CN201200981Y - Cleaner of multilevel dry-type vacuum pump - Google Patents
Cleaner of multilevel dry-type vacuum pump Download PDFInfo
- Publication number
- CN201200981Y CN201200981Y CNU2008200133658U CN200820013365U CN201200981Y CN 201200981 Y CN201200981 Y CN 201200981Y CN U2008200133658 U CNU2008200133658 U CN U2008200133658U CN 200820013365 U CN200820013365 U CN 200820013365U CN 201200981 Y CN201200981 Y CN 201200981Y
- Authority
- CN
- China
- Prior art keywords
- vacuum pump
- dry vacuum
- gas piping
- mass flow
- cleaning device
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 238000004140 cleaning Methods 0.000 claims abstract description 19
- 208000002925 dental caries Diseases 0.000 claims description 6
- 230000008878 coupling Effects 0.000 claims description 4
- 238000010168 coupling process Methods 0.000 claims description 4
- 238000005859 coupling reaction Methods 0.000 claims description 4
- 238000005516 engineering process Methods 0.000 abstract description 9
- 239000007789 gas Substances 0.000 description 32
- 239000004065 semiconductor Substances 0.000 description 8
- 230000000694 effects Effects 0.000 description 4
- 238000000034 method Methods 0.000 description 4
- 239000003921 oil Substances 0.000 description 4
- 238000010926 purge Methods 0.000 description 4
- 239000002912 waste gas Substances 0.000 description 4
- 238000005229 chemical vapour deposition Methods 0.000 description 3
- QGZKDVFQNNGYKY-UHFFFAOYSA-N Ammonia Chemical compound N QGZKDVFQNNGYKY-UHFFFAOYSA-N 0.000 description 2
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 2
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 2
- 230000005540 biological transmission Effects 0.000 description 2
- 238000001816 cooling Methods 0.000 description 2
- 239000013078 crystal Substances 0.000 description 2
- 238000010586 diagram Methods 0.000 description 2
- VNWKTOKETHGBQD-UHFFFAOYSA-N methane Chemical compound C VNWKTOKETHGBQD-UHFFFAOYSA-N 0.000 description 2
- 238000000623 plasma-assisted chemical vapour deposition Methods 0.000 description 2
- 229910052710 silicon Inorganic materials 0.000 description 2
- 239000010703 silicon Substances 0.000 description 2
- 239000000243 solution Substances 0.000 description 2
- 239000002341 toxic gas Substances 0.000 description 2
- 208000027418 Wounds and injury Diseases 0.000 description 1
- 229910021529 ammonia Inorganic materials 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- 230000007797 corrosion Effects 0.000 description 1
- 238000005260 corrosion Methods 0.000 description 1
- 230000006378 damage Effects 0.000 description 1
- 238000001514 detection method Methods 0.000 description 1
- 238000009792 diffusion process Methods 0.000 description 1
- 238000010790 dilution Methods 0.000 description 1
- 239000012895 dilution Substances 0.000 description 1
- 239000003814 drug Substances 0.000 description 1
- 239000000428 dust Substances 0.000 description 1
- 238000005530 etching Methods 0.000 description 1
- 230000035611 feeding Effects 0.000 description 1
- 208000014674 injury Diseases 0.000 description 1
- 238000005468 ion implantation Methods 0.000 description 1
- 239000010687 lubricating oil Substances 0.000 description 1
- 238000005461 lubrication Methods 0.000 description 1
- 238000005272 metallurgy Methods 0.000 description 1
- 229910052757 nitrogen Inorganic materials 0.000 description 1
- 238000012856 packing Methods 0.000 description 1
- 231100000614 poison Toxicity 0.000 description 1
- 231100000572 poisoning Toxicity 0.000 description 1
- 230000000607 poisoning effect Effects 0.000 description 1
- 230000007096 poisonous effect Effects 0.000 description 1
- 238000007639 printing Methods 0.000 description 1
- 238000005086 pumping Methods 0.000 description 1
- 238000007789 sealing Methods 0.000 description 1
- 239000002699 waste material Substances 0.000 description 1
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- Compressors, Vaccum Pumps And Other Relevant Systems (AREA)
Abstract
The utility model relates to a vacuum pump cleaning technology, in particular to a cleaning device for a multiple-stage dry vacuum pump, which comprises a pressure reducing valve, a mass flow controller, an electromagnetic valve and a gas pipeline. One end of the pressure reducing valve is connected with the gas input end, while the other end of the pressure reducing valve is connected with the mass flow controller. The gas pipeline is divided into a first part and a second part which are sealed and independent. The output end of the mass flow controller is divided into two branches which are connected with the first part and the second part of the gas pipeline respectively. Each branch of the mass flow controller connected with the gas pipeline is provided with the electromagnetic valve. The first part of the gas pipeline is connected with a first-stage cavity body of the dry vacuum pump, while the second part is connected with a second cavity body, a third cavity body, a fourth cavity body and a fifth cavity body of the dry vacuum pump respectively. The cleaning device performs cleaning actions to the cavity body of each stage, and the cleaning is complete. The cleaning device has the advantages of simple and accurate control, high vacuum degree, and the like.
Description
Technical field
The utility model relates to the vavuum pump cleaning technique, specifically a kind of cleaning device of multi-stage dry vacuum pump.
Background technology
Along with being surging forward of semi-conductor industry, electronics industry, the against vacuum environment requirement is more and more, more and more stricter.Because the vacuum system of being made up of common oil sealing mechanical pump, diffusion pump is easy to return oil in vacuum chamber, the oil molecule in the vacuum chamber can deposit on the silicon chip crystal, makes silicon crystal become waste product.So the application of such vacuum system in semi-conductor industry, electronics industry is restricted.On the contrary,, accomplished that no oil vapour pollutes because dry vacuum pump does not need lubricating oil to come lubrication and seal, and insensitive to the dust and the steam that contain in the pumped gas.So the vacuum system of being made up of dry vacuum pump has obtained using widely, and in the evolution of semi-conductor industry, electronics industry, played the effect that promotes.
Because in semiconductor technology (particularly medium technology, harsh technology, for example source ion implantation, CVD (chemical vapour deposition (CVD)), PECVD (plasma enhanced chemical vapor deposition) etc.) in can produce a large amount of poisonous and corrosive gas (for example ammonia, methane etc.), these gases are discharged through exhaust outlet by the cavity of dried pump.Because these gases are very big to the murder by poisoning of human body, and are also very strong to the corrosivity of equipment, therefore avoid the corrosion of waste gas, thereby the waste gas that produces is diluted the safety that reaches protection human body and equipment dry vacuum pump, become problem demanding prompt solution.
The utility model content
In order to solve the problem that dry vacuum pump is corroded by waste gas, the purpose of this utility model is to provide a kind of cleaning device of multi-stage dry vacuum pump, solved the waste gas that in semiconductor technology, produces etching problem to dry vacuum pump, reduced the injury of toxic gas, played pump housing air cooling (purge function by nitrogen and make the pump cooling) effect to human body.
The purpose of this utility model is achieved through the following technical solutions:
The utility model comprises pressure-reducing valve, mass flow controller, magnetic valve and gas piping, and an end of pressure-reducing valve links to each other with the gas input, and the other end is connected with mass flow controller; Gas piping is divided into and seals independently first and second portion, and the output of mass flow controller is divided into two-way, is connected with first and second part of gas piping respectively; Each road that mass flow controller is connected with gas piping is equipped with magnetic valve; First in the gas piping is connected with the one-level cavity of dry vacuum pump, and second portion is connected with two～five cavitys of dry vacuum pump respectively.
Wherein: be connected with tube connector in the first in the described gas piping, the other end of tube connector is connected with the one-level cavity of dry vacuum pump by gas circuit head, through hole screw, is provided with check valve on tube connector; Check valve is an one-way throttle valve; Be connected with four tube connectors on the second portion in the described gas piping, the other end of every tube connector all is connected with two～five cavitys of dry vacuum pump by gas circuit head, through hole screw, is equipped with check valve on every tube connector; Check valve is an one-way throttle valve; Be provided with shutoff in the described gas piping, gas piping be divided into seal independently first and second portion; Described pressure-reducing valve is connected with the gas input by quick-release coupling.
Advantage of the present utility model and good effect are:
1. the utility model all has with each grade cavity of multi-stage dry vacuum pump and is connected, and each grade cavity has all been played cleaning action, cleans thoroughly.
2. the utility model adopts the output signal of mass flow controller to show constantly to go into dry vacuum pump housing N
2The numerical value of flow adopts pressure-reducing valve to regulate N
2The flow size adopts solenoid control N
2Break-make, control is simple, accurately.
3. the N that charges into of the corresponding different vacuum level cavity of the utility model
2The flow difference has prevented owing to charge into N
2And reduce at the bottom of causing vacuum.
4. the utility model is provided with check valve on pipeline, prevents that gas from backflowing; Check valve can be one-way throttle valve, adopts the mode of current limliting to control the N that feeds in each grade cavity
2Size.
5. the utility model adopts electrical control N
2Flow, the influence of against vacuum degree is minimum.
Description of drawings
Fig. 1 is a structural representation of the present utility model;
The circuit theory diagrams that Fig. 2 detects for the utility model mass flow;
Fig. 3 is the circuit theory diagrams of the utility model solenoid control;
Fig. 4 is a control flow chart of the present utility model;
Wherein: 1 is pressure-reducing valve, and 2 is mass flow controller, and 3 is first magnetic valve, and 4 is gas piping, and 5 is check valve, and 6 is the gas circuit head, and 7 is the through hole screw, and 8 is second magnetic valve, and 9 are shutoff, and 10 is first, and 11 is second portion, and 12 is tube connector.
The specific embodiment
The utility model is described in further detail below in conjunction with accompanying drawing.
As shown in Figure 1, the utility model comprises pressure-reducing valve 1, mass flow controller 2, magnetic valve and gas piping 4, and an end of pressure-reducing valve 1 is by quick-release coupling and N
2Input links to each other, and the other end is connected with mass flow controller 2; Be provided with shutoff 9 in the gas piping 4, gas piping 4 be divided into seal independently first 10 and second portion 11; The output of mass flow controller 2 is divided into two-way, is connected with first and second part 10,11 of gas piping 4 respectively; Be respectively equipped with first and second magnetic valve 3,8 on two pipelines that mass flow controller 2 is connected with gas piping 4; Be connected with tube connector 12 in the first 10 in the gas piping 4, the other end of tube connector 12 is connected with the one-level cavity A (low-pressure stage cavity) of dry vacuum pump by gas circuit 6, through hole screw 7, is provided with check valve 5 on tube connector 12; Be connected with four tube connectors 12 on the second portion 11 in the gas piping 4, the other end of every tube connector 12 all is connected with two～five cavity B～E of dry vacuum pump by gas circuit 6, through hole screw 7, can play the effect of dilution toxic gas, on every tube connector 12, be equipped with check valve 5.The check valve 5 of present embodiment is an one-way throttle valve, can carry out throttling to the gas that enters different cavitys when preventing to backflow, and from the high vacuum level, flow increases step by step.
Because N at different semiconductor technology feedings
2The purging amount is inequality, therefore N of the present utility model
2Control its flow by pressure-reducing valve 1.N
2The signal of telecommunication of the size of flow by mass flow controller 2 transmission reads by the preceding control panel of dry vacuum pump.First and second magnetic valve 3,8 is respectively to two-way N
2Control,, only need open first magnetic valve 3 of high vacuum level end, feed N for the semiconductor technology that relatively cleans
2One-level cavity A (axle end-blocking) is cleaned, and the protection bearing is not corroded.Carry out N and open first and second magnetic valve 3,8 simultaneously for comparatively harsh arts demand
2Purge.In order to prevent to feed the N in the dry vacuum pump housing
2Backflow, on the tube connector 12 of cavitys at different levels, check valve 5 is being installed all; In order to reduce the influence to vacuum, check valve 5 is an one-way throttle valve, adopts the mode of current limliting to control the N that feeds in each grade cavity
2Size, from the high vacuum level (one-level cavity A) of dry vacuum pump to low vacuum level (Pyatyi cavity E), the N that is blown into
2Flow increases successively.
As shown in Figure 2, N
2The flow detection circuit design principle is to adopt mass flow controller, the gas flow signal is changed into the signal of telecommunication, carry out sending after the gain-adjusted AD ALT-CH alternate channel of CPU through operational amplifier, analog signal conversion is become data signal, carry out flow by display screen at last and show.
As shown in Figure 3, the design principle of solenoid valve control circuit is the button transmission valve open and close information by front panel, after the input of CPU receives corresponding information, give trigger U7 signal by I/O mouth output, trigger corresponding solenoid control relay coil through driver module U9 again, the corresponding relays junction closure, magnetic valve is charged, the corresponding gas piping of open and close.
As shown in Figure 4, workflow of the present utility model is:
Insert N by quick-release coupling
2Feed system selects according to process environments whether needs are opened first and second magnetic valve 3,8 simultaneously; If at the technology of clean cleaning, not opens solenoid valve; First magnetic valve 3 of other situation lower shaft end-blocking should be opened, and feeds N
2The axle end-blocking is cleaned.If process environments is comparatively harsh, then first and second magnetic valve 3,8 is opened simultaneously, regulate pressure-reducing valve 1 again and read the flow registration, detect N
2Whether flow reaches the regulation requirement, if reach requirement, carries out N
2Purge; If do not reach requirement, readjust pressure-reducing valve 1 again until N
2Flow reaches the regulation requirement.
The utility model can keep vacuum environment not contaminated in pumping process, is applicable to industries such as semiconductor, petrochemical industry, metallurgy, food, medicine, electronics, packing, printing.
Claims (7)
1. the cleaning device of a multi-stage dry vacuum pump, it is characterized in that: comprise pressure-reducing valve (1), mass flow controller (2), magnetic valve and gas piping (4), one end of pressure-reducing valve (1) links to each other with the gas input, and the other end is connected with mass flow controller (2); Gas piping (4) is divided into and seals independently first (10) and second portion (11), and the output of mass flow controller (2) is divided into two-way, is connected with first and second part (10,11) of gas piping (4) respectively; Mass flow controller (2) is equipped with magnetic valve with each road that gas piping (4) is connected; First (10) in the gas piping (4) is connected with the one-level cavity (A) of dry vacuum pump, second portion (11) respectively with two～five cavitys (B～E) be connected of dry vacuum pump.
2. press the cleaning device of the described multi-stage dry vacuum pump of claim 1, it is characterized in that: be connected with tube connector (12) in the first (10) in the described gas piping (4), the other end of tube connector (12) is connected with the one-level cavity (A) of dry vacuum pump by gas circuit head (6), through hole screw (7), is provided with check valve (5) on tube connector (12).
3. by the cleaning device of the described multi-stage dry vacuum pump of claim 2, it is characterized in that: described check valve (5) is an one-way throttle valve.
4. press the cleaning device of the described multi-stage dry vacuum pump of claim 1, it is characterized in that: be connected with four tube connectors (12) on the second portion (11) in the described gas piping (4), the other end of every tube connector (12) all two～five cavitys by gas circuit head (6), through hole screw (7) and dry vacuum pump (B～E) be connected is equipped with check valve (5) on every tube connector (12).
5. by the cleaning device of the described multi-stage dry vacuum pump of claim 4, it is characterized in that: described check valve (5) is an one-way throttle valve.
6. by the cleaning device of the described multi-stage dry vacuum pump of claim 1, it is characterized in that: be provided with shutoff (9) in the described gas piping (4), gas piping (4) be divided into seal independently first (10) and second portion (11).
7. by the cleaning device of the described multi-stage dry vacuum pump of claim 1, it is characterized in that: described pressure-reducing valve (1) is connected with the gas input by quick-release coupling.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CNU2008200133658U CN201200981Y (en) | 2008-06-06 | 2008-06-06 | Cleaner of multilevel dry-type vacuum pump |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CNU2008200133658U CN201200981Y (en) | 2008-06-06 | 2008-06-06 | Cleaner of multilevel dry-type vacuum pump |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN201200981Y true CN201200981Y (en) | 2009-03-04 |
Family
ID=40423292
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CNU2008200133658U Expired - Lifetime CN201200981Y (en) | 2008-06-06 | 2008-06-06 | Cleaner of multilevel dry-type vacuum pump |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN201200981Y (en) |
Cited By (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US20130019900A1 (en) * | 2011-07-19 | 2013-01-24 | Multivac Sepp Haggenmuller Gmbh & Co. Kg | Cleaning method and system for a vacuum pump |
| CN105649953A (en) * | 2014-11-11 | 2016-06-08 | 中国科学院沈阳科学仪器股份有限公司 | Gas path system used for multi-level dry vacuum pump |
| CN112705538A (en) * | 2020-12-04 | 2021-04-27 | 浙江银轮机械股份有限公司 | Roots pump and screw pump vacuum unit cleaning assembly |
| CN114593036A (en) * | 2020-12-07 | 2022-06-07 | 中国科学院沈阳科学仪器股份有限公司 | Gas path distribution system for multistage dry vacuum pump |
| CN114962269A (en) * | 2021-02-26 | 2022-08-30 | 中国科学院微电子研究所 | Vacuum pump and vacuum pump system |
| CN116428155A (en) * | 2023-04-13 | 2023-07-14 | 北京通嘉宏瑞科技有限公司 | Pump body cleaning system and pump body cleaning control method |
-
2008
- 2008-06-06 CN CNU2008200133658U patent/CN201200981Y/en not_active Expired - Lifetime
Cited By (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US20130019900A1 (en) * | 2011-07-19 | 2013-01-24 | Multivac Sepp Haggenmuller Gmbh & Co. Kg | Cleaning method and system for a vacuum pump |
| CN105649953A (en) * | 2014-11-11 | 2016-06-08 | 中国科学院沈阳科学仪器股份有限公司 | Gas path system used for multi-level dry vacuum pump |
| CN112705538A (en) * | 2020-12-04 | 2021-04-27 | 浙江银轮机械股份有限公司 | Roots pump and screw pump vacuum unit cleaning assembly |
| CN114593036A (en) * | 2020-12-07 | 2022-06-07 | 中国科学院沈阳科学仪器股份有限公司 | Gas path distribution system for multistage dry vacuum pump |
| CN114962269A (en) * | 2021-02-26 | 2022-08-30 | 中国科学院微电子研究所 | Vacuum pump and vacuum pump system |
| CN116428155A (en) * | 2023-04-13 | 2023-07-14 | 北京通嘉宏瑞科技有限公司 | Pump body cleaning system and pump body cleaning control method |
| CN116428155B (en) * | 2023-04-13 | 2024-03-22 | 北京通嘉宏瑞科技有限公司 | Pump body cleaning system and pump body cleaning control method |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| C14 | Grant of patent or utility model | ||
| GR01 | Patent grant | ||
| C56 | Change in the name or address of the patentee |
Owner name: CAS SHENYANG SCIENTIFIC INSTRUMENTS CO., LTD. Free format text: FORMER NAME: SHENYANG SCIENTIFIC INSTRUMENT RESEARCH + MFG. CENTER CO., LTD., C.A.S |
|
| CP03 | Change of name, title or address |
Address after: Hunnan Shenyang 110197 Liaoning province Xinyuan street, No. 1 Patentee after: Shenyang Scientific Apparatus Co., Ltd. of Chinese Academy of Sciences Address before: Xinyuan street Shenyang Hunnan New District of 110168 cities in Liaoning province. Patentee before: Shenyang Scientific Instrument Research & Mfg. Center Co., Ltd., C.A.S |
|
| EE01 | Entry into force of recordation of patent licensing contract |
Assignee: Shanghai Kai Kai Vacuum Technology Co., Ltd. Assignor: Shenyang Scientific Apparatus Co., Ltd. of Chinese Academy of Sciences Contract record no.: 2016210000006 Denomination of utility model: Cleaner of multilevel dry-type vacuum pump Granted publication date: 20090304 License type: Exclusive License Record date: 20160203 |
|
| LICC | Enforcement, change and cancellation of record of contracts on the licence for exploitation of a patent or utility model | ||
| CX01 | Expiry of patent term |
Granted publication date: 20090304 |
|
| CX01 | Expiry of patent term |