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DE60028172D1 - Beleuchtungsvorrichtung - Google Patents

Beleuchtungsvorrichtung

Info

Publication number
DE60028172D1
DE60028172D1 DE60028172T DE60028172T DE60028172D1 DE 60028172 D1 DE60028172 D1 DE 60028172D1 DE 60028172 T DE60028172 T DE 60028172T DE 60028172 T DE60028172 T DE 60028172T DE 60028172 D1 DE60028172 D1 DE 60028172D1
Authority
DE
Germany
Prior art keywords
lighting device
lighting
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE60028172T
Other languages
English (en)
Other versions
DE60028172T2 (de
Inventor
Markus Eurlings
Jan Jaap Krikke
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
ASML Netherlands BV
Original Assignee
ASML Netherlands BV
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by ASML Netherlands BV filed Critical ASML Netherlands BV
Application granted granted Critical
Publication of DE60028172D1 publication Critical patent/DE60028172D1/de
Publication of DE60028172T2 publication Critical patent/DE60028172T2/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/027—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/70091—Illumination settings, i.e. intensity distribution in the pupil plane or angular distribution in the field plane; On-axis or off-axis settings, e.g. annular, dipole or quadrupole settings; Partial coherence control, i.e. sigma or numerical aperture [NA]
    • G03F7/70108—Off-axis setting using a light-guiding element, e.g. diffractive optical elements [DOEs] or light guides

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Microscoopes, Condenser (AREA)
  • Diffracting Gratings Or Hologram Optical Elements (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
DE60028172T 1999-12-13 2000-12-11 Beleuchtungsvorrichtung Expired - Fee Related DE60028172T2 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
EP99310026 1999-12-13
EP99310026 1999-12-13

Publications (2)

Publication Number Publication Date
DE60028172D1 true DE60028172D1 (de) 2006-06-29
DE60028172T2 DE60028172T2 (de) 2007-03-15

Family

ID=8241809

Family Applications (1)

Application Number Title Priority Date Filing Date
DE60028172T Expired - Fee Related DE60028172T2 (de) 1999-12-13 2000-12-11 Beleuchtungsvorrichtung

Country Status (5)

Country Link
US (1) US6833907B2 (de)
JP (1) JP3877517B2 (de)
KR (1) KR100566776B1 (de)
DE (1) DE60028172T2 (de)
TW (1) TW546550B (de)

Families Citing this family (20)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6813003B2 (en) * 2002-06-11 2004-11-02 Mark Oskotsky Advanced illumination system for use in microlithography
EP3226073A3 (de) * 2003-04-09 2017-10-11 Nikon Corporation Belichtungsverfahren und -vorrichtung sowie verfahren zur herstellung der vorrichtung
JP5021207B2 (ja) 2003-10-29 2012-09-05 カール・ツァイス・エスエムティー・ゲーエムベーハー フォトリソグラフィにおける光学アセンブリ
TWI512335B (zh) 2003-11-20 2015-12-11 尼康股份有限公司 光束變換元件、光學照明裝置、曝光裝置、以及曝光方法
TWI511182B (zh) 2004-02-06 2015-12-01 尼康股份有限公司 光學照明裝置、曝光裝置、曝光方法以及元件製造方法
JP4639120B2 (ja) * 2004-07-13 2011-02-23 エーエスエムエル ネザーランズ ビー．ブイ． マスク・パターンの光転送を最適化するための方法、リソグラフィ投影装置、および機械可読媒体
KR100700641B1 (ko) * 2004-12-03 2007-03-27 삼성에스디아이 주식회사 레이저 조사 장치, 패터닝 방법 및 그를 이용한 레이저열전사 패터닝 방법과 이를 이용한 유기 전계 발광 소자의제조 방법
US7349068B2 (en) * 2004-12-17 2008-03-25 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US20060176460A1 (en) * 2005-02-10 2006-08-10 Nikon Corporation Lithographic optical systems including exchangeable optical-element sets
US7317506B2 (en) * 2005-03-29 2008-01-08 Asml Netherlands B.V. Variable illumination source
US7548302B2 (en) * 2005-03-29 2009-06-16 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US7965373B2 (en) 2005-06-28 2011-06-21 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method utilizing a datapath having a balanced calculation load
US20070139630A1 (en) * 2005-12-19 2007-06-21 Nikon Precision, Inc. Changeable Slit to Control Uniformity of Illumination
JP2007240253A (ja) * 2006-03-07 2007-09-20 Toshiba Corp 亀裂検出装置および亀裂検出方法
JP4957058B2 (ja) * 2006-04-12 2012-06-20 大日本印刷株式会社 回折光学素子、および該素子を備えた露光装置
JP2008091881A (ja) * 2006-09-07 2008-04-17 Canon Inc 回折光学素子、露光装置およびデバイス製造方法
US20080285000A1 (en) * 2007-05-17 2008-11-20 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
WO2011012148A1 (en) 2009-07-31 2011-02-03 Carl Zeiss Smt Gmbh Optical beam deflecting element and method of adjustment
JP5611443B2 (ja) * 2010-12-28 2014-10-22 カール・ツァイス・エスエムティー・ゲーエムベーハー マイクロリソグラフィ投影露光装置の照明系
WO2014073299A1 (ja) * 2012-11-12 2014-05-15 シャープ株式会社 フレネルレンズおよびその製造方法、ならびに、センシングデバイス

Family Cites Families (23)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3729252A (en) 1970-06-05 1973-04-24 Eastman Kodak Co Optical spatial filtering with multiple light sources
JPS5144660B2 (de) 1971-10-18 1976-11-30
US4547037A (en) 1980-10-16 1985-10-15 Regents Of The University Of Minnesota Holographic method for producing desired wavefront transformations
US4444456A (en) 1982-06-23 1984-04-24 International Business Machines Corporation Holographic method and apparatus for transformation of a light beam into a line source of required curvature and finite numerical aperture
US4450358A (en) 1982-09-22 1984-05-22 Honeywell Inc. Optical lithographic system
US7656504B1 (en) 1990-08-21 2010-02-02 Nikon Corporation Projection exposure apparatus with luminous flux distribution
US5638211A (en) 1990-08-21 1997-06-10 Nikon Corporation Method and apparatus for increasing the resolution power of projection lithography exposure system
DE69132120T2 (de) 1990-11-15 2000-09-21 Nikon Corp., Tokio/Tokyo Verfahren und Vorrichtung zur Projektionsbelichtung
US6252647B1 (en) 1990-11-15 2001-06-26 Nikon Corporation Projection exposure apparatus
US5264898A (en) 1991-08-29 1993-11-23 Mitsubishi Denki Kabushiki Kaisha Projection exposure apparatus
JP3209218B2 (ja) 1991-12-27 2001-09-17 株式会社ニコン 投影露光装置及び方法、並びに素子製造方法
US6304317B1 (en) 1993-07-15 2001-10-16 Nikon Corporation Projection apparatus and method
US6285443B1 (en) * 1993-12-13 2001-09-04 Carl-Zeiss-Stiftung Illuminating arrangement for a projection microlithographic apparatus
US5850300A (en) 1994-02-28 1998-12-15 Digital Optics Corporation Diffractive beam homogenizer having free-form fringes
EP0687956B2 (de) 1994-06-17 2005-11-23 Carl Zeiss SMT AG Beleuchtungseinrichtung
US6259513B1 (en) * 1996-11-25 2001-07-10 Svg Lithography Systems, Inc. Illumination system with spatially controllable partial coherence
JP4310816B2 (ja) 1997-03-14 2009-08-12 株式会社ニコン 照明装置、投影露光装置、デバイスの製造方法、及び投影露光装置の調整方法
JP3264224B2 (ja) * 1997-08-04 2002-03-11 キヤノン株式会社 照明装置及びそれを用いた投影露光装置
EP0949541B1 (de) 1998-04-08 2006-06-07 ASML Netherlands B.V. Lithographischer Apparat
DE69931690T2 (de) * 1998-04-08 2007-06-14 Asml Netherlands B.V. Lithographischer Apparat
US6563567B1 (en) * 1998-12-17 2003-05-13 Nikon Corporation Method and apparatus for illuminating a surface using a projection imaging apparatus
US6392742B1 (en) * 1999-06-01 2002-05-21 Canon Kabushiki Kaisha Illumination system and projection exposure apparatus
US6403285B1 (en) 1999-12-17 2002-06-11 Micron Technology, Inc. Method for exposing semiconductor wafers in a manner that promotes radial processing uniformity

Also Published As

Publication number Publication date
US20030214643A1 (en) 2003-11-20
DE60028172T2 (de) 2007-03-15
US6833907B2 (en) 2004-12-21
JP3877517B2 (ja) 2007-02-07
JP2001217188A (ja) 2001-08-10
KR100566776B1 (ko) 2006-04-03
TW546550B (en) 2003-08-11
KR20010062358A (ko) 2001-07-07

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8339 Ceased/non-payment of the annual fee