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DK2052360T3 - Fremgangsmåde og elektronmikroskop til måling af ligheden af to-dimensionelle billeder - Google Patents

Fremgangsmåde og elektronmikroskop til måling af ligheden af to-dimensionelle billeder

Info

Publication number
DK2052360T3
DK2052360T3 DK07785677.1T DK07785677T DK2052360T3 DK 2052360 T3 DK2052360 T3 DK 2052360T3 DK 07785677 T DK07785677 T DK 07785677T DK 2052360 T3 DK2052360 T3 DK 2052360T3
Authority
DK
Denmark
Prior art keywords
similarity
additional signal
dimensional images
images
measure
Prior art date
Application number
DK07785677.1T
Other languages
English (en)
Inventor
Andreas Thust
Juri Barthel
Original Assignee
Forschungszentrum Juelich Gmbh
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Forschungszentrum Juelich Gmbh filed Critical Forschungszentrum Juelich Gmbh
Application granted granted Critical
Publication of DK2052360T3 publication Critical patent/DK2052360T3/da

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/22—Optical, image processing or photographic arrangements associated with the tube
    • H01J37/222—Image processing arrangements associated with the tube
    • G—PHYSICS
    • G06—COMPUTING OR CALCULATING; COUNTING
    • G06V—IMAGE OR VIDEO RECOGNITION OR UNDERSTANDING
    • G06V10/00—Arrangements for image or video recognition or understanding
    • G06V10/98—Detection or correction of errors, e.g. by rescanning the pattern or by human intervention; Evaluation of the quality of the acquired patterns
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/26—Electron or ion microscopes; Electron or ion diffraction tubes
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/26—Electron or ion microscopes; Electron or ion diffraction tubes
    • H01J37/261—Details
    • H01J37/263—Contrast, resolution or power of penetration
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/153—Correcting image defects, e.g. stigmators
    • H01J2237/1534—Aberrations
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/22—Treatment of data
    • H01J2237/221—Image processing
    • H01J2237/223—Fourier techniques
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/26—Electron or ion microscopes
    • H01J2237/2617—Comparison or superposition of transmission images; Moiré
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/26—Electron or ion microscopes
    • H01J2237/282—Determination of microscope properties
    • H01J2237/2823—Resolution

Landscapes

  • Engineering & Computer Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Quality & Reliability (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Multimedia (AREA)
  • Theoretical Computer Science (AREA)
  • Computer Vision & Pattern Recognition (AREA)
  • Analysing Materials By The Use Of Radiation (AREA)
  • Length-Measuring Devices Using Wave Or Particle Radiation (AREA)
  • Image Processing (AREA)
DK07785677.1T 2006-08-16 2007-07-25 Fremgangsmåde og elektronmikroskop til måling af ligheden af to-dimensionelle billeder DK2052360T3 (da)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
DE102006038211A DE102006038211A1 (de) 2006-08-16 2006-08-16 Verfahren und Elektronenmikroskop zur Messung der Ähnlichkeit zweidimensionaler Bilder
PCT/DE2007/001314 WO2008019644A1 (de) 2006-08-16 2007-07-25 Verfahren und elektronenmikroskop zur messung der ähnlichkeit zweidimensionaler bilder

Publications (1)

Publication Number Publication Date
DK2052360T3 true DK2052360T3 (da) 2011-12-05

Family

ID=38519660

Family Applications (1)

Application Number Title Priority Date Filing Date
DK07785677.1T DK2052360T3 (da) 2006-08-16 2007-07-25 Fremgangsmåde og elektronmikroskop til måling af ligheden af to-dimensionelle billeder

Country Status (8)

Country Link
US (1) US8351710B2 (da)
EP (1) EP2052360B1 (da)
JP (1) JP5546244B2 (da)
CN (1) CN101506839B (da)
AT (1) ATE527631T1 (da)
DE (1) DE102006038211A1 (da)
DK (1) DK2052360T3 (da)
WO (1) WO2008019644A1 (da)

Families Citing this family (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE102006061978A1 (de) * 2006-12-21 2008-06-26 Forschungszentrum Jülich GmbH Elektronenmikroskop und Verfahren zur Messung der Defokusstreuung
WO2009123311A1 (ja) * 2008-04-04 2009-10-08 株式会社日立製作所 回折像取得方法、及び荷電粒子線装置
DE102011107371A1 (de) * 2011-07-14 2013-01-17 Forschungszentrum Jülich GmbH Verfahren zur Bestimmung der Übertragungsfunktion eines signalverarbeitenden Systems ohne bekanntes Eingangssignal
JP5401521B2 (ja) * 2011-09-05 2014-01-29 株式会社日立ハイテクノロジーズ 荷電粒子線装置
JP6093865B2 (ja) * 2013-02-28 2017-03-08 ダイレクト エレクトロン エルピーＤｉｒｅｃｔ Ｅｌｅｃｔｒｏｎ，Ｌｐ イメージシーケンスのイメージ同士を組み合わせることによる試料の電子ビームイメージングの方法
JP5597295B2 (ja) * 2013-10-23 2014-10-01 株式会社日立ハイテクノロジーズ 荷電粒子線装置
JP5799147B2 (ja) * 2014-08-08 2015-10-21 株式会社日立ハイテクノロジーズ 荷電粒子線装置
US11288491B2 (en) * 2017-07-22 2022-03-29 Intelligent Virus Imaging Inc Method for automated unsupervised ontological investigation of structural appearances in electron micrographs
WO2021078445A1 (en) * 2019-10-22 2021-04-29 Asml Netherlands B.V. Method of determining aberrations in images obtained by a charged particle beam tool, method of determining a setting of a charged particle beam tool, and charged particle beam tool
EP3813091A1 (en) * 2019-10-22 2021-04-28 ASML Netherlands B.V. Method of determining aberrations in images obtained by a charged particle beam tool, method of determining a setting of a charged particle beam tool, and charged particle beam tool
JP7267319B2 (ja) * 2021-01-18 2023-05-01 日本電子株式会社 収差測定方法および電子顕微鏡
US11810753B2 (en) * 2021-10-13 2023-11-07 ICT Integrated Circuit Testing Gesellschaft für Halbleiterprüftechnik mbH Methods of determining aberrations of a charged particle beam, and charged particle beam system

Family Cites Families (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0816930B2 (ja) * 1989-11-28 1996-02-21 アジア航測株式会社 ステレオ画像データから３次元数値データを求める方法
US5300776A (en) * 1992-09-16 1994-04-05 Gatan, Inc. Autoadjusting electron microscope
JPH07220669A (ja) * 1994-01-31 1995-08-18 Jeol Ltd 非点・入射軸補正装置を備えた電子顕微鏡
JP4016472B2 (ja) * 1997-01-10 2007-12-05 株式会社日立製作所 外観検査方法及びその装置
US6587581B1 (en) * 1997-01-10 2003-07-01 Hitachi, Ltd. Visual inspection method and apparatus therefor
US6476398B1 (en) * 1999-03-05 2002-11-05 Applied Materials, Inc. Beam automation in charged-particle-beam systems
JP2000340154A (ja) * 1999-05-25 2000-12-08 Hitachi Ltd 走査電子顕微鏡
JP3813798B2 (ja) * 2000-07-13 2006-08-23 株式会社日立製作所 電子顕微鏡
JP3951590B2 (ja) * 2000-10-27 2007-08-01 株式会社日立製作所 荷電粒子線装置
CN1255850C (zh) * 2003-07-24 2006-05-10 上海市计量测试技术研究院 一种扫描电子显微镜像散的校正方法
JP4286625B2 (ja) * 2003-09-29 2009-07-01 株式会社日立ハイテクノロジーズ 電子顕微鏡による試料観察方法
JP4351108B2 (ja) * 2004-04-07 2009-10-28 日本電子株式会社 Ｓｅｍの収差自動補正方法及び収差自動補正装置
JP2005302468A (ja) * 2004-04-09 2005-10-27 Jeol Ltd 荷電粒子ビーム装置のシミュレーション画像表示方法及び装置
JP2006173027A (ja) * 2004-12-20 2006-06-29 Hitachi High-Technologies Corp 走査透過電子顕微鏡、及び収差測定方法、ならびに収差補正方法

Also Published As

Publication number Publication date
US8351710B2 (en) 2013-01-08
EP2052360A1 (de) 2009-04-29
EP2052360B1 (de) 2011-10-05
JP5546244B2 (ja) 2014-07-09
CN101506839B (zh) 2012-10-31
DE102006038211A1 (de) 2008-02-21
WO2008019644A1 (de) 2008-02-21
US20090268969A1 (en) 2009-10-29
ATE527631T1 (de) 2011-10-15
JP2010500726A (ja) 2010-01-07
CN101506839A (zh) 2009-08-12

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