DE69423504D1 - Photopolymerisierbare zusammensetzung - Google Patents

Photopolymerisierbare zusammensetzung

Info

Publication number: DE69423504D1
Authority: DE; Germany
Prior art keywords: photopolymerizable composition; photopolymerizable; composition
Prior art date: 1993-09-28
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.): Expired - Fee Related

Application number

DE69423504T

Other languages

English (en)

Other versions

DE69423504T2 (de

Inventor

Stanley Monk

Andrew Bennett

David Mccullogh

Geoffrey Horne

Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)

Kodak Graphics Holding Inc

Original Assignee

Kodak Graphics Holding Inc

Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)

1993-09-28

Filing date

1994-09-22

Publication date

2000-04-20

1994-09-22 Application filed by Kodak Graphics Holding Inc filed Critical Kodak Graphics Holding Inc

2000-04-20 Publication of DE69423504D1 publication Critical patent/DE69423504D1/de

2000-08-03 Application granted granted Critical

2000-08-03 Publication of DE69423504T2 publication Critical patent/DE69423504T2/de

2014-09-23 Anticipated expiration legal-status Critical

Status Expired - Fee Related legal-status Critical Current

Classifications

- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
- G03F7/031—Organic compounds not covered by group G03F7/029
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
- G03F7/029—Inorganic compounds; Onium compounds; Organic compounds having hetero atoms other than oxygen, nitrogen or sulfur
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
- Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
- Y10S430/1055—Radiation sensitive composition or product or process of making
- Y10S430/106—Binder containing
- Y10S430/107—Polyamide or polyurethane
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
- Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
- Y10S430/1055—Radiation sensitive composition or product or process of making
- Y10S430/106—Binder containing
- Y10S430/112—Cellulosic
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
- Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
- Y10S430/1055—Radiation sensitive composition or product or process of making
- Y10S430/114—Initiator containing
- Y10S430/116—Redox or dye sensitizer
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
- Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
- Y10S430/1055—Radiation sensitive composition or product or process of making
- Y10S430/114—Initiator containing
- Y10S430/12—Nitrogen compound containing
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
- Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
- Y10S430/1055—Radiation sensitive composition or product or process of making
- Y10S430/114—Initiator containing
- Y10S430/124—Carbonyl compound containing
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
- Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
- Y10S430/1055—Radiation sensitive composition or product or process of making
- Y10S430/127—Spectral sensitizer containing
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
- Y10S430/146—Laser beam
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
- Y10S430/148—Light sensitive titanium compound containing

Landscapes

Physics & Mathematics (AREA)
Spectroscopy & Molecular Physics (AREA)
General Physics & Mathematics (AREA)
Chemical & Material Sciences (AREA)
Inorganic Chemistry (AREA)
Photosensitive Polymer And Photoresist Processing (AREA)
Paints Or Removers (AREA)

DE69423504T 1993-09-28 1994-09-22 Photopolymerisierbare zusammensetzung Expired - Fee Related DE69423504T2 (de)

Applications Claiming Priority (2)

Application Number	Priority Date	Filing Date	Title
GB939319961A GB9319961D0 (en)	1993-09-28	1993-09-28	Photopolymerisable composition
PCT/GB1994/002056 WO1995009383A1 (en)	1993-09-28	1994-09-22	Photopolymerisable composition

Publications (2)

Publication Number	Publication Date
DE69423504D1 true DE69423504D1 (de)	2000-04-20
DE69423504T2 DE69423504T2 (de)	2000-08-03

Family

ID=10742627

Family Applications (1)

Application Number	Title	Priority Date	Filing Date
DE69423504T Expired - Fee Related DE69423504T2 (de)	1993-09-28	1994-09-22	Photopolymerisierbare zusammensetzung

Country Status (7)

Country	Link
US (1)	US5976735A (de)
EP (1)	EP0721606B1 (de)
JP (1)	JP3385421B2 (de)
AU (1)	AU7661994A (de)
DE (1)	DE69423504T2 (de)
GB (1)	GB9319961D0 (de)
WO (1)	WO1995009383A1 (de)

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
US5629354A (en) *	1995-02-28	1997-05-13	Eastman Kodak Company	Photopolymerization initiator system comprising a spectral sensitizer and a polycarboxylic acid co-initiator
GB9517315D0 (en) *	1995-08-24	1995-10-25	Horsell Plc	Lithographic plates
JP3770436B2 (ja) *	1997-12-15	2006-04-26	富士写真フイルム株式会社	光重合性組成物
US7507525B2 (en) *	2005-05-10	2009-03-24	Fujifilm Corporation	Polymerizable composition and lithographic printing plate precursor
EP1975706A3 (de) *	2007-03-30	2010-03-03	FUJIFILM Corporation	Lithografiedruckplattenvorläufer
WO2016017927A1 (ko)	2014-07-29	2016-02-04	한온시스템 주식회사	차량용 에어컨시스템
CN107073759B (zh) *	2014-11-04	2019-12-20	蓝宝迪有限公司	可光固化组合物

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
CA1308852C (en) *	1987-01-22	1992-10-13	Masami Kawabata	Photopolymerizable composition
EP0277915B1 (de) *	1987-02-02	1991-09-04	Ciba-Geigy Ag	Photoinitiatorengemische enthaltend ein Titanocen und ein 3-Ketocoumarin
DE4007428A1 (de) *	1990-03-09	1991-09-12	Hoechst Ag	Photopolymerisierbares gemisch und daraus hergestelltes aufzeichnungsmaterial
JPH04184344A (ja) *	1990-11-19	1992-07-01	Toyobo Co Ltd	光重合性組成物
ES2088536T3 (es) *	1991-01-29	1996-08-16	Nat Starch Chem Invest	Composiciones fotopolimerizables.
JPH0651505A (ja) *	1992-07-31	1994-02-25	Nippon Paint Co Ltd	アルカリ現像可能な感光性樹脂組成物

1993
- 1993-09-28 GB GB939319961A patent/GB9319961D0/en active Pending
1994
- 1994-09-22 WO PCT/GB1994/002056 patent/WO1995009383A1/en not_active Ceased
- 1994-09-22 AU AU76619/94A patent/AU7661994A/en not_active Abandoned
- 1994-09-22 EP EP94927005A patent/EP0721606B1/de not_active Expired - Lifetime
- 1994-09-22 DE DE69423504T patent/DE69423504T2/de not_active Expired - Fee Related
- 1994-09-22 JP JP51016495A patent/JP3385421B2/ja not_active Expired - Fee Related
- 1994-09-22 US US08/615,293 patent/US5976735A/en not_active Expired - Fee Related

Also Published As

Publication number	Publication date
US5976735A (en)	1999-11-02
JP3385421B2 (ja)	2003-03-10
GB9319961D0 (en)	1993-11-17
JPH09503871A (ja)	1997-04-15
DE69423504T2 (de)	2000-08-03
WO1995009383A1 (en)	1995-04-06
AU7661994A (en)	1995-04-18
EP0721606A1 (de)	1996-07-17
EP0721606B1 (de)	2000-03-15

Publication	Publication Date	Title
DE69327741D1 (de)	2000-03-09	Photopolymerisierbare Zusammensetzung
DE69222234D1 (de)	1997-10-23	Photopolymerisierbare Zusammensetzung
DE69618854D1 (de)	2002-03-14	Fotopolymerisierbare Zusammensetzung
DE69423670D1 (de)	2000-05-04	Siloxy-aluminoxan-Zusammensetzungen
DE69322946D1 (de)	1999-02-18	Photolackzusammensetzung
FI961720L (fi)	1996-04-19	Uusi koostumus
DE69301999D1 (de)	1996-05-02	Photoresist Zusammensetzung
DE69425786D1 (de)	2000-10-12	Photoresistzusammensetzung
FI931738L (fi)	1993-10-17	Teknisk harts-propenymppolymerkomposition
DE69325158D1 (de)	1999-07-08	Photokromische Zusammensetzung
DE69400062D1 (de)	1996-03-14	Photopolymerisierbare Zusammensetzung
FI932957L (fi)	1993-12-25	Glasfiberfoerstaerkt propenylpolymerkomposition
DE69222987D1 (de)	1997-12-11	Photopolymerisierbare zusammensetzung
DK0565078T3 (da)	1998-10-07	Hærdelig sammensætning
DE69609242D1 (de)	2000-08-17	Fotopolymerisierbare Zusammensetzungen
DE69320397D1 (de)	1998-09-24	Photopolymerisierbare Zusammensetzung
DE69605381D1 (de)	2000-01-05	Fotoresistzusammensetzung
DE69417749D1 (de)	1999-05-12	Nichtklebende zusammensetzung
DE69604601D1 (de)	1999-11-18	Fotopolymerisierbare Zusammensetzung
DE69503738D1 (de)	1998-09-03	Fotopolymerisierbare Zusammensetzung
DE69423858D1 (de)	2000-05-11	Positiv-arbeitende Fotolackzusammensetzung
FI932094A0 (fi)	1993-05-07	Kylningsapparat i kranens vaexel
DE69208580D1 (de)	1996-04-04	Photopolymerisierbare Zusammensetzung
DE69332687T2 (de)	2004-01-15	Photopolymerisierbare zusammensetzung
DE69423504D1 (de)	2000-04-20	Photopolymerisierbare zusammensetzung

Legal Events

Date	Code	Title	Description
2001-04-05	8364	No opposition during term of opposition
2004-07-08	8339	Ceased/non-payment of the annual fee