[go: up one dir, main page]

DK1970734T3 - Fremgangsmåde til fremstilling af en afstandsvarierende bølgeplade med flydende krystaller - Google Patents

Fremgangsmåde til fremstilling af en afstandsvarierende bølgeplade med flydende krystaller

Info

Publication number
DK1970734T3
DK1970734T3 DK08004418.3T DK08004418T DK1970734T3 DK 1970734 T3 DK1970734 T3 DK 1970734T3 DK 08004418 T DK08004418 T DK 08004418T DK 1970734 T3 DK1970734 T3 DK 1970734T3
Authority
DK
Denmark
Prior art keywords
vortex
photo
substrate
waveplate
spacer
Prior art date
Application number
DK08004418.3T
Other languages
English (en)
Inventor
David M Shemo
Scott Mceldowney
Jerry Zieba
Original Assignee
Jds Uniphase Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Jds Uniphase Corp filed Critical Jds Uniphase Corp
Application granted granted Critical
Publication of DK1970734T3 publication Critical patent/DK1970734T3/da

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G03F7/7055—Exposure light control in all parts of the microlithographic apparatus, e.g. pulse length control or light interruption
    • G03F7/70566—Polarisation control
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/30—Polarising elements
    • G02B5/3016—Polarising elements involving passive liquid crystal elements
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/30—Polarising elements
    • G02B5/3083—Birefringent or phase retarding elements
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/7095—Materials, e.g. materials for housing, stage or other support having particular properties, e.g. weight, strength, conductivity, thermal expansion coefficient
    • G03F7/70958—Optical materials or coatings, e.g. with particular transmittance, reflectance or anti-reflection properties
    • G03F7/70966—Birefringence
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09K—MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
    • C09K2323/00—Functional layers of liquid crystal optical display excluding electroactive liquid crystal layer characterised by chemical composition
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
    • G02F1/13363—Birefringent elements, e.g. for optical compensation
    • G02F1/133631—Birefringent elements, e.g. for optical compensation with a spatial distribution of the retardation value

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Chemical & Material Sciences (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Engineering & Computer Science (AREA)
  • Nonlinear Science (AREA)
  • Health & Medical Sciences (AREA)
  • Environmental & Geological Engineering (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Mathematical Physics (AREA)
  • Liquid Crystal (AREA)
  • Polarising Elements (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Crystals, And After-Treatments Of Crystals (AREA)
DK08004418.3T 2007-03-12 2008-03-10 Fremgangsmåde til fremstilling af en afstandsvarierende bølgeplade med flydende krystaller DK1970734T3 (da)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US89425507P 2007-03-12 2007-03-12

Publications (1)

Publication Number Publication Date
DK1970734T3 true DK1970734T3 (da) 2012-01-16

Family

ID=39473591

Family Applications (1)

Application Number Title Priority Date Filing Date
DK08004418.3T DK1970734T3 (da) 2007-03-12 2008-03-10 Fremgangsmåde til fremstilling af en afstandsvarierende bølgeplade med flydende krystaller

Country Status (8)

Country Link
US (1) US20080226844A1 (da)
EP (1) EP1970734B1 (da)
JP (1) JP5264219B2 (da)
KR (1) KR20080083595A (da)
CN (1) CN101266313B (da)
AT (1) ATE524754T1 (da)
DK (1) DK1970734T3 (da)
TW (1) TW200844546A (da)

Families Citing this family (53)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
AU2003242956A1 (en) * 2002-06-28 2004-01-19 Technion Research And Development Foundation Ltd. Geometrical phase optical elements with space-variant subwavelength gratings
RU2391078C2 (ru) * 2008-08-14 2010-06-10 Сергей Игоревич Анисимов Способ лечения кератоконуса воздействием ультрафиолетового излучения и устройство для его осуществления (варианты)
EP2163923B1 (en) * 2008-09-12 2014-12-17 JDS Uniphase Corporation Optical vortex retarder micro-array
EP2282231A3 (en) * 2009-08-07 2011-05-04 JDS Uniphase Corporation Multi-segment optical retarder for creating 3d images
US10274650B2 (en) 2010-01-29 2019-04-30 Beam Engineering For Advanced Measurements Co. Diffractive waveplate lenses and applications
US9557456B2 (en) 2010-01-29 2017-01-31 The United States Of America As Represented By The Secretary Of The Army Broadband optics for manipulating light beams and images
US11366254B2 (en) 2010-01-29 2022-06-21 Beam Engineering For Advanced Measurements Co. High-efficiency wide-angle beam steering system
US9983479B2 (en) 2010-04-21 2018-05-29 Beam Engineering For Advanced Measurements Co. Fabrication of high efficiency, high quality, large area diffractive waveplates and arrays
US10197715B1 (en) * 2013-03-15 2019-02-05 Beam Engineering For Advanced Measurements Co. Methods of diffractive lens and mirror fabrication
US20110262844A1 (en) 2010-04-21 2011-10-27 Beam Engineering For Advanced Measurement Co. Fabrication of high efficiency, high quality, large area diffractive waveplates and arrays
US10114239B2 (en) 2010-04-21 2018-10-30 Beam Engineering For Advanced Measurements Co. Waveplate lenses and methods for their fabrication
US20120092668A1 (en) * 2010-10-15 2012-04-19 The Hong Kong University Of Science And Technology Patterned polarization converter
CN102157894A (zh) * 2011-03-21 2011-08-17 华中科技大学 一种基于光栅的轴对称偏振谐振腔镜
JP2012203294A (ja) * 2011-03-28 2012-10-22 Ushio Inc 偏光素子ユニットおよび偏光光照射装置
US9612449B2 (en) 2012-02-08 2017-04-04 Saitama Medical University Axially symmetric polarization conversion element
CN102662270B (zh) * 2012-04-12 2015-05-20 华映视讯（吴江）有限公司 液晶面板的偏光层及其制造方法
CN102830548A (zh) * 2012-08-15 2012-12-19 深圳市华星光电技术有限公司 对液晶显示面板进行曝照处理的装置及方法
EP4137850A1 (en) * 2012-10-15 2023-02-22 ImagineOptix Corporation Optical element
US10107945B2 (en) * 2013-03-01 2018-10-23 Beam Engineering For Advanced Measurements Co. Vector vortex waveplates
US10185182B2 (en) * 2013-03-03 2019-01-22 Beam Engineering For Advanced Measurements Co. Mechanical rubbing method for fabricating cycloidal diffractive waveplates
JP6326746B2 (ja) * 2013-09-10 2018-05-23 東芝ライテック株式会社 偏光光照射装置
CN105659121B (zh) * 2013-10-21 2019-04-30 默克专利股份有限公司 制备双折射聚合物膜的方法
CN103995394B (zh) * 2014-03-19 2016-08-17 南开大学 一种基于激光直写的微纳区域液晶定向的方法及其系统
US9787899B1 (en) 2014-08-12 2017-10-10 Amazon Technologies, Inc. Multiple captures with a variable aperture
US9646365B1 (en) * 2014-08-12 2017-05-09 Amazon Technologies, Inc. Variable temporal aperture
US9749532B1 (en) 2014-08-12 2017-08-29 Amazon Technologies, Inc. Pixel readout of a charge coupled device having a variable aperture
WO2016183602A1 (en) * 2015-05-20 2016-11-24 Margaryan Hakob Centrally symmetric liquid crystal polarization diffractive waveplate and its fabrication
US9976911B1 (en) 2015-06-30 2018-05-22 Beam Engineering For Advanced Measurements Co. Full characterization wavefront sensor
US10191296B1 (en) 2015-06-30 2019-01-29 Beam Engineering For Advanced Measurements Co. Laser pointer with reduced risk of eye injury
US10436957B2 (en) 2015-10-27 2019-10-08 Beam Engineering For Advanced Measurements Co. Broadband imaging with diffractive waveplate coated mirrors and diffractive waveplate objective lens
US10451947B1 (en) 2016-10-31 2019-10-22 Facebook Technologies, Llc Apochromatic pancharatnam berry phase (PBP) liquid crystal structures for head-mounted displays
US10423045B2 (en) 2016-11-14 2019-09-24 Beam Engineering For Advanced Measurements Co. Electro-optical diffractive waveplate beam shaping system
CN106405717A (zh) * 2016-11-24 2017-02-15 宁波视睿迪光电有限公司 屈光单元及屈光单元制作方法
US10274805B2 (en) 2017-06-13 2019-04-30 Beam Engineering For Advanced Measurements Co. Polarization-independent switchable lens system
CN109752883B (zh) * 2017-09-20 2022-08-09 香港科技大学 制作具有连续变化的取向方向的光取向层的方法
US11982906B1 (en) 2018-03-05 2024-05-14 Beam Engineering For Advanced Measurements Co. Polarization-independent diffractive optical structures
US11175441B1 (en) 2018-03-05 2021-11-16 Beam Engineering For Advanced Measurements Co. Polarization-independent diffractive optical structures
US20190285891A1 (en) 2018-03-15 2019-09-19 Oculus Vr, Llc Image quality of pancharatnam berry phase components using polarizers
US11846779B2 (en) 2018-03-15 2023-12-19 Meta Platforms Technologies, Llc Display device with varifocal optical assembly
ES2711456B2 (es) 2018-09-14 2020-12-15 Univ Madrid Politecnica Dispositivo optico configurable
CN109164643B (zh) * 2018-09-21 2022-02-22 南京晶萃光学科技有限公司 一种完美涡旋光产生器及其制备方法
CN110320672B (zh) * 2019-07-08 2022-05-17 南京晶萃光学科技有限公司 一种太赫兹涡旋光产生器、制备方法及产生系统
US11294240B2 (en) 2019-08-10 2022-04-05 Beam Engineering For Advanced Measurements Co. Diffractive waveplate devices that operate over a wide temperature range
CN110673350B (zh) * 2019-09-03 2021-10-19 深圳大学 一种产生椭圆形径向偏振光束的涡旋半波片及系统
JP7234397B2 (ja) * 2019-09-30 2023-03-07 富士フイルム株式会社 偏光照射装置及び被照射体の露光方法
CN119179189A (zh) * 2020-02-03 2024-12-24 威尔乌集团 用于显示器背光的空间变化偏振器
TWI790626B (zh) * 2021-05-25 2023-01-21 逢甲大學 徑向偏極轉換元件、方位偏極轉換元件及其製法
CN113534481B (zh) * 2021-08-20 2024-11-05 深圳市麓邦技术有限公司 涡旋光源模组制备系统及方法
JPWO2023085308A1 (da) * 2021-11-11 2023-05-19
JPWO2023085257A1 (da) * 2021-11-11 2023-05-19
CN114624926A (zh) * 2022-03-28 2022-06-14 南京南辉智能光学感控研究院有限公司 一种涡旋波片
JPWO2024029309A1 (da) * 2022-08-02 2024-02-08
CN117680344A (zh) * 2023-11-17 2024-03-12 成都瑞波科材料科技有限公司 涡旋波片的制备方法及涡旋波片

Family Cites Families (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
SG50596A1 (en) * 1991-07-26 2001-01-16 Rolic Ag Photo-oriented polymer networks and method of their manufacture
US5539074A (en) * 1993-02-17 1996-07-23 Hoffmann-La Roche Inc. Linear and cyclic polymers or oligomers having a photoreactive ethene group
DE59403063D1 (de) * 1993-02-17 1997-07-17 Hoffmann La Roche Optisches Bauelement
JP2693368B2 (ja) * 1993-06-29 1997-12-24 スタンレー電気株式会社 液晶表示素子とその製造方法
DE59507348D1 (de) * 1994-09-29 2000-01-05 Rolic Ag Zug Cumarin- und chinolinon-derivate zur herstellung von orientierungsschichten für flüssigkristalle
US6107427A (en) * 1995-09-15 2000-08-22 Rolic Ag Cross-linkable, photoactive polymer materials
GB2309794B (en) * 1996-02-01 1998-07-15 Lg Electronics Inc An ultraviolet irradiating device for photo-alignment process and an irradiating method using the same
US6204901B1 (en) * 1997-07-31 2001-03-20 Duke University Liquid crystal color shutters that include reflective polarizers that pass color components of light of a first polarization and that reflect a majority of color components of light of a second polarization
AU2002241632A1 (en) * 2000-12-27 2002-07-08 Technion Research And Development Foundation Ltd. Space-variant subwavelength polarization grating and applications thereof
ATE390645T1 (de) * 2001-09-24 2008-04-15 Stichting Dutch Polymer Inst Eine erste und zweite unterschicht enthaltende orientierungsschicht
US7061561B2 (en) 2002-01-07 2006-06-13 Moxtek, Inc. System for creating a patterned polarization compensator
AU2003242956A1 (en) * 2002-06-28 2004-01-19 Technion Research And Development Foundation Ltd. Geometrical phase optical elements with space-variant subwavelength gratings
US7190521B2 (en) * 2002-09-13 2007-03-13 Technion Research And Development Foundation Ltd. Space-variant subwavelength dielectric grating and applications thereof
US20070115551A1 (en) 2005-04-01 2007-05-24 Alexis Spilman Space-variant waveplate for polarization conversion, methods and applications
US20090122402A1 (en) * 2007-11-14 2009-05-14 Jds Uniphase Corporation Achromatic Converter Of A Spatial Distribution Of Polarization Of Light

Also Published As

Publication number Publication date
JP2008233903A (ja) 2008-10-02
EP1970734A1 (en) 2008-09-17
CN101266313A (zh) 2008-09-17
CN101266313B (zh) 2011-10-05
US20080226844A1 (en) 2008-09-18
EP1970734B1 (en) 2011-09-14
ATE524754T1 (de) 2011-09-15
KR20080083595A (ko) 2008-09-18
TW200844546A (en) 2008-11-16
JP5264219B2 (ja) 2013-08-14

Similar Documents

Publication Publication Date Title
DK1970734T3 (da) Fremgangsmåde til fremstilling af en afstandsvarierende bølgeplade med flydende krystaller
JP6292879B2 (ja) 可変的な透過窓
Chen et al. Generation of arbitrary vector beams with liquid crystal polarization converters and vector-photoaligned q-plates
US6295111B1 (en) Liquid crystal cell and a method for fabricating that
CN103959157B (zh) 掩模
JP2008508543A5 (da)
GB2309793A (en) Controlling pretilt angle direction in a liquid crystal cell
JP2014006493A (ja) 位相差板の製造方法
CN102226856A (zh) 液晶显示装置的制造方法和用于配向处理的曝光装置
TWI486647B (zh) Method of manufacturing phase difference plate
CN109116635A (zh) 一种液晶偏振光栅制备方法
US20160161648A1 (en) Method of fabricating large area birefringent grating films
US11209700B2 (en) Method for manufacturing liquid crystal panel, method for manufacturing retardation plate, and wire grid polarizing plate
JP4216220B2 (ja) 液晶表示素子の製造方法
US20040241319A1 (en) Method of manufacturing phase-difference film using polarized ultraviolet light
WO2000073824A1 (fr) Diviseur de faisceau lumineux polarise et iiluminateur a lumiere polarisee le contenant
US10175570B2 (en) Reticle and fabrication method thereof, and method for fabricating patterns on a substrate
KR100684182B1 (ko) 액정 중합체 소자의 제조방법, 당해 방법에 의해 제조된 액정 중합체 소자 및 당해 소자를 포함하는 광학 장치
KR100767587B1 (ko) 코팅형 보상필름을 적용한 액정표시장치 및 그 제조방법
WO2012105393A1 (ja) 露光装置、液晶表示装置及びその製造方法
US20060187547A1 (en) Polarized light irradiation apparatus polarized light irradiation method, photo alignment film, and retardation film
US20160306085A1 (en) Liquid crystalline polymer film with diffractive optical noise removed and method of manufacturing the same
KR20050039564A (ko) 광 배향용 편광광 조사장치 및 광 배향용 편광광조사장치에서의 편광축의 조정 방법
KR0169063B1 (ko) 광배향용 자외선 조사장치
JP2004347668A (ja) 光配向用偏光光照射装置