DE2841039A1 - Halogenation and/or redn. of metals, semi-metals or their cpds. - by heating the initial materials, esp. oxide(s) with tri:chloro: fluoromethane - Google Patents
Halogenation and/or redn. of metals, semi-metals or their cpds. - by heating the initial materials, esp. oxide(s) with tri:chloro: fluoromethaneInfo
- Publication number
- DE2841039A1 DE2841039A1 DE19782841039 DE2841039A DE2841039A1 DE 2841039 A1 DE2841039 A1 DE 2841039A1 DE 19782841039 DE19782841039 DE 19782841039 DE 2841039 A DE2841039 A DE 2841039A DE 2841039 A1 DE2841039 A1 DE 2841039A1
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- Prior art keywords
- metals
- halogenation
- metal
- semi
- pure
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- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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- 229910052751 metal Inorganic materials 0.000 title claims abstract description 49
- 239000002184 metal Substances 0.000 title claims abstract description 49
- 150000002739 metals Chemical class 0.000 title claims abstract description 26
- 230000026030 halogenation Effects 0.000 title claims abstract description 14
- 238000005658 halogenation reaction Methods 0.000 title claims abstract description 14
- 239000000463 material Substances 0.000 title abstract description 4
- NBVXSUQYWXRMNV-UHFFFAOYSA-N fluoromethane Chemical compound FC NBVXSUQYWXRMNV-UHFFFAOYSA-N 0.000 title 2
- 125000001309 chloro group Chemical group Cl* 0.000 title 1
- 238000010438 heat treatment Methods 0.000 title 1
- 238000000034 method Methods 0.000 claims abstract description 38
- 238000006243 chemical reaction Methods 0.000 claims abstract description 14
- CYRMSUTZVYGINF-UHFFFAOYSA-N trichlorofluoromethane Chemical compound FC(Cl)(Cl)Cl CYRMSUTZVYGINF-UHFFFAOYSA-N 0.000 claims abstract description 11
- OTMSDBZUPAUEDD-UHFFFAOYSA-N Ethane Chemical compound CC OTMSDBZUPAUEDD-UHFFFAOYSA-N 0.000 claims abstract description 3
- VNWKTOKETHGBQD-UHFFFAOYSA-N methane Chemical compound C VNWKTOKETHGBQD-UHFFFAOYSA-N 0.000 claims abstract 3
- 230000009467 reduction Effects 0.000 claims description 15
- 150000008280 chlorinated hydrocarbons Chemical class 0.000 claims description 12
- 150000001875 compounds Chemical class 0.000 claims description 9
- 230000002140 halogenating effect Effects 0.000 claims description 8
- 229940029284 trichlorofluoromethane Drugs 0.000 claims description 8
- 239000003638 chemical reducing agent Substances 0.000 claims description 7
- 238000004519 manufacturing process Methods 0.000 claims description 6
- 238000000354 decomposition reaction Methods 0.000 claims description 4
- 239000000203 mixture Substances 0.000 claims description 4
- 239000007858 starting material Substances 0.000 claims description 3
- 239000000126 substance Substances 0.000 claims description 3
- 238000006722 reduction reaction Methods 0.000 claims 4
- HXELGNKCCDGMMN-UHFFFAOYSA-N [F].[Cl] Chemical class [F].[Cl] HXELGNKCCDGMMN-UHFFFAOYSA-N 0.000 claims 1
- 229910052799 carbon Inorganic materials 0.000 abstract description 4
- 229910052782 aluminium Inorganic materials 0.000 abstract description 3
- 229910002091 carbon monoxide Inorganic materials 0.000 abstract description 3
- 229910052742 iron Inorganic materials 0.000 abstract description 3
- 229910052710 silicon Inorganic materials 0.000 abstract description 3
- 229910052732 germanium Inorganic materials 0.000 abstract description 2
- CURLTUGMZLYLDI-UHFFFAOYSA-N Carbon dioxide Chemical compound O=C=O CURLTUGMZLYLDI-UHFFFAOYSA-N 0.000 description 10
- 239000007789 gas Substances 0.000 description 8
- 150000004820 halides Chemical class 0.000 description 7
- 229910002092 carbon dioxide Inorganic materials 0.000 description 5
- 239000001569 carbon dioxide Substances 0.000 description 5
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 4
- UQSXHKLRYXJYBZ-UHFFFAOYSA-N Iron oxide Chemical compound [Fe]=O UQSXHKLRYXJYBZ-UHFFFAOYSA-N 0.000 description 4
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 4
- 230000015572 biosynthetic process Effects 0.000 description 4
- 239000004065 semiconductor Substances 0.000 description 4
- ZAMOUSCENKQFHK-UHFFFAOYSA-N Chlorine atom Chemical compound [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 description 3
- 229910052801 chlorine Inorganic materials 0.000 description 3
- 239000000460 chlorine Substances 0.000 description 3
- 239000012535 impurity Substances 0.000 description 3
- 229910001507 metal halide Inorganic materials 0.000 description 3
- 150000004706 metal oxides Chemical class 0.000 description 3
- 230000001603 reducing effect Effects 0.000 description 3
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 2
- UGFAIRIUMAVXCW-UHFFFAOYSA-N Carbon monoxide Chemical compound [O+]#[C-] UGFAIRIUMAVXCW-UHFFFAOYSA-N 0.000 description 2
- VEXZGXHMUGYJMC-UHFFFAOYSA-M Chloride anion Chemical compound [Cl-] VEXZGXHMUGYJMC-UHFFFAOYSA-M 0.000 description 2
- KZBUYRJDOAKODT-UHFFFAOYSA-N Chlorine Chemical compound ClCl KZBUYRJDOAKODT-UHFFFAOYSA-N 0.000 description 2
- KRHYYFGTRYWZRS-UHFFFAOYSA-M Fluoride anion Chemical compound [F-] KRHYYFGTRYWZRS-UHFFFAOYSA-M 0.000 description 2
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 2
- 238000003723 Smelting Methods 0.000 description 2
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 description 2
- 229910052784 alkaline earth metal Inorganic materials 0.000 description 2
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 2
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 2
- 150000001805 chlorine compounds Chemical class 0.000 description 2
- 229930195733 hydrocarbon Natural products 0.000 description 2
- 150000002430 hydrocarbons Chemical class 0.000 description 2
- IXCSERBJSXMMFS-UHFFFAOYSA-N hydrogen chloride Substances Cl.Cl IXCSERBJSXMMFS-UHFFFAOYSA-N 0.000 description 2
- 229910000041 hydrogen chloride Inorganic materials 0.000 description 2
- 235000013980 iron oxide Nutrition 0.000 description 2
- 150000002736 metal compounds Chemical class 0.000 description 2
- 150000005309 metal halides Chemical class 0.000 description 2
- 229910044991 metal oxide Inorganic materials 0.000 description 2
- 239000001301 oxygen Substances 0.000 description 2
- 229910052760 oxygen Inorganic materials 0.000 description 2
- 235000012239 silicon dioxide Nutrition 0.000 description 2
- 239000000377 silicon dioxide Substances 0.000 description 2
- 238000003466 welding Methods 0.000 description 2
- NHYCGSASNAIGLD-UHFFFAOYSA-N Chlorine monoxide Chemical class Cl[O] NHYCGSASNAIGLD-UHFFFAOYSA-N 0.000 description 1
- 101000726740 Homo sapiens Homeobox protein cut-like 1 Proteins 0.000 description 1
- 101000761460 Homo sapiens Protein CASP Proteins 0.000 description 1
- 102100024933 Protein CASP Human genes 0.000 description 1
- 229910052770 Uranium Inorganic materials 0.000 description 1
- 239000003513 alkali Substances 0.000 description 1
- 150000001342 alkaline earth metals Chemical class 0.000 description 1
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 1
- 239000007864 aqueous solution Substances 0.000 description 1
- 150000001723 carbon free-radicals Chemical class 0.000 description 1
- 238000009614 chemical analysis method Methods 0.000 description 1
- 238000005660 chlorination reaction Methods 0.000 description 1
- 229910001902 chlorine oxide Inorganic materials 0.000 description 1
- KYKAJFCTULSVSH-UHFFFAOYSA-N chloro(fluoro)methane Chemical compound F[C]Cl KYKAJFCTULSVSH-UHFFFAOYSA-N 0.000 description 1
- 238000004140 cleaning Methods 0.000 description 1
- 238000010276 construction Methods 0.000 description 1
- 238000003795 desorption Methods 0.000 description 1
- 238000001514 detection method Methods 0.000 description 1
- 230000001627 detrimental effect Effects 0.000 description 1
- YADSGOSSYOOKMP-UHFFFAOYSA-N dioxolead Chemical compound O=[Pb]=O YADSGOSSYOOKMP-UHFFFAOYSA-N 0.000 description 1
- 238000010494 dissociation reaction Methods 0.000 description 1
- 230000005593 dissociations Effects 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 238000002474 experimental method Methods 0.000 description 1
- 150000002222 fluorine compounds Chemical class 0.000 description 1
- GNPVGFCGXDBREM-UHFFFAOYSA-N germanium atom Chemical compound [Ge] GNPVGFCGXDBREM-UHFFFAOYSA-N 0.000 description 1
- 239000008187 granular material Substances 0.000 description 1
- 229910052736 halogen Inorganic materials 0.000 description 1
- 150000002367 halogens Chemical class 0.000 description 1
- 239000001257 hydrogen Substances 0.000 description 1
- 229910052739 hydrogen Inorganic materials 0.000 description 1
- 150000002431 hydrogen Chemical class 0.000 description 1
- 238000011835 investigation Methods 0.000 description 1
- NMCUIPGRVMDVDB-UHFFFAOYSA-L iron dichloride Chemical class Cl[Fe]Cl NMCUIPGRVMDVDB-UHFFFAOYSA-L 0.000 description 1
- VBMVTYDPPZVILR-UHFFFAOYSA-N iron(2+);oxygen(2-) Chemical class [O-2].[Fe+2] VBMVTYDPPZVILR-UHFFFAOYSA-N 0.000 description 1
- 239000000155 melt Substances 0.000 description 1
- 238000002844 melting Methods 0.000 description 1
- 230000008018 melting Effects 0.000 description 1
- 230000009972 noncorrosive effect Effects 0.000 description 1
- 231100000252 nontoxic Toxicity 0.000 description 1
- 230000003000 nontoxic effect Effects 0.000 description 1
- 231100000956 nontoxicity Toxicity 0.000 description 1
- 239000000843 powder Substances 0.000 description 1
- 239000000376 reactant Substances 0.000 description 1
- 238000000926 separation method Methods 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- 238000005245 sintering Methods 0.000 description 1
- 238000001179 sorption measurement Methods 0.000 description 1
- 238000004611 spectroscopical analysis Methods 0.000 description 1
- 238000003786 synthesis reaction Methods 0.000 description 1
- 239000004408 titanium dioxide Substances 0.000 description 1
- DNYWZCXLKNTFFI-UHFFFAOYSA-N uranium Chemical compound [U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U] DNYWZCXLKNTFFI-UHFFFAOYSA-N 0.000 description 1
Classifications
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- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B33/00—Silicon; Compounds thereof
- C01B33/02—Silicon
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B33/00—Silicon; Compounds thereof
- C01B33/08—Compounds containing halogen
- C01B33/107—Halogenated silanes
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01G—COMPOUNDS CONTAINING METALS NOT COVERED BY SUBCLASSES C01D OR C01F
- C01G1/00—Methods of preparing compounds of metals not covered by subclasses C01B, C01C, C01D, or C01F, in general
- C01G1/06—Halides
-
- C—CHEMISTRY; METALLURGY
- C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
- C22B—PRODUCTION AND REFINING OF METALS; PRETREATMENT OF RAW MATERIALS
- C22B1/00—Preliminary treatment of ores or scrap
- C22B1/02—Roasting processes
- C22B1/08—Chloridising roasting
-
- C—CHEMISTRY; METALLURGY
- C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
- C22B—PRODUCTION AND REFINING OF METALS; PRETREATMENT OF RAW MATERIALS
- C22B21/00—Obtaining aluminium
- C22B21/0038—Obtaining aluminium by other processes
- C22B21/0046—Obtaining aluminium by other processes from aluminium halides
-
- C—CHEMISTRY; METALLURGY
- C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
- C22B—PRODUCTION AND REFINING OF METALS; PRETREATMENT OF RAW MATERIALS
- C22B41/00—Obtaining germanium
-
- C—CHEMISTRY; METALLURGY
- C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
- C22B—PRODUCTION AND REFINING OF METALS; PRETREATMENT OF RAW MATERIALS
- C22B5/00—General methods of reducing to metals
- C22B5/02—Dry methods smelting of sulfides or formation of mattes
- C22B5/18—Reducing step-by-step
-
- C—CHEMISTRY; METALLURGY
- C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
- C22B—PRODUCTION AND REFINING OF METALS; PRETREATMENT OF RAW MATERIALS
- C22B60/00—Obtaining metals of atomic number 87 or higher, i.e. radioactive metals
- C22B60/02—Obtaining thorium, uranium, or other actinides
- C22B60/0204—Obtaining thorium, uranium, or other actinides obtaining uranium
- C22B60/0208—Obtaining thorium, uranium, or other actinides obtaining uranium preliminary treatment of ores or scrap
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- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Engineering & Computer Science (AREA)
- Mechanical Engineering (AREA)
- Manufacturing & Machinery (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Life Sciences & Earth Sciences (AREA)
- General Life Sciences & Earth Sciences (AREA)
- Inorganic Chemistry (AREA)
- Environmental & Geological Engineering (AREA)
- Geology (AREA)
- Geochemistry & Mineralogy (AREA)
- Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
Abstract
Description
Verfahren zur Ysloqenierunq und/oder Reduktion und Zersetzung vcQ Metallen, Ha1.Process for the synthesis and / or reduction and decomposition of vcQ Metals, Ha1.
metallen und deren Verbindungen Die Erfindung betrifft ein Verfahren zur Halogenierung und/oder Reduktion und Zersetzung von Metallen, Halbmetallen und deren Verbindungen mit Hilfe eines gasförmigen oder vergasten Halogenierungs-und/oder Reduktionsmittels, wie in den Ansprüchen gekennzeichnet.metals and their compounds The invention relates to a method for halogenation and / or reduction and decomposition of metals, semi-metals and their compounds using a gaseous or gasified halogenation and / or Reducing agent as characterized in the claims.
Zur Darstellung von Metallen werden Verfahren angewendet wie z.B. Flektrolyse von Verbindungen der gewünschten Metalle in wässriger Lösung oder in der Schmelze, aluminothermische Reduktion, Reduktion nittels Alkali-oder Erdalkalimetallen, Reduktion mit Wasserstoff, Kohlenstoff, Xohlenmonoxid oder gasförmigen bzw. vergasten Kohlenwasserstoffen und andere,ähnliche Verfahren. Eine Halogenierung, insbesondere Chlorierung erfolgt sehr häufig mit Chlorgas oder Chlorwasserstoffgas.Methods are used to represent metals, e.g. Flektrolysis of compounds of the desired metals in aqueous solution or in the melt, aluminothermic reduction, reduction by means of alkali or alkaline earth metals, Reduction with hydrogen, carbon, carbon monoxide or gaseous or gasified Hydrocarbons and other similar processes. Halogenation, in particular Chlorination is very common with chlorine gas or hydrogen chloride gas.
Diese Verfahren haben jedoch verschiedene Nachteile. So liefert die Reduktion mittels Kohlenstoff, Kohlenmonoxid oder Kohlenwasserstoffen oft kein kohlenstoffarmes Produkt, wie es für viele Erzeugnisse notwendig ist. Bei der Chlorierung mit Chlorgas und Chlorwasserstoffgas ist die Emission von korrodierenden und schädlichen Gasen und Dämpfen besonders nachteilig. Andere Verfahren sind entweder zu teuer oder zu aufwendig in der Durchführung.However, these methods have several disadvantages. So delivers Reduction using carbon, carbon monoxide or hydrocarbons is often not a low-carbon one Product as it is necessary for many products. When chlorinating with chlorine gas and hydrogen chloride gas is the emission of corrosive and harmful gases and dampening are particularly detrimental. Other procedures are either too expensive or too expensive to carry out.
Der Erfindung liegt die Aufgabe zugrunde, das Verfahren der Gashalogenierung und/oder-reduktion zu vereinfachen und schädliche Einflüsse zu vermeiden, indem als Halogenierungs-und/oder Reduktionsmittel fluorierte Chlorkohlenwasserstoffe verwendet werden.The invention is based on the object of the gas halogenation process and / or reduction to simplify and avoid harmful influences by chlorinated hydrocarbons fluorinated as halogenating and / or reducing agents be used.
Dies hat u.a. verschiedene Vorteile gegenüber bisher bekannten Verfahren.This has, among other things, various advantages over previously known methods.
Bei der Halogenierung oder Reduktion von Metallverbindungen liegt beim erfindungsgemäßen Verfahren die Reaktionstemperatur weit unterhalb der Temperatur bisher bekannter Verfahren, sie liegt unterhalb des Schmelzpunktes der gewünschten Metalle und in vielen Fällen sogar unterhalb der Sintertemperatur der Metalle und ihrer Verbindungen. Durch die relativ niedrige Temperatur, die bei diesem erfindungsgemäßen Verfahren ausreicht wird die Technologie z.B. bei der Verhüttung wesentlich vereinfacht und verbilligt. So brauchen insbesondere keine Vorkehrungen gegen ein Zusammenbacken des Ausgangsmaterials getroffen werden. Ein weiterer Vorteil liegt in der i.a. hohen Inertheit der verwendeten Halogeniernrs-und Reduktionsgase. Diese Gase sind i.a. wegen ihrer bei Raumtempers'ur aus,eprägten Reaktionsträgheit unschädlich, ungiftig, nicht korrodlerend und unbrennbar.In the halogenation or reduction of metal compounds in the process according to the invention, the reaction temperature is far below the temperature previously known method, it is below the melting point of the desired Metals and in many cases even below the sintering temperature of the metals and their connections. Due to the relatively low temperature in this invention If the process is sufficient, the technology, e.g. in smelting, is significantly simplified and cheaper. In particular, there is no need to take any precautions against caking of the starting material. Another advantage is the i.a. high Inertness of the halogenating and reducing gases used. These gases are i.a. harmless, non-toxic because of their inertia of reaction at room temperature, non-corrosive and non-flammable.
Das erfindungsgemäße Verfahren läßt sich wie folgt beschreiben. Wirken fluorierte Chlorkohlenwasserstoffe auf Metalle, Halbmetalle oder deren Verbindungen unter Zufuhr von Wärmeenergie ein, so entstehen bei einer für die Reaktion typischen Temperatur das oder die entsprechenden Halogenide, (Chloride, Fluoride) bzw. die reinen Metalle aus deren Verbindungen. Die entstehenden Halogenide lassen sich nach bekannten Verfahren weiter verarbeiten. So sind verschiedene Metall-und Halbmetallhalogenide leicht flüchtig und können aus der Gasphase gewonnen werden. Da die meisten Halogenide wasserlöslich sind, können sie leicht von den unlöslichen Substanzen getrennt werden. Durch diese aufgezeigten, bekannten Verfahren ist eine leichte Trennung von Gemischen und eine Säuberung von Verunreinigungen möglich. Das erfindungsgemäße Verfahren liefert'dazu eine einfache Möglichkeit der Halogenierung. Da das erfindungsgemäße Verfahren bei einer bestimmten, für die Ausgangsstoffe charakteristischen Temperatur abläuft, kann das Verfahren auch z.B. direkt benutzt werden, um Stoffgemische zu trennen bzw. Verunreinigungen aus dem Ausgangsstoff zu entfernen. Da sich Halogenide thermisch zersetzen lassen, kann das erfindungsgemäße Verfahren bei weiterer Wärmezufuhr zur Darstellung reiner Metalle oder Halbmetalle benutzt werden.The method according to the invention can be described as follows. Works fluorinated chlorinated hydrocarbons on metals, semi-metals or their compounds with the addition of thermal energy, so arise in a typical reaction Temperature the or the corresponding halides, (chlorides, fluorides) or the pure metals from their compounds. The resulting halides can be reduced further process known methods. So are various metal and semi-metal halides highly volatile and can be obtained from the gas phase. As most halides are water-soluble, they can easily be separated from the insoluble substances. The known processes shown enable easy separation of mixtures and a cleaning of impurities is possible. The inventive method provides a simple way of halogenation for this purpose. Since the inventive Process at a certain temperature that is characteristic of the starting materials is running, the process can also be used directly, for example, to add mixtures of substances separate or remove impurities from the source material. Since halides The process according to the invention can be thermally decomposed if further heat is supplied can be used to represent pure metals or semi-metals.
Geht man von einer Metall-oder Halbmetallverbindung (z.B. einem Oxid) aus, so kann das entstehende Chlorid durch weitere Temperaturzufuhr in das reine Metall überführt werden. Somit können durch die fluorierten Chlorkohlenwasserstoffe Metall-oder Halbmetallverbindungen zu den reinen Metallen oder Halbmetallen reduziert werden.Assuming a metal or semi-metal compound (e.g. an oxide) off, the resulting chloride can be converted into the pure by adding more temperature Metal can be transferred. Thus, through the fluorinated chlorinated hydrocarbons Metal or semi-metal compounds reduced to the pure metals or semi-metals will.
Ein anderer Reduktionsmechanismus läuft Uber die Adsorption des fluorierten Chlorkohlenwasserstoffs mit anschließender Dissoziation des Moleküls, wobei sich das koadsorbierte Halogen mit der Metallverbindung vereinigt. Am Beispiel eines Metalloxids sei dies näher erläutert. Das Metalloxid (MeO ) bildet mit dem Chlor des Chlorkohlenwasserstoffs eine Metall-Sauerstoff-Chlorverbindung (MeOxCl).Another mechanism of reduction is the adsorption of the fluorinated Chlorinated hydrocarbon with subsequent dissociation of the molecule, being the co-adsorbed halogen is combined with the metal compound. Using the example of one Metal oxide this is explained in more detail. The metal oxide (MeO) forms with the chlorine of the chlorinated hydrocarbon is a metal-oxygen-chlorine compound (MeOxCl).
Durch Temperaturerhöhung entsteht unter Desorption von Chloroxiden (C10x) das reine Metall (Me).An increase in temperature results in desorption of chlorine oxides (C10x) the pure metal (Me).
Schließlich kann der Reduktionsmechanismus auch über Kohlenstoffradikale erfolge g ls s fluorierte Chlorkohlenwasscrstoffc eignen sich besonders die Fluorchlorderivate des Plethans und des Die Äthans. folgenden Beispiele sollen die Erfindung weiter erläutern, ohne sie jedoch einzuschränken. Die aufgezeigten Versuche wurden mit Trichlorfluormethan (CFC13) als Halogenierungs- und /oder Reduktionsmittel durchgeführt. Dies stellt jedoch keine Einschränkung dar, da andere Fluorchlorkohlenwasserstoffe ähnliche Ergebnisse zeigen.Finally, the reduction mechanism can also be via carbon radicals Successful fluorinated chlorinated hydrocarbons are particularly suitable for the fluorochlorine derivatives of the Plethane and the Ethane. The following examples are intended to further the invention explain without restricting them. The experiments shown were with Trichlorofluoromethane (CFC13) carried out as halogenating and / or reducing agent. However, this is not a limitation as there are other chlorofluorocarbons show similar results.
Beispiel 1) Eisenoxid (Fe304) wurde als Granulat in einem Reaktionsraum in einer Atmosphäre von Trichlorfluormethan (CFC13) auf etwa 500 OC erhitzt, und die Reaktionspartner für etwa 30 Minuten bei dieser Temperatur gehalten. Danach wurden mit gebräuchlichen und bekannten chemischen Analyseverfahren Eisenchloride, Eisenfluoriae und Kohlendioxid nachgewiesen. Desweiteren konnten verschieden reduzierte Eisenoxide sowie metallisches Eisen analysiert werden.Example 1) Iron oxide (Fe304) was produced as granules in a reaction chamber heated to about 500 OC in an atmosphere of trichlorofluoromethane (CFC13), and held the reactants at this temperature for about 30 minutes. Thereafter using common and well-known chemical analysis methods, iron chlorides, Eisenfluoriae and carbon dioxide detected. Furthermore, various reductions could be made Iron oxides as well as metallic iron can be analyzed.
Beispiel 2) Aluminiumoxid (A1203) wurde in pulveriger Form in einem Reaktor mit Trichlorfluormethan bei einer Temperatur von ca. 530 °C zur Reaktion gebracht. Der Chlorid-, Fluorid- und Kohlendioxidnachweis war positiv, auf den Innenwänden des Reaktors hatte sich ein reiner Aluminiumspiegel niedergeschlagen.Example 2) Alumina (A1203) was in powder form in one Reactor with trichlorofluoromethane at a temperature of approx. 530 ° C for reaction brought. The chloride, fluoride and carbon dioxide detection were positive on the interior walls A pure aluminum mirror was reflected in the reactor.
Beispiel 3) Siliziumdioxid (SiO2) zeigt bei einer Reaktionstemperatur von ca. 4200C in Anwesenheit von Trichlorfluormethan das Entstehen der Chloride, Fluoride, Kohlendioxids sowie des reinen Metalls.Example 3) shows silicon dioxide (SiO2) at reaction temperature from approx. 4200C in the presence of trichlorofluoromethane the formation of chlorides, Fluoride, carbon dioxide as well as the pure metal.
Beispiel 4) Titandioxid <T102) reagiert mit Trichlorfluormethan bei einer Reaktionstemperatur von ca. 4000C sehr stark unter Bildung der Metallhalogenide, Kohlendioxids und des reinen Metalls.Example 4) Titanium dioxide <T102) reacts with trichlorofluoromethane at a reaction temperature of approx. 4000C very strongly with the formation of metal halides, Carbon dioxide and pure metal.
Beispiel 5) Bei der Reaktion von Bleioxid (PbO2) mit Trichlorfluormethan lassen sich bei einer Temperatur von 530°C die Halogenide und Kohlendioxid nachweisen.Example 5) In the reaction of lead oxide (PbO2) with trichlorofluoromethane the halides and carbon dioxide can be detected at a temperature of 530 ° C.
Beispiel 6) In einem Vakuumrezipienten wird auf eine oxidierte Metall-(z.B. Eisen-) oberfläche fluorierter Chlorkohlenwasser.toff bei Raumtemperatur adsorbiert. Elektronenspektroskopische Untersuchungsmethoden zeigen, daß bei dieser Temperatur bereits eine Reaktion der Metalloberfläche ait dem fluorierten Chlorkohlenwasserstoff stattfindet. Die entsprechenden Untersuchungsmethoden weisen auf die Bildung von OberflAchenhalogeniden hin. Heizt man die Oberflache auf ca. 400°C auf, so beobachtet man die Abnahme der Chlor- und Sauerstoffkonzentration durch Abreaktion des adsorbierten Chlors mit dem Oxidsauerstoff. Durch entsprechende Wahl der Chlorkohlenwasserstoff-Dosis und der Temperatur kann somit eine reine Metalloberfläche erzeugt werden.Example 6) In a vacuum recipient, an oxidized metal (e.g. Iron) surface of fluorinated chlorinated hydrocarbons adsorbed at room temperature. Electron spectroscopic methods of investigation show that at this temperature already a reaction of the metal surface with the fluorinated chlorinated hydrocarbon takes place. The corresponding examination methods indicate the formation of Surface halides. If the surface is heated to approx. 400 ° C., it is observed the decrease in the chlorine and oxygen concentration due to the reaction of the adsorbed Chlorine with the oxide oxygen. By appropriate choice of the chlorinated hydrocarbon dose and the temperature, a pure metal surface can thus be produced.
Am Beispiel der Halogenierung und Reduktion mit Trichlorfluormethan
kann ein möglicher Reaktionsmechanismus verifiziert werden.
Im Rahmen der Herstellung von Halbleitermetallen, insbesondere von Silizium und Germanium, kann das Verfahren zur Erzeugung reiner Halbleitermetalle und Halbleiteroberflächen sowie zur gezielten Herstellung spezieller Oberflächenbelegungen - was z.B. beim Bau von Halbleiterelementen von Bedeutung ist - angewendet werden.In the context of the production of semiconductor metals, in particular of Silicon and germanium, the process can be used to produce pure semiconductor metals and semiconductor surfaces as well as for the targeted production of special surface coverings - which is important e.g. in the construction of semiconductor elements - can be applied.
Ein weiterer Anwendungsbereich betrifft die Metallhalogenide, die in bestimmten Fällen direkt zur Verarbeitung benutzt werden.Another area of application relates to the metal halides, the in certain cases can be used directly for processing.
Desoweiteren ist die Erzeugung reiner, oxidfreier Metalloberflächen sehr häufig wünschenswert.Furthermore, the production of pure, oxide-free metal surfaces is possible very often desirable.
Das erfindungsgemäße Verfahren kann u.a. auch zum Schutzgasschweißen verwendet werden, wobei die Metalloberflächen beim Schweißen durch die reduzierende Wirkung des Fluorchlorkohlenwasserstoffs oxidfrei wird. Dabei ist die hohe Inertheit, Ungiftigkeit und Unbrennbarkeit des Gases ein besonderer Vorteil.The method according to the invention can also be used, among other things, for gas-shielded welding used, the metal surfaces during welding by the reducing Effect of the chlorofluorocarbon is oxide-free. The high inertness Non-toxicity and incombustibility of the gas are a particular advantage.
Das Verfahren kann außerdem zur Anreicherung von Erzvorkommen mit geringem Metallgehalt angewendet werden, indem das gewUnschte Metall in Form seiner Halogenide abgetrennt wird.(z.B. Uran).The process can also be used to enrich ore deposits low metal content can be applied by adding the desired metal in the form of its Halides are separated (e.g. uranium).
Claims (10)
Priority Applications (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DE19782841039 DE2841039A1 (en) | 1978-09-21 | 1978-09-21 | Halogenation and/or redn. of metals, semi-metals or their cpds. - by heating the initial materials, esp. oxide(s) with tri:chloro: fluoromethane |
| ZA00793986A ZA793986B (en) | 1978-09-21 | 1979-08-02 | Process for the halogenation and/or reduction and disassociation of metals,semi-metals and their compounds |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DE19782841039 DE2841039A1 (en) | 1978-09-21 | 1978-09-21 | Halogenation and/or redn. of metals, semi-metals or their cpds. - by heating the initial materials, esp. oxide(s) with tri:chloro: fluoromethane |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| DE2841039A1 true DE2841039A1 (en) | 1980-04-03 |
Family
ID=6050012
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| DE19782841039 Withdrawn DE2841039A1 (en) | 1978-09-21 | 1978-09-21 | Halogenation and/or redn. of metals, semi-metals or their cpds. - by heating the initial materials, esp. oxide(s) with tri:chloro: fluoromethane |
Country Status (2)
| Country | Link |
|---|---|
| DE (1) | DE2841039A1 (en) |
| ZA (1) | ZA793986B (en) |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4392888A (en) * | 1982-01-07 | 1983-07-12 | Aluminum Company Of America | Metal treatment system |
| US5824134A (en) * | 1997-01-29 | 1998-10-20 | Powers; Jim | Direct reduction of iron ore utilizing organic hazardous materials |
| EP2778138A1 (en) * | 2013-03-11 | 2014-09-17 | Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. | Method for the generation of metal halides or metal oxyhalides from metal oxygen compounds or metals and use of the method |
-
1978
- 1978-09-21 DE DE19782841039 patent/DE2841039A1/en not_active Withdrawn
-
1979
- 1979-08-02 ZA ZA00793986A patent/ZA793986B/en unknown
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4392888A (en) * | 1982-01-07 | 1983-07-12 | Aluminum Company Of America | Metal treatment system |
| US5824134A (en) * | 1997-01-29 | 1998-10-20 | Powers; Jim | Direct reduction of iron ore utilizing organic hazardous materials |
| US6197087B1 (en) | 1997-01-29 | 2001-03-06 | James M. Powers | Pyrolysis of halogenated organic hazardous wastes with direct reduction of iron oxides |
| EP2778138A1 (en) * | 2013-03-11 | 2014-09-17 | Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. | Method for the generation of metal halides or metal oxyhalides from metal oxygen compounds or metals and use of the method |
Also Published As
| Publication number | Publication date |
|---|---|
| ZA793986B (en) | 1980-07-30 |
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