CN201811707U - Radial verticality detection platform - Google Patents

Abstract

The utility model discloses a radial verticality detection platform, which is used for detecting the radial verticality of a monocrystalline round bar in the photovoltaic industry. The detection platform consists of a bottom plate (10), a rotating disc (11), an upright post (2) with a graduated scale (2-1), a depth measuring scale (7) and an indexing table (8), wherein the lower end of the upright post (2) is provided with a base (1); the base (1) is fixed on the bottom plate (10); the rotating disc (11) is rotationally supported on the bottom plate (10); the depth measuring scale (7) and the indexing table (8) are movably arranged on the upright post (2); and the depth measuring scale (7) is positioned below the indexing table (8). The vertical accuracy and the centering accuracy of the monocrystalline round bar can be ensured and secondary detection of circular runout is not needed.

Description

Radial verticality test bench

technical field

The utility model relates to a radial perpendicularity detection platform, which is used for detecting the radial perpendicularity of a single wafer rod in the photovoltaic industry.

Background technique

At present, most photovoltaic companies have raised their quality requirements to a new level. Cell companies have higher requirements for silicon wafer manufacturing, and the processing of defective silicon wafers has also been reduced from the previous acceptance to chipping and small side lengths. One category, the produced unrolled sheets are not acceptable. There are two sources of unrolled and eccentric: one is the eccentricity during the bonding process of the round rod. After that, it will be directly cut on the machine; the second is that it occurs during the line opening process. Since the equipment is imported, errors in procedures and operations will sometimes have an impact.

Round rod bonding is the first process in the silicon wafer manufacturing workshop. The improvement of the yield of silicon wafers must start from this post. Now all photovoltaic companies produce square rods through wire square cutting; so the round rods are bonded to On the crystal support, ensuring the bonding accuracy of the round rod is the first element. After the round rod is bonded, the circular runout is detected by the one-way dial indicator. Therefore, the centering accuracy cannot be guaranteed for the eccentric and inclined crystal rod, which affects the direction. Rod yield.

Contents of the invention

The purpose of the utility model is to provide a radial verticality detection platform that can ensure the vertical accuracy of the single wafer rod and the centering accuracy of the single wafer rod, and does not require secondary detection of circle runout.

The technical solution to achieve the above purpose is: a radial verticality detection platform, which is composed of a base plate, a turntable, a column with a scale, a depth measuring ruler and a graduation table. The lower end of the column has a base, and the base is fixed on the base plate. The turntable is rotatably supported on the base plate, the depth measuring ruler and the graduation table are movably installed on the column, and the depth measuring ruler is located below the graduation table.

After adopting the above technical scheme, first put the bonded single wafer rod and the crystal holder into the rotating disk, adjust the position of the depth measuring ruler, and measure the distance between the four radial lines of the concave and convex parts to see if they are consistent, so as to judge the single crystal For the inclination of the round bar, use a mobile index to measure the jump at multiple points from the top to the bottom to judge the vertical tilt range of the single wafer bar, which is convenient for controlling the position of the non-tumbling, so as to adjust and judge in time, so this utility model is adopted The new radial perpendicularity testing platform can not only ensure the vertical accuracy of the single-wafer bar, but also ensure the centering accuracy of the single-wafer bar. At the same time, it does not need to detect the circle jump twice, which can reduce the probability of defective products.

Description of drawings

Fig. 1 is the assembly structure schematic diagram of the present utility model;

Fig. 2 is a schematic diagram of the three-dimensional structure of the column of the utility model.

Detailed ways

Below in conjunction with accompanying drawing and embodiment the utility model is described in further detail.

As shown in Figures 1 and 2, a radial perpendicularity detection platform is composed of a base plate 10, a turntable 11, a column 2 with a scale 2-1, a depth measuring ruler 7 and an indexing table 8. The lower end of the column 2 has Base 1, the base 1 is fixed on the base plate 10 through its four positioning holes, the turntable 11 is rotatably supported on the base plate 10 through bearings, the depth measuring ruler 7 is movably installed on the column 2 through the moving sleeve 3, and the depth measurement The ruler 7 is fixed on the moving sleeve 3 through the inner hexagonal bolt 9, the moving sleeve 3 is set on the column 2, the indexing table 8 is movably installed on the column 2 through the table frame moving sleeve 4, and the table rod 6 of the indexing table 8 The pressure plate 5 is fixed on the table frame moving sleeve 4, the table frame moving sleeve 4 is set on the column 2, and the depth measuring ruler 7 is located below the indexing table 8.

Dial gauge 8 can adopt dial gauge, also can adopt dial gauge.

The working principle of the utility model is as follows:

First, put the bonded single wafer rod 13 together with the crystal holder 12 into the turntable 11, adjust the position of the depth measuring ruler 7, and measure the distance between the four radial lines of the concave and convex parts to see if they are consistent, so as to judge the single wafer rod 13 For the inclination, use the mobile index 8 to measure the runout at multiple points from top to bottom to determine the range of vertical inclination of the single wafer rod, which is convenient for controlling the position of the non-tumbler for timely adjustment and judgment.

Claims (2)

1. A radial perpendicularity detection platform is characterized in that: it consists of a base plate (10), a rotating disk (11), a column (2) with a scale (2-1), a depth measuring ruler (7) and a graduation table (8), the lower end of the column (2) has a base (1), the base (1) is fixed on the base plate (10), the turntable (11) is rotatably supported on the base plate (10), and the depth measuring ruler ( 7) and the graduation table (8) are movably installed on the column (2), and the depth measuring ruler (7) is positioned at the below of the graduation table (8). 2. The radial perpendicularity testing platform according to claim 1, characterized in that: said indexing gauge (8) is a dial indicator or a dial gauge.

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