CN202916560U - Liquid crystal display deivce - Google Patents

Abstract

The utility model discloses a liquid crystal display device, which comprises: a first substrate, a second substrate and a frame glue, an amorphous silicon gate driving circuit is arranged on the surface of the first substrate, and the amorphous silicon gate driving circuit Comprising: a first metal layer, a first insulating layer, a second metal layer and a second insulating layer, the first insulating layer covers the first metal layer and the surface of the first substrate, and the second insulating layer covers On the surface of the second metal layer and the first insulating layer; a plurality of via holes are arranged in the first insulating layer and the second insulating layer, and the plurality of via holes are all arranged on the surface of the sealant and the first insulating layer. In the closed space surrounded by the substrate and the second substrate. Since the multiple via holes are arranged in the sealed space surrounded by the sealant, the first substrate, and the second substrate, it can effectively prevent the entry of external water vapor, carbon dioxide or other corrosive substances, and prevent the first metal layer and the second metal layer are etched to prevent the occurrence of open circuit phenomenon of the amorphous silicon gate drive circuit.

Description

A liquid crystal display device

technical field

The utility model belongs to the field of liquid crystal display, in particular to a liquid crystal display device. the

Background technique

With the development of the information society and the application of electronic products, in people's daily life, the application of liquid crystal display devices is becoming more and more extensive. the

Existing liquid crystal display devices are generally composed of two substrates forming electrodes and a liquid crystal layer injected between the two substrates, and voltage is applied to the electrodes to rearrange the liquid crystal molecules in the liquid crystal layer, thereby adjusting the amount of transmitted light. Among them, the two substrates are sealed by frame glue. Generally, the substrate facing the user is used to adjust the color of the display screen, which is called a color filter substrate. The substrate facing away from the user is provided with a thin film transistor, which is used to control the voltage applied to the electrode. called the array substrate. A gate shift register drive circuit is also provided on the array substrate, the gate shift register drive circuit includes a first metal layer and a second metal layer, the first metal layer of the gate shift register drive circuit Layer and the first metal layer (gate layer) in the pixel area on the array substrate realize pattern formation at the same time, the second metal layer of the gate shift register drive circuit and the first metal layer in the pixel area on the array substrate The two metal layers (source layers) realize pattern formation at the same time, so the gate shift register drive circuit can be used to drive the thin film transistors arranged on the array substrate. the

The existing gate shift register drive circuit is generally an amorphous silicon drive circuit, which is formed by multiple film formation and etching processes. As shown in Figure 1, the physical structure of the first metal layer drive circuit is generally include:

The first metal layer 2, the first metal layer 2 is directly arranged on the surface of a substrate 1;

The first insulating layer 3, the first insulating layer 3 covers the first metal layer 2 and the substrate surface 1, and the first insulating layer 2 is provided with a first via hole 21, the first via The hole 21 exposes the first metal layer 2;

The second metal layer 4, the second metal layer 4 is arranged on the surface of the first insulating layer 2;

The second insulating layer 5, the second insulating layer 5 covers the surfaces of the first insulating layer 2 and the second metal layer 4, and a second via hole 22 is provided at a position corresponding to the first via hole 21, In order to expose the first metal layer 2, a third via hole 23 is provided at a position corresponding to the second metal layer 4 to expose the second metal layer 4. The first via hole 21, the second via hole 22 and the third via hole 23 are generally set on the outer side of the center line of the frame rubber 7;

A transparent conductive layer 6, the transparent conductive layer 6 covers the surface of the second insulating layer 5, and is connected to the first metal layer 2 and the first insulating layer 3 respectively through the via holes arranged in the second insulating layer 5 and the first insulating layer 3. The two metal layers 4 are connected. the

In a high-temperature and high-humidity environment, the first metal layer 2 and the second metal layer 4 of the gate shift register drive circuit of the existing liquid crystal display device are easily corroded, resulting in disconnection of the amorphous silicon gate drive circuit. the

Utility model content

In view of this, the purpose of this utility model is to provide a liquid crystal display device to solve the problem that the first metal layer and the second metal layer of the gate shift register drive circuit of the existing liquid crystal display device are easily corroded, resulting in abnormal The problem of open circuit of the crystalline silicon gate drive circuit. the

The liquid crystal display device includes:

The first substrate, the amorphous silicon gate drive circuit is arranged on the surface of the first substrate; the second substrate, the second substrate is arranged opposite to the first substrate, and the first substrate and the second substrate are arranged The gaps are bonded and sealed by frame glue, and it is characterized in that the amorphous silicon gate drive circuit includes:

a first metal layer, the first metal layer is disposed on the surface of the first substrate;

A first insulating layer, the first insulating layer covers the first metal layer and the surface of the first substrate;

a second metal layer, the second metal layer is disposed on the surface of the first insulating layer;

A second insulating layer, the second insulating layer covers the surface of the second metal layer and the first insulating layer;

Wherein, the first insulating layer and the second insulating layer are provided with a plurality of via holes, the plurality of via holes expose the first metal layer and the second metal layer, and the plurality of via holes are all It is arranged in a closed space surrounded by the sealant, the first substrate and the second substrate. the

Preferably, the plurality of via holes are set within a range of 0-200 μm from the inner edge of the sealant. the

Preferably, a first via hole is provided in the first insulating layer, and the first via hole exposes the first metal layer. the

Preferably, a second via hole and a third via hole are provided in the second insulating layer;

Wherein, the second via hole and the first via hole are arranged correspondingly and expose the first metal layer, and the third via hole exposes the second metal layer. the

Preferably, both the first insulating layer and the second insulating layer are silicon nitride layers or silicon oxide layers. the

Preferably, a transparent conductive layer is provided on the surface of the second insulating layer. the

Preferably, the transparent conductive layer is electrically connected to the first metal layer and the second metal layer respectively through a plurality of via holes. the

Preferably, a pixel unit array is arranged on the surface of the first substrate. the

Preferably, the amorphous silicon gate driving circuit and the pixel unit array are formed on the surface of the first substrate simultaneously through the same process. the

It can be seen that since the multiple via holes of the liquid crystal display device provided by the present invention are arranged in the sealed space surrounded by the sealant, the first substrate, and the second substrate, it can effectively avoid external water vapor, carbon dioxide or other The entry of corrosive substances prevents the first metal layer and the second metal layer from being corroded, and prevents the disconnection phenomenon of the amorphous silicon gate drive circuit. the

Description of drawings

In order to more clearly illustrate the technical solutions in the embodiments of the present invention or the prior art, the following will briefly introduce the accompanying drawings that will be used in the description of the embodiments or the prior art. Obviously, the accompanying drawings in the following description The drawings show some embodiments of the utility model, and those skilled in the art can also obtain other drawings according to these drawings without creative work. the

Fig. 1 is the structural schematic diagram of existing liquid crystal display device;

Fig. 2 is the structural representation of a kind of liquid crystal display device provided by the utility model;

FIG. 3 is a schematic structural view of another liquid crystal display device provided by the present invention. the

Detailed ways

In order to make the purpose, technical solutions and advantages of the embodiments of the present utility model clearer, the technical solutions in the embodiments of the present utility model will be clearly and completely described below in conjunction with the accompanying drawings in the embodiments of the present utility model. Obviously, the described The embodiments are some embodiments of the present utility model, but not all embodiments. Based on the embodiments of the present utility model, all other embodiments obtained by persons of ordinary skill in the art without making creative efforts belong to the scope of protection of the present utility model. the

As mentioned in the background art, the first metal layer and the second metal layer of the existing liquid crystal display device are easily corroded, resulting in disconnection of the amorphous silicon gate driving circuit. the

The inventor found through research that since the existing first via hole, the second via hole and the third via hole are generally arranged on the outer side of the center line of the sealant, in a high-temperature and high-humidity environment, the external water Corrosive substances such as steam and carbon dioxide can reach the position of the first metal layer and the second metal layer through the thin transparent conductive layer and the first via hole, the second via hole, and the third via hole, and then the first metal layer will be obtained. The metal layer and the second metal layer are corroded, which causes the disconnection of the amorphous silicon gate drive circuit. Therefore, the inventors set the first via hole, the second via hole and the third via hole where the external corrosive substances cannot reach. position, thereby avoiding the corrosion of the first metal layer and the second metal layer, and preventing the disconnection of the amorphous silicon gate drive circuit. the

The utility model discloses a liquid crystal display device, comprising:

The first substrate, the amorphous silicon gate drive circuit is arranged on the surface of the first substrate; the second substrate, the second substrate is arranged opposite to the first substrate, and the first substrate and the second substrate are arranged The gaps are bonded and sealed by frame glue, and the amorphous silicon gate drive circuit includes:

a first metal layer, the first metal layer is disposed on the surface of the first substrate;

A first insulating layer, the first insulating layer covers the first metal layer and the surface of the first substrate;

a second metal layer, the second metal layer is disposed on the surface of the first insulating layer;

A second insulating layer, the second insulating layer covers the surface of the second metal layer and the first insulating layer;

Wherein, the first insulating layer and the second insulating layer are provided with a plurality of via holes, the plurality of via holes expose the first metal layer and the second metal layer, and the plurality of via holes are all It is arranged in the closed space surrounded by the sealant, the first substrate and the second substrate. the

It can be seen from the above scheme that the multiple via holes of the liquid crystal display device provided by the utility model are arranged in the sealed space surrounded by the sealant, the first substrate, and the second substrate, so that external water vapor can be effectively avoided , carbon dioxide or other corrosive substances, thereby preventing the first metal layer and the second metal layer from being corroded, and preventing the occurrence of disconnection of the amorphous silicon gate drive circuit. the

The above is the core idea of the present application. The technical solutions in the embodiments of the present invention will be clearly and completely described below in conjunction with the accompanying drawings in the embodiments of the present invention. Obviously, the described embodiments are only a part of the present invention. Examples, not all examples. Based on the embodiments of the present utility model, all other embodiments obtained by persons of ordinary skill in the art without making creative efforts belong to the scope of protection of the present utility model. the

In the following description, a lot of specific details have been set forth in order to fully understand the utility model, but the utility model can also be implemented in other ways that are different from those described here, and those skilled in the art can do so without violating the connotation of the utility model. Under the circumstances, similar promotion is done, so the utility model is not limited by the specific embodiments disclosed below. the

The embodiment of the utility model discloses a liquid crystal display device, as shown in Figure 2, comprising:

The first substrate 101, the surface of the first substrate 101 is provided with an amorphous silicon gate drive circuit;

The second substrate 102 is arranged opposite to the first substrate 101 , and the first substrate 101 and the second substrate 102 are glued and sealed by a sealant 103 . the

Wherein, the amorphous silicon gate drive circuit specifically includes:

The first metal layer 111, the first metal layer 111 is arranged on the surface of the first substrate 101;

The first insulating layer 112, the first insulating layer 112 covers the first metal layer 111 and the surface of the first substrate 101, and the first insulating layer 112 is preferably a silicon nitride layer or silicon oxide;

A second metal layer 113, the second metal layer 113 is disposed on the surface of the first insulating layer 112;

The second insulating layer 114, the second insulating layer 114 covers the surface of the second metal layer 113 and the first insulating layer 112, and the second insulating layer 114 is preferably a silicon nitride layer or silicon oxide;

Wherein, the first insulating layer 112 and the second insulating layer 114 are provided with a plurality of via holes 30, and the plurality of via holes 30 expose the first metal layer 111 or the second metal layer 112, and the The plurality of via holes 30 are all arranged in a closed space surrounded by the sealant 103 and the first substrate 101 and the second substrate 102 (the sealant 103 and the first substrate 101 and the second substrate 102 The enclosed space is the part on the right side of the sealant 103 close to the display area of the liquid crystal display device), and the plurality of via holes 30 are set within a range of 0-200 μm from the sealant 103, more preferably, the The plurality of via holes 30 are set within a range of 50 μm˜150 μm away from the sealant 103 . the

A transparent conductive layer 115 is arranged on the surface of the second insulating layer 114, and the transparent conductive layer 115 is preferably an indium tin oxide layer or a silver zinc oxide layer or other transparent conductive layers, and the transparent conductive layer 115 passes through a plurality of The via holes 30 are electrically connected to the first metal layer 111 and the second metal layer 113 respectively. the

Since it is difficult for external water vapor, carbon dioxide or other corrosive substances to enter the enclosed space surrounded by the sealant 103, the first substrate 101, and the second substrate 102, the inventors made the plurality of via holes 30 are all arranged in the closed space surrounded by the sealant 103, the first substrate 101, and the second substrate 102, so as to prevent external water vapor, carbon dioxide or other corrosive substances from penetrating through the transparent conductive layer 115 to the second substrate. The first metal layer 111 and the second metal layer 113 cause corrosion to prevent the disconnection phenomenon of the amorphous silicon gate driving circuit. the

A pixel unit array (not shown in the figure) is arranged on the surface of the first substrate 101, and the pixel unit array is located in a closed space surrounded by the sealant 103, the first substrate 101, and the second substrate 102 , used to realize the screen display of the liquid crystal display device, and the distance between the pixel unit array and the sealant 103 is 400 μm ~ 500 μm, therefore, the plurality of via holes are located between the sealant 103 and the pixel Position between cell arrays. the

In this embodiment, the amorphous silicon gate driving circuit and the pixel unit array are formed on the surface of the first substrate 101 at the same time through the same process. the

Another embodiment of the utility model discloses another liquid crystal display device, as shown in Figure 3, comprising:

The first substrate 101, the surface of the first substrate 101 is provided with an amorphous silicon gate drive circuit;

The second substrate 102 is arranged opposite to the first substrate 101 , and the first substrate 101 and the second substrate 102 are glued and sealed by a sealant 103 . the

Wherein, the amorphous silicon gate drive circuit specifically includes:

The first metal layer 111, the first metal layer 111 is arranged on the surface of the first substrate 101;

The first insulating layer 112, the first insulating layer 112 covers the first metal layer 111 and the surface of the first substrate 101, and the first insulating layer 112 is preferably a silicon nitride layer or silicon oxide;

The second metal layer 113, the second metal layer 113 is arranged on the surface of the first insulating layer 112, and the second insulating layer 114 is preferably a silicon nitride layer or silicon oxide;

The second insulating layer 114, the second insulating layer 114 covers the surface of the second metal layer 113 and the first insulating layer 112;

Wherein, a first via hole 31 is provided in the first insulating layer 112, and the first via hole 31 exposes the first metal layer 111; a second via hole is provided in the second insulating layer 114. 32 and the third via hole 33, the second via hole 32 and the first via hole 31 are set correspondingly, and expose the first metal layer 111, and the third via hole 33 connects the second metal layer 113 exposed. the

Wherein, the first via hole 31, the second via hole 32 and the third via hole 33 are arranged in a closed space surrounded by the sealant 103, the first substrate 101, and the second substrate 102 (the The airtight space enclosed by the sealant 103, the first substrate 101, and the second substrate 102 is the part on the right side of the sealant 103 close to the display area of the liquid crystal display device), and specifically, the first via hole 31, the second via hole The hole 32 and the third via hole 33 are set within the range of 0-200 μm away from the sealant 103, more preferably, the first via hole 31, the second via hole 32 and the third via hole 33 are set in the same distance as the sealant 103. The distance between the sealants 103 is within a range of 50 μm to 150 μm. the

A transparent conductive layer 115 is provided on the surface of the second insulating layer 114. The transparent conductive layer 115 is preferably an indium tin oxide layer or a silver zinc oxide layer or other transparent conductive layers. The transparent conductive layer 115 passes through the first The via hole 31, the second via hole 32 and the third via hole 33 are respectively electrically connected to the first metal layer 111 and the second metal layer 113, and finally realizes the connection between the first metal layer 111 and the second metal layer 113. electrical connection. the

Since it is difficult for external water vapor, carbon dioxide or other corrosive substances to enter the enclosed space surrounded by the sealant 103, the first substrate 101, and the second substrate 102, the inventor made the first via hole 31. Both the second via hole 32 and the third via hole 33 are set in the enclosed space surrounded by the sealant 103 and the first substrate 101 and the second substrate 102, so as to avoid external water vapor, carbon dioxide or other The corrosive substance penetrates through the transparent conductive layer 115 to corrode the first metal layer 111 and the second metal layer 113, so as to prevent the disconnection phenomenon of the amorphous silicon gate drive circuit. the

A pixel unit array (not shown in the figure) is arranged on the surface of the first substrate 101, and the pixel unit array is located in a closed space surrounded by the sealant 103, the first substrate 101, and the second substrate 102 , used to realize the screen display of the liquid crystal display device, and the distance between the pixel unit array and the sealant 103 is 400 μm to 500 μm, therefore, the first via hole 31, the second via hole 32 and the second via hole 31 The three via holes 33 are located between the sealant 103 and the pixel unit array. the

In this embodiment, the amorphous silicon gate driving circuit and the pixel unit array are formed on the surface of the first substrate 101 at the same time through the same process. the

Each part in this manual is described in a progressive manner, and each part focuses on the difference from other parts, and the same and similar parts of each part can be referred to each other. the

The above description of the disclosed embodiments will enable those skilled in the art to realize or use the utility model. Various modifications to these embodiments will be readily apparent to those skilled in the art, and the general principles defined herein may be implemented in other embodiments without departing from the spirit or scope of the invention. Therefore, the present invention will not be limited to the embodiments shown herein, but will conform to the widest scope consistent with the principles and novel features disclosed herein. the

Claims (9)

1. liquid crystal indicator, comprising: first substrate is provided with amorphous silicon grid driving circuit on the described first substrate surface; Second substrate, described second substrate and described first substrate are oppositely arranged, and between described first substrate and the second substrate by the gluing involution that connects of frame, it is characterized in that, described amorphous silicon grid driving circuit comprises:

The first metal layer, described the first metal layer are arranged on the first substrate surface;

The first insulation course, described the first insulation course cover on described the first metal layer and the first substrate surface;

The second metal level, described the second metal level are arranged on described the first surface of insulating layer;

The second insulation course, described the second insulation course cover on described the second metal level and the first surface of insulating layer;

Wherein, be provided with a plurality of via holes in described the first insulation course and the second insulation course, described a plurality of via hole comes out described the first metal layer and the second metal level, and described a plurality of via hole all is arranged in the confined space that is surrounded by described frame glue and first substrate, second substrate.

2. described display device according to claim 1 is characterized in that, described a plurality of via holes are arranged on described frame glue inward flange in the scope of 0 ~ 200 μ m.

3. described display device according to claim 1 is characterized in that, be provided with the first via hole in described the first insulation course, described the first via hole comes out described the first metal layer.

4. described display device according to claim 3 is characterized in that, is provided with the second via hole and the 3rd via hole in described the second insulation course;

Wherein, described the second via hole and the first via hole correspondence arrange and described the first metal layer are come out, and described the 3rd via hole comes out described the second metal level.

5. described display device according to claim 1 is characterized in that, described the first insulation course and the second insulation course are silicon nitride layer or silicon oxide layer.

6. described display device according to claim 1 is characterized in that, is provided with transparency conducting layer on described the second surface of insulating layer.

7. described display device according to claim 6 is characterized in that, described transparency conducting layer is electrically connected with described the first metal layer and the second metal level respectively by a plurality of via holes.

8. described display device according to claim 1 is characterized in that, described first substrate is provided with pixel unit array on the surface.

9. described display device according to claim 8 is characterized in that, described amorphous silicon grid driving circuit and described pixel unit array are by same technique, be formed on the described first substrate surface simultaneously.

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