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EP0302313A1 - Procédé et dispositif pour traiter des objets avec des solvants dans un récipient clos - Google Patents

Procédé et dispositif pour traiter des objets avec des solvants dans un récipient clos Download PDF

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Publication number
EP0302313A1
EP0302313A1 EP88111774A EP88111774A EP0302313A1 EP 0302313 A1 EP0302313 A1 EP 0302313A1 EP 88111774 A EP88111774 A EP 88111774A EP 88111774 A EP88111774 A EP 88111774A EP 0302313 A1 EP0302313 A1 EP 0302313A1
Authority
EP
European Patent Office
Prior art keywords
solvent
container
treatment
water
mixture
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
EP88111774A
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German (de)
English (en)
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EP0302313B1 (fr
Inventor
Peter Weil
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Individual
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Individual
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Filing date
Publication date
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Priority to AT88111774T priority Critical patent/ATE70315T1/de
Publication of EP0302313A1 publication Critical patent/EP0302313A1/fr
Application granted granted Critical
Publication of EP0302313B1 publication Critical patent/EP0302313B1/fr
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Expired - Lifetime legal-status Critical Current

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Classifications

    • BPERFORMING OPERATIONS; TRANSPORTING
    • B44DECORATIVE ARTS
    • B44DPAINTING OR ARTISTIC DRAWING, NOT OTHERWISE PROVIDED FOR; PRESERVING PAINTINGS; SURFACE TREATMENT TO OBTAIN SPECIAL ARTISTIC SURFACE EFFECTS OR FINISHES
    • B44D3/00Accessories or implements for use in connection with painting or artistic drawing, not otherwise provided for; Methods or devices for colour determination, selection, or synthesis, e.g. use of colour tables
    • B44D3/24Lamps for baking lacquers; Painters belts; Apparatus for dissolving dried paints, for heating paints
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B44DECORATIVE ARTS
    • B44DPAINTING OR ARTISTIC DRAWING, NOT OTHERWISE PROVIDED FOR; PRESERVING PAINTINGS; SURFACE TREATMENT TO OBTAIN SPECIAL ARTISTIC SURFACE EFFECTS OR FINISHES
    • B44D3/00Accessories or implements for use in connection with painting or artistic drawing, not otherwise provided for; Methods or devices for colour determination, selection, or synthesis, e.g. use of colour tables
    • B44D3/16Implements or apparatus for removing dry paint from surfaces, e.g. by scraping, by burning
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23GCLEANING OR DE-GREASING OF METALLIC MATERIAL BY CHEMICAL METHODS OTHER THAN ELECTROLYSIS
    • C23G5/00Cleaning or de-greasing metallic material by other methods; Apparatus for cleaning or de-greasing metallic material with organic solvents
    • C23G5/02Cleaning or de-greasing metallic material by other methods; Apparatus for cleaning or de-greasing metallic material with organic solvents using organic solvents
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23GCLEANING OR DE-GREASING OF METALLIC MATERIAL BY CHEMICAL METHODS OTHER THAN ELECTROLYSIS
    • C23G5/00Cleaning or de-greasing metallic material by other methods; Apparatus for cleaning or de-greasing metallic material with organic solvents
    • C23G5/02Cleaning or de-greasing metallic material by other methods; Apparatus for cleaning or de-greasing metallic material with organic solvents using organic solvents
    • C23G5/028Cleaning or de-greasing metallic material by other methods; Apparatus for cleaning or de-greasing metallic material with organic solvents using organic solvents containing halogenated hydrocarbons
    • C23G5/02806Cleaning or de-greasing metallic material by other methods; Apparatus for cleaning or de-greasing metallic material with organic solvents using organic solvents containing halogenated hydrocarbons containing only chlorine as halogen atom

Definitions

  • the invention relates to a method and a device for treating objects in a closed container with solvent, the objects to be treated being treated at least temporarily by immersion in solvent and then sprayed off in a solvent-free area of the container.
  • DE-A-33 00 666 discloses a washing process for small parts, in which the small parts are passed through solvents in treatment baskets in a closed container and are sprayed off above the solvent level. This process is used as a washing process and has some advantages, but it is not suitable for stripping or stripping objects.
  • the paint residues contain chlorine-containing solvents, which means expensive destruction. Only a limited use of additives, such as phenols, cresols or the like, is also possible for health and environmental reasons. With a degree of silting of the immersion baths of about 50%, the entire system must be destroyed or replaced. Due to the higher requirements for environmental compatibility, this known technology has been replaced by other processes.
  • pyrolysis it is known to carry out pyrolysis by means of higher temperatures.
  • pyrolysis which can take place at temperatures around 400 ° C.
  • no temperature-sensitive parts such as wood, plastic, hardened metals, thin sheets, light and non-ferrous metals, soldered parts, magnetized metals, etc.
  • halogen compounds can occur in the hot exhaust gases if, for example, polyvenyl chloride or chlorinated rubber is carbonized. These acidic gases can be neutralized in so-called afterwashers the.
  • the combustion produces highly toxic dioxins (Seveso), which can then be found in the wash water or can be released into the environment via the fireplace.
  • Paint stripping by burning is no longer possible today for environmental reasons, otherwise it can only be used to a limited extent, if at all.
  • hot stripping in hot alkali solutions or acids for example hot sulfuric acid
  • This treatment is dangerous, the baths are enriched with heavy metals, complexing agents, surfactants, so that there can ultimately be a pollution of the environment, especially of the waste water.
  • extremely aggressive, corrosive vapors also have a negative impact on the environment and personnel and must be recorded and neutralized in a complex manner.
  • used pickling liquids have to be destroyed in a cost-intensive manner. The amount of waste thus increases considerably and puts a strain on the sewage treatment plants due to large amounts of salt.
  • the object of the invention is to provide a solution with which the disadvantages described above are avoided not only when stripping paint, but also during other stripping treatment of surfaces, in particular also solvents in the coating materials can be completely removed and kept in the treatment process, and materials can be easily disposed of and can be treated in an environmentally friendly manner.
  • the process has considerable advantages over known processes.
  • a treatment agent mixture of solvent and an excess proportion of water azeotropic methylene chloride / water 98.5 to 1.5%, here for example 80 to 20%
  • the closed circuit avoids polluting emissions such as pollution of air, soil and water. There is also no need for thermal removal of halogen coating materials, as a result of which there is no formation of dioxides, for example in the pyrolysis of PVC.
  • the treatment in the boiling treatment agent mixture which in the example of methylene chloride boils with water at 38.1 ° C., shortens the treatment times many times over, so that the throughput of such a treatment is also reduced System increased or the size can be reduced accordingly, the amount of substances to be used can be kept correspondingly low.
  • Another advantage is that the materials that have to be removed from the surface of the objects to be treated can be removed in comparatively large pieces, which are then e.g. are recyclable. A load on the treatment liquids by foreign substances, such as resins or the like, is thereby avoided or reduced over a long period of time, so that rare regeneration phases can be maintained.
  • the invention provides that circulated water is used to remove the solvent from the system and from the coating or lacquer residues, at least some of this water having previously been used as part of the treatment agent mixture.
  • the water in the system can therefore be reused very often, which also leads to a very economical procedure.
  • One embodiment of the invention is that after complete removal of the solvent from the system by boiling and recondensing, the parts in the treatment be hosed and removed from the container and / or that the solvent-free residues are collected and recycled.
  • the invention also provides that the vapor phase of the solvent condenses in the upper region of the immersion tank and the condensate can be used as a spray. This has the advantage that the entire process, as far as the solvent is concerned, can be recycled, i.e. the risk of polluting the environment is avoided.
  • additives are added to the spraying agent.
  • These additives can be of very different types, they can be corrosives, chemicals for passivation, if with an acidic medium, for example in a medium containing formic acid, has been stripped, it can be oily and / or aqueous additives and the like. More.
  • the invention can also be used in the same way, e.g. for degreasing surfaces with other solvents or treatment mixtures in the liquid or vapor phase.
  • the expulsion of such solvents or treatment mixtures can then again be azeotropic, e.g. by boiling with water, for example: trichlorethylene with water (ratio 93.4% tri to 6.6% H2O) or tetrachloroethene with water in a ratio of 87.1% tetrachloroethene to 15.9% water, here the principle the system displacement by the higher boiling substance is exploited in a completely closed procedure.
  • the environmentally harmful azeotrope component should be driven out in the system by the less or not at all polluting substance (here essentially H2O).
  • stripping agents are only present in the system as an intermediate stage, as in most extractive processes, and are removed from them after the stripping process, they do not cause any additional waste problems. (Cold paint removers with a content of approx. 50% paint are often destroyed due to silting up, i.e. doubling and additional pollution of the waste with environmentally harmful additives).
  • the dampened aggressiveness enables small surface changes compared to many raw materials by using inhibitors in the acidic as well as in the alkaline range. Strongly caustic processes are often used to remove extremely resistant layers from sensitive base materials. (Hot concentrated sulfuric acid, hot caustic soda, etc.). This doesn't just mean Surface changes, but also complex neutralization in the aftertreatment (over-salting of the waste water).
  • the invention also provides a system with an immersion tank that can be at least partially filled with a solvent mixture, this system being characterized in that the immersion tank with a heating device in its lower region and with a cooling device in the region of the above Lid is equipped.
  • the heating device With the heating device, it becomes possible to keep the super-azeotropic solvent / water mixture at the boiling point of this mixture during the treatment process.
  • the treatment process is complete and the solvent has been pumped out of the container. So ent neither water remaining in the container nor separately introduced water are heated, the solvent being expelled from the mixture and the coating materials first at the appropriate temperature of the azeotrope.
  • the cooling device in the area of the upper edge is able to condense the solvent vapors, so the solvent can be removed from the container. A further heating of the water via the heating device then ensures the evaporation of the water.
  • the condensate or. Cooling device in the head region of the container can be used to return the water to other parts of the system, which means that all vaporizable components can be removed from the container before opening the lid.
  • the cooling device in the head area of the immersion tank also has the task of forming a type of vapor barrier when the tank is open, but if solvent residues, for whatever reason, should remain in the open tank, their vapors can then be condensed without causing it to environmental pollution.
  • the invention provides that the immersion container, at least in its gas space, has a spray device for objects to be treated there de is equipped.
  • This spraying device can be installed in a stationary manner, but it can also be a spraying lance or the like which can be operated by hand, of course both options can also be provided at the same time.
  • the gas space is to be understood as both the space above a liquid level and the total space of the container when the treatment agent mixture has been pumped out.
  • the invention has the particular advantage of the completely closed mode of operation.
  • at least one collecting container for solvents, one collecting container for water and one collecting container for a further treatment agent, such as a neutralizing agent or the like are assigned to the immersion container.
  • a further treatment agent such as a neutralizing agent or the like
  • At least one of the collection containers for solvents can also be used as a collection container for the treatment agent mixture, i.e. e.g. for the mixture of methylene chloride with an excess of water based on the azeotropic mixture.
  • the immersion tank has an activated carbon filter and / or a pressure compensation is provided.
  • These system elements have the task of providing gas volume compensation when the container is closed and after flooding with the treatment agent mixture when the heating device begins to heat. The portion of the gas volume expanding over the treatment agent mixture is released into the environment via the activated carbon filter by increasing the volume compared to the gas space volume of the immersion tank, or it acts on the pressure compensation tank.
  • a simple further embodiment of the invention consists in that the cooling device is assigned a condensate collection channel with drain lines.
  • the drain lines can be feed lines to the corresponding collecting containers for the treatment agent mixture and / or for the solvent and / or for water, but it can also be a bypass line which returns the condensate directly to the treatment room.
  • the system generally designated 1 for the treatment, for example for stripping or stripping, of objects 2 consists essentially of a dip tank 3, which can be closed by a removable cover 4 on the top. Through the opening released by the lid 4, the immersion container 3 is loaded with the objects 2 to be treated, which are arranged, for example, in an immersed basket 5.
  • the immersion tank 3 is provided in the lower area with a heating device 6, in the upper area near the cover 4 with cooling coils 7, which are equipped with a condensate channel 8 underneath.
  • Storage tanks are provided for receiving treatment liquid and / or neutralizing agent and / or water or the like, such as the treating agent tank 9, the condensate / water tank 10 and the neutralizing agent tank 11, each of which is shown in the figure by additional tanks 9a, 9b or 10a and 11a are added to show that the type and size of the tanks are not important.
  • a relief line 12 is provided, which leads to an activated carbon plant 13 and to a pressure compensation tank 14. Via the activated carbon system 13, a gas volume can be released to the environment via the valve 15, which gas volume is formed by thermal expansion when heated.
  • the immersion container 3 is approximately half filled with liquid so that the container is divided into a liquid region 16 and a gas space 17.
  • spray devices are provided, e.g. a permanently installed spraying system 18 and a manual spraying system 19, the specific design of which is not important.
  • the container If the container is empty, it can be filled with the latter for the treatment of the objects 2.
  • the cover 4 is removed and the cooling runs over the cooling device 7.
  • the immersion container 5 which can be provided with an additional perforated plate 5 a on one of its undersides
  • the latter is introduced into the immersion container 3 from above.
  • the lid is closed and, for example, a mixture of methylene chloride and alcohols and other solvents, acids or alkali, such as, for example, armines or surfactants or the like, and water is introduced in an over-azeotropic ratio from the tank or tanks 9 or 9a, 9b.
  • the tanks 9, 9a, 9b can be arranged higher in the direction of gravity than the highest filling level of the container 3, so that an additional pumping is unnecessary when filling, but a complete pumping out of the mixture can be ensured when emptying.
  • the heating device After flooding, the heating device is turned on and the treatment agent mixture is heated, a mixture of methylene chloride / water azeotrope boiling at 38.1 ° C. in a ratio of 89.5 to 1.5%. Boiling or bubbling the liquid accelerates the reaction, the treatment time of the parts 2 to be treated can thus e.g. compared to a cold stripping process can be shortened by a multiple, approximately 10 to 20 times, which means a 10 to 20 times higher throughput of the system.
  • the gas mixture expanding in the gas space 17 is fed via the line 12, for example to the activated carbon filter system 13, and can be released into the environment via the valve 15.
  • a vapor of solvent and water which then forms in the gas space 17 is condensed on the cooling coils 6 and collected via the condensate collecting channel 8 and, for example via a bypass line 20, is fed directly back to the immersion container 3.
  • the heating is switched off.
  • methylene chloride as solvent, it settles down below after a short time, while the water floats up as a lighter medium.
  • the methylene chloride can now be pumped back into or into one of the containers 9 to 9b, and a water fraction is left in the immersion container 3.
  • the extraction phase begins, i.e. the heating is switched on again.
  • the methylene / water mixture boils again azeotropically at 38.1 ° C.
  • the gas phase is condensed again on the cooling coils and is now fed to the storage tank 9 via line 21. If the temperature rises above 38.1 ° C, the operator finds that all methylene chloride has been distilled out. Between this temperature and the boiling point of water there are further azeotropes of the other additives, such as alcohols, formic or acetic acids, esters and the like. Like. These can then be distilled out accordingly.
  • the lid can be removed. Solvents are now completely removed from the immersion container 3, there are only parts of lacquer or paint or plastics or other detached coating materials and possibly water in the container.
  • the parts When slowly extending the diving basket 5 NEN the parts are now hosed by the stationary or the hand-operated spraying systems 18 and 19, in such a way that the coatings, which generally peel off over a large area, collect in the lower perforated plate 5a.
  • additives may also be added to the water to be treated, such as anti-corrosion agents or the like. This also saves an external spraying place by spraying in the immersion tank.
  • the water-wet residues on the perforated plate can be dewatered via filter presses or the like and can be reused. With the appropriate procedure, the hosed and removed parts are still comparatively warm, so that they dry very quickly, which additionally reduces corrosion.
  • a solvent vapor treatment in the steam space 17 can also be carried out simultaneously, e.g. of objects that are not suitable for immersion treatment, e.g. Light metals and their alloys, non-ferrous metals, wood, plastics u. This procedure can e.g. also used for incorrectly painted parts from electronics, from aircraft construction, from automobile production, for example for light alloy high-speed rims. Like. more.
  • the system can work completely closed, a certain volume of gas is discharged in the upward process via the activated carbon filter system 13, it is the only emission to the environment, but this volume can also be collected in a pressure expansion tank 14, then the system is pressurized to a certain extent operated towards the environment.
  • degreasing processes or other treatment processes can also be carried out in the system, depending entirely on the liquid mixtures used or their over-azeotropic compositions.

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  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Vaporization, Distillation, Condensation, Sublimation, And Cold Traps (AREA)
  • Cleaning By Liquid Or Steam (AREA)
  • Detergent Compositions (AREA)
  • Paints Or Removers (AREA)
  • Processing And Handling Of Plastics And Other Materials For Molding In General (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
  • Cleaning And De-Greasing Of Metallic Materials By Chemical Methods (AREA)
  • Treatment Of Fiber Materials (AREA)
EP88111774A 1987-08-01 1988-07-21 Procédé et dispositif pour traiter des objets avec des solvants dans un récipient clos Expired - Lifetime EP0302313B1 (fr)

Priority Applications (1)

Application Number Priority Date Filing Date Title
AT88111774T ATE70315T1 (de) 1987-08-01 1988-07-21 Verfahren und vorrichtung zum behandeln von gegenstaenden in einem geschlossenen behaelter mit loesungsmittel.

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
DE3725565A DE3725565A1 (de) 1987-08-01 1987-08-01 Verfahren und anlage zum entlacken von gegenstaenden mit einem tauchbehaelter mit loesungsmittel
DE3725565 1987-08-01

Publications (2)

Publication Number Publication Date
EP0302313A1 true EP0302313A1 (fr) 1989-02-08
EP0302313B1 EP0302313B1 (fr) 1991-12-11

Family

ID=6332876

Family Applications (1)

Application Number Title Priority Date Filing Date
EP88111774A Expired - Lifetime EP0302313B1 (fr) 1987-08-01 1988-07-21 Procédé et dispositif pour traiter des objets avec des solvants dans un récipient clos

Country Status (10)

Country Link
US (1) US5011542A (fr)
EP (1) EP0302313B1 (fr)
JP (1) JPH02500178A (fr)
KR (1) KR950014078B1 (fr)
AT (1) ATE70315T1 (fr)
BR (1) BR8807154A (fr)
DE (2) DE3725565A1 (fr)
ES (1) ES2027351T3 (fr)
GR (1) GR3003993T3 (fr)
WO (1) WO1989001057A1 (fr)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0416763A1 (fr) * 1989-08-14 1991-03-13 BUSH BOAKE ALLEN Limited Procédés et compositions pour le nettoyage des articles
WO1996018511A1 (fr) * 1994-12-16 1996-06-20 Rotary Stripping Systems Limited Appareil de support d'articles dans des cuves de traitement liquide
WO1996024704A1 (fr) * 1995-02-07 1996-08-15 Peter Weil Procede de nettoyage d'objets a l'aide de solvants dans une chambre de traitement fermee

Families Citing this family (89)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5094696A (en) * 1988-04-25 1992-03-10 Aga Aktiebolag Method of removing paint
US5300154A (en) * 1990-08-14 1994-04-05 Bush Boake Allen Limited Methods for cleaning articles
US5346534A (en) * 1990-09-12 1994-09-13 Baxter International Inc. Process for treating an article with a volatile fluid
DE4119303A1 (de) * 1991-06-12 1991-12-12 Rolf Prof Dr Ing Germerdonk Verfahren zum zerlegen von stueckigen abfallgemischen, die metallteile, loesliche polymere, insbes. aus (chlor-)kohlenwasserstoffen, weichmachern sowie farb- und zuschlagstoffe enthalten, in zwei bzw. drei recyclingfaehige komponenten und in einen chlorkohlenwasserstoff-freien, problemloser zu entsorgenden restabfall
DE4138400C1 (fr) * 1991-11-22 1993-02-18 Aichelin Gmbh, 7015 Korntal-Muenchingen, De
US5273060A (en) * 1992-06-26 1993-12-28 Martin Marietta Corporation Alcohol spray cleaning system
DE4317862A1 (de) * 1993-05-28 1994-12-01 Aichelin Ind Ofen Verfahren und Vorrichtung zum Reinigen von metallischen Werkstücken
US5377705A (en) * 1993-09-16 1995-01-03 Autoclave Engineers, Inc. Precision cleaning system
US5367881A (en) * 1993-09-28 1994-11-29 Liquid Carbonic Corporation Cryogenic control of emission of solvent vapors from mixers
DE4336704A1 (de) * 1993-10-27 1995-05-04 Wacker Chemitronic Verfahren und Vorrichtung zur Behandlung von scheibenförmigen Werkstücken mit einer Flüssigkeit
US6027651A (en) * 1994-06-06 2000-02-22 Cash; Alan B. Process for regenerating spent solvent
US5876567A (en) * 1995-04-28 1999-03-02 Yamamoto; Soichiro Solvent recycling system
TW539918B (en) 1997-05-27 2003-07-01 Tokyo Electron Ltd Removal of photoresist and photoresist residue from semiconductors using supercritical carbon dioxide process
US6306564B1 (en) 1997-05-27 2001-10-23 Tokyo Electron Limited Removal of resist or residue from semiconductors using supercritical carbon dioxide
US6500605B1 (en) 1997-05-27 2002-12-31 Tokyo Electron Limited Removal of photoresist and residue from substrate using supercritical carbon dioxide process
US7064070B2 (en) * 1998-09-28 2006-06-20 Tokyo Electron Limited Removal of CMP and post-CMP residue from semiconductors using supercritical carbon dioxide process
US6277753B1 (en) 1998-09-28 2001-08-21 Supercritical Systems Inc. Removal of CMP residue from semiconductors using supercritical carbon dioxide process
JP5073902B2 (ja) * 1999-11-02 2012-11-14 東京エレクトロン株式会社 多数のワークピースを超臨界処理する方法及び装置
US6748960B1 (en) * 1999-11-02 2004-06-15 Tokyo Electron Limited Apparatus for supercritical processing of multiple workpieces
US6558475B1 (en) * 2000-04-10 2003-05-06 International Business Machines Corporation Process for cleaning a workpiece using supercritical carbon dioxide
US6890853B2 (en) * 2000-04-25 2005-05-10 Tokyo Electron Limited Method of depositing metal film and metal deposition cluster tool including supercritical drying/cleaning module
KR100750018B1 (ko) * 2000-07-26 2007-08-16 동경 엘렉트론 주식회사 반도체 기판의 처리를 위한 고압 챔버 및 반도체 기판의고압 처리를 위한 장치
US6428683B1 (en) * 2000-12-15 2002-08-06 United Technologies Corporation Feedback controlled airfoil stripping system with integrated water management and acid recycling system
TW589657B (en) * 2001-04-10 2004-06-01 Tokyo Electron Ltd High pressure processing chamber for semiconductor substrate including flow enhancing features
US20040040660A1 (en) * 2001-10-03 2004-03-04 Biberger Maximilian Albert High pressure processing chamber for multiple semiconductor substrates
US20040016450A1 (en) * 2002-01-25 2004-01-29 Bertram Ronald Thomas Method for reducing the formation of contaminants during supercritical carbon dioxide processes
US7001468B1 (en) 2002-02-15 2006-02-21 Tokyo Electron Limited Pressure energized pressure vessel opening and closing device and method of providing therefor
WO2003070846A2 (fr) * 2002-02-15 2003-08-28 Supercritical Systems Inc. Sechage d'une photoresine au moyen d'un bain aux solvants et d'un co2 supercritique
US6924086B1 (en) * 2002-02-15 2005-08-02 Tokyo Electron Limited Developing photoresist with supercritical fluid and developer
US20030155541A1 (en) * 2002-02-15 2003-08-21 Supercritical Systems, Inc. Pressure enhanced diaphragm valve
US7387868B2 (en) 2002-03-04 2008-06-17 Tokyo Electron Limited Treatment of a dielectric layer using supercritical CO2
JP4246640B2 (ja) * 2002-03-04 2009-04-02 東京エレクトロン株式会社 ウェハ処理において低誘電率材料を不動態化する方法
US20050227187A1 (en) * 2002-03-04 2005-10-13 Supercritical Systems Inc. Ionic fluid in supercritical fluid for semiconductor processing
US20040072706A1 (en) * 2002-03-22 2004-04-15 Arena-Foster Chantal J. Removal of contaminants using supercritical processing
US7169540B2 (en) * 2002-04-12 2007-01-30 Tokyo Electron Limited Method of treatment of porous dielectric films to reduce damage during cleaning
JP2004050119A (ja) * 2002-07-23 2004-02-19 Matsushita Electric Ind Co Ltd 洗浄装置及び洗浄方法
DE10258490A1 (de) * 2002-12-14 2004-07-08 Daimlerchrysler Ag Verfahren zur Entlackung von Polymersubstraten
US20040112409A1 (en) * 2002-12-16 2004-06-17 Supercritical Sysems, Inc. Fluoride in supercritical fluid for photoresist and residue removal
US20040177867A1 (en) * 2002-12-16 2004-09-16 Supercritical Systems, Inc. Tetra-organic ammonium fluoride and HF in supercritical fluid for photoresist and residue removal
US7021635B2 (en) * 2003-02-06 2006-04-04 Tokyo Electron Limited Vacuum chuck utilizing sintered material and method of providing thereof
US20040154647A1 (en) * 2003-02-07 2004-08-12 Supercritical Systems, Inc. Method and apparatus of utilizing a coating for enhanced holding of a semiconductor substrate during high pressure processing
US7225820B2 (en) * 2003-02-10 2007-06-05 Tokyo Electron Limited High-pressure processing chamber for a semiconductor wafer
US7077917B2 (en) * 2003-02-10 2006-07-18 Tokyo Electric Limited High-pressure processing chamber for a semiconductor wafer
US7270137B2 (en) 2003-04-28 2007-09-18 Tokyo Electron Limited Apparatus and method of securing a workpiece during high-pressure processing
US20040231707A1 (en) * 2003-05-20 2004-11-25 Paul Schilling Decontamination of supercritical wafer processing equipment
US7163380B2 (en) * 2003-07-29 2007-01-16 Tokyo Electron Limited Control of fluid flow in the processing of an object with a fluid
US20050035514A1 (en) * 2003-08-11 2005-02-17 Supercritical Systems, Inc. Vacuum chuck apparatus and method for holding a wafer during high pressure processing
US20050034660A1 (en) * 2003-08-11 2005-02-17 Supercritical Systems, Inc. Alignment means for chamber closure to reduce wear on surfaces
US20050067002A1 (en) * 2003-09-25 2005-03-31 Supercritical Systems, Inc. Processing chamber including a circulation loop integrally formed in a chamber housing
US7186093B2 (en) * 2004-10-05 2007-03-06 Tokyo Electron Limited Method and apparatus for cooling motor bearings of a high pressure pump
US7250374B2 (en) * 2004-06-30 2007-07-31 Tokyo Electron Limited System and method for processing a substrate using supercritical carbon dioxide processing
US7307019B2 (en) * 2004-09-29 2007-12-11 Tokyo Electron Limited Method for supercritical carbon dioxide processing of fluoro-carbon films
US20060065288A1 (en) * 2004-09-30 2006-03-30 Darko Babic Supercritical fluid processing system having a coating on internal members and a method of using
US20060065189A1 (en) * 2004-09-30 2006-03-30 Darko Babic Method and system for homogenization of supercritical fluid in a high pressure processing system
US7491036B2 (en) * 2004-11-12 2009-02-17 Tokyo Electron Limited Method and system for cooling a pump
US20060102590A1 (en) * 2004-11-12 2006-05-18 Tokyo Electron Limited Method for treating a substrate with a high pressure fluid using a preoxide-based process chemistry
US20060102591A1 (en) * 2004-11-12 2006-05-18 Tokyo Electron Limited Method and system for treating a substrate using a supercritical fluid
US20060102204A1 (en) * 2004-11-12 2006-05-18 Tokyo Electron Limited Method for removing a residue from a substrate using supercritical carbon dioxide processing
US20060102208A1 (en) * 2004-11-12 2006-05-18 Tokyo Electron Limited System for removing a residue from a substrate using supercritical carbon dioxide processing
US20060130966A1 (en) * 2004-12-20 2006-06-22 Darko Babic Method and system for flowing a supercritical fluid in a high pressure processing system
US20060135047A1 (en) * 2004-12-22 2006-06-22 Alexei Sheydayi Method and apparatus for clamping a substrate in a high pressure processing system
US7140393B2 (en) * 2004-12-22 2006-11-28 Tokyo Electron Limited Non-contact shuttle valve for flow diversion in high pressure systems
US7434590B2 (en) * 2004-12-22 2008-10-14 Tokyo Electron Limited Method and apparatus for clamping a substrate in a high pressure processing system
US7291565B2 (en) * 2005-02-15 2007-11-06 Tokyo Electron Limited Method and system for treating a substrate with a high pressure fluid using fluorosilicic acid
US7435447B2 (en) * 2005-02-15 2008-10-14 Tokyo Electron Limited Method and system for determining flow conditions in a high pressure processing system
US20060180572A1 (en) * 2005-02-15 2006-08-17 Tokyo Electron Limited Removal of post etch residue for a substrate with open metal surfaces
US20060180174A1 (en) * 2005-02-15 2006-08-17 Tokyo Electron Limited Method and system for treating a substrate with a high pressure fluid using a peroxide-based process chemistry in conjunction with an initiator
US20060186088A1 (en) * 2005-02-23 2006-08-24 Gunilla Jacobson Etching and cleaning BPSG material using supercritical processing
US20060185693A1 (en) * 2005-02-23 2006-08-24 Richard Brown Cleaning step in supercritical processing
US20060185694A1 (en) * 2005-02-23 2006-08-24 Richard Brown Rinsing step in supercritical processing
US7550075B2 (en) 2005-03-23 2009-06-23 Tokyo Electron Ltd. Removal of contaminants from a fluid
US7380984B2 (en) * 2005-03-28 2008-06-03 Tokyo Electron Limited Process flow thermocouple
US7767145B2 (en) 2005-03-28 2010-08-03 Toyko Electron Limited High pressure fourier transform infrared cell
US20060225772A1 (en) * 2005-03-29 2006-10-12 Jones William D Controlled pressure differential in a high-pressure processing chamber
US7442636B2 (en) * 2005-03-30 2008-10-28 Tokyo Electron Limited Method of inhibiting copper corrosion during supercritical CO2 cleaning
US7494107B2 (en) * 2005-03-30 2009-02-24 Supercritical Systems, Inc. Gate valve for plus-atmospheric pressure semiconductor process vessels
US7399708B2 (en) * 2005-03-30 2008-07-15 Tokyo Electron Limited Method of treating a composite spin-on glass/anti-reflective material prior to cleaning
US20060219268A1 (en) * 2005-03-30 2006-10-05 Gunilla Jacobson Neutralization of systemic poisoning in wafer processing
US20060223899A1 (en) * 2005-03-30 2006-10-05 Hillman Joseph T Removal of porogens and porogen residues using supercritical CO2
US20060255012A1 (en) * 2005-05-10 2006-11-16 Gunilla Jacobson Removal of particles from substrate surfaces using supercritical processing
US7789971B2 (en) * 2005-05-13 2010-09-07 Tokyo Electron Limited Treatment of substrate using functionalizing agent in supercritical carbon dioxide
US7524383B2 (en) * 2005-05-25 2009-04-28 Tokyo Electron Limited Method and system for passivating a processing chamber
US20070000519A1 (en) * 2005-06-30 2007-01-04 Gunilla Jacobson Removal of residues for low-k dielectric materials in wafer processing
US20070012337A1 (en) * 2005-07-15 2007-01-18 Tokyo Electron Limited In-line metrology for supercritical fluid processing
US10421124B2 (en) * 2017-09-12 2019-09-24 Desktop Metal, Inc. Debinder for 3D printed objects
CN109174780A (zh) * 2018-07-20 2019-01-11 孟凡清 一种镜片脱膜设备
CN109201605B (zh) * 2018-09-13 2023-05-09 无锡市恒利弘实业有限公司 一种金属表面保护uv油墨的脱膜装置
CN109201606B (zh) * 2018-09-13 2023-05-09 无锡市恒利弘实业有限公司 一种金属基材表面uv油墨的剥离联用工艺
CN109201607B (zh) * 2018-09-13 2023-05-09 无锡市恒利弘实业有限公司 一种金属基材表面uv油墨的剥离联用装置

Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2310569A (en) * 1941-07-18 1943-02-09 Ici Ltd Degreasing of metal articles
GB870970A (en) * 1959-10-28 1961-06-21 Du Pont Improvements in or relating to the cleaning of articles
FR2044887A5 (fr) * 1969-05-09 1971-02-26 Hunter Douglas International
EP0080407A2 (fr) * 1981-11-19 1983-06-01 L'air Liquide, Societe Anonyme Pour L'etude Et L'exploitation Des Procedes Georges Claude Procédé et installation de décapage d'objets pourvus d'un revêtement
GB2113719A (en) * 1982-01-26 1983-08-10 Guido Zucchini Solvent recovery and regeneration in washing operation
EP0087055A1 (fr) * 1982-02-18 1983-08-31 Dürr GmbH Procédé pour le traitement par solvant d'objets métalliques

Family Cites Families (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CA579891A (fr) * 1959-07-21 J. Rosenthal Arnold Deshydratation de melanges de chlorure de methylene avec des alcools
US2385564A (en) * 1940-06-19 1945-09-25 Ici Ltd Solvent extraction
US3338756A (en) * 1963-10-28 1967-08-29 Hooker Chemical Corp Method for removing coatings
US3794524A (en) * 1972-11-21 1974-02-26 Chemed Corp Stripping method
CA1001934A (en) * 1974-03-26 1976-12-21 Tony G. Talana Method of stripping paint
US4038155A (en) * 1976-04-05 1977-07-26 Purex Corporation Ltd. Energy saving vapor degreasing apparatus
US4339283A (en) * 1980-02-19 1982-07-13 Mccord James W Vapor generating and recovering apparatus
DE3015524C2 (de) * 1980-04-23 1985-05-23 LPW-Reinigungstechnik GmbH, 7024 Filderstadt Anlage zum Behandeln von Gegenständen mit Lösungsmitteln, lösungsmittelhaltigen Flüssigkeiten und mit Lösungsmitteldämpfen
DE8437870U1 (de) * 1984-12-22 1986-02-13 Wache Oberflächentechnik GmbH & Co KG, 2000 Norderstedt Vorrichtung zum Waschen von vorzugsweise metallischen Werkstücken
US4770197A (en) * 1986-02-21 1988-09-13 Westinghouse Electric Corp. Apparatus for recovering solvent

Patent Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2310569A (en) * 1941-07-18 1943-02-09 Ici Ltd Degreasing of metal articles
GB870970A (en) * 1959-10-28 1961-06-21 Du Pont Improvements in or relating to the cleaning of articles
FR2044887A5 (fr) * 1969-05-09 1971-02-26 Hunter Douglas International
EP0080407A2 (fr) * 1981-11-19 1983-06-01 L'air Liquide, Societe Anonyme Pour L'etude Et L'exploitation Des Procedes Georges Claude Procédé et installation de décapage d'objets pourvus d'un revêtement
GB2113719A (en) * 1982-01-26 1983-08-10 Guido Zucchini Solvent recovery and regeneration in washing operation
EP0087055A1 (fr) * 1982-02-18 1983-08-31 Dürr GmbH Procédé pour le traitement par solvant d'objets métalliques

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0416763A1 (fr) * 1989-08-14 1991-03-13 BUSH BOAKE ALLEN Limited Procédés et compositions pour le nettoyage des articles
WO1996018511A1 (fr) * 1994-12-16 1996-06-20 Rotary Stripping Systems Limited Appareil de support d'articles dans des cuves de traitement liquide
WO1996024704A1 (fr) * 1995-02-07 1996-08-15 Peter Weil Procede de nettoyage d'objets a l'aide de solvants dans une chambre de traitement fermee

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KR950014078B1 (ko) 1995-11-21
US5011542A (en) 1991-04-30
WO1989001057A1 (fr) 1989-02-09
GR3003993T3 (fr) 1993-03-16
BR8807154A (pt) 1989-10-17
KR890701799A (ko) 1989-12-21
ES2027351T3 (es) 1992-06-01
JPH02500178A (ja) 1990-01-25
DE3866820D1 (de) 1992-01-23
ATE70315T1 (de) 1991-12-15
EP0302313B1 (fr) 1991-12-11
DE3725565A1 (de) 1989-02-16

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