DK3458913T3 - Selvmonteret mønstergenerering ved brug af mønstrede hydrofobiske overflader - Google Patents
Selvmonteret mønstergenerering ved brug af mønstrede hydrofobiske overflader Download PDFInfo
- Publication number
- DK3458913T3 DK3458913T3 DK17729244.8T DK17729244T DK3458913T3 DK 3458913 T3 DK3458913 T3 DK 3458913T3 DK 17729244 T DK17729244 T DK 17729244T DK 3458913 T3 DK3458913 T3 DK 3458913T3
- Authority
- DK
- Denmark
- Prior art keywords
- self
- pattern generation
- hydrophobic surfaces
- assembled pattern
- patterned hydrophobic
- Prior art date
Links
- 230000005661 hydrophobic surface Effects 0.000 title 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/26—Processing photosensitive materials; Apparatus therefor
- G03F7/40—Treatment after imagewise removal, e.g. baking
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D3/00—Pretreatment of surfaces to which liquids or other fluent materials are to be applied; After-treatment of applied coatings, e.g. intermediate treating of an applied coating preparatory to subsequent applications of liquids or other fluent materials
- B05D3/06—Pretreatment of surfaces to which liquids or other fluent materials are to be applied; After-treatment of applied coatings, e.g. intermediate treating of an applied coating preparatory to subsequent applications of liquids or other fluent materials by exposure to radiation
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANOTECHNOLOGY
- B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
- B82Y30/00—Nanotechnology for materials or surface science, e.g. nanocomposites
-
- C—CHEMISTRY; METALLURGY
- C12—BIOCHEMISTRY; BEER; SPIRITS; WINE; VINEGAR; MICROBIOLOGY; ENZYMOLOGY; MUTATION OR GENETIC ENGINEERING
- C12Q—MEASURING OR TESTING PROCESSES INVOLVING ENZYMES, NUCLEIC ACIDS OR MICROORGANISMS; COMPOSITIONS OR TEST PAPERS THEREFOR; PROCESSES OF PREPARING SUCH COMPOSITIONS; CONDITION-RESPONSIVE CONTROL IN MICROBIOLOGICAL OR ENZYMOLOGICAL PROCESSES
- C12Q1/00—Measuring or testing processes involving enzymes, nucleic acids or microorganisms; Compositions therefor; Processes of preparing such compositions
- C12Q1/68—Measuring or testing processes involving enzymes, nucleic acids or microorganisms; Compositions therefor; Processes of preparing such compositions involving nucleic acids
- C12Q1/6806—Preparing nucleic acids for analysis, e.g. for polymerase chain reaction [PCR] assay
-
- C—CHEMISTRY; METALLURGY
- C12—BIOCHEMISTRY; BEER; SPIRITS; WINE; VINEGAR; MICROBIOLOGY; ENZYMOLOGY; MUTATION OR GENETIC ENGINEERING
- C12Q—MEASURING OR TESTING PROCESSES INVOLVING ENZYMES, NUCLEIC ACIDS OR MICROORGANISMS; COMPOSITIONS OR TEST PAPERS THEREFOR; PROCESSES OF PREPARING SUCH COMPOSITIONS; CONDITION-RESPONSIVE CONTROL IN MICROBIOLOGICAL OR ENZYMOLOGICAL PROCESSES
- C12Q1/00—Measuring or testing processes involving enzymes, nucleic acids or microorganisms; Compositions therefor; Processes of preparing such compositions
- C12Q1/68—Measuring or testing processes involving enzymes, nucleic acids or microorganisms; Compositions therefor; Processes of preparing such compositions involving nucleic acids
- C12Q1/6869—Methods for sequencing
- C12Q1/6874—Methods for sequencing involving nucleic acid arrays, e.g. sequencing by hybridisation
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/0002—Lithographic processes using patterning methods other than those involving the exposure to radiation, e.g. by stamping
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/20—Exposure; Apparatus therefor
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/26—Processing photosensitive materials; Apparatus therefor
- G03F7/40—Treatment after imagewise removal, e.g. baking
- G03F7/405—Treatment with inorganic or organometallic reagents after imagewise removal
Landscapes
- Chemical & Material Sciences (AREA)
- Physics & Mathematics (AREA)
- Life Sciences & Earth Sciences (AREA)
- Engineering & Computer Science (AREA)
- Organic Chemistry (AREA)
- Proteomics, Peptides & Aminoacids (AREA)
- General Physics & Mathematics (AREA)
- Health & Medical Sciences (AREA)
- Zoology (AREA)
- Wood Science & Technology (AREA)
- Analytical Chemistry (AREA)
- Biochemistry (AREA)
- Microbiology (AREA)
- Immunology (AREA)
- Biotechnology (AREA)
- Biophysics (AREA)
- Bioinformatics & Cheminformatics (AREA)
- General Engineering & Computer Science (AREA)
- General Health & Medical Sciences (AREA)
- Genetics & Genomics (AREA)
- Molecular Biology (AREA)
- Nanotechnology (AREA)
- Inorganic Chemistry (AREA)
- Plasma & Fusion (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Composite Materials (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Materials Engineering (AREA)
- Crystallography & Structural Chemistry (AREA)
- Apparatus Associated With Microorganisms And Enzymes (AREA)
- Measuring Or Testing Involving Enzymes Or Micro-Organisms (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
- Steroid Compounds (AREA)
- Materials For Photolithography (AREA)
- Financial Or Insurance-Related Operations Such As Payment And Settlement (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US201662338394P | 2016-05-18 | 2016-05-18 | |
| PCT/US2017/033169 WO2017201198A1 (en) | 2016-05-18 | 2017-05-17 | Self assembled patterning using patterned hydrophobic surfaces |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| DK3458913T3 true DK3458913T3 (da) | 2021-03-15 |
Family
ID=59034864
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| DK17729244.8T DK3458913T3 (da) | 2016-05-18 | 2017-05-17 | Selvmonteret mønstergenerering ved brug af mønstrede hydrofobiske overflader |
Country Status (12)
| Country | Link |
|---|---|
| US (3) | US10900076B2 (da) |
| EP (1) | EP3458913B1 (da) |
| JP (1) | JP6824290B2 (da) |
| KR (1) | KR102171865B1 (da) |
| CN (1) | CN109313396B (da) |
| AU (2) | AU2017267653B2 (da) |
| CA (1) | CA3021915A1 (da) |
| DK (1) | DK3458913T3 (da) |
| ES (1) | ES2861478T3 (da) |
| IL (1) | IL262516B (da) |
| SG (1) | SG11201809376WA (da) |
| WO (1) | WO2017201198A1 (da) |
Families Citing this family (27)
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| CA3021915A1 (en) * | 2016-05-18 | 2017-11-23 | Illumina, Inc. | Self-assembled patterning using patterned hydrophobic surfaces |
| WO2018232086A1 (en) * | 2017-06-14 | 2018-12-20 | Board Of Regents, The University Of Texas System | Chip hybridized association-mapping platform and methods of use |
| ES2999650T3 (en) | 2017-08-01 | 2025-02-26 | Illumina Inc | Spatial indexing of genetic material and library preparation using hydrogel beads and flow cells |
| CN107579006B (zh) * | 2017-09-13 | 2019-08-06 | 京东方科技集团股份有限公司 | 一种薄膜晶体管、阵列基板及其制备方法 |
| CN111093819B (zh) * | 2017-12-21 | 2022-04-05 | 伊鲁米纳公司 | 具有水凝胶涂层的流动池 |
| NL2020622B1 (en) | 2018-01-24 | 2019-07-30 | Lllumina Cambridge Ltd | Reduced dimensionality structured illumination microscopy with patterned arrays of nanowells |
| PE20220773A1 (es) | 2018-06-29 | 2022-05-16 | Illumina Inc | Cubetas de lectura |
| TWI730352B (zh) * | 2018-08-06 | 2021-06-11 | 英商伊路米納劍橋有限公司 | 流體槽與定序系統及製備用於其之基板的方法 |
| EP3618115A1 (en) * | 2018-08-27 | 2020-03-04 | Rijksuniversiteit Groningen | Imaging device based on colloidal quantum dots |
| WO2020141806A2 (ko) | 2018-12-31 | 2020-07-09 | 인투코어테크놀로지 주식회사 | 플라즈마 발생 장치 및 그 동작 방법 |
| TWI873119B (zh) | 2019-01-29 | 2025-02-21 | 美商伊路米納有限公司 | 流通槽及製備其之方法 |
| TWI857001B (zh) | 2019-01-29 | 2024-10-01 | 美商伊路米納有限公司 | 定序套組 |
| TWI857000B (zh) | 2019-01-29 | 2024-10-01 | 美商伊路米納有限公司 | 流體槽以及將複合物引入至流體槽之方法 |
| NL2023679B1 (en) * | 2019-08-09 | 2021-04-13 | Illumina Inc | System and method for patterning flow cell substrates |
| CN110942981A (zh) * | 2019-12-10 | 2020-03-31 | 上海华力微电子有限公司 | 涂胶方法及半导体结构 |
| BR112021026592A2 (pt) | 2019-12-20 | 2022-06-21 | Illumina Inc | Células de fluxo |
| MX2022014718A (es) | 2020-07-02 | 2023-03-06 | Illumina Inc | Un metodo para calibrar la eficiencia de siembra de genotecas de ácidos nucleicos en celdas de flujo. |
| US12297367B2 (en) | 2020-08-27 | 2025-05-13 | Applied Materials, Inc. | Encapsulation materials for flat optical devices |
| IL299520A (en) * | 2020-09-29 | 2023-02-01 | Illumina Inc | Flow cells and methods of creating them |
| AU2021352913A1 (en) * | 2020-09-29 | 2023-01-05 | Illumina, Inc. | Methods for making flow cells |
| CN116762007A (zh) | 2020-12-31 | 2023-09-15 | 3M创新有限公司 | 具有图案化表面化学成分的纳米图案化膜 |
| DE102021200588A1 (de) | 2021-01-22 | 2022-07-28 | Robert Bosch Gesellschaft mit beschränkter Haftung | Verfahren und Steuergerät zum Herstellen eines Trägerelements zum Aufnehmen einer Probenflüssigkeit, Trägerelement und Analysevorrichtung mit Trägerelement |
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| CN117813557A (zh) | 2021-08-11 | 2024-04-02 | 科莱鹤株式会社 | 对基板进行图案化的方法、在基板上形成微细结构的方法和制造流体装置的方法 |
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| CA3021915A1 (en) * | 2016-05-18 | 2017-11-23 | Illumina, Inc. | Self-assembled patterning using patterned hydrophobic surfaces |
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2017
- 2017-05-17 CA CA3021915A patent/CA3021915A1/en active Pending
- 2017-05-17 WO PCT/US2017/033169 patent/WO2017201198A1/en not_active Ceased
- 2017-05-17 CN CN201780030534.0A patent/CN109313396B/zh active Active
- 2017-05-17 US US16/096,669 patent/US10900076B2/en active Active
- 2017-05-17 EP EP17729244.8A patent/EP3458913B1/en active Active
- 2017-05-17 KR KR1020187036643A patent/KR102171865B1/ko active Active
- 2017-05-17 SG SG11201809376WA patent/SG11201809376WA/en unknown
- 2017-05-17 ES ES17729244T patent/ES2861478T3/es active Active
- 2017-05-17 JP JP2018560189A patent/JP6824290B2/ja active Active
- 2017-05-17 AU AU2017267653A patent/AU2017267653B2/en active Active
- 2017-05-17 DK DK17729244.8T patent/DK3458913T3/da active
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2018
- 2018-10-22 IL IL262516A patent/IL262516B/en active IP Right Grant
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2021
- 2021-01-20 US US17/153,379 patent/US11332788B2/en active Active
- 2021-08-05 AU AU2021212076A patent/AU2021212076B2/en not_active Ceased
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2022
- 2022-05-05 US US17/662,124 patent/US11702695B2/en active Active
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|---|---|
| KR102171865B1 (ko) | 2020-10-29 |
| AU2017267653B2 (en) | 2021-05-13 |
| AU2021212076A1 (en) | 2021-08-26 |
| AU2021212076B2 (en) | 2022-09-01 |
| US20210139979A1 (en) | 2021-05-13 |
| WO2017201198A1 (en) | 2017-11-23 |
| US11702695B2 (en) | 2023-07-18 |
| IL262516B (en) | 2020-06-30 |
| ES2861478T3 (es) | 2021-10-06 |
| KR20190009345A (ko) | 2019-01-28 |
| US10900076B2 (en) | 2021-01-26 |
| US20220275443A1 (en) | 2022-09-01 |
| EP3458913A1 (en) | 2019-03-27 |
| JP6824290B2 (ja) | 2021-02-03 |
| US11332788B2 (en) | 2022-05-17 |
| EP3458913B1 (en) | 2020-12-23 |
| US20190360041A1 (en) | 2019-11-28 |
| IL262516A (en) | 2018-12-31 |
| AU2017267653A1 (en) | 2018-11-22 |
| CA3021915A1 (en) | 2017-11-23 |
| CN109313396A (zh) | 2019-02-05 |
| SG11201809376WA (en) | 2018-12-28 |
| CN109313396B (zh) | 2022-11-22 |
| JP2019523640A (ja) | 2019-08-29 |
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