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DE60116858D1 - Zusammensetzung - Google Patents

Zusammensetzung

Info

Publication number
DE60116858D1
DE60116858D1 DE60116858T DE60116858T DE60116858D1 DE 60116858 D1 DE60116858 D1 DE 60116858D1 DE 60116858 T DE60116858 T DE 60116858T DE 60116858 T DE60116858 T DE 60116858T DE 60116858 D1 DE60116858 D1 DE 60116858D1
Authority
DE
Germany
Prior art keywords
composition
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE60116858T
Other languages
English (en)
Other versions
DE60116858T2 (de
Inventor
Eiichi Okazaki
Michihiro Kaai
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toagosei Co Ltd
Original Assignee
Toagosei Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toagosei Co Ltd filed Critical Toagosei Co Ltd
Application granted granted Critical
Publication of DE60116858D1 publication Critical patent/DE60116858D1/de
Publication of DE60116858T2 publication Critical patent/DE60116858T2/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F222/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a carboxyl radical and containing at least one other carboxyl radical in the molecule; Salts, anhydrides, esters, amides, imides, or nitriles thereof
    • C08F222/36—Amides or imides
    • C08F222/40—Imides, e.g. cyclic imides
    • C08F222/404—Imides, e.g. cyclic imides substituted imides comprising oxygen other than the carboxy oxygen
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F22/00—Homopolymers and copolymers of compounds having one or more unsaturated aliphatic radicals each having only one carbon-to-carbon double bond, and at least one being terminated by a carboxyl radical and containing at least one other carboxyl radical in the molecule; Salts, anhydrides, esters, amides, imides or nitriles thereof
    • C08F22/36—Amides or imides
    • C08F22/40—Imides, e.g. cyclic imides
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F20/00—Homopolymers and copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride, ester, amide, imide or nitrile thereof
    • C08F20/02—Monocarboxylic acids having less than ten carbon atoms, Derivatives thereof
    • C08F20/10—Esters
    • C08F20/34—Esters containing nitrogen, e.g. N,N-dimethylaminoethyl (meth)acrylate
    • C08F20/36—Esters containing nitrogen, e.g. N,N-dimethylaminoethyl (meth)acrylate containing oxygen in addition to the carboxy oxygen, e.g. 2-N-morpholinoethyl (meth)acrylate or 2-isocyanatoethyl (meth)acrylate
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F220/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride ester, amide, imide or nitrile thereof
    • C08F220/02—Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
    • C08F220/10—Esters
    • C08F220/12—Esters of monohydric alcohols or phenols
    • C08F220/14—Methyl esters, e.g. methyl (meth)acrylate
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F220/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride ester, amide, imide or nitrile thereof
    • C08F220/02—Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
    • C08F220/10—Esters
    • C08F220/12—Esters of monohydric alcohols or phenols
    • C08F220/16—Esters of monohydric alcohols or phenols of phenols or of alcohols containing two or more carbon atoms
    • C08F220/18—Esters of monohydric alcohols or phenols of phenols or of alcohols containing two or more carbon atoms with acrylic or methacrylic acids
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D135/00—Coating compositions based on homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a carboxyl radical, and containing at least another carboxyl radical in the molecule, or of salts, anhydrides, esters, amides, imides or nitriles thereof; Coating compositions based on derivatives of such polymers

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Wood Science & Technology (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Paints Or Removers (AREA)
  • Macromonomer-Based Addition Polymer (AREA)
DE60116858T 2000-03-29 2001-03-12 Zusammensetzung Expired - Lifetime DE60116858T2 (de)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2000092489 2000-03-29
JP2000092489A JP4505933B2 (ja) 2000-03-29 2000-03-29 組成物
PCT/JP2001/001905 WO2001072858A1 (fr) 2000-03-29 2001-03-12 Composition

Publications (2)

Publication Number Publication Date
DE60116858D1 true DE60116858D1 (de) 2006-04-13
DE60116858T2 DE60116858T2 (de) 2006-08-10

Family

ID=18607816

Family Applications (1)

Application Number Title Priority Date Filing Date
DE60116858T Expired - Lifetime DE60116858T2 (de) 2000-03-29 2001-03-12 Zusammensetzung

Country Status (9)

Country Link
US (1) US6730763B1 (de)
EP (1) EP1270611B1 (de)
JP (1) JP4505933B2 (de)
KR (1) KR100791917B1 (de)
CN (1) CN1325522C (de)
AU (1) AU2001241098A1 (de)
DE (1) DE60116858T2 (de)
TW (1) TWI282348B (de)
WO (1) WO2001072858A1 (de)

Families Citing this family (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7399574B2 (en) * 2001-09-28 2008-07-15 Dai Nippon Printing Co., Ltd. Curable resin for photo-patterning, process for producing the same, curable resin composition, color filter, liquid crystal panel substrate, and liquid crystal panel
KR100447935B1 (ko) * 2001-11-15 2004-09-08 한솔제지주식회사 수성 ｏｐｖ 코팅 조성물
US7537810B2 (en) * 2003-03-24 2009-05-26 Dai Nippon Printing Co., Ltd. Curable resin composition, photosensitive pattern-forming curable resin composition, color filter, substrate for liquid crystalline panel, and liquid crystalline panel
US8513375B2 (en) * 2003-05-05 2013-08-20 Designer Molecules, Inc. Imide-linked maleimide and polymaleimide compounds
WO2010019832A2 (en) 2008-08-13 2010-02-18 Designer Molecules, Inc. Amide-extended crosslinking compounds and methods for use thereof
KR20070067645A (ko) * 2003-08-22 2007-06-28 사토머 테크놀로지 컴퍼니, 인코포레이티드 Ｕｖ 계의 고온 안정화
US7030201B2 (en) * 2003-11-26 2006-04-18 Az Electronic Materials Usa Corp. Bottom antireflective coatings
US8043534B2 (en) * 2005-10-21 2011-10-25 Designer Molecules, Inc. Maleimide compositions and methods for use thereof
JP5251503B2 (ja) * 2006-02-17 2013-07-31 東洋インキＳｃホールディングス株式会社 活性エネルギー線硬化型インクジェットインキ組成物
JP4702204B2 (ja) * 2006-06-30 2011-06-15 東洋インキＳｃホールディングス株式会社 活性エネルギー線硬化型組成物
JP5477299B2 (ja) * 2008-12-12 2014-04-23 東亞合成株式会社 マレイミド基で表面修飾した無機酸化物微粒子を含む硬化型組成物
FR2951110B1 (fr) * 2009-10-14 2011-11-25 Herve Hollard Procede de decoration ou de marquage sur matiere plastique et metal avec des pigments a effets speciaux
JP5615600B2 (ja) * 2010-06-09 2014-10-29 富士フイルム株式会社 インクジェット記録用インク組成物、インクジェット記録方法及びインクジェット印画物
CN107400448A (zh) * 2017-08-30 2017-11-28 合肥敏喆信息科技有限公司 一种风力发电机叶片用涂料及其制备方法

Family Cites Families (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE3069448D1 (en) 1979-05-18 1984-11-22 Ciba Geigy Ag Photocrosslinkable copolymers, photosensitive recording material containing them, its utilisation in the production of photographic pictures and process for the production of photographic pictures
JPH0233041B2 (de) 1982-01-21 1990-07-25 Johnson & Son Inc S C
US4529787A (en) 1982-06-15 1985-07-16 S. C. Johnson & Son, Inc. Bulk polymerization process for preparing high solids and uniform copolymers
US4546160A (en) 1984-02-29 1985-10-08 S. C. Johnson & Son, Inc. Bulk polymerization process for preparing high solids and uniform copolymers
JPS62205108A (ja) 1986-03-03 1987-09-09 Hitachi Chem Co Ltd ビニル重合体の製造方法
DE3809418A1 (de) * 1988-03-21 1989-10-12 Henkel Kgaa Copolymere von langkettigen alkylacrylaten mit n-haltigen olefinen, verfahren zu ihrer herstellung und ihre verwendung als fliessverbesserer fuer rohoele
DE3828876A1 (de) 1988-08-25 1990-03-08 Henkel Kgaa Verwendung von copolymeren von langkettigen alkylacrylaten mit n-haltigen olefinen als verlaufmittel fuer pulverlacke
JP2667550B2 (ja) * 1989-05-30 1997-10-27 旭化成工業株式会社 熱可塑性共重合体の製造方法
US5200462A (en) 1991-01-25 1993-04-06 Eastman Kodak Company Succinimide containing polymers and lattices prepared from same
FR2735480B1 (fr) 1995-06-15 1997-07-18 Atochem Elf Sa Procede de polymerisation anionique en continu d'au moins un monomere (meth)acrylique pour l'obtention de polymeres a haut taux de solide
PT1704878E (pt) * 1995-12-18 2013-07-17 Angiodevice Internat Gmbh Composições de polímeros reticulados e métodos para a sua utilização
WO1998012274A1 (en) * 1996-09-23 1998-03-26 Chandrashekar Pathak Methods and devices for preparing protein concentrates
US6329443B1 (en) 1997-06-20 2001-12-11 Toagosei Co, Ltd. Acrylates and actinic radiation-curable compositions containing them
US6388026B1 (en) * 1997-08-05 2002-05-14 S. C. Johnson Commercial Markets, Inc. Process for the preparation of macromers
JPH11198552A (ja) 1998-01-20 1999-07-27 Oji Paper Co Ltd 熱転写記録用受像シート
ES2221395T3 (es) * 1998-07-10 2004-12-16 Johnson Polymer, Llc. Procedimiento para producir polimeros mediante reaccion de condensacion y polimerizacion por radicales libres, y aparatos y productos relacionados.

Also Published As

Publication number Publication date
AU2001241098A1 (en) 2001-10-08
KR20020086700A (ko) 2002-11-18
EP1270611A1 (de) 2003-01-02
WO2001072858A1 (fr) 2001-10-04
CN1422288A (zh) 2003-06-04
KR100791917B1 (ko) 2008-01-04
DE60116858T2 (de) 2006-08-10
CN1325522C (zh) 2007-07-11
EP1270611B1 (de) 2006-01-25
US6730763B1 (en) 2004-05-04
EP1270611A4 (de) 2004-09-08
JP4505933B2 (ja) 2010-07-21
JP2001278917A (ja) 2001-10-10
TWI282348B (en) 2007-06-11

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