EP0044326A1 - Conductane transparent laminate, method for the preparation thereof and utilisation thereof - Google Patents
Conductane transparent laminate, method for the preparation thereof and utilisation thereofInfo
- Publication number
- EP0044326A1 EP0044326A1 EP81900335A EP81900335A EP0044326A1 EP 0044326 A1 EP0044326 A1 EP 0044326A1 EP 81900335 A EP81900335 A EP 81900335A EP 81900335 A EP81900335 A EP 81900335A EP 0044326 A1 EP0044326 A1 EP 0044326A1
- Authority
- EP
- European Patent Office
- Prior art keywords
- oxide
- conductive layer
- rare earth
- layer according
- amine
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Withdrawn
Links
- 238000000034 method Methods 0.000 title claims description 13
- 238000002360 preparation method Methods 0.000 title description 2
- 229910052761 rare earth metal Inorganic materials 0.000 claims abstract description 13
- 150000002910 rare earth metals Chemical class 0.000 claims abstract description 13
- 239000004973 liquid crystal related substance Substances 0.000 claims abstract description 7
- 150000002902 organometallic compounds Chemical class 0.000 claims abstract description 7
- 150000001875 compounds Chemical class 0.000 claims abstract description 5
- 229910052793 cadmium Inorganic materials 0.000 claims abstract description 4
- BDOSMKKIYDKNTQ-UHFFFAOYSA-N cadmium atom Chemical compound [Cd] BDOSMKKIYDKNTQ-UHFFFAOYSA-N 0.000 claims abstract description 4
- 229910052732 germanium Inorganic materials 0.000 claims abstract description 4
- GNPVGFCGXDBREM-UHFFFAOYSA-N germanium atom Chemical compound [Ge] GNPVGFCGXDBREM-UHFFFAOYSA-N 0.000 claims abstract description 4
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 claims abstract description 3
- 229910052718 tin Inorganic materials 0.000 claims abstract description 3
- 150000001412 amines Chemical group 0.000 claims abstract 5
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 claims abstract 4
- WYURNTSHIVDZCO-UHFFFAOYSA-N Tetrahydrofuran Chemical compound C1CCOC1 WYURNTSHIVDZCO-UHFFFAOYSA-N 0.000 claims abstract 4
- 125000003903 2-propenyl group Chemical group [H]C([*])([H])C([H])=C([H])[H] 0.000 claims abstract 3
- 150000004703 alkoxides Chemical group 0.000 claims abstract 3
- 125000000217 alkyl group Chemical group 0.000 claims abstract 3
- 125000003118 aryl group Chemical group 0.000 claims abstract 3
- 150000007942 carboxylates Chemical group 0.000 claims abstract 3
- 125000004093 cyano group Chemical group *C#N 0.000 claims abstract 2
- SBZXBUIDTXKZTM-UHFFFAOYSA-N diglyme Chemical compound COCCOCCOC SBZXBUIDTXKZTM-UHFFFAOYSA-N 0.000 claims abstract 2
- 125000001181 organosilyl group Chemical group [SiH3]* 0.000 claims abstract 2
- YLQBMQCUIZJEEH-UHFFFAOYSA-N tetrahydrofuran Natural products C=1C=COC=1 YLQBMQCUIZJEEH-UHFFFAOYSA-N 0.000 claims abstract 2
- 230000008569 process Effects 0.000 claims description 7
- 229910003437 indium oxide Inorganic materials 0.000 claims description 5
- 229910052693 Europium Inorganic materials 0.000 claims description 4
- 229910052769 Ytterbium Inorganic materials 0.000 claims description 4
- PJXISJQVUVHSOJ-UHFFFAOYSA-N indium(iii) oxide Chemical compound [O-2].[O-2].[O-2].[In+3].[In+3] PJXISJQVUVHSOJ-UHFFFAOYSA-N 0.000 claims description 4
- 229910052684 Cerium Inorganic materials 0.000 claims description 3
- 229910052692 Dysprosium Inorganic materials 0.000 claims description 3
- 229910052691 Erbium Inorganic materials 0.000 claims description 3
- 229910052688 Gadolinium Inorganic materials 0.000 claims description 3
- 229910052689 Holmium Inorganic materials 0.000 claims description 3
- 229910052765 Lutetium Inorganic materials 0.000 claims description 3
- 229910052779 Neodymium Inorganic materials 0.000 claims description 3
- 229910052777 Praseodymium Inorganic materials 0.000 claims description 3
- 229910052772 Samarium Inorganic materials 0.000 claims description 3
- 229910052771 Terbium Inorganic materials 0.000 claims description 3
- APFVFJFRJDLVQX-UHFFFAOYSA-N indium atom Chemical compound [In] APFVFJFRJDLVQX-UHFFFAOYSA-N 0.000 claims description 3
- 229910052706 scandium Inorganic materials 0.000 claims description 3
- 239000000758 substrate Substances 0.000 claims description 3
- 229910052727 yttrium Inorganic materials 0.000 claims description 3
- 238000010438 heat treatment Methods 0.000 claims description 2
- 229910052738 indium Inorganic materials 0.000 claims description 2
- 229910052746 lanthanum Inorganic materials 0.000 claims description 2
- 229910052751 metal Inorganic materials 0.000 claims 4
- 239000002184 metal Substances 0.000 claims 4
- 230000000737 periodic effect Effects 0.000 claims 2
- GYHNNYVSQQEPJS-UHFFFAOYSA-N Gallium Chemical compound [Ga] GYHNNYVSQQEPJS-UHFFFAOYSA-N 0.000 claims 1
- 229910052775 Thulium Inorganic materials 0.000 claims 1
- 229910052782 aluminium Inorganic materials 0.000 claims 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 claims 1
- AJNVQOSZGJRYEI-UHFFFAOYSA-N digallium;oxygen(2-) Chemical compound [O-2].[O-2].[O-2].[Ga+3].[Ga+3] AJNVQOSZGJRYEI-UHFFFAOYSA-N 0.000 claims 1
- 229910052733 gallium Inorganic materials 0.000 claims 1
- 229910001195 gallium oxide Inorganic materials 0.000 claims 1
- 150000002739 metals Chemical class 0.000 claims 1
- 239000003960 organic solvent Substances 0.000 claims 1
- TWNQGVIAIRXVLR-UHFFFAOYSA-N oxo(oxoalumanyloxy)alumane Chemical compound O=[Al]O[Al]=O TWNQGVIAIRXVLR-UHFFFAOYSA-N 0.000 claims 1
- ZSWFCLXCOIISFI-UHFFFAOYSA-N cyclopentadiene Chemical compound C1C=CC=C1 ZSWFCLXCOIISFI-UHFFFAOYSA-N 0.000 abstract 2
- 239000003574 free electron Substances 0.000 abstract 1
- 238000004519 manufacturing process Methods 0.000 description 5
- XOLBLPGZBRYERU-UHFFFAOYSA-N tin dioxide Chemical compound O=[Sn]=O XOLBLPGZBRYERU-UHFFFAOYSA-N 0.000 description 5
- 229910001887 tin oxide Inorganic materials 0.000 description 5
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 4
- 238000000576 coating method Methods 0.000 description 4
- 239000000463 material Substances 0.000 description 4
- 239000000203 mixture Substances 0.000 description 3
- 239000004065 semiconductor Substances 0.000 description 3
- 239000007787 solid Substances 0.000 description 3
- 229910052786 argon Inorganic materials 0.000 description 2
- 125000004429 atom Chemical group 0.000 description 2
- 230000008901 benefit Effects 0.000 description 2
- ZMIGMASIKSOYAM-UHFFFAOYSA-N cerium Chemical compound [Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce] ZMIGMASIKSOYAM-UHFFFAOYSA-N 0.000 description 2
- 239000000470 constituent Substances 0.000 description 2
- 238000005530 etching Methods 0.000 description 2
- OGPBJKLSAFTDLK-UHFFFAOYSA-N europium atom Chemical compound [Eu] OGPBJKLSAFTDLK-UHFFFAOYSA-N 0.000 description 2
- 239000000126 substance Substances 0.000 description 2
- 239000010409 thin film Substances 0.000 description 2
- NAWDYIZEMPQZHO-UHFFFAOYSA-N ytterbium Chemical compound [Yb] NAWDYIZEMPQZHO-UHFFFAOYSA-N 0.000 description 2
- 239000000370 acceptor Substances 0.000 description 1
- 230000009471 action Effects 0.000 description 1
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 1
- 210000004027 cell Anatomy 0.000 description 1
- 238000005229 chemical vapour deposition Methods 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 239000004020 conductor Substances 0.000 description 1
- 210000002858 crystal cell Anatomy 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 230000001419 dependent effect Effects 0.000 description 1
- 238000011161 development Methods 0.000 description 1
- 230000018109 developmental process Effects 0.000 description 1
- KBQHZAAAGSGFKK-UHFFFAOYSA-N dysprosium atom Chemical compound [Dy] KBQHZAAAGSGFKK-UHFFFAOYSA-N 0.000 description 1
- 239000007772 electrode material Substances 0.000 description 1
- UYAHIZSMUZPPFV-UHFFFAOYSA-N erbium Chemical compound [Er] UYAHIZSMUZPPFV-UHFFFAOYSA-N 0.000 description 1
- 230000002349 favourable effect Effects 0.000 description 1
- 239000010408 film Substances 0.000 description 1
- UIWYJDYFSGRHKR-UHFFFAOYSA-N gadolinium atom Chemical compound [Gd] UIWYJDYFSGRHKR-UHFFFAOYSA-N 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- KJZYNXUDTRRSPN-UHFFFAOYSA-N holmium atom Chemical compound [Ho] KJZYNXUDTRRSPN-UHFFFAOYSA-N 0.000 description 1
- 238000007654 immersion Methods 0.000 description 1
- 239000012535 impurity Substances 0.000 description 1
- 239000011261 inert gas Substances 0.000 description 1
- 229910052747 lanthanoid Inorganic materials 0.000 description 1
- 150000002602 lanthanoids Chemical class 0.000 description 1
- FZLIPJUXYLNCLC-UHFFFAOYSA-N lanthanum atom Chemical compound [La] FZLIPJUXYLNCLC-UHFFFAOYSA-N 0.000 description 1
- OHSVLFRHMCKCQY-UHFFFAOYSA-N lutetium atom Chemical compound [Lu] OHSVLFRHMCKCQY-UHFFFAOYSA-N 0.000 description 1
- 230000007246 mechanism Effects 0.000 description 1
- QEFYFXOXNSNQGX-UHFFFAOYSA-N neodymium atom Chemical compound [Nd] QEFYFXOXNSNQGX-UHFFFAOYSA-N 0.000 description 1
- 230000003647 oxidation Effects 0.000 description 1
- 238000007254 oxidation reaction Methods 0.000 description 1
- 239000001301 oxygen Substances 0.000 description 1
- 229910052760 oxygen Inorganic materials 0.000 description 1
- 125000004430 oxygen atom Chemical group O* 0.000 description 1
- PUDIUYLPXJFUGB-UHFFFAOYSA-N praseodymium atom Chemical compound [Pr] PUDIUYLPXJFUGB-UHFFFAOYSA-N 0.000 description 1
- 238000007761 roller coating Methods 0.000 description 1
- KZUNJOHGWZRPMI-UHFFFAOYSA-N samarium atom Chemical compound [Sm] KZUNJOHGWZRPMI-UHFFFAOYSA-N 0.000 description 1
- SIXSYDAISGFNSX-UHFFFAOYSA-N scandium atom Chemical compound [Sc] SIXSYDAISGFNSX-UHFFFAOYSA-N 0.000 description 1
- 238000000926 separation method Methods 0.000 description 1
- 239000002689 soil Substances 0.000 description 1
- 239000002904 solvent Substances 0.000 description 1
- 238000005507 spraying Methods 0.000 description 1
- 238000004544 sputter deposition Methods 0.000 description 1
- GZCRRIHWUXGPOV-UHFFFAOYSA-N terbium atom Chemical compound [Tb] GZCRRIHWUXGPOV-UHFFFAOYSA-N 0.000 description 1
- -1 thullium Chemical compound 0.000 description 1
- 230000007704 transition Effects 0.000 description 1
- 238000002834 transmittance Methods 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Chemical compound O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
- VWQVUPCCIRVNHF-UHFFFAOYSA-N yttrium atom Chemical compound [Y] VWQVUPCCIRVNHF-UHFFFAOYSA-N 0.000 description 1
Classifications
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
- G02F1/1343—Electrodes
- G02F1/13439—Electrodes characterised by their electrical, optical, physical properties; materials therefor; method of making
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
- G02F1/1337—Surface-induced orientation of the liquid crystal molecules, e.g. by alignment layers
- G02F1/133711—Surface-induced orientation of the liquid crystal molecules, e.g. by alignment layers by organic films, e.g. polymeric films
- G02F1/133719—Surface-induced orientation of the liquid crystal molecules, e.g. by alignment layers by organic films, e.g. polymeric films with coupling agent molecules, e.g. silane
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09K—MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
- C09K2323/00—Functional layers of liquid crystal optical display excluding electroactive liquid crystal layer characterised by chemical composition
- C09K2323/02—Alignment layer characterised by chemical composition
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S359/00—Optical: systems and elements
- Y10S359/90—Methods
Definitions
- Transparent conductive layer process for its production and its use
- the invention relates to a conductive layer according to the preamble of claim 1 and also relates to manufacturing techniques and uses for this conductor.
- a conductive layer according to the preamble of claim 1 and also relates to manufacturing techniques and uses for this conductor.
- Transparent electrode coatings usually consist of a doped indium or tin oxide. These materials enable layers with a thickness in the range of a few 10 2 nm transmittances> 80% and
- the electrode is required to have properties which - within the framework of the previously known preparation techniques - cannot be achieved with materials based on indium oxide or tin oxide.
- the heating layer on the windshield of a vehicle should have a sheet resistance ⁇ 10 ⁇ / ⁇ , and in the case of highly multiplexable liquid crystal displays, thin-film electrodes are required which have a sheet resistance value of around 50 ⁇ / ⁇ even with thicknesses of a few 10 nm.
- the object of the invention is to provide a guiding layer that absorbs little visible light, still conducts well even if its thickness is small compared to the wavelengths of the light, and also enables an electrode to be produced without an etching step gets along and the substrate is not thermally stressed too much.
- This object is achieved by a conductive layer with the features of claim 1.
- the soils contained in a conductive layer according to the invention are, by definition, oxides of the elements of the third subgroup, i.e.
- lanthanide series scandium, yttrium, as well as lanthanum and the elements of the lanthanide series (cerium, praseodymium, neodymium, samarium, europium, gadolinium, terbium, dysprosium, holmium, erbium, thullium , Ytterbium, lutetium).
- the invention is based on the observation that the transition elements proposed here also have semiconductor properties in their oxides and can thereby achieve considerable conductivity values.
- the conduction mechanism of such semiconductors is probably the same as that of an indium oxide based semiconductor:
- An electronic third-party line arises from defects in the lattice, i.e. essentially from missing oxygen atoms or from introduced foreign atoms in which the higher-value ones act as donors and the atoms with less value act as acceptors.
- rare earth metals and their oxides are very expensive substances, mainly because they are always present as mixtures in nature and are very difficult to separate.
- the rare earth metals or their mixtures can easily be converted into organometallic compounds which - depending on the vapor pressure and solubility - allow various application techniques: in addition to the CVD process, also immersion, spraying and centrifugal techniques and the so-called “Roller coating", with which thin electrodes can be printed in their final contours.
- the thermal oxidation of the organometallic compounds can be carried out at temperatures between 50 ° C. and 500 ° C. and in periods between 10 minutes and 5 hours.
- the conduction is normally brought about by doping with an element of a different value. It is basically irrelevant whether the rare earth metals are part of the regular host lattice or act as an impurity. The conditions are most favorable when the rare earths are combined with tin oxide. Good results can also be obtained if an oxide of germanium or cadmium is used instead of tin oxide. It may even be sufficient to assemble the conductive layer exclusively from rare earths; because individual rare earth metals (cerium, europium and ytterbium) can have different values. For this reason, it should in principle also be possible to form the conductive layer from the oxide of a single rare earth metal present in different valence states.
- the figure shows a schematically held side section of a reflective liquid crystal display with a seven-segment number display.
- the display contains in detail a front linear polarizer 1, a front carrier plate 2, a rear carrier plate 3, a rear linear polarizer 4 crossed to the front and a reflector 6.
- the two plates are tightly connected to one another by a frame 7.
- the chamber bounded by the frame and the two plates is filled with a liquid crystal layer 8.
- the plates 2, 3 each have on their mutually facing surfaces conductive coatings (front electrode from separately controllable segment electrodes 9, continuous rear electrode 11) and orientation layers 12, 13.
- the liquid crystal cell works on the principle of the so-called "rotary cell", which is described in detail in the DE-AS 21 58 563 is described.
- the electrodes are designed according to the requirements of the individual case. A large number of material combinations and process variants are available within the scope of the invention. This diversity will be illustrated below with the help of a few examples.
- Usable guiding layers result if one proceeds as follows in each of these examples:
- the two compounds are dissolved in 50 ml solvent under an inert gas atmosphere (argon). 2 g of the dominant constituent are dissolved, the correspondingly smaller amount of the doping constituent. Then glass plates are immersed in the solution under argon. The plates are then dried in air at 130 ° C. and then heated to 400 ° C. with the simultaneous action of water vapor and oxygen.
- argon inert gas atmosphere
- the invention is not limited to the exemplary embodiments described. So it is not always necessary to start from substances in the form of dissolved organometallic compounds; CVD processes are also conceivable, for example, in which the material to be evaporated is in a solid or gaseous state.
- the proposed conductive layers are not only used as thin-film electrodes of liquid crystal displays, but are also suitable wherever an economically producible transparent electrode is required.
Landscapes
- Physics & Mathematics (AREA)
- Nonlinear Science (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Mathematical Physics (AREA)
- Chemical & Material Sciences (AREA)
- Crystallography & Structural Chemistry (AREA)
- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Liquid Crystal (AREA)
- Chemical Vapour Deposition (AREA)
- Conductive Materials (AREA)
- Non-Insulated Conductors (AREA)
Abstract
Ce stratifie a conductance propose contient une "terre rare" (il s'agit la d'un oxyde d'un metal de terre rare). En vue d'assurer a ce stratifie une conductance suffisante en electrons libres, cette "terre rare" est habituellement combinee avec l'oxyde d'un autre element comme l'etain, le germanium ou le cadmium. En ce cas lequel des deux element combines fournit le reseau-hote et quel autre element constitue l'auxiliaire importe peu. En vue de preparer ce stratifie a conductance, il est recommande d'utiliser au depart des composes organo-metalliques dissous et, dans ce cas, le metal de terre rare sera insere dans un compose de formule generale CpmLnR3-m ou LnR3.Lm (Cp = cyclopentadiene; Ln = ele issu du troisieme groupe secondaire; R = alkyle, aryle, allyle, amine, alkoxyde, carboxylate, cyano, Cl, Br, I, organosilyle, organogermyle, organostannyle; L = ether, tetrahydrofuranne, diglyme, amine, organophosphine; 1 (Alpha) m (Alpha) 3). Un tel stratifie a conductance s'utilise particulierement comme electrode (9, 11) dans les affichages electro-optiques passifs, comme par exemple les indicateurs a cristaux liquides.This proposed conductance laminate contains a "rare earth" (it is an oxide of a rare earth metal). In order to ensure that this laminate has sufficient free electron conductance, this "rare earth" is usually combined with the oxide of another element such as tin, germanium or cadmium. In which case which of the two combined elements provides the host network and which other element constitutes the auxiliary does not matter. In order to prepare this conductive laminate, it is recommended to use dissolved organometallic compounds at the start and, in this case, the rare earth metal will be inserted in a compound of general formula CpmLnR3-m or LnR3.Lm ( Cp = cyclopentadiene; Ln = ele from the third secondary group; R = alkyl, aryl, allyl, amine, alkoxide, carboxylate, cyano, Cl, Br, I, organosilyl, organogermyle, organostannyl; L = ether, tetrahydrofuran, diglyme, amine , organophosphine; 1 (Alpha) m (Alpha) 3). Such a conductance laminate is particularly used as an electrode (9, 11) in passive electro-optical displays, such as for example liquid crystal indicators.
Description
Transparente Leitschicht, Verfahren zu ihrer Herstellung und ihre VerwendungTransparent conductive layer, process for its production and its use
Die Erfindung betrifft eine leitende Schicht gemäß dem Oberbegriff des Anspruchs 1 und bezieht sich außerdem auf Fertigungstechniken und Verwendungsmöglichkeiten für diesen Leiter. Eine solche In2O3:Sn-Elektrode, hergestellt aus flüchtigen metallorganischen Verbindungen in einem CVD-Verfahren, wird in "Thin Solid Films" 29 (1975) 155 beschrieben.The invention relates to a conductive layer according to the preamble of claim 1 and also relates to manufacturing techniques and uses for this conductor. Such an In 2 O 3 : Sn electrode, produced from volatile organometallic compounds in a CVD process, is described in "Thin Solid Films" 29 (1975) 155.
Durchsichtige Elektrodenbeläge bestehen in aller Regel aus einem dotierten Indium- oder Zinnoxid. Diese Werkstoffe ermöglichen Schichten, die bei einer Dicke im Bereich einiger 102 nm Transmissionsgrade > 80 % undTransparent electrode coatings usually consist of a doped indium or tin oxide. These materials enable layers with a thickness in the range of a few 10 2 nm transmittances> 80% and
Flächenwiderstandswerte < 50 Ω/♢ aufweisen und damit die an sie gestellten Anforderungen im allgemeinen erfüllen. In einigen Fällen werden jedoch von der Elektrode Eigenschaften verlangt, die man - im Rahmen der bisher bekannten Präparationstechniken - mit Materialien auf Indiumoxid- oder Zinnoxidbasis nicht erreichen kann. So sollte beispielsweise die Heizschicht auf der Windschutzscheibe eines Fahrzeugs über einen Flächenwiderstand <10 Ω/♢ verfügen, und bei hochmultiplexbaren Flüssigkristallanzeigen braucht man Dünnschichtelektroden, die auch bei Stärken von wenigen.10 nm Flächenwiderstandswerte um 50 Ω/♢ aufweisen. Hinzukommt, daß die bisher entwickelten Herstellungsverfahren für Indiumoxid- oder Zinnoxidüberzüge - chemische Dampfabscheidung bzw. Aufsputtern mit anschließendem Herausätzen der Εlektrodenstruktur - recht aufwendig sind und überdies so hohe Prozeßtemperaturen erfordern, daß man häufig auf teuere Substrate angewiesen ist. Dieser Nachteil fällt vor allem dann ins Gewicht, wenn es darum geht, preiswerte Massenartikel wie Fenster- Scheiben oder elektrooptische Displays in einer serienfertigungsgerechten Weise zu beschichten. Darüberhin- aus ist bereits heute abzusehen, daß sich Indium und Zinn in den kommenden Jahren erheblich verteuern werden, da ihr Verbrauch ständig zunimmt und die Vorräte begrenzt sind.Surface resistance values <50 Ω / ♢ and thus generally meet the requirements placed on them. In some cases, however, the electrode is required to have properties which - within the framework of the previously known preparation techniques - cannot be achieved with materials based on indium oxide or tin oxide. For example, the heating layer on the windshield of a vehicle should have a sheet resistance <10 Ω / ♢, and in the case of highly multiplexable liquid crystal displays, thin-film electrodes are required which have a sheet resistance value of around 50 Ω / ♢ even with thicknesses of a few 10 nm. In addition, the previously developed manufacturing processes for indium oxide or tin oxide coatings - chemical vapor deposition or sputtering with subsequent etching out of the electrode structure - are quite complex are and also require such high process temperatures that one is often dependent on expensive substrates. This disadvantage is particularly important when it comes to coating inexpensive mass-produced items such as window panes or electro-optical displays in a manner suitable for series production. In addition, it is already foreseeable today that indium and tin will become considerably more expensive in the coming years, as their consumption is constantly increasing and supplies are limited.
Ausgehend von dieser Situation liegt der Erfindung die Aufgabe zugrunde, eine Leitschicht anzugeben, die sichtbares Licht wenig absorbiert, auch dann noch gut leitet, wenn ihre Dicke im Vergleich zu den Wellenlängen des Lichts klein ist, und zudem eine Elektrodenfertigung ermöglicht, die ohne einen Ätzschritt auskommt und das Substrat thermisch nicht allzusehr belastet. Diese Aufgabe wird durch eine Leitschicht mit den Mermalen des Patentanspruchs 1 gelöst. Die in einer erfindungsgemäßen Leitschicht enthaltenen Erden sind definitionsgemäß Oxide der Elemente der dritten Nebengruppe also des Scandiums, Yttriums sowie des Lanthans und der Elemente der Lanthanoidenreihe (Cer, Praseodym, Neodym, Samarium, Europium, Gadolinium, Terbium, Dysprosium, Holmium, Erbium, Thullium, Ytterbium, Lutetium).Based on this situation, the object of the invention is to provide a guiding layer that absorbs little visible light, still conducts well even if its thickness is small compared to the wavelengths of the light, and also enables an electrode to be produced without an etching step gets along and the substrate is not thermally stressed too much. This object is achieved by a conductive layer with the features of claim 1. The soils contained in a conductive layer according to the invention are, by definition, oxides of the elements of the third subgroup, i.e. scandium, yttrium, as well as lanthanum and the elements of the lanthanide series (cerium, praseodymium, neodymium, samarium, europium, gadolinium, terbium, dysprosium, holmium, erbium, thullium , Ytterbium, lutetium).
Die Erfindung geht von der Beobachtung aus, daß auch die hier vorgeschlagenen Übergangselemente in ihren Oxiden Halbleitereigenschaften haben und dabei beachtliche Leitfähigkeitswerte erreichen können. Der Leitungsmechanismus solcher Halbleiter ist vermutlich der gleiche wie bei einem Halbleiter auf Indiumoxidbasis: Eine elektronische Fremdleitung entsteht durch Störstellen im Gitter, also im wesentlichen durch fehlende Sauerstoffatome oder durch eingebrachte Fremdatome, bei denen die höherwertigen als Donatoren und die Atome mit geringerer Wertigkeit als Akzeptoren wirken. Die Seltenerdmetalle und ihre Oxide sind im reinen Zustand an sich sehr teure Substanzen, und zwar vor allem deshalb, weil sie in der Natur stets als Gemische vorliegen und sich nur sehr schwer voneinander trennen lassen. Eine solche Trennung ist für die vorgeschlagene Leitschicht glücklicherweise nicht erforderlich, da sich die einzelnen Seltenen Erden, wie herausgefunden worden ist, bezüglich der hier relevanten Kriterien praktisch nicht unterscheiden. Es hat sich außerdem gezeigt, daß man die Seltenerdmetalle bzw. deren Gemische ohne weiteres in metallorganische Verbindungen überführen kann, die - je nach Dampfdruck und Lδslichkeit - verschiedene Aufbringtechniken erlauben: Außer dem CVD-Verfahren auch Tauch-, Sprüh- und Schleudertechniken sowie die sogenannte "RollenbeSchichtung" ("Roller-Coating"), mit der dünne Elektroden gleich in ihren endgültigen Konturen aufgedruckt werden können. Die thermische Oxida- tion der metallorganischen Verbindungen läßt sich - abhängig von der Art des verwendeten Gemischs - bei Temperaturen zwischen 50 °C und 500 °C und in Zeiträumen zwischen 10 Min. und 5 Std. durchführen. Im Ergebnis erhält man eine auch preislich attraktive Alternative zu den bisher gebräuchlichen Transparent-Elektroden-Werkstoffen, deren Kostenvorteil in Zukunft noch stärker zu Buche schlagen dürfte, da die Seltenerdmetalle entgegen ihrer Bezeichnung durchaus nicht selten sind.(Der Gehalt an Sc, Y, La, Ce, Nd, Yb in der festen Erdrinde liegt bei 10-2 bis 10-3 %; Pr, Sm, Eu, Gd, Tb, Dy, Ho, Er, Lu kommen etwa so häufig wie Sn vor, nämlich zu 10-3 bis 10 % ; der Anteil an Tm beträgt 10 -4 bis 10-5 %; In hat eine Häufigkeit zwischenThe invention is based on the observation that the transition elements proposed here also have semiconductor properties in their oxides and can thereby achieve considerable conductivity values. The conduction mechanism of such semiconductors is probably the same as that of an indium oxide based semiconductor: An electronic third-party line arises from defects in the lattice, i.e. essentially from missing oxygen atoms or from introduced foreign atoms in which the higher-value ones act as donors and the atoms with less value act as acceptors. In their pure state, rare earth metals and their oxides are very expensive substances, mainly because they are always present as mixtures in nature and are very difficult to separate. Fortunately, such a separation is not necessary for the proposed control layer, since, as has been found, the individual rare earths practically do not differ with regard to the criteria relevant here. It has also been shown that the rare earth metals or their mixtures can easily be converted into organometallic compounds which - depending on the vapor pressure and solubility - allow various application techniques: in addition to the CVD process, also immersion, spraying and centrifugal techniques and the so-called "Roller coating", with which thin electrodes can be printed in their final contours. Depending on the type of mixture used, the thermal oxidation of the organometallic compounds can be carried out at temperatures between 50 ° C. and 500 ° C. and in periods between 10 minutes and 5 hours. The result is an attractive price alternative to the previously used transparent electrode materials, the cost advantage of which will have an even greater impact in the future, as the rare earth metals, contrary to their name, are not uncommon (the content of Sc, Y, La , Ce, Nd, Yb in the solid earth crust is 10 -2 to 10 -3 %; Pr, Sm, Eu, Gd, Tb, Dy, Ho, Er, Lu occur about as frequently as Sn, namely 10 -3 to 10%; the proportion of Tm is 10 -4 to 10 -5 %; In has a frequency between
10-5 und 10-6 %) .10 -5 and 10 -6 %).
Bei der vorgeschlagenen Leitschicht wird die Leitung normalerweise durch Dotierung mit einem Element anderer Wertigkeit hervorgerufen. Dabei spielt es grundsätzlich keine Rolle, ob die Seltenerdmetalle Teil des regulären Wirtsgitters sind oder als Verunreinigung fungieren. Am günstigsten gestalten sich die Verhältnisse, wenn die Seltenen Erden mit Zinnoxid kombiniert werden. Gute Resultate erhält man aber auch, wenn man statt Zinnoxid ein Oxid des Germaniums oder Cadmiums verwendet. Unter Umständen reicht es sogar aus, die Leitschicht ausschließlich aus Seltenen Erden zusammenzusetzen; denn einzelne Seltenerdmetalle (Cer, Europium und Ytterbium) können unterschiedliche Wertigkeiten aufweisen. Aus diesem Grund sollte es prinzipiell auch möglich sein, die Leitschicht aus dem Oxid eines einzigen, in verschiedenen Wertigkeitszuständen vorliegenden Selten- erdmetalles zu bilden.In the case of the proposed conductive layer, the conduction is normally brought about by doping with an element of a different value. It is basically irrelevant whether the rare earth metals are part of the regular host lattice or act as an impurity. The conditions are most favorable when the rare earths are combined with tin oxide. Good results can also be obtained if an oxide of germanium or cadmium is used instead of tin oxide. It may even be sufficient to assemble the conductive layer exclusively from rare earths; because individual rare earth metals (cerium, europium and ytterbium) can have different values. For this reason, it should in principle also be possible to form the conductive layer from the oxide of a single rare earth metal present in different valence states.
Weitere vorteilhafte Ausgestaltungen und Weiterbildun- gen der Erfindung, insbesondere bequeme Herstellungsverfahren sowie Anwendungen, bei denen die Vorzüge der vorgeschlagenen Leitschicht besonders zur Geltung kommen, sind Gegenstand zusätzlicher Ansprüche.Further advantageous refinements and developments of the invention, in particular convenient manufacturing processes and applications in which the advantages of the proposed conductive layer are particularly effective, are the subject of additional claims.
Der Lösungsvorschlag soll nun an Hand mehrerer Beispiele unter Bezugnahme auf die beigefügte Figur näher erläutert werden. Die Figur zeigt in einem schematisch gehaltenen Seitenschnitt eine reflektiv betriebene Flüssigkristallanzeige mit einer Sieben-Segment-Zifferndarstellung. Das Display enthält im einzelnen einen vorderen Linearpolari- sator 1, eine vordere Trägerplatte 2, eine hintere Trägerplatte 3, einen hinteren, zum vorderen gekreuzten Linearpolarisator 4 sowie einen Reflektor 6. Die beiden Platten werden durch einen Rahmen 7 dicht miteinander verbunden. Die vom Rahmen und den beiden Platten begrenzte Kammer ist mit einer Flüssigkristallschicht 8 gefüllt. Die Platten 2, 3 tragen auf ihren einander zugewandten Flächen jeweils leitfähige Beläge (Vorderelektrode aus getrennt ansteuerbaren Segmentelektroden 9, durchgehende Rückelektrode 11) sowie Orientierungs- schichten 12, 13. Die Flüssigkristallzelle arbeitet nach dem Prinzip der sogenannten "Drehzelle", das ausführlich in der DE-AS 21 58 563 beschrieben wird.The proposed solution will now be explained in more detail using several examples with reference to the attached figure. The figure shows a schematically held side section of a reflective liquid crystal display with a seven-segment number display. The display contains in detail a front linear polarizer 1, a front carrier plate 2, a rear carrier plate 3, a rear linear polarizer 4 crossed to the front and a reflector 6. The two plates are tightly connected to one another by a frame 7. The chamber bounded by the frame and the two plates is filled with a liquid crystal layer 8. The plates 2, 3 each have on their mutually facing surfaces conductive coatings (front electrode from separately controllable segment electrodes 9, continuous rear electrode 11) and orientation layers 12, 13. The liquid crystal cell works on the principle of the so-called "rotary cell", which is described in detail in the DE-AS 21 58 563 is described.
Die Elektroden sind entsprechend den Erfordernissen des Einzelfalles ausgebildet. Dabei stehen im Rahmen der Erfindung eine Vielzahl von Materialkombinationen und Verfahrensvarianten zur Verfügung. Diese Vielfalt soll im Folgenden an Hand einiger Beispiele veranschaulicht werden. The electrodes are designed according to the requirements of the individual case. A large number of material combinations and process variants are available within the scope of the invention. This diversity will be illustrated below with the help of a few examples.
Brauchbare Leitschichten ergeben sich, wenn man bei diesen Beispielen jeweils folgendermaßen vorgeht:Usable guiding layers result if one proceeds as follows in each of these examples:
Die beiden Verbindungen werden unter Inertgasatmosphäre (Argon) in jeweils 50 ml Lösungsmittel gelöst. Vom dominierenden Bestandteil löst man jeweils 2 g, vom dotierenden Bestandteil die entsprechend geringere Menge. Dann werden unter Argon Glasplatten in die Lösung getaucht. Anschließend werden die Platten an Luft bei 130 °C getrocknet und danach unter gleichzeitiger Einwirkung von Wasserdampf und Sauerstoff auf 400 °C erhitzt.The two compounds are dissolved in 50 ml solvent under an inert gas atmosphere (argon). 2 g of the dominant constituent are dissolved, the correspondingly smaller amount of the doping constituent. Then glass plates are immersed in the solution under argon. The plates are then dried in air at 130 ° C. and then heated to 400 ° C. with the simultaneous action of water vapor and oxygen.
Die Erfindung beschränkt sich nicht auf die geschilder- ten Ausführungsbeispiele. So braucht man nicht in jedem Fall von Substanzen in Form gelöster metallorganischer Verbindungen auszugehen; denkbar sind beispielsweise auch CVD-Verfahren, bei denen das zu verdampfende Material in einem festen oder gasförmigen Zustand vorliegt. Im übrigen finden die vorgeschlagenen Leitschichten nicht nur als Dünnschichtelektroden von Flüssigkristallanzeigen Verwendung, sondern bieten sich stets dort an, wo eine wirtschaftlich herstellbare Transparent-Elektrode benötigt wird. The invention is not limited to the exemplary embodiments described. So it is not always necessary to start from substances in the form of dissolved organometallic compounds; CVD processes are also conceivable, for example, in which the material to be evaporated is in a solid or gaseous state. In addition, the proposed conductive layers are not only used as thin-film electrodes of liquid crystal displays, but are also suitable wherever an economically producible transparent electrode is required.
Claims
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DE3001125 | 1980-01-14 | ||
| DE19803001125 DE3001125A1 (en) | 1980-01-14 | 1980-01-14 | METHOD FOR PRODUCING A LIQUID CRYSTAL DISPLAY |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| EP0044326A1 true EP0044326A1 (en) | 1982-01-27 |
Family
ID=6092013
Family Applications (2)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| EP81900335A Withdrawn EP0044326A1 (en) | 1980-01-14 | 1981-01-12 | Conductane transparent laminate, method for the preparation thereof and utilisation thereof |
| EP81100168A Ceased EP0032397A1 (en) | 1980-01-14 | 1981-01-12 | Method of manufacturing a liquid crystal display |
Family Applications After (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| EP81100168A Ceased EP0032397A1 (en) | 1980-01-14 | 1981-01-12 | Method of manufacturing a liquid crystal display |
Country Status (5)
| Country | Link |
|---|---|
| US (1) | US4370028A (en) |
| EP (2) | EP0044326A1 (en) |
| JP (2) | JPS56501902A (en) |
| DE (1) | DE3001125A1 (en) |
| WO (1) | WO1981002073A1 (en) |
Families Citing this family (14)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4530857A (en) * | 1983-05-13 | 1985-07-23 | M&T Chemicals Inc. | Glass container hot end coating formulation and method of use |
| US4643531A (en) * | 1984-02-15 | 1987-02-17 | Canon Kabushiki Kaisha | Liquid crystal panel having an organic indium and/or organic zirconium orientation film |
| US4647156A (en) * | 1984-04-12 | 1987-03-03 | Casio Computer Co., Ltd. | Liquid crystal device |
| JPS6130994U (en) * | 1984-07-28 | 1986-02-25 | アルプス電気株式会社 | transparent electrode sheet |
| NL8402498A (en) * | 1984-08-14 | 1986-03-03 | Philips Nv | IMAGE DISPLAY CELL. |
| US4797325A (en) * | 1984-12-13 | 1989-01-10 | United Kingdom Atomic Energy Authority | Spacecraft materials |
| US4752501A (en) * | 1987-07-01 | 1988-06-21 | General Motors Corporation | Method for forming patterned tin oxide thin film element |
| DE3925970A1 (en) * | 1989-08-05 | 1991-02-07 | Hoechst Ag | ELECTRICALLY CONDUCTIVE POLYMERS AND THEIR USE AS AN ORIENTATION LAYER IN LIQUID CRYSTAL SWITCHING AND DISPLAY ELEMENTS |
| DE4015869A1 (en) * | 1990-05-17 | 1991-11-21 | Nokia Unterhaltungselektronik | HIGH-RESOLUTION PASSIVALLY CONTROLLED LIQUID CRYSTAL DISPLAY |
| DE4141528C2 (en) * | 1991-12-17 | 1995-04-06 | Nokia Unterhaltungselektronik | Liquid crystal cell with strip electrodes and orientation layers |
| US5698262A (en) * | 1996-05-06 | 1997-12-16 | Libbey-Owens-Ford Co. | Method for forming tin oxide coating on glass |
| JP4138681B2 (en) * | 2003-03-06 | 2008-08-27 | 日東電工株式会社 | Method for producing twisted and tilted oriented film |
| WO2024035914A1 (en) | 2022-08-12 | 2024-02-15 | Gelest, Inc. | High purity tin compounds containing unsaturated substituent and method for preparation thereof |
| WO2024076481A1 (en) | 2022-10-04 | 2024-04-11 | Gelest, Inc. | Cyclic azastannane and cyclic oxostannane compounds and methods for preparation thereof |
Family Cites Families (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| GB1082308A (en) * | 1964-01-20 | 1967-09-06 | Atomic Energy Commission | Rare earth etc. suboxides |
| DE2238429B2 (en) * | 1971-08-11 | 1976-01-08 | Ing. C. Olivetti & C., S.P.A., Ivrea, Turin (Italien) | Multiplex control circuit |
| US3786486A (en) * | 1971-08-11 | 1974-01-15 | Olivetti & Co Spa | Multiplex driving circuit |
| US3728008A (en) * | 1971-12-01 | 1973-04-17 | Olivetti & Co Spa | Liquid crystal display |
| US3854793A (en) * | 1972-06-27 | 1974-12-17 | Bell Telephone Labor Inc | Liquid crystal cells |
| US3973057A (en) * | 1975-03-07 | 1976-08-03 | Rca Corporation | Method of preparing a liquid crystal display |
| JPS54112658A (en) * | 1978-02-22 | 1979-09-03 | Seiko Epson Corp | Liquid crystal display panel and production of the same |
| GB2026190B (en) * | 1978-07-07 | 1982-11-10 | Hitachi Ltd | Liquid crystal display device |
| US4261650A (en) * | 1978-12-18 | 1981-04-14 | International Business Machines Corporation | Method for producing uniform parallel alignment in liquid crystal cells |
-
1980
- 1980-01-14 DE DE19803001125 patent/DE3001125A1/en not_active Withdrawn
- 1980-12-24 US US06/220,075 patent/US4370028A/en not_active Expired - Fee Related
-
1981
- 1981-01-12 WO PCT/DE1981/000011 patent/WO1981002073A1/en not_active Ceased
- 1981-01-12 JP JP50054481A patent/JPS56501902A/ja active Pending
- 1981-01-12 EP EP81900335A patent/EP0044326A1/en not_active Withdrawn
- 1981-01-12 EP EP81100168A patent/EP0032397A1/en not_active Ceased
- 1981-01-13 JP JP371581A patent/JPS56106221A/en active Pending
Non-Patent Citations (1)
| Title |
|---|
| See references of WO8102073A1 * |
Also Published As
| Publication number | Publication date |
|---|---|
| WO1981002073A1 (en) | 1981-07-23 |
| DE3001125A1 (en) | 1981-07-16 |
| EP0032397A1 (en) | 1981-07-22 |
| US4370028A (en) | 1983-01-25 |
| JPS56501902A (en) | 1981-12-24 |
| JPS56106221A (en) | 1981-08-24 |
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