DE2237177A1 - HOLOGRAM - Google Patents

Description

Canon Kabushiki Kaisha, Tokyo / Japan

"HOLOGRAM"'

The present invention concerns $ A © ts on © In hologram with an Interfereozmusfeer. . ..

It is to be expected -that Ättfzeielixiimgselsaent © full of interference, ie hologram © for etie requests ^ erarteitimg ^ for optical measurements raid image reproduction as | isahf ^{1 is} widely used. In the past trardeo ¹⁵ was the most photo-sensitive materials uat @ rsia @ hfc ₅ the only practical photosensitive material, however, the plate with a high exposure ratio, was it possible to use a silver salt emulsion ? Photo-sensitive materials have a phctowi-resistance characteristic ^ However, the achievable resolution is veriiältMis, the Isapfindlefdceif and the

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Scattering effectiveness relatively low, so that such materials have not yet been used in practice. Other photosensitive materials are dichromatic gelatin and thermoplastic films, however, the properties are of these materials those of the silver-salt emulsion and inferior to the photo-resistive materials. Other materials, for example dielectrics subject to a light destruction effect, a variable Curie point comprising ferromagnetic materials and anodized cf? silicon v / ground practically not used to this day.

With a silver salt emulsion provided plates, v; hich because of their high dissolution ratio, the only practical photosensitive elements for holograms represent, may be subjected to development and fixing to a bleaching treatment and used as Phasenholograirme. This is because holograms can be classified into phase and amplitude holograms. In the case of phase holograms, the information to be recorded is recorded in the form of a difference in the optical path length, so that the hologram appears to be uniformly transparent to the human eye, while the amplitude hologram records the information in the form of the difference in optical density. Theoretically it can be calculated that the refractive efficiency for an amplitude hologram is a maximum of "J.2 fi , while for a phacene hologram this fourth can theoretically be $ 100. The practically used HoIo-

grams are therefore all phase holograms. As soon as a Silver salt emulsion used to achieve a phase hologram is a bleaching treatment after developing and fixation necessary.

It turns out, however, that treatment of blood is very difficult and is closely related to developing and fixing

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is linked. In case the bleaching treatment is carried out automatically large fluctuations and irregular bleaching spots occur in the end product. The development, fixation and Bleaching processes are carried out wet, and these individual steps are not easily carried out can. Shrinkage can be disadvantageous the emulsion layer occur. This shrinkage of the emulsion layer results in a distortion of the hologram pattern, thereby losing the recorded information. Even if this shrinkage occurs very evenly, so it is still not desirable, which in turn results has shown that bleached silver-salt emulsions can only be used to a limited extent, especially in the case of optical Measurements and color holograms difficulties arise »With optical measurements the accuracy is reduced by while with color holograms · an undesired color shift occurs.

Other disadvantages are the following:

1. The mechanical strength of the emulsion layer is not sufficiently large and the durability insufficient if contact with other elements appears necessary.

2. A multiplication of holograms can only smoldering wer.den carried out. ¹¹

3. Since the emulsion layer has a thickness of at least 5 / U the achievable packing density is not very high.

4. The method of manufacturing the photosensitive member is complicated and expensive.

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5. The sensitivity, the scattering efficiency and the dissolution ratio are not satisfactory.

6. The silver iodine formed from the silver during the bleaching treatment is not stable, so that, in particular an alteration process takes place through photolysis.

7. The emulsion layer is not always uniform.

8. Due to haze in developing, results some noise, so the signal-to-noise ratio, especially for optical measurements of high Accuracy, is not enough.

Accordingly, the aim of the present invention is to provide a hologram which has these disadvantages mentioned above does not have and which is particularly suitable for making copies.

According to the invention, this is achieved in that "it consists of a flislonsberelch of a photosensitive element is formed, which consists of a photosensitive receiver containing a photoconductor and a photosensitive amplifier, which diffuses into the photoconductor when irradiated, whereby these two elements can be arranged in the following way:

a) the two elements are in the form of one above the other arranged layers,

b) one element is provided in the form of a layer, while the other element is present in the form of a dispersion within the first element,

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c) one element is provided in the form of a layer, while the other element comes into contact with the surface of the first-mentioned layer as soon as one Irradiation takes place.

The invention will now be based on exemplary embodiments will be explained and described in more detail ^ with reference to the attached Drawing is referred to.

Show it;

Fig. 1 to 6 photoerapfindliehe elements for generating a hologram according to the present invention ^

Pig. 7 is a schematic view of the optical system for the production of the hologramsj

8 shows an embodiment of the photosensitive element according to dec ^{3 of the} present invention;

9 shows the exposure step for manufacture an interference pattern j

10 and 13 are schematic views of relief interference patterns;

14 is a representation of the adding step for the Creation of an interference pattern

15 to 19 are schematic views of relief interferrogenic channels;

20 is a schematic representation of the exposure step for the production of an interference pattern;

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Pig. 21 a relief pattern

22 is a schematic view of the exposure step for making an interference patternc;

FIGS. 25 and 2k are schematic views of ReIief interferrogramines;

Fig. 25 is a schematic view of the exposure step for the production of an interference pattern;

26 is a schematic view of a Rellef interferrogram;

27 shows a graphic representation of the dependency of the iodine content on the displacement of the absorption end;

28 is an enlarged schematic sectional view of a reproduced element with an R-relief pattern j

29 shows a schematic representation of an optical system for regenerating image information before use a reproduced hologram;

30 shows a graph showing the dependency of the transmission factor von der V / ellenläuee with the exposure time as Parameter;

31 shows a schematic representation of an optical for performing real-time holography;

Fig. 32 "is a photographic representation of an interference rauster s, and

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Pig · 33 is a schematic representation of an optical system for a Furier transmission hologram.

In the context of the present invention, a photosensitive Element used, which is provided with a photoconductor, photosensitive receiver and a photosensitive Amplifier consists, which under actinic · radiation a mutual diffusion with the photoconductor performs, whereby there is a difference in the optical density of the refractive index or the reflection factor or combinations this parameter results between the diffused part and the undiffused part. The photosensitive one The receiver is in contact with the photosensitive amplifier. The photosensitive element is through toherent, actinic radiation irradiates, polygamy an image information in the form of an interference pattern which corresponds to the image information. This interference pattern will by the difference in the optical density of the refractive index of the reflection factor or combination of these parameters between the exposed part and the unexposed part reached, resulting in a hologram.

The actual radiation results in the photo-sensitive Recipients a ^ mutual diffusion or mutual reaction between the photosensitive receiver and the photosensitive Amplifier. The photosensitive amplifier, in conjunction with the photosensitive receiver, effects a Sensitization of the photosensitive element in different Way. The photosensitive amplifier is in contact with the photosensitive receiver and receives a part the aktlnischon radiant energy, so that the photosensitive Amplifier has a significant role in exposure. The mutual diffusion within the photoref-ind— borrowed elements by actinic radiation is within • The photo sensitive recipient and the photo input final

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Amplifier both physically and chemically different. The part exposed to diffusion serves to form the interference pattern of a hologram. The difference in the optical density of the refractive index and the reflection factor between that of a diffusion exposed, part and the original photosensitive Material can be used for the formation of the holographic number directly be used. When creating a relief interferrogram this difference can be used for dac hologram regardless of differences in physical properties will.

The photosensitive receiver contains a photoconductor. Corresponding photoconductors are chalcogen glass, organic Glass or organic crystals, with a photoconductivity, the glass transition temperature being not higher than is about 400 ° C. Crystals having no transition temperature with metal compounds, for example PbIp, can can also be used in the context of the present invention as long as the materials used compared to the Metal-containing crystals have a mutual * diffusion.

Chalcogen glass is an amorphous material with at least one Element of the sulfur group (S, Se, Te) as the main component. In the context of the present invention, the following can be used Chalcogen glasses. uses v / earth:

simple types of glass, for example Se or S Glac; binary Chalcogen glass Gortcn, for example As-S, As-Te, As-Se, S-Si, Se-S, Se-Te, Sb-Se, Sb-Te, Bi-Se, Di-S, Ge-S, Bi-Te and the like Systems; ternure chalcogen glasses, for example Ac-S-To, As-Se-Te ,, Sb-Ar-S, Ar-S-So, An-S-Gc, S-Se-Go, Ac-Se-Go, and the like Systems; quarternary chalcogengl a:; e, for example As-S-Se-Te, As-S-Se-Gc and similar systems.

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Other types of chalcogen glasses that can be used are mixtures of the above called chalcogen glass systems, one or more of the following Elements can be added: halogens, thalium, copper, silver, cadmium, lead, alkali metals, e.g. Na, K or similar alkaline earth metals, for example Ca, Sr and similar, elements of group IVb of the periodic table, e.g. Si, Ge and similar, rare earths of the lanthanum species, for example elements such as Eu, Sm and similar actinic rare earths such as U and the like. Glass-like materials are materials with a glass transition temperature, which materials can contain, for example, a crystallite material.

Organic materials exhibiting photoconductivity can be vinyl carbazone halogenated poly-vinylcarbaaolaminopolyphenyl N, N, N ^r , N ^{ -tetrabenzyl-p-phenylenediamine, 4-4 ° -bis-dimethyl- aminobenzophenol, diphenyl methane, leuco-based color bodies, triphenylmethane parbene diamine be a leuco-based poly vinyl anthrathene poly-2-vinyl dibenzene-thiophene and similar materials. Photoconductive organic materials are generally used together with sensitizers. Dye-sensitive and electron-active compounds can be mentioned as sensitizers.

Examples of such paraffin sensitizers are as follows:

1. DlcarbazylRiethan or Tricarbazyln \ ethane, with the following formula

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where R, an acrylic, for example phenyl, halogen-substituted phenyl, nitrophenyl, di-alkylaminophenyl, alkoxyphenyl, carbazole radicals, substituted carbazole radicals and the like, Rp and R, are either the same or different ", hydrogen and / or C ₁ -Cg Alkyls; Rj. And R _r are either identical or different from hydrogen, C ₁ -Cj, alkyls, C 1 -Cj, "alkoxy, halo nitro and / or dialkylamino constituents and X" is an anion.

2. Cyanine dye having the following formula

CH _x CH, \ / ³

X -

where X is a nitro group or a 1-2 halogen, R is an alkyl and not higher than C- _,? ; A is a substance like - (CH-CH) -CH = where η is a? is an integer between 0 and 2, -CH = C-CH-

J.

respectively.

-CH = CH-C = CH-CH =

where R 'is a lower allyl of C.-Cj, and B is an anion

is.

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j5. Dialkylaminostyryl pigment of the formula

(OH-CII)

R- * Rr? Ri-r

I ³ Λ / '

where A is a substance like -N-, -0-, -S-, -Se-, -C- or -CH = CH-,

Is hydrogen or lower alkyl and R is

whereby

Is hydrogen or lower alkyl; B and C are identical or different to methine, "substituted menthine or" Nitrogen, if carbon, hydrogen or an alkyl

to which B and C are appended,

and

are the same or

different hydrogen, halogen, for example Cl, Br and I, NO ₂ , COOR ^, where Rg is a lower alkyl; R ₁ and Rp together can form a benzene ring, but if B and C is carbon, then R ₁ = R ₂ = H and a benzene ring with R and R _{2 is} excluded; R, is an alkyl of not higher than C _,? ; Γκ and R _r are equal or different lower alkyls of not more than C ₁ ^ X is an anion and η is an integer of 1 or 2.

K. Brilliant Blue ", Victoria Blue B, Methyl Violet, Crystal Violet, RhodaniiD B, Rhodamine Extra and similar substances.

As electron ^ active compounds are 2,4,7-trinitrofluorenone, 2,4-, 5,7-tetranitrofluorenone, 2-chlorantraquinone, halides, for example tetrabronimethane, chlorotribromomethane, iodoform, Hexabromothane and similar substances mentioned. As crystalline

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Materials with no glass transition temperature are oxides, halides, sulfides, selenides, arsenides, tellurides and intermetallic compounds of Cu, Zn, Cd, Hg, Ga, In, Tl, Pb, Sn, Sb and Bi. Examples of such materials are CuI, PbI ₀ , PbCl ₂ , CdCl ₂ , CuCl, SbI ₃ , PbS, CdS, ZnS, PbSe ,. CdTe, GaAs, InAs, ZnO and InSb mentioned.

The photosensitive amplifier is a material that works with the photosensitive receiver reacts and diffuses into the same. Corresponding photo-sensitive amplifier materials are metallic solid materials, compounds which During decomposition, metallic materials form, liquid materials or finely adjusted materials within a Liquid, as well as gaseous materials. Examples of metallic Materials are metals such as Ag, Zn, Cd. Mn, Ga, Ni, Cr. Cu, In, Bi, Sn and Tl, as well as alloys with those mentioned above Metals and various materials which these metals or metal ions form when they decompose. Furthermore, in the context of semiconductor materials such as Sl or Ge, also intermetallic compounds such as Ga-As and In-Sb, halogen elements, Halogen ions, semimetals of group V of the periodic Systems for example As, Sb and similar, chalcogen elements such as S, Se and Te are mentioned.

Particularly effective photosensitive enhancer materials are Ag, Cu or alloys with at least one of these components. In the case of alloys, those are to be removed have a low melting point. The following alloys should be mentioned in this context:

Ag-Bi (Bi not less than 80 ^)

Ag-Cd (Cd not less than $ 95)

Ag-Ga (Ga "not less than 55 ^)

"Ag-Hg (Hg 90-9. ^ ')

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Ag-In (in no less than $ 70)

Ag-Li (Li not less than $ 9)

Ag-Pb (Pb not less than $ 93)

Ag-Te (Te 62-86 $)

Ag-Tl (Tl not less than $ 92)

Cu-Ga (Ga not less than $ 87)

Cu-Hg (Hg not less than $ 95)

Cu-In (in no less than $ 95)

Cu-Sn (Sn not less than $ 93)

Cu-Te (Te 78-86 $)

An embodiment of the photosensitive element according to of the present invention has two elements which are in the form of superposed layers. This embodiment is shown in FIGS.

1 shows a photosensitive element which consists of a carrier 2, a photosensitive receiver layer 1 arranged on the carrier 2 and a photosensitive intensifier layer 3 applied to the photosensitive receiver layer 1. In the embodiment shown in FIG. 2, the photosensitive element consists of a carrier 2, a photosensitive intensifying layer 3 arranged on the carrier 2 and a photosensitive receiving layer 1 applied to the photosensitive intensifying layer 3.

In DGN in Figs. 3 and illustrated embodiments h photοempfindliche the element consists of a carrier on which the two elements are mounted photoerapfindlichen. In the embodiment shown in Fig. 3, a carrier layer 2 is provided on which a photosensitive receiver layer 1 is applied. Small particles 3 of a photo-sensitive amplifier are arranged within this photosensitive receiver layer 1. In the embodiment shown in FIG. 4, the photosensitive element

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on the other hand, a carrier layer 2 on which a layer ^; a photosensitive to amplifier 3 is applied. Particles of the photosensitive receiver 1 are arranged in finely divided form within this layer of a photosensitive intensifier 3.

In a further embodiment of the photosensitive element, one photosensitive element is provided in the form of a layer, while the other element comes into contact with the surface of this layer as soon as an exposure with the interference pattern takes place. This embodiment is shown in Figs. 5 shows a photosensitive element which consists of a carrier 2 and a layer of a photosensitive receiver 1. The photosensitive amplifier is not shown, but it is brought into contact in gaseous or liquid form or in the form of a thin layer with layer 1 during exposure or shortly afterwards, so that the desired interference pattern is obtained. 6 shows a photosensitive element which consists of a carrier 2 and a layer of a photosensitive amplifier J> . The photosensitive receiver is not shown, Jedooh will be the same in the form of a. Gas or a liquid or a thin layer, brought into contact with the layer 3 during or shortly after the exposure, so that it also gives the desired interference rr.ustor.

With regard to the embodiments shown in FIGS. 1 to &, it should be mentioned that the thicknesses of the two layers are usually between 10 η αχ and 1 mm, preferably between 10 m λι and 30 M , but the thickness can be greater than ebon trap the locations given above: in. Di ₀ ^ s can in FIGS. 1 to 6 shown Ausführungsfor

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can also be used without a carrier, so that the desired interference pattern results. In this case the thickness of the photosensitive receiver or of the photosensitive amplifier is not less than 10 yU, so that the necessary strength of the layer results. In the embodiments shown in FIGS. 1 and 2, the thickness of the layer of the photosensitive receiver is preferably between 30 m / u and 3 / u, while the thickness of the photosensitive amplifier is between 10 mM and 0.2 / u with regard to the resolution.

In the context of the present invention, glass, ceramic materials, crystals, metals ,. Semiconductors, resins, organic films, paper, fabrics, and composite materials be used. Every layer of photosensitive Receiver and the photosensitive amplifier can be in conventional way, for example by steam coating in a vacuum by spraying, by melt coating or similar processes can be produced. With thick layers can also be made by cutting, polishing or the like. The layer of photosensitive Receiver with particles of a photosensitive amplifier according to FIG. 3 arranged dispersed therein can there- be made by that a photoeir.sensitive recipient with particles of a photosensitive enhancer in the form of a layer; is melted on the carrier, or that a thin one Film or particles of a photosensitive receiver glojchm-isGic is applied to the support *, whereupon the photo-sensitive Receiver for melting ίςβ ^ αοί ^ becomes. at such a photosensitive element is the proportion the photosensitive amplifier in about 0.01 to 5 Weight .- ^ dos photosensitive receivers »· -

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A layer of a photosensitive amplifier with particles of a photosensitive receiver according to Pig. 4 can be produced in such a way that a photosensitive amplifier with particles of a photosensitive receiver is melted on the support in the form of a layer, or that a thin film or particles "of a photosensitive amplifier are placed on particles of the photosensitive receiver which are uniformly on the carriers have been placed, the photoempfind ¹ followed.! before is brought amplifier to melt. In such an embodiment the proportion of the photosensitive amplifier preferably 1 bin xO wt .- # of the photoreceiver finite receiver. As a photo sensitive amplifier is preferably doing a metal with a low The following table gives, by way of example, such low melting point metals.

Tabel

Alloy Composition Melting Point (C.)

Bi (44.7) Pb (22.6) Sn (8.J) Cd (5O) In (19.1) 46.7

Bi (35.6) Pb (49.1) Hg (15.5) 106

Bi (50.0) Fb (26.7) Sn (13-3) Cd (10.O) 70

In (40) Ga (6o) * 60

Bi (48.0) Pb (28.5) Sn (14.5) Sb (Q.0) 227

Bi (56.0) Sn (40.0) 2n (4.0) 100

Bi (53.9) Pb (42.U) Sb (4.0) I58

Sn (73-5) Cd (24.5) Zn (2.0 '16?

Sn (71.0) Zn (9.0) 199

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Sn (98.O) Mn (2.0) 200

Sn (96.5) Ag 0.5) 221

Pb (87.5) Sb (12.5) 247

Pb (82.5) Cd (17.5) 248

Ag (20) Bi (80). 390

Ag (5) Cd (95). * ¹ 100

Ag (37) Ca. (Β?) ■ 375

Ag (5) Hg (95). 330

Ag (30) In (70) - ·.

Ag (91) Li (9)

Ag (7) Pb (93) ² 100

Ag (29.4) Te (70.6). 351

Ag (1.5) 'Te (98.5) ■ .291

Cu (13) Ga (87) 400

Cu (2) Hg (98) - 200

Cu (5) ϊώ (95). . 4oo

Cu (7) Sn (93) 400

Cu (16) Te (84) 340

Ge (5) Sn (95) 400

Mg (2.-2) Pb (97.8) * 258

Mg (2) Sn (98). 200

Ni (1) Sn. (99) 400

Particles of a photoasnpfindlichen receiver and a photo sensitive amplifier may be sprayed molten material through Zerstossan example, in a vibration mill ^ a ball mill or a mortar _s or produced by chemical deposition "

With regard to the photosensitive element according to FIG the liquid photosensitive enhancer can be melted in Shape are applied »In this case, purposeful

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moderate metal alloys with a low melting point used according to the table. However, gaseous photosensitive amplifiers can also be used for exposure of the photosensitive receiver layer can be used, in which case steam is applied takes place in a vacuum at the same time as the exposure.

With regard to the embodiment shown in FIG it should be mentioned that the liquid or gaseous photosensitive receiver can be applied in the same week, like the liquid or gaseous photosensitive amplifier, as in the embodiment shown in FIG.

The photosensitive elements shown in FIGS. 1 to 6 are typical embodiments for production by Interferen ^ mustem. Within the scope of the present invention however, other embodiments of photosensitive elements are used. For example a photosensitive element can be composed of a layer of a photosensitive receiver, a layer of a photosensitive amplifier and a layer of a photoenipfindlichon Receiver exist, this embodiment being formed in that in the case of the in Fig. 1 embodiment shown on the layer of photosensitive Amplifier 5 a further photosensitive receiver layer is arranged. Furthermore, a photosensitive Element are produced in that a photosensitive receiver layer, a photoeiapfindli · » before the amplifier base is not a photosensitive receiver layer and a photosensitive intensifying layer are superposed on each other in the manner shown in FIG photosensitive intensifier layer, a photosensitive receiver layer and a photosensitive intensifier layer been applied. A photosensitive element can also consist of a photosensitive amplifier

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layer, a photosensitive receiving layer and a Photosensitive reinforcement layer are made, which is produced thereby that will be on the photosensitive receiving layer 1 of FIG. 2, a photosensitive intensifier layer is applied will. Finally, a photosensitive element can consist of a photosensitive amplifier chi ch tr, a photosensitive Receiver «chient, a photosensitive intensifying layer and a photosensitive receiving layer insist by placing on the photosensitive receiver 1 of Fig. 2, a photosensitive enhancement layer and thereon a photosensitive receiver layer can be applied. .

The photosensitive elements of FIGS. 1 and 2 can also can be modified by a photo-sensitive receiver layer and a photo-sensitive reinforcement layer be applied with the formation of a relief interferogram, so that a photosensitive element is more complicated Construc- ture results.

In the embodiment shown in FIG. 3, a photo-sensitive receiver can be and / or a photo-sensitive Reinforcement layer on the dispersed particles a photosensitive amplifier 3 containing photosensitive receiver layer 1 applied or between the Photosensitive layer 1 and the carrier 2 arranged vrerdsn. In the embodiment shown in Fig. 4 form can be in ahn-Iieher Way as in Fig. 3 a photosensitive receiver sole cht and / or a photo-sensitive amplifier layer on the photo-sensitive intensifier layer 1 or between the photosensitive enhancement layer 1 and the support 2 to be ordered.

In the context of the present invention, photosensitive

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Elements according to FIGS. 1 and 6 are used, which in addition have one or more elements. From the commercial However, a simple construction of the photosensitive member is preferable from the standpoint.

Various methods for producing holograms according to of the present invention will now be described.

According to FIG. 7, the optical system forming a hologram consists of a laser 5> an inverted telescope 6 which widens the laser beam, a beam splitter 7, an information source 8, a photosensitive element 9, a reference beam 10 and one of the "Xnfor- Ination source 8 outgoing light beam 11. The interference image of the reference beam 10 and the light beam 11 is recorded as a hologram.

The present invention is basically known by the exposureB process be done alone. The effectiveness of the. However, holograms are best achieved by having a additional treatment is carried out to make it applicable of the hologram more practical and in a wide range through .can be performed.

* A hologram can be reproduced using an original octinic radiation with an image image on oin photo sensitive element is made to attract attention, so that at the photosensitive element an interferem.mustcr according to the picture information. This is the difference the optical density dec; Brochunr; Dindexes and the Refloktionsfalrtors or the combination of these parameters when

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UJ. l '; v -rr, r *

occur by diffusion phenomena, whereupon chemically or mechanically the remaining photosensitive receiver or remove the photosensitive amplifier or both. An interferogram can be generated using an interference pattern is generated on a photosensitive element, whereupon mechanically or chemically the exposed areas are not exposed Parts of the photosensitive receiver or amplifier, or both, are removed, creating a relief interferrogram results in the form of a hologram.

The relief interferrogram thus formed can be used as an original hologram used v / earth, "a transfer material can be used with the original pattern are brought into close contact, so that a reproduction of the hologram results.

The relief pattern can be created by moving in the direction of the Thickness of the element partially or completely the layer is removed.

The interference pattern is usually formed in the photosensitive receiver, and the diffusion phenomenon begins the interface between the photosensitive receiver and the photosensitive amplifier. The diffusion occurs both in the photosensitive receiver as well. in the photosensitive amplifier depending on the intensity of the actual radiation. As a result, diffusion areas are formed between these two layers. The interference pattern formed in both of these layers or in the photosensitive intensifying layer can be used as a hologram be used. In this case, the photosensitive Amplifier be a perfect body layer and be very transparent. In addition, it is necessary to have an element to use high mechanical strength. ·

That inter-

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ferenzmueter can be converted into a relief pattern, by removing the exposed or unexposed parts. The methods and apparatus for recording a Holograms on a photosensitive receiver can also used for recording a hologram on a photosensitive amplifier v.'erden.

The production of holograms using photo-sensitive elements according to FIGS. 1 to 6 is intended to follow will now be described:

FIG, 8 to 13 show a method of producing a hologram using the apparatus gemäsrs Fig. 7> however, the source of information 8 of 1'.Lg. 7 is replaced by an original pattern T according to FIG. 9 v.'ordon, which is provided with transparent areas B and black patches Λ. Fig. 8 shows the element at the beginning of the process. 9 shows the state in which the element is exposed to the HoIogrammustor, with diffusion taking place between the photo-sensitive intensifying layer and the photosensitive receiving layer in the exposed area, with a diffusion area 12 being formed. According to FIG. 10, the unexposed photosensitive amplifier is then removed by reading. According to FIG. 11, the photosensitive receiver is also removed in the non-illuminated area. According to FIG. 12, the exposed surface of the carrier is exposed to an etching treatment in the area of the unexposed oak. Finally, according to Flg. also the di ff and: locations part 12 removed. If the photosensitive amplifier is thick or the size of the actual radiation is about the same as the thickness of the photosensitive amplifier is small, then the diffusion area is not carried out over the entire thickness of the photosensitive receiver layer and the photosensitive intensifier layer, so that in the area of the surface of the exposed part a photo-sensitive amplifier remains, not because of the diffusion

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sion has participated. In this case, the one in the exposed> Any remaining photosensitive amplifier will be removed as soon as possible the photosensitive intensifier in the unexposed area is removed to achieve the state according to FIG. 10. The removal of the remaining photosensitive amplifier is carried out simultaneously with the removal of the photosensitive amplifier of the unexposed areas «

The patterns formed in FIGS. 9 to 13 form interference patterns that can be used as holograms. If the pattern shown in Fig. 9 is used as a hologram * a photosensitive element is used, which is thin and in a substantially transparent photo-sensitive enhancer layer and has low sensitivity while having a strong hologram exposure on the photosensitive eggs ent is applied while a weak beam of light is used for regeneration.

The arrangements shown in FIGS. 10 to 13 result Holograms with a greater color contrast or a fixed hologram.

The pattern shown in Fig. 10 is usually made by made that the phobosensitive :! before element with an acid solution is treated. Metal photosensitive amplifiers can be dissolved and removed by acid. A amphoteric metal, for example Zixik, can be replaced by a Alkali solution 'can be removed. On the other hand, the Diffusion area not removed by ordinary acid treatment. The pattern shown in Fig. 11 can thereby be produced that the photosensitive Iiehe shown in Fig. 10 Etnpfanger is treated with a solvent that dissolves the photosensitive receiver. Sobiilu the photosensitive The receiver is a chalcocine glass, becomes the dissolution and Removal usually uses an alkali solution. However, if the photoompfindlicho receiver is an organic one

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Photoconductor is usually used to dissolve an organic one Solvent used. If the photosensitive Receiver ultimately a photoconductor from a metal pre-binding is usually an acid solution to dissolve used.

The diffusion area is created in an ordinary acid Alkali solution or an organic solvent usually borrowed not resolved, pan shown in Fig. 12 pattern is thereby produced that the element shown in FIG. 11 is treated with a solvent by which the wearer is attacked. For example, if the carrier is a metal, an acid or an alkali is used, however, if the support is a glass, it becomes hydrogen fluoride used. Finally, if the carrier is a resin, an organic solvent can be used.

At d & m in Figs. 10 through IJ, the method described a positive pattern compared to the original pattern made by removing the unexposed parts of Fig. 9 is removed from ground. However, it is also possible to obtain a negative pattern by using the Diffuctonobo oak can be removed, the low mechanical strength of the diffusion areas being used. The negative pattern is a Pattern in which, the photo-receiving receiver 1 and the photosensitive amplifier 2 at the Flg. 1-Ί exchanged to IC will. The removal of the diffusion area for the formation of a negative pattern is carried out, by the element shown in Fig. 9 in water or a organic solvents, for example alcohol or Tuluen, is exposed, with additional mechanical 'ibrationon in the solvent or on that Kiement are applied. However, there can also be an adhesive tape on the surface

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of the element are applied, which is then removed, wherein the diffusion areas are also removed. However, it is mentions that in processes for the production of a negative pattern by mechanical removal of the diffusion parts the The resolution ratio of the negative pattern is lower than that of positive patterns according to FIGS. 10 to 13.

14 to 18 show a method of making a hologram using the photosensitive element of FIG. 2. The photosensitive enhancer layer is applied to the support, and a photosensitive receiver layer is applied to the photosensitive intensifier layer. The mechanical strength of the diffusion areas in such a photosensitive element is lower than the diffusion areas in the embodiments shown in FIGS. In particular, in the present case the adhesion to the carrier is relatively low. Taking advantage of this fact, the diffusion region of Fig. 14 can be removed by the same method similar to Fig. 9 *. The removal of the diffusion areas according to FIG. 14 can be achieved with the aid of a dilute alkali solution or an acid solution. In this case, the diluted alkali or acid components penetrate between the diffusion area and the photosensitive receiver, the photosensitive amplifier and the support ^ whereby the diffusion areas are cut out of the photosensitive element .. If the photosensitive receiver is chalcogen glass, aqueous alkali solution not only removes the diffusion areas but also the photosensitive receiver. The removal of the diffusion areas is faster than that of the photosensitive receiver. In this way, the pattern shown in Fig. Vj results. If the photosensitive receiver layer is too weak compared to the radiation applied in the context of FIG. 1A, then the photoem-

- 26th

309808/0824

BATH

ΙΑ · "-V ^ fSTJTV-Ö

sensitive receiver layer and photosensitive amplifiers not a diffusion area but a part this photo-sensitive receiver and photo-sensitive amplifier is not involved in the diffusion process. In in this case, the diffusion area after removal of the photoenipfendlichen receiver layer in the exposed area removed. The distance can be at the same time as the diffusion area using a dilute alkali solution. The cough shown in Fig. 15 can be in another Pattern to be converted. According to Fig. Io v / ird the photosensitive Receiver removed while goinäns Fig. 17 a The etching process of the exposed substrate of FIG. 15 was carried out will. According to Flg. 18 becomes the exposed surface of the Element of Fig. 16 felted. The element shown in FIG. 19 is made by removing the photosensitive amplifier 3 shown in FIG.

The removal of the photo-sensitive receiver, the photosensitive one The amplifier and the etching of the substrate are carried out using the methods described in FIGS. 10-13 carried out. Each of the elements shown in FIGS. 14-19 can be used as a hologram. The in Figs. 16, 10 14 and 19 can be used as immutable holograms. Those shown in Figs On the other hand, patterns can be used as holograms by carrying out irradiation, whereby the protruding Parts of the pattern are converted into diffusion areas.

20 and 21 show a method using a photosensitive element according to FIG. 3 · D ^ft s in FIG. The pattern shown in FIG. 21 is produced by removing the non-illuminated parts of the element of FIG. The removal of the

- 27 309808/082 4

BAD ORIQtNAL

A solvent that dissolves the photosensitive receiver is used to reach the dead area. The dispersed photosensitive amplifier 3 is removed at the same time. The photosensitive receiver can be removed using the same method as in FIG. 11. The pattern of Fig. 21 can be converted to the in Fig. 12 and patterns shown ¹ IJ. The patterns shown in Figs. 20 and 21 can also be used as holograms. The pattern shown in Fig. 21 gives an invariable hologram. -

The formation of a hologram using a photosensitive Elements according to FIG. 4 can be carried out in a manner similar to that in FIGS. 20 and 21. Since the diffusion area of the phato-sensitive element according to FIG. 4 in particular in view of its mechanical strength is very weak, these diffusion areas can after the in 15 are removed, so that a positive pattern according to FIG. 6 compared to the original Pattern results.

The pattern formed by a photosensitive element according to FIG. 4 can be that of FIG. 20, 21 and 16, each of these patterns can be used as a hologram. If the support of these patterns is etched in the manner shown in FIGS. 12, 1J>, 18 and 19, holograms of other patterns result.

20 to 24 show a corresponding method of manufacture of a pattern using a photosensitive Element "according to FIG. 5". According to FIG. 22, a photosensitive one becomes Amplifier 5 in gaseous form in contact with the surface of the photosensitive receiver 1 of the

- 28 -

308808/082 / ». BAD ORfGJNAt.

photosensitive member of Fig. 5, followed by actinic irradiation through an original onto the photosensitive member. Diffusion areas are thus formed by diffusion of the photosensitive amplifier into the photosensitive receiver on the exposed surface. Ergi in the unexposed parts * bt a photosensitive layer amplifier '5 because the photosensitive amplifier droplets do not diffuse but only brought to precipitation. By removing the photosensitive intensifier layer 5 in the unexposed areas 2j5, a fixed pattern according to FIG. 2j5 is then formed. Subsequent removal of the phoijoemp.findlichen receiver results in a pattern according to FIG. 24. The removal of the photosensitive receiver and the photosensitive amplifier can be carried out by the same method as with the pattern of FIGS. The patterns shown in FIGS. 22 to 2k can also be used as holograms. The elements shown in FIGS. 2 *> and 2k can serve as fixed holograms. The pattern shown in FIG. 2k can be converted into the pattern shown in FIGS. 12 and 15. The pattern shown in Fig. 22 can be converted into a series of patterns as shown in Figs. 16 and 19 by using the method of making the pattern of Fig. 15 and removing the diffusion areas to form a positive pattern.

Figs. 25 and 26 incline processors to produce a pattern using eiras photosensitive element according to Fig. 6. According to Fip; 25 is a photo sensitive receiver 1 in gaseous form with the photoonipfluxional amplifier layer 3 of the photosensitive element of Fig. 6 brought into contact, whereupon an actinic irradiation is carried out, under which diffusion areas are formed by the photo-

- 29 309808/0824

Sensitive receiver diffused into the photosensitive amplifier in the exposed areas, while a photosensitive receiver layer 1 is formed by precipitation in the non-exposed areas. The diffusion regions formed in this way have a low mechanical strength. The pattern shown in FIG. 26 can be obtained by using the method described in connection with FIG. The patterns shown in Figs. 25 and 26 can be used as holograms. The pattern shown in Fig. 26 can be converted into a pattern in which the protruding parts of the pattern are converted into diffusion regions, and the resulting pattern can also be used as a hologram. The pattern shown in FIG. 26 can be converted into patterns according to FIGS. 16, 18 and 19. In the embodiments shown in FIGS. 9, 14, 22 and 25, the exposure can also be carried out from the side of the carrier. In the foregoing, methods for producing holograms were explained. However, the methods used represent only a part of all possible methods, so that the present invention is not intended to be restricted to the methods described.

In the context of the present invention, acid or alkali solution can be used as the acid or alkali solution for the production of the pattern. Such acids are, for example, hydrochloric acid, nitric acid, sulfuric acid, fluoric acid and the like, a chromic acid mixture (K2Cr-207-H2S0 ⁱ i), nitrogen nitrate, nitrogen persulphate, iron-III-chloride ^ Elsen-III nitrate, red prussiate-potassium-bromine mixture «Corresponding alkali solutions are aqueous or alcoholic hydroxides of sodium, potassium, calcium or barium, aqueous ammonia and the like. The samples produced can also be treated if desired. If the carrier is electrically conductive and the photosensitive amplifier is metal, then the element can be coated so that a relief layer is produced on the carrier. The formation of such a

309108/0824

Metal layer is based on a phenomenon called metal in chalcogen glass diffuses, resulting in a diffusion area, in which the resistance is about 10 ^ ohm / cm. Applying the additional layer to the diffusion area occurs during the period during which the high resistance layer is in the non-exposed It is gradually dissolved in the plating liquid will.

Regarding the fixing process, it should be mentioned that if the Sample according to B'lg. 9 and 22 a photosensitive layer made of metal, for example silver or copper, or an alloy of copper or silver on v / eist, this metal or alloy converted into the iodide or bromide form as a result of which transparent and inactive substances are formed. The chemical reactions that occur are like follows:

2Ag + I ₂ > 2AgI

If the photo-sensitive amplifier has a metal layer it can be removed by amalgation with mercury will. If the photosensitive receiver layer. is a chaikogen glass and if this is a chalcogen glass Contains halogen, a pattern results in which there is a change in light transmittance in the exposed area is negligibly small, so that this master is particularly suitable as a phase hologram. The pattern is in the diffusion areas depending on the permeability factor observed. That part in which the photo-sensitive amplifier layer is generated by radiant energy Diffused into the chalcogen glass results in a reduced permeability factor. The measurement of the spectral Permeability factor shows that the absorption end is shifted in the direction of greater wavelength. A

- 31 3098 08/082A

Such a pattern is formed by a change in the optical density or a decrease or increase in the reflected Light takes place due to a difference in absorption. The information is in the form of a visible Image recorded. In case the same is used as a hologram will result in an amplitude hologram, which, however, is not very desirable.

However, it could be determined that if a halogen dom chalcogen glass is added, the absorption end is not shifted even if the photosensitive amplifier is made to diffuse by actinic radiation « The transmission factor is not significantly changed, but the refractive index is influenced so that results in a phase hologram. Substantial bleaching is achieved by the reaction of the metal and the halogen. When a halogen is added, the sensitivity of the photosensitive member is also advantageous enlarged.

Iodine and bromine can preferably be used as halogen. However, chlorine and fluorine can also be used in this combination slope can be used. In the following description, the present invention in connection with iodine by way of example described.

The amount of iodine to be added is limited by experience. If the iodine mengo is too big, the melting point will be and the glan transition point is significantly reduced, so a disadvantageous softening or crystallization of the glass takes place even at room temperature.

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the mechanical strength is reduced early on. The maximum amount of iodine to be added depends on the composition of the chalcogen glass. It appears to be desirable to limit the iodine content to such values that the glass transition temperature is higher than 50.degree. The amount of iodine corresponding to this value is less than 80% by weight, preferably less than 60% by weight. If the amount of iodine is less than 0.01 % , the displacement of the absorption end becomes relatively large, which is also undesirable. Particularly suitable subordinates of iodine are more than 0.1 %. As soon as iodine is added to As ₂ S-, a chalcogen glass is obtained which contains one silver atom per 10O atom of chalcogen glass, the ratio of the absorption shift (Δ Λ.) And the iodine content being given in FIG. 27 and the following table.

Weight percent of added iodine {%)

Absorbtionsyerechrift Δ λ. (in / 0 80 3-5 20th 16.8 13th 25.0 6th 52.0 0

As can be seen from FIG. 27, the addition of small amounts of iodine causes a considerable change in Λ λ. .

From the foregoing it follows that the addition of a Ha-1 ogen in dao chalcogen glass is very wiris * .cam. DieGer desirable Effect can also be achieved with a ·: photosensitive element according to FIG. 1 bit; 6 can be used.

30Θ808 / 0824 BADORIÖINAI.

Pig. 28 shows an element 14 with a relief pattern which is derived from a relief pattern according to FIG. 6 to 26 has been produced.

29 shows an optical system for regenerating image information from a reproduced hologram according to FIG. 28. The light beam emitted by a laser 5 is enlarged by an inverted telescope 6 and exposes an element with a relief pattern 14 as a reference beam. A primary source light 15 * that is, the waveform generating light exhibits good diffraction efficiency because the element 14 is an excellent phase hologram. The recording and regeneration of a hologram can be carried out at the same time. It is therefore possible that the light to which the photosensitive element is sensitive, that is, a coherent light beam with a wavelength corresponding to the spectral sensitivity range of the photosensitive element is projected onto a hologram, while at the same time a regeneration of the hologram using a light with a wavelength outside the spectral sensitivity is used as a reference beam. In this case, argon light with 4,880 R is preferred as coherent light and a helium-neon light with a wavelength of 6,328 J as reference light beam. used.

A hologram with a relief interferrogram causes a phase contrast, a non-linear contrast in relation to the radiation intensity, so that the fraction light is higher Order can be regenerated with high efficiency The remaining distance in the interference pattern is very much reduced so that a very precise measurement is possible.

In the context of the present invention, it appears to be very

3098G8 / Ö824

advantageous to use a hologram with an interference pattern, which is formed by using various photosensitive plates as the original pattern, the original pattern is projected onto a photosensitive plate, which in the context of the present invention 2 for the reproduction of the Interference pattern is used. In your case that is Original-> mucter already has an Intcrfei-onzmuster in the form of a Holograms, so that it is not necessary that the Bosi ~ radiation light for the original pattern coherent light is. Accordingly, visible light or ultraviolet light can be used very satisfactorily. The original pattern can of course be a pattern which in the dome exposed part according to Flg. 1 to 6 is present. In die.ο com Context, it seems very useful that, if the Interference pattern applied to a photographic plate with a silver-salt coating as the original pattern is turned on while reproducing the interference pattern Photosensitive member according to the present invention is used.

For example, if the in Figs. 9, 14, 20, 22 and 25 illustrated embodiments the original pattern P a Interference pattern of a Hdosramm on a silver-salt ■ Plate is with the light and shadow interference pattern appear before the bleaching process, then it becomes the original Interference patterns generated on a photosensitive element by exposure to ordinary light will. The reproduced pattern can be in various relief patterns in accordance with the embodiments of FIGS. 9 to 26 brought v / earth.

Ea appears to be very useful, an interference pattern that has already been formed reproduced on a photosensitive element as a hologram for the following reasons:

- 25 -309808/0824

BADORIQfNAL

a) The reproduced pattern has a phase-enhancing effect Effect on.

b) The pattern reproduced is mechanical in terms of Strength as well as the durability of a whitening rust superior to a silver-salt layer. ·

c) A relief pattern can be reproduced by a printing method of an original relief pattern using a resin film co will.

d) A light and shadow interference pattern on one very sensitive silver salt plate can be on a photosensitive Element to achieve a hologram can be reproduced without the need for a blelch process were.

By using a photosensitive member with a wide dynamic range in terms of spectral photosensitive Characteristic, can be a Fourier transform hologram recorded and regenerated, resulting in a high density hologram.

The advantages of the present invention can thus as can be summarized as follows:

The sensitivity of the photosensitive element can be very high can be greatly increased, the sensitivity at least equal to or higher than that of a silver-salt plate -with high Resolving power can be made. As a result, the exposure time can be shortened, so that the disadvantageous The influence of vibrations is avoided. As a result, holograms can be generated without creating large beds

303fl03 / Q824 ÖAD ORIGINAL

for setting up the device to avoid Vibrations are used.

The Bohandlunyszeit up to the development can be made so short that a regeneration in real zej thologrcphic is possible. This point is particularly true in the case of using holography for accurate measurement. This same Ze.it between the production of a Hc.üo. ;; ramming until regeneration · cheating at least one hour, including development, fixing, water washing, and re Blelchung V / asr.erwaschung wherein zwz'Jizl I 1st a special treatment space necessary . Within the scope of the present invention, the development can be carried out with the aid of the ion :;] i elites project, so that real-time holography is possible. The treatment steps such as fixation and etching only take parts of minutes. The refraction g ε effective! ·; ei t vrii d improved by the fixed state or the etching, the non-linear photosensitive characteristic essentially enables real-time regeneration. The individual process steps are εο simple that any space can be used. The whole process can be done in one. Pres I εions «measuring device can be carried out.

A shrinking of the photoenipinicular layer of the photosensitivity Elements does not occur. As a result, optical measurements with Farbho] ographic and accurate regenerations fine pictures often have difficulties

It is also possible that Reljcfmuister generated by etching such a Holocrarmielements gemüss of the present invention to a Plaetikkorper \ i transmitted, consequently Holo programs ε ore h.orr effectively and at low cost; estellt who can. In the context of the present »invention, di

3 OSRC C ' O 8:> i

rectem VJege a main reproduction element can be produced, which in terms of its reproductive properties is much better than previously known devices. According to the previous one The state of the art includes a hologram on a silver plate formed, thereupon the hologram on a photoresistor transferred, arinchliessond a relief he must on the photowider. ^ t and applied, whereupon the resistance finally drops is coated with a metal layer so that d.ie The artwork has sufficient strength.

Since the photoerr.pfincUiehö element in the Kahr.ien der V03? Li legends Invention has a wide dynamic range, in which reciprocal actions can be applied, can thus holograms generated by the light of a body that has a high contrast. Furthermore, Fourier transform holograms are produced, in which a LJ chtzentratlon takes place from a very small body. As a result there is a possibility of high density recording

to undertake. The hologram according to the present invention can be used as a high density storage element for data processing.

In the following, examples are given which areas of application of the present invention show:

Example 1

A layer of chalcogen ^ las ASpS _v with an iodine content of 25 fo vmrde applied by steam coating with a thickness of 500 m, -u on a 1 mm thick white glass plate. Subsequently, Ag with a thickness of

309 8 06/0824

30 m / rev is applied to the chalcogen glass layer. The element produced in this way was very strongly irradiated from the south side with a high-pressure queek silver lamp from PJjO Watt at a distance of 25 cm.

During the irradiation, between the chalcoco glass look and the silver layer, a peaching process occurs, in which the silver layer is deposited in the chalcoceal clear, so that the metallic color disappears. The light-permeable chain of the element improves with xus.'itr.l icher exposure time, whereby, the spectral dependence in Pig. &Quot; O is shown. DJ e & e Fif ¹ ;, shows the spectral transmittance at different times of exposure. It thus appears plausible that the silver layer has practically completely disappeared after an exposure of about 50 minutes, because the spectral transmittance in this case essentially corresponds to the spectral transmittance Re, at which no silver layer has been diffused. If such an element is used as a phase hologram, the metal layer remaining on the surface should be removed. The removal of the metal layer on the surface appears necessary in order to prevent gradual exposure of a highly sensitive photosensitive material to natural light. An oxidation bath, in particular an acid bath, is suitable for removing the metal layer. Examples of such acids are mixtures of sulfuric and chromic acid, nitric acid, ammonium nitrate solution, Elsen-III-nitrate, ammonium persulfate and the like. *

Example 2

A chalcogen glass layer Aa ₀ Se 'Pe _{1 K} with an iodine content of

- 39 - 309808/0 824

20 fä was applied by brief evaporation with a thickness of 100 m / rev on a glass plate, then a semitransparent silver layer with a thickness of 50 m λι was applied. A Fourier transformation hologram was carried out by bringing this element into the focal plane of a lens which had a focal length of 100 mm. The beam of an argon-ion laser with 150 mW scum diarrhea was brought through this lens. The 'exposed area. on .the surface of the element was about

2
1 cm, while the exposure was completed in about 1/10 of a second.

The remaining silver layer is then removed and the hologram is regenerated. It was found that the image could be regenerated with a DifTraktionswirksamkeit of about ¹ K) $.

Example J> _

A molten chalcogen glass made of As ₀ S-, with a bromine

d j>

Br content of JO % by weight was obtained by adding AsBr-, and S, with AKpS, being formed. Melting took place in an argon atmosphere below 55O ⁰ O and an atmospheric one

k for three hours. The molten element was placed on a base plate with a thickness of approximately 5 / U. The temperature of the molten element during the coating was about 100 ° C, but the liquid state was maintained. The plate produced in this way obtained its photosensitivity by cooling it very strongly, after which a thin layer of copper was vapor-coated. As a rhasenholotfrarmn, this element gave exactly the same results as in Examples 1 and '? ..

3 0 9 C <0 8/0 a 7th C.

Example 4

ASj (Se ^ Te ₂ , was applied by vapor deposition:! T to a thickness of about 0.5 m on a very flat glass plate, after which a silver layer with a thickness of 20 m Ai was deposited. The element thus formed was used to carry out real-time holography The gloss and the amount of deformation of the element 16 by the application of an external force 17 were determined, and the interference pattern formed is shown in FIG.

The optical system of FIG. 3I consists of an argon laser 5 with a wavelength of 4,880 A and an output power of 500 mW, a diaphragm 18, a beam enlarger 6, a flat reflection mirror 19, the surface 20 to be measured and examined, a beam splitter 7, an already mentioned photosensitive element 9, a helium Ne laser 21, a primary diffraction light beam 22, a camera 24 photographing the interference pattern, interference filters 23, 23 'for 6,328 ft, a primary diffraction ion light beam 22', a diaphragm 30, and a photoelectronic multiplier 33. The photoelectronic multiplier 33 is used to measure the intensity of diffraction light to indicate the regeneration efficiency. The shutter 18 closes when the regeneration effectiveness has reached its maximum value. The laser 21 is used to determine an optimal exposure. As soon as the exposure before the deformation of the body surface 20 becomes almost sufficient, an external force 17 is applied in order to deform the surface 20. At this point, the light from laser 5 is reduced while the light from laser 21 is switched off in order to create the interface: -

3 iJ 9808/0824 BAD

pattern according to the deformation to be observed. The resulting interference pattern is shown in Fig. J52.

The above-mentioned hologram element was washed in a 1% aqueous solution of Fe (NO ^) ₇ for 5 seconds, whereby the silver layer was removed and fixation took place. Then an argon laser was used in the He-Ne laser, so that regeneration was efficient and easy to carry out over a long period of time. could be carried out. The element was etched with a 0.5 H aqueous solution of NaOH, resulting in a relief pattern in a non-linear relationship with the light intensity of the hologram pattern. In this case, the etching took place in adaptation to the non-linear development.

The phase hologram thus formed shows a higher-order diffraction light, if a phase amplitude method is carried out using interference between the higher-order scattered waves, then an interference pattern results whose interference distance λ / ίο corresponds, so that a deformation of Λ. / 100 is measured very easily could be. A- corresponds to the wavelength. If a silver-salt emulsion is used, a shrinkage of the emulsion layer of approximately 2 Ai occurs, so that the phase amplitude method is limited to a value of iX / 100. In the context of the present invention, however, values of A- / 100 to X / 1000 or even lower can be measured by making slight changes.

Example 5

Fig. 33 shows an optical system for generating a Fourier transform hologram. The optical system consists of

- 42 -

309808/0824

BATH

an argon laser 5, a beam splitter 7, a reflection mirror 19, an objective lens of a microscope 25, a pinhole 26, a collimator lens 27, a transparent positive microfilm 28, a lens 29, a mask 30, one constructed according to the present invention photoegipfindlichen element 31, as well as a fine adjustment 32. The force lengths of the lenses have the fourth F and F ¹ . The image on the transparent positive microfilm corresponds to a page of a magazine.

When performing Fourier transform holography in connection with such a transparent image, there is a very weak scattered radiation during the light incident directly on the photosensitive element is very strong. As a result, it is relatively difficult to get one Unless the dynamic range of the photosensitive element is sufficiently wide. As a result silver-salt emtilsions are not in this case usable, but can within the scope of the present invention holograms are generated for this application, in which there is a high information density.

The photo-sensitive element consisted of a flat glass plate made of AScS ₇₁ Te. * With a thickness of 1 M and a copper layer of approximately ² K) max. A fixation was performed by placing a ?. # aqueous aqueous reading of ammonium persulfate was caused to act on the hologram for 10 seconds.

Example 6

A layer of one of

309808/0924 BAD ORtGfNAL

As ₀ Se ₇ TeGe _{n κ} applied by evaporation. A thin layer of silver was then applied. The element was be-1 fixed ichtet and "like-in etched Example 4, so a hologram ^ Daraufhin'wurde that resulted with relief pattern, a thermoplastic film, for example polystyrene or Vinylpolyrneren with a temperature of 100 -. * 150 ⁰ C. the relief pattern is imprinted by placing these two elements between

, W al en
see heated / pushed through. This transferred the relief pattern to the thermoplastic material. The obtained reproduction of the hologram was used to produce an image with good results.

Example 7

The procedure of Example 6 was repeated except that a copper foil was adhered to the polyester film in place of the triacetate film. Furthermore, a chalcogen glass melting at low temperatures, As ₀ SeJ-Te-. _c with an iodine content of 20 percent by weight applied to the copper layer by melting. After the exposure, the chalcogen glass layer was removed from the copper layer, resulting in a relief pattern corresponding to the exposure pattern on the copper foil. The relief pattern thus formed was transferred to a transparent film so that a hologram could be reproduced in a similar whiteness as in example 6.

Example 8

A Chalkogenglacschicht ASpSe ^ -Ge ^ and a metal layer with an alloy Cu _v> gq ^a S £ ₀ j_ was used. That by it

309808/0824 BAO ORIGINAL

formed element was exposed to a hologram pattern, during which time heating by an infrared lamp of the side took place. When the element was heated to approximately 80 ° C, the necessary exposure

Q 7 O

energy to about 1/10, i.e. from about 10 to 10 erg / cm. The element thus produced was poor in sensitivity, but the mechanical strength was very large.

Example 9

A thin layer of a poly-9-vinylcarbazole a few Ai thick was applied to a glass plate. This layer was sensitized with carbazolylmethane dye so that the layer became sensitive to visible light. An extremely thin layer of silver, approximately 10 nyu, was then applied to the poly-9-vinylcarbazole layer. After exposure, development was carried out using the silver layer as a nucleus for physical development. The silver layer was sufficiently strengthened, while the exposed area was etched with benzene to fill in a relief pattern. The silver layer was then removed, eo datis sioft g good Phaeehnolo-? Amn revealed. *

Example 10

• ■

A layer of PbI ₂ was applied to a glass plate by the application of steam, after which a layer of an alloy of Af (50) and In (70) was applied to the coated plate. The values given in brackets correspond to

309808/0824

BAO ORIGINAL

the weight percent. By using such a Elements, a hologram could be created which had a high resolving power and that with regard to it Regeneration allowed good results.

Example 11

An element was produced by applying a chalcogen glass layer ASpTe ₇ S on a glass plate, whereupon a silver layer was applied to the chalcogen layer, followed by exposure with an energy of 10 erg / cm. The element could be exposed to an argon laser at an exposure time of 1/100 second, so that a good hologram could be obtained even if a shock absorbing bed was not used.

Example 12

An AgSc-Te _n , layer with dispersed Ag was cut out from a block with the aid of a wire cutter and ground to a thickness of about 100 m / rev. Subsequently, a slight etching with a weak alkali solution was carried out. The element thus produced was exposed to a light of 4,880 A, while the regeneration took place under a light of 6,328 A. The angle between the light from the body and the reference source during exposure was set to 30 °, which corresponds to approximately 1000 lines per millimeter of the carrier frequency. The hologram exposure was carried out 20 times by tilting the element every J5 °. Every exposed sample was then accurate

- 46 -

3098 08/082 A BAD ORIOINAL

separated at the time of regeneration. The photoempElndliche Element according to the present invention can therefore be used for three-dimensional exposure, so that see results in a very large storage capacity. As a result, high capacity photo memories can be manufactured.

example

A shift from AsJSt. was applied by vacuum evaporation to a thickness of 200 m ax on a glass plate. The vacuum was 5 × 10 * while the temperature of the glass plate was kept at 150 ^° C. Subsequently, silver was applied to the ASpS layer by vacuum vapor deposition with a diameter of 20 ni / rev. After the hologram the remaining metal parts by a chromic acid mixture were ■ beliohtung (HpSO ₂ + K ₂ Cr ₂ O _1,) - removed while the layer of A3 ₂ S ^ _{ln n} i _C htbelichteten areas by an alcoholic solution of 0.5 N sodium hydroxide was removed. The holographic pattern was produced on the exposed part of the glass plate. The pattern was then converted into a strong curvature of the stable layer and the glass plate was etched using hydrofluoric acid. The layer resistant to strong acids was removed by placing it in the chromic acid mixture for a long period of time, thereby creating a glass plate with a relief. This relief glass plate represented an almost complete phase hologram, and showed a deffr action efficiency of up to about 50% . The hologram is mechanically very durable and chemically resistant.

309808/0824

JMiI-. : fiO C ■ BAD ORIGINAL

Example l4

A plate of high resolution with a silver salt emulsion 6 ^ 9F (from Kodak) was exposed to a hologram pattern according to the known method and developed to form an amplitude hologram. The hologram formed was brought into contact with a photosensitive element, which consists of a glass plate, a chalcogen layer of ^As 30 ^Se 45 ^Ge 10 ^S 15 ^{with a thickness: e}

30455

of 500 m / rev and a silver layer of 20 m / rev.

This was followed by exposure to the light of a xenon lamp done to print a hologram pattern. '

5 6 The amount of exposure was between 10 and 10 !, upesee, achieving practically identical results became. In the case of a phaser hologram by bleaching With a silver-salt emulsion, no irregularities occurred, but rather a stable and very reproducible one Result. The printed element was immersed in an aqueous solution of Eieen III chloride, whereby the Silver layer removes me. The resulting hologram had a higher surface strength and durability than a hologram, a silver, salt, and emulsion. The one made in this way Item was made with an OO N alcoholic solution etched by NaOH, which removes the unexposed parts became. As a result, a relief pattern was created. This relief pattern could be used as a Drtfiskvorlage hologram

ο by heating to 100 C, whereupon a warm polystyrene film is pressed against it with the help of a roller became. The relief pattern was transferred to the polystyrene film. In this way one could be very A large number of holograms can be reproduced.

309 808/08

BATH ORIGINAL

^ - ^ VjJy XVC ⁴ AS.

Claims (22)

Claims Hologram with an interference pattern, thereby. that it is from a ddfflisionster calibrate one photoe ^ sensitive element is formed from a a photo-sensitive receiver containing a photoconductor and a photosensitive amplifier used in Irradiation diffuses into the photoconductor, and these two elements can be arranged in the following manner a) the two elements are arranged in the form of layers arranged one above the other, b) one element is provided in the form of a layer, while the other element is provided in the form of a dispersion is present within the first element, c) one element is provided in the form of a layer while the other element comes into contact with the surface of the first-mentioned layer as soon as irradiation takes place. 2. Hologram according to claim 1, characterized in that it is marked that the diffusion areas through the light reflected from an object to be reproduced and a reference beam are produced. 309808/0824 Jt'A'pVlQ BATH ORIGINAL 3. Hologram according to claim 1, characterized in that that the diffusion areas are generated by exposure of an original pattern whose interference pattern as Hologram are usable. 4. Hologram according to claim 1, characterized in that the photosensitive receiver, at least has a photoconductor which is selected from the group of substances such as chalcogen glass with at least one element such as sulfur, Selenium and tellurium, an organic photoconductive compound, metal halide, metal sulfide, metal selenide, Metal telluride and metal oxide is selected. 5. Hologram according to claim 4, characterized in that »the chalcogen glass contains a halogen. 6. Hologram according to claim 1, characterized in that the photosensitive amplifier consists of a the substances of the group of silver, zinc, cadmium, manganese, gallium, chromium, copper, indium, bismuth, tin, thallium, Consists of germanium and tellurium. . 7. Hologram according to one of the preceding claims, dad.urch marked that a relief interferrogram formed by removal of one of the essential elements in the area not participating in diffusion is. 8. Hologram according to claim 7> characterized in that the relief interferrogram by distance of both essential elements is generated in those areas in which diffusion has not taken place. 309808/0824
BAD ORfGINAU 9. Hologram according to claim 7, characterized in that that within the layer of one essential element the other essential element in finely divided form Shape is present. 10. The hologram according to claim 7, characterized in that the relief interferrogram is transmitted by pressure is transferred to another element). 11. Hologram according to one of the preceding claims., Characterized in that the exposed diffusion areas the photosensitive member by peeling it off are removable. 12. Hologram according to claim 11, characterized in that that the Rftlief-Interferrogramra in another Rclief-Interferrogram is converted, in which the diffusion areas are exposed to further exposure. 13 hologram according to claim 11, characterized in that that the relief interferrogram by removing one of the two essential elements is produced in the unexposed areas of the photosensitive element, after the diffusion areas have been removed by peeling bind. 14. Hologram according to claim 11, characterized in that that the relief interferrogram is transmitted by pressure transmission to a transfer element. 15 · Hologram according to claim 13, characterized in that the relief interferrogram by pressure transmission is transferred to 6in transfer element. - 51 -309308/0824 BATH ORIGINAL ⁰ 16. Hologram according to one of the preceding claims, characterized marked that the unexposed areas of the carrier after the removal of the essential 2 elements are exposed to corrosion in the unexposed areas of the photosensitive element. 17. Hologram according to claim 16, characterized in that g e k e η ns o> i c h net that the relief interferrogram into a relief interferrogram is converted, in which the diffusion areas at the exposed areas of the photosensitive element removed by peeling them off. 18. Hologram according to claim I7, characterized in that that the relief interferrogram is transferred to a transfer element by pressure transfer. 19. Hologram according to claim 17 * marked thereby t that the relief interferrogram by pressure transmission is transferred to a transfer element. 20. Hologram according to one of the preceding claims .due to this marked that a relief interferrogram by etching the exposed areas of the support of the photosensitive element after the diffusion areas have been peeled off of the photosensitive member is generated. 21. The hologram as claimed in claim 20, characterized in that it is marked e t that the relief interferrogram is transferred to a transfer element by pressure transfer. 22. Hologram according to claim 20, characterized in that that the relief interferrogram is converted into a relief interforrojjr & Tjn is converted by exposing the diffusion areas to further exposure. 309808/0024 Blank page