CN1800990A - Elimination method of carbonate in resists development liquid, elimination apparatus and concentration control method of resists development liquid - Google Patents
Elimination method of carbonate in resists development liquid, elimination apparatus and concentration control method of resists development liquid Download PDFInfo
- Publication number
- CN1800990A CN1800990A CNA2006100057185A CN200610005718A CN1800990A CN 1800990 A CN1800990 A CN 1800990A CN A2006100057185 A CNA2006100057185 A CN A2006100057185A CN 200610005718 A CN200610005718 A CN 200610005718A CN 1800990 A CN1800990 A CN 1800990A
- Authority
- CN
- China
- Prior art keywords
- resist
- carbonate
- liquid
- imaging liquid
- resist imaging
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000000034 method Methods 0.000 title claims abstract description 27
- 239000007788 liquid Substances 0.000 title claims description 134
- BVKZGUZCCUSVTD-UHFFFAOYSA-L Carbonate Chemical compound [O-]C([O-])=O BVKZGUZCCUSVTD-UHFFFAOYSA-L 0.000 title claims description 57
- 230000008030 elimination Effects 0.000 title 2
- 238000003379 elimination reaction Methods 0.000 title 2
- WGTYBPLFGIVFAS-UHFFFAOYSA-M tetramethylammonium hydroxide Chemical compound [OH-].C[N+](C)(C)C WGTYBPLFGIVFAS-UHFFFAOYSA-M 0.000 claims abstract description 117
- 238000001914 filtration Methods 0.000 claims abstract description 15
- 238000003384 imaging method Methods 0.000 claims description 104
- 238000005374 membrane filtration Methods 0.000 claims description 6
- VHUUQVKOLVNVRT-UHFFFAOYSA-N Ammonium hydroxide Chemical compound [NH4+].[OH-] VHUUQVKOLVNVRT-UHFFFAOYSA-N 0.000 claims 1
- 150000004649 carbonic acid derivatives Chemical class 0.000 abstract 4
- 238000001728 nano-filtration Methods 0.000 abstract 2
- 239000012528 membrane Substances 0.000 abstract 1
- 230000001105 regulatory effect Effects 0.000 description 23
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 12
- QEMXHQIAXOOASZ-UHFFFAOYSA-N tetramethylammonium Chemical compound C[N+](C)(C)C QEMXHQIAXOOASZ-UHFFFAOYSA-N 0.000 description 10
- BVKZGUZCCUSVTD-UHFFFAOYSA-M Bicarbonate Chemical compound OC([O-])=O BVKZGUZCCUSVTD-UHFFFAOYSA-M 0.000 description 6
- 230000002779 inactivation Effects 0.000 description 6
- 229920003986 novolac Polymers 0.000 description 5
- CURLTUGMZLYLDI-UHFFFAOYSA-N Carbon dioxide Chemical compound O=C=O CURLTUGMZLYLDI-UHFFFAOYSA-N 0.000 description 4
- 229920002120 photoresistant polymer Polymers 0.000 description 4
- 230000001172 regenerating effect Effects 0.000 description 4
- 230000015572 biosynthetic process Effects 0.000 description 3
- 238000010586 diagram Methods 0.000 description 3
- 238000007599 discharging Methods 0.000 description 3
- 239000000203 mixture Substances 0.000 description 3
- NIXOWILDQLNWCW-UHFFFAOYSA-N Acrylic acid Chemical class OC(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 description 2
- CZMRCDWAGMRECN-UGDNZRGBSA-N Sucrose Chemical compound O[C@H]1[C@H](O)[C@@H](CO)O[C@@]1(CO)O[C@@H]1[C@H](O)[C@@H](O)[C@H](O)[C@@H](CO)O1 CZMRCDWAGMRECN-UGDNZRGBSA-N 0.000 description 2
- 229930006000 Sucrose Natural products 0.000 description 2
- 229910002092 carbon dioxide Inorganic materials 0.000 description 2
- 239000001569 carbon dioxide Substances 0.000 description 2
- 230000006866 deterioration Effects 0.000 description 2
- 239000000975 dye Substances 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 230000007613 environmental effect Effects 0.000 description 2
- 239000012530 fluid Substances 0.000 description 2
- 150000002500 ions Chemical class 0.000 description 2
- 238000001259 photo etching Methods 0.000 description 2
- 230000008929 regeneration Effects 0.000 description 2
- 238000011069 regeneration method Methods 0.000 description 2
- 229920005989 resin Polymers 0.000 description 2
- 239000011347 resin Substances 0.000 description 2
- 239000005720 sucrose Substances 0.000 description 2
- 206010070834 Sensitisation Diseases 0.000 description 1
- 239000002253 acid Substances 0.000 description 1
- 239000003513 alkali Substances 0.000 description 1
- 230000004888 barrier function Effects 0.000 description 1
- 239000002585 base Substances 0.000 description 1
- 125000005587 carbonate group Chemical group 0.000 description 1
- 239000003795 chemical substances by application Substances 0.000 description 1
- 238000004587 chromatography analysis Methods 0.000 description 1
- 239000012141 concentrate Substances 0.000 description 1
- 238000004132 cross linking Methods 0.000 description 1
- 238000009792 diffusion process Methods 0.000 description 1
- 239000000839 emulsion Substances 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- -1 for example Chemical compound 0.000 description 1
- 230000009931 harmful effect Effects 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- 239000000049 pigment Substances 0.000 description 1
- 230000002265 prevention Effects 0.000 description 1
- ADXCEOBGDCQCKM-UHFFFAOYSA-N quinoline-2,3-dione Chemical compound C1=CC=CC2=NC(=O)C(=O)C=C21 ADXCEOBGDCQCKM-UHFFFAOYSA-N 0.000 description 1
- 150000003839 salts Chemical class 0.000 description 1
- 230000008313 sensitization Effects 0.000 description 1
- 238000003756 stirring Methods 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 238000004448 titration Methods 0.000 description 1
- 238000002834 transmittance Methods 0.000 description 1
- GETQZCLCWQTVFV-UHFFFAOYSA-N trimethylamine Chemical compound CN(C)C GETQZCLCWQTVFV-UHFFFAOYSA-N 0.000 description 1
Images
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/26—Processing photosensitive materials; Apparatus therefor
- G03F7/30—Imagewise removal using liquid means
- G03F7/32—Liquid compositions therefor, e.g. developers
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
- G03F7/0007—Filters, e.g. additive colour filters; Components for display devices
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/06—Silver salts
- G03F7/063—Additives or means to improve the lithographic properties; Processing solutions characterised by such additives; Treatment after development or transfer, e.g. finishing, washing; Correction or deletion fluids
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/26—Processing photosensitive materials; Apparatus therefor
- G03F7/30—Imagewise removal using liquid means
- G03F7/3021—Imagewise removal using liquid means from a wafer supported on a rotating chuck
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/26—Processing photosensitive materials; Apparatus therefor
- G03F7/30—Imagewise removal using liquid means
- G03F7/32—Liquid compositions therefor, e.g. developers
- G03F7/322—Aqueous alkaline compositions
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/26—Processing photosensitive materials; Apparatus therefor
- G03F7/40—Treatment after imagewise removal, e.g. baking
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Separation Using Semi-Permeable Membranes (AREA)
Abstract
To provide a method and a device for removing carbonates from a resist developing solution containing TMAH (tetramethylammonium hydroxide) and carbonates, and to provide a method for controlling the concentration of a resist developing solution. The method for removing carbonates in the resist developing solution includes a filtration step of filtering a resist developing solution containing TMAH and carbonates through an NF (nano filtration) membrane.
Description
Technical field
The present invention relates to remove the concentration control method of method, device and the resist imaging liquid of carbonate in the resist imaging liquid.
Background technology
So far, the manufacturing of electron device often utilizes photoetching process.In this photoetching process, behind the light graph exposure formation sub-image of stipulating on the photoresist, with this photoresist video picture, the operation of charting.Usually, the resist imaging liquid (for example, open flat 5-11458 communique with reference to the spy, the spy opens flat 5-40345 communique) that contains hydroxide tetramethylammonium (to call TMAH in the following text) is used in such video picture.
TMAH in the resist imaging liquid consumes because of the video picture with resist, so cause the deterioration of the video picture performance of resist imaging liquid with the process of service time.In recent years,,, make the TMAH constant concentration in the resist imaging liquid, both kept the video picture performance of resist imaging liquid, make resist imaging liquid long lifetime again by in the resist imaging liquid, replenishing TMAH at any time for the conductivity that makes the resist imaging liquid is constant.Therefore, the resist imaging liquid has the tendency with the environmental gas Long contact time of air etc.
Yet, the result that inventors study distinguishes, if the resist imaging liquid that contains TMAH contacts with the environmental gas of air etc. for a long time, then the carbon dioxide in the ambiance dissolves in this resist imaging liquid, in the resist imaging liquid, accumulate various carbonate, for example, carbonate of TMA (tetramethylammonium) etc.
In addition, if accumulate such carbonate in the resist imaging liquid, then might cause harmful effect to the video picture performance of resist.In addition, because the carbonate of TMA carries out the part disassociation in the resist imaging liquid, so the carbonate of TMA increases the conductivity of resist imaging liquid.Yet,,, also be difficult to the concentration of the TMAH of pinpoint accuracy ground control resist imaging liquid sometimes even in the resist imaging liquid, replenish TMAH for keeping the conductivity of resist imaging liquid consistently.
Therefore, must from the resist imaging liquid, remove carbonate.
Summary of the invention
The present invention finishes in view of above-mentioned problem, and its purpose is to provide the concentration control method of method, device and the resist imaging liquid of removing carbonate from the resist imaging liquid that contains TMAH and carbonate.
The result of the wholwe-hearted research of present inventors when finding to utilize the NF membrane filtration to contain the resist imaging liquid of TMAH and carbonate, can remove carbonate in the resist imaging liquid in the non-side that sees through, thereby expect the present invention.
The method of removing of carbonate in the resist imaging liquid of the present invention has the filtration operation of utilizing the NF membrane filtration to contain the resist imaging liquid of TMAH (tetramethylammonium hydroxide) and carbonate.
In the resist imaging liquid of the present invention carbonate remove device, have the filtration means of utilizing the NF membrane filtration to contain the resist imaging liquid of TMAH and carbonate.
According to the present invention, contain the resist imaging liquid of TMAH and carbonate by utilizing the NF membrane filtration, compare with the resist imaging liquid before filtering, can reduce the carbonate concentration in the filtered fluid fully.
As the reason that obtains this effect, for example, can enumerate water (molecular weight about 18) or TMAH (molecular weight about 91) can be easily NF film by above-mentioned classification molecular weight, and carbonate for example the carbonate of TMA (trimethylammonium) (molecular weight about 208) estimate that structure can become spatial structure, because the increase of this structure and molecular weight is difficult to the film by NF comparatively speaking.
Therefore, the classification molecular weight of NF film preferably 500～1500 is more preferably 700～1000.
The concentration control method of resist imaging liquid of the present invention, comprise the method for removing that adopts carbonate in above-mentioned any described resist imaging liquid remove the resist imaging liquid carbonate operation and use conductivity meter to measure the concentration determination operation of the TMAH concentration of the resist imaging liquid of having removed carbonate.
Because carbonate is partly disassociation in the resist imaging liquid, so the existence of carbonate worsens degree of accuracy in the mensuration of the TMAH concentration of using conductivity meter, but,, can measure to pinpoint accuracy the TMAH concentration of resist imaging liquid owing to remove carbonate in advance if adopt the present invention.
Adopt the present invention, can from the resist imaging liquid, remove carbonate expeditiously.
Description of drawings
Fig. 1 is the schematic flow diagram of the resist imaging system of relevant embodiment of the present invention.
Fig. 2 is the process flow diagram of the filtering process among the expression embodiment.
(symbol description) 40...NF film, the 74... conductivity meter, 30A, 30B, 30C, 30D... filtration unit (filtration means), 14... carbonate remove device.
Embodiment
Below, the limit describes optimum implementation of the present invention with reference to the accompanying drawing limit.
Moreover, in the following description, use same-sign in identical or considerable part, save the explanation of repetition.
Fig. 1 is the process flow diagram of the imaging system 10 of the relevant the present embodiment of expression.
This imaging system 10 has the resist display 12 of the resist video picture of using the resist imaging liquid to make sensitization and the resist imaging liquid regenerating unit 14 that the used resist imaging liquid of video picture is regenerated.
The device that resist display 12 is to use the resist imaging liquid will adopt the resist of known method exposure to carry out video picture can use known in the past resist display 12.
As the resist that becomes the video picture object, it can be the photoresist material, for example, can use base resin and the two known in the past eurymeric resist composition of emulsion such as quinoline quinone repeatedly that contains linear novolac resin etc., or contain the known in the past negative resist composition etc. of alkali soluble resin, photic acid producing agent, crosslinking chemical and pigment.
As resist imaging liquid, use the alkaline resist imaging liquid that contains TMAH (tetramethylammonium hydroxide) to this resist video picture.Particularly, the solution that for example contains 0.4～3.0 quality %TMAH is suitable as the resist imaging liquid.
Then, resist imaging liquid regenerating unit 14 is described.This resist imaging liquid regenerating unit 14 is to regulate the device of the TMAH concentration of resist imaging liquid along with remove carbonate in the resist imaging liquid that uses from resist display 12.Resist imaging liquid regenerating unit 14 mainly has basin 20, a plurality of filtrator 30A, 30B, 30C, 30D and regulating tank 50.
Filtrator (filtration means) 30A～30D filters the device that is stored in the resist imaging liquid in the basin 20.This filtrator 30A～30D has NF film 40 respectively, the resist imaging liquid as being filtered object that flows into from inlet i is separated into seeing through liquid and not seeing through the non-through liquid of NF film 40 through NF film 40, discharge through liquid from seeing through liquid outlet p, discharge the non-liquid that sees through from the non-liquid outlet u that sees through.
This NF film 40 is diffusion barriers of classification molecular weight about 200～2000.Especially in order to separate carbonate expeditiously, preferred classification molecular weight is 500～1500, and more preferably the classification molecular weight is 700～1000.
Therefore, the classification molecular weight may be defined as and is about 90% molecular weight through the prevention rate, for example, can be by the transmittance curve simulated determination that uses 5% sucrose solution (molecular weight of sucrose about 342) or 0.1% dye solution (molecular weight of dyestuff about 626) to wait mensuration.
Then, the annexation to filtrator 30A～30D describes in detail.Basin 20 is connected with the inlet i of filtrator 30A by being in series with the pipeline L12 of pump 24 and pump 26.
The non-liquid outlet u that sees through of filtrator 30A is connected with the inlet i of filtrator 30B by pipeline L14.The non-liquid outlet u that sees through of filtrator 30B is connected with the inlet i of filtrator 30C by pipeline L16 again, and the non-liquid outlet u that sees through of filtrator 30C is connected with the inlet i of filtrator 30D by pipeline L18 again.
In addition, the non-liquid outlet u that sees through of filtrator 30D is by pipeline L20, is connected with the pump 24 on the pipeline L12 and the centre of pump 26.
Tell the pipeline L22 that has valve V2 again by pipeline L20, be connected with drain tank 32 on this pipeline L22.
The liquid that sees through of the NF film 40 on each filtrator 30A～30D exports p, links to each other with regulating tank 50 by pipeline L30 respectively.
Regulating tank 50 is connected with resist display 12 by the pipeline L40 that pump 52 is arranged.
Connect the former liquid supply system 60 of resist video picture by the pipeline L50 that valve V50 is arranged on this regulating tank 50, connect the new liquid supply system 62 of video picture, connect pure water feed system 64 by the pipeline L54 that valve V54 is arranged by the pipeline L52 that valve V52 is arranged.
The former liquid supply system 60 of resist video picture, be with TMAH for the concentration of regulation for example the resist imaging liquid of 20 weight % supply with the system of regulating tank 50, the new liquid supply system 62 of resist video picture, be TMAH to be preestablished into resist display 12 intend the system that the resist imaging liquid of the concentration of use is supplied with regulating tank 50, pure water feed system 64 is the systems that pure water supplied with regulating tank 50.
Valve V50, valve V52 and valve V54 link to each other with control device 80, control device 80 each flow of control.
In addition, establish the stirrer 70 that has stirrer paddle 72 in the regulating tank 50, establish the conductivity meter 74 of measuring resist imaging liquid conductivity in the regulating tank 50 simultaneously.
This conductivity meter 74 links to each other with control device 80, and the conductivity that control device 80 is measured according to conductivity meter 74 is controlled each flow, makes the TMAH concentration of the resist imaging liquid in the regulating tank 50 become the concentration (for example, 2.38 weight %) of regulation.
Then, the resist developing method to the imaging system of the present embodiment describes.
At first, regulating TMAH in regulating tank 50 in advance for example is the resist imaging liquid of 2.38 weight % for the concentration of stipulating, because this operation is known operation, so save detailed description, but, can easily carry out by in regulating tank 50, supplying with various liquid by the former liquid supply system 60 of resist video picture, the new liquid supply system 62 of resist video picture and pure water feed system 64 ratio in accordance with regulations.
In addition, by the resist imaging liquid that pump 52 is supplied with in the regulating tank 50 to resist display 12, in resist display 12, use the resist after this resist imaging liquid will expose to carry out video picture.
Along with the video picture of resist is carried out, the TMAH in the resist imaging liquid consumes.And the carbon dioxide in the ambiance is dissolved in the resist imaging liquid, forms various carbonate with the composition reaction of TMAH in the resist imaging liquid etc.For example, as carbonate, can enumerate is the kation of TMAH, i.e. tetramethylammonium (TMA
+) carbonate (TMA) of ion
2CO
3(TMA)
2CO
3Molecular weight be about 208.
In addition, along with the video picture of resist, in the resist imaging liquid, also accumulate the resist of dissolving.
Like this, consume TMAH, the long-pending resist imaging liquid that the resist of carbonate or dissolving is arranged, be stored in the basin 20 by pump 22 after, supply with filtrator 30A by pump 24 and pump 26.At this, the resist imaging liquid utilizes pump 24 or pump 26 to supply with filtrator 30A under the pressure of regulation.
In filtrator 30A, because (for example, (TMA) of molecular weight about 208 of the carbonate in the resist imaging liquid
2CO
3) or the resist of dissolving is difficult sees through NF film 40, so the major part of the resist of carbonate or dissolving is by pipeline L14 supply filtrator 30B.And water in the resist imaging liquid (molecular weight about 18) or TMAH (molecular weight about 91) are owing to can see through NF film 40 fully, so pressure differential by NF film 40 front and back, these water and TMAH see through NF film 40, arrive regulating tank 50 by pipeline L30, in the opposing party's concentrate side, water that does not see through and TMAH supply with filtrator 30B with not seeing through the carbonate of NF film 40 or the resist of dissolving.
At filtrator 30B, see through NF film 40 because the resist of carbonate or dissolving is also difficult, so the main pipeline L16 of passing through supplies with filtrator 30C, and water or TMAH see through NF film 40, supply with regulating tank 50 by pipeline L30.
Similarly, the non-liquid that sees through from filtrator 30B, each the NF film 40 that is filtered device 30C and filtrator 30D again filters, and water and TMAH supply with regulating tank 50 by pipeline L30, and the non-liquid that sees through of the resist of carbonate containing, dissolving, water and TMAH is recycled to pipeline L12 by pipeline L20.
In addition, be discharged to drain tank 32 from the non-part that sees through liquid of filtrator 30D by pipeline L22, for example, non-carbonate concentration that sees through side that makes NF film 40 or resist concentration etc. can be too not high.
Regulating tank 50, use conductivity meter 74 to measure the conductivity that sees through liquid that the resist imaging liquid that sees through is mainly moisture and TMAH, get back to the setting of regulation for the concentration that makes TMAH, can with video picture stoste, the new liquid of video picture and water individually or combination in any ground supply with regulating tank, can also utilize stirrer paddle 72 to stir this liquid, regeneration obtains the resist imaging liquid of desired TMAH concentration.In addition, the resist imaging liquid of regeneration turns back to resist display 12 by pipeline L40 like this.
If adopt such system, owing to adopt the used resist imaging liquid of the resist that accumulates carbonate or dissolving under the video picture operation effect in the NF film 40 filtration resist displaies 12, so can from see through liquid, remove the resist of carbonate or dissolving.In addition, can utilize regulating tank 50 to turn back to resist display 12, as the resist imaging liquid, so can suppress the deterioration etc. of the video picture performance of the resist imaging liquid that the increase with the resist of carbonate or dissolving etc. causes owing to should see through liquid.
In addition, regulating tank 50 has utilized conductivity meter 74 to measure to remove the TMAH concentration in the filtered fluid of carbonate etc.Because after the partial ionization, if there is carbonate in a large number in regulating tank 50, then the mensuration of the TMAH concentration of conductivity meter is used in influence to carbonate in the resist imaging liquid.Yet, adopt the present invention, owing to before conductance measurement, removed carbonate in advance, can measure to pinpoint accuracy the TMAH concentration of resist imaging liquid.Therefore, utilize control device 80 can carry out to pinpoint accuracy the adjusting or the control of the TMAH concentration in the regulating tank 50, can utilize the video picture in the resist display 12 of resist imaging liquid better again.
Moreover, the invention is not restricted to above-mentioned embodiment, also various distortion.
For example, though above-mentioned embodiment is connected in series a plurality of filtrator 30A～30D, single filtrator also can be worked, and in addition, also can connect a plurality of filtrators side by side.
Embodiment
Below, enumerate purposes of the present invention according to embodiment.Here, as shown in Figure 2, become following device: by the filtration unit 30A supply video picture used resist imaging liquid of pipeline L100 to one, seeing through liquid discharges from filtration unit 30A by pipeline L104, a non-part that sees through liquid is recycled to pipeline L100 by pipeline L102, and the non-remainder that sees through liquid is discharged by pipeline L103.Here, the flow of the resist imaging liquid of supplying with to the inlet of pipeline L100 is Qin, the flow of the resist imaging liquid of discharging from the outlet of pipeline L104 is Qper, the flow that is recycled to the resist imaging liquid of pipeline L100 by pipeline L102 is Qr, and the flow of the resist imaging liquid of discharging by pipeline L103 is Qout.
Here, the classification molecular weight of NF film 40 is 1000.
Embodiment 1 uses the resist imaging liquid that contains 2.38%TMAH, supplies with the used resist imaging liquid of linear novolaks class resist video picture as Qin to the inlet of pipeline L100.Embodiment 2 uses the resist imaging liquid that contains 2.379%TMAH, supplies with the used resist imaging liquid of linear novolaks class resist video picture as Qin to the inlet of pipeline L100.And embodiment 3 uses the resist imaging liquid that contains 0.471%TMAH, supplies with the used resist imaging liquid of acrylic acid series resist video picture as Qin to the inlet of pipeline L100.
In addition, filtration reach each stream Qin, the Qout after constant, flow and the concentration of Qper, Qr is shown in table 1.Here, the carbonic acid ion concentration adopts chromatography of ions to obtain, and inactivation TMAH concentration and active TMAH concentration adopt the salt acidometric titration to obtain, and the resist concentration of dissolving adopts the dry weight method to obtain.The increase performance as the carbonic acid ion is estimated in the formation of carbonate, and the while also shows as the increase of inactivation TMAH.In addition, the inactivation of TMAH is except that the formation of carbonate, and estimation also helps the reaction with resist.
Can clearly illustrate that by table 1, see through carbonic acid ion concentration or the inactivation TMAH concentration of liquid Qper, more much lower than each concentration of supplying with liquid Qin, but not it is then high a lot of to see through the carbonic acid ion concentration or the inactivation TMAH concentration of discharging liquid Qout.In addition, the resist of dissolving also presents and the equal tendency of carbonic acid ion concentration.And active TMAH concentration does not change between Qin, Qper, Qout basically.
Table 1
| Video picture object resist | The kind of stream | Flow (L/min) | Carbonic acid ion concentration (wtppm) | Inactivation TMAH concentration (wt%) | The resist concentration (wt%) of dissolving | Active TMAH concentration (wt%) | |
| Embodiment 1 | Linear novolaks class resist | Qin | 33 | 385.8 | 0.074 | 0.040 | 2.320 |
| Qout | 3 | 2,456.7 | 0.363 | 0.246 | 2.492 | ||
| Qper | 30 | 113.6 | 0.000 | 0.016 | 2.330 | ||
| Qr | 160 | - | - | - | - | ||
| Embodiment 2 | Linear novolaks class resist | Qin | 15.2 | 1,116.0 | 0.165 | 0.044 | 2.468 |
| Qout | 1.3 | 6,830.1 | 1.106 | 0.584 | 3.001 | ||
| Qper | 13.9 | 373.4 | 0.078 | 0.008 | 2.436 | ||
| Qr | 115 | - | - | - | - | ||
| Embodiment 3 | The acrylic compounds resist | Qin | 44 | 194.4 | 0.027 | 0.031 | 0.471 |
| Qout | 4 | 1,186.5 | 0.151 | 0.045 | 0.650 | ||
| Qper | 40 | 51.3 | 0.000 | 0.006 | 0.488 | ||
| Qr | 150 | - | - | - | - |
Claims (4)
1. the method for removing of the carbonate in the resist imaging liquid is characterized in that comprising the filtration operation of utilizing the NF membrane filtration to contain the resist imaging liquid of hydroxide tetramethylammonium and carbonate.
2. the method for removing of the carbonate in the described resist imaging liquid of claim 1, the classification molecular weight of wherein aforementioned NF film is 500～1500.
3. the concentration control method of resist imaging liquid, remove comprising the method for removing of using the carbonate in claim 1 or the 2 described resist imaging liquids aforementioned resist imaging liquid carbonate operation and use conductivity meter to measure the concentration determination operation of the tetramethylphosphonihydroxide hydroxide ammonium concentration of the resist imaging liquid of having removed aforementioned carbonate.
Carbonate in the resist imaging liquid remove device, it is characterized in that having the filtration means of utilizing the NF membrane filtration to contain the resist imaging liquid of hydroxide tetramethylammonium and carbonate.
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2005001703 | 2005-01-06 | ||
| JP2005001703A JP2006189646A (en) | 2005-01-06 | 2005-01-06 | Method for removing carbonate in resist developing solution, removing device, and method for controlling concentration of resist developing solution |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN1800990A true CN1800990A (en) | 2006-07-12 |
Family
ID=36796922
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CNA2006100057185A Pending CN1800990A (en) | 2005-01-06 | 2006-01-06 | Elimination method of carbonate in resists development liquid, elimination apparatus and concentration control method of resists development liquid |
Country Status (4)
| Country | Link |
|---|---|
| JP (1) | JP2006189646A (en) |
| KR (1) | KR20060080884A (en) |
| CN (1) | CN1800990A (en) |
| TW (1) | TW200627092A (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN106552517A (en) * | 2015-09-30 | 2017-04-05 | 东京应化工业株式会社 | Barrier filter and filter method, photoetching medicinal liquid purify the manufacture method and Resist patterns forming method of product |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP5604770B2 (en) * | 2006-11-30 | 2014-10-15 | 三菱化学エンジニアリング株式会社 | Method and apparatus for adjusting developer concentration |
| JP6401580B2 (en) * | 2014-11-11 | 2018-10-10 | ナガセテクノエンジニアリング株式会社 | Analysis apparatus and analysis method |
Family Cites Families (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH06142460A (en) * | 1991-02-13 | 1994-05-24 | Dainippon Seito Kk | Method for pulverizing oligosaccharide |
| JP3671644B2 (en) * | 1998-01-05 | 2005-07-13 | オルガノ株式会社 | Photoresist developing waste liquid recycling method and apparatus |
| JP3758011B2 (en) * | 1998-11-24 | 2006-03-22 | オルガノ株式会社 | Equipment for recovering and reusing recycled developer from photoresist developer waste |
| JP4097973B2 (en) * | 2002-03-29 | 2008-06-11 | 松下環境空調エンジニアリング株式会社 | Alkali developer concentration measurement method |
-
2005
- 2005-01-06 JP JP2005001703A patent/JP2006189646A/en active Pending
- 2005-12-21 TW TW094145600A patent/TW200627092A/en unknown
-
2006
- 2006-01-05 KR KR1020060001237A patent/KR20060080884A/en not_active Withdrawn
- 2006-01-06 CN CNA2006100057185A patent/CN1800990A/en active Pending
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN106552517A (en) * | 2015-09-30 | 2017-04-05 | 东京应化工业株式会社 | Barrier filter and filter method, photoetching medicinal liquid purify the manufacture method and Resist patterns forming method of product |
Also Published As
| Publication number | Publication date |
|---|---|
| TW200627092A (en) | 2006-08-01 |
| KR20060080884A (en) | 2006-07-11 |
| JP2006189646A (en) | 2006-07-20 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| JP3728945B2 (en) | Method and apparatus for recovering and reusing developer from photoresist developer waste | |
| US6083670A (en) | Process and equipment for rejuvenation treatment of photoresist development waste | |
| US20080169230A1 (en) | Pumping and Dispensing System for Coating Semiconductor Wafers | |
| US20140116943A1 (en) | Water Purification System and Method | |
| JP2007323095A (en) | Regeneration treatment method for waste photoresist developing solution | |
| KR100386438B1 (en) | Apparatus and method for recovering photoresist developers and strippers | |
| CN1688879A (en) | Inorganic carbon removal | |
| US8777189B2 (en) | Method and apparatus for treating fluids to reduce microbubbles | |
| CN102407171A (en) | Manufacturing Method Of Tetra-allkylammonium Saline Water Solution | |
| CN1800990A (en) | Elimination method of carbonate in resists development liquid, elimination apparatus and concentration control method of resists development liquid | |
| WO2008013706A1 (en) | Apparatus and method for conditioning an immersion fluid | |
| JP2003167358A (en) | Equipment for regenerating used resist peeling solution and method therefor | |
| JP3758011B2 (en) | Equipment for recovering and reusing recycled developer from photoresist developer waste | |
| US7967978B2 (en) | Method and apparatus for filter conditioning | |
| JP2002253931A (en) | Method and apparatus for manufacturing regenerated tetraalkylammonium hydroxide | |
| CN102050505B (en) | Immersion type membrane separator device | |
| JP3497841B2 (en) | Developing waste liquid recycling apparatus and developing waste liquid recycling method | |
| CN115970499A (en) | Reverse osmosis system control method and device, electronic equipment and storage medium | |
| CN1991594A (en) | Developing solution recycling method and developing solution recycling device | |
| JPH06165927A (en) | Device for preparing solution and method for same | |
| JP2003215810A (en) | Method for recovering developer from photoresist developer waste liquid | |
| WO1993000610A1 (en) | Silver recovery process | |
| CN1508845A (en) | Photoresist supply system and method | |
| JP2005173402A (en) | Regenerating apparatus for photoresist development fluid waste | |
| WO2024044206A2 (en) | Reduced flow rate processing system for flexographic printing plates |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| C06 | Publication | ||
| PB01 | Publication | ||
| C10 | Entry into substantive examination | ||
| SE01 | Entry into force of request for substantive examination | ||
| C12 | Rejection of a patent application after its publication | ||
| RJ01 | Rejection of invention patent application after publication |
Open date: 20060712 |