DK0471151T3 - Bindemiddelblandinger som kan tværbindes ved bestråling - Google Patents
Bindemiddelblandinger som kan tværbindes ved bestrålingInfo
- Publication number
- DK0471151T3 DK0471151T3 DK91107450.8T DK91107450T DK0471151T3 DK 0471151 T3 DK0471151 T3 DK 0471151T3 DK 91107450 T DK91107450 T DK 91107450T DK 0471151 T3 DK0471151 T3 DK 0471151T3
- Authority
- DK
- Denmark
- Prior art keywords
- reacting
- carboxylic acids
- product
- binder mixtures
- crosslinked
- Prior art date
Links
- 239000011230 binding agent Substances 0.000 title abstract 2
- 239000000203 mixture Substances 0.000 title abstract 2
- 125000003700 epoxy group Chemical group 0.000 abstract 4
- 150000001735 carboxylic acids Chemical class 0.000 abstract 3
- 125000003178 carboxy group Chemical group [H]OC(*)=O 0.000 abstract 2
- 239000007795 chemical reaction product Substances 0.000 abstract 2
- -1 epoxide compound Chemical class 0.000 abstract 2
- 239000000047 product Substances 0.000 abstract 2
- 150000008064 anhydrides Chemical class 0.000 abstract 1
- FQTPJRSWICGMDY-UHFFFAOYSA-N isocyanato carbamate Chemical class NC(=O)ON=C=O FQTPJRSWICGMDY-UHFFFAOYSA-N 0.000 abstract 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G18/00—Polymeric products of isocyanates or isothiocyanates
- C08G18/06—Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen
- C08G18/28—Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen characterised by the compounds used containing active hydrogen
- C08G18/40—High-molecular-weight compounds
- C08G18/58—Epoxy resins
- C08G18/581—Reaction products of epoxy resins with less than equivalent amounts of compounds containing active hydrogen added before or during the reaction with the isocyanate component
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G18/00—Polymeric products of isocyanates or isothiocyanates
- C08G18/06—Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen
- C08G18/70—Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen characterised by the isocyanates or isothiocyanates used
- C08G18/81—Unsaturated isocyanates or isothiocyanates
- C08G18/8141—Unsaturated isocyanates or isothiocyanates masked
- C08G18/815—Polyisocyanates or polyisothiocyanates masked with unsaturated compounds having active hydrogen
- C08G18/8158—Polyisocyanates or polyisothiocyanates masked with unsaturated compounds having active hydrogen with unsaturated compounds having only one group containing active hydrogen
- C08G18/8175—Polyisocyanates or polyisothiocyanates masked with unsaturated compounds having active hydrogen with unsaturated compounds having only one group containing active hydrogen with esters of acrylic or alkylacrylic acid having only one group containing active hydrogen
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G59/00—Polycondensates containing more than one epoxy group per molecule; Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups
- C08G59/14—Polycondensates modified by chemical after-treatment
- C08G59/1433—Polycondensates modified by chemical after-treatment with organic low-molecular-weight compounds
- C08G59/1438—Polycondensates modified by chemical after-treatment with organic low-molecular-weight compounds containing oxygen
- C08G59/1455—Monocarboxylic acids, anhydrides, halides, or low-molecular-weight esters thereof
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G59/00—Polycondensates containing more than one epoxy group per molecule; Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups
- C08G59/14—Polycondensates modified by chemical after-treatment
- C08G59/1433—Polycondensates modified by chemical after-treatment with organic low-molecular-weight compounds
- C08G59/1477—Polycondensates modified by chemical after-treatment with organic low-molecular-weight compounds containing nitrogen
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G59/00—Polycondensates containing more than one epoxy group per molecule; Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups
- C08G59/18—Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing
- C08G59/40—Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing characterised by the curing agents used
- C08G59/42—Polycarboxylic acids; Anhydrides, halides or low molecular weight esters thereof
- C08G59/4292—Polycarboxylic acids; Anhydrides, halides or low molecular weight esters thereof together with monocarboxylic acids
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
- C08L63/00—Compositions of epoxy resins; Compositions of derivatives of epoxy resins
- C08L63/10—Epoxy resins modified by unsaturated compounds
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
- G03F7/0388—Macromolecular compounds which are rendered insoluble or differentially wettable with ethylenic or acetylenic bands in the side chains of the photopolymer
Landscapes
- Chemical & Material Sciences (AREA)
- Health & Medical Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Medicinal Chemistry (AREA)
- Polymers & Plastics (AREA)
- Organic Chemistry (AREA)
- Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- General Chemical & Material Sciences (AREA)
- General Physics & Mathematics (AREA)
- Emergency Medicine (AREA)
- Epoxy Resins (AREA)
- Macromonomer-Based Addition Polymer (AREA)
- Adhesives Or Adhesive Processes (AREA)
- Paints Or Removers (AREA)
- Dental Preparations (AREA)
- Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DE4025687A DE4025687A1 (de) | 1990-08-14 | 1990-08-14 | Durch strahlung vernetzbare bindemittelgemische |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| DK0471151T3 true DK0471151T3 (da) | 1994-10-17 |
Family
ID=6412194
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| DK91107450.8T DK0471151T3 (da) | 1990-08-14 | 1991-05-08 | Bindemiddelblandinger som kan tværbindes ved bestråling |
Country Status (8)
| Country | Link |
|---|---|
| US (1) | US5102702A (da) |
| EP (1) | EP0471151B1 (da) |
| JP (1) | JP3300000B2 (da) |
| AT (1) | ATE111124T1 (da) |
| DE (2) | DE4025687A1 (da) |
| DK (1) | DK0471151T3 (da) |
| ES (1) | ES2038576T3 (da) |
| GR (1) | GR920300038T1 (da) |
Families Citing this family (12)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE4116957A1 (de) * | 1991-05-24 | 1992-11-26 | Ruetgerswerke Ag | Durch strahlung vernetzbare beschichtungsmittel und ihre verwendung |
| JP3077277B2 (ja) * | 1991-08-05 | 2000-08-14 | 大日本インキ化学工業株式会社 | 新規なエネルギー線硬化型樹脂組成物 |
| US5395403A (en) * | 1992-06-30 | 1995-03-07 | Sanyo Electric Co., Ltd. | Hydrogen-absorbing alloy electrode and manufacturing method therefor |
| JP3281473B2 (ja) * | 1994-01-17 | 2002-05-13 | 日本化薬株式会社 | フレキシブルプリント配線板用レジストインキ組成物及びその硬化物 |
| JPH08269146A (ja) * | 1994-09-28 | 1996-10-15 | Takeda Chem Ind Ltd | 高耐熱性高分子重合体微粒子及びエポキシエステル |
| US5854313A (en) * | 1994-09-28 | 1998-12-29 | Takeda Chemical Industries, Ltd. | Fine particles of high heat resistant polymer and epoxy esters |
| US5973034A (en) * | 1995-10-11 | 1999-10-26 | Nippon Kayaku Kabushiki Kaisha | (Oxide or sulfide) powder epoxy (meth) acrylate w/glass and/or metal |
| US7888466B2 (en) | 1996-01-11 | 2011-02-15 | Human Genome Sciences, Inc. | Human G-protein chemokine receptor HSATU68 |
| US6017634A (en) * | 1997-07-21 | 2000-01-25 | Miguel Albert Capote | Carboxyl-containing polyunsaturated fluxing agent and carboxyl-reactive neutralizing agent as adhesive |
| KR20030093316A (ko) | 2001-04-13 | 2003-12-06 | 휴먼 게놈 사이언시즈, 인코포레이티드 | 혈관 내피 성장 인자 2 |
| MXPA03010747A (es) | 2001-05-25 | 2004-03-02 | Human Genome Sciences Inc | Anticuerpos que se unen inmunoespecificamente a receptores de ligando inductor de apoptosis relacionado con factor de necrosis tumoral. |
| JP5107960B2 (ja) * | 2009-04-10 | 2012-12-26 | 太陽ホールディングス株式会社 | ソルダーレジスト組成物、それを用いたドライフィルム及びプリント配線板 |
Family Cites Families (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| IT1013221B (it) * | 1973-08-25 | 1977-03-30 | Ruetgerswerke Ag | Miscele di resina sintetica dotate di elevata reattivita sotto l azione di raggi ionizzanti |
| DE2707405C3 (de) * | 1976-07-19 | 1987-12-03 | Vianova Kunstharz Ag, Werndorf | Verfahren zur Herstellung von Bindemitteln für die Elektrotauchlackierung |
| ATE37889T1 (de) * | 1984-06-29 | 1988-10-15 | Siemens Ag | Thermostabiles, durch bestrahlung vernetzbares polymersystem auf der basis von bisphenolen und epichlorhydrin sowie verfahren zu seiner verwendung. |
| DE3508450A1 (de) * | 1985-03-09 | 1986-09-11 | Rütgerswerke AG, 6000 Frankfurt | Durch strahlung vernetzbare bindemittel und ihre verwendung |
| JPH01141908A (ja) * | 1987-11-30 | 1989-06-02 | Dainippon Ink & Chem Inc | 活性エネルギー線硬化性樹脂組成物 |
-
1990
- 1990-08-14 DE DE4025687A patent/DE4025687A1/de not_active Withdrawn
-
1991
- 1991-05-08 AT AT91107450T patent/ATE111124T1/de not_active IP Right Cessation
- 1991-05-08 DK DK91107450.8T patent/DK0471151T3/da active
- 1991-05-08 ES ES91107450T patent/ES2038576T3/es not_active Expired - Lifetime
- 1991-05-08 EP EP91107450A patent/EP0471151B1/de not_active Expired - Lifetime
- 1991-05-08 DE DE59102823T patent/DE59102823D1/de not_active Expired - Lifetime
- 1991-07-22 US US07/733,424 patent/US5102702A/en not_active Expired - Lifetime
- 1991-08-13 JP JP20300391A patent/JP3300000B2/ja not_active Expired - Lifetime
-
1992
- 1992-08-26 GR GR92300038T patent/GR920300038T1/el unknown
Also Published As
| Publication number | Publication date |
|---|---|
| DE4025687A1 (de) | 1992-02-20 |
| ATE111124T1 (de) | 1994-09-15 |
| US5102702A (en) | 1992-04-07 |
| ES2038576T3 (es) | 1994-11-16 |
| EP0471151A2 (de) | 1992-02-19 |
| JP3300000B2 (ja) | 2002-07-08 |
| JPH04270715A (ja) | 1992-09-28 |
| EP0471151A3 (en) | 1992-07-22 |
| GR920300038T1 (en) | 1992-08-26 |
| EP0471151B1 (de) | 1994-09-07 |
| DE59102823D1 (de) | 1994-10-13 |
| ES2038576T1 (es) | 1993-08-01 |
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