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DE69603373D1 - Fraktionierung von phenol-formaldehyd-kondensaten und die hergestellte fotoresistzusammensetzungen - Google Patents

Fraktionierung von phenol-formaldehyd-kondensaten und die hergestellte fotoresistzusammensetzungen

Info

Publication number
DE69603373D1
DE69603373D1 DE69603373T DE69603373T DE69603373D1 DE 69603373 D1 DE69603373 D1 DE 69603373D1 DE 69603373 T DE69603373 T DE 69603373T DE 69603373 T DE69603373 T DE 69603373T DE 69603373 D1 DE69603373 D1 DE 69603373D1
Authority
DE
Germany
Prior art keywords
fractionation
photo resist
phenol formaldehyde
resist compositions
formaldehyde condensates
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE69603373T
Other languages
English (en)
Other versions
DE69603373T2 (de
Inventor
M Rahman
Daniel Aubin
Dinesh Khanna
Sunit Dixit
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
EMD Performance Materials Corp
Original Assignee
Clariant International Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Clariant International Ltd filed Critical Clariant International Ltd
Publication of DE69603373D1 publication Critical patent/DE69603373D1/de
Application granted granted Critical
Publication of DE69603373T2 publication Critical patent/DE69603373T2/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G8/00—Condensation polymers of aldehydes or ketones with phenols only
    • C08G8/04—Condensation polymers of aldehydes or ketones with phenols only of aldehydes
    • C08G8/08—Condensation polymers of aldehydes or ketones with phenols only of aldehydes of formaldehyde, e.g. of formaldehyde formed in situ
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/022—Quinonediazides
    • G03F7/023—Macromolecular quinonediazides; Macromolecular additives, e.g. binders
    • G03F7/0233—Macromolecular quinonediazides; Macromolecular additives, e.g. binders characterised by the polymeric binders or the macromolecular additives other than the macromolecular quinonediazides
    • G03F7/0236—Condensation products of carbonyl compounds and phenolic compounds, e.g. novolak resins
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders

Landscapes

  • Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Physics & Mathematics (AREA)
  • Materials For Photolithography (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Phenolic Resins Or Amino Resins (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
DE69603373T 1995-09-20 1996-09-18 Fraktionierung von phenol-formaldehyd-kondensaten und die hergestellte fotoresistzusammensetzungen Expired - Fee Related DE69603373T2 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US08/530,847 US5739265A (en) 1995-09-20 1995-09-20 Fractionation of phenol formaldehyde condensate and photoresist compositions produced therefrom
PCT/US1996/014946 WO1997011100A1 (en) 1995-09-20 1996-09-18 Fractionation of phenol formaldehyde condensate and photoresist compositions produced therefrom

Publications (2)

Publication Number Publication Date
DE69603373D1 true DE69603373D1 (de) 1999-08-26
DE69603373T2 DE69603373T2 (de) 2000-04-06

Family

ID=24115226

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69603373T Expired - Fee Related DE69603373T2 (de) 1995-09-20 1996-09-18 Fraktionierung von phenol-formaldehyd-kondensaten und die hergestellte fotoresistzusammensetzungen

Country Status (8)

Country Link
US (2) US5739265A (de)
EP (1) EP0851879B1 (de)
JP (1) JPH11512832A (de)
KR (1) KR100411590B1 (de)
CN (1) CN1099429C (de)
DE (1) DE69603373T2 (de)
TW (1) TW376467B (de)
WO (1) WO1997011100A1 (de)

Families Citing this family (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5853954A (en) * 1996-12-18 1998-12-29 Clariant Finance (Bvi) Limited Fractionated novolak resin and photoresist composition therefrom
US6200479B1 (en) * 1997-01-14 2001-03-13 Shipley Company, L.L.C. Phenolic resin purification
US6121412A (en) * 1998-11-12 2000-09-19 Clariant Finance (Bvi) Limited Preparation of fractionated novolak resins by a novel extraction technique
US6297352B1 (en) * 1998-11-12 2001-10-02 Clariant Finance (Bvi) Limited Method of reducing metal ion content of film-forming resins using a liquid/liquid centrifuge
US6506831B2 (en) 1998-12-20 2003-01-14 Honeywell International Inc. Novolac polymer planarization films with high temperature stability
JP3894001B2 (ja) * 2001-09-06 2007-03-14 住友化学株式会社 化学増幅型ポジ型レジスト組成物
JP4433165B2 (ja) * 2004-02-16 2010-03-17 ソニー株式会社 カチオン伝導体およびこれを用いた電気化学デバイス
US8247072B2 (en) 2006-02-14 2012-08-21 Eastman Chemical Company Resol beads, methods of making them and methods of using them
US20070191572A1 (en) * 2006-02-14 2007-08-16 Tustin Gerald C Resol beads, methods of making them, and methods of using them
US20070191571A1 (en) * 2006-02-14 2007-08-16 Sink Chester W Resol beads, methods of making them, and methods of using them
CA2813301A1 (en) * 2010-09-30 2012-04-05 Evonik Corporation Method for removing residual organic solvent from microparticles

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE938233C (de) * 1953-03-11 1956-01-26 Kalle & Co Ag Lichtempfindliches Material fuer die photomechanische Herstellung von Druckformen
US4033909A (en) * 1974-08-13 1977-07-05 Union Carbide Corporation Stable phenolic resoles
JPS61185741A (ja) * 1985-02-13 1986-08-19 Mitsubishi Chem Ind Ltd ポジ型フオトレジスト組成物
US5378802A (en) * 1991-09-03 1995-01-03 Ocg Microelectronic Materials, Inc. Method for removing impurities from resist components and novolak resins
KR100231655B1 (ko) * 1991-12-18 1999-11-15 마이클 에이. 카푸토 노볼락 수지중의 금속 이온 감소 방법
EP0635145B1 (de) * 1992-03-06 1998-08-19 Clariant Finance (BVI) Limited Photoresists mit einem niedrigem grad metallionen
US5521052A (en) * 1994-12-30 1996-05-28 Hoechst Celanese Corporation Metal ion reduction in novolak resin using an ion exchange catalyst in a polar solvent and photoresists compositions therefrom
US5693749A (en) * 1995-09-20 1997-12-02 Hoechst Celanese Corporation Fractionation of phenol formaldehyde condensate and photoresist compositions produced therefrom

Also Published As

Publication number Publication date
KR100411590B1 (ko) 2004-04-28
TW376467B (en) 1999-12-11
EP0851879B1 (de) 1999-07-21
WO1997011100A1 (en) 1997-03-27
US5976761A (en) 1999-11-02
EP0851879A1 (de) 1998-07-08
CN1099429C (zh) 2003-01-22
DE69603373T2 (de) 2000-04-06
US5739265A (en) 1998-04-14
CN1196735A (zh) 1998-10-21
KR19990045753A (ko) 1999-06-25
JPH11512832A (ja) 1999-11-02

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Legal Events

Date Code Title Description
8327 Change in the person/name/address of the patent owner

Owner name: CLARIANT FINANCE (BVI) LTD., ROAD TOWN, TORTOLA, V

8364 No opposition during term of opposition
8327 Change in the person/name/address of the patent owner

Owner name: AZ ELECTRONIC MATERIALS USA CORP. (N.D.GES.D. STAA

8328 Change in the person/name/address of the agent

Representative=s name: PATENTANWAELTE ISENBRUCK BOESL HOERSCHLER WICHMANN HU

8339 Ceased/non-payment of the annual fee