DE602006012064D1 - Siliziumsprudelbett - Google Patents
SiliziumsprudelbettInfo
- Publication number
- DE602006012064D1 DE602006012064D1 DE602006012064T DE602006012064T DE602006012064D1 DE 602006012064 D1 DE602006012064 D1 DE 602006012064D1 DE 602006012064 T DE602006012064 T DE 602006012064T DE 602006012064 T DE602006012064 T DE 602006012064T DE 602006012064 D1 DE602006012064 D1 DE 602006012064D1
- Authority
- DE
- Germany
- Prior art keywords
- silicon
- sprudel
- bed
- reactors
- polysilicon
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Active
Links
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 title abstract 3
- 229910052710 silicon Inorganic materials 0.000 title abstract 3
- 239000010703 silicon Substances 0.000 title abstract 3
- 238000000354 decomposition reaction Methods 0.000 abstract 1
- 230000008021 deposition Effects 0.000 abstract 1
- 229910021420 polycrystalline silicon Inorganic materials 0.000 abstract 1
- 229920005591 polysilicon Polymers 0.000 abstract 1
- 239000011856 silicon-based particle Substances 0.000 abstract 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B33/00—Silicon; Compounds thereof
- C01B33/02—Silicon
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B33/00—Silicon; Compounds thereof
- C01B33/02—Silicon
- C01B33/021—Preparation
- C01B33/027—Preparation by decomposition or reduction of gaseous or vaporised silicon compounds other than silica or silica-containing material
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J19/00—Chemical, physical or physico-chemical processes in general; Their relevant apparatus
- B01J19/26—Nozzle-type reactors, i.e. the distribution of the initial reactants within the reactor is effected by their introduction or injection through nozzles
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J8/00—Chemical or physical processes in general, conducted in the presence of fluids and solid particles; Apparatus for such processes
- B01J8/18—Chemical or physical processes in general, conducted in the presence of fluids and solid particles; Apparatus for such processes with fluidised particles
- B01J8/1818—Feeding of the fluidising gas
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J8/00—Chemical or physical processes in general, conducted in the presence of fluids and solid particles; Apparatus for such processes
- B01J8/18—Chemical or physical processes in general, conducted in the presence of fluids and solid particles; Apparatus for such processes with fluidised particles
- B01J8/1818—Feeding of the fluidising gas
- B01J8/1827—Feeding of the fluidising gas the fluidising gas being a reactant
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J8/00—Chemical or physical processes in general, conducted in the presence of fluids and solid particles; Apparatus for such processes
- B01J8/18—Chemical or physical processes in general, conducted in the presence of fluids and solid particles; Apparatus for such processes with fluidised particles
- B01J8/1845—Chemical or physical processes in general, conducted in the presence of fluids and solid particles; Apparatus for such processes with fluidised particles with particles moving upwards while fluidised
- B01J8/1854—Chemical or physical processes in general, conducted in the presence of fluids and solid particles; Apparatus for such processes with fluidised particles with particles moving upwards while fluidised followed by a downward movement inside the reactor to form a loop
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J8/00—Chemical or physical processes in general, conducted in the presence of fluids and solid particles; Apparatus for such processes
- B01J8/18—Chemical or physical processes in general, conducted in the presence of fluids and solid particles; Apparatus for such processes with fluidised particles
- B01J8/1845—Chemical or physical processes in general, conducted in the presence of fluids and solid particles; Apparatus for such processes with fluidised particles with particles moving upwards while fluidised
- B01J8/1863—Chemical or physical processes in general, conducted in the presence of fluids and solid particles; Apparatus for such processes with fluidised particles with particles moving upwards while fluidised followed by a downward movement outside the reactor and subsequently re-entering it
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J8/00—Chemical or physical processes in general, conducted in the presence of fluids and solid particles; Apparatus for such processes
- B01J8/18—Chemical or physical processes in general, conducted in the presence of fluids and solid particles; Apparatus for such processes with fluidised particles
- B01J8/24—Chemical or physical processes in general, conducted in the presence of fluids and solid particles; Apparatus for such processes with fluidised particles according to "fluidised-bed" technique
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J8/00—Chemical or physical processes in general, conducted in the presence of fluids and solid particles; Apparatus for such processes
- B01J8/18—Chemical or physical processes in general, conducted in the presence of fluids and solid particles; Apparatus for such processes with fluidised particles
- B01J8/24—Chemical or physical processes in general, conducted in the presence of fluids and solid particles; Apparatus for such processes with fluidised particles according to "fluidised-bed" technique
- B01J8/245—Spouted-bed technique
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J8/00—Chemical or physical processes in general, conducted in the presence of fluids and solid particles; Apparatus for such processes
- B01J8/18—Chemical or physical processes in general, conducted in the presence of fluids and solid particles; Apparatus for such processes with fluidised particles
- B01J8/24—Chemical or physical processes in general, conducted in the presence of fluids and solid particles; Apparatus for such processes with fluidised particles according to "fluidised-bed" technique
- B01J8/26—Chemical or physical processes in general, conducted in the presence of fluids and solid particles; Apparatus for such processes with fluidised particles according to "fluidised-bed" technique with two or more fluidised beds, e.g. reactor and regeneration installations
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J2208/00—Processes carried out in the presence of solid particles; Reactors therefor
- B01J2208/00008—Controlling the process
- B01J2208/00017—Controlling the temperature
- B01J2208/00389—Controlling the temperature using electric heating or cooling elements
- B01J2208/00407—Controlling the temperature using electric heating or cooling elements outside the reactor bed
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J2208/00—Processes carried out in the presence of solid particles; Reactors therefor
- B01J2208/00008—Controlling the process
- B01J2208/00017—Controlling the temperature
- B01J2208/00389—Controlling the temperature using electric heating or cooling elements
- B01J2208/00415—Controlling the temperature using electric heating or cooling elements electric resistance heaters
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J2219/00—Chemical, physical or physico-chemical processes in general; Their relevant apparatus
- B01J2219/00002—Chemical plants
- B01J2219/00027—Process aspects
- B01J2219/00038—Processes in parallel
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J2219/00—Chemical, physical or physico-chemical processes in general; Their relevant apparatus
- B01J2219/00049—Controlling or regulating processes
- B01J2219/00051—Controlling the temperature
- B01J2219/00074—Controlling the temperature by indirect heating or cooling employing heat exchange fluids
- B01J2219/00119—Heat exchange inside a feeding nozzle or nozzle reactor
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J2219/00—Chemical, physical or physico-chemical processes in general; Their relevant apparatus
- B01J2219/18—Details relating to the spatial orientation of the reactor
- B01J2219/185—Details relating to the spatial orientation of the reactor vertical
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J2219/00—Chemical, physical or physico-chemical processes in general; Their relevant apparatus
- B01J2219/19—Details relating to the geometry of the reactor
- B01J2219/192—Details relating to the geometry of the reactor polygonal
- B01J2219/1923—Details relating to the geometry of the reactor polygonal square or square-derived
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Combustion & Propulsion (AREA)
- Inorganic Chemistry (AREA)
- Silicon Compounds (AREA)
- Devices And Processes Conducted In The Presence Of Fluids And Solid Particles (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US70096405P | 2005-07-19 | 2005-07-19 | |
| PCT/US2006/028112 WO2007012027A2 (en) | 2005-07-19 | 2006-07-19 | Silicon spout-fluidized bed |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| DE602006012064D1 true DE602006012064D1 (de) | 2010-03-18 |
Family
ID=37529310
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| DE602006012064T Active DE602006012064D1 (de) | 2005-07-19 | 2006-07-19 | Siliziumsprudelbett |
Country Status (10)
| Country | Link |
|---|---|
| US (1) | US20080220166A1 (de) |
| EP (1) | EP1924349B1 (de) |
| JP (1) | JP5086256B2 (de) |
| KR (1) | KR101363911B1 (de) |
| CN (1) | CN101316651B (de) |
| AT (1) | ATE456395T1 (de) |
| DE (1) | DE602006012064D1 (de) |
| NO (1) | NO20080729L (de) |
| TW (1) | TWI465600B (de) |
| WO (1) | WO2007012027A2 (de) |
Families Citing this family (30)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP5435188B2 (ja) * | 2006-11-14 | 2014-03-05 | 三菱マテリアル株式会社 | 多結晶シリコンの製造方法および多結晶シリコン製造設備 |
| SG192438A1 (en) | 2008-06-30 | 2013-08-30 | Memc Electronic Materials | Fluidized bed reactor systems and methods for reducing the deposition of silicon on reactor walls |
| FR2937053B1 (fr) * | 2008-10-09 | 2010-12-17 | Commissariat Energie Atomique | Dispositif pour la synthese de nanoparticules par depot chimique en phase vapeur en lit fluidise |
| US8168123B2 (en) * | 2009-02-26 | 2012-05-01 | Siliken Chemicals, S.L. | Fluidized bed reactor for production of high purity silicon |
| KR20120005522A (ko) | 2009-04-20 | 2012-01-16 | 에이이 폴리실리콘 코포레이션 | 규화물 코팅된 금속 표면을 갖는 반응기 |
| EP2421640A1 (de) | 2009-04-20 | 2012-02-29 | Ae Polysilicon Corporation | Verfahren und system zur kühlung eines reaktionsklärgases |
| CN102713001B (zh) * | 2009-11-18 | 2014-03-05 | 瑞科硅公司 | 流化床反应器 |
| CN102686307A (zh) | 2009-12-29 | 2012-09-19 | Memc电子材料有限公司 | 使用外围四氯化硅减少硅在反应器壁上的沉积的方法 |
| EP2547624A4 (de) * | 2010-03-19 | 2014-05-07 | Gtat Corp | System und verfahren zur ablagerung von polykristallinem silizium |
| KR101329030B1 (ko) | 2010-10-01 | 2013-11-13 | 주식회사 실리콘밸류 | 유동층 반응기 |
| CN102205222A (zh) * | 2011-03-25 | 2011-10-05 | 浙江合盛硅业有限公司 | 制取多晶硅的流化床反应装置 |
| KR101329032B1 (ko) * | 2011-04-20 | 2013-11-14 | 주식회사 실리콘밸류 | 다결정 실리콘 제조장치 및 이를 이용한 다결정 실리콘의 제조방법 |
| KR101329035B1 (ko) * | 2011-04-20 | 2013-11-13 | 주식회사 실리콘밸류 | 유동층 반응기 |
| TW201304864A (zh) * | 2011-06-10 | 2013-02-01 | Rec Silicon Inc | 高純度矽塗佈顆粒之製造 |
| FR2977259B1 (fr) * | 2011-06-28 | 2013-08-02 | Commissariat Energie Atomique | Dispositif a profil specifique de reacteur de type lit a jet pour depot par cvd |
| US8875728B2 (en) | 2012-07-12 | 2014-11-04 | Siliken Chemicals, S.L. | Cooled gas distribution plate, thermal bridge breaking system, and related methods |
| JP6272867B2 (ja) * | 2012-08-29 | 2018-01-31 | ヘムロック・セミコンダクター・オペレーションズ・エルエルシー | 先細り流動床反応器及びその使用のためのプロセス |
| US9587993B2 (en) | 2012-11-06 | 2017-03-07 | Rec Silicon Inc | Probe assembly for a fluid bed reactor |
| US9212421B2 (en) | 2013-07-10 | 2015-12-15 | Rec Silicon Inc | Method and apparatus to reduce contamination of particles in a fluidized bed reactor |
| US20140312030A1 (en) * | 2013-04-23 | 2014-10-23 | Paul D. Steneck | Microwave heat treatment apparatus and method |
| DE102013208274A1 (de) | 2013-05-06 | 2014-11-20 | Wacker Chemie Ag | Wirbelschichtreaktor und Verfahren zur Herstellung von granularem Polysilicium |
| US9238211B1 (en) | 2014-08-15 | 2016-01-19 | Rec Silicon Inc | Segmented silicon carbide liner |
| US9446367B2 (en) | 2014-08-15 | 2016-09-20 | Rec Silicon Inc | Joint design for segmented silicon carbide liner in a fluidized bed reactor |
| US9662628B2 (en) | 2014-08-15 | 2017-05-30 | Rec Silicon Inc | Non-contaminating bonding material for segmented silicon carbide liner in a fluidized bed reactor |
| EP3278872B1 (de) * | 2015-04-01 | 2021-07-07 | Hanwha Chemical Corporation | Verfahren zur herstellung von polysilicium-granulat mit eineem fliessbettreaktorsystem |
| CN105568254B (zh) * | 2016-02-24 | 2018-10-30 | 清华大学 | 一种用于流化床化学气相沉积反应器的气体入口设备 |
| KR102096577B1 (ko) * | 2016-12-29 | 2020-04-02 | 한화솔루션 주식회사 | 폴리실리콘 제조 장치 |
| EP3672910B1 (de) * | 2017-08-23 | 2021-07-21 | Wacker Chemie AG | Wirbelschichtreaktor zur herstellung von polykristallinem siliciumgranulat |
| RU183578U1 (ru) * | 2017-12-06 | 2018-09-26 | федеральное государственное бюджетное образовательное учреждение высшего образования "Иркутский национальный исследовательский технический университет" (ФГБОУ ВО "ИРНИТУ") | Электрическая печь для обжига сыпучих материалов |
| CA3218306A1 (en) * | 2021-05-17 | 2022-11-24 | George SKOPTSOV | Microwave assisted fluidized bed reactor |
Family Cites Families (30)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3977896A (en) * | 1972-03-09 | 1976-08-31 | General Atomic Company | Process for depositing pyrolytic carbon coatings |
| US4207360A (en) * | 1975-10-31 | 1980-06-10 | Texas Instruments Incorporated | Silicon seed production process |
| DE2626446C3 (de) * | 1976-06-12 | 1978-12-14 | Hobeg Hochtemperaturreaktor-Brennelement Gmbh, 6450 Hanau | Verfahren zur Beschichtung von Teilchen für die Herstellung von Brenn- und/oder Absorberelementen für Kernreaktoren und Vorrichtung dazu |
| US4080927A (en) * | 1976-10-06 | 1978-03-28 | General Atomic Company | Fluidized bed-gas coater apparatus |
| US4116160A (en) * | 1976-10-26 | 1978-09-26 | General Atomic Company | Fluidized bed, gas coating apparatus |
| US4221182A (en) * | 1976-10-06 | 1980-09-09 | General Atomic Company | Fluidized bed gas coating apparatus |
| JPS6051601B2 (ja) * | 1978-06-19 | 1985-11-14 | バブコツク日立株式会社 | 流動層炉起動バ−ナ装置 |
| DE2846160A1 (de) * | 1978-10-24 | 1980-05-08 | Kernforschungsanlage Juelich | Wirbelschichtreaktor mit offenem reaktionsgaszutritt und verfahren zur laminar-durchflussteigerung |
| JPS57135708A (en) * | 1981-02-12 | 1982-08-21 | Shin Etsu Chem Co Ltd | Manufacturing of high purity silicon granule |
| JPS57145021A (en) * | 1981-02-27 | 1982-09-07 | Shin Etsu Chem Co Ltd | Preparation of silicon granule |
| US4424199A (en) * | 1981-12-11 | 1984-01-03 | Union Carbide Corporation | Fluid jet seed particle generator for silane pyrolysis reactor |
| US4416913A (en) * | 1982-09-28 | 1983-11-22 | Motorola, Inc. | Ascending differential silicon harvesting means and method |
| US4546012A (en) * | 1984-04-26 | 1985-10-08 | Carbomedics, Inc. | Level control for a fluidized bed |
| JPS6316040A (ja) * | 1986-03-28 | 1988-01-23 | Kawasaki Heavy Ind Ltd | 粉粒体の熱処理方法 |
| JPS6465010A (en) * | 1987-09-04 | 1989-03-10 | Osaka Titanium | Device for producing high-purity granular metallic silicon |
| US5326547A (en) * | 1988-10-11 | 1994-07-05 | Albemarle Corporation | Process for preparing polysilicon with diminished hydrogen content by using a two-step heating process |
| US5284676A (en) * | 1990-08-17 | 1994-02-08 | Carbon Implants, Inc. | Pyrolytic deposition in a fluidized bed |
| US5175942A (en) * | 1991-07-19 | 1993-01-05 | Gte Products Corporation | Method for fluidized bed discharge |
| GB2271518B (en) * | 1992-10-16 | 1996-09-25 | Korea Res Inst Chem Tech | Heating of fluidized bed reactor by microwave |
| US5328713A (en) * | 1993-03-16 | 1994-07-12 | Carbon Implants, Inc. | Precise regulation of fluidized bed weight in pyrolytically coating substrates |
| US5798137A (en) * | 1995-06-07 | 1998-08-25 | Advanced Silicon Materials, Inc. | Method for silicon deposition |
| JPH119985A (ja) * | 1997-06-19 | 1999-01-19 | Ube Ind Ltd | 流動層粉体被覆装置及び被覆肥料の製造方法 |
| DE19735378A1 (de) * | 1997-08-14 | 1999-02-18 | Wacker Chemie Gmbh | Verfahren zur Herstellung von hochreinem Siliciumgranulat |
| US6410087B1 (en) * | 1999-11-01 | 2002-06-25 | Medical Carbon Research Institute, Llc | Deposition of pyrocarbon |
| WO2001061070A1 (en) * | 2000-02-18 | 2001-08-23 | G.T. Equipment Technologies Inc. | Method and apparatus for chemical vapor deposition of polysilicon |
| US6733826B2 (en) * | 2000-12-18 | 2004-05-11 | Osram Sylvania Inc. | Method and apparatus for coating electroluminescent phosphors |
| DE10124848A1 (de) * | 2001-05-22 | 2002-11-28 | Solarworld Ag | Verfahren zur Herstellung von hochreinem, granularem Silizium in einer Wirbelschicht |
| AU2002329626A1 (en) * | 2002-07-22 | 2004-02-23 | Stephen M. Lord | Methods for heating a fluidized bed silicon manufacture apparatus |
| US20080035056A1 (en) * | 2004-04-21 | 2008-02-14 | Kazutoshi Okubo | Apparatus For Manufacturing Coated Fuel Particles For High-Temperature Gas-Cooled Reactor |
| DE102005042753A1 (de) * | 2005-09-08 | 2007-03-15 | Wacker Chemie Ag | Verfahren und Vorrichtung zur Herstellung von granulatförmigem polykristallinem Silicium in einem Wirbelschichtreaktor |
-
2006
- 2006-07-19 TW TW095126373A patent/TWI465600B/zh active
- 2006-07-19 DE DE602006012064T patent/DE602006012064D1/de active Active
- 2006-07-19 EP EP06787918A patent/EP1924349B1/de not_active Not-in-force
- 2006-07-19 WO PCT/US2006/028112 patent/WO2007012027A2/en not_active Ceased
- 2006-07-19 AT AT06787918T patent/ATE456395T1/de not_active IP Right Cessation
- 2006-07-19 KR KR1020087003875A patent/KR101363911B1/ko not_active Expired - Fee Related
- 2006-07-19 CN CN2006800265133A patent/CN101316651B/zh active Active
- 2006-07-19 JP JP2008522948A patent/JP5086256B2/ja not_active Expired - Fee Related
- 2006-07-19 US US11/996,285 patent/US20080220166A1/en not_active Abandoned
-
2008
- 2008-02-08 NO NO20080729A patent/NO20080729L/no not_active Application Discontinuation
Also Published As
| Publication number | Publication date |
|---|---|
| WO2007012027A2 (en) | 2007-01-25 |
| EP1924349B1 (de) | 2010-01-27 |
| CN101316651B (zh) | 2011-03-02 |
| JP2009502704A (ja) | 2009-01-29 |
| NO20080729L (no) | 2008-04-17 |
| EP1924349A2 (de) | 2008-05-28 |
| KR101363911B1 (ko) | 2014-02-21 |
| TWI465600B (zh) | 2014-12-21 |
| TW200710263A (en) | 2007-03-16 |
| JP5086256B2 (ja) | 2012-11-28 |
| WO2007012027A3 (en) | 2008-06-05 |
| KR20080039911A (ko) | 2008-05-07 |
| US20080220166A1 (en) | 2008-09-11 |
| CN101316651A (zh) | 2008-12-03 |
| ATE456395T1 (de) | 2010-02-15 |
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