CN203658561U - Single-chip reference bridge type magnetic sensor for high-intensity magnetic field - Google Patents
Single-chip reference bridge type magnetic sensor for high-intensity magnetic field Download PDFInfo
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Abstract
Description
技术领域 technical field
本实用新型涉及磁传感器技术领域,特别涉及一种用于高强度磁场中的单芯片参考桥式磁传感器。 The utility model relates to the technical field of magnetic sensors, in particular to a single-chip reference bridge magnetic sensor used in high-intensity magnetic fields.
背景技术 Background technique
磁传感器广泛用于现代工业和电子产品中以感应磁场强度来测量电流、位置、方向等物理参数。在现有技术中,有许多不同类型的传感器用于测量磁场及其他参数,例如霍尔(Hall)元件,各向异性磁电阻(Anisotropic Magnetoresistance, AMR)元件或巨磁电阻(Giant Magnetoresistance, GMR)元件为敏感元件的磁传感器。 Magnetic sensors are widely used in modern industries and electronic products to measure physical parameters such as current, position, and direction by inducing magnetic field strength . In the prior art, there are many different types of sensors used to measure the magnetic field and other parameters, such as Hall elements , Anisotropic Magnetoresistance (AMR) elements or Giant Magnetoresistance (GMR) A magnetic sensor whose element is a sensitive element.
霍尔磁传感器虽然能在高强度磁场中工作,但灵敏度很低、功耗大、线性度差等缺点。AMR磁感器虽然灵敏度比霍尔传感器高,但其制造工艺复杂,功耗高,并且不适用于高强度磁场。GMR磁传感器相比霍尔磁传感器有更高的灵敏度,但其线性范围偏低,并且也不适用于高强度磁场。 Although the Hall magnetic sensor can work in a high-intensity magnetic field, it has disadvantages such as low sensitivity, high power consumption, and poor linearity. Although the AMR magnetic sensor has higher sensitivity than the Hall sensor, its manufacturing process is complicated, the power consumption is high, and it is not suitable for high-intensity magnetic fields. GMR magnetic sensors have higher sensitivity than Hall magnetic sensors, but their linear range is low and they are not suitable for high-intensity magnetic fields.
TMR(Tunnel MagnetoResistance)磁传感器是近年来开始工业应用的新型磁电阻效应传感器,其利用的是磁性多层膜材料的隧道磁电阻效应对磁场进行感应,其相对于霍尔磁传感器、AMR磁传感器以及GMR磁传感器具有更高的灵敏度、更低的功耗、更好的线性度以及更宽的工作范围。但现有的TMR磁传感器仍然不适用于高强度磁场中工作,并且线性范围也不够宽。 TMR (Tunnel MagnetoResistance) magnetic sensor is a new type of magnetoresistance effect sensor that has been applied in industry in recent years. It uses the tunnel magnetoresistance effect of magnetic multilayer film materials to sense magnetic fields. And the GMR magnetic sensor has higher sensitivity, lower power consumption, better linearity and wider working range. However, the existing TMR magnetic sensors are still not suitable for working in high-intensity magnetic fields, and the linear range is not wide enough.
发明内容 Contents of the invention
本实用新型的目的在于克服现有技术中存在的以上问题,提供一种适用于高强度磁场中的单芯片参考桥式磁传感器。 The purpose of the utility model is to overcome the above problems in the prior art and provide a single-chip reference bridge magnetic sensor suitable for high-intensity magnetic fields.
为实现上述技术目的,达到上述技术效果,本实用新型通过以下技术方案实现: In order to achieve the above-mentioned technical purpose and achieve the above-mentioned technical effect, the utility model is realized through the following technical solutions:
本实用新型提供了一种用于高强度磁场的单芯片参考桥式磁传感器,该传感器包括: The utility model provides a single-chip reference bridge type magnetic sensor for high-intensity magnetic fields, the sensor comprising:
一个基片; a substrate;
至少一个沉积在所述基片上的参考臂,所述参考臂包含有至少一行/列由一个或者至少两个相同的磁电阻传感元件电连接构成的参考元件串; At least one reference arm deposited on the substrate, the reference arm includes at least one row/column of reference element strings composed of one or at least two identical magnetoresistive sensing elements electrically connected;
至少一个沉积在所述基片上的感应臂,所述感应臂包含有至少一行/列由一个或者至少两个相同的磁电阻传感元件电连接构成的感应元件串; At least one sensing arm deposited on the substrate, the sensing arm includes at least one row/column of sensing element strings composed of one or at least two identical magnetoresistive sensing elements electrically connected;
至少一个衰减器和至少两个屏蔽结构,所述衰减器与所述屏蔽结构相交错间隔地排列,所述衰减器和所述屏蔽结构的形状相同,所述屏蔽结构的宽度和面积分别比所述衰减器的宽度和面积大; At least one attenuator and at least two shielding structures, the attenuators and the shielding structures are arranged alternately and at intervals, the attenuators and the shielding structures have the same shape, and the width and area of the shielding structures are respectively larger than the The width and area of the attenuator are large;
所述参考臂与所述感应臂连接构成一电桥; The reference arm is connected to the sensing arm to form a bridge;
每个所述参考元件串上对应设置有一屏蔽结构,每个所述感应元件串上对应设置有一衰减器,所述参考元件串位于所述屏蔽结构的下方或上方,所述感应元件串位于所述衰减器的下方或上方; Each of the reference element strings is correspondingly provided with a shielding structure, and each of the sensing element strings is correspondingly provided with an attenuator, the reference element strings are located below or above the shielding structure, and the sensing element strings are located at the below or above the attenuator;
所述参考元件串和所述感应元件串的行/列数相同,并沿纵向或横向相间隔排布; The number of rows/columns of the reference element string and the sensing element string are the same, and they are arranged at intervals along the longitudinal or transverse direction;
所述感应元件串处磁场的增益系数大于所述参考元件串处磁场的增益系数。 The gain coefficient of the magnetic field at the induction element string is greater than the gain coefficient of the magnetic field at the reference element string.
优选的,构成所述参考元件串和构成所述感应元件串的所述磁电阻传感元件为选自AMR、GMR、TMR传感元件中的一种。 Preferably, the magnetoresistive sensing elements constituting the reference element string and the sensing element string are selected from AMR, GMR, and TMR sensing elements.
优选的,所述磁电阻传感元件为GMR自旋阀结构、GMR多层膜结构、TMR自旋阀结构或者TMR三层膜结构。 Preferably, the magnetoresistance sensing element is a GMR spin valve structure, a GMR multi-layer film structure, a TMR spin valve structure or a TMR three-layer film structure.
优选的,所述电桥为半桥、全桥或者准桥。 Preferably, the electric bridge is a half bridge, a full bridge or a quasi bridge.
优选的,所述感应臂和所述参考臂上的所述磁电阻传感元件的个数相同。 Preferably, the number of the magnetoresistive sensing elements on the sensing arm and the reference arm is the same.
优选的,每个所述感应元件串与相邻的所述参考元件串之间均相隔间距L,当所述衰减器的个数为奇数时,正中间有两个所述参考元件串相邻且两者之间的间距为2L ,当所述衰减器的个数为偶数时,正中间有两个所述感应元件串相邻且两者之间的间距为2L。 Preferably, there is a distance L between each sensing element string and adjacent reference element strings, and when the number of attenuators is odd, there are two adjacent reference element strings in the middle And the distance between the two is 2L. When the number of the attenuators is an even number, there are two adjacent inductive element strings in the middle and the distance between the two is 2L.
优选的,所述衰减器的个数N不少于所述感应元件串的行/列数,所述屏蔽结构的个数M不少于所述参考元件串的行/列数,并且N<M,其中N、M均为正整数。 Preferably, the number N of the attenuators is not less than the number of rows/columns of the inductive element string, the number M of the shielding structure is not less than the number of rows/columns of the reference element string, and N< M, where N and M are both positive integers.
优选的,所述基片包括了集成电路,或与包括了集成电路的其它基片相连接。 Preferably, the substrate includes an integrated circuit, or is connected to other substrates including an integrated circuit.
优选的,所述集成电路为CMOS、BiCMOS、Bipolar、BCDMOS或SOI,所述参考臂与所述感应臂直接沉积在所述基片的集成电路上面。 Preferably, the integrated circuit is CMOS, BiCMOS, Bipolar, BCDMOS or SOI, and the reference arm and the sensing arm are directly deposited on the integrated circuit of the substrate.
优选的,所述基片为ASIC芯片,所述ASIC芯片含有偏移电路、增益电路、 校准电路、温度补偿电路和逻辑(logic)电路中的任一种或至少两种电路。 Preferably, the substrate is an ASIC chip, and the ASIC chip contains any one or at least two circuits of an offset circuit, a gain circuit, a calibration circuit, a temperature compensation circuit and a logic circuit.
优选的,所述逻辑电路为数字开关电路或者旋转角度计算电路。 Preferably, the logic circuit is a digital switch circuit or a rotation angle calculation circuit.
优选的,所述屏蔽结构和所述衰减器的形状均为沿横/纵向延伸的长条形阵列。 Preferably, the shape of the shielding structure and the attenuator is a strip-shaped array extending horizontally or vertically.
优选的,所述屏蔽结构和所述衰减器的组成材料相同,均为软铁磁合金,所述软铁磁合金包含有Ni、Fe和Co中的一种元素或至少两种元素。 Preferably, the shielding structure and the attenuator are composed of the same material, which is a soft ferromagnetic alloy, and the soft ferromagnetic alloy contains one element or at least two elements among Ni, Fe and Co.
优选的,所述单芯片参考桥式磁传感器的输入输出连接端电连接于半导体封装的输入输出连接端,所述半导体封装的方法包括焊盘引线键合、倒装芯片、球栅阵列封装、晶圆级封装或板上芯片封装。 Preferably, the input and output connection ends of the single-chip reference bridge magnetic sensor are electrically connected to the input and output connection ends of the semiconductor package, and the method of the semiconductor package includes pad wire bonding, flip chip, ball grid array packaging, Wafer-level packaging or chip-on-board packaging.
优选的,所述单芯片参考桥式磁传感器的工作磁场强度为20~500高斯。 Preferably, the working magnetic field strength of the single-chip reference bridge magnetic sensor is 20-500 Gauss.
优选的,所述屏蔽结构将所述参考元件串完全覆盖。 Preferably, the shielding structure completely covers the reference element string.
与现有技术相比,本实用新型具有以下有益效果:功耗低、线性度好、工作范围宽以及适用于高强度磁场。 Compared with the prior art, the utility model has the following beneficial effects: low power consumption, good linearity, wide working range and suitable for high-intensity magnetic fields.
附图说明 Description of drawings
为了更清楚地说明本实用新型实施例技术中的技术方案,下面将对实施例技术描述中所需要使用的附图作简单地介绍,显而易见地,下面描述中的附图仅仅是本实用新型的一些实施例,对于本领域普通技术人员来讲,在不付出创造性劳动的前提下,还可以根据这些附图获得其他的附图。 In order to more clearly illustrate the technical solutions in the embodiment technology of the present invention, the accompanying drawings that need to be used in the technical description of the embodiment will be briefly introduced below. Obviously, the accompanying drawings in the following description are only the embodiment of the present invention. For some embodiments, those of ordinary skill in the art can also obtain other drawings based on these drawings without any creative effort.
图1为现有技术中单芯片桥式磁传感器的结构示意图。 FIG. 1 is a schematic structural diagram of a single-chip bridge-type magnetic sensor in the prior art.
图2为本实用新型的单芯片参考桥式磁传感器的结构示意图。 FIG. 2 is a schematic structural diagram of a single-chip reference bridge magnetic sensor of the present invention.
图3为本实用新型的单芯片参考桥式磁传感器的另一种结构示意图。 FIG. 3 is another structural schematic diagram of the single-chip reference bridge magnetic sensor of the present invention.
图4为本实用新型的单芯片参考桥式磁传感器在外磁场中的磁场分布图。 FIG. 4 is a magnetic field distribution diagram of the single-chip reference bridge magnetic sensor of the present invention in an external magnetic field.
图5为本实用新型中参考元件串和感应元件串所在位置与相对应的增益系数之间的关系曲线。 FIG. 5 is a relationship curve between the positions of the reference element string and the inductive element string and the corresponding gain coefficients in the present invention.
图6为现有技术中参考元件串和感应元件串所在位置与相对应的增益系数之间的关系曲线。 FIG. 6 is a relationship curve between the positions of the reference element string and the inductive element string and the corresponding gain coefficients in the prior art.
图7为TMR和GMR自旋阀结构的磁电阻传感元件的响应曲线。 FIG. 7 is the response curves of magnetoresistive sensing elements with TMR and GMR spin valve structures.
图8为TMR三层膜结构和GMR多层膜结构的磁电阻传感元件的响应曲线。 Fig. 8 is the response curves of the magnetoresistive sensing elements with the TMR three-layer film structure and the GMR multi-layer film structure.
图9为AMR Barber-pole(类似于理发店门口的旋转彩柱)结构的磁电阻传感元件的响应曲线。 Figure 9 is the response curve of the magnetoresistive sensing element with the structure of AMR Barber-pole (similar to the rotating color column at the entrance of the barber shop).
图10为本实用新型中TMR自旋阀结构的磁传感器有无衰减器的转换特性曲线。 Fig. 10 is a conversion characteristic curve with or without an attenuator for a magnetic sensor with a TMR spin valve structure in the present invention.
图11为本实用新型中TMR三层膜结构的磁传感器有无衰减器的转换特性曲线。 Fig. 11 is the conversion characteristic curve of the magnetic sensor with or without the attenuator in the TMR three-layer film structure in the utility model.
具体实施方式 Detailed ways
下面结合附图及实施例对本实用新型的发明内容作进一步的描述。 The content of the invention of the utility model will be further described below in conjunction with the accompanying drawings and embodiments.
图1为现有技术中专利申请201310203311.3所公开的单芯片桥式磁传感器的结构示意图。该传感器包括基片1、感应元件串2、参考元件串3、屏蔽结构4、电连接导体6以及四个用于输入输出连接的焊盘7-10,分别作为电源供应端Vbias,接地端GND,电压输出端V+,V-。其中感应元件串2与参考元件串3相互交错排放,感应元件串2位于两个屏蔽结构4的间隙处,参考元件串3位于屏蔽结构4的下方。感应臂、参考臂和焊盘7-10之间均用电连接导体6连接。该传感器具有高灵敏度、线性度好、偏移量小等优点,但其容易饱和,其可适用的最大磁场强度为100高斯左右,不能用于更高强度的磁场当中。
Fig. 1 is a schematic structural diagram of a single-chip bridge-type magnetic sensor disclosed in patent application 201310203311.3 in the prior art. The sensor includes a
实施例 Example
图2为本实用新型中单芯片参考桥式磁传感器的结构示意图。其与图1中所示的传感器的不同之处在于:该传感器还包括衰减器5,衰减器5与屏蔽结构4相隔排列,并且衰减器5的个数N不少于感应元件串2的行/列数,屏蔽结构4的个数M不少于参考元件串3的行/列数,并且N<M,N和M均为正整数,图2中N为5,M为6。衰减器5与屏蔽结构4的形状相同,优选地为沿横/纵向延伸的长条形阵列,它们的组成材料也相同,均为选自Ni、Fe和Co一种元素或几种元素组成的软铁磁合金,也可以为非铁磁材料,但不限于以上材料。感应元件串2和参考元件串3各自均由至少一行/列由一个或者至少两个相同的磁电阻传感元件电连接构成,优选地,磁电阻传感元件为AMR、GMR或者TMR传感元件,并且感应元件串2和参考元件串3所包含的磁电阻传感元件的个数相同,其钉扎层的磁化方向也相同。感应元件串2与参考元件串3相互交错排放,每个感应元件串2与相邻的参考元件串3之间均相隔间距L,但对于如图2所示的奇数个衰减器5,正中间有两个参考元件串3相邻,其之间间距为2L ,对于如图3所示的偶数个衰减器5,正中间有两个感应元件串2相邻,其之间间距为2L。间距L很小,优选地为20~100 微米。每个感应元件串2上对应设置有一衰减器5,每个参考元件串3上对应设置有一屏蔽结构4,感应元件串2和参考元件串3可分别放置于衰减器5和屏蔽结构4的上方或者下方,图2中所示为放置于下方的情形。屏蔽结构4的宽度和面积要比衰减器5的宽度和面积大,其足够大到能将参考元件串3完全覆盖,致使在参考元件串3处的磁场能很大程度的衰减甚至完全屏蔽,而感应元件串2所能感测到的磁场在衰减器5的作用下会有所衰减,但衰减幅度并不是很大,从而导致感应元件串2处磁场的增益系数Asns大于参考元件串3处磁场的增益系数Aref。感应元件串2相互连接构成的感应臂和参考元件串3相互连接构成的参考臂电连接形成一电桥,该电桥的输入输出连接端分别为电源供应端Vbias 7,接地端GND 8,电压输出端V+ 9,V- 10。该传感器上各元件之间通过电连接导体6连接。
Fig. 2 is a schematic structural diagram of a single-chip reference bridge magnetic sensor in the present invention. It differs from the sensor shown in FIG. 1 in that: the sensor also includes
在基片1上也还可以印制有集成电路,或与另一印制有集成电路的基片相连接,优选地,所印制的集成电路可以为CMOS(Complementary Metal Oxide Semiconductor,互补金属氧化物半导体)、BiCMOS(双极互补金属氧化半导体 bipolar complementary metal oxide semiconductor)、Bipolar、BCDMOS或者SOI(Silicon-On-Insulator,绝缘衬底上的硅),参考臂与感应臂便直接沉积在基片1的集成电路上面。此外, 基片1还可以为专用集成电路ASIC(Application Specific Integrated Circuit)芯片,其含有偏移电路、增益电路(gain circuit)、 校准电路、温度补偿电路和逻辑电路(Logic Circuit)中的任一种或几种应用电路,其中逻辑电路还可以为数字开关电路或者旋转角度计算电路,但并不限于以上电路。
An integrated circuit can also be printed on the
本实施例中是采用焊盘来进行输入输出连接,也可以采用倒装芯片、球栅阵列封装、晶圆级封装以及板上芯片封装等半导体封装方法。该传感器可适用于20~500高斯的磁场中。 In this embodiment, pads are used for input and output connections, but semiconductor packaging methods such as flip-chip, ball grid array packaging, wafer-level packaging, and chip-on-board packaging can also be used. The sensor can be used in the magnetic field of 20~500 Gauss.
图4为感应元件串2与参考元件串3在外加磁场中的磁场分布图。图中,外加磁场的方向为11。构成感应元件串2和参考元件串3的磁电阻传感元件为TMR传感元件。从图中可以看出,在参考元件串3处的磁场在屏蔽结构的作用下大大衰减,而在感应元件串2处的磁场的衰减幅度相比前者要小。图5为与图4所对应的感应元件串2和参考元件串3的所在位置与相应的位置处的增益系数之间的关系曲线。图中横轴表示的位置是以比例距离的形式体现的。从图5中可以看出,在感应元件串2处的磁场幅度的增益系数Asns与参考元件串3处的磁场幅度的增益系数Aref均在0~1之间,其中增益系数Asns大于Aref,也就是说在参考元件串3处的磁场的衰减幅度要比在感应元件串2处的磁场衰减幅度大,这与从图4中所得到的结论一致。
FIG. 4 is a magnetic field distribution diagram of the
图6为图1中所对应的传感器结构的感应元件串2和参考元件串3的所在位置与相应的位置处的增益系数之间的关系曲线。为便于比较,参考元件串3和感应元件串2的所取个数与图5中相同。对比图5和图6中的两曲线12和13可以发现,本实用新型中的感应元件串2处的磁场幅度大幅度衰减,这样就即使把本实用新型中的单芯片参考桥式磁传感器放置于高强度的磁场中,该传感器所感测到的磁场大小是衰减后的磁场,只要在其饱和范围之内,此传感器仍然可以正常工作。
Figure 6 is a relationship curve between the position of the
图7为磁电阻传感元件为TMR和GMR自旋阀结构时的响应曲线。当外加磁场11的方向与钉扎层的磁化方向19平行,同时外加磁场的强度大于-Bs+Bo 25时,磁性自由层的磁化方向18与外加磁场11的方向平行,进而与钉扎层的磁化方向 19平行,此时TMR元件的磁阻最小,即为RL 21。当外加磁场11的方向与钉扎层的磁化方向19反平行,同时外加磁场的强度大于Bs+Bo 26时,磁性自由层的磁化方向18与外加磁场11的方向平行,进而与钉扎层的磁化方向 19反平行,此时TMR元件的磁阻最大,即为RH22。当外加磁场11的强度为Bo 23时,磁性自由层的磁化方向18与钉扎层的磁化方向 19垂直,此时,TMR元件的磁阻为RL 21和RH22的中间值,即(RL +RH)/2。-Bs+Bo 25与Bs+Bo 26之间的磁场便是单芯片线性桥式磁场传感器的测量范围。从图中可以看出,曲线20在-Bs+Bo 25与Bs+Bo 26之间呈线性,
Fig. 7 is the response curves when the magnetoresistive sensing elements are TMR and GMR spin valve structures. When the direction of the applied magnetic field 11 is parallel to the
电阻变化率为 Resistance change rate
对于TMR自旋阀,其电阻变化率最高可达到200%,对于GMR自旋阀,其电阻变化率最高只有10%。 For TMR spin valves, the resistance change rate can reach up to 200%, and for GMR spin valves, the resistance change rate is only 10%.
图8为磁电阻传感元件为TMR三层膜结构和GMR多层膜结构时的响应曲线。当外加磁场11的方向与钉扎层的磁化方向19平行,同时外加磁场的强度大于-Bs 31或者Bs 32时,磁性自由层的磁化方向18与外加磁场11的方向平行,进而与钉扎层的磁化方向 19平行,此时MTJ元件的磁阻最小,即为RL 28。当外加磁场为0,磁性自由层的磁化方向18与钉扎层的磁化方向 19反平行,此时MTJ元件的磁阻最大,即为RH27。-Bs 31与Bs 32之间的磁场便是传感器的测量范围。从图中可以看出,曲线29、30在-Bs 31与Bs 32之间呈线性,磁电阻元件的电阻变化率最高也能达到200%。
Fig. 8 is a response curve when the magnetoresistive sensing element has a TMR three-layer film structure and a GMR multi-layer film structure. When the direction of the applied magnetic field 11 is parallel to the
图9为磁电阻传感元件为AMR Barber-pole结构时的响应曲线。从图中可以看出,该种磁电阻元件的电阻变化率将近在1%左右。 Figure 9 is the response curve when the magnetoresistive sensing element is an AMR Barber-pole structure. It can be seen from the figure that the resistance change rate of this kind of magnetoresistive element is about 1%.
图10为磁电阻传感元件为TMR自旋阀结构的单芯片参考桥式传感器有无衰减器时的转换特性曲线。曲线15表示的是没有衰减器的情形,曲线16表示的是使用了衰减器的情形,横轴为外加磁场的大小,纵轴为传感器输出电压与电源电压之间的比值。对比两曲线可看出,曲线15所对应的磁场线性范围在35奥斯特左右,而曲线16所对应的磁场线性范围则在150奥斯特左右,由此可见,使用了衰减器之后,传感器的线性工作范围明显变宽。
Fig. 10 is a conversion characteristic curve of a single-chip reference bridge sensor with a TMR spin valve structure as a magnetoresistive sensing element with or without an attenuator.
图11为磁电阻传感元件为TMR三层膜结构的单芯片参考桥式传感器有无衰减器时的转换特性曲线。曲线33表示的是没有衰减器的情形,曲线34表示的是使用了衰减器的情形,横轴为外加磁场的大小,纵轴为传感器输出电压与电源电压之间的比值。对比这两曲线可看出,使用了衰减器之后,传感器工作范围明显变宽。
Fig. 11 is a conversion characteristic curve of a single-chip reference bridge sensor with or without an attenuator whose magnetoresistive sensing element is a TMR three-layer film structure.
以上讨论的是电桥为全桥的情形,由于半桥和准桥的工作原理与全桥相同,在此就不再赘述,上述所得到的结论也同样适用于半桥和准桥结构的单芯片参考桥式磁传感器。 The above discussion is the case where the bridge is a full bridge. Since the working principle of the half bridge and quasi-bridge is the same as that of the full bridge, it will not be repeated here. The conclusions obtained above are also applicable to the single bridge structure of the half bridge and quasi-bridge. The chip is referenced to a bridge-type magnetic sensor.
以上所述仅为本实用新型的优选实施例而已,并不用于限制本实用新型,对于本领域的技术人员来说,本实用新型可以有各种更改和变化。凡在本实用新型的精神和原则之内,所作的任何修改、等同替换、改进等,均应包含在本实用新型的保护范围之内。 The above descriptions are only preferred embodiments of the utility model, and are not intended to limit the utility model. For those skilled in the art, the utility model can have various modifications and changes. Any modification, equivalent replacement, improvement, etc. made within the spirit and principles of the present utility model shall be included in the protection scope of the present utility model.
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| CN103645449A (en) * | 2013-12-24 | 2014-03-19 | 江苏多维科技有限公司 | Single chip reference bridge type magnetic sensor for high-intensity magnetic field |
| CN104301851A (en) * | 2014-07-14 | 2015-01-21 | 江苏多维科技有限公司 | TMR Near Field Magnetic Communication System |
| CN107037381A (en) * | 2015-12-29 | 2017-08-11 | 爱盛科技股份有限公司 | Magnetic field sensing device and sensing method thereof |
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