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EP0483004A1 - Electron cyclotron resonance ion source for highly charged ions with polarisable probe - Google Patents

Electron cyclotron resonance ion source for highly charged ions with polarisable probe Download PDF

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Publication number
EP0483004A1
EP0483004A1 EP91402829A EP91402829A EP0483004A1 EP 0483004 A1 EP0483004 A1 EP 0483004A1 EP 91402829 A EP91402829 A EP 91402829A EP 91402829 A EP91402829 A EP 91402829A EP 0483004 A1 EP0483004 A1 EP 0483004A1
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EP
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Prior art keywords
cavity
probe
ions
source
source according
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EP91402829A
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German (de)
French (fr)
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EP0483004B1 (en
Inventor
Paul Briand
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Commissariat a lEnergie Atomique et aux Energies Alternatives CEA
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Commissariat a lEnergie Atomique CEA
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    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J27/00Ion beam tubes
    • H01J27/02Ion sources; Ion guns
    • H01J27/16Ion sources; Ion guns using high-frequency excitation, e.g. microwave excitation
    • H01J27/18Ion sources; Ion guns using high-frequency excitation, e.g. microwave excitation with an applied axial magnetic field

Definitions

  • the present invention relates to a source of highly charged positive ions with polarizable probe and electronic cyclotron resonance (ECR). It finds many applications, depending on the different values of the kinetic energy of the extracted ions, in the fields of ion implantation, microgravure, and more particularly in the equipment of particle accelerators, used both in the scientific than medical.
  • ECR electronic cyclotron resonance
  • the ions are obtained by ionizing, in a closed enclosure of the microwave cavity type, a gas, constituted for example of metallic vapors, by means of a plasma of electrons strongly accelerated by electronic cyclotron resonance.
  • HF high frequency electromagnetic field
  • the quantity of ions that can be produced results from the competition between two processes: on the one hand the formation of ions by electronic impact on neutral atoms constituting the gas to be ionized and on the other hand the destruction of these same ions by recombination, single or multiple, during a collision of the latter with a neutral atom; this neutral atom can come from the gas not yet ionized or else be produced on the walls of the enclosure by impact of an ion on said walls.
  • This drawback is avoided by confining, in the enclosure constituting the source, the ions formed as well as the electrons used for their ionization. This is achieved by creating inside the enclosure radial and axial magnetic fields, defining a closed sheet called "equimagnetic", having no contact with the walls of the enclosure and on which the condition of electronic cyclotron resonance is satisfied.
  • This tablecloth has the shape of a rugby ball. The closer this equimagnetic sheet is to the walls of the enclosure, the greater its efficiency because it makes it possible to limit the volume of presence of neutral atoms and therefore the amount of ion-neutral atom collision.
  • This layer also makes it possible to confine the ions and the electrons produced by ionization of the gas. Thanks to this confinement, the electrons created have the time to bombard the same ion several times and fully ionize it.
  • This source contains two stages.
  • the role of the first stage A is largely to provide a flow of electrons in the X axis of the source.
  • This first stage A comprises a cavity 2a with symmetry of revolution of the solenoid coils 14a disposed at the two ends of the cavity 2a, creating an axial magnetic field, this field being augmented by a soft iron shield 18a located at the input of the source. .
  • the gas or vapor to be ionized is introduced through a conduit 6 inside the cavity 2a. When it comes to steam, it can be introduced into the cavity in the form of a rod capable of vaporizing.
  • An electromagnetic field is created inside the cavity 2a by a first high frequency input 4a.
  • the gas leaving the first stage A is pre-ionized and then passes into the second stage B.
  • This stage B consists of a multimode cylindrical cavity 2 of high order, that is to say of large dimension with respect to the dimension of the wavelength of the electromagnetic field. Its axis of symmetry carries the reference X. This electromagnetic field is introduced radially by a second high frequency input 4.
  • the cavity 2 is joined at its end 5 to a vacuum pump 10b, by means of an extraction pipe in which are housed electrodes 10a.
  • a power source 9 makes it possible to apply a potential difference to these electrodes.
  • This pump, pipe and electrode assembly constitutes the means for extracting the ions.
  • the ions thus extracted from the cavity 2 can then be selected according to their degree of ionization using any known means using a magnetic field and / or an electric field.
  • coils 14 creating an axial magnetic field and a set 16 of permanent magnets creating a radial magnetic field, generally of the hexapolar type. These axial and radial magnetic fields are superimposed on each other and distributed throughout the cavity; they thus form a resulting magnetic field which defines at least one equimagnetic surface inside the cavity 2.
  • the first problem in this type of source is the importance of the bulk; to this problem is added the difficulty of manufacture and therefore the cost of such a source.
  • the present invention relates to an ion source with cyclotron resonance which makes it possible to remedy these drawbacks by simplifying in particular this type of source.
  • the main characteristic of the invention is to replace the first stage of the Minimafios source with a voltage polarizable probe.
  • the invention allows a lower cost than that of existing sources such as Minimafios, the manufacture of the probe being easier than that of the first stage of Minimafios.
  • the voltage supply means consist of a variable voltage source capable of supplying said probe with a negative voltage with respect to the potential of the cavity thus ensuring an increase in the ion current.
  • This negative voltage has an absolute value at least equal to about 100 volts for an increase in the charge of the ions.
  • the probe is arranged along the axis of the cavity, at one of its ends and on the side opposite to the extraction means. It is also possible to arrange it laterally.
  • the probe consists of an electron emitting metal.
  • the probe is made of tantalum.
  • any other metal emitting electrons can be envisaged and, in particular, tungsten and molybdenum.
  • the probe comprises a rod of this electron-emitting metal and a disc of this same metal fixed to one of the ends of this rod. It is possible to use a probe whose rod is made of a metal different from that of the disc.
  • the gas is introduced along the axis of the cavity, parallel to the probe. This increases the ionization of neutral atoms.
  • the gas can be introduced radially.
  • the introduction of the high frequency takes place along the axis of the cavity, on the probe side. It is however possible to introduce the high frequency radially. This source makes it possible in particular to obtain a current of argon ions seventeen times positively charged.
  • FIG. 2 shows the ion source according to the invention.
  • This source comprises, like that of the prior art, a stage B equipped with the cavity 2 RCE almost identical to the second stage B of the source of FIG. 1.
  • the first stage A from the source in FIG. 1 has disappeared and has been replaced by a polarizable probe 20, supplied with voltage by a variable power source 8.
  • this source comprises, at the input of the HF cavity, an element of soft iron 18 and another element of soft iron 12 at the outlet of the HF cavity, downstream of the electrodes 10a.
  • the role of the element 18 is identical to that of the element 18a of the source of FIG. 1.
  • the element 12, meanwhile, allows the reduction of the axial magnetic field downstream of the output electrodes 10a.
  • the supply 6 of metal gas or vapor is carried out along the axis X of the HF cavity and no longer radially in order to increase the quantity of ions.
  • the probe 20 is supplied by the source 8 of variable voltage (0 - 200 V) whose electrical connection is such that the probe 20 receives a negative voltage with respect to the potential of the cavity which is higher by a few kilovolts (10 to 20 kV ) relative to mass.
  • the probe 20 consists of a rod 20a of an electron emitting metal at the end of which is fixed a disk 20b of the same metal. This disc has a diameter about ten times larger than that of the rod 20a in order to improve the emission of the electrons.
  • This metal is in particular tantalum.
  • the probe 20 is placed at the end 3 of the cavity 2, the opposite end to that of the ion extraction means 10. In addition, it is placed along the axis X of the cavity 2, parallel to the high frequency input 4 and the introduction of the gas 6.
  • the probe is fixed in this position by means of a shutter 22, electrical insulator equipped with orifices for the passage, respectively, of the rod 20a, of the introduction of the gas 6 and of the high frequency input 4.
  • FIG. 3 schematically shows part of the source according to the invention and, in particular, the interior of the microwave cavity 2.
  • the equimagnetic surface S in the shape of a rugby ball, created by the resulting magnetic field, is shown inside the cavity 2, without contact with the walls of the cavity.
  • the probe 20 located at the end 3 of the cavity 2 has no contact with this equimagnetic surface S in order to best avoid the possibilities of recombination of an ion with one or more electrons.
  • FIG. 4 represents the ionization spectra of krypton, that is to say the variations of the ion current I i of krypton, in microamperes, as a function of the state of charge Q of the krypton ion.
  • the first spectrum a is obtained for a non-polarized probe and therefore for a zero probe voltage.
  • the second spectrum b is obtained for a probe polarized by a negative voltage of -180 volts.
  • the inventors have found that the probe, powered by a positive voltage with respect to the HF cavity, has the effect of reducing the ion current and increasing the low states of charge.
  • the curve in FIG. 5 represents the variations in the quantity N of argon ions seventeen times positively charged, expressed in number of pulses per second, as a function of the potential U of the probe, expressed in volts.
  • This curve was plotted by recording the intensity of the line K ⁇ emitted by a beam of Ar17+ ions intercepted by a solid target.
  • the ion beam is extracted from the source with a potential of 15 kV applied to the cavity relative to the mass and is deflected by a magnet, relative to the X axis, to be analyzed.
  • the line K ⁇ (2.957 KeV) is observed with a hyper-pure germanium detector which looks at the target under a solid 4.10 ⁇ 5 steradian angle through a Kapton® window.
  • This measurement technique does not directly give the intensity of the ion current Ar17+ but allows its evolution to be followed without ambiguity.
  • the intensity of the line being proportional to the current of Ar17+ ions falling on the target.
  • the energy of the X-rays being characteristic of this ion, one thus avoids any confusion with the states of charge having a close Q / M such as the nitrogen ion six times charged.
  • the growth factor of the number of Ar17+ ions is approximately 100 for a potential of the probe passing from -5 volts to -150 volts.
  • the curve in FIG. 6 represents the variations in the current I s of the probe in milliamps as a function of the potential U of this same probe in volts.
  • U 0, the tantalum probe current is negative, with an absolute value greater than 3 milliamps; this current corresponds to a capture of electrons.
  • the probe current is positive; it is then emission of electrons by the probe or else of an ion current of tantalum collected or else emission of electrons and of an ion current of tantalum collected.
  • the ion source according to the invention is simpler to manufacture than known two-stage sources and makes it possible to achieve at least the same performance as a two-stage source at a lower cost.

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  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Combustion & Propulsion (AREA)
  • Electron Sources, Ion Sources (AREA)
  • Particle Accelerators (AREA)

Abstract

The invention relates to an ion source with polarisable probe (20) making it possible to produce, from neutral atoms, a quantity of highly charged ions. This source comprises a microwave cavity (2), means (14) of producing an axial magnetic field in the cavity, means (16) of producing a multipole radial magnetic field in this cavity, a high-frequency input (4), a gas inlet (6) into the cavity, means (10) of extracting ions, and a voltage-polarisable probe (20) for improving the ionisation of the gas. <IMAGE>

Description

La présente invention a pour objet une source d'ions positifs fortement chargés à sonde polarisable et à résonance cyclotronique électronique (RCE). Elle trouve de nombreuses applications, en fonction des différentes valeurs de l'énergie cinétique des ions extraits, dans les domaines de l'implantation ionique, de la microgravure, et plus particulièrement dans l'équipement des accélérateurs de particules, utilisés aussi bien dans le domaine scientifique que médical.The present invention relates to a source of highly charged positive ions with polarizable probe and electronic cyclotron resonance (ECR). It finds many applications, depending on the different values of the kinetic energy of the extracted ions, in the fields of ion implantation, microgravure, and more particularly in the equipment of particle accelerators, used both in the scientific than medical.

Dans les sources à résonance cyclotronique électronique, les ions sont obtenus en ionisant, dans une enceinte fermée du genre cavité hyperfréquence, un gaz, constitué par exemple de vapeurs métalliques, au moyen d'un plasma d'électrons fortement accélérés par résonance cyclotronique électronique. Cette résonance est obtenue grâce à l'action conjuguée d'un champ électromagnétique haute fréquence (HF) injecté dans l'enceinte, contenant le gaz à ioniser, et d'un champ magnétique, régnant dans cette même enceinte, dont l'amplitude B satisfait à la condition de résonance cyclotronique électronique suivante : B = f.2 πm/e dans laquelle e représente la charge de l'électron, m sa masse et f la fréquence du champ électromagnétique.In sources with electronic cyclotron resonance, the ions are obtained by ionizing, in a closed enclosure of the microwave cavity type, a gas, constituted for example of metallic vapors, by means of a plasma of electrons strongly accelerated by electronic cyclotron resonance. This resonance is obtained by the combined action of a high frequency electromagnetic field (HF) injected into the enclosure, containing the gas to be ionized, and a magnetic field, prevailing in this same enclosure, whose amplitude B satisfies the following condition of electronic cyclotron resonance: B = f.2 πm / e in which e represents the charge of the electron, m its mass and f the frequency of the electromagnetic field.

Dans ce type de source, la quantité d'ions pouvant être produite résulte de la compétition entre deux processus : d'une part la formation des ions par impact électronique sur des atomes neutres constituant le gaz à ioniser et d'autre part la destruction de ces mêmes ions par recombinaison, simple ou multiple, lors d'une collision de ces derniers avec un atome neutre ; cet atome neutre peut provenir du gaz non encore ionisé ou bien être produit sur les parois de l'enceinte par impact d'un ion sur lesdites parois.In this type of source, the quantity of ions that can be produced results from the competition between two processes: on the one hand the formation of ions by electronic impact on neutral atoms constituting the gas to be ionized and on the other hand the destruction of these same ions by recombination, single or multiple, during a collision of the latter with a neutral atom; this neutral atom can come from the gas not yet ionized or else be produced on the walls of the enclosure by impact of an ion on said walls.

Cet inconvénient est évité en confinant, dans l'enceinte constituant la source, les ions formés ainsi que les électrons servant à leur ionisation. Ceci est réalisé en créant à l'intérieur de l'enceinte des champs magnétiques radial et axial, définissant une nappe fermée dite "équimagnétique", n'ayant aucun contact avec les parois de l'enceinte et sur laquelle la condition de résonance cyclotronique électronique est satisfaite. Cette nappe a la forme d'un ballon de rugby. Plus cette nappe équimagnétique est proche des parois de l'enceinte, plus son efficacité est grande car elle permet de limiter le volume de présence des atomes neutres et donc la quantité de collision ions-atomes neutres. Cette nappe permet aussi de confiner les ions et les électrons produits par ionisation du gaz. Grâce à ce confinement, les électrons créés ont le temps de bombarder plusieurs fois un même ion et de l'ioniser totalement.This drawback is avoided by confining, in the enclosure constituting the source, the ions formed as well as the electrons used for their ionization. This is achieved by creating inside the enclosure radial and axial magnetic fields, defining a closed sheet called "equimagnetic", having no contact with the walls of the enclosure and on which the condition of electronic cyclotron resonance is satisfied. This tablecloth has the shape of a rugby ball. The closer this equimagnetic sheet is to the walls of the enclosure, the greater its efficiency because it makes it possible to limit the volume of presence of neutral atoms and therefore the amount of ion-neutral atom collision. This layer also makes it possible to confine the ions and the electrons produced by ionization of the gas. Thanks to this confinement, the electrons created have the time to bombard the same ion several times and fully ionize it.

Le principe d'une telle source a été décrit dans le document FR-A-2 475 798, déposé au nom du demandeur et dans les articles :

  • "Minimafios - Surfaces magnétiques et parois" de Mrs GELLER et JACQUOT, publié à l'occasion du quatrième séminaire international sur les sources RCE et sujets annexes, en Janvier 1982, p. 14.1 à 14.14.
  • "Source d'ions lourds multichargés triplemafios" de Mrs BRIAND, CHAN-TUNG, GELLER et JACQUOT, publié dans la revue de physique appliquée, en Août 1977, p.1 135 à 1 138.
  • "Electron cyclotron resonance multiply charged ion sources" de Mr. GELLER, publié dans IEEE transactions on nuclear science, vol. NS 23, n° 2, en Avril 1976, p. 904 à 912.
The principle of such a source has been described in document FR-A-2 475 798, filed on behalf of the applicant and in the articles:
  • "Minimafios - Magnetic surfaces and walls" by Mrs GELLER and JACQUOT, published on the occasion of the fourth international seminar on RCE sources and related subjects, in January 1982, p. 14.1 to 14.14.
  • "Source of heavy ions multicharged triplemafios" of Mrs BRIAND, CHAN-TUNG, GELLER and JACQUOT, published in the review of applied physics, in August 1977, p.1 135 to 1 138.
  • "Electron cyclotron resonance multiply charged ion sources" by Mr. GELLER, published in IEEE transactions on nuclear science, vol. NS 23, n ° 2, in April 1976, p. 904 to 912.

Sur la figure 1, on a représenté schématiquement une source d'ions de l'art antérieur.In Figure 1, there is shown schematically an ion source of the prior art.

Cette source contient deux étages.This source contains two stages.

Le rôle du premier étage A est en grande partie de fournir un flux d'électrons dans l'axe X de la source. Ce premier étage A comporte une cavité 2a à symétrie de révolution des bobines solénoïdales 14a disposées aux deux extrémités de la cavité 2a, créant un champ magnétique axial, ce champ étant majoré par un blindage de fer doux 18a situé à l'entrée de la source. Le gaz ou la vapeur à ioniser est introduit par un conduit 6 à l'intérieur de la cavité 2a. Lorsqu'il s'agit de vapeur, celle-ci peut être introduite dans la cavité sous la forme d'une tige apte à se vaporiser. Un champ électromagnétique est créé à l'intérieur de la cavité 2a par une première entrée haute fréquence 4a.The role of the first stage A is largely to provide a flow of electrons in the X axis of the source. This first stage A comprises a cavity 2a with symmetry of revolution of the solenoid coils 14a disposed at the two ends of the cavity 2a, creating an axial magnetic field, this field being augmented by a soft iron shield 18a located at the input of the source. . The gas or vapor to be ionized is introduced through a conduit 6 inside the cavity 2a. When it comes to steam, it can be introduced into the cavity in the form of a rod capable of vaporizing. An electromagnetic field is created inside the cavity 2a by a first high frequency input 4a.

Le gaz sortant du premier étage A est préionisé et passe ensuite dans le second étage B. Cet étage B est constitué d'une cavité cylindrique multimode 2 d'ordre élevé, c'est-à-dire de dimension grande par rapport à la dimension de la longueur d'onde du champ électromagnétique. Son axe de symétrie porte la référence X. Ce champ électromagnétique est introduit radialement par une seconde entrée haute fréquence 4.The gas leaving the first stage A is pre-ionized and then passes into the second stage B. This stage B consists of a multimode cylindrical cavity 2 of high order, that is to say of large dimension with respect to the dimension of the wavelength of the electromagnetic field. Its axis of symmetry carries the reference X. This electromagnetic field is introduced radially by a second high frequency input 4.

La cavité 2 est réunie à son extrémité 5 à une pompe à vide 10b, au moyen d'une canalisation d'extraction dans laquelle sont logées des électrodes 10a. Une source d'alimentation 9 permet d'appliquer une différence de potentiel à ces électrodes.The cavity 2 is joined at its end 5 to a vacuum pump 10b, by means of an extraction pipe in which are housed electrodes 10a. A power source 9 makes it possible to apply a potential difference to these electrodes.

Cet ensemble pompe, canalisation et électrodes constitue les moyens d'extraction 10 des ions. Les ions ainsi extraits de la cavité 2 peuvent ensuite être sélectionnés suivant leur degré d'ionisation à l'aide de tout moyen connu utilisant un champ magnétique et/ou un champ électrique.This pump, pipe and electrode assembly constitutes the means for extracting the ions. The ions thus extracted from the cavity 2 can then be selected according to their degree of ionization using any known means using a magnetic field and / or an electric field.

Autour de la cavité sont disposées des bobines 14 créant un champ magnétique axial et un ensemble 16 d'aimants permanents créant un champ magnétique radial, généralement du type hexapolaire. Ces champs magnétiques axial et radial sont superposés l'un sur l'autre et répartis dans toute la cavité ; ils forment ainsi un champ magnétique résultant qui définit au moins une surface équimagnétique à l'intérieur de la cavité 2.Around the cavity are arranged coils 14 creating an axial magnetic field and a set 16 of permanent magnets creating a radial magnetic field, generally of the hexapolar type. These axial and radial magnetic fields are superimposed on each other and distributed throughout the cavity; they thus form a resulting magnetic field which defines at least one equimagnetic surface inside the cavity 2.

Le premier problème dans ce type de source est l'importance de l'encombrement ; à ce problème vient s'ajouter la difficulté de fabrication et donc le coût d'une telle source.The first problem in this type of source is the importance of the bulk; to this problem is added the difficulty of manufacture and therefore the cost of such a source.

Par ailleurs, les courants d'ions fournis par ces sources sont généralement trop faibles.Furthermore, the ion currents supplied by these sources are generally too weak.

La présente invention a pour objet une source d'ions à résonance cyclotronique permettant de remédier à ces inconvénients en simplifiant notamment ce type de source.The present invention relates to an ion source with cyclotron resonance which makes it possible to remedy these drawbacks by simplifying in particular this type of source.

De façon plus précise, l'invention a pour objet une source d'ions fortement chargés comportant essentiellement les éléments suivants :

  • une cavité, hyperfréquence 2 comportant un axe de symétrie ;
  • une entrée haute fréquence 4 débouchant dans la cavité pour y créer un champ électromagnétique de haute fréquence ;
  • une introduction de gaz 6 dans la cavité ;
  • des moyens de production 14 d'un champ magnétique selon l'axe dans ladite cavité ;
  • des moyens de production 16 d'un champ magnétique radial multipolaire dans cette cavité, la superposition de ces champs magnétiques axial et radial formant un champ magnétique résultant réparti dans toute la cavité et définissant au moins une surface équimagnétique S complètement fermée à l'intérieur de la cavité ;
  • des moyens d'extraction 10 des ions à l'extrémité 5 de la cavité ;
  • une sonde polarisable en tension 20 pour améliorer l'ionisation du gaz et augmenter ainsi le flux d'ions extrait, disposée en amont des moyens d'extraction et n'ayant aucun contact avec la surface magnétique ; et
  • des moyens d'alimentation en tension 8 de la sonde.
More specifically, the invention relates to a source of highly charged ions essentially comprising the following elements:
  • a microwave 2 cavity having an axis of symmetry;
  • a high frequency input 4 opening into the cavity to create a high frequency electromagnetic field there;
  • an introduction of gas 6 into the cavity;
  • means 14 for producing a magnetic field along the axis in said cavity;
  • means 16 for producing a multipolar radial magnetic field in this cavity, the superposition of these axial and radial magnetic fields forming a resulting magnetic field distributed throughout the cavity and defining at least one equimagnetic surface S completely closed inside the cavity ;
  • means for extracting ions 10 from the end 5 of the cavity;
  • a voltage polarizable probe 20 for improving the ionization of the gas and thus increasing the flow of extracted ions, disposed upstream of the extraction means and having no contact with the magnetic surface; and
  • voltage supply means 8 for the probe.

Par gaz, il faut aussi comprendre des vapeurs métalliques.By gas, we must also understand metallic vapors.

La caractéristique principale de l'invention est de remplacer le premier étage de la source Minimafios par une sonde polarisable en tension.The main characteristic of the invention is to replace the first stage of the Minimafios source with a voltage polarizable probe.

Outre les avantages décrits précédemment, l'invention permet un coût plus faible que celui des sources existantes telles Minimafios, la fabrication de la sonde étant plus aisée que celle du premier étage de Minimafios.In addition to the advantages described above, the invention allows a lower cost than that of existing sources such as Minimafios, the manufacture of the probe being easier than that of the first stage of Minimafios.

Selon un mode préféré de l'invention, les moyens d'alimentation en tension consistent en une source de tension variable apte à fournir à ladite sonde une tension négative par rapport au potentiel de la cavité assurant ainsi une augmentation du courant d'ions.According to a preferred embodiment of the invention, the voltage supply means consist of a variable voltage source capable of supplying said probe with a negative voltage with respect to the potential of the cavity thus ensuring an increase in the ion current.

Cette tension négative a une valeur absolue au moins égale à environ 100 volts pour une augmentation de la charge des ions.This negative voltage has an absolute value at least equal to about 100 volts for an increase in the charge of the ions.

Selon un mode de réalisation préféré, la sonde est disposée selon l'axe de la cavité, à une de ses extrémités et du côté opposé aux moyens d'extraction. Il est aussi possible de la disposer latéralement.According to a preferred embodiment, the probe is arranged along the axis of the cavity, at one of its ends and on the side opposite to the extraction means. It is also possible to arrange it laterally.

D'après l'invention, la sonde consiste en un métal émetteur d'électrons.According to the invention, the probe consists of an electron emitting metal.

Dans un mode préféré de réalisation de la source d'ions, la sonde est fabriquée en tantale. Bien entendu, tout autre métal émetteur d'électrons peut être envisagé et, en particulier, le tungstène et le molybdène.In a preferred embodiment of the ion source, the probe is made of tantalum. Of course, any other metal emitting electrons can be envisaged and, in particular, tungsten and molybdenum.

En particulier, la sonde comporte une tige de ce métal émetteur d'électrons et un disque de ce même métal fixé à une des extrémités de cette tige. Il est possible d'utiliser une sonde dont la tige est réalisée en un métal différent de celui du disque.In particular, the probe comprises a rod of this electron-emitting metal and a disc of this same metal fixed to one of the ends of this rod. It is possible to use a probe whose rod is made of a metal different from that of the disc.

Avantageusement, l'introduction du gaz se fait selon l'axe de la cavité, parallèlement à la sonde. Ceci permet d'augmenter l'ionisation des atomes neutres. On peut toutefois introduire le gaz radialement. De préférence, l'introduction de la haute fréquence se fait selon l'axe de la cavité, du côté de la sonde. Il est toutefois possible d'introduire la haute fréquence radialement. Cette source permet en particulier l'obtention d'un courant d'ions d'argon dix sept fois chargés positivement.Advantageously, the gas is introduced along the axis of the cavity, parallel to the probe. This increases the ionization of neutral atoms. However, the gas can be introduced radially. Preferably, the introduction of the high frequency takes place along the axis of the cavity, on the probe side. It is however possible to introduce the high frequency radially. This source makes it possible in particular to obtain a current of argon ions seventeen times positively charged.

D'autres caractéristiques et avantages de l'invention ressortiront mieux de la description qui va suivre, donnèe à titre illustratif mais non limitatif. La description se référe aux figures annexées, dans lesquelles :

  • la figure 1, déjà décrite, représente schématiquement une source RCE de l'art antérieur ;
  • la figure 2 représente schématiquement la source d'ions selon l'invention ;
  • la figure 3 est une représentation schématique de la cavité de la source de la figure 2 ;
  • les figures 4 à 6 sont des courbes de résultats obtenus lors d'expériences avec la source selon l'invention ; les courbes de la figure 4 donnent les variations du courant ionique Ii exprimé en microampères, en fonction de la charge de l'ion krypton. La courbe de la figure 5 montre les variations du nombre N approximatif d'impulsions par seconde de l'ion Ar¹⁷⁺ en fonction du potentiel U de la sonde exprimé en volts. La courbe de la figure 6 donne les variations du courant Is de la sonde exprimé en milliampères en fonction du potentiel U de cette même sonde exprimé en volts.
Other characteristics and advantages of the invention will emerge more clearly from the description which follows, given by way of illustration but not limitation. The description refers to the appended figures, in which:
  • FIG. 1, already described, schematically represents an RCE source of the prior art;
  • FIG. 2 schematically represents the source of ions according to the invention;
  • Figure 3 is a schematic representation of the source cavity of Figure 2;
  • Figures 4 to 6 are results curves obtained during experiments with the source according to the invention; the curves of FIG. 4 give the variations of the ion current I i expressed in microamperes, as a function of the charge of the krypton ion. The curve in FIG. 5 shows the variations in the approximate number N of pulses per second of the ion Ar¹⁷⁺ as a function of the potential U of the probe expressed in volts. The curve of FIG. 6 gives the variations of the current I s of the probe expressed in milliamps as a function of the potential U of this same probe expressed in volts.

La figure 2 représente la source d'ions selon l'invention. Cette source comporte, comme celle de l'art antérieur, un étage B équipé de la cavité 2 RCE quasiment identique au second étage B de la source de la figure 1. En revanche, le premier étage A de la source de la figure 1 a disparu et a été remplacé par une sonde 20 polarisable, alimentée en tension par une source d'alimentation variable 8. Par ailleurs, cette source comporte, à l'entrée de la cavité HF, un élément de fer doux 18 et un autre élément de fer doux 12 à la sortie de la cavité HF, en aval des électrodes 10a.Figure 2 shows the ion source according to the invention. This source comprises, like that of the prior art, a stage B equipped with the cavity 2 RCE almost identical to the second stage B of the source of FIG. 1. On the other hand, the first stage A from the source in FIG. 1 has disappeared and has been replaced by a polarizable probe 20, supplied with voltage by a variable power source 8. Furthermore, this source comprises, at the input of the HF cavity, an element of soft iron 18 and another element of soft iron 12 at the outlet of the HF cavity, downstream of the electrodes 10a.

Le rôle de l'élément 18 est identique à celui de l'élément 18a de la source de la figure 1. L'élément 12, quant à lui, permet la diminution du champ magnétique axial en aval des électrodes de sortie 10a.The role of the element 18 is identical to that of the element 18a of the source of FIG. 1. The element 12, meanwhile, allows the reduction of the axial magnetic field downstream of the output electrodes 10a.

En outre, l'alimentation 6 en gaz ou vapeur métallique est effectuée selon l'axe X de la cavité HF et non plus radialement afin d'augmenter la quantité d'ions.In addition, the supply 6 of metal gas or vapor is carried out along the axis X of the HF cavity and no longer radially in order to increase the quantity of ions.

La sonde 20 est alimentée par la source 8 de tension variable (0 - 200 V) dont le branchement électrique est tel que la sonde 20 reçoit une tension négative par rapport au potentiel de la cavité qui est supérieur de quelques kilovolts (10 à 20 kV) par rapport à la masse. La sonde 20 est constituée d'une tige 20a d'un métal émetteur d'électrons au bout de laquelle est fixé un disque 20b du même métal. Ce disque a un diamètre environ dix fois plus grand que celui de la tige 20a afin d'améliorer l'émission des électrons. Ce métal est en particulier du tantale.The probe 20 is supplied by the source 8 of variable voltage (0 - 200 V) whose electrical connection is such that the probe 20 receives a negative voltage with respect to the potential of the cavity which is higher by a few kilovolts (10 to 20 kV ) relative to mass. The probe 20 consists of a rod 20a of an electron emitting metal at the end of which is fixed a disk 20b of the same metal. This disc has a diameter about ten times larger than that of the rod 20a in order to improve the emission of the electrons. This metal is in particular tantalum.

Dans la réalisation représentée, la sonde 20 est placée à l'extrémité 3 de la cavité 2, extrémité opposée à celle des moyens d'extraction 10 des ions. De plus, elle est placée selon l'axe X de la cavité 2, parallélement à l'entrée haute fréquence 4 et à l'introduction du gaz 6. La sonde est fixée dans cette position à l'aide d'un obturateur 22, isolant électrique équipé d'orifices pour le passage, respectivement, de la tige 20a, de l'introduction du gaz 6 et de l'entrée haute fréquence 4.In the embodiment shown, the probe 20 is placed at the end 3 of the cavity 2, the opposite end to that of the ion extraction means 10. In addition, it is placed along the axis X of the cavity 2, parallel to the high frequency input 4 and the introduction of the gas 6. The probe is fixed in this position by means of a shutter 22, electrical insulator equipped with orifices for the passage, respectively, of the rod 20a, of the introduction of the gas 6 and of the high frequency input 4.

Sur la figure 3, on a représenté schématiquement une partie de la source selon l'invention et, en particulier, l'intérieur de la cavité hyperfréquence 2. La surface équimagnétique S en forme de ballon de rugby, créée par le champ magnétique résultant, est représentée à l'intérieur de la cavité 2, sans contact avec les parois de la cavité. La sonde 20 située à l'extrémité 3 de la cavité 2 n'a aucun contact avec cette surface équimagnétique S afin d'éviter au mieux les possibilités de recombinaisons d'un ion avec un ou plusieurs électrons.FIG. 3 schematically shows part of the source according to the invention and, in particular, the interior of the microwave cavity 2. The equimagnetic surface S in the shape of a rugby ball, created by the resulting magnetic field, is shown inside the cavity 2, without contact with the walls of the cavity. The probe 20 located at the end 3 of the cavity 2 has no contact with this equimagnetic surface S in order to best avoid the possibilities of recombination of an ion with one or more electrons.

Les courbes des figures 4 à 6 ont été établies pour une fréquence de 18 GHz et une tension de 15 kV appliquée à la cavité HF.The curves in FIGS. 4 to 6 have been established for a frequency of 18 GHz and a voltage of 15 kV applied to the HF cavity.

La figure 4 représente les spectres d'ionisation du krypton, c'est-à-dire les variations du courant ionique Ii du krypton, en microampères, en fonction de l'état de charge Q de l'ion krypton. Le premier spectre a est obtenu pour une sonde non polarisée et donc pour une tension de sonde nulle. Le second spectre b est obtenu pour une sonde polarisée par une tension négative de -180 volts. On remarque une augmentation du courant avec la tension de polarisation ; la valeur maximale est multipliée par un facteur au moins égal à deux lorsque la tension de la sonde passe de 0 à -180 volts.FIG. 4 represents the ionization spectra of krypton, that is to say the variations of the ion current I i of krypton, in microamperes, as a function of the state of charge Q of the krypton ion. The first spectrum a is obtained for a non-polarized probe and therefore for a zero probe voltage. The second spectrum b is obtained for a probe polarized by a negative voltage of -180 volts. We notice an increase in the current with the bias voltage; the maximum value is multiplied by a factor at least equal to two when the voltage of the probe goes from 0 to -180 volts.

Une autre conséquence de cette polarisation de la sonde est l'augmentation de la charge des ions du krypton qui passe de quatorze fois chargés positivement à dix sept fois chargés positivement, pour la valeur maximale du courant.Another consequence of this polarization of the probe is the increase in the charge of the ions krypton which goes from fourteen times positively charged to seventeen times positively charged, for the maximum value of the current.

A l'inverse, les inventeurs ont constaté que la sonde, alimentée par une tension positive par rapport à la cavité HF, a pour effet de diminuer le courant d'ions et d'augmenter les faibles états de charge.Conversely, the inventors have found that the probe, powered by a positive voltage with respect to the HF cavity, has the effect of reducing the ion current and increasing the low states of charge.

La courbe de la figure 5 représente les variations de la quantité N d'ions argon dix sept fois chargés positivement, exprimée en nombre d'impulsions par seconde, en fonction du potentiel U de la sonde, exprimé en volts.The curve in FIG. 5 represents the variations in the quantity N of argon ions seventeen times positively charged, expressed in number of pulses per second, as a function of the potential U of the probe, expressed in volts.

Cette courbe a été tracée en relevant l'intensité de la raie Kα émise par un faisceau d'ions Ar¹⁷⁺ intercepté par une cible solide. Le faisceau d'ions est extrait de la source avec un potentiel de 15 kV appliqué à la cavité par rapport à la masse et est défléchit par un aimant, par rapport à l'axe X, pour être analysé. L'angle de déviation est lié à l'état de charge sélectionné en M/Q (M est la masse de l'ion et Q sa charge). Il est ici de 104° pour Q = 17. La raie Kα (2,957 KeV) est observée avec un détecteur au germanium hyper-pur qui regarde la cible sous un angle solide 4.10⁻⁵ stéradian à travers une fenêtre de Kapton®.This curve was plotted by recording the intensity of the line K α emitted by a beam of Ar¹⁷⁺ ions intercepted by a solid target. The ion beam is extracted from the source with a potential of 15 kV applied to the cavity relative to the mass and is deflected by a magnet, relative to the X axis, to be analyzed. The deflection angle is linked to the state of charge selected in M / Q (M is the mass of the ion and Q its charge). It is here 104 ° for Q = 17. The line K α (2.957 KeV) is observed with a hyper-pure germanium detector which looks at the target under a solid 4.10⁻⁵ steradian angle through a Kapton® window.

Cette technique de mesure ne donne pas directement l'intensité du courant d'ions Ar¹⁷⁺ mais permet de suivre son évolution sans ambiguïté. L'intensité de la raie étant proportionnelle au courant d'ions Ar¹⁷⁺ tombant sur la cible. L'énergie des rayons X étant caractéristique de cet ion, on évite ainsi toute confusion avec les états de charge ayant un Q/M voisin tel que l'ion azote six fois chargé.This measurement technique does not directly give the intensity of the ion current Ar¹⁷⁺ but allows its evolution to be followed without ambiguity. The intensity of the line being proportional to the current of Ar¹⁷⁺ ions falling on the target. The energy of the X-rays being characteristic of this ion, one thus avoids any confusion with the states of charge having a close Q / M such as the nitrogen ion six times charged.

On remarque sur cette courbe la forte dépendance du nombre d'ions N avec le potentiel de la sonde. Le facteur de croissance du nombre d'ions Ar¹⁷⁺ est environ de 100 pour un potentiel de la sonde passant de -5 volts à -150 volts.Note on this curve the strong dependence of the number of N ions on the potential of the probe. The growth factor of the number of Ar¹⁷⁺ ions is approximately 100 for a potential of the probe passing from -5 volts to -150 volts.

La courbe de la figure 6 représente les variations du courant Is de la sonde en milliampères en fonction du potentiel U de cette même sonde en volts. Aux environs de U = 0, le courant de la sonde en tantale est négatif, d'une valeur absolue supérieure à 3 milliampères ; ce courant correspond à une capture d'électrons. Pour des tensions supérieures, en valeur absolue, à environ 100 volts, le courant de la sonde est positif ; il s'agit alors d'émission d'électrons par la sonde ou bien d'un courant ionique de tantale collecté ou encore d'émission d'électrons et d'un courant ionique de tantale collecté.The curve in FIG. 6 represents the variations in the current I s of the probe in milliamps as a function of the potential U of this same probe in volts. Around U = 0, the tantalum probe current is negative, with an absolute value greater than 3 milliamps; this current corresponds to a capture of electrons. For voltages above, in absolute value, around 100 volts, the probe current is positive; it is then emission of electrons by the probe or else of an ion current of tantalum collected or else emission of electrons and of an ion current of tantalum collected.

La source d'ions selon l'invention est de fabrication plus simple que les sources à deux étages connues et permet d'atteindre au moins les mêmes performances qu'une source à deux étages pour un coût moins élevé.The ion source according to the invention is simpler to manufacture than known two-stage sources and makes it possible to achieve at least the same performance as a two-stage source at a lower cost.

Claims (8)

Source d'ions positifs fortement chargés à sonde polarisable et à résonance cyclotronique électronique comportant essentiellement les éléments suivants : - une cavité hyperfréquence (2) comportant un axe de symétrie (X) ; - une entrée haute fréquence (4) débouchant dans la cavité pour y créer un champ électromagnétique de haute fréquence ; - une introduction de gaz (6) dans la cavité ; - des moyens de production (14) d'un champ magnétique selon l'axe dans ladite cavité ; - des moyens de production (16) d'un champ magnétique radial multipolaire dans cette cavité, la superposition de ces champs magnétiques axial et radial formant un champ magnétique résultant réparti dans toute la cavité et définissant au moins une surface équimagnétique (S) complètement fermée à l'intérieur de la cavité ; - des moyens d'extraction (10) des ions à l'extrémité (5) de la cavité ; - une sonde (20) polarisable en tension pour améliorer l'ionisation du gaz et augmenter ainsi le flux d'ions extrait, disposée en amont des moyens d'extraction et n'ayant aucun contact avec la surface équimagnétique ; et - des moyens d'alimentation en tension (8) de la sonde. Source of highly charged positive ions with polarizable probe and electronic cyclotron resonance essentially comprising the following elements: - a microwave cavity (2) comprising an axis of symmetry (X); - a high frequency input (4) opening into the cavity to create a high frequency electromagnetic field there; - introduction of gas (6) into the cavity; - Means for producing (14) a magnetic field along the axis in said cavity; - means (16) for producing a multipolar radial magnetic field in this cavity, the superposition of these axial and radial magnetic fields forming a resulting magnetic field distributed throughout the cavity and defining at least one completely closed equimagnetic surface (S) inside the cavity; - means for extracting (10) the ions at the end (5) of the cavity; - A voltage polarizable probe (20) to improve the ionization of the gas and thus increase the flow of extracted ions, arranged upstream of the extraction means and having no contact with the equimagnetic surface; and - voltage supply means (8) of the probe. Source selon la revendication 1, caractérisée en ce que les moyens d'alimentation en tension consistent en une source de tension variable (8) apte à fournir à ladite sonde une tension négative par rapport au potentiel de la cavité assurant une augmentation du courant d'ions.Source according to Claim 1, characterized in that the voltage supply means consist of a variable voltage source (8) capable of supplying said probe with a negative voltage with respect to the potential of the cavity ensuring an increase in the current. ions. Source selon la revendication 2, caractérisée en ce que cette tension négative a une valeur absolue au moins égale à environ 100 volts pour augmenter la charge des ions.Source according to claim 2, characterized in that this negative voltage has an absolute value at least equal to about 100 volts to increase the charge of the ions. Source selon l'une quelconque des revendications précédentes, caractérisée en ce que la sonde est disposée selon l'axe (X) de la cavité et à une de ses extrémités.Source according to any one of the preceding claims, characterized in that the probe is arranged along the axis (X) of the cavity and at one of its ends. Source selon l'une quelconque des revendications précédentes, caractérisée en ce que la sonde consiste en un métal émetteur d'électrons.Source according to any one of the preceding claims, characterized in that the probe consists of an electron-emitting metal. Source selon l'une quelconque des revendications précédentes, caractérisée en ce que la sonde (20) comporte une tige (20a) d'un métal émetteur d'électrons et un disque (20b) de ce même métal fixé à une des extrémités de ladite tige.Source according to any one of the preceding claims, characterized in that the probe (20) comprises a rod (20a) of an electron-emitting metal and a disc (20b) of this same metal fixed to one end of said rod. Source selon l'une quelconque des revendications précédentes, caractérisée en ce que l'introduction (6) de gaz se fait selon l'axe de la cavité, parallèlement à la sonde.Source according to any one of the preceding claims, characterized in that the introduction (6) of gas takes place along the axis of the cavity, parallel to the probe. Application de la source selon l'une quelconque des revendications précédentes, à l'obtention d'un courant d'ions d'argon dix sept fois chargés positivement.Application of the source according to any one of the preceding claims, to obtaining a current of seventeen times positively charged argon ions.
EP19910402829 1990-10-25 1991-10-23 Electron cyclotron resonance ion source for highly charged ions with polarisable probe Expired - Lifetime EP0483004B1 (en)

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FR9013232 1990-10-25
FR9013232A FR2668642B1 (en) 1990-10-25 1990-10-25 HIGHLY CHARGED ION SOURCE WITH POLARIZABLE PROBE AND ELECTRONIC CYCLOTRON RESONANCE.

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FR2757310A1 (en) * 1996-12-18 1998-06-19 Commissariat Energie Atomique MAGNETIC SYSTEM, IN PARTICULAR FOR ECR SOURCES, ALLOWING THE CREATION OF CLOSED SURFACES OF EQUIMODULE B OF ANY SHAPE AND DIMENSIONS
FR2757881A1 (en) * 1996-12-31 1998-07-03 Univ Paris Curie PROCESS FOR TREATING A SURFACE OF A SEMICONDUCTOR, CORRESPONDING DEVICE AND ASSOCIATED SEMICONDUCTOR
RU2377687C1 (en) * 2008-03-24 2009-12-27 Российская Федерация, от имени которой выступает государственный заказчик - Государственная корпорация по атомной энергии "Росатом" Laser source of highly charged ions
RU2538764C2 (en) * 2013-01-09 2015-01-10 Федеральное государственное бюджетное учреждение "Государственный научный центр Российской Федерации-Институт Теоретической и Экспериментальной Физики" Laser-plasma high-charge ion generator

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FR2933532B1 (en) * 2008-07-02 2010-09-03 Commissariat Energie Atomique ELECTRONIC CYCLOTRON RESONANCE ION GENERATING DEVICE

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Cited By (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE4419970A1 (en) * 1994-06-08 1995-12-21 Juergen Prof Dr Andrae Highly charged ion beam generator
FR2757310A1 (en) * 1996-12-18 1998-06-19 Commissariat Energie Atomique MAGNETIC SYSTEM, IN PARTICULAR FOR ECR SOURCES, ALLOWING THE CREATION OF CLOSED SURFACES OF EQUIMODULE B OF ANY SHAPE AND DIMENSIONS
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FR2757881A1 (en) * 1996-12-31 1998-07-03 Univ Paris Curie PROCESS FOR TREATING A SURFACE OF A SEMICONDUCTOR, CORRESPONDING DEVICE AND ASSOCIATED SEMICONDUCTOR
WO1998029901A1 (en) * 1996-12-31 1998-07-09 Universite Pierre Et Marie Curie Method and device for treating a semiconductor surface
RU2377687C1 (en) * 2008-03-24 2009-12-27 Российская Федерация, от имени которой выступает государственный заказчик - Государственная корпорация по атомной энергии "Росатом" Laser source of highly charged ions
RU2538764C2 (en) * 2013-01-09 2015-01-10 Федеральное государственное бюджетное учреждение "Государственный научный центр Российской Федерации-Институт Теоретической и Экспериментальной Физики" Laser-plasma high-charge ion generator

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EP0483004B1 (en) 1999-02-24
FR2668642A1 (en) 1992-04-30
JPH0589792A (en) 1993-04-09
FR2668642B1 (en) 1993-11-05
DE69130913D1 (en) 1999-04-01
DE69130913T2 (en) 1999-09-09

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