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EP0802267B1 - Aluminium surfaces with interference colours - Google Patents

Aluminium surfaces with interference colours Download PDF

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Publication number
EP0802267B1
EP0802267B1 EP19960810245 EP96810245A EP0802267B1 EP 0802267 B1 EP0802267 B1 EP 0802267B1 EP 19960810245 EP19960810245 EP 19960810245 EP 96810245 A EP96810245 A EP 96810245A EP 0802267 B1 EP0802267 B1 EP 0802267B1
Authority
EP
European Patent Office
Prior art keywords
layer
interference
partially transparent
thickness
aluminum
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
EP19960810245
Other languages
German (de)
French (fr)
Other versions
EP0802267A1 (en
Inventor
Paul Hänggi
Walter Hotz
Roman Fuchs
Volkmar Gillich
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
3A Composites International AG
Original Assignee
Alusuisse Lonza Services Ltd
Alusuisse Technology and Management Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority to AT96810245T priority Critical patent/ATE188517T1/en
Priority to DE59604113T priority patent/DE59604113D1/en
Priority to EP19960810245 priority patent/EP0802267B1/en
Priority to DK96810245T priority patent/DK0802267T3/en
Priority to PT96810245T priority patent/PT802267E/en
Priority to ES96810245T priority patent/ES2141460T3/en
Application filed by Alusuisse Lonza Services Ltd, Alusuisse Technology and Management Ltd filed Critical Alusuisse Lonza Services Ltd
Priority to US08/832,295 priority patent/US5904989A/en
Priority to CA 2202603 priority patent/CA2202603C/en
Publication of EP0802267A1 publication Critical patent/EP0802267A1/en
Application granted granted Critical
Publication of EP0802267B1 publication Critical patent/EP0802267B1/en
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

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Classifications

    • CCHEMISTRY; METALLURGY
    • C25ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25DPROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D11/00Electrolytic coating by surface reaction, i.e. forming conversion layers
    • C25D11/02Anodisation
    • C25D11/04Anodisation of aluminium or alloys based thereon
    • CCHEMISTRY; METALLURGY
    • C25ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25DPROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D11/00Electrolytic coating by surface reaction, i.e. forming conversion layers
    • C25D11/02Anodisation
    • C25D11/04Anodisation of aluminium or alloys based thereon
    • C25D11/18After-treatment, e.g. pore-sealing
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10TTECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00Stock material or miscellaneous articles
    • Y10T428/31504Composite [nonstructural laminate]
    • Y10T428/31678Of metal

Definitions

  • the present invention relates to an interference layer as a coloring surface layer of aluminum bodies containing an aluminum oxide layer and one deposited thereon semi-transparent layer.
  • the invention further relates to a method of manufacture the interference layer according to the invention.
  • Interference layers which certain length waves of the incident light by interference eliminate are known in optics as so-called filters.
  • the manufacture of such filters usually happens by applying a high-purity, thin metal layer Glass, by subsequent deposition of a dielectric layer, and by the further Apply a semi-transparent metal layer.
  • the deposition of the individual layers is usually done using PVD (physical vapor deposition) methods, like sputtering or vapor deposition.
  • the high-purity, thin metal layer is made of aluminum, for example.
  • Al 2 O 3 or SiO x layers are usually used as dielectric layers. Because of the small layer thickness, PVD-Al layers generally cannot be anodized, so that PVD-Al 2 O 3 or PVD-SiO 2 are mostly used as dielectric layers. However, the application of PVD-Al 2 O 3 layers or PVD-SiO 2 layers is expensive. In addition, dielectric layers which are applied to the aluminum surface by means of PVD methods sometimes have insufficient adhesion. Metals, such as high-purity aluminum, are usually used for the semi-transparent layers.
  • the known GS method ie the anodic oxidation of the aluminum surface with direct current in a sulfuric acid electrolyte, can also be used to produce a dielectric layer on an aluminum surface.
  • the resulting protective layer usually shows a high porosity due to the method.
  • the production of large surface layers with homogeneous coloring requires a correspondingly large constant layer thickness of the interference layer.
  • the anodic oxide layers produced in sulfuric acid are only on pure aluminum and AlMg or AlMgSi alloys based on pure aluminum (Al ⁇ 99.85% by weight) colorless and crystal clear.
  • alloy components such as Fe or Si-rich intermetallic Phases are built into the oxide layer, which then become uncontrollable Light absorption and / or lead to light scattering and thus more or less clouded Layers, or layers with an uncontrollable coloring result.
  • the object of the present invention is to provide an interference layer which can be produced inexpensively to be specified as the coloring surface layer of aluminum bodies, which the previous avoids the disadvantages mentioned and enables the lightfast coloring of aluminum surfaces, or can be used as a selective reflector surface.
  • the aluminum oxide layer is an anodically produced, transparent and pore-free barrier layer with a barrier layer thickness d preselected according to the desired surface color of the interference layer, the barrier layer thickness d being between 20 and 900 nm (nanometers) and the partially transparent layer being one has wavelength-dependent transmission ⁇ ( ⁇ ) that is greater than 0.01 and less than 1.
  • the interference layers according to the invention can, for example, on surfaces of General cargo, strips, sheets or foils made of aluminum, as well as aluminum cover layers of bodies made of composite materials, in particular aluminum cover layers of composite panels, or on any material with a - for example electrolytically - deposited Aluminum layer can be applied.
  • aluminum is of all purity levels in the present text as well as all aluminum alloys.
  • the term aluminum includes everything Rolling, kneading, casting, forging and pressing alloys made of aluminum.
  • there is pure aluminum material surface to be provided with the interference layer according to the invention With a degree of purity equal to or greater than 98.3% by weight of Al or aluminum alloys from this aluminum with at least one of the elements from the series of Si, Mg, Mn, Cu, Zn or Fe.
  • Aluminum surfaces made from high-purity are further preferred Aluminum alloys with a purity of 99.99% by weight Al and higher, for example made of plated material, or a purity of 99.5 to 99.99 wt .-% Al.
  • the aluminum surfaces can have any shape and can optionally also be structured. In the case of rolled aluminum surfaces, these can be used, for example Be treated high gloss or designer rollers.
  • a preferred use of structured Aluminum surfaces can be found, for example, for applications in daylight lighting, for example for decorative lights, mirrors or decorative surfaces from Ceiling or wall elements, or for applications in vehicle construction, for example Decorative parts or closures.
  • structured surfaces with structure sizes are obtained from expediently 1 nm to 1 mm and preferably from 50 nm to 100 ⁇ m to use.
  • the barrier layer thickness corresponds to the desired one Coloring is produced in a controlled manner.
  • the barrier layer must also be non-porous. So that will Diffuse light scattering that is difficult to control and thus uneven color development avoided.
  • the term non-porous does not mean absolute freedom from pores Roger that. Rather, the barrier layer of the interference layer according to the invention is in the essentially non-porous.
  • the anodized aluminum oxide layer has essentially no process-related porosity. Under a procedural Porosity becomes, for example, the use of an aluminum oxide dissolving electrolyte Roger that.
  • the pore-free barrier layer preferably has a porosity of less than 1% and in particular less than 0.5%.
  • the dielectric constant ⁇ of the barrier layer depends, among other things. of those used to make the barrier layer used process parameters during the anodic oxidation. Conveniently the dielectric constant ⁇ of the barrier layer is at a temperature of 20 ° C between 6 and 10.5 and preferably between 8 and 10.
  • the color of the aluminum surface provided with an interference layer according to the invention depends, for example, on the surface quality of the aluminum surface, on the angle of incidence of the light striking the interference layer surface, the viewing angle, the thickness of the barrier layer, the composition and the layer thickness of the partially transparent layer and the transmission ⁇ ( ⁇ ) of the partially transparent one Layer.
  • the interference layer according to the invention has a transmission ⁇ ( ⁇ ) between 0.3 and 0.7.
  • the layer thickness of the barrier layer is in accordance with the invention Interference layers preferably in the layer thickness range between 30 and 800 nm and particularly preferably between 35 and 500 nm.
  • the barrier layers of the interference layers can - over the entire interference layer surface seen - have a locally different layer thickness, so that for example optical color patterns arise on the interference layer surface.
  • the area of the individual color sample components i.e. Subareas of the interference layer surface with the same Barrier layer thickness, can range from submicron to - in relation to whole interference layer surface - large areas are sufficient.
  • all reflective materials are suitable as partially transparent layer materials.
  • the coating of the barrier layer with the partially transparent layer can, for example by physical methods, such as vapor deposition or sputtering, by chemical methods, such as CVD (chemical vapor deposition) or direct chemical deposition, or by electrochemical methods happen.
  • physical methods such as vapor deposition or sputtering
  • chemical methods such as CVD (chemical vapor deposition) or direct chemical deposition, or by electrochemical methods happen.
  • the partially transparent layer can be applied to the barrier layer over the entire surface or only Affect partial areas of the interference layer surface.
  • the sub-areas also form a grid-like network.
  • partially transparent layers only partial areas of the interference layer surface, submicron structures are preferred.
  • the partially transparent layer can have a uniform layer thickness or a structured, i.e. a locally different layer thickness over the partially transparent layer demonstrate. In the latter case, for example, even with a uniformly thick barrier layer Color samples are generated.
  • the layer thickness of the partially transparent layer is expediently over the whole Interference layer surface from 0.5 to 100 nm, preferably from 1 to 80 nm and in particular from 2 to 30 nm.
  • the partially transparent layer can also preferably be a sol-gel layer with a layer thickness of 0.5 to 250 ⁇ m and in particular from 0.5 to 150 ⁇ m with embedded reflective Represent particles, the dimensions of the reflecting particles preferably in the micron or submicron range and in particular in the submicron range.
  • reflective Particles are preferably suitable metal particles and in particular those made of Ag, Al, Au, Cr, Cu, Nb, Ni, Pt, Pd, Rh, Ta, Ti, or from metal alloys containing at least one of these aforementioned elements.
  • the reflective particles can be uniform in the Sol-gel layer can be distributed or essentially all in one to the barrier layer surface parallel plane.
  • the partially transparent sol-gel layer especially if it is essentially uniform has reflective particles distributed in the sol-gel layer, a locally different one Layer thickness. This can result in interference layers with optical color patterns.
  • the locally different layer thickness of the partially transparent sol-gel layer can, for example be produced by roll embossing, possibly after a previous one Heat treatment in which the sol-gel layer is at least partially polymerized or cured becomes.
  • the protective layer can be any transparent layer that offers mechanical and / or chemical protection to the partially transparent layer.
  • the transparent layer is a lacquer, oxide or sol-gel layer.
  • the lacquer layer is understood to mean, for example, a colorless, transparent, organic protective layer.
  • Layers made of SiO 2 , Al 2 O 3 , TiO 2 or CeO 2 are preferred as oxide layers.
  • sol-gel layers are layers that are produced using a sol-gel process.
  • the layer thickness of such a transparent protective layer is, for example, 0.5 to 250 ⁇ m, suitably 1 to 200 ⁇ m and preferably 1 to 150 ⁇ m.
  • the transparent one Protective layer can, for example, serve as the front end of the interference layer Protection against the effects of weather or liquids that favor corrosion (acidic Rain, bird droppings, etc.) can be applied.
  • the sol-gel layers have a glass-like character.
  • Sol-gel layers contain, for example, polymerization products from organically substituted alkoxysiloxanes of the general formula Y n Si (OR) 4-n where Y is for example a non-hydrolyzable monovalent organic group and R is for example an alkyl, aryl, alkaryl or aralkyl group, and n is a natural number from 0 to 3. If n is 1 or 2, R can be a C 1 -C 4 alkyl group. Y can be a phenyl group, n can be 1 and R can be a methyl group.
  • the sol-gel layer can be a polymerization product of organically substituted alkoxy compounds of the general formula X n AR 4-n where A is Si, Ti, Zr or Al, X is HO, alkyl-O or Cl-, R is phenyl, alkyl, alkenyl, vinyl ester or epoxy ether and n is a number of 1, 2 or 3 means.
  • the sol-gel layers are advantageous directly or indirectly through a sol-gel process applied to the interference layer.
  • a sol-gel process applied to the interference layer.
  • alkoxides and halosilanes mixed and in the presence of water and suitable catalysts hydrolyzed and condensed. After removal of water and solvent, it forms a sol that is applied to the interference layer by immersion, spinning, spraying, etc. , whereby the sol converts into a gel film, for example under influence of temperature and / or radiation.
  • silanes are used to form the sol, it is also possible to partially replace the silanes with compounds which instead of silicon contain titanium, zircon or aluminum. So that the hardness, density and the refractive index of the sol-gel layer can be varied.
  • the hardness of the sol-gel layer can also be controlled using various silanes, for example by forming an inorganic network to control hardness and thermal Stability or by using an organic network to control elasticity.
  • a sol-gel layer between the inorganic and organic polymers can be classified via the sol-gel process through targeted hydrolysis and Condensation of alkoxides, mainly of silicon, aluminum, titanium and zircon the interference layers are applied. The process turns it into an inorganic Network built up and over correspondingly derivatized silicic acid esters can additionally organic groups are built in, on the one hand for functionalization and on the other can be used to form defined organic polymer systems.
  • the sol-gel film can also be electro-coated according to the cataphoretic principle Deposition of an amine and organically modified ceramic can be deposited.
  • interference layers according to the invention are preferably suitable for lighting technology Applications, for example for creating surfaces with intense colors and / or colors dependent on the illumination and / or viewing angle for, for example decorative lights, mirrors or decorative surfaces of ceiling or wall elements.
  • Corresponding interference layers can also be used as forgery-proof surfaces everyday objects, such as packaging or containers, be used.
  • Such interference layers are also preferred as Surfaces of auto parts, in particular body parts, profiles or facade elements used for the construction industry, or for interior furnishings.
  • the present invention also relates to a method for producing the previously described Interference layer as a coloring surface layer of an aluminum body.
  • this is achieved in that the surface of the aluminum body is oxidized electrolytically in an electrolyte which does not redissolve the aluminum oxide, and the desired layer thickness d of the oxide layer formed, measured in nm, by choosing a constant electrolysis DC voltage U in volts, which is determined by d /1.6 ⁇ U ⁇ d /1.1 is selected, is set, and the aluminum oxide layer formed in this way is provided with a partially transparent layer on its free surface.
  • interference layers according to the invention requires a clean aluminum surface, i.e. the aluminum surface to be electrolytically oxidized usually has to prior to the method of surface treatment according to the invention, the so-called Pretreatment.
  • the aluminum surfaces usually have a naturally occurring oxide layer, which is often contaminated by foreign substances due to its history.
  • Foreign substances can, for example, residues of rolling aids, transport protection oils, Corrosion products or pressed-in foreign particles and the like.
  • Cleaning agents that exert a certain pickling attack are chemically pretreated.
  • alkaline degreasing agents are particularly suitable based on polyphosphate and borate.
  • a cleaning with moderate to strong Material removal involves pickling or etching using strongly alkaline or acid pickling solutions, such as. Sodium hydroxide solution or a mixture of nitric acid and hydrofluoric acid.
  • a cleaning without Surface erosion is the degreasing of the surfaces by using organic solvents or aqueous or alkaline cleaner.
  • Such surface pretreatment can be done, for example, by grinding, Blasting, brushing or polishing are done and, if necessary, by chemical aftertreatment be supplemented.
  • Aluminum surfaces show a very high reflectivity in the bare metal state for light and heat rays. The smoother the surface, the higher the level Reflection and the more shiny the surface appears. You get the highest shine Pure aluminum and on special alloys, such as AlMg or AlMgSi.
  • a highly reflective surface is achieved, for example, by polishing, milling, or rolling with highly polished rollers in the last rolling pass, by chemical or electrolytic Shine, or by combining the aforementioned surface treatment processes reached.
  • Polishing can be done with buffing wheels made of a soft cloth, for example and if necessary done using a polishing paste.
  • polishing through Rolling can take place in the last rolling pass, for example by means of engraved or etched steel rolls or by a predetermined structure and between the rolls and the rolling stock arranged means additionally a predetermined surface structure in the aluminum surface be impressed.
  • the chemical shine happens through, for example Use of a highly concentrated mixture of acids at usually high temperatures of approx. 100 ° C. Acidic or alkaline electrolytes can be used for electrolytic shining are used, usually acidic electrolytes being preferred.
  • the barrier layers of the interference layers according to the invention point to aluminum surfaces a purity of 99.5 to 99.98 wt .-% no significant changes in lighting technology the surface properties of the original aluminum surfaces, i.e. the Surface condition of the aluminum surfaces, such as that present after the shine is largely retained after the application of the barrier layer. It is however, take into account that the metal purity of the surface layer, for example the glossy result of an aluminum surface can very well have an influence.
  • the aluminum surface to be oxidized with a with regard to the desired color or with regard to the desired color structure provided predetermined surface condition and then electrically conductive liquid, the electrolyte, and as an anode to a DC voltage source connected, usually stainless steel, graphite, Lead or aluminum is used.
  • the electrolyte is such that that it does not chemically dissolve the aluminum oxide formed during the electrolysis process, i.e. there is no redissolution of the aluminum oxide.
  • hydrogen gas develops at the cathode and oxygen gas at the anode.
  • the one at the Oxygen formed on the aluminum surface forms a reaction with the aluminum increasingly thicker oxide layer during the process. Since the sheet resistance with the increasing thickness of the barrier layer increases rapidly, the current flow decreases accordingly quickly and the layer growth stops.
  • the electrolytic production of barrier layers according to the present invention permits precise control of the resulting barrier layer layer thickness.
  • the maximum layer thickness in nanometers (nm) achieved with the method according to the invention corresponds in a first approximation to the voltage applied and measured in volts (V), ie the maximum layer thickness achieved is linearly dependent on the anodizing voltage.
  • the exact value of the maximum layer thickness as a function of the applied DC voltage U can be determined by a simple preliminary test and is 1.1 to 1.6 nm / V, the exact values of the layer thickness depending on the voltage applied being dependent on the electrolyte used, ie its composition and its temperature, and the material composition of the surface layer of the aluminum body.
  • the measurement of the color tint of the interference layer surface can be done, for example, by means of a spectrometer.
  • the barrier layers are almost non-porous, i.e. any pores that occur result, for example, from contamination in the Electrolytes or from structural defects in the aluminum surface layer, however only insignificant due to dissolution of the aluminum oxide in the electrolyte.
  • non-redissolving electrolytes can be used in the process according to the invention organic or inorganic acids, usually diluted with water, with a pH of 2 and larger, preferably 3 and larger, in particular 4 and larger and 8.5 and smaller, preferably 7 and smaller, in particular 5.5 and smaller, can be used.
  • processable electrolytes are particularly preferred or organic acids, such as sulfuric or phosphoric acid in low concentrations, Boric acid, adipic acid, citric acid or tartaric acid, or mixtures thereof, or Solutions of ammonium or sodium salts of organic or inorganic acids, in particular the named acids and their mixtures.
  • the Solutions preferably have a total concentration of 100 g / l or less, in particular 2 to 70 g / l of ammonium or sodium salt dissolved in the electrolyte. Very particularly preferred be solutions of ammonium salts of citric or tartaric acid or Sodium salts of phosphoric acid.
  • a very particularly preferred electrolyte contains 1 to 5% by weight of tartaric acid, to which, for example, an amount of ammonium hydroxide (NH 4 OH) corresponding to the desired pH value can be added.
  • NH 4 OH ammonium hydroxide
  • the electrolytes are usually aqueous solutions.
  • the optimum electrolyte temperature for the method according to the invention depends on the one used Electrolytes off; but is generally for the quality of the barrier layer obtained of minor importance. Temperatures are used for the method according to the invention from 15 to 97 ° C and especially those between 18 and 50 ° C preferred.
  • the precise control of the barrier layer thickness with the method according to the invention allows, for example by means of appropriately designed, tip-shaped or plate-shaped cathodes, that is to say by controlling the locally acting anodizing potential, the production of locally different but predetermined barrier layer thicknesses, as a result of which, for example, interference layer surfaces are formed with predefined color patterns can.
  • the DC electrolysis voltage U applied during the anodic oxidation of the aluminum surface is chosen to be different locally, so that after the partially transparent layer has been applied, a structured coloring or a color pattern with, for example, intensive colors is obtained.
  • the locally different anodizing potential required for the production of color samples is preferably achieved by choosing a predetermined cathode shape.
  • the process according to the invention is particularly suitable for continuous production of interference layers through continuous electrolytic oxidation of the aluminum surface and / or continuous application of the partially transparent layer in a continuous system, preferably in an anodic strip anodizing and coating system.
  • Aluminum body with a purity of 99.90% by weight Al with a high gloss surface and Aluminum body with a purity of 99.85% by weight Al with an electrochemically roughened High-gloss surfaces are electrolytically polished and provided with a barrier layer, the electrochemically roughened high-gloss surface is also referred to as a matt gloss Surface is called.
  • the anodizing voltage in the range from 60 to 280 V barrier layers with layer thicknesses of 78 to 364 nm are produced. Samples are provided with an approximately 10 nm thick partially transparent layer of Au or Pt. the resulting interference layer surfaces show the Al surface texture, and colors depending on the viewing angle and the thickness of the barrier layer.
  • Tables 1 and 2 show the results of the micro-color measurements according to DIN 5033 for High-gloss surfaces produced, different thickness barrier layers, with an approximately 10 nm thick, partially transparent metal layer are provided, in Table 1 the corresponding Values for a partially transparent layer made of Au and in Table 2 the values for a partially transparent one Layer of Pt are listed.
  • micro-color measurements according to DIN 5033 are non-directional on the interference layer surface incident light.
  • the direction of observation is against the Interference layer surface normal inclined by 8 °.
  • L *, a * and b * are color numbers.
  • L * represents the brightness, where 0 means absolutely black and 100 absolutely white.
  • a * denotes a value on the Red-green axis, where positive a * values indicate red and negative a * values green colors.
  • b * shows the position of the hue on the yellow-blue axis, with positive b * values yellow and negative b * values denote blue colors.
  • the location of a hue in the a * -b * Level thus provides information about its hue and its saturation.
  • Anodizing voltage [V] Junction thickness [nm] Color (according to RAL) Micro-color measurements 0 ° 70 ° L * a * b * 60 78 Golden yellow Cadmium yellow 62.0 24.8 49.9 80 104 Heather violet Beige brown 53.9 32.7 -46.3 100 130 Light blue Red purple 77.2 -31.0 -23.4 180 234 Beige red Cadmium yellow 72.0 32.8 13.3 200 260 Heather violet Honey yellow 65.1 55.9 -32.4 220 286 Blue purple Blue purple 66.3 14.7 -30.5 240 312 Emerald green Heather violet 77.5 -57.1 17.7 260 338 Light green Blue purple 82.8 -44.3 61.4 280 364 Ocher yellow Emerald green 81.9 9.1 28.4 Anodizing voltage [V] Junction thickness [nm] Color (according to RAL) Micro-color measurements 0 ° 70 ° L * a *
  • Tables 3 and 4 show the results of the micro-color measurements according to DIN 5033 for barrier layers of various thicknesses produced on matt glossy surfaces, which are provided with a 10 nm thick, partially transparent metal layer, in Table 3 the corresponding values for a partially transparent layer Au and in Table 4 the values for a partially transparent layer of Pt are listed.
  • Table 5 shows the comparison of results of the micro-color measurements according to DIN 5033 for interference layers with and without a partially transparent layer for selected junction thickness values.
  • Junction thickness [nm] Matt surface not steamed Au-steamed Pt-vaporized L * a * b * L * a * b * L * a * b * 104 90.6 -1.2 -6.4 57.8 40.5 -26.1 55.0 13.2 -8.5 234 93.1 3.7 0.3 81.3 16.9 55.8 75.9 8.2 22.6 364 94.4 -0.3 3.1 86.0 -12.6 59.0 84.0 -6.9 39.3
  • Junction thickness [nm] High gloss surface not steamed Au-steamed Pt-vaporized L * a * b * L * a * b * L * a * b * 104 88.0 -3.7 -5.5 53.9 32.7 -46.3 60.2 11.3 -17.1 234 87.4 3.1 -4.4 72.0 32.8 13.3 59.4 21.0 2.7
  • An aluminum foil with an electrolytically polished high-gloss aluminum surface is selected by choosing the anodizing voltage in the range from 30 to 380 V according to the invention Provide barrier layers with layer thicknesses of 39 to 494 nm.
  • the barriers will continue with a partially transparent chrome layer with a uniform for all samples Layer thickness, which is in the layer thickness range of 1 to 5 nm, provided.
  • the application The chrome layer is made by sputtering in a belt process, the belt speed is about 25 m / min.
  • Table 6 shows the results of the micro-color measurements according to DIN 5033 for the interference layers described above. The comments made in Example 1 apply to the micro-color measurements.
  • the additional color specifications according to RAL in Table 6 relate to the visually perceptible colors at a viewing angle of 0 ° and 80 ° with respect to the interference layer surface normals.

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Abstract

Interference layer contains an aluminium oxide layer and a partially transparent layer deposited on it. The novelty is that the aluminium oxide layer is an anodically produced, transparent and pore-free barrier layer with a thickness of according to the required surface colouring of the interference layer. The thickness d is 20-900 nm, and the partially transparent layer has a wavelength dependent transmission t( lambda )) which is 0.1-1. Production of the interference layer is also claimed.

Description

Vorliegende Erfindung betrifft eine Interferenzschicht als farbgebende Oberflächenschicht von Aluminiumkörpern, enthaltend eine Aluminiumoxidschicht sowie eine auf diese abgeschiedene teiltransparente Schicht. Die Erfindung betrifft weiter ein Verfahren zur Herstellung der erfindungsgemässen Interferenzschicht.The present invention relates to an interference layer as a coloring surface layer of aluminum bodies containing an aluminum oxide layer and one deposited thereon semi-transparent layer. The invention further relates to a method of manufacture the interference layer according to the invention.

Interferenzschichten, welche gewisse Längenwellen des einfallenden Lichtes durch Interferenz eliminieren, sind in der Optik als sogenannte Filter bekannt. Die Herstellung solcher Filter geschieht üblicherweise durch Aufbringen einer hochreinen, dünnen Metallschicht auf Glas, durch nachfolgende Deposition einer dielektrischen Schicht, sowie durch das weitere Aufbringen einer halbtransparenten Metallschicht. Die Deposition der einzelnen Schichten geschieht üblicherweise durch Anwendung von PVD- (physical vapour deposition) Methoden, wie Sputtern oder Aufdampfen.Interference layers, which certain length waves of the incident light by interference eliminate are known in optics as so-called filters. The manufacture of such filters usually happens by applying a high-purity, thin metal layer Glass, by subsequent deposition of a dielectric layer, and by the further Apply a semi-transparent metal layer. The deposition of the individual layers is usually done using PVD (physical vapor deposition) methods, like sputtering or vapor deposition.

Die hochreine, dünne Metallschicht besteht beispielsweise aus Aluminium. Als dielektrische Schichten werden üblicherweise Al2O3- oder SiOx-Schichten verwendet. Der geringen Schichtdicke wegen, können PVD-Al-Schichten im allgemeinen nicht anodisiert werden, so dass als dielektrische Schichten meist PVD-Al2O3 oder PVD-SiO2 verwendet werden. Das Aufbringen von PVD-Al2O3-Schichten oder PVD-SiO2-Schichten ist jedoch teuer. Zudem weisen dielektrische Schichten, welche mittels PVD-Methoden auf die Aluminiumoberfläche aufgebracht werden, teilweise eine ungenügende Haftung auf. Für die halbtransparenten Schichten werden üblicherweise Metalle, wie beispielsweise hochreines Aluminium, verwendet. Zur Herstellung einer dielektrischen Schicht auf einer Aluminiumoberfläche kann an sich auch das bekannte GS-Verfahren, d.h. die anodische Oxidation der Aluminiumoberfläche mit Gleichstrom in einem Schwefelsäureelektrolyten, verwendet werden. Die resultierende Schutzschicht zeigt jedoch üblicherweise eine durch das Verfahren bedingte hohe Porosität. Die Herstellung grossflächiger Oberflächenschichten mit homogener Farbgebung bedingt eine entsprechend grossflächige Schichtdickenkonstanz der Interferenzschicht. Die Herstellung einer grossflächigen dielektrischen Schicht konstanter Schichtdicke mit dem GS-Verfahren ist jedoch nur schwer zu bewerkstelligen.The high-purity, thin metal layer is made of aluminum, for example. Al 2 O 3 or SiO x layers are usually used as dielectric layers. Because of the small layer thickness, PVD-Al layers generally cannot be anodized, so that PVD-Al 2 O 3 or PVD-SiO 2 are mostly used as dielectric layers. However, the application of PVD-Al 2 O 3 layers or PVD-SiO 2 layers is expensive. In addition, dielectric layers which are applied to the aluminum surface by means of PVD methods sometimes have insufficient adhesion. Metals, such as high-purity aluminum, are usually used for the semi-transparent layers. The known GS method, ie the anodic oxidation of the aluminum surface with direct current in a sulfuric acid electrolyte, can also be used to produce a dielectric layer on an aluminum surface. However, the resulting protective layer usually shows a high porosity due to the method. The production of large surface layers with homogeneous coloring requires a correspondingly large constant layer thickness of the interference layer. However, it is difficult to produce a large-area dielectric layer with a constant layer thickness using the GS process.

Die in Schwefelsäure erzeugten anodischen Oxidschichten sind nur auf Reinstaluminium und AlMg oder AlMgSi-Legierungen auf Basis von Reinstaluminium (Al ≥ 99.85 Gew.-%) farblos und glasklar. Bei weniger reinen Werkstoffen, wie beispielsweise Al 99.85, Al 99.8 oder Al 99.5, können Legierungsbestandteile, wie beispielsweise Fe- oder Si-reiche intermetallische Phasen, in die Oxidschicht miteingebaut werden, welche dann zu unkontrollierbarer Lichtabsorption und/oder zu Lichtstreuung führen und somit mehr oder weniger getrübte Schichten, oder Schichten mit einer unkontrollierbaren Farbgebung ergeben.The anodic oxide layers produced in sulfuric acid are only on pure aluminum and AlMg or AlMgSi alloys based on pure aluminum (Al ≥ 99.85% by weight) colorless and crystal clear. For less pure materials, such as Al 99.85, Al 99.8 or Al 99.5, alloy components, such as Fe or Si-rich intermetallic Phases are built into the oxide layer, which then become uncontrollable Light absorption and / or lead to light scattering and thus more or less clouded Layers, or layers with an uncontrollable coloring result.

Aufgabe vorliegender Erfindung ist es, eine kostengünstig herzustellende Interferenzschicht als farbgebende Oberflächenschicht von Aluminiumkörpern anzugeben, welche die vorgängig erwähnten Nachteile vermeidet und die lichtechte Färbung von Aluminiumoberflächen ermöglicht, oder als selektive Reflektoroberfläche verwendet werden kann.The object of the present invention is to provide an interference layer which can be produced inexpensively to be specified as the coloring surface layer of aluminum bodies, which the previous avoids the disadvantages mentioned and enables the lightfast coloring of aluminum surfaces, or can be used as a selective reflector surface.

Erfindungsgemäss wird dies dadurch erreicht, dass die Aluminiumoxidschicht eine anodisch erzeugte, transparente, sowie porenfreie Sperrschicht mit einer gemäss der gewünschten Oberflächenfarbe der Interferenzschicht vorgewählten Sperrschichtdicke d ist, wobei die Sperrschichtdicke d zwischen 20 und 900 nm (Nanometer) beträgt, und die teiltransparente Schicht eine wellenlängenabhängige Transmission τ (λ) aufweist, die grösser als 0.01 und kleiner als 1 ist.According to the invention, this is achieved in that the aluminum oxide layer is an anodically produced, transparent and pore-free barrier layer with a barrier layer thickness d preselected according to the desired surface color of the interference layer, the barrier layer thickness d being between 20 and 900 nm (nanometers) and the partially transparent layer being one has wavelength-dependent transmission τ (λ) that is greater than 0.01 and less than 1.

Die erfindungsgemässen Interferenzschichten können beispielsweise auf Oberflächen von Stückgut, Bändern, Blechen oder Folien aus Aluminium, sowie Aluminium-Deckschichten von Körpern aus Verbundwerkstoffen, insbesondere Aluminiumdeckschichten von Verbundplatten, oder auf beliebige Werkstoffe mit einer -- beispielsweise elektrolytisch -- abgeschiedenen Aluminiumschicht aufgebracht werden.The interference layers according to the invention can, for example, on surfaces of General cargo, strips, sheets or foils made of aluminum, as well as aluminum cover layers of bodies made of composite materials, in particular aluminum cover layers of composite panels, or on any material with a - for example electrolytically - deposited Aluminum layer can be applied.

Mit dem Werkstoff Aluminium sind in vorliegendem Text Aluminium aller Reinheitsgrade sowie alle Aluminiumlegierungen umfasst. Insbesondere umfasst der Begriff Aluminium alle Walz-, Knet-, Guss-, Schmiede- und Presslegierungen aus Aluminium. Bevorzugt besteht die mit der erfindungsgemässen Interferenzschicht zu versehende Werkstoffoberfläche aus Reinaluminium mit einem Reinheitsgrad von gleich oder grösser 98.3 Gew.-% Al oder Aluminiumlegierungen aus diesem Aluminium mit wenigstens einem der Elemente aus der Reihe von Si, Mg, Mn, Cu, Zn oder Fe. Weiter bevorzugt werden Aluminiumoberflächen aus hochreinen Aluminiumlegierungen einer Reinheit von 99.99 Gew.-% Al und höher, beispielsweise aus plattiertem Material, oder einer Reinheit von 99.5 bis 99.99 Gew.-% Al.With the material aluminum, aluminum is of all purity levels in the present text as well as all aluminum alloys. In particular, the term aluminum includes everything Rolling, kneading, casting, forging and pressing alloys made of aluminum. Preferably there is pure aluminum material surface to be provided with the interference layer according to the invention With a degree of purity equal to or greater than 98.3% by weight of Al or aluminum alloys from this aluminum with at least one of the elements from the series of Si, Mg, Mn, Cu, Zn or Fe. Aluminum surfaces made from high-purity are further preferred Aluminum alloys with a purity of 99.99% by weight Al and higher, for example made of plated material, or a purity of 99.5 to 99.99 wt .-% Al.

Die Aluminiumoberflächen können beliebige Gestalt aufweisen und können gegebenenfalls auch strukturiert sein. Bei gewalzten Aluminiumoberflächen können diese beispielsweise mittels Hochglanz- oder Designerwalzen behandelt sein. Eine bevorzugte Verwendung strukturierter Aluminiumoberflächen findet sich beispielsweise für Anwendungen in der Tageslichtbeleuchtung, für beispielsweise dekorative Leuchten, Spiegel oder Dekoroberflächen von Decken- oder Wandelementen, oder für Anwendungen im Fahrzeugbau, für beispielsweise Zierteile oder Verschlüsse. Dabei gelangen insbesondere strukturierte Oberflächen mit Strukturgrössen von zweckmässigerweise 1 nm bis 1 mm und bevorzugt von 50 nm bis 100 µm zur Anwendung.The aluminum surfaces can have any shape and can optionally also be structured. In the case of rolled aluminum surfaces, these can be used, for example Be treated high gloss or designer rollers. A preferred use of structured Aluminum surfaces can be found, for example, for applications in daylight lighting, for example for decorative lights, mirrors or decorative surfaces from Ceiling or wall elements, or for applications in vehicle construction, for example Decorative parts or closures. In particular, structured surfaces with structure sizes are obtained from expediently 1 nm to 1 mm and preferably from 50 nm to 100 μm to use.

Erfindungswesentlich ist insbesondere, dass die Sperrschichtdicke entsprechend der gewünschten Farbgebung kontrolliert hergestellt wird. Zur Erreichung einer möglichst hohen Farbechtheit der Interferenzschicht muss die Sperrschicht zudem porenfrei sein. Damit wird eine schlecht kontrollierbare diffuse Lichtstreuung und damit eine ungleichmässige Farbentwicklung vermieden. Unter dem Begriff porenfrei wird jedoch nicht eine absolute Porenfreiheit verstanden. Vielmehr ist die Sperrschicht der erfindungsgemässen Interferenzschicht im wesentlichen porenfrei. Wichtig dabei ist, dass die anodisch erzeugte Aluminiumoxidschicht im wesentlichen keine verfahrensbedingte Porosität aufweist. Unter einer verfahrensbedingten Porosität wird beispielsweise die Verwendung eines Aluminiumoxid-auflösenden Elektrolyten verstanden. In vorliegender Erfindung weist die porenfreie Sperrschicht bevorzugt eine Porosität von weniger als 1 % und insbesondere von weniger als 0.5 % auf.It is particularly important to the invention that the barrier layer thickness corresponds to the desired one Coloring is produced in a controlled manner. To achieve the highest possible Color fastness of the interference layer, the barrier layer must also be non-porous. So that will Diffuse light scattering that is difficult to control and thus uneven color development avoided. However, the term non-porous does not mean absolute freedom from pores Roger that. Rather, the barrier layer of the interference layer according to the invention is in the essentially non-porous. It is important that the anodized aluminum oxide layer has essentially no process-related porosity. Under a procedural Porosity becomes, for example, the use of an aluminum oxide dissolving electrolyte Roger that. In the present invention, the pore-free barrier layer preferably has a porosity of less than 1% and in particular less than 0.5%.

Die Dielektrizitätskonstante ε der Sperrschicht hängt u.a. von den zur Herstellung der Sperrschicht verwendeten Verfahrensparameter während der anodischen Oxidation ab. Zweckmässigerweise liegt die Dielektrizitätskonstante ε der Sperrschicht bei einer Temperatur von 20 °C zwischen 6 und 10.5 und bevorzugt zwischen 8 und 10.The dielectric constant ε of the barrier layer depends, among other things. of those used to make the barrier layer used process parameters during the anodic oxidation. Conveniently the dielectric constant ε of the barrier layer is at a temperature of 20 ° C between 6 and 10.5 and preferably between 8 and 10.

Die Farbe der mit einer erfindungsgemässen Interferenzschicht versehenen Aluminiumoberfläche ist beispielsweise abhängig von der Oberflächenbeschaffenheit der Aluminiumoberfläche, vom Einfallswinkel des auf die Interferenzschichtoberfläche auftreffenden Lichtes, dem Betrachtungswinkel, der Sperschichtdicke, der Zusammensetzung und der Schichtdicke der teiltransparenten Schicht und der Transmission τ (λ) der teiltransparenten Schicht. Die wellenlängenabhängige Transmission τ (λ) ist in vorliegendem Text als Quotient τ (λ) = I/I0 definiert, wobei I0 die Lichtintensität des auf die Oberfläche der teiltransparenten Schicht auftreffenden Lichtes der Wellenlänge λ und I die Lichtintensität des aus der teiltransparenten Schicht austretenden Lichtes bezeichnet In einer bevorzugten Ausführungsform weist die erfindungsgemässe Interferenzschicht eine Transmission τ (λ) zwischen 0.3 und 0.7 auf. The color of the aluminum surface provided with an interference layer according to the invention depends, for example, on the surface quality of the aluminum surface, on the angle of incidence of the light striking the interference layer surface, the viewing angle, the thickness of the barrier layer, the composition and the layer thickness of the partially transparent layer and the transmission τ (λ) of the partially transparent one Layer. The wavelength-dependent transmission τ (λ) is defined in the present text as the quotient τ (λ) = I / I 0 , where I 0 is the light intensity of the light of the wavelength λ incident on the surface of the partially transparent layer and I is the light intensity of the from the partially transparent layer emerging light called In a preferred embodiment, the interference layer according to the invention has a transmission τ (λ) between 0.3 and 0.7.

Der optischen Eigenschaften wegen, liegt die Schichtdicke der Sperrschicht von erfindungsgemässen Interferenzschichten bevorzugt im Schichtdickenbereich zwischen 30 und 800 nm und besonders bevorzugt zwischen 35 und 500 nm.Because of the optical properties, the layer thickness of the barrier layer is in accordance with the invention Interference layers preferably in the layer thickness range between 30 and 800 nm and particularly preferably between 35 and 500 nm.

Die Sperrschichten der Interferenzschichten können -- über die ganze Interferenzschichtoberfläche gesehen -- eine lokal unterschiedliche Schichtdicke aufweisen, so dass beispielsweise optische Farbmuster auf der Interferenzschichtoberfläche entstehen. Die Fläche der einzelnen Farbmuster-Bestandteile, d.h. Teilflächen der Interferenzschichtoberfläche mit gleicher Sperrschicht-Schichtdicke, kann von submikronen Bereichen bis -- im Verhältnis zur ganzen Interferenzschichtoberfläche -- grossen Flächen reichen.The barrier layers of the interference layers can - over the entire interference layer surface seen - have a locally different layer thickness, so that for example optical color patterns arise on the interference layer surface. The area of the individual color sample components, i.e. Subareas of the interference layer surface with the same Barrier layer thickness, can range from submicron to - in relation to whole interference layer surface - large areas are sufficient.

Als teiltransparente Schichtmaterialien eignen sich prinzipiell alle reflektierenden Materialien. Bevorzugt werden handelsübliche Metalle aller Reinheiten und insbesondere Ag, Al, Au, Cr, Cu, Nb, Ni, Pt, Pd, Rh, Ta, Ti, oder Metallegierungen enthaltend wenigstens eines dieser vorgenannten Elemente.In principle, all reflective materials are suitable as partially transparent layer materials. Commercial metals of all purities and in particular Ag, Al, Au, Cr, are preferred. Cu, Nb, Ni, Pt, Pd, Rh, Ta, Ti, or metal alloys containing at least one of these aforementioned elements.

Die Beschichtung der Sperrschicht mit der teiltransparenten Schicht kann beispielsweise durch physikalische Methoden, wie Aufdampfen oder Sputtern, durch chemische Methoden, wie CVD (chemical vapour deposition) oder direkte chemische Abscheidung, oder durch elektrochemische Methoden geschehen.The coating of the barrier layer with the partially transparent layer can, for example by physical methods, such as vapor deposition or sputtering, by chemical methods, such as CVD (chemical vapor deposition) or direct chemical deposition, or by electrochemical methods happen.

Die teiltransparente Schicht kann vollflächig auf die Sperrschicht aufgebracht sein oder nur Teilbereiche der Interferenzschichtoberfläche betreffen. Beispielsweise können die Teilbereiche auch ein gitterförmiges Netz bilden. Bei teiltransparenten Schichten, die nur Teilbereiche der Interferenzschichtoberfläche betreffen, werden submikrone Strukturen bevorzugt.The partially transparent layer can be applied to the barrier layer over the entire surface or only Affect partial areas of the interference layer surface. For example, the sub-areas also form a grid-like network. With partially transparent layers, only partial areas of the interference layer surface, submicron structures are preferred.

Die teiltransparente Schicht kann eine gleichmässige Schichtdicke aufweisen oder eine strukturierte, d.h. eine über die teiltransparente Schicht örtlich unterschiedliche Schichtdicke zeigen. Im letzteren Fall können beispielsweise auch bei gleichmässig dicker Sperrschicht Farbmuster erzeugt werden.The partially transparent layer can have a uniform layer thickness or a structured, i.e. a locally different layer thickness over the partially transparent layer demonstrate. In the latter case, for example, even with a uniformly thick barrier layer Color samples are generated.

Die Schichtdicke der teiltransparenten Schicht beträgt zweckmässigerweise über die ganze Interferenzschichtoberfläche von 0.5 bis 100 nm, bevorzugt von 1 bis 80 nm und insbesondere von 2 bis 30 nm.The layer thickness of the partially transparent layer is expediently over the whole Interference layer surface from 0.5 to 100 nm, preferably from 1 to 80 nm and in particular from 2 to 30 nm.

Die teiltransparente Schicht kann auch eine Sol-Gel-Schicht einer Schichtdicke von bevorzugt 0.5 bis 250 µm und insbesondere von 0.5 bis 150 µm mit eingelagerten reflektierenden Partikel darstellen, wobei die Abmessungen der reflektierenden Partikel bevorzugt im mikronen oder submikronen Bereich und insbesondere im submikronen Bereich liegen. Als reflektierende Partikel eignen sich bevorzugt Metallpartikel und insbesondere solche aus Ag, Al, Au, Cr, Cu, Nb, Ni, Pt, Pd, Rh, Ta, Ti, oder aus Metallegierungen enthaltend wenigstens eines dieser vorgenannten Elemente. Die reflektierenden Partikel können gleichmässig in der Sol-Gel-Schicht verteilt sein oder können sich im wesentlichen alle in einer zur Sperrschichtoberfläche parallel liegenden Ebene befinden. In einer bevorzugten Ausführungsform weist die teiltransparente Sol-Gel-Schicht, insbesondere wenn diese im wesentlichen gleichmässig in der Sol-Gel-Schicht verteilte reflektierende Partikel aufweist, eine lokal unterschiedliche Schichtdicke auf. Dadurch können Interferenzschichten mit optischen Farbmuster entstehen. Die lokal unterschiedliche Schichtdicke der teiltransparenten Sol-Gel-Schicht kann beispielsweise durch Walzprägen hergestellt werden, gegebenenfalls nach einer zuvor erfolgten Wärmebehandlung, bei der die Sol-Gel-Schicht wenigstens teilweise polymerisiert oder ausgehärtet wird.The partially transparent layer can also preferably be a sol-gel layer with a layer thickness of 0.5 to 250 µm and in particular from 0.5 to 150 µm with embedded reflective Represent particles, the dimensions of the reflecting particles preferably in the micron or submicron range and in particular in the submicron range. As reflective Particles are preferably suitable metal particles and in particular those made of Ag, Al, Au, Cr, Cu, Nb, Ni, Pt, Pd, Rh, Ta, Ti, or from metal alloys containing at least one of these aforementioned elements. The reflective particles can be uniform in the Sol-gel layer can be distributed or essentially all in one to the barrier layer surface parallel plane. In a preferred embodiment the partially transparent sol-gel layer, especially if it is essentially uniform has reflective particles distributed in the sol-gel layer, a locally different one Layer thickness. This can result in interference layers with optical color patterns. The locally different layer thickness of the partially transparent sol-gel layer can, for example be produced by roll embossing, possibly after a previous one Heat treatment in which the sol-gel layer is at least partially polymerized or cured becomes.

Um die Interferenzschichten vor mechanischen und chemischen Einflüssen besser zu schützen, weisen diese in einer bevorzugten Weiterbildung auf der von der Sperrschicht abgewandten Seite der teiltransparenten Schicht eine transparente Schutzschicht auf. Die Schutzschicht kann eine beliebige transparente Schicht darstellen, die der teiltransparenten Schicht mechanischen und/oder chemischen Schutz bietet. Beispielsweise stellt die transparente Schicht eine Lack-, Oxid- oder Sol-Gel-Schicht dar. Als Lackschicht wird beispielsweise eine farblose, transparente, organische Schutzschicht verstanden. Als Oxidschichten werden Schichten aus SiO2, Al2O3, TiO2 oder CeO2 bevorzugt. Als Sol-Gel Schichten werden in vorliegendem Text Schichten bezeichnet, die mit einem Sol-Gel Verfahren hergestellt werden.In order to better protect the interference layers from mechanical and chemical influences, in a preferred development they have a transparent protective layer on the side of the partially transparent layer facing away from the barrier layer. The protective layer can be any transparent layer that offers mechanical and / or chemical protection to the partially transparent layer. For example, the transparent layer is a lacquer, oxide or sol-gel layer. The lacquer layer is understood to mean, for example, a colorless, transparent, organic protective layer. Layers made of SiO 2 , Al 2 O 3 , TiO 2 or CeO 2 are preferred as oxide layers. In the present text, sol-gel layers are layers that are produced using a sol-gel process.

Die Schichtdicke einer solchen transparenten Schutzschicht beträgt beispielsweise 0.5 bis 250 µm, zweckmässigerweise 1 bis 200 µm und bevorzugt 1 bis 150 µm. Die transparente Schutzschicht kann beispielsweise als frontseitiger Abschluss der Interferenzschicht zum Schutz vor Witterungseinflüssen oder vor Korrosion begünstigenden Flüssigkeiten (saurer Regen, Vogelkot u.s.w.) aufgebracht werden.The layer thickness of such a transparent protective layer is, for example, 0.5 to 250 µm, suitably 1 to 200 µm and preferably 1 to 150 µm. The transparent one Protective layer can, for example, serve as the front end of the interference layer Protection against the effects of weather or liquids that favor corrosion (acidic Rain, bird droppings, etc.) can be applied.

Die Sol-Gel Schichten haben glasartigen Charakter. Sol-Gel-Schichten enthalten beispielsweise Polymerisationsprodukte aus organisch substituierten Alkoxysiloxanen der allgemeinen Formel YnSi(OR)4-n wobei Y z.B. eine nicht-hydrolisierbare monovalente organische Gruppe und R z.B. eine Alkyl-, Aryl-, Alkaryl- oder Aralkyl-Gruppe bezeichnen, und n eine natürliche Zahl von 0 bis 3 ist. Beträgt n gleich 1 oder 2, kann R eine C1-C4-Alkyl-Gruppe sein. Y kann eine Phenylgruppe, n gleich 1 und R eine Methylgruppe sein.The sol-gel layers have a glass-like character. Sol-gel layers contain, for example, polymerization products from organically substituted alkoxysiloxanes of the general formula Y n Si (OR) 4-n where Y is for example a non-hydrolyzable monovalent organic group and R is for example an alkyl, aryl, alkaryl or aralkyl group, and n is a natural number from 0 to 3. If n is 1 or 2, R can be a C 1 -C 4 alkyl group. Y can be a phenyl group, n can be 1 and R can be a methyl group.

In anderer Ausführungsform kann die Sol-Gel-Schicht ein Polymerisationsprodukt aus organisch substituierten Alkoxyverbindungen der allgemeinen Formel XnAR4-n sein, wobei A die Bedeutung von Si, Ti, Zr oder Al hat, X die Bedeutung von HO-, Alkyl-O- oder Cl- hat, R die Bedeutung von Phenyl, Alkyl, Alkenyl, Vinylester oder Epoxyether hat und n eine Zahl von 1, 2 oder 3 bedeutet. Beispiele für Phenyl sind unsubstituiertes Phenyl, oder mono-, di- oder trisubstituiertes C1-C9-alkylsubstituiertes Phenyl, für Alkyl gleich Methyl, Ethyl, Propyl, iso-Propyl, n-Butyl, iso-Butyl, Pentyl usw., für Alkenyl -CH=CH2, Allyl, 2-Methylallyl, 2-Butenyl usw., für Vinylester -(CH2)3-O-C(=O)-C(-CH3)=CH2 und für Epoxyether -(CH2)3-O-CH2-CH(-O-)CH2.In another embodiment, the sol-gel layer can be a polymerization product of organically substituted alkoxy compounds of the general formula X n AR 4-n where A is Si, Ti, Zr or Al, X is HO, alkyl-O or Cl-, R is phenyl, alkyl, alkenyl, vinyl ester or epoxy ether and n is a number of 1, 2 or 3 means. Examples of phenyl are unsubstituted phenyl, or mono-, di- or trisubstituted C 1 -C 9 -alkyl-substituted phenyl, for alkyl equal to methyl, ethyl, propyl, isopropyl, n-butyl, isobutyl, pentyl etc. for Alkenyl -CH = CH 2 , allyl, 2-methylallyl, 2-butenyl etc., for vinyl ester - (CH 2 ) 3 -OC (= O) -C (-CH 3 ) = CH 2 and for epoxy ether - (CH 2 ) 3 -O-CH 2 -CH (-O-) CH 2 .

Die Sol-Gel-Schichten werden vorteilhaft durch einen Sol-Gel-Prozess direkt oder indirekt auf die Interferenzschicht aufgebracht. Zu diesem Zwecke werden beispielsweise Alkoxide und Halogensilane gemischt und in Gegenwart von Wasser und geeigneten Katalysatoren hydrolysiert und kondensiert. Nach Entfernung des Wassers und Lösungsmittels bildet sich ein Sol, das durch Eintauchen, Schleudem, Spritzen usw. auf die Interferenzschicht aufgebracht wird, wobei sich das Sol in einen Gel-Film umwandelt, beispielsweise unter Einfluss von Temperatur und/oder Strahlung. In der Regel werden zur Bildung des Sols Silane verwendet, es ist auch möglich, die Silane teilweise durch Verbindungen zu ersetzen, welche anstelle des Siliciums Titan, Zirkon oder Aluminium enthalten. Damit kann die Härte, Dichte und der Brechungsindex der Sol-Gel-Schicht variiert werden. Die Härte der Sol-Gel-Schicht kann ebenso durch die Verwendung verschiedener Silane gesteuert werden, beispielsweise durch Ausbildung eines anorganischen Netzwerkes zur Steuerung der Härte und thermischen Stabilität oder durch Verwendung eines organischen Netzwerkes zur Steuerung der Elastizität. Eine Sol-Gel Schicht, welche zwischen den anorganischen und organischen Polymeren eingeordnet werden kann, kann über den Sol-Gel-Prozess durch gezielte Hydrolyse und Kondensation von Alkoxiden, vorwiegend des Siliciums, Aluminiums, Titans und Zirkons auf den Interferenzschichten aufgebracht werden. Durch den Prozess wird ein anorganisches Netzwerk aufgebaut und über entsprechend derivatisierte Kieselsäure-Ester können zusätzlich organische Gruppen eingebaut werden, die einerseits zur Funktionalisierung und andererseits zur Ausbildung definierter organischer Polymersysteme genutzt werden. Im weiteren kann der Sol-Gel-Film auch durch Elektro-Tauchlackierung nach dem Prinzip der kataphoretischen Abscheidung einer amin- und organisch modifizierten Keramik abgeschieden werden.The sol-gel layers are advantageous directly or indirectly through a sol-gel process applied to the interference layer. For this purpose, for example, alkoxides and halosilanes mixed and in the presence of water and suitable catalysts hydrolyzed and condensed. After removal of water and solvent, it forms a sol that is applied to the interference layer by immersion, spinning, spraying, etc. , whereby the sol converts into a gel film, for example under influence of temperature and / or radiation. As a rule, silanes are used to form the sol, it is also possible to partially replace the silanes with compounds which instead of silicon contain titanium, zircon or aluminum. So that the hardness, density and the refractive index of the sol-gel layer can be varied. The hardness of the sol-gel layer can also be controlled using various silanes, for example by forming an inorganic network to control hardness and thermal Stability or by using an organic network to control elasticity. A sol-gel layer between the inorganic and organic polymers can be classified via the sol-gel process through targeted hydrolysis and Condensation of alkoxides, mainly of silicon, aluminum, titanium and zircon the interference layers are applied. The process turns it into an inorganic Network built up and over correspondingly derivatized silicic acid esters can additionally organic groups are built in, on the one hand for functionalization and on the other can be used to form defined organic polymer systems. In the further the sol-gel film can also be electro-coated according to the cataphoretic principle Deposition of an amine and organically modified ceramic can be deposited.

Die erfindungsgemässen Interferenzschichten eignen sich bevorzugt für lichttechnische Anwendungen, beispielsweise zur Erzeugung von Oberflächen mit intensiven Farben und/oder von vom Beleuchtungs- und/oder Betrachtungswinkel abhängigen Farben für beispielsweise dekorative Leuchten, Spiegel oder Dekoroberflächen von Decken- oder Wandelementen. Zudem können entsprechende Interferenzschichten als fälschungssichere Oberflächen von Gegenständen des täglichen Lebens, beispielsweise von Verpackungen oder Containern, eingesetzt werden. Im weiteren werden derartige Interferenzschichten bevorzugt als Oberflächen von Autoteilen, insbesondere Karosserieteilen, von Profilen oder von Fassadenelementen für die Bauwirtschaft, oder für Inneneinrichtungsgegenstände verwendet.The interference layers according to the invention are preferably suitable for lighting technology Applications, for example for creating surfaces with intense colors and / or colors dependent on the illumination and / or viewing angle for, for example decorative lights, mirrors or decorative surfaces of ceiling or wall elements. Corresponding interference layers can also be used as forgery-proof surfaces everyday objects, such as packaging or containers, be used. Such interference layers are also preferred as Surfaces of auto parts, in particular body parts, profiles or facade elements used for the construction industry, or for interior furnishings.

Vorliegende Erfindung betrifft auch ein Verfahren zur Herstellung der vorgängig beschriebenen Interferenzschicht als farbgebende Oberflächenschicht eines Aluminiumkörpers.The present invention also relates to a method for producing the previously described Interference layer as a coloring surface layer of an aluminum body.

Erfindungsgemäss wird dies dadurch erreicht, dass die Oberfläche des Aluminiumkörpers elektrolytisch, in einem das Aluminiumoxid nicht rücklösenden Elektrolyten oxidiert wird, und die gewünschte Schichtdicke d der entstehenden Oxidschicht, gemessen in nm, durch Wahl einer konstanten Elektrolyse-Gleichspannung U in Volt, die nach Massgabe d/1.6 ≤ Ud/1.1 gewählt ist, eingestellt wird, und die derart gebildete Aluminiumoxidschicht auf ihrer freien Oberfläche mit einer teiltransparenten Schicht versehen wird.According to the invention, this is achieved in that the surface of the aluminum body is oxidized electrolytically in an electrolyte which does not redissolve the aluminum oxide, and the desired layer thickness d of the oxide layer formed, measured in nm, by choosing a constant electrolysis DC voltage U in volts, which is determined by d /1.6 ≤ U d /1.1 is selected, is set, and the aluminum oxide layer formed in this way is provided with a partially transparent layer on its free surface.

Die Herstellung erfindungsgemässer Interferenzschichten bedingt eine saubere Aluminiumoberfläche, d.h. die elektrolytisch zu oxidierende Aluminiumoberfläche muss üblicherweise vorgängig zum erfindungsgemässen Verfahren einer Oberflächenbehandlung, der sogenannten Vorbehandlung, zugeführt werden.The production of interference layers according to the invention requires a clean aluminum surface, i.e. the aluminum surface to be electrolytically oxidized usually has to prior to the method of surface treatment according to the invention, the so-called Pretreatment.

Die Aluminiumoberflächen weisen üblicherweise eine natürlich entstehende Oxidschicht auf, die häufig aufgrund ihrer Vorgeschichte durch Fremdsubstanzen verunreinigt ist. Solche Fremdsubstanzen können beispielsweise Reste von Walzhilfsmitteln, Transportschutzölen, Korrosionsprodukte oder eingepresste Fremdpartikel und ähnlichem sein. Zum Zwecke der Entfernung solcher Fremdsubstanzen werden die Aluminiumoberflächen üblicherweise mit Reinigungsmitteln, die einen gewissen Beizangriff ausüben, chemisch vorbehandelt. Dazu eignen sich -- neben sauren wässrigen Entfettungsmitteln -- insbesondere alkalische Entfettungsmittel auf Basis Polyphosphat und Borat. Eine Reinigung mit mässigem bis starkem Materialabtrag bildet das Beizen oder Aetzen mittels stark alkalischen oder sauren Beizlösungen, wie z.B. Natronlauge oder ein Gemisch aus Salpetersäure und Flussäure. Dabei werden die natürliche Oxidschicht und damit auch alle darin eingebauten Verunreinigungen entfernt. Bei Verwendung von stark angreifenden alkalischen Beizen entstehen oft Beizbeläge, die durch eine saure Nachbehandlung entfernt werden müssen. Eine Reinigung ohne Oberflächenabtrag bildet das Entfetten der Oberflächen durch Anwendung organischer Lösungsmittel oder wässriger oder alkalischer Reiniger.The aluminum surfaces usually have a naturally occurring oxide layer, which is often contaminated by foreign substances due to its history. Such Foreign substances can, for example, residues of rolling aids, transport protection oils, Corrosion products or pressed-in foreign particles and the like. For the purpose of The removal of such foreign substances usually involves the aluminum surfaces Cleaning agents that exert a certain pickling attack are chemically pretreated. To In addition to acidic aqueous degreasing agents, alkaline degreasing agents are particularly suitable based on polyphosphate and borate. A cleaning with moderate to strong Material removal involves pickling or etching using strongly alkaline or acid pickling solutions, such as. Sodium hydroxide solution or a mixture of nitric acid and hydrofluoric acid. Here the natural oxide layer and with it all impurities built into it away. When using strongly attacking alkaline stains, stain deposits often arise, which have to be removed by an acidic aftertreatment. A cleaning without Surface erosion is the degreasing of the surfaces by using organic solvents or aqueous or alkaline cleaner.

Je nach Oberflächenzustand ist auch ein mechanischer Oberflächenabtrag durch abrasive Mittel notwendig. Eine solche Oberflächenvorbehandlung kann beispielsweise durch Schleifen, Strahlen, Bürsten oder Polieren geschehen und gegebenenfalls durch eine chemische Nachbehandlung ergänzt werden.Depending on the surface condition, there is also mechanical surface abrasion necessary. Such surface pretreatment can be done, for example, by grinding, Blasting, brushing or polishing are done and, if necessary, by chemical aftertreatment be supplemented.

Aluminiumoberflächen zeigen im metallisch blanken Zustand ein sehr hohes Reflexionsvermögen für Licht- und Wärmestrahlen. Je glatter die Oberfläche, desto höher ist die gerichtete Reflexion und desto glänzender wirkt die Oberfläche. Höchsten Glanz erziehlt man auf Reinstaluminium und auf Speziallegierungen, wie beispielsweise AlMg oder AlMgSi.Aluminum surfaces show a very high reflectivity in the bare metal state for light and heat rays. The smoother the surface, the higher the level Reflection and the more shiny the surface appears. You get the highest shine Pure aluminum and on special alloys, such as AlMg or AlMgSi.

Eine hoch reflektierende Oberfläche wird beispielsweise durch Polieren, Fräsen, durch Walzen mit hochglanzpolierten Walzen im letzten Walzgang, durch chemisches oder elektrolytisches Glänzen, oder durch Kombination der vorgenannten Oberflächenbehandlungsverfahren erreicht. Das Polieren kann beispielsweise mit Schwabbelscheiben aus weichem Tuch und gegebenfalls unter Verwendung einer Polierpaste geschehen. Beim Polieren durch Walzen kann im letzten Walzgang beispielsweise mittels gravierter oder geätzter Stahlwalzen oder durch eine vorgegeben Struktur aufweisende und zwischen den Walzen und dem Walzgut angeordnete Mittel zusätzlich eine vorgegebene Oberflächenstruktur in die Aluminiumoberfläche eingeprägt werden. Das chemische Glänzen geschieht beispielsweise durch Anwendung eines hochkonzentrierten Säuregemisches bei üblicherweise hohen Temperaturen von ca. 100 °C. Für das elektrolytische Glänzen können saure oder alkalische Elektrolyten eingesetzt werden, wobei üblicherweise saure Elektrolyten bevorzugt werden.A highly reflective surface is achieved, for example, by polishing, milling, or rolling with highly polished rollers in the last rolling pass, by chemical or electrolytic Shine, or by combining the aforementioned surface treatment processes reached. Polishing can be done with buffing wheels made of a soft cloth, for example and if necessary done using a polishing paste. When polishing through Rolling can take place in the last rolling pass, for example by means of engraved or etched steel rolls or by a predetermined structure and between the rolls and the rolling stock arranged means additionally a predetermined surface structure in the aluminum surface be impressed. The chemical shine happens through, for example Use of a highly concentrated mixture of acids at usually high temperatures of approx. 100 ° C. Acidic or alkaline electrolytes can be used for electrolytic shining are used, usually acidic electrolytes being preferred.

Die Sperrschichten der erfindungsgemässen Interferenzschichten zeigen auf Aluminiumoberflächen einer Reinheit von 99.5 bis 99.98 Gew.-% keine wesentlichen lichttechnischen Veränderungen der Oberflächeneigenschaften der ursprünglichen Aluminiumoberflächen, d.h. der Oberflächenzustand der Aluminiumoberflächen, wie er beispielsweise nach dem Glänzen vorhanden ist, bleibt nach dem Aufbringen der Sperrschicht weitgehend erhalten. Dabei ist jedoch zu berücksichtigen, dass die Metallreinheit der Oberflächenschicht, beispielsweise auf das Glänzergebnis einer Aluminiumoberfläche, sehr wohl einen Einfluss ausüben kann.The barrier layers of the interference layers according to the invention point to aluminum surfaces a purity of 99.5 to 99.98 wt .-% no significant changes in lighting technology the surface properties of the original aluminum surfaces, i.e. the Surface condition of the aluminum surfaces, such as that present after the shine is largely retained after the application of the barrier layer. It is however, take into account that the metal purity of the surface layer, for example the glossy result of an aluminum surface can very well have an influence.

Beim erfindungsgemässen Verfahren wird wenigstens die zu oxidierende Aluminiumoberfläche mit einem bezüglich dem gewünschten Farbton oder bezüglich der gewünschten Farbstruktur vorbestimmten Oberflächenzustand versehen und anschliessend in eine elektrisch leitende Flüssigkeit, den Elektrolyten, gegeben und als Anode an einer Gleichspannungsquelle angeschlossen, wobei als negative Elektrode üblicherweise rostfreier Stahl, Graphit, Blei oder Aluminium verwendet wird. Erfindungsgemäss ist der Elektrolyt derart beschaffen, dass er das während dem Elektrolyseprozess gebildete Aluminiumoxid chemisch nicht auflöst, d.h. es findet keine Rücklösung des Aluminiumoxids statt. Im Gleichspannungsfeld entwickelt sich an der Kathode Wasserstoffgas und an der Anode Sauerstoffgas. Der an der Aluminiumoberfläche entstehende Sauerstoff bildet durch Reaktion mit dem Aluminium eine während dem Prozess zunehmend dickere Oxidschicht. Da der Schichtwiderstand mit zunehmender Dicke der Sperrschicht schnell ansteigt, nimmt der Stromfluss entsprechend schnell ab und das Schichtwachstum hört auf.In the method according to the invention, at least the aluminum surface to be oxidized with a with regard to the desired color or with regard to the desired color structure provided predetermined surface condition and then electrically conductive liquid, the electrolyte, and as an anode to a DC voltage source connected, usually stainless steel, graphite, Lead or aluminum is used. According to the invention, the electrolyte is such that that it does not chemically dissolve the aluminum oxide formed during the electrolysis process, i.e. there is no redissolution of the aluminum oxide. In the DC field hydrogen gas develops at the cathode and oxygen gas at the anode. The one at the Oxygen formed on the aluminum surface forms a reaction with the aluminum increasingly thicker oxide layer during the process. Since the sheet resistance with the increasing thickness of the barrier layer increases rapidly, the current flow decreases accordingly quickly and the layer growth stops.

Die elektrolytische Herstellung von Sperrschichten gemäss vorliegender Erfindung erlaubt die präzise Kontrolle der resultierenden Sperrschicht-Schichtdicke. Die mit dem erfindungsgemässen Verfahren maximal erzielte Schichtdicke in Nanometer (nm) entspricht in erster Näherung der angelegten und in Volt (V) gemessenen Spannung, d.h. die maximal erzielte Schichtdicke steht in linearer Abhängigkeit zur Anodisierspannung. Der exakte Wert der maximal erreichten Schichtdicke in Abhängigkeit der angelegten Gleichspannung U kann durch einen einfache Vorversuch bestimmt werden und liegt bei 1.1 bis 1.6 nm/V, wobei der genaue Werte der Schichtdicke in Funktion der angelegten Spannung abhängig ist vom verwendeten Elektrolyten, d.h. dessen Zusammensetzung sowie dessen Temperatur, und der Materialzusammensetzung der Oberflächenschicht des Aluminiumkörpers.The electrolytic production of barrier layers according to the present invention permits precise control of the resulting barrier layer layer thickness. The maximum layer thickness in nanometers (nm) achieved with the method according to the invention corresponds in a first approximation to the voltage applied and measured in volts (V), ie the maximum layer thickness achieved is linearly dependent on the anodizing voltage. The exact value of the maximum layer thickness as a function of the applied DC voltage U can be determined by a simple preliminary test and is 1.1 to 1.6 nm / V, the exact values of the layer thickness depending on the voltage applied being dependent on the electrolyte used, ie its composition and its temperature, and the material composition of the surface layer of the aluminum body.

Das Messen der Farbtönung der Interferenzschichtoberfläche kann beispielsweise mittels einem Spektrometer vorgenommen werden.The measurement of the color tint of the interference layer surface can be done, for example, by means of a spectrometer.

Durch die Verwendung eines nicht rücklösenden Elektrolyten sind die Sperrschichten nahezu porenfrei, d.h. allfällig auftretende Poren resultieren beispielsweise aus Verschmutzungen im Elektrolyten oder aus Gefüge-Fehlstellen in der Aluminium-Oberflächenschicht, jedoch nur unwesentlich durch Auflösung des Aluminiumoxids im Elektrolyten. By using a non-redissolving electrolyte, the barrier layers are almost non-porous, i.e. any pores that occur result, for example, from contamination in the Electrolytes or from structural defects in the aluminum surface layer, however only insignificant due to dissolution of the aluminum oxide in the electrolyte.

Als nicht rücklösende Elektrolyten können im erfindungsgemässen Verfahren beispielsweise organische oder anorganische Säuren, in der Regel verdünnt mit Wasser, mit einem pH-Wert von 2 und grösser, bevorzugt 3 und grösser, insbesondere 4 und grösser und 8.5 und kleiner, bevorzugt 7 und kleiner, insbesondere 5.5 und kleiner, verwendet werden. Bevorzugt werden kalt, d.h. bei Raumtemperatur, verarbeitbare Elektrolyten. Besonders bevorzugt werden anorganische oder organische Säuren, wie Schwefel- oder Phosphorsäure in niedriger Konzentration, Borsäure, Adipinsäure, Zitronensäure oder Weinsäure, oder Gemische davon, oder Lösungen von Ammonium- oder Natriumsalzen von organischen oder anorganischen Säuren, insbesondere der namentlich genannten Säuren und deren Gemische. Dabei weisen die Lösungen bevorzugt eine Konzentration von total 100 g/l oder weniger, insbesondere 2 bis 70 g/l, von im Elektrolyten gelöstem Ammonium- oder Natriumsalz auf. Ganz besonders bevorzugt werden dabei Lösungen von Ammoniumsalzen der Zitronen- oder Weinsäure oder Natriumsalzen der Phosphorsäure.For example, non-redissolving electrolytes can be used in the process according to the invention organic or inorganic acids, usually diluted with water, with a pH of 2 and larger, preferably 3 and larger, in particular 4 and larger and 8.5 and smaller, preferably 7 and smaller, in particular 5.5 and smaller, can be used. To be favoured cold, i.e. at room temperature, processable electrolytes. Inorganic ones are particularly preferred or organic acids, such as sulfuric or phosphoric acid in low concentrations, Boric acid, adipic acid, citric acid or tartaric acid, or mixtures thereof, or Solutions of ammonium or sodium salts of organic or inorganic acids, in particular the named acids and their mixtures. The Solutions preferably have a total concentration of 100 g / l or less, in particular 2 to 70 g / l of ammonium or sodium salt dissolved in the electrolyte. Very particularly preferred be solutions of ammonium salts of citric or tartaric acid or Sodium salts of phosphoric acid.

Ein ganz besonders bevorzugter Elektrolyt enthält 1 bis 5 Gew.-% Weinsäure, welcher beispielsweise eine zur Einstellung des gewünschten pH-Wertes entsprechende Menge Ammoniumhydroxid (NH4OH) beigegeben werden kann.A very particularly preferred electrolyte contains 1 to 5% by weight of tartaric acid, to which, for example, an amount of ammonium hydroxide (NH 4 OH) corresponding to the desired pH value can be added.

Die Elektrolyte sind in der Regel wässrige Lösungen.The electrolytes are usually aqueous solutions.

Die für das erfindungsgemässe Verfahren optimale Elektrolyttemperatur hängt vom verwendeten Elektrolyten ab; ist aber im allgemeinen für die Qualität der erhaltenen Sperrschicht von untergeordneter Bedeutung. Für das erfindungsgemässe Verfahren werden Temperaturen von 15 bis 97 °C und insbesondere solche zwischen 18 und 50 °C bevorzugt.The optimum electrolyte temperature for the method according to the invention depends on the one used Electrolytes off; but is generally for the quality of the barrier layer obtained of minor importance. Temperatures are used for the method according to the invention from 15 to 97 ° C and especially those between 18 and 50 ° C preferred.

Die präzise Kontrolle der Sperrschicht-Schichtdicke mit dem erfindungsgemässen Verfahren erlaubt, beispielsweise durch entsprechend speziell ausgebildete, spitzen- oder plattenförmige Kathoden, d.h. durch Steuerung des lokal wirkenden Anodisierpontentials, die Herstellung lokal unterschiedlicher, jedoch vorgegebener Sperrschichtdicken, wodurch beispielsweise Interferenzschichtoberflächen mit vordefinierten Farbmustern gebildet werden können. Dabei wird die während der anodischen Oxidation der Aluminiumoberfläche angelegte Elektrolyse-Gleichspannung U örtlich unterschiedlich gewählt, so dass nach Aufbringen der teiltransparenten Schicht eine strukturierte Farbgebung oder ein Farbmuster mit beispielsweise intensiven Farben erhalten wird. Das für die Herstellung von Farbmustern erforderliche, lokal unterschiedliche Anodisierpotential wird bevorzugt durch Wahl einer vorbestimmten Kathodenform erreicht. The precise control of the barrier layer thickness with the method according to the invention allows, for example by means of appropriately designed, tip-shaped or plate-shaped cathodes, that is to say by controlling the locally acting anodizing potential, the production of locally different but predetermined barrier layer thicknesses, as a result of which, for example, interference layer surfaces are formed with predefined color patterns can. The DC electrolysis voltage U applied during the anodic oxidation of the aluminum surface is chosen to be different locally, so that after the partially transparent layer has been applied, a structured coloring or a color pattern with, for example, intensive colors is obtained. The locally different anodizing potential required for the production of color samples is preferably achieved by choosing a predetermined cathode shape.

Besonders geeignet ist das erfindungsgemässe Verfahren für die kontinuierliche Herstellung von Interferenzschichten durch kontinuierliche elektrolytische Oxidation der Aluminiumoberfläche und/oder kontinuierliches Aufbringen der teiltransparenten Schicht in einer Durchlaufanlage, vorzugsweise in einer anodischen Bandanodisier- und Beschichtungsanlage.The process according to the invention is particularly suitable for continuous production of interference layers through continuous electrolytic oxidation of the aluminum surface and / or continuous application of the partially transparent layer in a continuous system, preferably in an anodic strip anodizing and coating system.

Beispiel 1:Example 1:

Aluminiumkörper einer Reinheit von 99.90 Gew.-% Al mit einer Hochglanzoberfläche und Aluminiumkörper einer Reinheit von 99.85 Gew.-% Al mit einer elektrochemisch aufgerauhten Hochglanzoberfläche werden elektrolytisch geglänzt und mit einer Sperrschicht versehen, wobei die elektrochemisch aufgerauhte Hochglanzoberfläche im weiteren als matt glänzende Oberfläche bezeichnet wird. Durch Wahl der Anodisierspannung im Bereich von 60 bis 280 V werden Sperrschichten mit Schichtdicken von 78 bis 364 nm hergestellt. Die Proben werden mit einer etwa 10 nm dicken teiltransparenten Schicht aus Au oder Pt versehen. die resultierenden Interferenzschichtoberflächen zeigen von der Al-Oberflächenbeschaffenheit, sowie vom Betrachtungswinkel und von der Sperrschichtdicke abhängige Farben.Aluminum body with a purity of 99.90% by weight Al with a high gloss surface and Aluminum body with a purity of 99.85% by weight Al with an electrochemically roughened High-gloss surfaces are electrolytically polished and provided with a barrier layer, the electrochemically roughened high-gloss surface is also referred to as a matt gloss Surface is called. By choosing the anodizing voltage in the range from 60 to 280 V barrier layers with layer thicknesses of 78 to 364 nm are produced. Samples are provided with an approximately 10 nm thick partially transparent layer of Au or Pt. the resulting interference layer surfaces show the Al surface texture, and colors depending on the viewing angle and the thickness of the barrier layer.

Tabellen 1 und 2 zeigen die Resultate der Micro-Colour Messungen nach DIN 5033 für auf Hochglanzoberflächen hergestellte, verschieden dicke Sperrschichten, die mit einer etwa 10 nm dicken, teiltransparenten Metallschicht versehen sind, wobei in Tabelle 1 die entsprechenden Werte für eine teiltransparente Schicht aus Au und in Tabelle 2 die Werte für eine teiltransparente Schicht aus Pt aufgeführt sind.Tables 1 and 2 show the results of the micro-color measurements according to DIN 5033 for High-gloss surfaces produced, different thickness barrier layers, with an approximately 10 nm thick, partially transparent metal layer are provided, in Table 1 the corresponding Values for a partially transparent layer made of Au and in Table 2 the values for a partially transparent one Layer of Pt are listed.

Die Micro-Colour Messungen nach DIN 5033 werden bei ungerichtet auf die Interferenzschichtoberfläche auftreffendem Licht durchgeführt. Die Beobachtungsrichtung ist gegen die Interferenzschichtoberflächennormale um 8° geneigt.The micro-color measurements according to DIN 5033 are non-directional on the interference layer surface incident light. The direction of observation is against the Interference layer surface normal inclined by 8 °.

In den folgenden Tabellen sind L*, a* und b* Farbmasszahlen. L* gibt die Helligkeit wieder, wobei 0 absolut schwarz und 100 absolut weiss bedeutet. a* bezeichnet einen Wert auf der Rot-Grün-Achse, wobei positive a*-Werte rote und negative a*-Werte grüne Farben bezeichnen. b* zeigt die Lage des Farbtones auf der Gelb-Blau-Achse, wobei positive b*-Werte gelbe und negative b*-Werte blaue Farben bezeichnen. Die Lage eines Farbtones in der a*-b* -Ebene gibt somit Auskunft über dessen Buntton und dessen Sättigung.In the following tables, L *, a * and b * are color numbers. L * represents the brightness, where 0 means absolutely black and 100 absolutely white. a * denotes a value on the Red-green axis, where positive a * values indicate red and negative a * values green colors. b * shows the position of the hue on the yellow-blue axis, with positive b * values yellow and negative b * values denote blue colors. The location of a hue in the a * -b * Level thus provides information about its hue and its saturation.

Die zusätzlichen Farbangaben in den nachfolgenden Tabellen beziehen sich auf die visuell wahrnehmbaren Farben bei einem Betrachtungswinkel von 0° und 70° bezüglich der Interferenzschichtoberflächennormalen. Anodisier-Spannung [V] Sperrschicht-Dicke [nm] Farbe (nach RAL) Micro-Colour Messungen 70° L* a* b* 60 78 Goldgelb Kadmiumgelb 62,0 24,8 49,9 80 104 Erikaviolett Beigebraun 53,9 32,7 -46,3 100 130 Lichtblau Rotlila 77,2 -31,0 -23,4 180 234 Beigerot Kadmiumgelb 72,0 32,8 13,3 200 260 Erikaviolett Honiggelb 65,1 55,9 -32,4 220 286 Blaulila Blaulila 66,3 14,7 -30,5 240 312 Smaragdgrün Erikaviolett 77,5 -57,1 17,7 260 338 Hellgrün Blaulila 82,8 -44,3 61,4 280 364 Ockergelb Smaragdgrün 81,9 9,1 28,4 Anodisier-Spannung [V] Sperrschicht-Dicke [nm] Farbe (nach RAL) Micro-Colour Messungen 70° L* a* b* 60 78 Grünbraun Silbergrau 61,1 1,1 11,5 80 104 Blaulila Bastaltgrau 60,2 11,3 -17,1 100 130 Lichtblau Marinblau 68,4 - 6,6 -35,7 180 234 Maisgelb Braunbeige 59,4 21,0 2,7 200 260 Rotlila Blassbraun 56,3 34,0 -38,6 220 286 Violettblau Violettblau 56,9 12,8 -48,1 240 312 Patinagrün Blaulila 71,8 -51,6 0,4 260 338 Grasgrün Wasserblau 79,1 -43,0 32,4 280 364 Safrangelb Maigrün 75,2 17,9 24,6 The additional color specifications in the following tables relate to the visually perceptible colors at a viewing angle of 0 ° and 70 ° with respect to the interference layer surface normal. Anodizing voltage [V] Junction thickness [nm] Color (according to RAL) Micro-color measurements 0 ° 70 ° L * a * b * 60 78 Golden yellow Cadmium yellow 62.0 24.8 49.9 80 104 Heather violet Beige brown 53.9 32.7 -46.3 100 130 Light blue Red purple 77.2 -31.0 -23.4 180 234 Beige red Cadmium yellow 72.0 32.8 13.3 200 260 Heather violet Honey yellow 65.1 55.9 -32.4 220 286 Blue purple Blue purple 66.3 14.7 -30.5 240 312 Emerald green Heather violet 77.5 -57.1 17.7 260 338 Light green Blue purple 82.8 -44.3 61.4 280 364 Ocher yellow Emerald green 81.9 9.1 28.4 Anodizing voltage [V] Junction thickness [nm] Color (according to RAL) Micro-color measurements 0 ° 70 ° L * a * b * 60 78 Green Brown Silver gray 61.1 1.1 11.5 80 104 Blue purple Bastalt gray 60.2 11.3 -17.1 100 130 Light blue Navy blue 68.4 - 6.6 -35.7 180 234 Corn yellow Brown beige 59.4 21.0 2.7 200 260 Red purple Pale brown 56.3 34.0 -38.6 220 286 Violet blue Violet blue 56.9 12.8 -48.1 240 312 Patina green Blue purple 71.8 -51.6 0.4 260 338 Grass green Water blue 79.1 -43.0 32.4 280 364 Saffron yellow May green 75.2 17.9 24.6

Tabellen 3 und 4 zeigen die Resultate der Micro-Colour Messungen nach DIN 5033 für auf matt glänzende Oberflächen hergestellte, verschieden dicke Sperrschichten, die mit einer 10 nm dicken, teiltransparenten Metallschicht versehen sind, wobei in Tabelle 3 die entsprechenden Werte für eine teiltransparente Schicht aus Au und in Tabelle 4 die Werte für eine teiltransparente Schicht aus Pt aufgeführt sind. Anodisier-Spannung [V] Sperrschicht-Dicke [nm] Farbe (nach RAL) Micro-Colour Messungen 70° L* a* b* 80 104 Erikaviolett Beigebraun 57,8 40,5 -26,1 100 130 Lichtblau Rotlila 77,3 -25,9 -31,5 160 208 Schwefelgelb Kadmiumgelb 91,3 - 7,3 70,6 180 234 Goldgelb Kadmiumgelb 81,3 16,9 55,8 200 260 Erikaviolett Honiggelb 70,7 53,2 -22,3 220 286 Blaulila Blaulila 70,5 15,1 -32,7 240 312 Türkisblau Erikaviolett 73,7 -23,1 -12,8 260 338 Hellgrün Blaulila 82,1 -55,9 34,7 280 364 Kadmiumgelb Gelbgrün 86,0 -12,6 59,0 Anodisier-Spannung [V] Sperrschicht-Dicke [nm] Farbe (nach RAL) Micro-Colour Messungen 70° L* a* b* 80 104 Beigebraun Moosgrau 55,0 13,2 - 8,5 100 130 Brillantblau Rotlila 69,0 - 1,8 -43,8 160 208 Safrangelb Zitronengelb 84,7 7,3 39,8 180 234 Maisgelb Braunbeige 75,9 8,2 22,6 200 260 helles Rotlila Blassbraun 71,6 19,9 -15,9 220 286 Blaulila Blaulila 68,9 16,3 -33,1 240 312 Taubenblau Blaulila 70,9 -15,1 -21,5 260 338 Grasgrün Wasserblau 81,1 -43,8 14,0 280 364 Zinkgelb Grasgrün 84,0 - 6,9 39,3 Tables 3 and 4 show the results of the micro-color measurements according to DIN 5033 for barrier layers of various thicknesses produced on matt glossy surfaces, which are provided with a 10 nm thick, partially transparent metal layer, in Table 3 the corresponding values for a partially transparent layer Au and in Table 4 the values for a partially transparent layer of Pt are listed. Anodizing voltage [V] Junction thickness [nm] Color (according to RAL) Micro-color measurements 0 ° 70 ° L * a * b * 80 104 Heather violet Beige brown 57.8 40.5 -26.1 100 130 Light blue Red purple 77.3 -25.9 -31.5 160 208 Sulfur yellow Cadmium yellow 91.3 - 7.3 70.6 180 234 Golden yellow Cadmium yellow 81.3 16.9 55.8 200 260 Heather violet Honey yellow 70.7 53.2 -22.3 220 286 Blue purple Blue purple 70.5 15.1 -32.7 240 312 Turquoise blue Heather violet 73.7 -23.1 -12.8 260 338 Light green Blue purple 82.1 -55.9 34.7 280 364 Cadmium yellow Yellow-green 86.0 -12.6 59.0 Anodizing voltage [V] Junction thickness [nm] Color (according to RAL) Micro-color measurements 0 ° 70 ° L * a * b * 80 104 Beige brown Moss gray 55.0 13.2 - 8.5 100 130 Brilliant blue Red purple 69.0 - 1.8 -43.8 160 208 Saffron yellow Lemon yellow 84.7 7.3 39.8 180 234 Corn yellow Brown beige 75.9 8.2 22.6 200 260 bright red purple Pale brown 71.6 19.9 -15.9 220 286 Blue purple Blue purple 68.9 16.3 -33.1 240 312 Dove blue Blue purple 70.9 -15.1 -21.5 260 338 Grass green Water blue 81.1 -43.8 14.0 280 364 Zinc yellow Grass green 84.0 - 6.9 39.3

Ein Vergleich der in Tabelle 1 und 2 gefundenen Angaben mit denen der in Tabelle 3 und 4 beschriebenen zeigt deutlich den Einfluss der Oberflächenbeschaffenheit der Oberflächenschicht des Aluminiumkörpers, d.h. die Struktur der Oberflächenschicht des Aluminiumkörpers bestimmt die Farbe mit.A comparison of the information found in Tables 1 and 2 with that of Tables 3 and 4 described clearly shows the influence of the surface quality of the surface layer of the aluminum body, i.e. the structure of the surface layer of the aluminum body determines the color.

Tabelle 5 zeigt für ausgewählte Sperrschichtdickenwerte den Vergleich von Resultaten der Micro-Colour Messungen nach DIN 5033 für Interferenzschichten mit und ohne teiltransparente Schicht. Sperrschicht-Dicke [nm] Matte Oberfläche nicht bedampft Au-bedampft Pt-bedampft L* a* b* L* a* b* L* a* b* 104 90,6 -1,2 -6,4 57,8 40,5 -26,1 55,0 13,2 -8,5 234 93,1 3,7 0,3 81,3 16,9 55,8 75,9 8,2 22,6 364 94,4 -0,3 3,1 86,0 -12,6 59,0 84,0 -6,9 39,3 Sperrschicht-Dicke [nm] Hochglanz-Oberfläche nicht bedampft Au-bedampft Pt-bedampft L* a* b* L* a* b* L* a* b* 104 88,0 -3,7 -5,5 53,9 32,7 -46,3 60,2 11,3 -17,1 234 87,4 3,1 -4,4 72,0 32,8 13,3 59,4 21,0 2,7 364 89,5 0,2 -0,2 81,9 9,1 28,4 75,2 17,9 24,6 Table 5 shows the comparison of results of the micro-color measurements according to DIN 5033 for interference layers with and without a partially transparent layer for selected junction thickness values. Junction thickness [nm] Matt surface not steamed Au-steamed Pt-vaporized L * a * b * L * a * b * L * a * b * 104 90.6 -1.2 -6.4 57.8 40.5 -26.1 55.0 13.2 -8.5 234 93.1 3.7 0.3 81.3 16.9 55.8 75.9 8.2 22.6 364 94.4 -0.3 3.1 86.0 -12.6 59.0 84.0 -6.9 39.3 Junction thickness [nm] High gloss surface not steamed Au-steamed Pt-vaporized L * a * b * L * a * b * L * a * b * 104 88.0 -3.7 -5.5 53.9 32.7 -46.3 60.2 11.3 -17.1 234 87.4 3.1 -4.4 72.0 32.8 13.3 59.4 21.0 2.7 364 89.5 0.2 -0.2 81.9 9.1 28.4 75.2 17.9 24.6

Beispiel 2:Example 2:

Eine Aluminiumfolie mit einer elektrolytisch geglänzten Hochglanz-Aluminiumoberfläche wird durch Wahl der Anodisierspannung im Bereich von 30 bis 380 V mit erfindungsgemässen Sperrschichten mit Schichtdicken von 39 bis 494 nm versehen. Die Sperrschichten werden weiter mit einer teiltransparenten Chromschicht mit einer für alle Proben einheitlichen Schichtdicke, welche im Schichtdickenbereich von 1 bis 5 nm liegt, versehen. Das Aufbringen der Chromschicht erfolgt durch Sputtern in einem Bandverfahren, wobei die Bandgeschwindigkeit etwa 25 m/min beträgt.An aluminum foil with an electrolytically polished high-gloss aluminum surface is selected by choosing the anodizing voltage in the range from 30 to 380 V according to the invention Provide barrier layers with layer thicknesses of 39 to 494 nm. The barriers will continue with a partially transparent chrome layer with a uniform for all samples Layer thickness, which is in the layer thickness range of 1 to 5 nm, provided. The application The chrome layer is made by sputtering in a belt process, the belt speed is about 25 m / min.

Tabelle 6 zeigt die Resultate der Micro-Colour Messungen nach DIN 5033 für vorstehend beschriebene Interferenzschichten. Für die Micro-Colour Messungen gelten die in Beispiel 1 gemachten Bemerkungen. Die zusätzlichen Farbangaben nach RAL in Tabelle 6 beziehen sich auf die visuell wahrnehmbaren Farben bei einem Betrachtungswinkel von 0° und 80° bezüglich der Interferenzschicht-Oberflächennomalen. Anodisier-Spannung [V] Sperrschicht-Dicke [nm] Micro-Colour Messungen Farbe (nach RAL) L* a* b 80° 30 39 66 3 18 Olivgelb Hellelfenbein 40 52 50 7 25 Grünbraun Olivgrau 50 65 38 12 11 Nussbraun Beige 60 78 30 20 -38 Nachtblau Blassbraun 70 91 47 0 -45 Enzianblau Enzianblau 80 104 63 -9 -39 Himmelblau Himmelblau 90 117 70 -12 -32 Himmelblau Violettblau 100 130 84 -15 -13 Lichtblau Brillantblau 110 143 86 -15 -5 Türkisblau Brillantblau 120 156 89 -12 22 Grünbeige Blaugrau 130 169 88 -10 36 Honiggelb farblos 140 182 81 1 63 Zitronengelb Hellelfenbein 150 195 82 0 62 Zitronengelb Hellelfenbein 160 208 70 22 46 Safrangelb Elfenbein 170 221 57 47 -8 Altrosa Sandgelb 180 234 48 61 -44 Signalviolett Goldgelb 190 247 45 50 -67 Purpurviolett Safrangelb 200 260 54 1 -61 Enzianblau Rosé 210 273 61 -22 -50 Enzianblau Hellrosa 220 286 72 -48 -20 Wasserblau Erikaviolett 230 299 80 -52 11 Maigrün Rotlila 240 312 84 -44 38 Gelbgrün Brillantblau 250 325 85 -32 56 Hellgelbgrün Lichtblau 260 338 83 -9 53 Ginstergelb Hellichtblau 270 351 77 27 13 Hellrosa Türkisblau 280 364 73 42 -5 Altrosa Maigrün 290 377 68 57 -25 Rosé Gelbgrün 300 390 62 62 -40 Erikaviolett Schwefelgelb 310 403 60 56 -46 Verkehrspurpur Zinkgelb 320 416 59 24 -41 Signalviolett Beige 330 429 68 -59 1 Wasserblau Hellrosa 340 442 72 -74 17 Minzgrün Hellerikaviolett 350 455 75 -73 27 Verkehrsgrün Erikaviolett 360 468 77 -60 31 Smaragdgrün Dunkelerikaviolett 370 481 80 -30 21 Patinagrün Signalviolett 380 494 78 10 1 farblos Rotlila Table 6 shows the results of the micro-color measurements according to DIN 5033 for the interference layers described above. The comments made in Example 1 apply to the micro-color measurements. The additional color specifications according to RAL in Table 6 relate to the visually perceptible colors at a viewing angle of 0 ° and 80 ° with respect to the interference layer surface normals. Anodizing voltage [V] Junction thickness [nm] Micro-color measurements Color (according to RAL) L * a * b 0 ° 80 ° 30th 39 66 3rd 18th Olive yellow Light ivory 40 52 50 7 25th Green Brown Olive gray 50 65 38 12th 11 Nut brown beige 60 78 30th 20th -38 Midnight blue Pale brown 70 91 47 0 -45 Gentian blue Gentian blue 80 104 63 -9 -39 Sky blue Sky blue 90 117 70 -12 -32 Sky blue Violet blue 100 130 84 -15 -13 Light blue Brilliant blue 110 143 86 -15 -5 Turquoise blue Brilliant blue 120 156 89 -12 22 Green beige Bluish gray 130 169 88 -10 36 Honey yellow colorless 140 182 81 1 63 Lemon yellow Light ivory 150 195 82 0 62 Lemon yellow Light ivory 160 208 70 22 46 Saffron yellow ivory 170 221 57 47 -8th Dusky pink Sand yellow 180 234 48 61 -44 Signal violet Golden yellow 190 247 45 50 -67 Purple violet Saffron yellow 200 260 54 1 -61 Gentian blue Rose 210 273 61 -22 -50 Gentian blue Light pink 220 286 72 -48 -20 Water blue Heather violet 230 299 80 -52 11 May green Red purple 240 312 84 -44 38 Yellow-green Brilliant blue 250 325 85 -32 56 Pale yellow green Light blue 260 338 83 -9 53 Broom yellow Bright blue 270 351 77 27 13 Light pink Turquoise blue 280 364 73 42 -5 Dusky pink May green 290 377 68 57 -25 Rose Yellow-green 300 390 62 62 -40 Heather violet Sulfur yellow 310 403 60 56 -46 Traffic lane Zinc yellow 320 416 59 24th -41 Signal violet beige 330 429 68 -59 1 Water blue Light pink 340 442 72 -74 17th Mint green Hellerika violet 350 455 75 -73 27 Traffic green Heather violet 360 468 77 -60 31 Emerald green Dark purple violet 370 481 80 -30 21 Patina green Signal violet 380 494 78 10th 1 colorless Red purple

Claims (16)

  1. Interference layer which acts as a colouring surface layer on aluminium items, said layer containing an aluminium oxide layer and, deposited on this, a partially transparent layer,
    characterised in that,
    the aluminium oxide layer is a transparent, pore-free barrier layer produced by anodising, of predetermined thickness d corresponding to the desired surface colour of the interference layer, the thickness d of the barrier layer lying between 20 and 900 nm, and the partially transparent layer exhibiting a wavelength dependent trans-mission τ (λ) which is greater than 0,01 and smaller than 1.
  2. Interference layer according to claim 1, characterised in that the thickness d of the barrier layer lies between 30 and 800 nm, in particular between 35 and 500 nm.
  3. Interference layer according to claim 1 or 2, characterised in that for the purpose of creating a structured colour effect or to produce a coloured pattern, the barrier layer exhibits appropriate, predetermined, local differences in thickness.
  4. Interference layer according to one of the claims 1 to 3, characterised in that the partially transparent layer of metal, in particular of Ag, Al, Au, Cr, Cu, Nb, Ni, Pt, Pd, Rh, Ta, Ti, or a metal alloy containing at least one of these mentioned elements.
  5. Interference layer according to one of the claims 1 to 4, characterised in that the partially transparent layer exhibits a layer thickness of 0.5 to 100 nm, especially preferred being a thickness of 1 to 80 nm, and especially 2 to 30 nm.
  6. Interference layer according to one of the claims 1 to 5, characterised in that for the purpose of creating a structured colour effect or to produce a coloured pattern, the partially transparent layer exhibits appropriate, predetermined, local differences in thickness.
  7. Interference layer according to one of the claims 1 to 6, characterised in that the partially transparent layer is in the form of a lattice-shaped net, wherein the distances between the lines of the lattice-shaped net are preferably in the sub-micron range.
  8. Interference layer according to claim I or 3, characterised in that the partially transparent layer is a sol-gel layer of preferably 0.5 to 250 µm with reflecting particles embedded therein, where the dimensions of the reflecting particles are preferably in the micron or sub-micron range, preferably in the sub-micron range.
  9. Interference layer according to claim 8, characterised in that, for the purpose of creating optical colour patterns, the partially transparent sol-gel layer containing preferably essentially uniformly dispersed reflecting particles exhibits a structure with local differences in layer thickness.
  10. Interference layer according to one of the claims 1 to 9, characterised in that the side of the partially transparent layer facing away from the barrier layer is protected from mechanical and chemical effects by means of a transparent protective layer.
  11. Interference layer according to claim 10, characterised in that the transparent protective layer is a varnish, a sol-gel layer or a thin oxide layer preferably out of SiO2, Al2O3 or TiO2.
  12. Process for manufacturing an interference layer according to one of the claims 1 to 9, characterised in that, the surface of the aluminium item is oxidised electrolytically in an electrolyte that does not redisolve aluminium oxide and that the desired thickness d of the resultant oxide layer, measured in nm, is obtained by choosing a constant electrolyte voltage U in volts according to the relationship d/1.6 ≤ Ud/1.1 and the thus formed aluminium oxide layer is provided with a partially transparent layer on its free surface.
  13. Process according to claim, 12, characterised in that, as non re-dissolving electrolyte, solutions containing organic or inorganic acids are employed, and the solutions exhibit a pH-value of 2 to 8.5
  14. Process according to claim, 13, characterised in that, the non re-dissolving electrolyte is a solution of ammonium or sodium salts of organic or inorganic acids or a solution containing ammonium or sodium salts of organic or inorganic salts and the corresponding organic or inorganic acids.
  15. Process according to one of the claims 12 to 14, characterised in that the electrolytic oxidation of the aluminium surface and/or the provision of the partially transparent layer is performed as a continuous process in a continuous production line, preferably in an anodic strip anodising and coating line.
  16. Process according to one of the claims 12 to 15, characterised in that a locally different electrolysing direct current U is applied to the aluminium surface in order to obtain a structured colour effect or coloured pattern.
EP19960810245 1996-04-18 1996-04-18 Aluminium surfaces with interference colours Expired - Lifetime EP0802267B1 (en)

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DE59604113T DE59604113D1 (en) 1996-04-18 1996-04-18 Aluminum surface with interference colors
EP19960810245 EP0802267B1 (en) 1996-04-18 1996-04-18 Aluminium surfaces with interference colours
DK96810245T DK0802267T3 (en) 1996-04-18 1996-04-18 Aluminum surface with interference colors
PT96810245T PT802267E (en) 1996-04-18 1996-04-18 ALUMINUM SURFACE WITH COLORS OF INTERFERENCE
AT96810245T ATE188517T1 (en) 1996-04-18 1996-04-18 ALUMINUM SURFACE WITH INTERFERENCE COLORS
ES96810245T ES2141460T3 (en) 1996-04-18 1996-04-18 ALUMINUM SURFACES WITH INTERFERING COLORS.
US08/832,295 US5904989A (en) 1996-04-18 1997-04-03 Aluminum surface with interference colors
CA 2202603 CA2202603C (en) 1996-04-18 1997-04-14 Aluminium surface with interference colours

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