CN201925936U - Cyclone oxygen-synthesizing combustion device for treating waste gas of semiconductor process - Google Patents

Abstract

The utility model relates to a cyclone-type oxygen combustion device for treating semiconductor process waste gas. An exhaust gas channel is arranged in an inlet head and is connected between an external waste gas supply end and a combustion zone below the inlet head to guide the waste gas. Entering the combustion zone, two partitions are arranged on the periphery of the exhaust gas channel. An ignition chamber is formed between the periphery of the exhaust gas channel and the partitions, and a gas supply end and an ignition chamber are respectively formed on the partitions to communicate with the outside world. A plurality of inclined holes in the combustion zone guide the gas into the combustion zone through the vortex of the ignition chamber. During this period, it is ignited by an igniter in the ignition chamber to generate a vortex flame to burn the exhaust gas entering the combustion zone.

Description

Cyclone oxygen combustion device for treating waste gas from semiconductor process

technical field

The utility model relates to a cyclone-type oxygen-combustion device, in particular to an inlet head seat for treating semiconductor process waste gas, and relates to a waste gas passage, an ignition chamber and an oblique hole for guiding waste gas inside the inlet head seat.

Background technique

In the manufacturing process of semiconductors, many toxic, corrosive and flammable process waste gases will be produced. In order to avoid the possibility of the waste gas polluting the environment and causing public nuisance, the harmful substances in the waste gas must be filtered out first. , in order to discharge harmless exhaust gas to the outside atmosphere.

It is known that the traditional method of treating waste gas from semiconductor manufacturing process is to inject the waste gas from the process into the waste gas treatment tank, and first accept the high-temperature flame combustion in the waste gas treatment tank to form high-temperature waste gas, forcing the harmful substances in the high-temperature waste gas to undergo high-temperature catalysis, and It is decomposed into harmless substances, and then the harmful substances soluble in water in the high-temperature waste gas are melted by the washing water inside the waste gas treatment tank, so that the high-temperature waste gas is converted into a harmless gas, and the high-temperature waste gas is cooled to facilitate discharge To the outside atmosphere without causing environmental pollution.

The top of the above-mentioned traditional exhaust gas treatment tank generally has an inlet head seat (inlet head), which can usually input exhaust gas and oxygen-containing gas at the same time, to mix the exhaust gas and oxygen-containing gas, and ignite the oxygen-containing gas. The gas is used to generate a high-temperature flame to burn the exhaust gas.

At present, there are a variety of methods on the market that use high-temperature flames and washing water to treat waste gas from semiconductor manufacturing processes, such as Taiwan Patent No. 482038 and No. 570146, which mainly use the inlet head seat on the top of the waste gas treatment tank to generate high-temperature flames , the process exhaust gas transported from the external exhaust gas supply end into the inlet head seat is first burned, and the washing water is sprayed into water droplets or overflowed into a water curtain in the exhaust gas treatment tank under the inlet head seat to melt the exhaust gas harmful substances in.

However, the process waste gas in the above-mentioned Taiwan No. 482038 and No. 570146 patent cases passes through the inlet head seat and the waste gas treatment tank in a straight line; in other words, the waste gas passes through the high-temperature flame and washing water in a straight line, resulting in the waste gas It is difficult to increase the time of interaction with high-temperature flames and washing water, so it is easy to cause incomplete combustion of harmful substances in exhaust gas, and it is also easy to cause incomplete dissolution of harmful substances in exhaust gas in washing water. improve.

Contents of the invention

The purpose of the utility model is to overcome the problem in the prior art that the waste gas from semiconductor manufacturing process passes through the high-temperature flame and washing water in a straight line, which makes it difficult to increase the time for the waste gas to react with the high-temperature flame and washing water.

For realizing above-mentioned object, the technical scheme that the utility model adopts is:

A cyclone-type oxy-combustion device for treating exhaust gas from semiconductor manufacturing process. An inlet head seat is provided between an exhaust gas supply end and a gas supply end. It is characterized in that the inlet head seat is equipped with:

an exhaust gas passage communicates between the exhaust gas supply end and a combustion area below the inlet head seat, so as to guide exhaust gas into the combustion area;

Two partitions are arranged at intervals between the periphery of the waste gas channel and the inner wall of the inlet head seat, and form an ignition chamber between the two partitions;

an ignition rod planted in the ignition chamber; and

A plurality of oblique holes are formed on the partition plate in a swirl shape, and communicate with the gas supply end, the ignition chamber and the combustion area, so as to guide the gas swirl into the ignition chamber, and ignite through the ignition rod to create a gas in the ignition chamber. A vortex flame is formed in the chamber, and the inclined hole guides the flame vortex into the combustion zone to burn the exhaust gas in the combustion zone.

Wherein: the two baffles are an upper baffle and a lower baffle, the slanted hole includes an upper slanted hole formed on the upper baffle and a lower slanted hole formed on the lower baffle, the said The upper inclined hole communicates between the gas supply end and the ignition chamber, and the lower inclined hole communicates between the ignition chamber and the combustion zone.

Wherein: the ignition chamber is formed on the periphery of the waste gas channel, the inner wall of the inlet head seat, and between the upper and lower partitions.

Wherein: the inlet head seat is located on the top of an exhaust gas treatment tank, and the inner wall of the exhaust gas treatment tank forms an outer water curtain, the combustion zone is located in the exhaust gas treatment tank, and the flame that swirls into the combustion zone induces the exhaust gas to swirl to on the water curtain.

Wherein: a gas chamber connecting the gas supply end and the upper inclined hole is formed between the periphery of the waste gas channel, the top of the upper partition and the inner wall of the inlet head seat.

Wherein: the gas chamber is provided with a storage tube communicating with the ignition chamber, the igniter is set in the storage tube, and a plurality of air holes are formed on the storage tube, which are connected to the inside of the storage tube and the gas between the chambers to guide gas into the accommodating tube.

Wherein: an annular upper layer water tank that can introduce external washing water is formed between the outer periphery of the ignition chamber and the inner wall of the inlet head seat, and an upper overflow port is connected between the upper layer water tank and the interior of the waste gas treatment tank to guide The washing water is led to overflow into the waste gas treatment tank to form an inner water curtain inside the outer water curtain to accept the blowing of the waste gas.

Wherein: an annular sump connected to the upper water tank is formed between the outer periphery of the ignition chamber and the inner wall of the inlet head seat, and is located on the top of the upper water tank, and external washing water is introduced into the upper water tank through the water collection tank.

Wherein: the inner wall of the waste gas treatment tank forms an annular lower water tank that can introduce external washing water, and an overflow port is connected between the lower water tank and the inside of the waste gas treatment tank to guide the washing water to overflow to the waste gas treatment tank. The outer water curtain is formed in the tank.

Wherein: the opposite end of the exhaust gas channel and the lower inclined hole is provided with a combustion chamber groove located in the exhaust gas treatment tank, and the top of the combustion chamber groove communicates with the exhaust gas channel and the lower inclined hole, and the combustion zone is located in the In the combustion cavity, the bottom of the combustion cavity forms a notch that communicates with the waste gas treatment tank.

Compared with the prior art, the utility model adopting the above-mentioned technical solution has the advantage that: by virtue of the above, the swirl direction of the inclined hole is equal, so that the gas entering the ignition chamber through the swirl through the inclined hole is ignited to form a flame Afterwards, the vortex enters the combustion zone through the inclined hole, forming a flame flowing from top to bottom in a swirl state, and then induces the exhaust gas in the combustion zone to flow from top to bottom in a swirl state; accordingly, using the swirl flame Inducing the exhaust gas from the semiconductor manufacturing process, causing the exhaust gas to pass through the high-temperature flame of the vortex in a swirl path from top to bottom, so as to prolong the time for the interaction between the exhaust gas and the vortex flame; A high-density cyclone fire net is formed to improve the efficiency of flame purification of harmful substances in exhaust gas.

Description of drawings

Fig. 1 is a sectional view of the preferred embodiment of the utility model;

Fig. 2 is another sectional view of the preferred embodiment of the present invention;

Fig. 3 is the A-A sectional view of Fig. 2;

Figure 3a is a partial enlarged view of Figure 3;

Fig. 4 is the B-B sectional view of Fig. 2;

Figure 4a is a partially enlarged view of Figure 4;

Fig. 5 is a perspective view of a conduit and a partition of the present invention;

Fig. 6 is a perspective view of a partition of the present invention;

Fig. 7 is the usage state diagram of Fig. 1;

FIG. 8 is a diagram of the use state of FIG. 2 .

Explanation of reference signs: 11-exhaust gas supply end; 12-gas supply end; 13-washing water supply end; 2-exhaust gas treatment tank; 20-reaction chamber; 21-lower water tank; 22-second water supply port; 23- Underflow outlet; 3-inlet head seat; 30-combustion zone; 31-gas chamber; 311-gas inlet; 32-ignition chamber; 33-accommodating tube; 331-gas hole; Combustion chamber groove; 342-notch; 35-upper water tank; 351-upper overflow port; 36-water collection tank; 361-through hole; 362-first water supply port; 4-exhaust gas channel; Inlet; 42-exhaust gas outlet; 5-upper baffle; 51-upper inclined hole; 6-lower baffle; 61-lower slanted hole; 7-igniter; 81-outer water curtain; 82-inner water curtain; 91, 92-flames.

Detailed ways

Please refer to Fig. 1, which reveals a cross-sectional view of a preferred embodiment of the present invention, and cooperates with Fig. 2 to illustrate the utility model's cyclone-type oxy-fuel combustion device for treating waste gas from a semiconductor process, at the waste gas supply end 11 of a semiconductor process An inlet head seat 3 (inlet head) is interposed between a gas supply end 12, and the inlet head seat 3 is located at the top of a waste gas treatment tank 2, and the inner wall of the waste gas treatment tank 2 forms an outer water curtain 81 (as shown in FIG. 7), the inlet head seat 3 is equipped with a vertical waste gas passage 4, two partitions 5, 6, an igniter 7 and a plurality of inclined holes 51, 61. Wherein, the gas supplied by the gas supply end 12 contains 5% to 15% of gas and 95% to 85% of air, and the gas and the outside air are pre-mixed by an external Vent tube premixer (not shown) into a combustible gas. Oxygen-containing gas can save the necessity of supplying oxygen separately; the center of the waste gas treatment tank 2 forms a reaction chamber 20, and the inner wall of the waste gas treatment tank 2 forms a ring-shaped lower floor water tank 21, which is used for waste gas treatment. The outer wall of the tank 2 is provided with a second water supply port 22 communicating with the lower water tank 21. The second water supply port 22 can communicate with a washing water supply port 13 outside to supply washing water to the lower water tank 21, and the top of the lower water tank 21 An annular lower overflow port 23 is communicated with the internal reaction chamber 20 of the waste gas treatment tank 2 , and the washing water in the lower tank 21 can be guided through the lower overflow port 23 to overflow to the waste gas treatment tank 2 In the reaction chamber 20, and flow along the inner wall of the reaction chamber 20 from top to bottom to form the outer water curtain 81.

The exhaust gas channel 4 is formed in a vertically arranged circular duct 40 in the center of the inlet head seat 3 (as shown in Figures 1 and 3), and an exhaust gas inlet connected to the exhaust gas supply end 11 is formed on the top of the inlet head seat 3 41, and a waste gas outlet 42 is formed at the bottom of the inlet head seat 3, and the waste gas outlet 42 communicates with a combustion zone 30 below the inlet head seat 3; in fact, the combustion zone 30 is located in the reaction chamber 20 of the waste gas treatment tank 2 , so that the exhaust gas channel 4 communicates between the exhaust gas supply end 11 and the combustion zone 30 of the reaction chamber 20 , and the exhaust gas can be guided into the combustion zone 30 of the reaction chamber 20 from top to bottom. The two partitions 5, 6 are arranged at intervals between the outer periphery of the waste gas channel 4 and the inner wall of the inlet head seat 3, and form an ignition chamber 32 between the two partitions 5, 6; in practice , the partitions 5 and 6 are an upper partition 5 and a lower partition 6, the upper partition 5 and the lower partition 6 are annular (as shown in Figure 6), respectively sleeved in the conduit 40 on the peripheral wall (as shown in Fig. 4 and Fig. 5), and spaced between the periphery of the conduit 40 containing the waste gas channel 4 and the inner wall of the inlet head seat 3; the lower partition 6 is located below the upper partition 5, and The ignition chamber 32 is formed on the periphery of the conduit 40 , the inner wall of the inlet head seat 3 , and between the upper and lower partitions 5 , 6 .

The slanted holes 51, 61 include a plurality of upper slanted holes 51 and lower slanted holes 61, and the upper slanted holes 51 are formed in a swirl shape on the upper partition 5 (as shown in FIGS. 2 and 3 ), and Surrounding the periphery of the conduit 40 of the waste gas passage 4 (cooperating with Fig. 3 a and shown in Fig. 6); the inner wall of the inlet head seat 3, the periphery of the conduit 40 containing the waste gas passage 4 and the top of the upper partition 5 form a communication. The gas chamber 31 at the top of the upper inclined hole 51, the outer wall of the inlet head seat 3 is provided with a gas inlet 311 communicating with the gas chamber 31 and the gas supply end 12, and the bottom end of the upper inclined hole 51 communicates with the ignition chamber 32 , so that the upper inclined hole 51 communicates between the gas supply end 12 and the ignition chamber 32; the gas supply end 12 can supply the oxygen-containing gas to the gas chamber 31 of the inlet head seat 3, and the gas chamber 31 The gas can be evenly supplied to each upper inclined hole 51, and the upper inclined hole 51 can guide the gas in the gas chamber 31 to swirl from top to bottom into the ignition chamber 32, so that the gas in the ignition chamber 32 Flows from top to bottom in a vortex state. The gas chamber 31 is provided with an accommodating pipe 33 communicating with the ignition chamber 32, the igniter 7 is planted in the accommodating pipe 33 and extends into the ignition chamber 32, and the accommodating pipe 33 is formed with A plurality of air holes 331 are communicated between the inside of the housing tube 33 and the gas chamber 31, so as to guide the combustion gas of the gas chamber 31 into the housing tube 33, and receive ignition from the igniter 7 to generate a mother fire flame 91 (as shown in the figure 7 ), to ignite the gas in the ignition chamber 32 to generate a flame 92 flowing from top to bottom in a swirling state, which can heat the exhaust gas in the exhaust gas channel 4 through the outer wall of the conduit 40 .

The lower inclined holes 61 are formed in a swirl shape on the lower partition plate 6 (as shown in FIG. 2 and FIG. 4 ), and surround the periphery of the duct 40 of the exhaust gas passage 4 (as shown in FIG. 4 a and FIG. 6 ). The swirl directions of the upper and lower slanted holes 51, 61 are equal, and the lower slanted hole 61 communicates between the ignition chamber 32 and the combustion zone 30 of the reaction chamber 20, and can guide the ignition chamber 32 The swirling flame 92 swirls into the combustion zone 30 of the reaction chamber 20 from top to bottom, and drives the flame 92 to continuously flow from top to bottom in the combustion zone 30 in a swirling state. The bottom periphery of the inlet head seat 3 is provided with a collar 34 extending downwards into the exhaust gas treatment tank 2, and a combustion chamber groove 341 is formed in the collar 34 at the opposite end below the exhaust gas channel 4 and the lower inclined hole 61, The combustion chamber groove 341 is located in the reaction chamber 20 of the exhaust gas treatment tank 2, and the top of the combustion chamber groove 341 communicates with the exhaust gas channel 4 and the lower inclined hole 61, and the combustion zone 30 is located in the combustion chamber groove 341. A notch 342 connected to the reaction chamber 20 of the exhaust gas treatment tank 2 is formed at the bottom of the combustion chamber groove 341 ;

An annular upper water tank 35 (as shown in Figure 1 ) and an annular water collection tank 36 (as shown in Figure 3 ) are formed between the periphery of the ignition chamber 32 and the inner wall of the inlet head seat 3 . The water tank 36 is located at the top of the upper water tank 35, and a plurality of drainage through holes 361 are connected between the water collecting tank 36 and the upper water tank 35. The outer wall of the inlet head seat 3 is provided with a first water supply port connecting the water collecting tank 36 and the external washing water supply end 13. 362, capable of supplying washing water into the upper water tank 35 through the sump 36 and the through hole 361; the top of the upper water tank 35 communicates with the combustion chamber groove 341 inside the waste gas treatment tank 2 with an annular upper overflow port 351 , can guide the washing water in the upper water tank 35 to overflow to the inner wall of the combustion chamber tank 341 (as shown in Figure 7), and sprinkle along the area of the inner wall of the reaction chamber 20 adjacent to the exhaust gas treatment tank 2, and form a water tank located at the The inner layer water curtain 82 inside the outer layer water curtain 81.

Composition according to above-mentioned component can be used for carrying out the utility model according to, comprises the following steps:

(1) Make the washing water supply end 13 continuously supply washing water to the first and second water supply ports 362, 22 simultaneously (as shown in FIG. 7 ), so that the inner walls of the reaction chamber 20 and the combustion chamber groove 341 form an outer layer of water respectively. Curtain 81 and inner layer water curtain 82.

(2) At the same time, make the gas supply end 12 continuously supply oxygen-containing gas into the gas chamber 31 through the gas inlet 311 (as shown in FIG. The lower vortex enters the ignition chamber 32 (as shown in FIG. 8 ), and then forms gas flowing from top to bottom in a vortex state. The igniter 7 surrounds.

(3) Utilize the igniter 7 to generate an arc spark (as shown in Figure 7 ) to ignite the gas in the housing tube 33 to generate a parent fire flame 91, which then ignites the gas in the ignition chamber 32 to form a swirl state The flame 92 flowing from top to bottom (as shown in FIG. 8 ) causes the ignition chamber 32 to continue to maintain a combustion state, and the flame 92 is guided by the lower inclined hole 61 and swirls from top to bottom into the combustion chamber In the groove 341 , the flame 92 is forced to flow from top to bottom in a vortex state in the combustion chamber groove 341 and the reaction chamber 20 , and forms a high-density cyclone fire net in the combustion zone 30 of the combustion chamber groove 341 . The amount of oxygen-containing gas supplied to the inlet head seat 3 by the gas supply end 12 can control the swirl speed of the flame 92 flowing from top to bottom in a swirl state, and increasing the supply of the gas can increase the swirl speed of the flame 92 , reducing the gas supply can reduce the swirl velocity of the flame 92 .

(4) Open the exhaust gas supply end 11 to continuously supply semiconductor process exhaust gas into the exhaust gas channel 4 through the exhaust gas inlet 41 (as shown in Figure 7), so that the exhaust gas passes through the exhaust gas inlet 41, the exhaust gas channel 4, the exhaust gas outlet 42, and the combustion chamber groove in sequence 341 and reaction chamber 20.

During this period, the exhaust gas passing through the exhaust gas channel 4 is pre-heated by the flame 92 in the gas chamber 31 through the outer wall of the conduit 40, so as to reduce the time for harmful substances in the exhaust gas to undergo high-temperature catalysis and decompose into harmless substances. 42 The waste gas that enters the combustion cavity groove 341 of the waste gas treatment tank 2 and the reaction chamber 20 receives the flame 92 flowing from top to bottom in a swirl state in the combustion zone 30 to burn (as shown in FIG. 8 ), forcing the harmful Substances are catalyzed by the high temperature of the flame 92 and decomposed into harmless substances. The flame 92 forms a high-density cyclone fire net and induces the waste gas to be thrown to the inner and outer water curtains 82 and 81 in a vortex state. , forcing the harmful substances contained in the exhaust gas, such as dust and fluorine ions, which can accept water washing, to hit the water curtains 82, 81, and melt in the water curtains 82, 81, and then discharged along with the water curtains 82, 81 , causing the waste gas to be converted into a harmless gas while cooling the waste gas by means of said water curtains 82,81.

By virtue of the above, since the swirl directions of the upper and lower inclined holes 51, 61 are equal, the gas that swirls into the ignition chamber 32 through the upper inclined hole 51 is ignited to form a flame 92, and then passes through the lower inclined hole. The hole 61 swirls into the combustion zone 30 of the exhaust gas treatment tank 2 to form a flame 92 flowing from top to bottom in a swirling state, and then induces the exhaust gas in the combustion zone 30 of the exhaust gas treatment tank 2 to flow from top to bottom in a swirling state ; Accordingly, use the vortex flame 92 to induce the exhaust gas of the semiconductor manufacturing process, causing the exhaust gas to pass through the high-temperature flame and washing water of the vortex in a vortex path from top to bottom, so as to prolong the time for the exhaust gas to react with the vortex flame and the washing water, so that the exhaust gas The heating is more uniform, which can avoid the situation that the exhaust gas leaves the flame 92 without being heated; at the same time, the gas is pressurized by means of the upper and lower inclined holes 51, 61, so that the swirl flame 92 forms a high-density cyclone fire net , to improve the efficiency of flame purification of harmful substances in the exhaust gas; in addition, by virtue of the water curtains 81 and 82 melting the harmful substances in the exhaust gas, the harmful substances can be prevented from adhering to the inner wall of the exhaust gas treatment tank 2, so as to further prevent the occurrence of fouling on the inner wall of the exhaust gas treatment tank 2 and erosion phenomena.

The above description is only illustrative, rather than restrictive, of the present utility model. Those of ordinary skill in the art understand that many modifications, changes or equivalents can be made without departing from the spirit and scope defined in the claims. But all will fall within the protection scope of the present utility model.

Claims (10)

1. a cyclone type of handling manufacture of semiconductor waste gas closes the oxygen burner, establishes an inlet headstock between a waste gas feed end and a gas supply end, it is characterized in that configuration packet contains in this inlet headstock:

One exhaust steam passage is communicated between the combustion zone of this waste gas feed end and this inlet headstock below, enters this combustion zone with exhaust gas routing;

Two dividing plates are arranged at intervals between this exhaust steam passage periphery and the inlet headstock inwall, and form a fire chamber between described two dividing plates;

One fire rod plants in this fire chamber; And

The plural number inclined hole, being the distribution of whirlpool shape is formed on the described dividing plate, be communicated with this gas supply end, fire chamber and combustion zone, enter in this fire chamber with guiding combustion gas whirlpool, light and in this fire chamber, form whirlpool flame via this fire rod, described inclined hole is also guided this flame whirlpool and is entered this combustion zone, with the waste gas in this combustion zone of burning.

2. the cyclone type of processing manufacture of semiconductor waste gas according to claim 1 closes the oxygen burner, it is characterized in that: described two dividing plates are a upper strata dividing plate and lower floor's dividing plate, described inclined hole comprises upper strata inclined hole that is formed on this upper strata dividing plate and the lower floor's inclined hole that is formed on this lower floor's dividing plate, described upper strata inclined hole is communicated between this gas supply end and the fire chamber, and described lower floor inclined hole is communicated between this fire chamber and the combustion zone.

3. the cyclone type of processing manufacture of semiconductor waste gas according to claim 2 closes the oxygen burner, it is characterized in that: described fire chamber is formed between this exhaust steam passage periphery, inlet headstock inwall and upper strata and the lower floor's dividing plate.

4. the cyclone type of processing manufacture of semiconductor waste gas according to claim 2 closes the oxygen burner, it is characterized in that: described inlet headstock is positioned at an exhaust-gas treatment groove top, and this exhaust-gas treatment groove inwall forms an outer water curtain, this combustion zone is positioned at this exhaust-gas treatment groove, and whirlpool enters this waste gas whirlpool of flame priming of this combustion zone to this water curtain.

5. the cyclone type of processing manufacture of semiconductor waste gas according to claim 2 closes the oxygen burner, it is characterized in that: form a combustion gas chamber that is communicated with this gas supply end and described upper strata inclined hole between described exhaust steam passage periphery, dividing plate top, upper strata and the inlet headstock inwall.

6. the cyclone type of processing manufacture of semiconductor waste gas according to claim 5 closes the oxygen burner, it is characterized in that: the containing tube that is provided with this fire chamber of connection in the described combustion gas chamber, this igniter is located in this containing tube, and be formed with plural pore on this containing tube, be communicated between this containing tube inside and this combustion gas chamber, enter in this containing tube with the guiding combustion gas.

7. the cyclone type of processing manufacture of semiconductor waste gas according to claim 4 closes the oxygen burner, it is characterized in that: formation one can import the ring-type upper strata tank of extraneous washings between described fire chamber periphery and this inlet headstock inwall, and be communicated with overfall between this upper strata tank and this exhaust-gas treatment groove inside, to guide the washings overflow to this exhaust-gas treatment groove, and form an internal layer water curtain that is positioned at this skin water curtain inboard, blow to accept waste gas.

8. the cyclone type of processing manufacture of semiconductor waste gas according to claim 7 closes the oxygen burner, it is characterized in that: described fire chamber peripheral with this inlet headstock inwall between formation one be communicated with the ring-type water leg of this upper strata tank, be positioned at this upper strata sink top, and extraneous washings import this upper strata tank via this water leg.

9. the cyclone type according to claim 4 or 7 described processing manufacture of semiconductor waste gas closes the oxygen burner, it is characterized in that: described exhaust-gas treatment groove inwall formation one can import the ring-type lower floor tank of extraneous washings, and be communicated with overfall between this lower floor's tank and this exhaust-gas treatment groove inside, to this exhaust-gas treatment groove, form this skin water curtain with the overflow of guiding washings.

10. the cyclone type of processing manufacture of semiconductor waste gas according to claim 4 closes the oxygen burner, it is characterized in that: described exhaust steam passage and opposite end, described lower floor inclined hole below are provided with a combustion chamber groove that is positioned at this exhaust-gas treatment groove, and this combustion chamber groove top is communicated with this exhaust steam passage and described lower floor inclined hole, this combustion zone is positioned at this combustion chamber groove, and this combustion chamber trench bottom also forms a notch that is communicated with this exhaust-gas treatment groove.

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