1998054525A1 (fr) 1997-05-26 1998-05-07 Dispositif pour l'exposition d'un substrat a des rayons uv et procede pour l'exploitation de ce dispositif

Publications (2)

Publication Number Publication Date
EP0985121A1 EP0985121A1 (fr) 2000-03-15
EP0985121B1 true EP0985121B1 (fr) 2003-09-10

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EP98916778A Expired - Lifetime EP0985121B1 (fr) 1997-05-26 1998-05-07 Dispositif pour l'exposition d'un substrat a des rayons uv et procede pour l'exploitation de ce dispositif

Country Status (4)

Country Link
EP (1) EP0985121B1 (fr)
AT (1) ATE224523T1 (fr)
DE (1) DE59805621D1 (fr)
WO (1) WO1998054525A1 (fr)

Cited By (5)

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Publication number Priority date Publication date Assignee Title
DE102007040209A1 (de) * 2007-08-27 2009-03-12 Uviterno Ag Vorrichtung zum Bestrahlen eines Substrats
EP2192366A2 (fr) 2008-12-01 2010-06-02 Uviterno AG Dispositif de rayonnement d'un substrat
KR20150074074A (ko) * 2012-10-23 2015-07-01 오를리콘 서피스 솔루션스 아크티엔게젤샤프트, 트뤼프바흐 클럭 작동을 위한 uv-조사 장치
DE102018102928A1 (de) 2018-02-09 2019-08-14 Heraeus Noblelight Gmbh UV-Strahlermodul und dessen Verwendung
CN114392708A (zh) * 2022-01-15 2022-04-26 耐呗斯(嘉兴)安全防护用品有限公司 一种硅胶的uv改质机

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DE102006003057A1 (de) * 2006-01-20 2007-07-26 Phoenix Contact Gmbh & Co. Kg Drucker mit einem Belichtungskopf
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GB2495901B (en) * 2011-08-08 2014-03-12 Gew Ec Ltd Improved housing for ink curing apparatus

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Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE102007040209A1 (de) * 2007-08-27 2009-03-12 Uviterno Ag Vorrichtung zum Bestrahlen eines Substrats
EP2192366A2 (fr) 2008-12-01 2010-06-02 Uviterno AG Dispositif de rayonnement d'un substrat
KR20150074074A (ko) * 2012-10-23 2015-07-01 오를리콘 서피스 솔루션스 아크티엔게젤샤프트, 트뤼프바흐 클럭 작동을 위한 uv-조사 장치
DE102018102928A1 (de) 2018-02-09 2019-08-14 Heraeus Noblelight Gmbh UV-Strahlermodul und dessen Verwendung
CN114392708A (zh) * 2022-01-15 2022-04-26 耐呗斯(嘉兴)安全防护用品有限公司 一种硅胶的uv改质机

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EP0985121A1 (fr) 2000-03-15
WO1998054525A1 (fr) 1998-12-03
DE59805621D1 (de) 2003-11-20
ATE224523T1 (de) 2002-10-15

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