CN1225725C - Ferromagnetic stack material with reliable uniaxial anisotropy - Google Patents
Ferromagnetic stack material with reliable uniaxial anisotropy Download PDFInfo
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Abstract
一种磁电阻膜包括受钉扎铁磁层;自由铁磁层;置于受钉扎和自由铁磁层之间的中间层;以及接触受钉扎铁磁层的钉扎层。自由铁磁材料层由铁磁叠层材料制成,包括钴镍铁合金层以及设置在钴镍铁合金层上的钴铁合金层。现已证明钴镍铁合金层用于在钴铁合金层中可靠建立单轴磁各向异性。此外,即使钴镍铁合金层以及钴铁合金层的厚度减小,单轴磁各向异性仍能可靠地保持在铁磁叠层材料中。
A magnetoresistive film includes a pinned ferromagnetic layer; a free ferromagnetic layer; an intermediate layer interposed between the pinned and free ferromagnetic layers; and a pinned layer contacting the pinned ferromagnetic layer. The free ferromagnetic material layer is made of ferromagnetic lamination materials, including a cobalt-nickel-iron alloy layer and a cobalt-iron alloy layer arranged on the cobalt-nickel-iron alloy layer. Cobalt-nickel-iron alloy layers have now been demonstrated for the reliable establishment of uniaxial magnetic anisotropy in cobalt-iron alloy layers. In addition, the uniaxial magnetic anisotropy is reliably maintained in the ferromagnetic stacked material even if the thickness of the CoNi-Fe alloy layer as well as the Co-Fe alloy layer is reduced.
Description
技术领域technical field
本发明涉及包括以下层的磁电阻膜:受钉扎铁磁层;自由铁磁层;置于受钉扎和自由铁磁层之间的中间层;以及接触受钉扎铁磁层的钉扎层,例如反铁磁层。The present invention relates to a magnetoresistive film comprising the following layers: a pinned ferromagnetic layer; a free ferromagnetic layer; an intermediate layer disposed between the pinned and free ferromagnetic layers; and a pin contacting the pinned ferromagnetic layer layers, such as antiferromagnetic layers.
背景技术Background technique
磁电阻元件通常用于从磁记录介质驱动器或如硬盘驱动器(HDD)的存储装置中的磁记录盘中读出信息数据。例如自旋阀膜之类的磁电阻膜用在磁电阻元件中。自旋阀膜的电阻随自由铁磁层中磁化方向改变而改变。电阻中的这种变化能够辨别磁记录盘上的磁位数据。Magnetoresistive elements are commonly used to read information data from a magnetic recording disk in a magnetic recording medium drive or a storage device such as a hard disk drive (HDD). A magnetoresistance film such as a spin valve film is used in the magnetoresistance element. The resistance of the spin-valve film changes as the direction of magnetization in the free ferromagnetic layer changes. This change in resistance enables the discrimination of magnetic bit data on a magnetic recording disk.
一般来说,自旋阀膜的自由铁磁层包括镍铁(NiFe)合金层和叠置在镍铁合金层上的钴铁(CoFe)合金层。叠置镍铁合金层有助于建立起钴铁合金层中的单轴磁各向异性。钴铁合金层中单轴磁各向异性的建立导致从磁记录盘接收磁场的自由铁磁层中磁化的可靠转动。以此方式可以可靠地辨别磁位数据。Generally, the free ferromagnetic layer of a spin valve film includes a nickel-iron (NiFe) alloy layer and a cobalt-iron (CoFe) alloy layer stacked on the nickel-iron alloy layer. Stacking the nickel-iron alloy layers helps to establish the uniaxial magnetic anisotropy in the cobalt-iron alloy layer. The establishment of uniaxial magnetic anisotropy in the cobalt-iron alloy layer results in reliable rotation of the magnetization in the free ferromagnetic layer receiving the magnetic field from the magnetic recording disk. Magnetic bit data can be reliably identified in this way.
较高密度的磁记录需要磁电阻元件进一步提高输出。磁电阻元件的输出取决于例如自由铁磁层的厚度。叠置较小厚度的自由铁磁层可以象所需要的那样提高磁电阻元件的输出。然而,如果自由铁磁层中镍铁合金层的厚度减小,那么很难在自由铁磁层中建立单轴各向异性。丧失单轴各向异性往往妨碍了磁位数据的可靠辨别。Higher density magnetic recording requires magnetoresistive elements to further increase output. The output of the magnetoresistive element depends on eg the thickness of the free ferromagnetic layer. Stacking a free ferromagnetic layer of smaller thickness can improve the output of the magnetoresistive element as desired. However, it is difficult to establish uniaxial anisotropy in the free ferromagnetic layer if the thickness of the NiFe alloy layer in the free ferromagnetic layer is reduced. Loss of uniaxial anisotropy often prevents reliable discrimination of magnetic bit data.
发明内容 Contents of the invention
因此本发明的一个目的是提供一种即使厚度减少也能够可靠地建立单轴各向异性的铁磁叠层材料。It is therefore an object of the present invention to provide a ferromagnetic laminate material capable of reliably establishing uniaxial anisotropy even if the thickness is reduced.
根据本发明,提供一种铁磁叠层材料,包括:钴镍铁合金层;以及设置在钴镍铁合金层上的钴铁合金层。According to the present invention, a ferromagnetic lamination material is provided, comprising: a cobalt-nickel-iron alloy layer; and a cobalt-iron alloy layer arranged on the cobalt-nickel-iron alloy layer.
现已证明钴镍铁合金层用于可靠地在钴铁合金层中建立单轴磁各向异性。此外,即使钴镍铁合金层以及钴铁合金层的厚度减小,单轴磁各向异性可以可靠地保持在铁磁叠层材料中。Cobalt-nickel-iron alloy layers have now been demonstrated to reliably establish uniaxial magnetic anisotropy in cobalt-iron alloy layers. In addition, uniaxial magnetic anisotropy can be reliably maintained in the ferromagnetic stack material even if the thickness of the cobalt-nickel-iron alloy layer as well as the cobalt-iron alloy layer is reduced.
铁磁叠层材料可以用做磁电阻膜中的自由铁磁层,设计用于辨别如硬盘驱动器(HDD)的磁记录介质驱动器中磁记录盘上的磁位数据。磁电阻膜可以包括例如,受钉扎铁磁层;包括以上提到的铁磁叠层材料的自由铁磁层;置于受钉扎和自由铁磁层之间的中间层;以及接触受钉扎铁磁层的钉扎层。中间层可以导电或绝缘。钉扎层可以是反铁磁层或特定的硬磁材料层。The ferromagnetic stack material can be used as a free ferromagnetic layer in a magnetoresistive film designed to discriminate magnetic bit data on a magnetic recording disk in a magnetic recording media drive such as a hard disk drive (HDD). The magnetoresistive film may include, for example, a pinned ferromagnetic layer; a free ferromagnetic layer comprising the above-mentioned ferromagnetic stack materials; an intermediate layer interposed between the pinned and free ferromagnetic layers; and a contact pinned ferromagnetic layer. A pinned layer that pins the ferromagnetic layer. The interlayer can be conductive or insulating. The pinned layer can be an antiferromagnetic layer or a layer of a specific hard magnetic material.
这里,钴镍铁合金层含有基于以下表达式的x[atom%]的钴、y[atom%]的镍以及z[atom%]的铁:Here, the cobalt-nickel-iron alloy layer contains x[atom%] of cobalt, y[atom%] of nickel, and z[atom%] of iron based on the following expression:
100=x+y+z100=x+y+z
41≤x≤7241≤x≤72
z=y+10z=y+10
即使自由铁磁层的厚度减小,这种类型的钴镍铁合金层也能可靠地在自由铁磁层中建立单轴磁各向异性。类似地,钴镍铁合金层含有基于以下表达式的x[atom%]的钴、y[atom%]的镍以及z[atom%]的铁:This type of cobalt-nickel-iron alloy layer reliably establishes uniaxial magnetic anisotropy in the free ferromagnetic layer even if the thickness of the free ferromagnetic layer is reduced. Similarly, the cobalt-nickel-iron alloy layer contains x[atom%] of cobalt, y[atom%] of nickel and z[atom%] of iron based on the following expression:
100=x+y+z100=x+y+z
40≤x≤5040≤x≤50
35≤z≤3635≤z≤36
此时,设置钴铁合金层的厚度小于1.0[nm]。At this time, the thickness of the cobalt-iron alloy layer is set to be less than 1.0 [nm].
具体地,优选易磁化方向上钴镍铁合金层中的矫顽力等于或小于800[A/m]。此外,优选在钴镍铁合金层中难磁化方向上的矫顽力Hc(hard)与易磁化方向上的矫顽力Hc(easy)的比值Hc(hard)/Hc(easy)等于或小于0.7。此外,钴镍铁合金层优选具有等于或大于1.7[T]的饱和磁化强度 BS。当三个条件都满足时,钴镍铁合金层非常有利于进一步减小自由铁磁层的厚度。Specifically, it is preferable that the coercive force in the cobalt-nickel-iron alloy layer in the direction of easy magnetization is equal to or less than 800 [A/m]. Further, it is preferable that the ratio Hc (hard) /Hc(easy) of the coercive force Hc (hard) in the hard magnetization direction to the coercive force Hc (easy ) in the easy magnetization direction in the cobalt-nickel-iron alloy layer is equal to or less than 0.7. Furthermore, the cobalt-nickel-iron alloy layer preferably has a saturation magnetization BS equal to or greater than 1.7 [T]. When all three conditions are satisfied, the Co-Ni-Fe layer is very beneficial to further reduce the thickness of the free ferromagnetic layer.
应该注意除了磁电阻膜中的自由铁磁层之外,以上提到的铁磁叠层材料可以应用于任何用途。It should be noted that the above-mentioned ferromagnetic laminate materials can be used for any purpose other than the free ferromagnetic layer in the magnetoresistive film.
附图说明Description of drawings
从下面结合附图优选实施例的说明中,本发明的以上和其它目的、特点及优点将变得很明显,其中:From the following description in conjunction with the preferred embodiments of the accompanying drawings, the above and other objects, features and advantages of the present invention will become apparent, wherein:
图1示意性地示出了硬盘驱动器(HDD)的内部结构的平面图;Fig. 1 schematically shows a plan view of the internal structure of a hard disk drive (HDD);
图2示意性地示出了根据具体例子浮动磁头滑块结构的放大透视图;Fig. 2 schematically shows an enlarged perspective view of a structure of a floating magnetic head slider according to a specific example;
图3示意性地示出了在空气支撑表面观察到的读/写电磁转换器的前视图;Figure 3 schematically shows a front view of a read/write electromagnetic transducer viewed on an air bearing surface;
图4为磁电阻(MR)读出元件的放大平面图;4 is an enlarged plan view of a magnetoresistive (MR) readout element;
图5示意性地示出了根据本发明的自旋阀膜结构的放大前视图;Fig. 5 schematically shows an enlarged front view of a spin valve membrane structure according to the present invention;
图6A示出了根据实施例的第一例子的自旋阀膜的BH特性的曲线图;6A is a graph showing a BH characteristic of a spin valve film according to the first example of the embodiment;
图6B示出了根据比较例的自旋阀膜的BH特性的曲线图;FIG. 6B shows a graph of BH characteristics of a spin-valve film according to a comparative example;
图7示出了钻镍铁(CoNiFe)合金的组分与良好磁特性的关系曲线图;Figure 7 shows a graph showing the relationship between the composition of cobalt-nickel-iron (CoNiFe) alloys and good magnetic properties;
图8为电流垂直于平面(CPP)结构MR读出元件的放大平面图;以及8 is an enlarged plan view of a current perpendicular to the plane (CPP) structure MR readout element; and
图9为隧道结磁电阻(TMR)膜的放大前视图。Fig. 9 is an enlarged front view of a tunnel junction magnetoresistance (TMR) film.
具体实施方式Detailed ways
图1示意性地示出了作为记录介质驱动器或存储装置一个例子的硬盘驱动器(HDD)11的内部结构。HDD 11包括盒形主外壳12,限定出例如平坦的平行六面体内部空间。在主外壳12的内部空间内引入至少一个磁记录盘13。磁记录盘13安装在主轴电动机14的驱动轴上。主轴电动机14能够驱动磁记录盘13以例如4,200rpm和7,200rpm或10,000rpm之间范围内的较高转速旋转。未示出的盖和主外壳12结合以限定主外壳12和它自身之间的封闭内部空间。FIG. 1 schematically shows the internal structure of a hard disk drive (HDD) 11 as an example of a recording medium drive or storage device. The HDD 11 includes a box-shaped main housing 12 defining, for example, a flat parallelepiped internal space. In the inner space of the main casing 12 is introduced at least one magnetic recording disk 13 . The magnetic recording disk 13 is mounted on a drive shaft of a spindle motor 14 . The spindle motor 14 is capable of driving the magnetic recording disk 13 to rotate at a relatively high rotational speed, for example, in a range between 4,200 rpm and 7,200 rpm or 10,000 rpm. A cover, not shown, combines with the main housing 12 to define a closed interior space between the main housing 12 and itself.
支架16也设置主外壳12的内部空间内。将支架16设计成可以绕垂直的支撑轴15摆动。支架16包括在垂直的支撑轴15的水平方向上延伸的刚性摆臂17,弹性磁头悬架18固定到摆臂17的顶端。弹性磁头悬架18从摆臂17向前延伸。通常,浮动磁头滑块19通过未示出的平衡弹簧(gimbal spring)悬挂在磁头悬架18上。磁头悬架18用于朝磁记录盘13的表面推进浮动磁头滑块19。当磁记录盘13旋转时,浮动磁头滑块19能够接收沿旋转的磁记录盘13产生的气流。气流用于在浮动磁头滑块19上产生升力。从而通过升力和磁头悬架18的推动力之间平衡建立起较高稳定性,在磁记录盘13以此较高稳定性旋转期间,浮动磁头滑块19能够保持在磁记录盘13的表面上浮动。The bracket 16 is also disposed within the inner space of the main housing 12 . The support 16 is designed to swing around the vertical support shaft 15 . The bracket 16 includes a rigid swing arm 17 extending in the horizontal direction of a vertical support shaft 15 , and an elastic head suspension 18 is fixed to the top end of the swing arm 17 . An elastic head suspension 18 extends forward from the swing arm 17 . Normally, the flying head slider 19 is suspended on the head suspension 18 by a gimbal spring not shown. The head suspension 18 is used to propel the flying head slider 19 toward the surface of the magnetic recording disk 13 . When the magnetic recording disk 13 rotates, the flying head slider 19 can receive an air flow generated along the rotating magnetic recording disk 13 . The air flow is used to generate a lift force on the flying head slider 19 . Higher stability is thereby established by the balance between the lifting force and the driving force of the head suspension 18, and the flying head slider 19 can be held on the surface of the magnetic recording disk 13 during the rotation of the magnetic recording disk 13 with this higher stability. float.
在浮动磁头滑块19浮动期间,当驱动支架16被驱动绕支撑轴15摆动时,浮动磁头滑块19能够横越磁记录盘13的径向在磁记录盘13上限定的记录磁轨。这种径向移动可以将浮动磁头滑块19正好设置在磁记录盘13上的目标记录磁轨上。此时,例如可以使用如音圈电机(VCM)等的电磁致动器21实现支架16的摆动。通常,当两个或更多磁记录盘13设置在主外壳12的内部空间内,在相邻的磁记录盘13之间设置一对弹性磁头悬架18和摆臂17。During the floating of the flying head slider 19 , when the drive bracket 16 is driven to swing around the support shaft 15 , the flying head slider 19 can traverse the recording tracks defined on the magnetic recording disk 13 in the radial direction of the magnetic recording disk 13 . This radial movement can place the flying head slider 19 exactly on the target recording track on the magnetic recording disk 13 . At this time, for example, an electromagnetic actuator 21 such as a voice coil motor (VCM) can be used to realize the swing of the bracket 16 . Generally, when two or more magnetic recording disks 13 are disposed within the inner space of the main housing 12 , a pair of elastic head suspensions 18 and swing arms 17 are disposed between adjacent magnetic recording disks 13 .
图2示出了浮动磁头滑块19的一个具体例子。这种类型的浮动磁头滑块19包括由Al2O3-TiC制成平坦的平行六面体的滑动体22,以及结合到滑动体22尾部或滑出端出端的磁头保护层24。磁头保护层24可以由Al2O3制成。读出/写入电磁转换器23嵌在磁头保护层24中。介质相对表面或底面25连续延伸地限定在滑动体22和磁头保护层24上,以一定距离面对磁记录盘13的表面。底面25设计成接收沿旋转磁记录盘13的表面产生的气流26。A specific example of the flying head slider 19 is shown in FIG. 2 . This type of flying head slider 19 includes a flat parallelepiped slider body 22 made of Al 2 O 3 —TiC, and a head protection layer 24 bonded to the tail of the slider body 22 or the slider-out end. The head protective layer 24 may be made of Al 2 O 3 . A read/write electromagnetic transducer 23 is embedded in the head protective layer 24 . A medium-facing surface or bottom surface 25 is defined in continuous extension on the slider 22 and the head protection layer 24, facing the surface of the magnetic recording disk 13 at a distance. Bottom surface 25 is designed to receive airflow 26 generated along the surface of rotating magnetic recording disk 13 .
形成一对导轨27在底面25上从导向或流入端朝尾部或流出端延伸。各导轨27设计成在它的顶面限定空气支撑表面28。具体地,气流26在各空气支撑表面28产生以上提到的升力。嵌在磁头保护层24中的读出/写入电磁转换器23设计成在空气支撑表面28露出前端,以后将具体介绍。可以额外形成类金刚石碳(DLC)保护层在空气支撑表面28延伸,以覆盖电磁转换器23的前端。浮动磁头滑块19可以采用除以上介绍之外的任何形状或形式。A pair of rails 27 are formed on the bottom surface 25 extending from the leading or inflow end towards the tail or outflow end. Each rail 27 is designed to define an
如图3详细所示,电磁转换器23形成所谓的复合型薄膜磁头。具体地,电磁转换器23包括磁电阻(MR)读出元件31和薄膜磁性或感应写入磁头32。MR读出元件31设计成能响应来自磁记录盘13的施加磁场电阻中的变化辨别磁位数据。薄膜磁头32设计成利用未示出的的导电涡旋形线圈图形感应的磁场,由此将磁位数据记录到磁记录盘13内。As shown in detail in FIG. 3, the electromagnetic transducer 23 forms a so-called composite type thin-film magnetic head. Specifically, the electromagnetic transducer 23 includes a magnetoresistive (MR)
MR读出元件31位于上和非非磁间隙层33,34之间。上和下非磁间隙层33,34可以由例如Al2O3(氧化铝)制成。插入MR读出元件31的上和下非磁间隙层33,34位于上和下屏蔽层35,36之间。上和下屏蔽层35,36可以由FeN、NiFe等制成。下屏蔽层36可以在Al2O3(氧化铝)层37表面上延伸。氧化铝层37用作以上提到的磁头保护层24的下半层,即,里衬层。The
薄膜磁头32包括在上屏蔽层35的表面上延伸的非磁间隙层38。非磁间隙层38可以由例如Al2O3(氧化铝)制成。上磁极层39与上屏蔽层35相对。非磁间隙层38设置在上屏蔽层35和上磁极层39之间。上磁极层39可以由例如NiFe制成。上磁极层39由在非磁间隙层38上延伸的Al2O3(氧化铝)层40覆盖。氧化铝层40设计成在以上提到的氧化铝层37和它自身之间插入MR读出元件31和薄膜磁头32。具体地,氧化铝层40设计成磁头保护层24的上半层,即,外罩层。The thin film
上磁极层39和上屏蔽层35一起用于确定薄膜磁头32的磁芯。具体地,MR读出元件31的上屏蔽层35设计成额外作为薄膜磁头32的下磁极层的功能。当在导电涡旋形线圈图形感应出磁场时,在上磁极层39和上屏蔽层35之间交换磁通量。非磁间隙层38使交换的磁通量从空气支撑表面28泄露。如此泄露的磁通量形成用于记录的磁场,即,写间隙磁场。MR读出元件31的上屏蔽层35由薄膜磁头32的下磁极层决定。The upper
同样参考图4,MR读出元件31包括磁电阻(MR)膜,即,在非磁间隙层34的平坦表面上沿空气支撑表面28延伸的自旋阀膜41。一对端面定义在自旋阀膜41上,由此与非磁间隙层34的平坦表面交叉倾斜角θ。Referring also to FIG. 4 , the
类似地,形成一对磁畴控制硬磁膜42在非磁间隙层34的平坦表面上沿空气支撑表面28延伸。磁畴控制硬磁膜42设计成在非磁间隙层34的平坦表面上沿空气支撑表面28插入自旋阀膜41。磁畴控制硬磁膜42的前端分别连接到自旋阀膜41的端面。磁畴控制硬磁膜42可以由如CoPt、CoCrPt等硬磁材料制成。Similarly, a pair of magnetic domain control hard
形成引线层43在磁畴控制硬磁膜42的表面上延伸。引线层43介于磁畴控制硬磁膜42和上屏蔽层35之间。引线层43的导向或前端通过磁畴控制硬磁膜42连接到自旋阀膜41的端面。读出电流通过引线层43提供到自旋阀膜41。引线层43可以由具有较高导电性的材料制成,例如Cu。The
如图4所示,引线层43设计成从空气支撑表面28露出的前端沿非磁间隙层34的平坦表面向后延伸。端子焊盘44分别连接到引线层43的后端。端子焊盘44可以在引线层43的表面上延伸。当浮动磁头滑块19固定在弹性磁头悬架18上时,端子焊盘44通过例如未示出的Au球连接到弹性磁头悬架18上未示出的端子焊盘。As shown in FIG. 4 , the
如图5所示,自旋阀膜41包括设置在非磁间隙层34表面上的基底层51。基底层51可以由例如镍铬(NiCr)合金层制成。As shown in FIG. 5 , the
钉扎层52设置在基底层51的表面上。钉扎层52可以由如PdPtMn、FeMn等的反铁磁合金材料制成。此外,钉扎层52可以由硬磁性材料制成。受钉扎铁磁层53设置在钉扎层52的表面上。受钉扎铁磁层53包括依次叠置在钉扎层52表面上的第一、第二和第三钴铁(CoFe)合金铁磁层53a、53b、53c。钌(Ru)结合层54介于第一和第二CoFe合金铁磁层53a、53b之间。反射膜或氧化层55插在第二和第三CoFe合金铁磁层53b、53c之间。此外,受钉扎铁磁层53可以具有除以上介绍的之外的结构。钉扎层52用于在预定的方向上固定受钉扎铁磁层53中的磁化。The pinning layer 52 is provided on the surface of the base layer 51 . The pinning layer 52 may be made of an antiferromagnetic alloy material such as PdPtMn, FeMn, or the like. In addition, the pinning layer 52 may be made of a hard magnetic material. The pinned ferromagnetic layer 53 is disposed on the surface of the pinned layer 52 . The pinned ferromagnetic layer 53 includes first, second and third cobalt-iron (CoFe) alloy ferromagnetic layers 53 a , 53 b , 53 c sequentially stacked on the surface of the pinned layer 52 . A ruthenium (Ru) bonding layer 54 is interposed between the first and second CoFe alloy ferromagnetic layers 53a, 53b. A reflective film or oxide layer 55 is interposed between the second and third CoFe alloy ferromagnetic layers 53b, 53c. In addition, the pinned ferromagnetic layer 53 may have structures other than those described above. The pinning layer 52 serves to fix the magnetization in the pinned ferromagnetic layer 53 in a predetermined direction.
非磁性中间层56设置在受钉扎铁磁层53的表面上。非磁性中间层56可以由例如Cu等的导电材料制成。自由铁磁层57设置在非磁性中间层56的表面上。自由铁磁层57包括在非磁性中间层56的表面上延伸的钴铁(CoFe)合金层57a,以及在钴铁合金层57a上延伸的钴镍铁(CoNiFe)合金层57b。自由铁磁层57的表面上覆盖有保护层58。保护层58包括铜(Cu)层58a和设置在Cu层58a上表面上的盖或钽(Ta)层58b。The nonmagnetic intermediate layer 56 is provided on the surface of the pinned ferromagnetic layer 53 . The nonmagnetic interlayer 56 may be made of a conductive material such as Cu. A free ferromagnetic layer 57 is provided on the surface of the nonmagnetic intermediate layer 56 . The free ferromagnetic layer 57 includes a cobalt-iron (CoFe) alloy layer 57a extending on the surface of the nonmagnetic intermediate layer 56, and a cobalt-nickel-iron (CoNiFe) alloy layer 57b extending on the cobalt-iron alloy layer 57a. The surface of the free ferromagnetic layer 57 is covered with a protective layer 58 . The protective layer 58 includes a copper (Cu) layer 58a and a cap or tantalum (Ta) layer 58b disposed on the upper surface of the Cu layer 58a.
当MR读出元件31与磁记录盘13相对,用于读出磁信息数据时,自由铁磁层57的磁化能够响应磁记录盘13施加的磁极性翻转在自旋阀膜41中旋转。自由铁磁层57中磁化的旋转导致自旋阀膜41中电阻的变化。当读出电流通过引线层43施加到自旋阀膜41时,响应磁电阻中的变化,如电压等的任何参数大小的变化出现在由端子焊盘44输出的读出电流输出中。大小变化可用于辨别记录在磁记录盘13上的磁位数据。When the
此时,以上提到的钴镍铁合金层57b用于在自旋阀膜41中可靠地确定自由铁磁层57中的单轴磁各向异性。当磁场由磁记录盘作用在自由铁磁层57上时,单轴磁各向异性的建立导致自由铁磁层57中的磁化可靠旋转。可以可靠地辨别磁位数据。此外,即使钴铁合金层57a以及钴镍铁合金层57b的厚度减小,也可以在自由铁磁层57中可靠地确定单轴磁各向异性。自旋阀膜41显示出较大的电阻变化,由此端子焊盘44输出电压出现较大的幅值变化。以此方式可以得到提高的输出。At this time, the above-mentioned cobalt-nickel-iron alloy layer 57 b is used to reliably determine the uniaxial magnetic anisotropy in the free ferromagnetic layer 57 in the
本发明人已观察到了以上提到的自旋阀膜41的特性。在观察中,本发明人在真空气氛中在晶片上沉积层叠材料。层叠材料依次包括厚度约6.0nm的NiCr、厚度约15.0nm的PdPtMn层,厚度约1.5nm的第一CoFe合金铁磁层53a,厚度约0,85nm的Ru结合层54,以及厚度约1.0nm的第二CoFe合金铁磁层53b。使用溅射沉积层叠材料。第二CoFe合金铁磁层53b沉积之后,氧气引入到真空气氛中。氧气的引入保持70秒。引入的氧气用于在第二CoFe合金铁磁层53b的表面上形成氧化层55。形成氧化层55之后再次形成真空气氛。本发明人随后在晶片上依次沉积厚度1.5nm的第三CoFe合金铁磁层53c、厚度约2.1nm的Cu层、厚度约0.5nm的钴铁合金层57a、厚度约1.7nm的钴镍铁合金层57b、厚度约1.2nm的Cu层、以及厚度约3.0nm的钽层。也可采用溅射进行沉积。Co90Fe10合金(atom%)用做CoFe合金铁磁层53a,53b,53c,57a。Co41Fe24Ni35合金(atom%)用做CoNiFe合金铁磁层。沉积完成之后,在热处理的基础上调整PdPtMn层。以此方式制备第一例的自旋阀膜41。本发明人测量了制备的自旋阀膜41的磁电阻(MR)比例[%]、表面电阻ρ/t[Ω]、电阻变化Δρ/t[Ω]、磁耦合场
Hin[A/m]以及磁耦合或钉扎场
Hua[kA/m]。The present inventors have observed the above-mentioned characteristics of the spin-
本发明人还制备了对比例的自旋阀膜。除了用厚度约1.0nm的CoFe合金层与自由铁磁层57中厚度约2.0nm的NiFe层组合代替钴铁合金层57a和钴镍铁合金层57b之外,按上面提到的方式形成自旋阀膜。在热处理的基础上调整PdPtMn层之后,本发明人测量了对比例的自旋阀膜的磁电阻(MR)比例[%]、表面电阻ρ/t[Ω]、电阻变化Δρ/t[Ω]、磁耦合场 Hin[A/m]以及磁耦合或钉扎场 Hua[kA/m]。The present inventors also prepared spin-valve membranes of comparative examples. The spin-valve film was formed in the above-mentioned manner except that the CoFe alloy layer 57a and the CoFe alloy layer 57b were replaced by a combination of a CoFe alloy layer having a thickness of about 1.0 nm and a NiFe layer having a thickness of about 2.0 nm in the free ferromagnetic layer 57. . After adjusting the PdPtMn layer on the basis of heat treatment, the inventors measured the magnetoresistance (MR) ratio [%], surface resistance ρ/t[Ω], resistance change Δρ/t[Ω] of the spin-valve film of the comparative example , the magnetic coupling field Hin [A/m] and the magnetic coupling or pinning field Hua [kA/m].
[表1]
从表1中可以看出,与比较例的自旋阀膜相比,第一例的自旋阀膜41中的MR比显著提高。第一例的自旋阀膜41显示出较大的电阻变化幅值Δρ/t。此外,如图6A所示,已证实第一例的自旋阀膜41中的单轴磁各向异性,而与厚度减少无关。另一方面,图6B所示的自旋阀膜中可以观察到单轴磁各向异性损耗。As can be seen from Table 1, the MR ratio in the spin-
本发明人类似地制备了第二例的自旋阀膜。本发明人再次在真空气氛中在晶片上沉积层叠材料。层叠材料依次包括厚度约6.0nm的NiCr层、厚度约15.0nm的PdPtMn、厚度约1.2nm的第一CoFe合金铁磁层53a、厚度约0.85nm的Ru结合层54,以及厚度约1.2nm的第二CoFe合金铁磁层53b。使用溅射沉积层叠材料。沉积第二CoFe合金铁磁层53b之后将氧气引入到真空气氛内。氧气的引入保持90秒。引入的氧气用于在第二CoFe合金铁磁层53b的表面上形成氧化层55。形成氧化层55之后再次形成真空气氛。本发明人随后在晶片上依次沉积厚度1.7nm的第三CoFe合金铁磁层53c、厚度约2.1nm的Cu层、厚度约0.5nm的钴铁合金层57a、厚度约1.7nm的CoNiFe合金层57b、厚度约0.6nm的Au层。也可采用溅射进行沉积。Co60Fe40合金(atom%)用做CoFe合金铁磁层53a,53b,53c,57a。Co41Fe24Ni35合金(atom%)用做CoNiFe合金铁磁层57b。沉积完成之后,在热处理的基础上调整PdPtMn层。以此方式制备第二例的自旋阀膜41。本发明人测量了制备的自旋阀膜41的磁电阻(MR)比例[%]、表面电阻ρ/t[Ω]、电阻变化Δρ/t[Ω]、磁耦合场
Hin[A/m]以及磁耦合或钉扎场
Hua[kA/m]。The present inventors similarly prepared the spin-valve film of the second example. The inventors again deposited the laminated material on the wafer in a vacuum atmosphere. The stacked material sequentially includes a NiCr layer with a thickness of about 6.0nm, a PdPtMn layer with a thickness of about 15.0nm, a first CoFe alloy ferromagnetic layer 53a with a thickness of about 1.2nm, a Ru bonding layer 54 with a thickness of about 0.85nm, and a second layer with a thickness of about 1.2nm. Two CoFe alloy ferromagnetic layers 53b. The layered material is deposited using sputtering. Oxygen was introduced into the vacuum atmosphere after depositing the second CoFe alloy ferromagnetic layer 53b. The introduction of oxygen is maintained for 90 seconds. The introduced oxygen is used to form an oxide layer 55 on the surface of the second CoFe alloy ferromagnetic layer 53b. The vacuum atmosphere is formed again after the oxide layer 55 is formed. The present inventor then sequentially deposited on the wafer a third CoFe alloy ferromagnetic layer 53c with a thickness of 1.7nm, a Cu layer with a thickness of about 2.1nm, a cobalt-iron alloy layer 57a with a thickness of about 0.5nm, a CoNiFe alloy layer 57b with a thickness of about 1.7nm, Au layer with a thickness of about 0.6 nm. Sputtering can also be used for deposition. Co 60 Fe 40 alloy (atom%) is used for the CoFe alloy ferromagnetic layers 53a, 53b, 53c, 57a. Co 41 Fe 24 Ni 35 alloy (atom%) is used for the CoNiFe alloy ferromagnetic layer 57b. After the deposition is completed, the PdPtMn layer is adjusted on the basis of heat treatment. In this way, the spin-
本发明人还以上面提到的方式制备了对比例的自旋阀膜。除了用厚度约1.0nm的CoFe合金层与自由铁磁层57中厚度约2.0nm的NiFe层组合代替钴铁合金层57a和钴镍铁合金层57b之外,以上面提到的方式形成自旋阀膜。在热处理的基础上调整PdPtMn层之后,本发明人测量了对比例的自旋阀膜的磁电阻(MR)比例[%]、表面电阻ρ/t[Ω]、电阻变化Δρ/t[Ω]、磁耦合场 Hin[A/m]以及磁耦合或钉扎场Hua[kA/m]。The present inventors also prepared spin-valve films of comparative examples in the above-mentioned manner. The spin-valve film was formed in the above-mentioned manner except that the cobalt-iron alloy layer 57a and the cobalt-nickel-iron alloy layer 57b were replaced by a combination of a CoFe alloy layer with a thickness of about 1.0 nm and a NiFe layer with a thickness of about 2.0 nm in the free ferromagnetic layer 57. . After adjusting the PdPtMn layer on the basis of heat treatment, the inventors measured the magnetoresistance (MR) ratio [%], surface resistance ρ/t[Ω], resistance change Δρ/t[Ω] of the spin-valve film of the comparative example , the magnetic coupling field Hin [A/m] and the magnetic coupling or pinning field Hua [kA/m].
[表2][Table 2]
从表2中可以看出,与比较例的自旋阀膜相比,第二例的自旋阀膜41中的MR比显著提高。第二例的自旋阀膜41显示出较大的电阻变化幅值Δρ/t。此外,已证实第二例的自旋阀膜41中的单轴磁各向异性,而与厚度减少无关。As can be seen from Table 2, the MR ratio in the spin-
本发明人观察了CoNiFe合金层57b的磁特性。本发明人测量了CoNiFe合金层的各种组合物的饱和磁密度 Bs[T]、易磁化方向上的矫顽力Hc(easy)[A/m],以及矫顽力Hc(hard)[A/m]。如表3所示,在特定组分的CoNiFe合金层中观察到了单轴各向异性。The present inventors observed the magnetic properties of the CoNiFe alloy layer 57b. The present inventors measured the saturation magnetic density Bs [T], the coercive force Hc (easy) [A/m] in the direction of easy magnetization, and the coercive force Hc (hard) [A/m] of various compositions of CoNiFe alloy layers. /m]. As shown in Table 3, uniaxial anisotropy was observed in the CoNiFe alloy layers of specific compositions.
[表3][table 3]
可以根据图7中所示的结构确定CoNiFe合金层的组分以确定单轴各向异性。具体地,CoNiFe层应含有基于以下表达式的x[atom%]的钴、y[atom%]的镍以及z[atom%]的铁:The composition of the CoNiFe alloy layer can be determined according to the structure shown in FIG. 7 to determine the uniaxial anisotropy. Specifically, the CoNiFe layer should contain cobalt in x[atom%], nickel in y[atom%] and iron in z[atom%] based on the following expressions:
100=x+y+z100=x+y+z
41≤x≤7241≤x≤72
z=y+10z=y+10
此外,CoNiFe层含有基于以下表达式的x[atom%]的钴、y[atom%]的镍以及z[atom%]的铁:In addition, the CoNiFe layer contains x[atom%] of cobalt, y[atom%] of nickel, and z[atom%] of iron based on the following expressions:
100=x+y+z100=x+y+z
40≤x≤5040≤x≤50
35≤z≤3635≤z≤36
应该注意在CoNiFe合金的组分中可以接受±2[atom%]的余量。具体地,自由铁磁层57的厚度在以下条件下可以减小:在易磁化方向上CoNiFe合金层的矫顽力等于或小于800[A/m],和/或在钴镍铁合金层中设置难磁化方向上的矫顽力Hc(hard)与易磁化方向上的矫顽力Hc(easy)的比值等于或小于0.7,和/或CoNiFe合金层具有例如等于或大于1.7[T]的饱和磁化强度Bs。It should be noted that a margin of ±2 [atom%] is acceptable in the composition of the CoNiFe alloy. Specifically, the thickness of the free ferromagnetic layer 57 can be reduced under the following conditions: the coercivity of the CoNiFe alloy layer in the direction of easy magnetization is equal to or less than 800 [A/m], and/or the cobalt-nickel-iron alloy layer is provided The ratio of the coercive force Hc (hard) in the hard magnetization direction to the coercive force Hc (easy) in the easy magnetization direction is equal to or less than 0.7, and/or the CoNiFe alloy layer has a saturation magnetization equal to or greater than 1.7 [T], for example Strength Bs.
如图8所示,自旋阀膜41设置在例如所谓的电流垂直于平面(CPP)结构MR读出元件31a中。自旋阀膜41基于CPP结构MR读出元件31a的上和下电极层43a,43b之间。自旋阀膜41仅能具有以上提到的结构。此时,如果电极层43a,43b由导电磁性材料制成,那么电极层43a,43b能够附加地起CPP结构MR读出元件31a的上和下屏蔽层的作用。此外,类似的参考数字属于等效于以上提到的MR读出元件31的结构或部件。自由铁磁层57减小厚度导致CPP结构MR读出元件31a的上和下屏蔽层之间的空间减少。由此沿磁记录盘13的记录轨道可以提高磁记录的线性分辨率。As shown in FIG. 8, a
以上提到的自旋阀膜41可以用CPP结构MR读出元件31a中的隧道结磁电阻(TMR)膜代替。如图9所示,以上介绍的自由铁磁层57可以设置在例如TMR膜41b。设置绝缘非磁性中间层61代替以上提到的TMR膜41b中的导电非磁性中间层56。此外,类似的参考数字属于等效于以上提到的自旋阀膜41的结构或部件。如果以此方式在TMR膜41b中设置自由铁磁层57,那么如上所述自由铁磁层57减小厚度导致CPP结构MR读出元件31a的上和下屏蔽层之间的空间减少。由此沿磁记录盘13的记录轨道可以提高磁记录的线性分辨率。The above-mentioned
应该注意自旋阀膜41和TMR膜41b可以形成为在受钉扎铁磁层53下面包括自由铁磁层57。It should be noted that the
Claims (18)
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| JP391047/2001 | 2001-12-25 | ||
| JP2001391047A JP2003198002A (en) | 2001-12-25 | 2001-12-25 | Magnetoresistive film and ferromagnetic laminated structure |
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| CN1225725C true CN1225725C (en) | 2005-11-02 |
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| US (1) | US7292415B2 (en) |
| EP (1) | EP1324356B1 (en) |
| JP (1) | JP2003198002A (en) |
| KR (1) | KR100849430B1 (en) |
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| US7449345B2 (en) * | 2004-06-15 | 2008-11-11 | Headway Technologies, Inc. | Capping structure for enhancing dR/R of the MTJ device |
| US7611912B2 (en) * | 2004-06-30 | 2009-11-03 | Headway Technologies, Inc. | Underlayer for high performance magnetic tunneling junction MRAM |
| JP4822680B2 (en) * | 2004-08-10 | 2011-11-24 | 株式会社東芝 | Method for manufacturing magnetoresistive element |
| JP2006060044A (en) * | 2004-08-20 | 2006-03-02 | Canon Anelva Corp | Method for manufacturing magnetoresistive element |
| JP2006261454A (en) * | 2005-03-17 | 2006-09-28 | Fujitsu Ltd | Magnetoresistive element, magnetic head, and magnetic storage device |
| US8449948B2 (en) * | 2009-09-10 | 2013-05-28 | Western Digital (Fremont), Llc | Method and system for corrosion protection of layers in a structure of a magnetic recording transducer |
| US9034150B2 (en) * | 2012-11-29 | 2015-05-19 | Seagate Technology Llc | Thin film with tuned anisotropy and magnetic moment |
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| US3921218A (en) * | 1973-12-26 | 1975-11-18 | Honeywell Inf Systems | Thin film magnetoresistive transducers with rotated magnetic easy axis |
| US4847584A (en) * | 1988-10-14 | 1989-07-11 | Honeywell Inc. | Magnetoresistive magnetic sensor |
| JPH0729735A (en) | 1993-07-09 | 1995-01-31 | Tohoku Tokushuko Kk | Ferromagnetic magnetoresistance effect alloy film |
| JP3574186B2 (en) * | 1994-09-09 | 2004-10-06 | 富士通株式会社 | Magnetoresistance effect element |
| JPH08212512A (en) * | 1995-02-03 | 1996-08-20 | Hitachi Ltd | Magnetic storage device, thin-film magnetic head used therefor, and manufacturing method thereof |
| US5896252A (en) | 1995-08-11 | 1999-04-20 | Fujitsu Limited | Multilayer spin valve magneto-resistive effect magnetic head with free magnetic layer including two sublayers and magnetic disk drive including same |
| JP3461999B2 (en) * | 1996-03-28 | 2003-10-27 | 株式会社東芝 | Magnetoresistive element |
| JP2924825B2 (en) * | 1996-10-31 | 1999-07-26 | 日本電気株式会社 | Magnetoresistive element and magnetoresistive sensor using the same |
| US5768069A (en) * | 1996-11-27 | 1998-06-16 | International Business Machines Corporation | Self-biased dual spin valve sensor |
| JPH10241123A (en) * | 1997-02-28 | 1998-09-11 | Nec Corp | Magnetoresistance effect head |
| JPH10294217A (en) | 1997-04-21 | 1998-11-04 | Victor Co Of Japan Ltd | Spin valve type magnetoresistance effect film and magnetic head having the same |
| JP2970590B2 (en) * | 1997-05-14 | 1999-11-02 | 日本電気株式会社 | Magnetoresistive element, magnetoresistive sensor using the same, magnetoresistive detection system and magnetic storage system |
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| US6245450B1 (en) * | 1997-11-17 | 2001-06-12 | Matsushita Electric Industrial Co., Ltd. | Exchange coupling film magnetoresistance effect device magnetoresistance effective head and method for producing magnetoresistance effect device |
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| JP3114683B2 (en) * | 1998-01-22 | 2000-12-04 | 日本電気株式会社 | Magnetoresistance effect element and method of manufacturing the same, and magnetoresistance effect sensor, magnetoresistance detection system and magnetic storage system using this magnetoresistance effect element |
| US5930164A (en) * | 1998-02-26 | 1999-07-27 | Motorola, Inc. | Magnetic memory unit having four states and operating method thereof |
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| JP2002183909A (en) * | 2000-12-07 | 2002-06-28 | Hitachi Ltd | Method of manufacturing thin-film magnetic head, thin-film magnetic head, and magnetic disk drive equipped with the same |
| JP2002309353A (en) * | 2001-04-13 | 2002-10-23 | Fujitsu Ltd | Soft magnetic film and magnetic head for recording using the same |
| JP2003157509A (en) * | 2001-11-19 | 2003-05-30 | Hitachi Ltd | Thin-film magnetic head, method of manufacturing the same, and magnetic disk drive equipped with the same |
-
2001
- 2001-12-25 JP JP2001391047A patent/JP2003198002A/en active Pending
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- 2002-12-23 US US10/328,437 patent/US7292415B2/en not_active Expired - Fee Related
- 2002-12-23 EP EP02258894A patent/EP1324356B1/en not_active Expired - Lifetime
- 2002-12-23 DE DE60211109T patent/DE60211109T2/en not_active Expired - Lifetime
- 2002-12-24 KR KR1020020083101A patent/KR100849430B1/en not_active Expired - Fee Related
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| EP1324356B1 (en) | 2006-05-03 |
| DE60211109T2 (en) | 2006-09-07 |
| CN1430205A (en) | 2003-07-16 |
| DE60211109D1 (en) | 2006-06-08 |
| JP2003198002A (en) | 2003-07-11 |
| KR100849430B1 (en) | 2008-07-30 |
| US7292415B2 (en) | 2007-11-06 |
| EP1324356A1 (en) | 2003-07-02 |
| KR20030057336A (en) | 2003-07-04 |
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